DE102005030839A1 - Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven - Google Patents

Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven Download PDF

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Publication number
DE102005030839A1
DE102005030839A1 DE102005030839A DE102005030839A DE102005030839A1 DE 102005030839 A1 DE102005030839 A1 DE 102005030839A1 DE 102005030839 A DE102005030839 A DE 102005030839A DE 102005030839 A DE102005030839 A DE 102005030839A DE 102005030839 A1 DE102005030839 A1 DE 102005030839A1
Authority
DE
Germany
Prior art keywords
projection
exposure apparatus
subsystem
projection exposure
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102005030839A
Other languages
German (de)
English (en)
Inventor
Aurelian Dr. Dodoc
Wilhelm Ulrich
Heiko Dr. Feldmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102005030839A priority Critical patent/DE102005030839A1/de
Priority to PCT/EP2006/063663 priority patent/WO2007003563A1/de
Priority to KR1020127008773A priority patent/KR101407797B1/ko
Priority to JP2008518844A priority patent/JP6116788B2/ja
Priority to KR20077030366A priority patent/KR101478832B1/ko
Publication of DE102005030839A1 publication Critical patent/DE102005030839A1/de
Priority to JP2012094123A priority patent/JP6063637B2/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102005030839A 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven Withdrawn DE102005030839A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
PCT/EP2006/063663 WO2007003563A1 (de) 2005-07-01 2006-06-28 Projektionsbelichtungsanlage mit einer mehrzahl von projektionsobjektiven
KR1020127008773A KR101407797B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치
JP2008518844A JP6116788B2 (ja) 2005-07-01 2006-06-28 複数の投影対物レンズを備えた投影露光装置
KR20077030366A KR101478832B1 (ko) 2005-07-01 2006-06-28 다수의 투영 렌즈를 구비한 투영 조명 장치
JP2012094123A JP6063637B2 (ja) 2005-07-01 2012-04-17 複数の投影対物レンズを備えた投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005030839A DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven

Publications (1)

Publication Number Publication Date
DE102005030839A1 true DE102005030839A1 (de) 2007-01-11

Family

ID=36955990

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102005030839A Withdrawn DE102005030839A1 (de) 2005-07-01 2005-07-01 Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven

Country Status (4)

Country Link
JP (2) JP6116788B2 (ko)
KR (2) KR101478832B1 (ko)
DE (1) DE102005030839A1 (ko)
WO (1) WO2007003563A1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI573175B (zh) 2003-10-28 2017-03-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TW201809727A (zh) 2004-02-06 2018-03-16 日商尼康股份有限公司 偏光變換元件
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US8130364B2 (en) 2007-01-04 2012-03-06 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US20080165333A1 (en) * 2007-01-04 2008-07-10 Nikon Corporation Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学***、曝光装置以及元件制造方法
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5048869B2 (ja) 2008-05-20 2012-10-17 ホ チョン，ジン マスクレス露光装置用光学部品
KR100952158B1 (ko) * 2008-05-20 2010-04-09 진 호 정 마스크 리스 노광장치용 마이크로프리즘 어레이
KR101695034B1 (ko) 2008-05-28 2017-01-10 가부시키가이샤 니콘 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN107247388B (zh) * 2012-12-18 2018-09-18 株式会社尼康 曝光装置、器件制造***及器件制造方法
JP7018333B2 (ja) 2018-03-08 2022-02-10 大林道路株式会社 複装式カッター

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL194844C (nl) * 1991-02-08 2003-04-03 Zeiss Carl Fa Catadioptrisch reductie-objectief.
JP3316710B2 (ja) * 1993-12-22 2002-08-19 株式会社ニコン 露光装置
JP3348467B2 (ja) * 1993-06-30 2002-11-20 株式会社ニコン 露光装置及び方法
JPH088169A (ja) * 1994-06-23 1996-01-12 Nikon Corp 露光装置
US5617211A (en) * 1994-08-16 1997-04-01 Nikon Corporation Exposure apparatus
JPH1064807A (ja) * 1996-08-19 1998-03-06 Nikon Corp 縮小投影走査型露光装置
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
JP2001154368A (ja) * 1999-11-29 2001-06-08 Nikon Corp 露光装置及び露光方法
JP4505666B2 (ja) * 2000-04-19 2010-07-21 株式会社ニコン 露光装置、照明装置及びマイクロデバイスの製造方法
JP2002055059A (ja) * 2000-08-10 2002-02-20 Nikon Corp 異物検査装置、露光装置、及び露光方法
JP2001201688A (ja) * 2000-12-05 2001-07-27 Nikon Corp 露光装置及び方法並びに照明装置及び方法
EP1451619A4 (en) * 2001-10-30 2007-10-03 Asml Netherlands Bv STRUCTURES AND METHOD FOR REDUCING BERRATION IN OPTICAL SYSTEMS
EP1456705A2 (de) * 2001-12-10 2004-09-15 Carl Zeiss SMT AG Katadioptrisches reduktionsobjektiv
JP4322564B2 (ja) * 2003-06-10 2009-09-02 富士フイルム株式会社 画素位置特定方法、画像ずれ補正方法、および画像形成装置
JP4874529B2 (ja) * 2003-07-03 2012-02-15 富士フイルム株式会社 画像形成装置
JP2006047670A (ja) * 2004-08-04 2006-02-16 Nikon Corp 露光装置および露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007051669A1 (de) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage
US8558991B2 (en) 2007-10-26 2013-10-15 Carl Zeiss Smt Gmbh Imaging optical system and related installation and method

Also Published As

Publication number Publication date
JP6063637B2 (ja) 2017-01-18
JP2012168550A (ja) 2012-09-06
JP6116788B2 (ja) 2017-04-19
KR101407797B1 (ko) 2014-06-17
KR20080022125A (ko) 2008-03-10
WO2007003563A1 (de) 2007-01-11
KR101478832B1 (ko) 2015-01-02
JP2008545153A (ja) 2008-12-11
KR20120040755A (ko) 2012-04-27

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE

R005 Application deemed withdrawn due to failure to request examination

Effective date: 20120703