DD275749A5 - Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen Farbstoff und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial - Google Patents

Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen Farbstoff und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial Download PDF

Info

Publication number: DD275749A5
Authority: DD; German Democratic Republic
Prior art keywords: photosensitive; positive; dye; compounds; working photosensitive
Prior art date: 1987-10-23

Application number

DD32098688A

Other languages

German (de)

English (en)

Inventor

Hans-Joachim Merrem

Gerhard Buhr

Ruediger Lenz

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-10-23

Filing date

1988-10-21

Publication date

1990-01-31

1988-10-21 Application filed by Hoechst Ag filed Critical Hoechst Ag

1990-01-31 Publication of DD275749A5 publication Critical patent/DD275749A5/de

Links

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206010034972 Photosensitivity reaction Diseases 0.000 abstract description 11
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238000007598 dipping method Methods 0.000 description 1
238000009826 distribution Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
150000002084 enol ethers Chemical class 0.000 description 1
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
229920001249 ethyl cellulose Polymers 0.000 description 1
235000019325 ethyl cellulose Nutrition 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
239000011888 foil Substances 0.000 description 1
239000011521 glass Substances 0.000 description 1
238000007646 gravure printing Methods 0.000 description 1
150000002366 halogen compounds Chemical class 0.000 description 1
125000001475 halogen functional group Chemical group 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
239000012456 homogeneous solution Substances 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
229910052743 krypton Inorganic materials 0.000 description 1
DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
238000001459 lithography Methods 0.000 description 1
239000000395 magnesium oxide Substances 0.000 description 1
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
229910001507 metal halide Inorganic materials 0.000 description 1
150000005309 metal halides Chemical class 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
239000000178 monomer Substances 0.000 description 1
239000000025 natural resin Substances 0.000 description 1
238000005457 optimization Methods 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
125000002092 orthoester group Chemical group 0.000 description 1
150000002905 orthoesters Chemical class 0.000 description 1
150000004866 oxadiazoles Chemical class 0.000 description 1
150000002916 oxazoles Chemical class 0.000 description 1
239000005011 phenolic resin Substances 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
239000000049 pigment Substances 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
239000004033 plastic Substances 0.000 description 1
239000004014 plasticizer Substances 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
239000010695 polyglycol Substances 0.000 description 1
229920000151 polyglycol Polymers 0.000 description 1
229920000193 polymethacrylate Polymers 0.000 description 1
229920006324 polyoxymethylene Polymers 0.000 description 1
229920002689 polyvinyl acetate Polymers 0.000 description 1
229920001289 polyvinyl ether Polymers 0.000 description 1
229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
239000002243 precursor Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
238000002203 pretreatment Methods 0.000 description 1
238000003303 reheating Methods 0.000 description 1
238000005096 rolling process Methods 0.000 description 1
238000007650 screen-printing Methods 0.000 description 1
239000004208 shellac Substances 0.000 description 1
ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
229940113147 shellac Drugs 0.000 description 1
235000013874 shellac Nutrition 0.000 description 1
FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
239000002210 silicon-based material Substances 0.000 description 1
239000002356 single layer Substances 0.000 description 1
239000011877 solvent mixture Substances 0.000 description 1
238000009987 spinning Methods 0.000 description 1
238000005507 spraying Methods 0.000 description 1
238000003860 storage Methods 0.000 description 1
125000001424 substituent group Chemical group 0.000 description 1
150000003460 sulfonic acids Chemical class 0.000 description 1
229920003002 synthetic resin Polymers 0.000 description 1
239000000057 synthetic resin Substances 0.000 description 1
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
150000003509 tertiary alcohols Chemical class 0.000 description 1
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
150000003918 triazines Chemical class 0.000 description 1
JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
210000002268 wool Anatomy 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

DD32098688A 1987-10-23 1988-10-21 Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen Farbstoff und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial DD275749A5 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19873735852 DE3735852A1 (de)	1987-10-23	1987-10-23	Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number	Publication Date
DD275749A5 true DD275749A5 (de)	1990-01-31

Family

ID=6338902

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DD32098688A DD275749A5 (de)	1987-10-23	1988-10-21	Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen Farbstoff und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial

Country Status (9)

Country	Link
US (2)	US4927732A (ko)
EP (1)	EP0312950B1 (ko)
JP (1)	JP2603316B2 (ko)
KR (1)	KR960016306B1 (ko)
AT (1)	ATE116742T1 (ko)
DD (1)	DD275749A5 (ko)
DE (2)	DE3735852A1 (ko)
HK (1)	HK178995A (ko)
IL (1)	IL88119A (ko)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS63286843A (ja) *	1987-05-19	1988-11-24	Nippon Zeon Co Ltd	ポジ型フォトレジスト組成物
MX169489B (es) *	1987-12-28	1993-07-07	Sumitomo Chemical Co	Procedimiento para preparar compuestos de estirilo
JP2595598B2 (ja) *	1987-12-28	1997-04-02	住友化学工業株式会社	フォトレジスト組成物
DE3837500A1 (de) *	1988-11-04	1990-05-23	Hoechst Ag	Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
JP2636395B2 (ja) *	1988-11-17	1997-07-30	住友化学工業株式会社	フォトレジスト組成物
US5362598A (en) *	1989-04-10	1994-11-08	Sumitomo Chemical Co., Ltd.	Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
DE4013575C2 (de) *	1990-04-27	1994-08-11	Basf Ag	Verfahren zur Herstellung negativer Reliefkopien
CA2041434A1 (en) *	1990-05-02	1991-11-03	Teijiro Kitao	Resist composition
JP3064595B2 (ja) *	1991-04-26	2000-07-12	住友化学工業株式会社	ポジ型レジスト組成物
US5656414A (en) *	1993-04-23	1997-08-12	Fujitsu Limited	Methods of forming tall, high-aspect ratio vias and trenches in photo-imageable materials, photoresist materials, and the like
DE69512113T2 (de) *	1994-03-14	2000-05-25	Kodak Polychrome Graphics Llc	Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten
US5756257A (en) *	1996-02-14	1998-05-26	Imation Corp.	Color proofing article incorporating novel antihalation dye
US5763135A (en) *	1996-09-30	1998-06-09	Clariant Finance (Bvi) Limited	Light sensitive composition containing an arylhydrazo dye
US6245492B1 (en)	1998-08-13	2001-06-12	International Business Machines Corporation	Photoresist system and process for aerial image enhancement
WO2000077575A1 (en)	1999-06-10	2000-12-21	Alliedsignal Inc.	Spin-on-glass anti-reflective coatings for photolithography
US6824879B2 (en)	1999-06-10	2004-11-30	Honeywell International Inc.	Spin-on-glass anti-reflective coatings for photolithography
US20030008229A1 (en) *	2001-06-25	2003-01-09	Prakash Seth	Thermally sensitive coating compositions useful for lithographic elements
WO2003044600A1 (en)	2001-11-15	2003-05-30	Honeywell International Inc.	Spin-on anti-reflective coatings for photolithography
US8053159B2 (en)	2003-11-18	2011-11-08	Honeywell International Inc.	Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8642246B2 (en)	2007-02-26	2014-02-04	Honeywell International Inc.	Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en)	2009-06-10	2013-10-15	Honeywell International Inc.	Anti-reflective coatings for optically transparent substrates
US8864898B2 (en)	2011-05-31	2014-10-21	Honeywell International Inc.	Coating formulations for optical elements
WO2016167892A1 (en)	2015-04-13	2016-10-20	Honeywell International Inc.	Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4349619A (en) *	1979-09-19	1982-09-14	Japan Synthetic Rubber Co., Ltd.	Photoresist composition
DE3324795A1 (de) *	1983-07-09	1985-01-17	Merck Patent Gmbh, 6100 Darmstadt	Negativ arbeitende fotoresistzusammensetzungen mit strahlungsabsorbierenden zusaetzen
DE3325022A1 (de) *	1983-07-11	1985-01-24	Hoechst Ag, 6230 Frankfurt	Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
JPS6088941A (ja) *	1983-10-21	1985-05-18	Nagase Kasei Kogyo Kk	フオトレジスト組成物
DE3584316D1 (de) *	1984-06-01	1991-11-14	Rohm & Haas	Lichtempfindliche beschichtungszusammensetzung, aus diesem hergestellte thermisch stabile beschichtungen und verfahren zur herstellung von thermisch stabilen polymerbildern.
EP0193603A4 (en) *	1984-09-13	1988-04-06	Advanced Micro Devices Inc	PHOTOLITOGRAPHIC PROCESS USING POSITIVE PROTECTIVE PHOTOGRAPHIC MATERIAL CONTAINING A COLORLESS LIGHT ABSORBING AGENT.
JPS6193445A (ja) *	1984-10-12	1986-05-12	Fuji Photo Film Co Ltd	新規なフオトレジスト組成物
US4626492A (en) *	1985-06-04	1986-12-02	Olin Hunt Specialty Products, Inc.	Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound
US4931381A (en) *	1985-08-12	1990-06-05	Hoechst Celanese Corporation	Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
CA1287768C (en) *	1986-01-27	1991-08-20	Thap Dominh	Antireflective photoresist composition

1987
- 1987-10-23 DE DE19873735852 patent/DE3735852A1/de not_active Withdrawn
1988
- 1988-10-17 DE DE3852690T patent/DE3852690D1/de not_active Expired - Fee Related
- 1988-10-17 AT AT88117219T patent/ATE116742T1/de not_active IP Right Cessation
- 1988-10-17 EP EP88117219A patent/EP0312950B1/de not_active Expired - Lifetime
- 1988-10-20 US US07/260,307 patent/US4927732A/en not_active Expired - Lifetime
- 1988-10-21 IL IL88119A patent/IL88119A/xx not_active IP Right Cessation
- 1988-10-21 JP JP63264269A patent/JP2603316B2/ja not_active Expired - Lifetime
- 1988-10-21 DD DD32098688A patent/DD275749A5/de not_active IP Right Cessation
- 1988-10-21 KR KR1019880013728A patent/KR960016306B1/ko not_active IP Right Cessation
1990
- 1990-03-28 US US07/500,201 patent/US5066567A/en not_active Expired - Lifetime
1995
- 1995-11-23 HK HK178995A patent/HK178995A/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
KR960016306B1 (ko)	1996-12-09
JPH01137246A (ja)	1989-05-30
DE3852690D1 (de)	1995-02-16
IL88119A0 (en)	1989-06-30
IL88119A (en)	1992-02-16
EP0312950A2 (de)	1989-04-26
US5066567A (en)	1991-11-19
US4927732A (en)	1990-05-22
HK178995A (en)	1995-12-01
ATE116742T1 (de)	1995-01-15
DE3735852A1 (de)	1989-05-03
EP0312950A3 (en)	1990-10-24
EP0312950B1 (de)	1995-01-04
KR890007117A (ko)	1989-06-19
JP2603316B2 (ja)	1997-04-23

Legal Events

Date	Code	Title	Description
1997-09-11	ENJ	Ceased due to non-payment of renewal fee

Publication	Publication Date	Title
DD275749A5 (de)	1990-01-31	Positiv arbeitendes lichtempfindliches gemisch, enthaltend einen Farbstoff und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial
DE69726378T2 (de)	2004-09-16	Gefärbte Photoresists sowie Methoden und Artikel, die diese umfassen
DE4111060B4 (de)	2004-07-29	Positiv arbeitende lichtempfindliche Zusammensetzung
DE69727620T2 (de)	2004-09-30	Zusammensetzungen für antireflektierende Beschichtungen
JP2753921B2 (ja)	1998-05-20	ポジ型フオトレジスト組成物
US4575480A (en)	1986-03-11	Photoresist composition
DE3720017C2 (ko)	1990-04-26
DE69400595T2 (de)	1997-04-30	Strahlungsempfindliche Harzzusammensetzung
JP3293940B2 (ja)	2002-06-17	感光性組成物及びそれを用いたパターン形成方法
DE3821585A1 (de)	1989-03-23	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE69837984T2 (de)	2008-03-06	Gefärbte Fotolacke sowie Methoden und Artikel, die diese umfassen
EP0303108A2 (de)	1989-02-15	Lichtempfindliches Gemisch, daraus hergestelltes lichtempfindliches Kopiermaterial und Verfahren zur Herstellung von negativen Reliefkopien
DE69826642T2 (de)	2005-10-27	Positiv arbeitende, neue photoaktive verbindungen enthaltende photoresiste
EP0285014A2 (de)	1988-10-05	Lichtempfindliches Gemisch, daraus hergestelltes Kopiermaterial und Verfahren zur Herstellung von Druckformen
DE3715790A1 (de)	1988-11-24	Strahlungsempfindliches aufzeichnungsmaterial
US5380618A (en)	1995-01-10	Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent
EP0314037B1 (de)	1994-02-23	Positiv arbeitendes lichtempfindliches Gemisch, enthaltend einen Farbstoff, und daraus hergestelltes positiv arbeitendes lichtempfindliches Aufzeichnungsmaterial
EP0519298A1 (de)	1992-12-23	Strahlungsempfindliche Sulfonsäureester und deren Verwendung
DE4125042A1 (de)	1993-02-04	Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
KR19990045397A (ko)	1999-06-25	레지스트 패턴 형성법 및 이 방법에 사용되는포지티브 레지스트 조성물
DE69009231T2 (de)	1995-01-05	Positiv arbeitende Photoresistzusammensetzung.
DE3853114T2 (de)	1995-06-14	Poly(3-mono oder 3,5-disubstituierte acetoxystyrole) und deren Verwendung.
DE68909084T2 (de)	1994-01-13	Hochempfindlicher Resist für das mittlere und tiefe UV.
EP0298393A2 (de)	1989-01-11	Verfahren zur Herstellung negativer Bilder aus einem positiv arbeitenden Photoresist mit einem Gehalt an Curcumin und lichtemfindlichen Gemisch enthaltend Curcumin
DE69631709T2 (de)	2005-02-10	Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält