DE10006905A1 - Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laser - Google Patents
Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laserInfo
- Publication number
- DE10006905A1 DE10006905A1 DE10006905A DE10006905A DE10006905A1 DE 10006905 A1 DE10006905 A1 DE 10006905A1 DE 10006905 A DE10006905 A DE 10006905A DE 10006905 A DE10006905 A DE 10006905A DE 10006905 A1 DE10006905 A1 DE 10006905A1
- Authority
- DE
- Germany
- Prior art keywords
- structured
- structuring
- optical
- pulsed laser
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/34—Laser welding for purposes other than joining
Abstract
Description
Die vorliegende Erfindung betrifft eine Vorrichtung entsprechend dem Oberbegriff des Anspruchs 1.The present invention relates to a device according to the preamble of Claim 1.
In den letzten Jahren hat sich Laserlicht in vielfältigen Anwendungen etabliert. So wird es z. B. zum Bohren, Schneiden, Schweißen und Reinigen von Oberflächen eingesetzt. Eine weitere Anwendung betrifft die Strukturierung von Oberflächen. Dabei ergibt sich aber eine Schwierigkeit: Will man eine Oberfläche mit Hilfe von Licht strukturieren, so ist aufgrund der Welleneigenschaften des Lichts dieser Strukturierung eine natürliche untere Grenze gesetzt, die von den Beugungsbedingungen gegeben wird. Diese Grenze liegt bei etwa der halben Wellenlänge des verwendeten Lichtes und damit für sichtbares Licht bei ca. 250 nm.Laser light has established itself in a wide variety of applications in recent years. It will be like this e.g. B. used for drilling, cutting, welding and cleaning surfaces. A Another application concerns the structuring of surfaces. But there is one Difficulty: If you want to structure a surface with the help of light, it is because of the Wave properties of light this structuring set a natural lower limit, which is given by the diffraction conditions. This limit is about half Wavelength of the light used and therefore for visible light at approx. 250 nm.
Will man kleinere Strukturen mit Laserlicht erzeugen, so muss man sich verschiedener zusätzlicher Techniken bedienen. Beispielsweise kann man nichtlineare Prozesse zur Strukturierung verwenden, wie etwa chemische Reaktionen, deren Rate exponentiell mit der Temperatur steigt, oder man verwendet nichtlineare optische Prozesse. Ist die Intensitätsverteilung des Lasers durch ein Gaußprofil gegeben so können mit Hilfe der nichtlinearen Effekte dann auch kleinere Strukturen erzeugt werden. Derartige Prozesse werden beispielsweise in der Fotolithographie eingesetzt. Nachteil dieser Methoden ist, dass man für jedes neue Material erst wieder geeignete Prozesse entwickeln muss.If you want to create smaller structures with laser light, you have to be different use additional techniques. For example, one can use nonlinear processes for Use structuring, such as chemical reactions, the rate of which increases exponentially with the Temperature rises or non-linear optical processes are used. Is the Intensity distribution of the laser given by a Gaussian profile, so with the help of non-linear effects then smaller structures can be generated. Such processes are used for example in photolithography. The disadvantage of these methods is that you have to develop suitable processes for each new material.
Ein anderer Ansatz ist das optische Nahfeldmikroskop, bei dem die oben genannte Beugungsbedingung umgangen wird, indem man eine optische Faser zu einer dünnen Spitze auszieht. Diese wird dann mit einem Metallfilm so beschichtet, dass eine kleine Öffnung an der Spitze verbleibt, durch die das Licht austreten kann. Es konnte gezeigt werden, dass man solche Öffnungen mit Durchmessern unter 50 nm erzeugen kann. Bringt man diese Lichtquelle genügend nahe an eine Oberfläche, so kann man damit sehr kleine Strukturen (< 50 nm) erzeugen. Allerdings hat man sich dabei den Nachteil eines seriellen Prozesses eingehandelt. Die Spitze muss nach jedem Strukturierungsprozess zur einer neuen Stelle bewegt werden, woraus sich aus Zeitgründen Beschränkungen auf sehr kleine Flächen ergeben.Another approach is the near-field optical microscope, in which the above Diffraction condition is bypassed by making an optical fiber a thin tip takes off. This is then coated with a metal film so that there is a small opening the tip remains through which the light can exit. It could be shown that one can produce such openings with diameters below 50 nm. Bring this light source sufficiently close to a surface so that very small structures (<50 nm) can be produce. However, the disadvantage of a serial process has been accepted. The tip has to be moved to a new position after each structuring process, which results in restrictions on very small areas due to time constraints.
Aufgabe der Erfindung ist es, ein optisches Verfahren zu schaffen, mit dem Oberflächen aus beliebigem Material parallel strukturiert werden können, wobei die erzeugten Strukturen unterhalb der Beugungsbeschränkung liegen, ohne dass zusätzliche Prozessschritte notwendig sind.The object of the invention is to provide an optical method with which surfaces any material can be structured in parallel, the structures created are below the diffraction limit without additional process steps being necessary are.
Diese Aufgabe wird durch eine Vorrichtung mit den Merkmalen des Anspruchs 1 erfüllt.This object is achieved by a device with the features of claim 1.
- - Das Verfahren ermöglicht es, Oberflächen aus beliebigen Materialien zu strukturieren.- The process makes it possible to structure surfaces from any material.
- - Es handelt sich um eine parallele Strukturierung.- It is a parallel structuring.
- - Die Strukturierung benötigt keine weiteren Zwischenschritte.- The structuring does not require any further intermediate steps.
- - Es ist möglich Strukturen deutlich unterhalb der Beugungsgrenze von Licht zu erzeugen.- It is possible to create structures well below the diffraction limit of light.
- - Die Größe der erzeugten Struktur ist leicht variierbar.- The size of the structure created can be varied slightly.
Die Erfindung beruht auf dem Aufbringen submikroskopisch kleiner Partikel auf die zu strukturierende Oberfläche. Je nach Anwendungsfall können dabei Partikel verschiedener oder identischer Größe, wie auch Partikel aus verschiedenen Materialien verwendet werden. Auch die Anordnung der Partikel auf der Oberfläche kann je nach Anwendungsfall von vereinzelten Partikeln bis hin zu einer vollständigen Partikelschicht verändert werden.The invention is based on the application of submicroscopic particles to the structuring surface. Depending on the application, particles can be different or of identical size, as particles from different materials are used. Depending on the application, the arrangement of the particles on the surface can also vary from individual particles can be changed up to a complete particle layer.
Nach dem Aufbringen der Partikel wird die Oberfläche mit einem intensiven Laserpuls bestrahlt. Das optische Feld wird durch die Anwesenheit der Partikel verändert. Bei geeigneten Bedingungen von Laserintensität, Polarisation, Pulslänge, Einstrahlwinkel, Partikelmaterial, Abstand der Partikel zur Oberflächen, Umgebungsmedium und Laserwellenlänge lässt es sich erreichen, dass das optische Feld unter den Partikeln gegenüber der Umgebung verstärkt wird, so dass sich die Oberfläche unter jedem Partikel strukturieren lässt. Da der Partikeldurchmesser kleiner als die Wellenlänge sein kann, werden auch Strukturen unterhalb der Beugungsbeschränkung zugänglich.After applying the particles, the surface is coated with an intense laser pulse irradiated. The presence of the particles changes the optical field. At suitable conditions of laser intensity, polarization, pulse length, angle of incidence, Particle material, distance of the particles to the surfaces, surrounding medium and Laser wavelength can be achieved to oppose the optical field among the particles the environment, so that the surface is structured under each particle leaves. Since the particle diameter can be smaller than the wavelength, too Structures below the diffraction limit are accessible.
Claims (13)
Aufbringen submikroskopischer Partikel (d < 1 Mikrometer) auf die Oberfläche und anschließende Pulslaserbestrahlung.1. Method for the optical nanostructuring of surfaces, characterized by the following steps:
Application of submicroscopic particles (d <1 micrometer) to the surface and subsequent pulsed laser radiation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10006905A DE10006905A1 (en) | 2000-02-16 | 2000-02-16 | Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10006905A DE10006905A1 (en) | 2000-02-16 | 2000-02-16 | Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laser |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10006905A1 true DE10006905A1 (en) | 2001-09-06 |
Family
ID=7631101
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10006905A Ceased DE10006905A1 (en) | 2000-02-16 | 2000-02-16 | Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laser |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE10006905A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007064237A1 (en) * | 2005-11-29 | 2007-06-07 | Sergei Nikolaevich Maximovsky | Method for forming nano-dimensional clusters and setting ordered structures therefrom |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3742770A1 (en) * | 1987-12-17 | 1989-06-29 | Akzo Gmbh | MICRO / ULTRAFILTRATION MEMBRANES WITH DEFINED PORO SIZE BY IRRADIATION WITH PULSE LASERS AND METHOD FOR THE PRODUCTION THEREOF |
EP0731490A2 (en) * | 1995-03-02 | 1996-09-11 | Ebara Corporation | Ultra-fine microfabrication method using an energy beam |
DE19544295A1 (en) * | 1995-11-28 | 1997-06-05 | Zeiss Carl Jena Gmbh | Production of structures within a submicron range e.g. grating |
-
2000
- 2000-02-16 DE DE10006905A patent/DE10006905A1/en not_active Ceased
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3742770A1 (en) * | 1987-12-17 | 1989-06-29 | Akzo Gmbh | MICRO / ULTRAFILTRATION MEMBRANES WITH DEFINED PORO SIZE BY IRRADIATION WITH PULSE LASERS AND METHOD FOR THE PRODUCTION THEREOF |
EP0731490A2 (en) * | 1995-03-02 | 1996-09-11 | Ebara Corporation | Ultra-fine microfabrication method using an energy beam |
DE19544295A1 (en) * | 1995-11-28 | 1997-06-05 | Zeiss Carl Jena Gmbh | Production of structures within a submicron range e.g. grating |
Non-Patent Citations (2)
Title |
---|
BONEBERG,J., et.al.: The mechanism of nanostructuring upon nanosecond laser irradiation of a STM tip. In: Appl. Phys. A, 1998, Vol. 67, S. 381-384 * |
JERSCH,J., et.al.: Nano-material processing with laser radiation in the near field of a scanning probe tip. In: Optics & Laser, Vol. 29, No. 8, 1997, S. 433-437 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007064237A1 (en) * | 2005-11-29 | 2007-06-07 | Sergei Nikolaevich Maximovsky | Method for forming nano-dimensional clusters and setting ordered structures therefrom |
US8206505B2 (en) | 2005-11-29 | 2012-06-26 | Sergei Nikolaevich Maximovsky | Method for forming nano-dimensional clusters and setting ordered structures therefrom |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1871566B1 (en) | Method for finely polishing/structuring thermosensitive dielectric materials by a laser beam | |
EP2144728B1 (en) | Method for incorporating a structure into a surface of a transparent workpiece | |
DE19912879C2 (en) | Process for removing a transparent solid with laser beams | |
DE10122335C1 (en) | Process for marking glass comprises selecting the marking position along a drawing process having a glass transition temperature above the transformation temperature | |
EP1646474A1 (en) | Method for processing materials with laser pulses having a large spectral bandwidth and device for carrying out said method | |
EP1878707A1 (en) | Method of formation of observable laser induced cracks in brittle material | |
EP0743128B1 (en) | Process and device for marking products of transparent (solid) material with a laser | |
DE19736110C2 (en) | Method and device for burr and melt-free micromachining of workpieces | |
EP1042944A1 (en) | Method and device for measuring, calibrating and using laser tweezers | |
DE4118457A1 (en) | METHOD FOR STORING INFORMATION IN AN OPTICALLY READABLE DATA STORAGE | |
DE2523982C3 (en) | Process and device for maskless vapor deposition, as well as use of the process | |
DE2421833A1 (en) | METHOD OF TREATING A LAYER ON A SUBSTRATE | |
DE10006905A1 (en) | Optical nano-structuring of surfaces such as semiconductor substrate or data carrier, by applying sub-microscopic particles and irradiating with pulsed laser | |
DE10250015B3 (en) | Adaptive, feedback-controlled material processing with ultra-short laser pulses | |
EP1480066B1 (en) | Microscope slide with marking region | |
DE10234002A1 (en) | Product made from glass or transparent glassy material used in the production of glass containers comprises a surface having a local deformation for a lens | |
DE10162111A1 (en) | Marking of components by use of a pulsed high-energy laser beam to change the complex refractive index in a surface layer of the component, so that its reflective or absorptive properties are changed and appear as a marking | |
EP3789157B1 (en) | Method for treating the surface of a solid object | |
DE102021123801A1 (en) | Method and device for laser machining a workpiece | |
WO2004005982A2 (en) | Microstructuring of an optical waveguides for producing functional optical elements | |
DE102008048342B4 (en) | SERS substrate, method for its preparation and method for detecting an analyte using SERS | |
DE19823257A1 (en) | Method of definite permanent changing of the extinction spectrum of dielectric-containing metal particles using intensive laser pulses | |
DE102019201781A1 (en) | Method and device for processing particles | |
DE4406768A1 (en) | Optical spectroscopic method for identification of esp. ruby | |
DE19711049C1 (en) | Method of manufacturing spatial microstructures in transparent materials by laser radiation e.g. for 3-D optical data storage |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
8122 | Nonbinding interest in granting licenses declared | ||
8131 | Rejection |