CN205616946U - Linear evaporation source and coating by vaporization device - Google Patents
Linear evaporation source and coating by vaporization device Download PDFInfo
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- CN205616946U CN205616946U CN201620445036.5U CN201620445036U CN205616946U CN 205616946 U CN205616946 U CN 205616946U CN 201620445036 U CN201620445036 U CN 201620445036U CN 205616946 U CN205616946 U CN 205616946U
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Abstract
The embodiment of the utility model discloses linear evaporation source and coating by vaporization device. This linearity evaporation source includes: including the crucible, still include: be located a set of nozzle on the crucible, a set of reserve nozzle and be located the mobilizable baffle of crucible at least, wherein: a set of nozzle by a plurality of nozzle of evenly distributed on the crucible, each organize reserve nozzle by the reserve nozzle that one side of each nozzle set up in a set of nozzle, have on the baffle and only expose respectively a plurality of trompils of reserve nozzle in each nozzle or a set of reserve nozzle in a set of nozzle. In this scheme, for a set of nozzle is provided with a set of reserve nozzle at least, when a set of nozzle takes place to block up, can change a set of reserve nozzle through movable baffle, like this, compare with prior art's scheme, just need not to suspend the broken vacuum of evaporation process cooling and carry out cleaning treatment to production efficiency has been improved.
Description
Technical field
This utility model relates to Display Technique field, particularly relates to a kind of linear evaporation source and evaporation coating device.
Background technology
In Display Technique field, in the manufacturing process of display, vacuum coating is a kind of more ripe one-tenth
Film mode, is deposited with the material being used for film forming to substrate by linear evaporation source heating.But, due to certain
The particularity of a little materials, during evaporation, easily results in blockage to the nozzle in linear evaporation source, and one
Denier generation blocking is accomplished by cooling vacuum breaker and is carried out processing, and the mobility of equipment is caused the biggest shadow
Ring, reduce production efficiency.Especially, Organic Light Emitting Diode (Organic Light-emitting Diode,
OLED), in the manufacturing process of display, the film forming procedure of organic material is more prone to spray nozzle clogging occur
Problem, production efficiency is the lowest.
Utility model content
The purpose of this utility model embodiment is to provide a kind of linear evaporation source and evaporation coating device, is used for solving now
There is the problem that in technology, linear evaporation source causes production efficiency to reduce because of spray nozzle clogging.
The purpose of this utility model embodiment is achieved through the following technical solutions:
A kind of linear evaporation source, including crucible, also includes: one group of nozzle being positioned on described crucible, at least
One group of nozzle and be positioned at crucible movably baffle plate；Wherein:
Described one group of nozzle is made up of multiple nozzles equally distributed on described crucible；
The nozzle group that described each group of nozzle is arranged by the side of each nozzle in described one group of nozzle
Become；
Have on described baffle plate only expose in described one group of nozzle in each nozzle or one group of nozzle each standby
With multiple perforates of nozzle.
It is preferred that be provided with for controlling the cylinder that described baffle plate moves in the side of described baffle plate.
It is preferred that be provided with for controlling the electromagnetic valve that described baffle plate moves in the side of described baffle plate.
It is preferred that the size of described perforate is not less than described nozzle or the size of described nozzle.
It is preferred that described nozzle and described nozzle is generally circular in shape, described perforate be shaped as rectangle
Or it is circular.
It is preferred that the distance between each described nozzle and nozzle is the most equal.
It is preferred that all described nozzles and described nozzle are uniformly distributed on described crucible.
A kind of evaporation coating device, including the linear evaporation source described in any of the above item.
Having the beneficial effect that of this utility model embodiment:
In a kind of linear evaporation source of this utility model embodiment offer and evaporation coating device, it is that one group of nozzle is arranged
Have least one set nozzle, when there is blocking in one group of nozzle, can by moving stop change one group standby
With nozzle, so, compared with the scheme of prior art, it is no need for interrupting evaporation process cooling vacuum breaker and carries out
Cleaning treatment, thus improve production efficiency.
Accompanying drawing explanation
One of structural representation of a kind of linear evaporation source that Fig. 1 provides for this utility model embodiment；
The two of the structural representation of a kind of linear evaporation source that Fig. 2 provides for this utility model embodiment；
The three of the structural representation of a kind of linear evaporation source that Fig. 3 provides for this utility model embodiment；
The vertical view signal of baffle plate and nozzle in a kind of linear evaporation source that Fig. 4 provides for this utility model embodiment
One of figure；
Baffle plate and the vertical view of nozzle in a kind of linear evaporation source that Fig. 5 provides for this utility model embodiment
One of schematic diagram；
The four of the structural representation of a kind of linear evaporation source that Fig. 6 provides for this utility model embodiment；
The vertical view signal of baffle plate and nozzle in a kind of linear evaporation source that Fig. 7 provides for this utility model embodiment
The two of figure；
Baffle plate and the vertical view of nozzle in a kind of linear evaporation source that Fig. 8 provides for this utility model embodiment
The two of schematic diagram；
The five of the structural representation of a kind of linear evaporation source that Fig. 9 provides for this utility model embodiment；
The six of the structural representation of a kind of linear evaporation source that Figure 10 provides for this utility model embodiment；
The seven of the structural representation of a kind of linear evaporation source that Figure 11 provides for this utility model embodiment.
Detailed description of the invention
A kind of linear evaporation source with embodiment, this utility model provided below in conjunction with the accompanying drawings and evaporation coating device
Illustrate in greater detail.
This utility model embodiment provides a kind of linear evaporation source, including crucible, also includes: be positioned on crucible
One group of nozzle, least one set nozzle and be positioned at crucible movably baffle plate；Wherein:
One group of nozzle is made up of multiple nozzles equally distributed on crucible；
The nozzle that each group nozzle is arranged by the side of nozzle each in one group of nozzle forms；
Have on baffle plate and only expose each nozzle in each nozzle in one group of nozzle or one group of nozzle
Multiple perforates.
In this utility model embodiment, it is that one group of nozzle is provided with least one set nozzle, at one group of nozzle
When there is blocking, one group of nozzle can be changed by moving stop, so, with the scheme of prior art
Compare, be no need for interrupting evaporation process cooling vacuum breaker and be carried out processing, thus improve production efficiency.
Wherein, in nozzle quantity in one group of nozzle and one group of nozzle, the quantity of nozzle is identical, and
The specification of nozzle and nozzle (include size, material, etc.) identical.
When being embodied as, control the movement of baffle plate for convenience, it is preferred that be provided with use in the side of baffle plate
In controlling the cylinder that baffle plate moves.Or, it is provided with for controlling the electromagnetism that baffle plate moves in the side of baffle plate
Valve.
When being embodied as, in order to ensure that be deposited with material can enter nozzle smoothly, it is preferred that perforate
Size is not less than nozzle or the size of nozzle.
When being embodied as, it is preferred that the shape of nozzle and nozzle can be, but not limited to as circle, perforate
Shape can be, but not limited to as rectangle or circle.
When being embodied as, it is preferred that the distance between each nozzle and nozzle is the most equal.
When being embodied as, it is preferred that all nozzles and nozzle are uniformly distributed on crucible.So, may be used
To be further ensured that film forming is uniform.
When being embodied as, the quantity of the perforate on baffle plate can be with one group of nozzle or the number of one group of nozzle
Measure equal, it is also possible to more than one group of nozzle or the quantity of one group of nozzle, as long as guaranteeing only to spill
One group of nozzle or one group of nozzle.
When being embodied as, the group number of nozzle can be set the most flexibly, such as, if being steamed
The material of plating occurs situation about blocking more, can arrange one group or two groups of nozzle, if the material being deposited with
Material occurs situation about blocking the most, then arrange nozzle more than two, certainly can also consider further
Other influence factor, and then determine the group number of set nozzle.
Separately below in case of arranging one group of nozzle and two groups of nozzle, to this utility model
A kind of linear evaporation source that embodiment is provided is described below in greater detail.
Linear evaporation source shown in Figure 1, is that one group of nozzle arranges one group of nozzle, this linear evaporation
Source includes crucible 1, be positioned on crucible 1 one group of nozzle, one group of nozzle and be positioned at crucible 1 and can move
Dynamic baffle plate；Wherein:
One group of nozzle is made up of multiple nozzle 2A equally distributed on crucible 1；
One group of nozzle is made up of nozzle 2B of the side setting of nozzle 2A each in one group of nozzle；
Have on baffle plate and only expose in one group of nozzle each nozzle in each nozzle 2A or one group of nozzle
Multiple perforates 31 of 2B.
Wherein, nozzle 2A is identical with the specification of nozzle 2B.
Wherein, nozzle 2A and nozzle 2B generally circular in shape, perforate be shaped as rectangle.
Wherein, the distance between each nozzle 2A and nozzle 2B is the most equal.
Based on the linear evaporation source shown in Fig. 1, all nozzle 2A and nozzle 2B are uniform on crucible
Distribution, sees Fig. 2, all nozzle 2A and is uniformly distributed, and nozzle 2B is positioned at two nozzle 2A's
Midseptum.
Based on the linear evaporation source shown in Fig. 2, see Fig. 3, be provided with in the side of baffle plate for controlling gear
The cylinder 4 that plate 3 moves.
During evaporation, see Fig. 4, first use nozzle 2A, when there being nozzle 2A that blocking occurs,
Control baffle plate 3 by cylinder 4 to move right, be replaced by nozzle 2B, see Fig. 5.Complete at evaporation
After, then be carried out nozzle 2A processing.During follow-up evaporation, if there being nozzle 2B to occur again
Blocking, then control baffle plate 3 be moved to the left by cylinder 4, it is replaced by nozzle 2A.
In linear evaporation source shown in Fig. 1～Fig. 3, the quantity of the perforate 31 on baffle plate 3 and nozzle 2A or
The quantity of nozzle 2B is equal.Can also arrange the quantity of perforate 31 on baffle plate 3 than nozzle 2A or
Many one of the quantity of nozzle 2B, sees Fig. 6；When only spilling nozzle 2A, the rightest at baffle plate 3
End has the perforate 31 of a residue, top view shown in Figure 7；Baffle plate 3 is controlled to moving to left by cylinder 4
Dynamic, when only spilling nozzle 2B, the high order end at baffle plate 3 has the perforate 31 of a residue, sees Fig. 8
Shown top view.
Linear evaporation source shown in Figure 9, is that one group of nozzle arranges two groups of nozzle, this linear evaporation
Source includes crucible 1, be positioned on crucible 1 one group of nozzle, two groups of nozzle and be positioned at crucible 1 and can move
Dynamic baffle plate 3；Wherein:
One group of nozzle is made up of multiple nozzle 2A equally distributed on crucible 1；
In two groups of nozzle: one group of nozzle is by the side setting of nozzle 2A each in one group of nozzle
Nozzle 2B forms；Another group nozzle is arranged by the side of nozzle 2A each in one group of nozzle
Nozzle 2C forms；
Have on baffle plate and only expose each standby spray in each nozzle 2A, or one group of nozzle in one group of nozzle
Multiple perforates 31 of each nozzle 2C in mouth 2B, or one group of nozzle.
Wherein, nozzle 2A, nozzle 2B and nozzle 2C generally circular in shape, the shape of perforate
For rectangle.
Wherein, the distance between each nozzle 2A and nozzle 2B is the most equal, and each nozzle 2A is with standby
Distance between nozzle 2C is the most equal.
Wherein, all nozzle 2A, nozzle 2B and nozzle 2C are uniformly distributed on crucible.From
It can be seen that all nozzle 2A are uniformly distributed in figure, and it is uniformly distributed between the interval of two nozzle 2A
There are nozzle 2B and nozzle 2C.
Based on the linear evaporation source shown in Fig. 9, see Figure 10, be provided with in the side of baffle plate for controlling gear
The cylinder 4 that plate 3 moves.
During evaporation, first use nozzle 2A, when there being nozzle 2A that blocking occurs, by cylinder 4
Control baffle plate 3 to move right, be replaced by nozzle 2B, if during this is deposited with, nozzle
2B also blocks, then is controlled baffle plate 3 moved right by cylinder 4, is replaced by nozzle 2C.?
After being deposited with, then it is carried out nozzle 2A and nozzle 2B processing.In follow-up evaporation process
In, if there being nozzle 2C to block again, then control baffle plate 3 be moved to the left by cylinder 4, change
For nozzle 2B or nozzle 2A.
In linear evaporation source shown in Fig. 9 and Figure 10, the quantity of the perforate 31 on baffle plate 3 and nozzle 2A
Or the quantity of nozzle 2B or nozzle 2C is equal.Perforate 31 on baffle plate 3 can also be set
Many one of the quantity quantity than nozzle 2A or nozzle 2B or nozzle 2C, sees Figure 11.
It should be noted that during utilizing linear evaporation source to be deposited with, when there is blocking in nozzle,
The scheme that this utility model embodiment is provided can be used.Such as, in the making of OLED display
During, during some organic material film forming, the situation that blocking occurs is more, it is possible to arrange least one set standby
Use nozzle.
Based on same design, this utility model embodiment also provides for a kind of evaporation coating device, including any of the above
Linear evaporation source described in embodiment.
In a kind of linear evaporation source of this utility model embodiment offer and evaporation coating device, it is that one group of nozzle is arranged
Have least one set nozzle, when there is blocking in one group of nozzle, can by moving stop change one group standby
With nozzle, so, compared with the scheme of prior art, it is no need for interrupting evaporation process cooling vacuum breaker and carries out
Cleaning treatment, thus improve production efficiency.
Although having been described for preferred embodiment of the present utility model, but those skilled in the art once learning
Basic creative concept, then can make other change and amendment to these embodiments.So, appended power
Profit requires to be intended to be construed to include preferred embodiment and fall into all changes of this utility model scope and repair
Change.
Obviously, those skilled in the art this utility model can be carried out various change and modification without deviating from
Spirit and scope of the present utility model.So, if these amendments of the present utility model and modification belong to this reality
Within the scope of novel claim and equivalent technologies thereof, then this utility model is also intended to comprise these changes
With including modification.
Claims (8)
1. a linear evaporation source, including crucible, it is characterised in that also include: be positioned on described crucible
One group of nozzle, least one set nozzle and be positioned at crucible movably baffle plate；Wherein:
Described one group of nozzle is made up of multiple nozzles equally distributed on described crucible；
The nozzle group that described each group of nozzle is arranged by the side of each nozzle in described one group of nozzle
Become；
Have on described baffle plate only expose in described one group of nozzle in each nozzle or one group of nozzle each standby
With multiple perforates of nozzle.
Linear evaporation source the most according to claim 1, it is characterised in that in the side of described baffle plate
It is provided with for controlling the cylinder that described baffle plate moves.
Linear evaporation source the most according to claim 1, it is characterised in that in the side of described baffle plate
It is provided with for controlling the electromagnetic valve that described baffle plate moves.
4. according to the linear evaporation source described in any one of claims 1 to 3, it is characterised in that described perforate
Size not less than described nozzle or the size of described nozzle.
Linear evaporation source the most according to claim 4, it is characterised in that described nozzle and described standby
Generally circular in shape with nozzle, described perforate be shaped as rectangle or circle.
6. according to the linear evaporation source described in any one of claims 1 to 3, it is characterised in that each described
Distance between nozzle with nozzle is the most equal.
7. according to the linear evaporation source described in any one of claims 1 to 3, it is characterised in that all described
Nozzle and described nozzle are uniformly distributed on described crucible.
8. an evaporation coating device, it is characterised in that include the linear steaming described in any one of claim 1～7
Rise.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620445036.5U CN205616946U (en) | 2016-05-16 | 2016-05-16 | Linear evaporation source and coating by vaporization device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620445036.5U CN205616946U (en) | 2016-05-16 | 2016-05-16 | Linear evaporation source and coating by vaporization device |
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| Publication Number | Publication Date |
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| CN205616946U true CN205616946U (en) | 2016-10-05 |
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| CN201620445036.5U Active CN205616946U (en) | 2016-05-16 | 2016-05-16 | Linear evaporation source and coating by vaporization device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108977774A (en) * | 2018-08-29 | 2018-12-11 | 京东方科技集团股份有限公司 | Crucible, evaporation coating device and evaporation coating method |
| WO2019000491A1 (en) * | 2017-06-28 | 2019-01-03 | 武汉华星光电半导体显示技术有限公司 | Evaporation source device for vapor deposition |
| CN109234682A (en) * | 2017-07-10 | 2019-01-18 | 合肥欣奕华智能机器有限公司 | A kind of linear evaporation source and vacuum deposition apparatus |
| CN109306454A (en) * | 2018-10-26 | 2019-02-05 | 武汉华星光电半导体显示技术有限公司 | Evaporation coating device and its control method |
| CN110523097A (en) * | 2019-09-19 | 2019-12-03 | 天津科斯特汽车技术有限责任公司 | Spray drying system is used in a kind of preparation of cell positive material |
| CN113957390A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
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2016
- 2016-05-16 CN CN201620445036.5U patent/CN205616946U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019000491A1 (en) * | 2017-06-28 | 2019-01-03 | 武汉华星光电半导体显示技术有限公司 | Evaporation source device for vapor deposition |
| CN109234682A (en) * | 2017-07-10 | 2019-01-18 | 合肥欣奕华智能机器有限公司 | A kind of linear evaporation source and vacuum deposition apparatus |
| CN108977774A (en) * | 2018-08-29 | 2018-12-11 | 京东方科技集团股份有限公司 | Crucible, evaporation coating device and evaporation coating method |
| CN109306454A (en) * | 2018-10-26 | 2019-02-05 | 武汉华星光电半导体显示技术有限公司 | Evaporation coating device and its control method |
| CN110523097A (en) * | 2019-09-19 | 2019-12-03 | 天津科斯特汽车技术有限责任公司 | Spray drying system is used in a kind of preparation of cell positive material |
| CN113957390A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
| CN113957390B (en) * | 2020-07-21 | 2024-03-08 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
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