CN203117930U - Touch control electrode structure - Google Patents
Touch control electrode structure Download PDFInfo
- Publication number
- CN203117930U CN203117930U CN 201220708966 CN201220708966U CN203117930U CN 203117930 U CN203117930 U CN 203117930U CN 201220708966 CN201220708966 CN 201220708966 CN 201220708966 U CN201220708966 U CN 201220708966U CN 203117930 U CN203117930 U CN 203117930U
- Authority
- CN
- China
- Prior art keywords
- etching
- optical layers
- touch
- control electrode
- electrode layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Landscapes
- Position Input By Displaying (AREA)
Abstract
The utility model discloses a touch control electrode structure, which comprises a base plate, an electrode layer, a first etching-prevention optical layer, a second etching-prevention optical layer and a signal lead wire, wherein the base plate defines a sensing region and a lead wire region surrounding the sensing region, the electrode layer is arranged on the base plate and is divided into an etching region and a non-etching region, the first etching-prevention optical layer is arranged on the non-etching region of the electrode layer, the second etching-prevention optical layer is arranged on the first etching-prevention optical layer and the base plate, in addition, at least bare parts of the first etching-prevention optical layer and the second etching-prevention optical layer are positioned at the electrode layer of the non-etching region of the lead wire region, and the signal lead wire is arranged in the lead wire region and is electrically connected with the electrode layer of the bare non-etching region. Through regulating the refractive index of the first etching-prevention optical layer and the second etching-prevention optical layer, the appearance difference of the etched etching region and the non-etching region can be reduced.
Description
Technical field
The utility model relates to touch technology, particularly relates to a kind of touch-control electrode structure.
Background technology
In traditional touch-control electrode structure manufacturing process, topmost step comprises the formation of electrode structure and the formation of the signal lead that is connected electrode structure, in these two steps, need to use for the mask of definition electrode pattern respectively and be used for the mask of definition signal lead-in wire join domain.In traditional manufacturing process, mask generally all needs extra step to remove after finishing above fabrication steps.
On the other hand, in order to make the touch-control electrode structure when being applied to touch control display apparatus, have good visual effect, after forming the touch-control sensing plot structure, need to increase extra optical layers on the touch-control electrode structure usually, to regulate the display effect of contactor control device.
Therefore not only flow process is loaded down with trivial details for traditional touch-control electrode structure manufacturing process, and need pay extra cost aspect the adjustment of display effect.
The utility model content
Based on this, be necessary to provide a kind of touch-control electrode structure, it has less processing step and visual effect preferably.
A kind of touch-control electrode structure comprises:
One substrate, this substrate define a sensing area and a lead district around this sensing area;
One electrode layer is arranged on this substrate, and this electrode layer is divided into an etching region and a non-etching region;
One first anti-etching optical layers is arranged on the non-etching region of this electrode layer;
One second anti-etching optical layers is arranged on this first anti-etching optical layers and this substrate, and this first anti-etching optical layers with this second prevent the etching optical layers at least exposed part be positioned at the electrode layer of this non-etching region of this lead district;
One signal lead is arranged in this lead district, and electrically connects the electrode layer of this exposed non-etching region.
By regulating the refractive index of the first anti-etching optical layers and the second anti-etch layer, can alleviate the difference in appearance that etching after etching district and non-etching region exist.
Description of drawings
Fig. 1 is the process chart of an embodiment touch-control electrode structure.
Fig. 2 a ~ Fig. 2 h is the vertical view for the corresponding touch-control electrode structure of each step in the process chart shown in Figure 1.
Fig. 2 a ' ~ Fig. 2 f ', Fig. 2 g '-1, Fig. 2 h '-1 are respectively Fig. 2 a ~ Fig. 2 h along the cut-open view of B-B ' direction, and Fig. 2 g '-2, Fig. 2 h '-2 are respectively Fig. 2 g and Fig. 2 h along the cut-open view of C-C ' direction.
Fig. 2 i-1 and Fig. 2 i-2 are respectively the sectional view of an embodiment touch-control electrode structure etching region and non-etching region.
Fig. 3 a ~ Fig. 3 c is for forming the vertical view of another embodiment touch-control electrode structure of the utility model.
Fig. 3 a ', Fig. 3 b '-1, Fig. 3 c '-1 are respectively Fig. 3 a ~ Fig. 3 c along the cut-open view of B-B ' (or C-C '), and Fig. 3 b '-2, Fig. 3 c '-2 are divided into Fig. 3 b and Fig. 3 c along the cut-open view of C-C ' direction.
Fig. 4 a ~ Fig. 4 b is the vertical view of the utility model the 3rd embodiment touch-control electrode structure.
Fig. 5 is the process chart of another embodiment touch-control electrode structure.
Fig. 6 a is for adopting the vertical view of the corresponding touch-control electrode structure of part steps in the process chart shown in Figure 5;
Fig. 6 a '-1 be Fig. 6 a along the cut-open view of B-B ' (or C-C '), Fig. 6 a '-2 is that Fig. 6 a is along the cut-open view of C-C '.
Fig. 7 a is a kind of vertical view that adopts the utility model touch control display apparatus.
Fig. 7 b is the sectional view corresponding to Fig. 7 a touch control display apparatus.
Fig. 8 a has illustrated the touch-control electrode structure of the another embodiment of the utility model.
Fig. 8 b and Fig. 8 c are the vertical view corresponding to touch control component on the touch-control electrode structure second surface of Fig. 8 a.
Fig. 9 is the cut-open view of the touch control display apparatus of a kind of Fig. 8 a touch-control electrode structure of employing.
Figure 10 and Figure 11 are two kinds of diagrams that can be used for electrode layer in the utility model touch-control electrode structure.
Embodiment
As described in Figure 1, Fig. 1 has illustrated a kind of process chart that can be used for making the utility model touch-control electrode structure.This manufacturing process flow may further comprise the steps.
S101: prepare a substrate.With reference to figure 2a ' and Fig. 2 a, substrate 110 adopts the material that can have an X-rayed, as glass substrate or poly terephthalic acid class plastics (Polyethylene terephthalate, PET).Substrate 110 can be plane or curve form, to adapt to different touch-control products.Substrate 110 also can be hard substrate maybe can disturb the formula substrate.Substrate 110 has first surface S1 and second surface S2, and first surface S1 is relative with second surface S2.Substrate 110 defines the zone of sensing area A1(Fig. 2 a dotted line) and around the lead district A2 of sensing area A1.
S102: form an electrode layer on substrate.With reference to figure 2b ' and Fig. 2 b, electrode layer 130a is formed on the first surface S1 of substrate 110.Electrode layer 130a can adopt nanometer filamentary silver (Silver Nano-Wire, SNW) layer, carbon nano-tube (Carbon nanotube, CNT) layer, Graphene (Graphene) layer, conductive polymer (Conductive Polymer) layer and oxidized metal (ITO, AZO ... Gel) layer waits the material that can have an X-rayed.The mode that forms electrode layer 130a can adopt technologies such as deposition, sputter.
S103: form a protective seam on electrode layer.With reference to figure 2c ' and Fig. 2 c, go up formation protective seam 140 in electrode layer 130a.For easy oxidized material such as nanometer filamentary silver, protective seam 140 is electrode layer 130a and air insulated, and then helps to improve the oxidation resistance of electrode layer 130.Simultaneously, because the Nano Silver wire material self has certain density, protective seam 140 can by selecting the material that preferable adhesion is arranged with substrate 110 for use, help to improve the nanometer filamentary silver at the adhesion of substrate 110 by gap and the substrate contacts of nanometer filamentary silver.The material of protective seam 140 adopts the insulating material that can have an X-rayed, as silicon dioxide.The thickness of protective seam is 50nm to 500nm.
S104: form one first anti-etching optical layers on protective seam.With reference to figure 2d ' and Fig. 2 d, the first anti-etching optical layers 150 is formed on the protective seam 140.The first anti-etching optical layers 150 has the shape of patterning, in order to define the electrode structure of electrode layer.The insulating material that this first anti-etching optical layers 150 can adopt acryl polymkeric substance (Acrylate Polymer) and epoxy resin (Epoxide Resin) etc. to have an X-rayed is made.The mode that forms the first anti-etching optical layers 150 can adopt printing (printing) technology.The thickness of the first anti-etching optical layers is 0.05um to 5um.
S105: this electrode layer that etching is not blocked by this first anti-etching optical layers, then the electrode layer of this after etching is divided into an etching region and a non-etching region.With reference to figure 2e ' and Fig. 2 e, after etching, electrode layer 130b comprises etching region M and non-etching region N.In etching process, because the thinner thickness of protective seam 140, the permeable protective seam 140 of etching solution, and then the electrode layer 130a of etching region M carried out etching.Electrode layer 130b shown in Fig. 2 e and Fig. 2 e, non-etching region N forms the electrode structure identical with the first anti-etching optical layers 150 defined figures, in the present embodiment, electrode structure comprises a plurality of along the sensing electrode of first axial array, and each sensing electrode self-inductance measurement district A1 extends to lead district A2.Etched electrodes layer 130a can adopt incomplete etched technology, namely under the prerequisite that the electrode layer 130b of the electrode layer 130b that guarantees etching region M and non-etching region N is electrically insulated, only etches away the electrode layer 130b of partially-etched district M.Adopt incomplete etched technology, can avoid etching region M and non-etching region N electrode layer aberration excessive.In another embodiment, also can adopt complete etched technology.
S106: form one second anti-etching optical layers, second anti-etching optical layers exposed part at least is positioned at first of lead district and prevents the etching optical layers.With reference to figure 2f ' and Fig. 2 f, the second anti-etching optical layers 160 is formed on the first anti-etching optical layers 150 and the protective seam 140, and the second anti-etching optical layers 160 is in order to the join domain of definition signal lead-in wire.Second anti-etching optical layers 160 exposed parts are positioned at the first anti-etching optical layers 150 of lead district A2.The insulating material that the second anti-etching optical layers 160 adopts acryl polymkeric substance (Acrylate Polymer) and epoxy resin (Epoxide Resin) etc. to have an X-rayed is made.Form the second anti-etching optical layers 160 and can adopt printing (printing) technology.The thickness of the second anti-etching optical layers 160 is 0.05 um to 5um.
S107: first anti-etching optical layers and the protective seam that etching is not blocked by the second anti-etching optical layers makes that the electrode layer of the non-etching region that lead district is interior is at least part of exposed.With reference to figure 2g '-1, Fig. 2 g '-2 and Fig. 2 g, first anti-etch layer 160 and the protective seam 140 that adopts the etch process etching not blocked by the second anti-etching optical layers 160 makes the electrode layer 130b of non-etching region N partly exposed.
S108: form a signal lead.With reference to figure 2h '-1, Fig. 2 h '-2 and Fig. 2 h, signal lead 170 is formed on the substrate 110, and signal lead 170 is positioned at lead district A2, the electrode layer 130b of the non-etching region N that signal lead 170 electric connections are exposed.In the present embodiment, an end of each signal lead 170 electrically connects with each sensing electrode respectively, and the other end of each signal lead 170 converges to a bonding land A3.It should be noted that the number of bonding land A3 and position can adjust according to the number of sensing electrode.Convergence to the signal lead 170 of bonding land A3 is connected to (not shown) on the controller by engaging a flexible circuit board, and handles the signal that is transmitted by signal lead 170 by controller.Signal lead 170 can adopt alloy materials such as metal materials such as conductive material that tin indium oxide etc. can have an X-rayed, silver, aluminium or molybdenum aluminium molybdenum, or aforementioned combination.
With reference to figure 2h '-1, Fig. 2 h '-2 and Fig. 2 h, through above-mentioned technology resulting touch-control electrode structure, this touch-control electrode structure comprises: substrate 110, substrate 110 define sensing area A1 and lead district A2 around sensing area; Electrode layer 130b is arranged on the substrate 110, and electrode layer 130b is divided into etching region M and non-etching region N; Protective seam 140 is arranged on this electrode layer 130b and this substrate 110; The first anti-etching optical layers 150 is arranged on the protective seam 140 of non-etching region N of electrode layer 130b; The second anti-etching optical layers 160 is arranged on protective seam 140 and the first anti-etching optical layers 150, and protective seam 140, the first anti-etching optical layers 150 and second anti-etching optical layers 160 exposed parts are positioned at the electrode layer 130b of the non-etching region N of lead district A2; Signal lead 170 is arranged in the lead district A2, and electrically connects the electrode layer 130b of exposed non-etching region N.In the present embodiment, signal lead 170 is positioned on the substrate 110.Other characteristic of each parts of present embodiment touch-control electrode structure describes in detail in forming technology, so locate to repeat no more.
Other please also refer to Fig. 2 h '-1, Fig. 2 h '-2, Fig. 2 i-1 and Fig. 2 i-2; be positioned on the electrode layer of etching region M of sensing area A1 and be formed with protective seam 140, the second anti-etching optical layers 160 successively, be formed with protective seam 140, the first anti-etching optical layers 150 and the second anti-etching optical layers 160 on the electrode layer of non-etching region N successively.By regulating the refractive index of protective seam 140, the first anti-etching optical layers 150, the second anti-etching optical layers 160; can alleviate the difference in appearance through etching after etching district M and non-etching region N existence; follow-up when this touch-control electrode structure is applied to touch control display apparatus to guarantee, can obtain better visual effect.In one embodiment, the refractive index than the first anti-etching optical layers 150 is big by 0.1 at least than the refractive index of refractive index big 0.1, the second anti-etching optical layers 160 of protective seam 140 at least for the refractive index of the first anti-etching optical layers 150.The refractive index of protective seam 140, the first anti-etching optical layers 150, the second anti-etching optical layers 160 can adjust according to the refractive index of different electrode layer material.In addition, the thickness of protective seam 140 can be to 50nm to 500nm, and this thickness range can guarantee that etching solution more easily permeates when etched electrodes layer 130a; The thickness of the first anti-etching optical layers 150 and the second anti-etching optical layers 160 can be and is 0.05um to 5um, and this thickness range is conducive to guarantee the light transmittance of whole touch-control electrode structure.In addition, than traditional manufacturing process, do not relate to the mask of the electrode pattern that remove to be used for definition electrode layer 130a in the technological process of present embodiment and remove step in order to the mask of definition signal lead-in wire join domain, therefore processing step can be still less, the time of processing procedure also can be shorter, can improve the efficient of this technology.
In another embodiment of the present utility model; be formed with the hollow out zone on the second anti-etching optical layers; be formed with the through hole corresponding to the hollow out zone on protective seam and the first anti-etching optical layers; signal lead is formed on second protective seam, and electrically connects the electrode layer of exposed non-etching region by hollow out zone and through hole.More specifically, can be with reference to following detailed description.
With reference to figure 3a ' and Fig. 3 a, be with the previous embodiment difference, the second anti-etching optical layers 160 that forms in step S106 includes hollow out zone 161, the second anti-etching optical layers 160 are positioned at lead district A2 by hollow out zone 161 exposed parts the first anti-etching optical layers 150.In the present embodiment, hollow out zone 161 exposes the anti-etching optical layers 150 of first on each sensing electrode that is positioned at lead district A2.
Further with reference to figure 3b '-1, Fig. 3 b '-2 and Fig. 3 b; can adopt the technology identical with last embodiment; first anti-etching optical layers 150 and the protective seam 140 at 161 places, etching hollow out zone can be prevented the through hole that etching optical layers 150 and protective seam 140 form corresponding to hollow out zone 161 first.
Further with reference to figure 3c '-1, Fig. 3 c '-2 and Fig. 3 c, can adopt the technology identical with last embodiment, form signal lead 170 in lead district A2, signal lead 170 is formed on the second anti-etching optical layers 160, and electrically connects each sensing electrode by hollow out zone 161 and through hole.Other characteristic of present embodiment touch-control electrode structure is identical with last embodiment, repeats no more herein.
Other please refer to Fig. 4 a and Fig. 4 b; after the touch-control electrode structure of step S107 formation as Fig. 2 g or Fig. 3 a; the step that can comprise a removal second anti-etching optical layers 160; be that touch-control electrode structure of the present utility model can reach the purpose that alleviates through the difference in appearance of etching after etching district M and non-etching region N existence only by regulating protective seam 140 and first anti-etching optical layers 150 refractive indexes.
Other please refer to Fig. 5, Fig. 6 a '-1, Fig. 6 a '-2 and Fig. 6 a, Fig. 5 has illustrated the another kind of process chart that can be used for making the utility model touch-control electrode structure, and Fig. 6 a '-1, Fig. 6 a '-2 and Fig. 6 a are the touch-control electrode structure that technological process that a kind of Fig. 5 of employing illustrates forms.The technological process difference that illustrates with Fig. 1 is; when electrode layer adopts oxidized metal (ITO; AZO ... Gel) oxidation resistance such as layer and adhesion are preferably during material; can omit the step that forms protective seam; namely directly form the first corrosion protection optical layers (step 203) on electrode layer; the electrode layer (step 204) that do not blocked by the first corrosion protection optical layers of etching then; form the second anti-etching optical layers (step 205) then; second anti-etching optical layers exposed part at least is positioned at first of lead district and prevents the etching optical layers; etching is not prevented the first anti-etching optical layers that the etching optical layers is blocked by second then; expose the electrode layer of the non-etching region that is positioned at lead district, form signal lead at last.The technology that other characteristic and Fig. 1 of the technology that Fig. 5 illustrates illustrate is identical, repeats no more herein.
Illustrate as Fig. 6 a '-1, Fig. 6 a '-2 and Fig. 6 a ', according to the making technology of Fig. 5, the touch-control electrode structure of formation comprises: substrate 210, substrate 210 define sensing area A1 with around the lead district A2 of sensing area; Electrode layer 230b is arranged on the substrate 210, and electrode layer 230b is divided into etching region M and non-etching region N; The first anti-etching optical layers 250 is arranged on the non-etching region N of electrode layer 230b; The second anti-etching optical layers 260 is arranged on this first anti-etching optical layers 250 and this substrate 210, and the first anti-etching optical layers 250 and second prevents that etching optical layers 260 exposed parts are positioned at the electrode layer 230b of the non-etching region N of lead district A2; Signal lead 270 is arranged in the lead district A2, and electrically connects the electrode layer of exposed non-etching region N.In the present embodiment, signal lead 270 is arranged on the substrate 210.In another embodiment, be formed with the hollow out zone on the second anti-etching optical layers 260, be formed with the through hole corresponding to the hollow out zone on the first anti-etching optical layers 250, signal lead 270 is by the electrode layer 230b electric connection with the non-etching region N that is positioned at lead district A2 of hollow out zone and through hole.Other characteristic of present embodiment touch-control electrode structure is identical with previous embodiment, repeats no more herein.
Please refer to Fig. 7 a and Fig. 7 b, Fig. 7 a has illustrated a kind of top view that adopts the touch control display apparatus of the utility model touch-control electrode structure, and Fig. 7 b has illustrated a kind of cut-open view corresponding to Fig. 7 a touch control display apparatus.In the present embodiment, touch control display apparatus 10 has a viewing area A4 and an ornamental area A5 around viewing area A4, include the cover plate 11, the first touch-control electrode structure 12, the second touch-control electrode structure 13, the demonstration module 14 that stack gradually, these assemblies engage by bonding coat G.Wherein, cover plate 11 adopts the material that can have an X-rayed, as glass.Cover plate 11 can be shapes such as plane or curved surface, to adapt to different touch-control products.In the present embodiment, cover plate 11 is formed with shielding layer 11a with the side that the first touch-control electrode structure 12 engages, the part that is positioned at ornamental area A5, and shielding layer 11a is formed with the pattern of hollow out, as mac function pattern or Logo.In another embodiment, decorative layer 11a also can be arranged at a side of 11 disengaged of cover plates.Shielding layer 11a can adopt materials such as colored ink or coloured photoresistance.The side that cover plate is 11 disengaged also can be formed with functional layers such as Bewildering resistance layer, anti-soil layer.The first touch-control electrode structure 12 and the second touch-control electrode structure 13 can adopt the touch-control electrode structure of previous embodiment, and wherein 12b and 13b are substrate, and 12a and 13a are for being formed at touch-control electrode assemblie on the substrate.Preferably, the first touch-control electrode structure 12 is vertical mutually with sensing electrode on the second touch-control electrode structure 13.Be formed at the interior shielding layer 11a of ornamental area A5 in order to cover the signal lead in the first touch-control electrode structure 12 and the second touch-control electrode structure, the 13 lead district A2.Show that module 14 can adopt display panels or other display panel.Bonding coat G adopts the jointing material that can have an X-rayed, as solid state optics glue (Solid Optical Clear Adhesive), liquid optical cement (Liquid Optical Clear Adhesive).In the present embodiment, bonding coat G is the distribution of whole property.In other embodiments, bonding coat G can be local distribution, as only being distributed in ornamental area A5.
With reference to figure 8a, Fig. 8 a has illustrated the synoptic diagram of another touch-control electrode structure of the utility model, the first surface S1 that is substrate 110 forms after the touch-control electrode assemblie, can further adopt the manufacturing process of Fig. 1 (or Fig. 5), forms the touch-control electrode assemblie in the second surface S2 of substrate 110.More specifically, shown in Fig. 8 b or Fig. 8 c, the touch-control electrode assemblie on the substrate 110 second surface S2 comprises the electrode layer 230b of patterning, and electrode layer 230b is made up of a plurality of sensing electrodes along second axial array.Other characteristic of the touch-control electrode assemblie of second surface S2 is identical with previous embodiment, repeats no more herein.
With reference to figure 9, Fig. 9 has illustrated a kind of touch control display apparatus of the Fig. 8 of employing a touch-control electrode structure.Touch control display apparatus 20 includes cover plate 21, touch-control electrode structure 22, the demonstration module 24 that stacks gradually, and those assemblies engage by bonding coat G.The periphery of its cover plate 21 is formed with shielding layer 21a.Touch-control electrode structure 22 comprises substrate 22b, and the first surface of substrate 22b and second surface are formed with touch-control electrode assemblie 22a and 22c respectively.The touch control display apparatus 10 that cover plate 21, shielding layer 21a, demonstration module 24, other characteristic and Fig. 5 b of bonding coat G illustrate is identical, repeats no more herein.
With reference to Figure 10 and Figure 11, the utility model can be in order to the touch-control electrode structure of the individual layer that forms other type, as the triangular structure of the symmetrical distribution among Figure 10, and staggered pectination as shown in figure 11.
Than traditional manufacturing process, do not relate to the etching mask of removing the electrode pattern that is used for the definition electrode layer and the step of removing the mask of the join domain that goes between in order to definition signal in the technological process of the present utility model, therefore processing step can be still less, the time of processing procedure also can be shorter, can improve the efficient of this technology.The utility model can alleviate the difference in appearance that etching after etching district and non-etching region exist by regulating the refractive index of the first anti-etching optical layers and the second anti-etch layer simultaneously, and then helps to improve the appearance effect of touch control display apparatus.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model claim.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the utility model design, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
1. a touch-control electrode structure is characterized in that, comprising:
One substrate, this substrate define a sensing area and a lead district around this sensing area;
One electrode layer is arranged on this substrate, and this electrode layer is divided into an etching region and a non-etching region;
One first anti-etching optical layers is arranged on the non-etching region of this electrode layer;
One second anti-etching optical layers is arranged on this first anti-etching optical layers and this substrate, and this first anti-etching optical layers with this second prevent the etching optical layers at least exposed part be positioned at the electrode layer of this non-etching region of this lead district;
One signal lead is arranged in this lead district, and electrically connects the electrode layer of this exposed non-etching region.
2. touch-control electrode structure according to claim 1 is characterized in that, more is formed with a protective seam on the described electrode layer, and this protective seam is arranged between this electrode layer and this first anti-etching optical layers.
3. touch-control electrode structure according to claim 2 is characterized in that, the thickness of described protective seam is to 50nm to 500nm.
4. touch-control electrode structure according to claim 2 is characterized in that, the refractive index of the described first anti-etching optical layers is bigger by 0.1 than the refractive index of described protective seam at least.
5. according to claim 1 or 4 described touch-control electrode structures, it is characterized in that the refractive index of the described second anti-etching optical layers refractive index than the described first anti-etching optical layers at least is big by 0.1.
6. touch-control electrode structure according to claim 1, it is characterized in that, be formed with the hollow out zone on the described second anti-etching optical layers, be formed with the through hole corresponding to this hollow out zone on the described first anti-etching optical layers, described signal lead is positioned on this second anti-etching optical layers, and electrically connects the electrode layer of this exposed non-etching region by this hollow out zone and this through hole.
7. touch-control electrode structure according to claim 1 is characterized in that, described signal lead is arranged on this substrate.
8. touch-control electrode structure according to claim 1 is characterized in that, the thickness of the described first anti-etching optical layers is 0.05um to 5um.
9. touch-control electrode structure according to claim 1 is characterized in that, the thickness of the described second anti-etching optical layers is 0.05um to 5um.
10. touch-control electrode structure according to claim 1 is characterized in that, the described first anti-etching optical layers and the second anti-etching optical layers adopt the insulating material that can have an X-rayed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220708966 CN203117930U (en) | 2012-12-18 | 2012-12-18 | Touch control electrode structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220708966 CN203117930U (en) | 2012-12-18 | 2012-12-18 | Touch control electrode structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203117930U true CN203117930U (en) | 2013-08-07 |
Family
ID=48898258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220708966 Expired - Lifetime CN203117930U (en) | 2012-12-18 | 2012-12-18 | Touch control electrode structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203117930U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014094624A1 (en) * | 2012-12-18 | 2014-06-26 | 宸鸿光电科技股份有限公司 | Touch control electrode structure and manufacturing process therefor |
| CN105224115A (en) * | 2014-06-12 | 2016-01-06 | 宸鸿科技(厦门)有限公司 | Curved surface contact panel and wearable device |
| CN105242799A (en) * | 2014-06-12 | 2016-01-13 | 宸鸿科技(厦门)有限公司 | Curved surface touch display module and wearable equipment |
| CN105891292A (en) * | 2016-05-28 | 2016-08-24 | 惠州市力道电子材料有限公司 | High-conductivity interdigital electrode and preparing method and application thereof |
| CN106527826A (en) * | 2017-01-09 | 2017-03-22 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method therefor, and display device |
| CN108334240A (en) * | 2018-03-20 | 2018-07-27 | 武汉华星光电半导体显示技术有限公司 | Production method, touch panel and the display equipment of touch panel |
-
2012
- 2012-12-18 CN CN 201220708966 patent/CN203117930U/en not_active Expired - Lifetime
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014094624A1 (en) * | 2012-12-18 | 2014-06-26 | 宸鸿光电科技股份有限公司 | Touch control electrode structure and manufacturing process therefor |
| CN105224115A (en) * | 2014-06-12 | 2016-01-06 | 宸鸿科技(厦门)有限公司 | Curved surface contact panel and wearable device |
| CN105242799A (en) * | 2014-06-12 | 2016-01-13 | 宸鸿科技(厦门)有限公司 | Curved surface touch display module and wearable equipment |
| CN105224115B (en) * | 2014-06-12 | 2018-08-21 | 宸鸿科技(厦门)有限公司 | Curved surface touch panel and wearable device |
| CN105242799B (en) * | 2014-06-12 | 2018-08-21 | 宸鸿科技(厦门)有限公司 | Curved surface touch-control display module and wearable device |
| CN105891292A (en) * | 2016-05-28 | 2016-08-24 | 惠州市力道电子材料有限公司 | High-conductivity interdigital electrode and preparing method and application thereof |
| CN106527826A (en) * | 2017-01-09 | 2017-03-22 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method therefor, and display device |
| CN106527826B (en) * | 2017-01-09 | 2020-05-01 | 京东方科技集团股份有限公司 | Touch screen, manufacturing method thereof and display device |
| CN108334240A (en) * | 2018-03-20 | 2018-07-27 | 武汉华星光电半导体显示技术有限公司 | Production method, touch panel and the display equipment of touch panel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203117930U (en) | Touch control electrode structure | |
| CN103777793B (en) | Contact panel and preparation method thereof | |
| US20140022467A1 (en) | Touch panel and method for manufacturing the same | |
| TWI550463B (en) | Conductive film and method for manufacturing the same | |
| TWI497391B (en) | Capacitive-type transparent conductivie film and method for production thereof | |
| TW201445409A (en) | Single-layer multi-point touch-control conductive film and method for producing the same | |
| US10932364B2 (en) | Transparent conductive film | |
| CN109976596A (en) | Touch-control sensing unit | |
| US20090051668A1 (en) | Touch Panel Structure | |
| CN103870044A (en) | Touch electrode structure and manufacturing process thereof | |
| JP6070675B2 (en) | Method for producing transparent conductive substrate and touch panel sensor | |
| CN105022545A (en) | Ultra-thin rollable capacitive touch screen made from polyimide substrate and manufacturing method of ultra-thin rollable capacitive touch screen | |
| TWI492356B (en) | Conductive film and electrode layer of touch panel, manufacturing method thereof, and touch panel thereof | |
| CN109545436A (en) | Transparent conductive film, touch screen and preparation method thereof | |
| CN203117929U (en) | Touch electrode structure | |
| TW201525795A (en) | Method for making touch panel | |
| TWI396126B (en) | Manufacturing method of touch panel | |
| KR101496250B1 (en) | Touch Panel and Method for Making the Same | |
| CN103870043B (en) | touch electrode structure and its manufacturing process | |
| CN109545444A (en) | Transparent conductive film, touch screen and preparation method thereof | |
| JP2014199555A (en) | Electrode member for touch panel, manufacturing method of electrode member for touch panel, touch panel and image display article | |
| KR101428009B1 (en) | Touch Panel and Method for Making the Same | |
| CN202838265U (en) | Structure of touch device | |
| CN109545441A (en) | Transparent conductive film, touch screen and preparation method thereof | |
| JP2014199565A (en) | Electrode member for touch panel and manufacturing method of electrode member for touch panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130807 |
|
| CX01 | Expiry of patent term |