DE3175345D1 - Coating insulating materials by glow discharge - Google Patents
Coating insulating materials by glow dischargeInfo
- Publication number
- DE3175345D1 DE3175345D1 DE8181303327T DE3175345T DE3175345D1 DE 3175345 D1 DE3175345 D1 DE 3175345D1 DE 8181303327 T DE8181303327 T DE 8181303327T DE 3175345 T DE3175345 T DE 3175345T DE 3175345 D1 DE3175345 D1 DE 3175345D1
- Authority
- DE
- Germany
- Prior art keywords
- insulating materials
- glow discharge
- coating insulating
- coating
- glow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8027277 | 1980-08-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3175345D1 true DE3175345D1 (en) | 1986-10-23 |
Family
ID=10515600
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8181303327T Expired DE3175345D1 (en) | 1980-08-21 | 1981-07-21 | Coating insulating materials by glow discharge |
Country Status (4)
Country | Link |
---|---|
US (1) | US4400410A (de) |
EP (1) | EP0049032B1 (de) |
JP (1) | JPS5773176A (de) |
DE (1) | DE3175345D1 (de) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3047888A1 (de) * | 1980-12-19 | 1982-07-15 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "schneidwerkzeug, verfahren zu seiner herstellung und seine verwendung" |
FR2514743B1 (fr) * | 1981-10-21 | 1986-05-09 | Rca Corp | Pellicule amorphe a base de carbone, du type diamant, et son procede de fabrication |
JPS58117868A (ja) * | 1981-12-28 | 1983-07-13 | Toshiba Corp | 皮膜形成装置 |
JPS594433A (ja) * | 1982-06-30 | 1984-01-11 | Toshiba Corp | 薄膜形成装置 |
US4704339A (en) * | 1982-10-12 | 1987-11-03 | The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland | Infra-red transparent optical components |
JPS59207620A (ja) * | 1983-05-10 | 1984-11-24 | Zenko Hirose | アモルフアスシリコン成膜装置 |
US4512284A (en) * | 1983-12-19 | 1985-04-23 | Rca Corporation | Glow discharge apparatus for use in coating a disc-shaped substrate |
US4554208A (en) * | 1983-12-27 | 1985-11-19 | General Motors Corporation | Metal bearing surface having an adherent score-resistant coating |
GB2162207B (en) * | 1984-07-26 | 1989-05-10 | Japan Res Dev Corp | Semiconductor crystal growth apparatus |
US4663183A (en) * | 1984-09-10 | 1987-05-05 | Energy Conversion Devices, Inc. | Glow discharge method of applying a carbon coating onto a substrate |
DE3442208C3 (de) * | 1984-11-19 | 1998-06-10 | Leybold Ag | Verfahren und Vorrichtung zum Herstellen harter Kohlenstoffschichten |
DE3609503A1 (de) * | 1985-03-22 | 1986-10-02 | Canon K.K., Tokio/Tokyo | Heizwiderstandselement und heizwiderstand unter verwendung desselben |
US4783369A (en) * | 1985-03-23 | 1988-11-08 | Canon Kabushiki Kaisha | Heat-generating resistor and heat-generating resistance element using same |
DE3609691A1 (de) * | 1985-03-23 | 1986-10-02 | Canon K.K., Tokio/Tokyo | Thermischer schreibkopf |
US4845513A (en) * | 1985-03-23 | 1989-07-04 | Canon Kabushiki Kaisha | Thermal recording head |
GB2175252B (en) * | 1985-03-25 | 1990-09-19 | Canon Kk | Thermal recording head |
GB2176443B (en) * | 1985-06-10 | 1990-11-14 | Canon Kk | Liquid jet recording head and recording system incorporating the same |
US4626448A (en) * | 1985-07-18 | 1986-12-02 | The United States Of America As Represented By The United States Department Of Energy | Plasma deposition of amorphous metal alloys |
JPS62202899A (ja) * | 1986-03-03 | 1987-09-07 | Nippon Gakki Seizo Kk | 装飾品の製法 |
US4753414A (en) * | 1986-04-14 | 1988-06-28 | Balzers Optical Corporation | Carbon coatings in replicated optics art |
US4995684A (en) * | 1986-06-18 | 1991-02-26 | Raytheon Company | Impact resistant and tempered optical elements |
GB2192733B (en) * | 1986-06-18 | 1991-02-06 | Raytheon Co | Impact resistant and tempered optical elements |
US4907846A (en) * | 1987-11-20 | 1990-03-13 | Raytheon Company | Thick, impact resistant antireflection coatings for IR transparent optical elements |
JP2572438B2 (ja) * | 1989-01-30 | 1997-01-16 | ホーヤ株式会社 | ガラスプレス成形型の製造方法 |
US5183602A (en) * | 1989-09-18 | 1993-02-02 | Cornell Research Foundation, Inc. | Infra red diamond composites |
US5206083A (en) * | 1989-09-18 | 1993-04-27 | Cornell Research Foundation, Inc. | Diamond and diamond-like films and coatings prepared by deposition on substrate that contain a dispersion of diamond particles |
US5067781A (en) * | 1989-11-21 | 1991-11-26 | Raytheon Company | Optical elements and method of manufacture |
US5120602A (en) * | 1990-02-02 | 1992-06-09 | Raytheon Company | Optical elements and method of manufacture |
US5527596A (en) * | 1990-09-27 | 1996-06-18 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
US5268217A (en) * | 1990-09-27 | 1993-12-07 | Diamonex, Incorporated | Abrasion wear resistant coated substrate product |
US5637353A (en) * | 1990-09-27 | 1997-06-10 | Monsanto Company | Abrasion wear resistant coated substrate product |
JP2929779B2 (ja) * | 1991-02-15 | 1999-08-03 | トヨタ自動車株式会社 | 炭素被膜付撥水ガラス |
US5224441A (en) * | 1991-09-27 | 1993-07-06 | The Boc Group, Inc. | Apparatus for rapid plasma treatments and method |
US6171674B1 (en) * | 1993-07-20 | 2001-01-09 | Semiconductor Energy Laboratory Co., Ltd. | Hard carbon coating for magnetic recording medium |
US6835523B1 (en) | 1993-05-09 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Apparatus for fabricating coating and method of fabricating the coating |
US6113746A (en) * | 1996-11-27 | 2000-09-05 | University Of Florida | Methods for altering the magnetic properties of materials and the materials produced by these methods |
US6071597A (en) * | 1997-08-28 | 2000-06-06 | 3M Innovative Properties Company | Flexible circuits and carriers and process for manufacture |
US6277480B1 (en) | 1999-05-03 | 2001-08-21 | Guardian Industries Corporation | Coated article including a DLC inclusive layer(s) and a layer(s) deposited using siloxane gas, and corresponding method |
US6447891B1 (en) | 1999-05-03 | 2002-09-10 | Guardian Industries Corp. | Low-E coating system including protective DLC |
US6261693B1 (en) * | 1999-05-03 | 2001-07-17 | Guardian Industries Corporation | Highly tetrahedral amorphous carbon coating on glass |
US6312808B1 (en) | 1999-05-03 | 2001-11-06 | Guardian Industries Corporation | Hydrophobic coating with DLC & FAS on substrate |
US6280834B1 (en) | 1999-05-03 | 2001-08-28 | Guardian Industries Corporation | Hydrophobic coating including DLC and/or FAS on substrate |
US6461731B1 (en) | 1999-05-03 | 2002-10-08 | Guardian Industries Corp. | Solar management coating system including protective DLC |
US6475573B1 (en) | 1999-05-03 | 2002-11-05 | Guardian Industries Corp. | Method of depositing DLC inclusive coating on substrate |
US6368664B1 (en) | 1999-05-03 | 2002-04-09 | Guardian Industries Corp. | Method of ion beam milling substrate prior to depositing diamond like carbon layer thereon |
US6335086B1 (en) | 1999-05-03 | 2002-01-01 | Guardian Industries Corporation | Hydrophobic coating including DLC on substrate |
US6316734B1 (en) | 2000-03-07 | 2001-11-13 | 3M Innovative Properties Company | Flexible circuits with static discharge protection and process for manufacture |
US6815620B2 (en) * | 2001-03-29 | 2004-11-09 | 3M Innovative Properties Company | Flexible circuit with electrostatic damage limiting feature |
US6459043B1 (en) | 2001-03-29 | 2002-10-01 | 3M Innovative Properties Company | Flexible circuit with electrostatic damage limiting feature and method of manufacture |
US6995954B1 (en) | 2001-07-13 | 2006-02-07 | Magnecomp Corporation | ESD protected suspension interconnect |
US7489493B2 (en) * | 2003-12-01 | 2009-02-10 | Magnecomp Corporation | Method to form electrostatic discharge protection on flexible circuits using a diamond-like carbon material |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3473959A (en) * | 1964-08-10 | 1969-10-21 | Licentia Gmbh | Method for coating semiconductors and apparatus |
FR1582129A (de) * | 1968-06-18 | 1969-09-26 | ||
JPS5132501B2 (de) * | 1972-05-01 | 1976-09-13 | ||
JPS5123477A (ja) * | 1974-07-25 | 1976-02-25 | Kawasaki Heavy Ind Ltd | Haienchunochitsusosankabutsunokyushuhohonarabini kyushusochi |
US4060660A (en) * | 1976-01-15 | 1977-11-29 | Rca Corporation | Deposition of transparent amorphous carbon films |
US4142004A (en) * | 1976-01-22 | 1979-02-27 | Bell Telephone Laboratories, Incorporated | Method of coating semiconductor substrates |
GB1582231A (en) * | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
FR2371524A1 (fr) * | 1976-11-18 | 1978-06-16 | Alsthom Atlantique | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma |
US4140814A (en) * | 1977-12-01 | 1979-02-20 | Texas Instruments Incorporated | Plasma deposition of transparent conductive layers |
DE3167761D1 (en) * | 1980-01-16 | 1985-01-31 | Nat Res Dev | Method and apparatus for depositing coatings in a glow discharge |
-
1981
- 1981-07-21 DE DE8181303327T patent/DE3175345D1/de not_active Expired
- 1981-07-21 EP EP81303327A patent/EP0049032B1/de not_active Expired
- 1981-08-14 US US06/292,432 patent/US4400410A/en not_active Expired - Lifetime
- 1981-08-21 JP JP56130354A patent/JPS5773176A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
US4400410A (en) | 1983-08-23 |
JPH0254429B2 (de) | 1990-11-21 |
EP0049032B1 (de) | 1986-09-17 |
JPS5773176A (en) | 1982-05-07 |
EP0049032A1 (de) | 1982-04-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8365 | Fully valid after opposition proceedings |