DE3769417D1 - Verfahren zur herstellung transparenter, leitender ueberzuege. - Google Patents

Verfahren zur herstellung transparenter, leitender ueberzuege.

Info

Publication number
DE3769417D1
DE3769417D1 DE8787113556T DE3769417T DE3769417D1 DE 3769417 D1 DE3769417 D1 DE 3769417D1 DE 8787113556 T DE8787113556 T DE 8787113556T DE 3769417 T DE3769417 T DE 3769417T DE 3769417 D1 DE3769417 D1 DE 3769417D1
Authority
DE
Germany
Prior art keywords
producing transparent
conductive covers
covers
conductive
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787113556T
Other languages
English (en)
Inventor
Yasuhito Isozaki
Kazuyuki Okano
You Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE3769417D1 publication Critical patent/DE3769417D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C20/00—Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating
    • C23C20/06—Coating with inorganic material, other than metallic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/27—Oxides by oxidation of a coating previously applied
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C03C2217/231—In2O3/SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/322—Oxidation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Liquid Crystal (AREA)
  • Chemically Coating (AREA)
  • Non-Insulated Conductors (AREA)
DE8787113556T 1986-09-17 1987-09-16 Verfahren zur herstellung transparenter, leitender ueberzuege. Expired - Lifetime DE3769417D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61220602A JP2718023B2 (ja) 1986-09-17 1986-09-17 透明導電膜の形成方法

Publications (1)

Publication Number Publication Date
DE3769417D1 true DE3769417D1 (de) 1991-05-23

Family

ID=16753547

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787113556T Expired - Lifetime DE3769417D1 (de) 1986-09-17 1987-09-16 Verfahren zur herstellung transparenter, leitender ueberzuege.

Country Status (5)

Country Link
US (1) US4888210A (de)
EP (1) EP0261578B1 (de)
JP (1) JP2718023B2 (de)
KR (1) KR910000408B1 (de)
DE (1) DE3769417D1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2827226B2 (ja) * 1988-08-29 1998-11-25 松下電器産業株式会社 透明導電膜の形成方法
KR910005090B1 (en) * 1989-06-02 1991-07-22 Samsung Electronic Devices Method of making the spacer of display device
JPH04186229A (ja) * 1990-11-20 1992-07-03 Matsushita Electric Ind Co Ltd 補助電極付透明電極およびその製造方法
JP3587537B2 (ja) 1992-12-09 2004-11-10 株式会社半導体エネルギー研究所 半導体装置
JP3724592B2 (ja) * 1993-07-26 2005-12-07 ハイニックス セミコンダクター アメリカ インコーポレイテッド 半導体基板の平坦化方法
GB9421335D0 (en) * 1994-10-22 1994-12-07 Epichem Ltd Chemical vapour deposition
EP1031642B1 (de) * 1999-02-26 2002-11-27 Agfa-Gevaert Schicht auf Basis eines leitfähigen Metalloxids
US6940565B2 (en) * 2000-08-26 2005-09-06 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and fabricating method thereof
US6743488B2 (en) 2001-05-09 2004-06-01 Cpfilms Inc. Transparent conductive stratiform coating of indium tin oxide
JP4857508B2 (ja) * 2001-09-21 2012-01-18 株式会社村田製作所 金属酸化物膜形成用塗布液
JP4932536B2 (ja) * 2007-02-28 2012-05-16 株式会社吉野工業所 定量繰り出し容器
CN101842423B (zh) * 2007-08-02 2014-01-22 杜邦帝人薄膜美国有限公司 涂覆的聚酯薄膜

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6903365A (de) * 1969-03-05 1970-09-08
US3676729A (en) * 1969-06-23 1972-07-11 Sylvania Electric Prod Arc discharge lamp having a thin continuous film of indium oxide on the inner surface thereof
US4069357A (en) * 1976-11-09 1978-01-17 The United States Of America As Represented By The United States Department Of Energy Process for diffusing metallic coatings into ceramics to improve their voltage withstanding capabilities
JPS54130497A (en) * 1978-03-31 1979-10-09 Agency Of Ind Science & Technol Production of indium oxide ( ) film
JPS54150417A (en) * 1978-05-19 1979-11-26 Hitachi Ltd Production of transparent conductive layer
JPS5923403B2 (ja) * 1978-06-16 1984-06-01 セイコーエプソン株式会社 透明導電膜の製造方法
US4325987A (en) * 1979-07-31 1982-04-20 Societa Italiana Vetro-Siv-S.P.A. Process for the production of an electrically conducting article
DE3133871A1 (de) * 1981-08-27 1983-03-10 M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München Verfahren zur herstellung homogener beschichtungen aus zwei oder mehreren metallen und/oder metallverbindungen
DE3266579D1 (en) * 1981-11-25 1985-10-31 Secr Defence Brit Organometallic adducts
DE3300589A1 (de) * 1983-01-11 1984-07-12 Schott Glaswerke, 6500 Mainz Verfahren zur herstellung von indiumoxid-zinnoxid-schichten
DE3324647A1 (de) * 1983-07-08 1985-01-17 Schott Glaswerke, 6500 Mainz Tauchverfahren zur herstellung transparenter, elektrisch leitfaehiger, dotierter indiumoxidschichten

Also Published As

Publication number Publication date
JP2718023B2 (ja) 1998-02-25
EP0261578B1 (de) 1991-04-17
KR880004132A (ko) 1988-06-01
KR910000408B1 (ko) 1991-01-25
EP0261578A1 (de) 1988-03-30
US4888210A (en) 1989-12-19
JPS6376212A (ja) 1988-04-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee