CN218558508U - Broadband infrared blocking conductive film - Google Patents
Broadband infrared blocking conductive film Download PDFInfo
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- CN218558508U CN218558508U CN202223263628.XU CN202223263628U CN218558508U CN 218558508 U CN218558508 U CN 218558508U CN 202223263628 U CN202223263628 U CN 202223263628U CN 218558508 U CN218558508 U CN 218558508U
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Abstract
The utility model discloses an infrared separation conducting film of broadband belongs to conducting film technical field, including the substrate layer, be provided with the metal insulating layer on the terminal surface of substrate layer, the substrate layer is kept away from and is provided with the acid oxidation layer on the terminal surface of metal insulating layer, the acid oxidation layer is kept away from and is provided with the tin dioxide layer on the terminal surface of substrate layer, the metal insulating layer is the mixed metal oxide insulating layer that forms of tin dioxide and antimony oxide granule, the thickness of substrate layer is 188 mu m, the thickness of acid oxidation layer is 15nm, the thickness on tin dioxide layer is 140nm, the thickness of metal insulating layer is 15 mu m. The utility model discloses a metal insulating layer sets up in the one side of substrate layer, keep away from setting up tin dioxide layer and acid oxidation layer of the one side of metal insulating layer at the substrate layer, use the separation function combination of metal insulating layer, tin dioxide layer and acid oxidation layer, can effective separation 800nm ~ 2400 nm's near-infrared wave band.
Description
Technical Field
The utility model belongs to the technical field of the conductive film, concretely relates to infrared separation conductive film of broadband.
Background
Because of direct exposure of sunlight, indoor and in-car decorations and equipment are easy to age, a shading and heat-insulating functional film is required to be attached to window glass of an automobile, a glass curtain and a glass window of a house, so that the radiation of near infrared rays of sunlight to the inner side of the glass is reduced while illumination is carried out by utilizing the sunlight.
Chinese patent publication No. CN2011203925345 mentions an external-application color-changing heat-insulating protective film for glass, wherein the color-changing heat-insulating film is dyed moderately by a PET film and coated with an inorganic tungsten trioxide solution on the surface thereof. The scheme adopts the proper dyeing of the PET film for heat insulation, the efficiency of infrared ray obstruction is not high, and simultaneously, the infrared ray obstruction waveband is only 900 nm-1200 nm.
Therefore, in view of the above technical problems, it is necessary to provide a broadband infrared blocking conductive film.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a broadband infrared separation conducting film to solve foretell problem.
In order to achieve the above object, an embodiment of the present invention provides the following technical solutions:
the utility model provides a broadband infrared separation conducting film, includes the substrate layer, be provided with the metal insulating layer on the terminal surface of substrate layer, the substrate layer is provided with the acid oxidation layer on keeping away from a terminal surface of metal insulating layer, be provided with the tin dioxide layer on the terminal surface that the substrate layer was kept away from to the acid oxidation layer, the metal insulating layer is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix and form.
As a further improvement of the utility model, the thickness of the substrate layer is 188 μm, the thickness of the acid oxidation layer is 15nm, the thickness of the tin dioxide layer is 140nm, and the thickness of the metal heat insulation layer is 15 μm.
As a further improvement of the utility model, the thickness of the substrate layer is 125 μm, the thickness of the acid oxidation layer is 20nm, the thickness of the tin dioxide layer is 40nm, the thickness of the metal heat insulation layer is 10 μm.
As a further improvement of the utility model, the thickness of the substrate layer is 100 μm, the thickness of the acid oxidation layer is 25nm, the thickness of the tin dioxide layer is 100nm, the thickness of the metal heat insulation layer is 8 μm.
As a further improvement of the utility model, the thickness of substrate layer is 250 μm, the thickness of acid oxide layer is 10nm, the thickness of tin dioxide layer is 130nm, the thickness of metal insulating layer is 12 μm.
As a further improvement of the utility model, the thickness of the substrate layer is 100 μm, the thickness of the acid oxidation layer is 5nm, the thickness of the tin dioxide layer is 120nm, the thickness of the metal heat insulation layer is 5 μm.
As a further improvement of the utility model, the thickness of the substrate layer is 188 μm, the thickness of the acid oxidation layer is 18nm, the thickness of the tin dioxide layer is 100nm, and the thickness of the metal heat insulation layer is 11 μm.
As a further improvement of the utility model, the thickness of the substrate layer is 125 μm, the thickness of the acid oxidation layer is 5nm, the thickness of the tin dioxide layer is 110nm, the thickness of the metal heat insulation layer is 9 μm.
As a further improvement of the utility model, the thickness of substrate layer is 250 μm, the thickness of acid oxide layer is 12nm, the thickness of tin dioxide layer is 130nm, the thickness of metal insulating layer is 14 μm.
Compared with the prior art, the utility model has the advantages of it is following:
the utility model discloses a metal insulating layer sets up in the one side of substrate layer, keep away from setting up tin dioxide layer and acid oxide layer of the one side of metal insulating layer at the substrate layer, use the separation function combination of metal insulating layer, tin dioxide layer and acid oxide layer, can effective separation 800nm ~ 2400 nm's near-infrared wave band.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1 is an exploded view of a broadband infrared blocking conductive film according to an embodiment of the present invention;
fig. 2 is a semi-sectional view of a broadband infrared blocking conductive film according to an embodiment of the present invention;
fig. 3 is a schematic structural view of a broadband infrared blocking conductive film according to an embodiment of the present invention;
fig. 4 shows performance data of examples and comparative examples of a broadband infrared blocking conductive film according to an embodiment of the present invention.
In the figure: 1. the metal heat-insulating layer comprises a tin dioxide layer, 2 acid oxidation layers, 3 base material layers and 4 metal heat-insulating layers.
Detailed Description
The present invention will be described in detail below with reference to embodiments shown in the drawings. However, the present invention is not limited to the embodiments, and the structural, method, or functional changes made by those skilled in the art according to the embodiments are all included in the scope of the present invention.
[ example one: "C (B)
An embodiment of the utility model discloses an infrared separation conducting film of broadband, including substrate layer 3, refer to fig. 1 ~ 2 and show, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix the formation, and metal insulating layer 4 can effectual isolated near infrared band.
The thickness of the base material layer 3 is 188 micrometers, the thickness of the acid oxidation layer 2 is 15nm, the thickness of the tin dioxide layer 1 is 140nm, the thickness of the metal heat insulation layer 4 is 15 micrometers, the transmittance of the base material layer 3 is 20.11%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 28.46%.
Example two: "C (B)
An embodiment of the utility model discloses a broadband infrared separation conductive film, including substrate layer 3, refer to that figure 1 ~ figure 2 are shown, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the mixed metal oxide insulating layer that forms of tin dioxide and antimony oxide granule, and metal insulating layer 4 can effectual isolated near-infrared band.
The thickness of the base material layer 3 is 125 μm, the thickness of the acid oxidation layer 2 is 20nm, the thickness of the tin dioxide layer 1 is 40nm, the thickness of the metal heat insulation layer 4 is 10 μm, the transmittance of the base material layer 3 is 22.37%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 28.35%.
[ example three: "C (B)
An embodiment of the utility model discloses an infrared separation conducting film of broadband, including substrate layer 3, refer to fig. 1 ~ 2 and show, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix the formation, and metal insulating layer 4 can effectual isolated near infrared band.
The thickness of the substrate layer 3 is 100 μm, the thickness of the acid oxidation layer 2 is 25nm, the thickness of the tin dioxide layer 1 is 100nm, the thickness of the metal heat insulation layer 4 is 8 μm, the transmittance of the substrate layer 3 is 21.06%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 27.59%.
[ example four: therein for teaching
An embodiment of the utility model discloses an infrared separation conducting film of broadband, including substrate layer 3, refer to fig. 1 ~ 2 and show, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix the formation, and metal insulating layer 4 can effectual isolated near infrared band.
The thickness of the substrate layer 3 is 250 micrometers, the thickness of the acid oxidation layer 2 is 10nm, the thickness of the tin dioxide layer 1 is 130nm, the thickness of the metal heat insulation layer 4 is 12 micrometers, the transmittance of the substrate layer 3 is 23.16%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 28.60%.
Example five: "C (B)
An embodiment of the utility model discloses a broadband infrared separation conductive film, including substrate layer 3, refer to that figure 1 ~ figure 2 are shown, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the mixed metal oxide insulating layer that forms of tin dioxide and antimony oxide granule, and metal insulating layer 4 can effectual isolated near-infrared band.
The thickness of the substrate layer 3 is 100 μm, the thickness of the acid oxidation layer 2 is 5nm, the thickness of the tin dioxide layer 1 is 120nm, the thickness of the metal heat insulation layer 4 is 5 μm, the transmittance of the substrate layer 3 is 20.68%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 29.31%.
Example six: therein for teaching
An embodiment of the utility model discloses a broadband infrared separation conductive film, including substrate layer 3, refer to that figure 1 ~ figure 2 are shown, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the mixed metal oxide insulating layer that forms of tin dioxide and antimony oxide granule, and metal insulating layer 4 can effectual isolated near-infrared band.
The thickness of the substrate layer 3 is 188 micrometers, the thickness of the acid oxidation layer 2 is 18nm, the thickness of the tin dioxide layer 1 is 100nm, the thickness of the metal heat insulation layer 4 is 11 micrometers, the transmittance of the substrate layer 3 is 21.59%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 29.22%.
Example seven: therein for teaching
An embodiment of the utility model discloses an infrared separation conducting film of broadband, including substrate layer 3, refer to fig. 1 ~ 2 and show, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix the formation, and metal insulating layer 4 can effectual isolated near infrared band.
The thickness of the base material layer 3 is 125 μm, the thickness of the acid oxidation layer 2 is 5nm, the thickness of the tin dioxide layer 1 is 110nm, the thickness of the metal heat insulation layer 4 is 9 μm, the transmittance of the base material layer 3 is 21.47%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 28.78%.
[ example eight: "C (B)
An embodiment of the utility model discloses a broadband infrared separation conductive film, including substrate layer 3, refer to that figure 1 ~ figure 2 are shown, be provided with metal insulating layer 4 on the terminal surface of substrate layer 3, substrate layer 3 is provided with acid oxide layer 2 on keeping away from a terminal surface of metal insulating layer 4, and acid oxide layer 2 is provided with tin dioxide layer 1 on keeping away from a terminal surface of substrate layer 3, and metal insulating layer 4 is the mixed metal oxide insulating layer that forms of tin dioxide and antimony oxide granule, and metal insulating layer 4 can effectual isolated near-infrared band.
The thickness of the base material layer 3 is 250 μm, the thickness of the acid oxidation layer 2 is 12nm, the thickness of the tin dioxide layer 1 is 130nm, the thickness of the metal heat insulation layer 4 is 14 μm, the transmittance of the base material layer 3 is 20.69%, and the transmittance of the combination of the tin dioxide layer 1 and the acid oxidation layer 2 is 29.89%.
Specifically, the metal heat-insulating layer 4 is a coating of a metal oxide heat-insulating layer containing tin dioxide and antimony oxide particles, and can well block a near-infrared band of 800nm to 1400nm, the tin dioxide layer 1 and the acidic oxide layer 2 can effectively widen the infrared blocking band, and have a good blocking effect at the near-infrared band of 1400nm to 2400nm, and the conductive thin film material capable of effectively blocking the near-infrared band of 800nm to 2400nm can be realized by combining the blocking functions of the tin dioxide layer 1, the acidic oxide layer 2 and the metal heat-insulating layer 4.
Furthermore, firstly, the acid oxidation layer 2 and the tin dioxide layer 1 are physically sputtered on one surface of the base material layer 3 through magnetron sputtering, wherein the thickness of the base material layer 3 is 100 micrometers, 125 micrometers, 188 micrometers or 250 micrometers, the thickness of the acid oxidation layer 2 is 5 nm-25 nm, and the thickness of the tin dioxide layer 1 is 40 nm-140 nm, then the metal heat insulation layer 4 is coated on one side surface of the base material layer 3 away from the tin dioxide layer 1 and the acid oxidation layer 2 through a precise coating process, and the thickness of the metal heat insulation layer 4 is 5 micrometers-15 micrometers, so that the performance of blocking the near infrared band of 800 nm-2400 nm by the thin film can be realized.
Referring to fig. 4, the metal heat insulation layer 4 can well block 800nm to 1400nm near-infrared band, the transmittance is about 20% 800nm to 1400nm, the tin dioxide layer 1 and the acidic oxide layer 2 on the other side can effectively widen the infrared blocking band, the metal heat insulation layer has good blocking effect in 1400nm to 2400nm near-infrared band, and the transmittance is about 28% 1400nm to 2400nm.
Referring to fig. 4, in comparative example 1, chemical coating is performed on only one side of a substrate layer 3, the substrate layer 3 with the thickness of 188 μm is taken, a metal heat insulation layer 4 is coated on one side of a substrate, the thickness of the metal heat insulation layer 4 is 15 μm, and in comparative example 2, magnetron sputtering coating is performed on only one side of the substrate. The method comprises the steps of taking a substrate layer 3 with the thickness of 125 mu m, carrying out magnetron sputtering on one surface of the substrate layer 3 to form an acid oxidation layer 2 and a tin dioxide layer 1, wherein the thickness of the acid oxidation layer 2 is 15nm, the thickness of the tin dioxide layer 1 is 130nm, and the method can be obtained from a comparative example 1 and a comparative example 2.
Referring to fig. 3, the outer side of the wide wave infrared blocking conductive film is arranged to be a rounded corner, when the wide wave infrared blocking conductive film is installed on the automobile window glass, under a general condition, the automobile window glass cannot be opened within 4-7 days of film pasting of the automobile window glass, the automobile window needs to be kept in a closed state, if the automobile window glass is opened inadvertently, the attaching degree of the wide wave infrared blocking conductive film and the automobile window glass can be influenced, further, the wide wave infrared blocking conductive film is separated from the glass, one side of the wide wave infrared blocking conductive film is warped, the heat insulation effect of the wide wave infrared blocking conductive film is influenced, the rounded corner is arranged to a large extent and can be avoided, the rounded corner is provided with a certain buffer, when the wide wave infrared blocking conductive film is contacted with the door gap of an automobile door, the rounded corner of the wide wave infrared blocking conductive film is contacted with the door gap in sequence, and the warped edge of the wide wave infrared blocking conductive film is not easy to cause.
According to the technical scheme provided by the utility model, the utility model discloses following beneficial effect has:
an object of the utility model is to provide an infrared coating material of separation and tin dioxide layer combine special function membrane, through the thickness on optimal design coating structure and tin dioxide layer to realized a broadband near-infrared separation conductive film material, can effective separation 800nm ~ 2400 nm's near-infrared wave band.
It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (9)
1. The utility model provides a broadband infrared separation conducting film which characterized in that, includes the substrate layer, be provided with the metal insulating layer on the terminal surface of substrate layer, be provided with the acid oxidation layer on the terminal surface that the metal insulating layer was kept away from to the substrate layer, the acid oxidation layer is kept away from and is provided with the tin dioxide layer on the terminal surface of substrate layer, the metal insulating layer is the metal oxide insulating layer that tin dioxide and antimony oxide granule mix and form.
2. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 188 μm, the acidic oxide layer has a thickness of 15nm, the tin dioxide layer has a thickness of 140nm, and the metal thermal insulation layer has a thickness of 15 μm.
3. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 125 μm, the acid oxide layer has a thickness of 20nm, the tin dioxide layer has a thickness of 40nm, and the metal thermal insulation layer has a thickness of 10 μm.
4. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 100 μm, the acid oxide layer has a thickness of 25nm, the tin dioxide layer has a thickness of 100nm, and the metal thermal insulation layer has a thickness of 8 μm.
5. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 250 μm, the acid oxide layer has a thickness of 10nm, the tin dioxide layer has a thickness of 130nm, and the metal thermal insulation layer has a thickness of 12 μm.
6. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 100 μm, the acid oxide layer has a thickness of 5nm, the tin dioxide layer has a thickness of 120nm, and the metal thermal insulation layer has a thickness of 5 μm.
7. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 188 μm, the acid oxide layer has a thickness of 18nm, the tin dioxide layer has a thickness of 100nm, and the metal thermal insulation layer has a thickness of 11 μm.
8. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 125 μm, the acid oxide layer has a thickness of 5nm, the tin dioxide layer has a thickness of 110nm, and the metal thermal insulation layer has a thickness of 9 μm.
9. The broadband infrared blocking conductive film according to claim 1, wherein the substrate layer has a thickness of 250 μm, the acid oxide layer has a thickness of 12nm, the tin dioxide layer has a thickness of 130nm, and the metal thermal insulation layer has a thickness of 14 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223263628.XU CN218558508U (en) | 2022-12-06 | 2022-12-06 | Broadband infrared blocking conductive film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202223263628.XU CN218558508U (en) | 2022-12-06 | 2022-12-06 | Broadband infrared blocking conductive film |
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| Publication Number | Publication Date |
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| CN218558508U true CN218558508U (en) | 2023-03-03 |
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| CN202223263628.XU Active CN218558508U (en) | 2022-12-06 | 2022-12-06 | Broadband infrared blocking conductive film |
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| CN (1) | CN218558508U (en) |
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- 2022-12-06 CN CN202223263628.XU patent/CN218558508U/en active Active
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