CN216795347U

CN216795347U - Waveguide slit type microwave plasma source

Info

Publication number: CN216795347U
Application number: CN202220507083.3U
Authority: CN
Inventors: 王邱林; 张鹏程; 吉皓
Original assignee: Chengdu Fenyu Electronic Technology Co ltd
Current assignee: Chengdu Fenyu Electronic Technology Co ltd
Priority date: 2022-03-09
Filing date: 2022-03-09
Publication date: 2022-06-21
Anticipated expiration: 2032-03-09

Abstract

The utility model discloses a waveguide slit type microwave plasma source, which belongs to the technical field of microwaves and comprises a rectangular waveguide, a microwave transmitting plate and a cover plate; the front end of the rectangular waveguide is provided with a microwave feed inlet, and the bottom of the rectangular waveguide is provided with a plurality of gaps; the microwave feed inlet is used for inputting microwaves into the rectangular waveguide and outputting the microwaves from the plurality of gaps; microwave transmitting plates are arranged below the plurality of gaps; the microwave transmitting plate is arranged on the cover plate; the microwave transmitting plate is used for transmitting microwaves output from a plurality of slits. The waveguide slit type microwave plasma source can stably generate microwave plasma, so that plasma cloud is generated in the processing cavity, large-area uniform processing is realized, the sealing performance is good, the waveguide slit type microwave plasma source has a cooling function, and the service life is long.

Description

Waveguide slit type microwave plasma source

Technical Field

The utility model belongs to the technical field of microwaves, and particularly relates to a waveguide slit type microwave plasma source.

Background

Plasma is an ionized gaseous substance consisting of positive and negative ions generated by ionizing atoms and radicals, from which part of electrons are deprived. In plasma processing of semiconductor chip devices, plasma is generally excited by means of both radio frequency and microwave. Compared with radio frequency plasma, the frequency oscillation in the electric field of the microwave plasma is higher, the movement distance of electrons before the direction is changed is shorter, the quantity of electrons which can reach the surface of the device in each movement period is less, the charge effect of the surface of the device is reduced, ions cannot be accelerated to move to the surface, and undesirable surface collision is avoided. Microwave plasma has isotropic characteristics and is well suited for "device release" in MEMS fabrication and "flip chip underfill" processes in microchip packaging.

The microstrip line adopted at present is used for exciting microwave plasma, is unstable, has small volume and cannot generate large-area plasma. The microwave plasma is excited by adopting the rectangular waveguide, the uniformity and the sealing property of the processing cavity are also needed to be solved, and the long-term heating service life of the rectangular waveguide is shortened.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a waveguide slit type microwave plasma source aiming at the defects, and solves the problems of how to stably and widely generate microwave plasma and uniformly generate microwave plasma, and the problems of good sealing property, long service life and the like. In order to achieve the purpose, the utility model provides the following technical scheme:

the waveguide slit type microwave plasma source comprises a rectangular waveguide 1, a microwave transmitting plate 2 and a cover plate 3; the front end of the rectangular waveguide 1 is provided with a microwave feed-in port 4, and the bottom of the rectangular waveguide is provided with a plurality of gaps 5; the microwave feed port 4 is used for inputting microwaves into the rectangular waveguide 1 and outputting the microwaves from the plurality of gaps 5; a microwave transmitting plate 2 is arranged below the plurality of gaps 5; the microwave transmitting plate 2 is arranged on the cover plate 3; the microwave transmitting plate 2 is used for transmitting microwaves output from a plurality of slits 5. According to the structure, the microwave feed inlet 4 is formed in the front end of the rectangular waveguide 1, the microwave feed inlet 4 is connected with the microwave generator, microwaves generated by the microwave generator enter the rectangular waveguide 1 from the microwave feed inlet 4 in the front end of the rectangular waveguide 1, the rear end of the rectangular waveguide 1 is sealed by metal, so the microwaves can be uniformly radiated out from a plurality of gaps 5 formed in the bottom, then the microwaves are coupled into an external processing cavity through the microwave transmitting plate 2 on the cover plate 3, and process gas in the processing cavity is ionized to form plasma. The rectangular waveguide 1 has two wide surfaces and two narrow surfaces, and the surface of the rectangular waveguide 1 with the plurality of gaps 5 at the bottom is the wide surface. The microwave transmitting plate 2 can be a plate made of quartz or ceramic materials, so that microwaves can be coupled into the external treatment cavity through the microwave transmitting plate 2, process gas in the treatment cavity is prevented from leaking into the rectangular waveguide 1 from the plurality of gaps 5, and the sealing of the treatment cavity is ensured. The cover plate not only fixes the microwave transmitting plate 2, but also connects the rectangular waveguide 1 and the external processing cavity through the cover plate 3, so that the use is very convenient. The waveguide slit type microwave plasma source adopts the rectangular waveguide with a plurality of slits 5 to transmit microwaves, can stably generate microwave plasma, generates plasma cloud in the processing cavity, realizes large-area uniform processing, and has good sealing property.

Further, the cover plate 3 comprises an upper cover plate 6 and a lower cover plate 7; the top of the lower cover plate 7 is provided with an upper cover plate 6; an accommodating cavity 8 for accommodating the microwave transmitting plate 2 is arranged in the upper cover plate 6; the top of the accommodating cavity 8 is provided with a first opening 9; the first openings 9 correspond to the plurality of slits 5. According to the structure, the upper cover plate 6 is arranged at the top of the lower cover plate 7, the transparent microwave plate 2 placed in the accommodating cavity 8 can be fixed, the lower cover plate 7 and the upper cover plate 6 clamp the transparent microwave plate 2 together, the upper surface and the lower surface of the transparent microwave plate 2 are provided with the sealing rings, the surfaces of the lower cover plate 7 and the upper cover plate 6 which are matched with the transparent microwave plate 2 are provided with the sealing grooves matched with the sealing rings, and the transparent microwave plate 2, the upper cover plate 6 and the lower cover plate 7 are in sealing fit. The top of the containing cavity 8 is provided with a first opening 9, so that the microwave can enter the microwave-transparent plate 2 from the first opening 9 after coming out of the plurality of slots 5 at the bottom of the rectangular waveguide 1. Because the microwave transmitting plate 2 is arranged in the accommodating cavity 8, the periphery of the microwave transmitting plate 2 is covered by the upper cover plate 6, and the microwave is prevented from leaking from the periphery of the microwave transmitting plate 2.

Further, at least one process gas passage is arranged on the lower cover plate 7; the process gas passage comprises a process gas inlet 10, a process gas passage 11 and a process gas outlet 12; the process gas inlet 10, the process gas path 11 and the process gas outlet 12 are communicated in sequence. As can be seen from the above structure, the process gas enters the process gas passage 11 from the process gas inlet of the lower plate 7, and exits the lower plate 7 from the process gas outlet 12 into the process chamber. Since the process gas enters the processing chamber from the lower cover plate 7, a process gas passage does not need to be additionally arranged on the processing chamber, and the use is convenient. And the process gas passage is arranged on the lower cover plate 7, and the lower cover plate 7 can be cooled, so that the service life of the equipment is prolonged.

Further, the lower cover plate 7 includes a first cover plate 13 and a second cover plate 14; the top of the second cover plate 14 is provided with a first cover plate 13; a second opening 15 penetrating through the first cover plate 13 and the second cover plate 14 is arranged below the microwave transmitting plate 2; the process gas inlet 10 is arranged on the first cover plate 13; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14; the process gas outlet 12 is arranged on the inner side of the second opening 15. As can be seen from the above structure, the process gas enters the process gas passage 11 between the first cover plate 13 and the second cover plate 14 from the process gas inlet 10 of the first cover plate 13, and then flows out into the process chamber from the process gas outlet 12. The process gas inlet 10 is arranged on the first cover plate 13, so that process gas can be conveniently accessed from the outside; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14, so as to facilitate the processing and manufacturing of the process gas circuit 11; the process gas outlet 12 is provided on the inner side surface of the second opening 15, so that when the microwave passes through the second opening 15 penetrating the first cover plate 13 and the second cover plate 14 after passing through the microwave-transmitting plate 2, the microwave starts to excite the process gas to form plasma.

Further, the process gas outlet 12 comprises a plurality of gas outlet holes; all the small air outlet holes uniformly surround the inner side surface of the second opening 15. According to the structure, the process gas outlet 12 comprises a plurality of small gas outlet holes, all the small gas outlet holes uniformly surround the inner side surface of the second opening 15, and a large number of process gases are uniformly excited near the second opening 15 by microwaves from the small gas outlet holes on the inner side surface of the second opening 15 and enter the external processing cavity.

Further, a cooling inlet 16 and a cooling outlet 17 are arranged on the side surface of the rectangular waveguide 1; the side surface of the cooling inlet 16 is opposite to the side surface of the cooling outlet 17; the cooling outlet 17 comprises a number of cooling apertures. According to the structure, air enters the rectangular waveguide 1 from the cooling inlet 16 on one side of the rectangular waveguide 1, then flows out from the cooling outlet 17 on the opposite side, and the rectangular waveguide 1 is cooled by continuously introducing air into the rectangular waveguide 1. Because the microwave-transparent plate 2 is arranged below the rectangular waveguide 1, air cannot penetrate through the microwave-transparent plate 2, so that the air is prevented from entering the external processing cavity. The cooling outlet 17 comprises a plurality of cooling holes, so that air can uniformly flow out, and the purpose of uniform heat dissipation is achieved.

Further, a cooling cavity 18 is arranged between the rectangular waveguide 1 and the microwave transmitting plate 2; a plurality of partition plates 19 which are sequentially arranged from front to back are arranged in the cooling cavity 18; the partition plates 19 are used for dividing the cooling cavity 18 into a plurality of cooling single cavities; the side surface of the cooling single cavity is provided with a cooling inlet 16 and a cooling outlet 17; the side surface of the cooling inlet 16 is opposite to the side surface of the cooling outlet 17; the cooling outlet 17 comprises a plurality of cooling apertures; the top of each cooling single cavity is provided with a gap 5. According to the structure, the microwaves leave from the plurality of gaps 5 at the bottom of the rectangular waveguide 1, enter the cooling cavity 18, and then enter the external processing cavity through the microwave transmitting plate 2 below the cooling cavity 18. The cooling cavity 18 is divided into a plurality of cooling single cavities by a plurality of partition boards 19 which are sequentially arranged from front to back, so that the microwave can more uniformly penetrate through the microwave transmitting plate 2 and enter the external processing cavity. The side of the cooling single cavity is provided with a cooling inlet 16 and a cooling outlet 17, air enters the rectangular waveguide 1 and the cooling single cavity from the cooling inlet 16 on one side of the cooling single cavity and flows out from the cooling outlet 17 on the opposite side, and the cooling cavity 18 is divided into a plurality of cooling single cavities, so that the purpose of uniformly cooling the rectangular waveguide 1 can be realized by the plurality of cooling single cavities. The cooling outlet 17 comprises a plurality of cooling holes, so that air can uniformly flow out, and the purpose of uniform heat dissipation is also achieved. The microwave transparent plate 2 below the cooling chamber 18 prevents air from penetrating into the external process chamber.

Further, a plurality of small exhaust holes 20 are arranged at the top of the rectangular waveguide 1. According to the structure, after the air in the cooling cavity 18 enters the rectangular waveguide 1 from the plurality of slits 5, the plurality of air outlet holes at the top of the rectangular waveguide 1 can be used for discharging the air through the plurality of air outlet holes 20. A decorative plate may be provided on the periphery of the rectangular waveguide 1, and an exhaust hole may be further provided on the decorative plate, so that the air discharged from the exhaust hole 20 into the decorative plate may be discharged from the exhaust hole to the outside.

Further, a slit plate 21 is arranged between the microwave transmitting plate 2 and the cooling cavity 18. According to the structure, the microwave in the rectangular waveguide 1 enters the cooling cavity 18 from the plurality of slots 5 at the bottom of the rectangular waveguide 1, then passes through the slot plate 21 below the cooling cavity 18, and is radiated downwards. The slit plate 21 is a metal plate, and a plurality of slits are formed in the slit plate, so that uniform microwave radiation is facilitated.

The utility model has the beneficial effects that:

the utility model discloses a waveguide slit type microwave plasma source, which belongs to the technical field of microwaves and comprises a rectangular waveguide, a microwave transmitting plate and a cover plate; the front end of the rectangular waveguide is provided with a microwave feed inlet, and the bottom of the rectangular waveguide is provided with a plurality of gaps; the microwave feed inlet is used for inputting microwaves into the rectangular waveguide and outputting the microwaves from the plurality of gaps; a microwave transmitting plate is arranged below the plurality of gaps; the microwave transmitting plate is arranged on the cover plate; the microwave transmitting plate is used for transmitting microwaves output from a plurality of slits. The waveguide slit type microwave plasma source can stably generate microwave plasma, so that plasma cloud is generated in the processing cavity, large-area uniform processing is realized, the sealing performance is good, the waveguide slit type microwave plasma source has a cooling function, and the service life is long.

Drawings

FIG. 1 is a schematic three-dimensional structure of a first embodiment of the present invention;

FIG. 2 is a schematic three-dimensional structure of another perspective of the first embodiment of the present invention;

FIG. 3 is a schematic three-dimensional structure of the cover plate and microwave transparent plate combination of the present invention;

FIG. 4 is a schematic three-dimensional structure of the bottom view of the upper cover plate;

FIG. 5 is a schematic three-dimensional structure of the lower cover plate;

FIG. 6 is a schematic three-dimensional structure of a bottom view of the first cover plate;

FIG. 7 is a schematic three-dimensional structure of a top view of the second cover plate;

FIG. 8 is a schematic three-dimensional structure of the second and third embodiments;

FIG. 9 is a schematic three-dimensional view of the second embodiment with the cover and microwave transparent plate removed and the bottom view removed;

FIG. 10 is a schematic three-dimensional view of the third embodiment with the cover and microwave transparent plate removed and the bottom view removed;

in the drawings: 1-rectangular waveguide, 2-microwave transparent plate, 3-cover plate, 4-microwave feed inlet, 5-gap, 6-upper cover plate, 7-lower cover plate, 8-containing cavity, 9-first opening, 10-process gas inlet, 11-process gas path, 12-process gas outlet, 13-first cover plate, 14-second cover plate, 15-second opening, 16-cooling inlet, 17-cooling outlet, 18-cooling cavity, 19-partition plate, 20-exhaust small hole and 21-gap plate.

Detailed Description

The present invention will be described in further detail below with reference to the drawings and the embodiments, but the present invention is not limited to the following examples.

The first embodiment is as follows:

see figures 1-7. The waveguide slit type microwave plasma source comprises a rectangular waveguide 1, a microwave transmitting plate 2 and a cover plate 3; the front end of the rectangular waveguide 1 is provided with a microwave feed-in port 4, and the bottom of the rectangular waveguide is provided with a plurality of gaps 5; the microwave feed port 4 is used for inputting microwaves into the rectangular waveguide 1 and outputting the microwaves from the plurality of gaps 5; a microwave transmitting plate 2 is arranged below the plurality of gaps 5; the microwave transmitting plate 2 is arranged on the cover plate 3; the microwave transmitting plate 2 is used for transmitting microwaves output from a plurality of slits 5. According to the structure, the microwave feed inlet 4 is formed in the front end of the rectangular waveguide 1, the microwave feed inlet 4 is connected with the microwave generator, microwaves generated by the microwave generator enter the rectangular waveguide 1 from the microwave feed inlet 4 in the front end of the rectangular waveguide 1, the rear end of the rectangular waveguide 1 is sealed by metal, so the microwaves can be uniformly radiated out from a plurality of gaps 5 formed in the bottom, then the microwaves are coupled into an external processing cavity through the microwave transmitting plate 2 on the cover plate 3, and process gas in the processing cavity is ionized to form plasma. The rectangular waveguide 1 has two wide surfaces and two narrow surfaces, and the surface of the rectangular waveguide 1 with the plurality of gaps 5 at the bottom is the wide surface. The microwave transmitting plate 2 can be a quartz or ceramic plate, so that microwaves can be coupled into the external treatment cavity through the microwave transmitting plate 2, the process gas in the treatment cavity is prevented from leaking into the rectangular waveguide 1 from the plurality of gaps 5, and the sealing of the treatment cavity is ensured. The cover plate not only fixes the microwave transmitting plate 2, but also connects the rectangular waveguide 1 and the external processing cavity through the cover plate 3, so that the use is very convenient. The waveguide slit type microwave plasma source adopts the rectangular waveguide with a plurality of slits 5 to transmit microwaves, can stably generate microwave plasma, generates plasma cloud in the processing cavity, realizes large-area uniform processing, and has good sealing property.

The cover plate 3 comprises an upper cover plate 6 and a lower cover plate 7; the top of the lower cover plate 7 is provided with an upper cover plate 6; an accommodating cavity 8 for accommodating the microwave transmitting plate 2 is arranged in the upper cover plate 6; the top of the accommodating cavity 8 is provided with a first opening 9; the first openings 9 correspond to the plurality of slits 5. According to the structure, the upper cover plate 6 is arranged at the top of the lower cover plate 7, the microwave transmitting plate 2 placed in the accommodating cavity 8 can be fixed, the lower cover plate 7 and the upper cover plate 6 clamp the microwave transmitting plate 2 together, the upper surface and the lower surface of the microwave transmitting plate 2 are provided with sealing rings, the surfaces of the lower cover plate 7 and the upper cover plate 6, which are matched with the microwave transmitting plate 2, are provided with sealing grooves matched with the sealing rings, and the microwave transmitting plate 2, the upper cover plate 6 and the lower cover plate 7 are in sealing fit. The top of the containing cavity 8 is provided with a first opening 9, so that the microwave can enter the microwave-transparent plate 2 from the first opening 9 after coming out of the plurality of slots 5 at the bottom of the rectangular waveguide 1. Because the microwave transmitting plate 2 is arranged in the accommodating cavity 8, the periphery of the microwave transmitting plate 2 is covered by the upper cover plate 6, and the microwave is prevented from leaking from the periphery of the microwave transmitting plate 2.

The lower cover plate 7 is provided with at least one process gas passage; the process gas passage comprises a process gas inlet 10, a process gas passage 11 and a process gas outlet 12; the process gas inlet 10, the process gas path 11 and the process gas outlet 12 are communicated in sequence. As can be seen from the above structure, the process gas enters the process gas passage 11 from the process gas inlet of the lower plate 7, and exits the lower plate 7 from the process gas outlet 12 into the process chamber. Since the process gas enters the processing chamber from the lower cover plate 7, a process gas passage does not need to be additionally arranged on the processing chamber, and the use is convenient. And the process gas passage is arranged on the lower cover plate 7, and the lower cover plate 7 can be cooled, so that the service life of the equipment is prolonged.

The lower cover plate 7 comprises a first cover plate 13 and a second cover plate 14; the top of the second cover plate 14 is provided with a first cover plate 13; a second opening 15 penetrating through the first cover plate 13 and the second cover plate 14 is arranged below the microwave transmitting plate 2; the process gas inlet 10 is arranged on the first cover plate 13; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14; the process gas outlet 12 is arranged on the inner side of the second opening 15. As can be seen from the above structure, the process gas enters the process gas passage 11 between the first cover plate 13 and the second cover plate 14 from the process gas inlet 10 on the first cover plate 13, and then flows out into the process chamber from the process gas outlet 12. The process gas inlet 10 is arranged on the first cover plate 13, so that process gas can be conveniently accessed from the outside; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14, so as to facilitate the processing and manufacturing of the process gas circuit 11; the process gas outlet 12 is provided on the inner side surface of the second opening 15, so that when the microwave passes through the second opening 15 penetrating the first cover plate 13 and the second cover plate 14 after passing through the microwave-transmitting plate 2, the microwave starts to excite the process gas to form plasma.

The process gas outlet 12 comprises a plurality of gas outlet holes; all the small air outlet holes uniformly surround the inner side surface of the second opening 15. It can be known from the above structure that the process gas outlet 12 includes a plurality of small gas outlet holes, all the small gas outlet holes uniformly surround the inner side surface of the second opening 15, and the process gas is excited by the microwaves near the second opening 15 from a large number of small gas outlet holes on the inner side surface of the second opening 15 uniformly and enters the external processing cavity.

A cooling inlet 16 and a cooling outlet 17 are arranged on the side surface of the rectangular waveguide 1; the side surface of the cooling inlet 16 is opposite to the side surface of the cooling outlet 17; the cooling outlet 17 comprises a number of cooling apertures. According to the structure, air enters the rectangular waveguide 1 from the cooling inlet 16 on one side of the rectangular waveguide 1 and then flows out from the cooling outlet 17 on the opposite side, and the rectangular waveguide 1 is cooled by continuously introducing air into the rectangular waveguide 1. Because the microwave transmitting plate 2 is arranged below the rectangular waveguide 1, air cannot penetrate through the microwave transmitting plate 2, and therefore air is prevented from entering the external processing cavity. The cooling outlet 17 comprises a plurality of cooling holes, so that air can uniformly flow out, and the purpose of uniform heat dissipation is achieved.

The second embodiment:

see figures 3-9. The waveguide slit type microwave plasma source comprises a rectangular waveguide 1, a microwave transmitting plate 2 and a cover plate 3; the front end of the rectangular waveguide 1 is provided with a microwave feed inlet 4, and the bottom of the rectangular waveguide is provided with a plurality of gaps 5; the microwave feed port 4 is used for inputting microwaves into the rectangular waveguide 1 and outputting the microwaves from the plurality of gaps 5; a microwave transmitting plate 2 is arranged below the plurality of gaps 5; the microwave transmitting plate 2 is arranged on the cover plate 3; the microwave transparent plate 2 is used for transmitting microwaves output from a plurality of slits 5. According to the structure, the microwave feed inlet 4 is formed in the front end of the rectangular waveguide 1, the microwave feed inlet 4 is connected with the microwave generator, microwaves generated by the microwave generator enter the rectangular waveguide 1 from the microwave feed inlet 4 in the front end of the rectangular waveguide 1, the rear end of the rectangular waveguide 1 is sealed by metal, so the microwaves can be uniformly radiated out from a plurality of gaps 5 formed in the bottom, then the microwaves are coupled into an external processing cavity through the microwave transmitting plate 2 on the cover plate 3, and process gas in the processing cavity is ionized to form plasma. The rectangular waveguide 1 has two wide surfaces and two narrow surfaces, and the surface of the rectangular waveguide 1 with the plurality of gaps 5 at the bottom is the wide surface. The microwave transmitting plate 2 can be a plate made of quartz or ceramic materials, so that microwaves can be coupled into the external treatment cavity through the microwave transmitting plate 2, process gas in the treatment cavity is prevented from leaking into the rectangular waveguide 1 from the plurality of gaps 5, and the sealing of the treatment cavity is ensured. The cover plate not only fixes the microwave transmitting plate 2, but also connects the rectangular waveguide 1 and the external processing cavity through the cover plate 3, so that the use is very convenient. The waveguide slit type microwave plasma source adopts the rectangular waveguide with a plurality of slits 5 to transmit microwaves, can stably generate microwave plasma, generates plasma cloud in a processing cavity, realizes large-area uniform processing, and has good sealing property.

The lower cover plate 7 is provided with at least one process gas passage; the process gas passage comprises a process gas inlet 10, a process gas passage 11 and a process gas outlet 12; the process gas inlet 10, the process gas path 11 and the process gas outlet 12 are communicated in sequence. As can be seen from the above structure, the process gas enters the process gas passage 11 from the process gas inlet of the lower cover plate 7, and exits the lower cover plate 7 from the process gas outlet 12 to enter the processing chamber. Since the process gas enters the processing chamber from the lower cover plate 7, a process gas passage does not need to be additionally arranged on the processing chamber, and the use is convenient. And the process gas passage is arranged on the lower cover plate 7, and the lower cover plate 7 can be cooled, so that the service life of the equipment is prolonged.

The lower cover plate 7 comprises a first cover plate 13 and a second cover plate 14; the top of the second cover plate 14 is provided with a first cover plate 13; a second opening 15 penetrating through the first cover plate 13 and the second cover plate 14 is arranged below the microwave transmitting plate 2; the process gas inlet 10 is arranged on the first cover plate 13; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14; the process gas outlet 12 is arranged on the inner side of the second opening 15. As can be seen from the above structure, the process gas enters the process gas passage 11 between the first cover plate 13 and the second cover plate 14 from the process gas inlet 10 of the first cover plate 13, and then flows out into the process chamber from the process gas outlet 12. The process gas inlet 10 is arranged on the first cover plate 13, so that process gas can be conveniently accessed from the outside; the process gas circuit 11 is arranged between the first cover plate 13 and the second cover plate 14, so as to facilitate the processing and manufacturing of the process gas circuit 11; the process gas outlet 12 is provided on the inner side surface of the second opening 15, so that when the microwave passes through the second opening 15 penetrating the first cover plate 13 and the second cover plate 14 after passing through the microwave-transmitting plate 2, the microwave starts to excite the process gas to form plasma.

The process gas outlet 12 comprises a plurality of gas outlet holes; all the small air outlet holes uniformly surround the inner side surface of the second opening 15. According to the structure, the process gas outlet 12 comprises a plurality of small gas outlet holes, all the small gas outlet holes uniformly surround the inner side surface of the second opening 15, and a large number of process gases are uniformly excited near the second opening 15 by microwaves from the small gas outlet holes on the inner side surface of the second opening 15 and enter the external processing cavity.

A cooling cavity 18 is arranged between the rectangular waveguide 1 and the microwave transmitting plate 2; a plurality of partition plates 19 which are sequentially arranged from front to back are arranged in the cooling cavity 18; the partition plates 19 are used for dividing the cooling cavity 18 into a plurality of cooling single cavities; the side surface of the cooling single cavity is provided with a cooling inlet 16 and a cooling outlet 17; the side surface of the cooling inlet 16 is opposite to the side surface of the cooling outlet 17; the cooling outlet 17 comprises a plurality of cooling apertures; the top of each cooling single cavity is provided with a gap 5. According to the structure, the microwaves leave from the plurality of gaps 5 at the bottom of the rectangular waveguide 1, enter the cooling cavity 18, and then enter the external processing cavity through the microwave transmitting plate 2 below the cooling cavity 18. The cooling cavity 18 is divided into a plurality of cooling single cavities by a plurality of partition boards 19 which are sequentially arranged from front to back, so that the microwave can more uniformly penetrate through the microwave transmitting plate 2 and enter the external processing cavity. The side of the cooling single cavity is provided with a cooling inlet 16 and a cooling outlet 17, air enters the rectangular waveguide 1 and the cooling single cavity from the cooling inlet 16 on one side of the cooling single cavity and flows out from the cooling outlet 17 on the opposite side, and the cooling cavity 18 is divided into a plurality of cooling single cavities, so that the purpose of uniformly cooling the rectangular waveguide 1 can be realized by the plurality of cooling single cavities. The cooling outlet 17 comprises a plurality of cooling holes, so that air can uniformly flow out, and the purpose of uniform heat dissipation is also achieved. The microwave transparent plate 2 below the cooling chamber 18 prevents air from penetrating into the external process chamber.

The top of the rectangular waveguide 1 is provided with a plurality of small exhaust holes 20. According to the structure, after the air in the cooling cavity 18 enters the rectangular waveguide 1 from the plurality of slits 5, the plurality of air outlet holes at the top of the rectangular waveguide 1 can be used for discharging the air through the plurality of air outlet holes 20. A decorative plate may be provided on the periphery of the rectangular waveguide 1, and an exhaust hole may be further provided on the decorative plate, so that the air discharged from the exhaust hole 20 into the decorative plate may be discharged from the exhaust hole to the outside.

Example three:

see figures 3-10. On the basis of the second embodiment, a gap plate 21 is arranged between the microwave transmitting plate 2 and the cooling cavity 18. According to the structure, the microwave in the rectangular waveguide 1 enters the cooling cavity 18 from the plurality of slots 5 at the bottom of the rectangular waveguide 1, then passes through the slot plate 21 below the cooling cavity 18, and then is radiated downwards. The slit plate 21 is a metal plate, and a plurality of slits are formed in the slit plate, so that uniform microwave radiation is facilitated.

The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.

Claims

1. Waveguide slot type microwave plasma source, its characterized in that: comprises a rectangular waveguide (1), a microwave transmitting plate (2) and a cover plate (3); the front end of the rectangular waveguide (1) is provided with a microwave feed inlet (4), and the bottom of the rectangular waveguide is provided with a plurality of gaps (5); the microwave feed inlet (4) is used for inputting microwaves into the rectangular waveguide (1) and outputting the microwaves from the plurality of gaps (5); microwave transmitting plates (2) are arranged below the plurality of gaps (5); the microwave transmitting plate (2) is arranged on the cover plate (3); the microwave transmitting plate (2) is used for transmitting microwaves output from a plurality of gaps (5).

2. The waveguide slot microwave plasma source of claim 1, wherein: the cover plate (3) comprises an upper cover plate (6) and a lower cover plate (7); the top of the lower cover plate (7) is provided with an upper cover plate (6); an accommodating cavity (8) for accommodating the microwave transmitting plate (2) is arranged in the upper cover plate (6); the top of the accommodating cavity (8) is provided with a first opening (9); the first openings (9) correspond to the plurality of gaps (5).

3. The waveguide slot microwave plasma source of claim 2, wherein: at least one process gas passage is arranged on the lower cover plate (7); the process gas passage comprises a process gas inlet (10), a process gas passage (11) and a process gas outlet (12); the process gas inlet (10), the process gas path (11) and the process gas outlet (12) are communicated in sequence.

4. The waveguide slot microwave plasma source of claim 3, wherein: the lower cover plate (7) comprises a first cover plate (13) and a second cover plate (14); a first cover plate (13) is arranged at the top of the second cover plate (14); a second opening (15) penetrating through the first cover plate (13) and the second cover plate (14) is arranged below the microwave transmitting plate (2); the process gas inlet (10) is arranged on the first cover plate (13); the process gas circuit (11) is arranged between the first cover plate (13) and the second cover plate (14); the process gas outlet (12) is arranged on the inner side of the second opening (15).

5. The waveguide slot microwave plasma source of claim 4, wherein: the process gas outlet (12) comprises a plurality of gas outlet holes; all the small air outlet holes uniformly surround the inner side surface of the second opening (15).

6. A waveguide slot microwave plasma source according to any of claims 1 to 5, characterized in that: a cooling inlet (16) and a cooling outlet (17) are arranged on the side surface of the rectangular waveguide (1); the side surface where the cooling inlet (16) is located is opposite to the side surface where the cooling outlet (17) is located; the cooling outlet (17) comprises a plurality of cooling apertures.

7. A waveguide slot microwave plasma source according to any of claims 1 to 5, characterized in that: a cooling cavity (18) is arranged between the rectangular waveguide (1) and the microwave transmitting plate (2); a plurality of partition plates (19) which are sequentially arranged from front to back are arranged in the cooling cavity (18); the partition plates (19) are used for dividing the cooling cavity (18) into a plurality of cooling single cavities; the side surface of the cooling single cavity is provided with a cooling inlet (16) and a cooling outlet (17); the side surface where the cooling inlet (16) is located is opposite to the side surface where the cooling outlet (17) is located; the cooling outlet (17) comprises a plurality of cooling small holes; the top of each cooling single cavity is provided with a corresponding gap (5).

8. The waveguide slot microwave plasma source of claim 7, wherein: the top of the rectangular waveguide (1) is provided with a plurality of small exhaust holes (20).

9. The waveguide slot microwave plasma source of claim 7, wherein: and a gap plate (21) is arranged between the microwave transmitting plate (2) and the cooling cavity (18).