DE1543208A1 - Verfahren zur Herstellung von 1,3,2,4-Diazadisiletidinen - Google Patents

Verfahren zur Herstellung von 1,3,2,4-Diazadisiletidinen

Info

Publication number: DE1543208A1
Authority: DE; Germany
Prior art keywords: diazadisiletidine; radicals; general formula; tetramethyl; alkali metal
Prior art date: 1962-03-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

DE19651543208

Other languages

German (de)

English (en)

Inventor

Fink Dr Walter

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Monsanto Co

Original Assignee

Monsanto Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1962-03-30

Filing date

1965-06-21

Publication date

1969-06-12

1962-03-30 Priority claimed from CH384062A external-priority patent/CH407114A/de

1963-03-15 Priority claimed from CH327563A external-priority patent/CH460000A/de

1965-06-21 Application filed by Monsanto Co filed Critical Monsanto Co

1969-06-12 Publication of DE1543208A1 publication Critical patent/DE1543208A1/de

Status Pending legal-status Critical Current

Links

IVSQMSIRHKTHCB-UHFFFAOYSA-N 1,3,2,4-diazadisiletidine Chemical class N1[SiH2]N[SiH2]1 IVSQMSIRHKTHCB-UHFFFAOYSA-N 0.000 title claims description 14
238000000034 method Methods 0.000 title claims description 13
238000002360 preparation method Methods 0.000 title claims description 4
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 9
229910052710 silicon Inorganic materials 0.000 claims description 8
239000000203 mixture Substances 0.000 claims description 7
229930195733 hydrocarbon Natural products 0.000 claims description 6
239000004215 Carbon black (E152) Substances 0.000 claims description 5
125000004432 carbon atom Chemical group C* 0.000 claims description 5
UWVNGBSSPBXJQN-UHFFFAOYSA-N diazadisiletidine Chemical group N1N[SiH2][SiH2]1 UWVNGBSSPBXJQN-UHFFFAOYSA-N 0.000 claims description 5
125000004430 oxygen atom Chemical group O* 0.000 claims description 5
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 4
229910052783 alkali metal Inorganic materials 0.000 claims description 4
229910000102 alkali metal hydride Inorganic materials 0.000 claims description 4
150000008046 alkali metal hydrides Chemical class 0.000 claims description 4
150000001340 alkali metals Chemical class 0.000 claims description 4
150000001412 amines Chemical class 0.000 claims description 4
230000003197 catalytic effect Effects 0.000 claims description 4
229910000077 silane Inorganic materials 0.000 claims description 4
125000005504 styryl group Chemical group 0.000 claims description 4
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
229920002554 vinyl polymer Polymers 0.000 claims description 4
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical group CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
150000001875 compounds Chemical class 0.000 claims description 3
125000004185 ester group Chemical group 0.000 claims description 3
239000012442 inert solvent Substances 0.000 claims description 3
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
125000002743 phosphorus functional group Chemical group 0.000 claims description 3
239000010703 silicon Substances 0.000 claims description 3
229910000573 alkali metal alloy Inorganic materials 0.000 claims description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
229910052796 boron Inorganic materials 0.000 claims description 2
125000004093 cyano group Chemical group *C#N 0.000 claims description 2
229910052760 oxygen Inorganic materials 0.000 claims description 2
239000001301 oxygen Substances 0.000 claims description 2
230000007717 exclusion Effects 0.000 claims 1
238000006243 chemical reaction Methods 0.000 description 28
-1 hydrocarbon radicals Chemical class 0.000 description 16
229910052739 hydrogen Inorganic materials 0.000 description 15
239000001257 hydrogen Substances 0.000 description 15
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
150000004678 hydrides Chemical class 0.000 description 7
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 6
229910052799 carbon Inorganic materials 0.000 description 6
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 6
239000003054 catalyst Substances 0.000 description 5
DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 4
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 4
150000002431 hydrogen Chemical class 0.000 description 4
229910052700 potassium Inorganic materials 0.000 description 4
239000011591 potassium Substances 0.000 description 4
239000002904 solvent Substances 0.000 description 4
WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
239000007795 chemical reaction product Substances 0.000 description 3
VDCSGNNYCFPWFK-UHFFFAOYSA-N diphenylsilane Chemical compound C=1C=CC=CC=1[SiH2]C1=CC=CC=C1 VDCSGNNYCFPWFK-UHFFFAOYSA-N 0.000 description 3
229910052744 lithium Inorganic materials 0.000 description 3
229910000103 lithium hydride Inorganic materials 0.000 description 3
125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
239000004305 biphenyl Substances 0.000 description 2
238000001816 cooling Methods 0.000 description 2
238000000354 decomposition reaction Methods 0.000 description 2
238000006356 dehydrogenation reaction Methods 0.000 description 2
230000008030 elimination Effects 0.000 description 2
238000003379 elimination reaction Methods 0.000 description 2
125000001033 ether group Chemical group 0.000 description 2
229910052736 halogen Inorganic materials 0.000 description 2
125000005843 halogen group Chemical group 0.000 description 2
238000005984 hydrogenation reaction Methods 0.000 description 2
239000007788 liquid Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
229910052757 nitrogen Inorganic materials 0.000 description 2
239000000047 product Substances 0.000 description 2
150000003254 radicals Chemical class 0.000 description 2
239000011734 sodium Substances 0.000 description 2
HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
125000001302 tertiary amino group Chemical group 0.000 description 2
GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
229910010082 LiAlH Inorganic materials 0.000 description 1
229910014299 N-Si Inorganic materials 0.000 description 1
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
125000001931 aliphatic group Chemical group 0.000 description 1
150000008378 aryl ethers Chemical class 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
238000009835 boiling Methods 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
239000007809 chemical reaction catalyst Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
229910017052 cobalt Inorganic materials 0.000 description 1
239000010941 cobalt Substances 0.000 description 1
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
150000004292 cyclic ethers Chemical class 0.000 description 1
230000007423 decrease Effects 0.000 description 1
238000004821 distillation Methods 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000004508 fractional distillation Methods 0.000 description 1
125000000524 functional group Chemical group 0.000 description 1
125000000623 heterocyclic group Chemical group 0.000 description 1
150000002430 hydrocarbons Chemical class 0.000 description 1
239000012433 hydrogen halide Substances 0.000 description 1
229910000039 hydrogen halide Inorganic materials 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
239000000155 melt Substances 0.000 description 1
IBYYZDHAJZICKQ-UHFFFAOYSA-N n-[dichloro(dimethylamino)silyl]-n-methylmethanamine Chemical compound CN(C)[Si](Cl)(Cl)N(C)C IBYYZDHAJZICKQ-UHFFFAOYSA-N 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
239000003208 petroleum Substances 0.000 description 1
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
229910000105 potassium hydride Inorganic materials 0.000 description 1
125000002924 primary amino group Chemical class [H]N([H])* 0.000 description 1
238000000746 purification Methods 0.000 description 1
239000000376 reactant Substances 0.000 description 1
230000035484 reaction time Effects 0.000 description 1
238000001953 recrystallisation Methods 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
238000007086 side reaction Methods 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000007858 starting material Substances 0.000 description 1
239000000725 suspension Substances 0.000 description 1
150000003512 tertiary amines Chemical class 0.000 description 1
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
239000008096 xylene Substances 0.000 description 1

Classifications

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- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/44—Amides thereof
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6571—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and oxygen atoms as the only ring hetero atoms
- C07F9/657154—Cyclic esteramides of oxyacids of phosphorus
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- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6564—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms
- C07F9/6581—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms
- C07F9/6587—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having phosphorus atoms, with or without nitrogen, oxygen, sulfur, selenium or tellurium atoms, as ring hetero atoms having phosphorus and nitrogen atoms with or without oxygen or sulfur atoms, as ring hetero atoms having two phosphorus atoms as ring hetero atoms in the same ring
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- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6596—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having atoms other than oxygen, sulfur, selenium, tellurium, nitrogen or phosphorus as ring hetero atoms
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- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
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- C10M105/00—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
- C10M105/76—Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing silicon
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F1/00—Shielding characterised by the composition of the materials
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- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
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- C10M2223/04—Phosphate esters
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- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/02—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having no phosphorus-to-carbon bonds
- C10M2223/04—Phosphate esters
- C10M2223/042—Metal salts thereof
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- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/02—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having no phosphorus-to-carbon bonds
- C10M2223/04—Phosphate esters
- C10M2223/047—Thioderivatives not containing metallic elements
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- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
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DE19651543208 1962-03-30 1965-06-21 Verfahren zur Herstellung von 1,3,2,4-Diazadisiletidinen Pending DE1543208A1 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
CH384062A CH407114A (de)	1962-03-30	1962-03-30	Verfahren zur Herstellung heterocyclischer Viererringverbindungen
CH327563A CH460000A (de)	1963-03-15	1963-03-15	Verfahren zur Herstellung von hochtemperaturbeständigen Cyclodisilazanen
CH815164		1964-06-22
CH1643364		1964-12-18

Publications (1)

Publication Number	Publication Date
DE1543208A1 true DE1543208A1 (de)	1969-06-12

Family

ID=27428603

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE19651543208 Pending DE1543208A1 (de)	1962-03-30	1965-06-21	Verfahren zur Herstellung von 1,3,2,4-Diazadisiletidinen

Country Status (4)

Country	Link
BE (1)	BE665774A (fr)
DE (1)	DE1543208A1 (fr)
FR (1)	FR88274E (fr)
GB (1)	GB1121481A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US11035039B2 (en) *	2015-07-31	2021-06-15	Versum Materials Us, Llc	Compositions and methods for depositing silicon nitride films

1965
- 1965-06-21 FR FR21623A patent/FR88274E/fr not_active Expired
- 1965-06-21 DE DE19651543208 patent/DE1543208A1/de active Pending
- 1965-06-22 GB GB26464/65A patent/GB1121481A/en not_active Expired
- 1965-06-22 BE BE665774A patent/BE665774A/xx unknown

Also Published As

Publication number	Publication date
FR88274E (fr)	1967-01-06
GB1121481A (en)	1968-07-31
BE665774A (fr)	1965-10-18

Publication	Publication Date	Title
DE4239246C1 (de)	1993-12-16	Verfahren zur Herstellung von SiH-Gruppen aufweisenden Organopolysiloxanen
DE1232580B (de)	1967-01-19	Verfahren zur Herstellung von Vinylhalogensilanen
DE495533C (de)	1930-04-10	Verfahren zur Herstellung von Alkylverbindungen des Bleis
DE1206899B (de)	1965-12-16	Verfahren zur Herstellung von siliciumhaltigen N, N', N"-Triorgano-B, B', B"-trihydrido-borazolen
DE1289842B (de)	1969-02-27	Verfahren zur Spaltung von Disilanen
DE1768084C3 (de)	1974-04-11	Platinkomplexe, Verfahren zu, ihrer Herstellung und ihre Verwendung
DE1242614B (de)	1967-06-22	Verfahren zur Herstellung von Alkylhalogensilangemischen
DE1543208A1 (de)	1969-06-12	Verfahren zur Herstellung von 1,3,2,4-Diazadisiletidinen
DE1158071B (de)	1963-11-28	Verfahren zur Herstellung von ª†-Aminoisobutylgruppen enthaltenden siliciumorganischen Verbindungen
DE1061302B (de)	1959-07-16	Verfahren zur Herstellung von Wasserstoffverbindungen der Elemente der IV. und V. Gruppe des Periodischen Systems
DE2814750C2 (de)	1984-10-18	Verfahren zu Herstellung von disubstituierten Dichlorsilanen
DE1156809B (de)	1963-11-07	Verfahren zur Herstellung von Cyanalkylfluorsilanen
DE1154477B (de)	1963-09-19	Verfahren zur Herstellung von Nitro- oder Nitritogruppen enthaltenden Silanen
DE1218453B (de)	1966-06-08	Verfahren zur Herstellung von 5, 5'-Dialkyl-10, 10'-spiro-bis-phenazaverbindungen
DE877306C (de)	1953-05-21	Verfahren zur Herstellung von siliciumorganischen Verbindungen
DE2120002C (de)	1973-04-05	Verfahren zur Herstellung von beta Isothiuroniumsalzen
DE1266301B (de)	1968-04-18	Verfahren zur Herstellung von Alkylhalogensilanen
DE2039435A1 (de)	1971-02-18	Verfahren zur Herstellung von Organosiliciumverbindungen mit Silylphenylgruppen
DE1060397B (de)	1959-07-02	Verfahren zur Herstellung von metallorganischen Verbindungen des Nickels
DE1046619B (de)	1958-12-18	Verfahren zur Herstellung von Arylchlorsilanen
DE1034159B (de)	1958-07-17	Verfahren zur Herstellung von Siliciumhydriden
DE1156807B (de)	1963-11-07	Verfahren zur Herstellung von cyclischen Zinnalkylenverbindungen
DE1088051B (de)	1960-09-01	Verfahren zur Herstellung von Alkylhalogensilanen
DE2238013C3 (de)	1978-05-11	Weitere Ausbildung des Verfahrens zur Herstellung von Arylchlorsilanen
DE570594C (de)	1933-03-15	Verfahren zum Alkylieren von Saeurenitrilen