CN1978356B - Substrate conveying system, substrate conveying device and substrate treatment device - Google Patents
Substrate conveying system, substrate conveying device and substrate treatment device Download PDFInfo
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- CN1978356B CN1978356B CN2006101642025A CN200610164202A CN1978356B CN 1978356 B CN1978356 B CN 1978356B CN 2006101642025 A CN2006101642025 A CN 2006101642025A CN 200610164202 A CN200610164202 A CN 200610164202A CN 1978356 B CN1978356 B CN 1978356B
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- handling part
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
Abstract
The purpose of this invention is to transport substrate to avoid coating film uneven on the glass substrate. In front and back of the support for resist coating processing components, the first transporter and the second transporter is arranged. The second transporter comprises plural rollers arrange at Y direction, holder for supporting rollers and track board for fixing holder. A rotary driver part makes rollers rotated and a horizontal driver part makes the holder advanced and retreated along Y direction is arranged on the holder. Lift pin groups lift free and independent for each other are arranged on the support. In the station of the glass substrate uplifted by lift pin groups, rollers enter under the glass substrate and take over it. The roller rotates and transports the glass substrate to back at low speed and recedes at the same time.
Description
Technical field
The present invention relates to substrate is transported to substrate conveyance system, base board delivery device and the substrate board treatment that coating of substrates is applied the coating handling part of liquid.
Background technology
For example in the photo-mask process of the ME of liquid-crystal display, the resist that carries out on glass substrate, applying resist liquid applies to be handled.
Above-mentioned resist applies the resist of handling on being in the transport path of glass substrate for example and applies in the handling part and carry out.Usually, temporary transient the carrying of glass substrate put sending on the platform on the transport path, send into platform from this and be transported to the resist coating handling part.In addition, the resist that will be through with applies glass substrate processed and applies handling part from resist and pass out to and see off on the platform.From this send into platform to resist apply the glass substrate of handling part conveying, with apply (with reference to the TOHKEMY 2005-142372 communique) that handling part normally carries out through the vertical transport assembly with conveying arm to the conveying of the glass substrate of seeing platform off from resist.In this conveying arm, adopt the supporting glass substrate lower surface a plurality of positions so that glass substrate can deflection forked conveying arm (with reference to japanese kokai publication hei 11-26550 communique).
In addition; Nearest FPD is with the maximization of resist applying device for counterpart substrate; Adopt mode without spin; Promptly relatively move or scan, and do not need substrate to rotatablely move, resist liquid is coated on the substrate with the thickness of hope through the substrate on the platform being discharged resist liquid with band shape while the nozzle that makes long strip type.According to coating process without spin, nozzle is relatively moved 1 time from the end to end of substrate, just can not make resist liquid fall the outside and on substrate, form the resist coated film.
But, under the situation of the forked conveying arm of above-mentioned such use, between part that contacts with conveying arm and non-contacting part, on glass substrate, produce the temperature inequality because of heat affecting sometimes from this conveying arm.Produce on the resist liquid on the glass substrate because of this temperature is uneven sometimes and apply inequality.Apply inequality if produced, then can not suitably carry out photo-mask process after this.
In addition, in the non-whirl coating of above-mentioned that kind, in order on substrate, to apply resist liquid with hope and uniform thickness, the small coating gap that must will be set between nozzle and the substrate remains certain value (for example 100 μ m) during coating scanning.But; In the past near the resist liquid coating apparatus; Transfer robot carry out to the visit of other treatment unit or assembly or substrate send into, see off action the time mechanical vibration meeting that produces transmit on the ground and feed through to the platform that applies in handling, have because the influence of this vibration makes and applies gap variation and the thickness mutation of resist coated film takes place on substrate or apply inhomogenous problem.In addition, the flase operation of transfer robot causes rotatablely moves or the motion of arm advance and retreat becomes problem at upkeep operation personnel's etc. secure context.And then the deflection that has increased conveying arm because of the maximization of substrate also becomes problem.
Summary of the invention
The present invention makes in view of such problem, and purpose is substrate to be transported to resist apply in the coating handling part of handling part etc., and is uneven with the coating that suppresses to be coated in the coating liquid on the substrate such as glass substrate.And then, the purpose of this invention is to provide a kind of can improve to handling part send into, see off substrate mechanism security and efficiency and the handling part in the processing execution is not applied the base board delivery device and the substrate board treatment of the influence of mechanical vibration etc.
In order to achieve the above object, the present invention is coated to the substrate conveyance system of the coating handling part conveying substrate on the substrate with respect to applying liquid.And; Possess the conveying body, said conveying body have can supporting substrates and a plurality of rollers of arranging of along continuous straight runs, integratedly support above-mentioned a plurality of rollers support unit, above-mentioned support unit is moved and make above-mentioned a plurality of roller with respect to the travel mechanism that applies the handling part advance and retreat and make the rotary driving part of above-mentioned a plurality of roller rotations.And the present invention possesses hoisting appliance, makes the substrate elevating of above-mentioned coating handling part.
According to the present invention, for example can with substrate supporting on a plurality of rollers, Yi Bian make this roller rotation the contact position of roller and substrate be moved, Yi Bian conveying substrate.Through like this, can be not heat passage partly on the substrate and on substrate, to produce temperature uneven, the coating that can suppress to be coated in the coating liquid on the substrate is uneven.
Above-mentioned a plurality of roller also can begin to contact successively mode on the lower surface of the substrate of above-mentioned coating handling part with the roller from the place ahead of above-mentioned coating handling part side, enter into downside and the supporting substrates of the substrate of above-mentioned coating handling part, retreats from above-mentioned coating handling part supporting under the state of aforesaid substrate.
Above-mentioned a plurality of roller also can rotate so that can not squint in the position of the substrate of above-mentioned coating handling part on one side, Yi Bian enter into above-mentioned coating handling part.
Above-mentioned a plurality of roller also can pass through the substrate rearward side conveying of rotation with supporting on one side, from above-mentioned be coated with teach handling part retreat on one side.
Above-mentioned hoisting appliance also can possess the lower surface of supporting substrates and a plurality of Lift Parts that go up and down; Above-mentioned a plurality of Lift Part; Begin to descend successively from the Lift Part of the approaching side of above-mentioned roller,, give roller substrate delivery/reception so that match with the entering of above-mentioned a plurality of rollers and do not contact with this roller.
Also can possess other that have identical structure with above-mentioned conveying body and have a plurality of other rollers, other support units, other travel mechanisms, other rotary driving parts and carry bodies.In the case, above-mentioned a plurality of other rollers enter into above-mentioned coating handling part supporting under the state of substrate, on one side rotation retreat from above-mentioned coating handling part on one side so that can not squint in the position of the substrate of above-mentioned coating handling part.
Above-mentioned hoisting appliance also can possess the lower surface of supporting substrates and a plurality of Lift Parts that go up and down; Above-mentioned a plurality of Lift Part begins to rise successively from the Lift Part of the approach axis front side that is in above-mentioned other rollers, so that match with retreating of above-mentioned a plurality of other rollers and do not contact with this roller, comes supporting substrates.
The present invention of another technical scheme possesses the conveying body, and said conveying body has can supporting substrates and the support unit of the rotating band that can rotate, the above-mentioned rotating band of supporting, above-mentioned support unit is moved and make above-mentioned rotating band with respect to the travel mechanism that applies the handling part advance and retreat and make the rotary driving part of above-mentioned rotating band rotation.And the present invention possesses hoisting appliance, makes the substrate elevating of above-mentioned coating handling part.
Above-mentioned rotating band also can begin to contact successively the mode, the downside that enters into the substrate of above-mentioned coating handling part of lower surface of the substrate of above-mentioned coating handling part with the place ahead from above-mentioned coating handling part side and come supporting substrates, retreats from above-mentioned coating handling part supporting under the state of aforesaid substrate.
Above-mentioned rotating band also can rotate so that can not squint in the position of the substrate of above-mentioned coating handling part on one side, Yi Bian enter into above-mentioned coating handling part.
Above-mentioned rotating band also can be on one side through rotation with the substrate of supporting rearward side carry, on one side retreat from above-mentioned coating handling part.
Above-mentioned hoisting appliance also can possess the lower surface of supporting substrates and a plurality of Lift Parts that go up and down; Above-mentioned a plurality of Lift Part begins to descend successively so that match with the entering of above-mentioned rotating band and do not contact with rotating band from the Lift Part of the approaching side of above-mentioned rotating band, gives rotating band with substrate delivery/reception.
The aforesaid substrate delivery system also can possess other conveying bodies that have the structure identical with above-mentioned conveying body and have other rotating bands, other support units, other driving mechanisms and other rotary driving parts; Above-mentioned other rotating bands enter into above-mentioned coating handling part supporting under the state of substrate; Rotation on one side is not so that can squint in the position of the substrate of coating handling part, and one side is retreated from above-mentioned coating handling part.
Above-mentioned hoisting appliance also can possess the lower surface of supporting substrates and a plurality of Lift Parts of going up and down; Above-mentioned a plurality of Lift Part begins to rise successively so that match with retreating of above-mentioned rotating band and do not contact with other rotating bands from the Lift Part of the approach axis front side that is in above-mentioned other rotating bands, comes supporting substrates.
According to another technical scheme; Base board delivery device of the present invention is to be used for handling part on both allocations, substrate being implemented set processing; The base board delivery device that aforesaid substrate after the aforesaid substrate that processing is preceding is sent into, will be handled is seen off; Have: the 1st fixing transport path, to lay and be used for carrying the 1st of aforesaid substrate to carry body with horizontality, a sidepiece at above-mentioned handling part on the 1st direction of level has the terminal; The 2nd fixing transport path is laid and is used for carrying the 2nd of aforesaid substrate to carry body with horizontality, and another sidepiece at above-mentioned handling part on above-mentioned the 1st direction has initiating terminal; Movable conveying-bridge; Constitute; Be equipped with and be used for carrying the 3rd of aforesaid substrate to carry body with horizontality; Can be at bridge toward moving between moving position and the bridge double action position; Said bridge toward moving position be used for aforesaid substrate be sent in the above-mentioned handling part perhaps with aforesaid substrate from above-mentioned handling part see off the above-mentioned the 1st fixedly the initiating terminal of terminal or above-mentioned the 2nd transport path of transport path be connected and be erected at the top of above-mentioned handling part; Said bridge double action position be used for when the processing substrate of above-mentioned handling part making a concession and hide the above-mentioned the 1st or the 2nd fixedly transport path below, in order aforesaid substrate to be sent in the above-mentioned handling part and linkage driving the above-mentioned the 1st carry body and the above-mentioned the 3rd carry body, for aforesaid substrate is seen off and above-mentioned the 2nd conveying body of linkage driving and above-mentioned the 3rd conveying body from above-mentioned.
In addition, substrate board treatment of the present invention have on platform approximate horizontal ground supporting substrates and implement the handling part of set processing and be used for will handling to above-mentioned handling part before the base board delivery device of the present invention seen off of the aforesaid substrate of aforesaid substrate after sending into, maybe will handling.
In the present invention, undertaken by handling part processing substrate during make movable conveying-bridge in the static or standby in bridge double action position.If in the handling part processing substrate that is through with, then make movable conveying-bridge move to bridge toward moving position.At bridge on moving position; Movable conveying-bridge can with the 1st fixedly the terminal of transport path is connected and with the state and the 1st of the top that is erected at handling part fixedly the 1st conveying sports association of transport path move and drive the 3rd conveying body; Thus substrate is sent into to handling part; And with the 2nd fixedly the initiating terminal of transport path be connected and with the state and the 2nd of the top that is erected at handling part fixedly transport path the 2nd carry sports association moving and drive the 3rd and carry body, thus substrate is seen off from handling part.
Base board delivery device of the present invention as preferred a kind of scheme, has: the movable base of loading movable conveying-bridge; The pedestal moving part makes pedestal move between moving position corresponding to the pedestal double action position of bridge double action position and corresponding to the pedestal of above-mentioned bridge toward moving position on above-mentioned the 1st direction; The bridge lifting unit of bridge lifting moving on pedestal is movably transported in order.In the case, be preferably the pedestal moving part pedestal is moved horizontally between moving position in pedestal double action position and pedestal, the bridge lifting unit makes the conveying-bridge lifting moving on the pedestal at pedestal on moving position.
According to another preferred scheme of the present invention, movable conveying-bridge is divided into the 1st cantilever style conveying-bridge and the 2nd cantilever style conveying-bridge by 2; The 1st cantilever style conveying-bridge constitutes; Can with the 1st fixedly the terminal of transport path be connected and be erected at platform above Bridge 1 toward moving position with hide fixedly mobile between the Bridge 1 double action position under the transport path the 1st; The 2nd cantilever style conveying-bridge constitutes, can with the 2nd fixedly the initiating terminal of transport path be connected and be erected at platform above Bridge 2 toward moving position with hide fixedly mobile between the Bridge 2 double action position under the transport path the 2nd.According to this structure, the 1st and the 2nd cantilever style conveying-bridge is 1/2 just passable as long as share each of load of substrate respectively, so even the substrate maximization also can tackle well.
And then, in base board delivery device of the present invention,, be provided with as preferred a kind of scheme: the 1st movable pedestal, load the 1st cantilever style conveying-bridge; The 1st pedestal moving part makes the 1st pedestal move between moving position corresponding to the 1st pedestal double action position of Bridge 1 double action position with corresponding to the 1st pedestal of Bridge 1 toward moving position on the 1st direction; The Bridge 1 lifting unit makes the 1st cantilever style conveying-bridge lifting moving on the 1st pedestal.In addition, be provided with: the 2nd movable pedestal, load the 2nd cantilever style conveying-bridge; The 2nd pedestal moving part makes the 2nd pedestal move between moving position corresponding to the 2nd pedestal double action position of Bridge 2 double action position with corresponding to the 2nd pedestal of Bridge 2 toward moving position on the 1st direction; The Bridge 2 lifting unit makes the 2nd cantilever style conveying-bridge lifting moving on the 2nd pedestal.
Here, the 1st and/or the 2nd pedestal moving part can make the 1st and/or the 2nd pedestal move horizontally between moving position in the 1st and/or the 2nd pedestal double action position and the 1st and/or the 2nd pedestal; The 1st and/or the Bridge 2 lifting unit can on moving position, make the 1st and/or the 2nd cantilever style conveying-bridge lifting moving on the 1st and/or the 2nd pedestal at the 1st and/or the 2nd pedestal.
In addition, according to preferred a kind of mode, the 1st and/or the 2nd cantilever style conveying-bridge has: the 1st and/or the 2nd up-down main body liftably is bearing on the 1st and/or the 2nd pedestal; Many socle girder portions are from the side-prominent and extension to platform of the 1st and/or the 2nd up-down main body; The a plurality of the 1st and/or the 2nd roller carries body to be rotatably installed in each socle girder portion as the 3rd; The the 1st and/or the 2nd roller driving part, be located in order to produce the power that drives these the 1st and/or the 2nd rollers rotations the 1st and/or the Bridge 2 main body on; The the 1st and/or the 2nd driving section is used for the rotary driving force that is produced by the 1st and/or the 2nd roller driving part is passed to a part or the 1st and/or the 2nd whole rollers.
And then, according to preferred a kind of scheme, in a part or whole socle girder portion, the a plurality of the 1st and/or the 2nd roller with the 2nd direction of the orthogonal level of the 1st direction on set spacing biasing and arrange.In this structure, because substrate tails off with the ratio that the 1st and/or the 2nd roller point-blank contacts, so can prevent the quality badness that produces to the heat flow of roller because of the substrate after processing effectively.
In above-mentioned handling part,, many lifting pins that connect platform and can constitute up or down can be set also in order substrate to be loaded on the platform, substrate to be unloaded, perhaps above platform, carries out the handing-over of substrate with movable conveying-bridge from platform.
According to the present invention, because it is uneven to have suppressed to be coated in the coating of the coating liquid on the substrate, so can make the fine pdm substrate like more high-precision photo-mask process by embodiment.In addition, can improve security and the efficiency (turnout) of handling part being sent into, seen off the mechanism of substrate, and the handling part in processing execution does not apply the influence of mechanical vibration etc.
Description of drawings
Fig. 1 is the vertical view of overview of structure of the coating development processing apparatus of this embodiment of expression.
Fig. 2 is the explanatory view of vertical section of the overview of the expression resist structure that applies processing components.
Fig. 3 is the vertical view of the overview of the expression resist structure that applies processing components.
Fig. 4 is the explanatory view of nozzle.
Fig. 5 is the explanatory view that body and the overview of the structure of the 2nd conveying body are carried in expression the 1st.
Fig. 6 is that the expression glass substrate is bearing in the 1st and carries the resist of the state on the roller of body to apply the explanatory view in the processing components.
Fig. 7 is that expression carries body that the resist that glass substrate is transported to the state on the platform is applied the explanatory view in the processing components by the 1st.
Fig. 8 is that expression the 1st carries the resist of the situation that the roller of body retreats to apply the explanatory view in the processing components.
Fig. 9 is the interior explanatory view of resist coating processing components that the expression glass substrate is bearing in the state on the lifter pin.
Figure 10 is that the resist of situation that expression the 2nd carries body to enter into the following side of glass substrate applies the explanatory view in the processing components.
Figure 11 is that the expression glass substrate is bearing in the 2nd and carries the resist of the state on the roller of body to apply the explanatory view in the processing components.
Figure 12 is that expression the 2nd carries the roller of body to retreat and the resist of situation that glass substrate is rearward carried applies the explanatory view in the processing components.
Figure 13 be expression with glass substrate from the 2nd carry body to join to the situation of downstream rollers resist apply the explanatory view in the processing components.
Figure 14 is the vertical view that the resist when only being arranged on lifter pin on the both ends of glass substrate applies processing components.
Figure 15 is the explanatory view that the resist when in the 1st conveying body and the 2nd conveying body, having used band applies the vertical section of processing components.
Figure 16 is that expression the 1st carries the resist of the situation that the band of body retreats to apply the explanatory view in the processing components.
Figure 17 is that the resist of the situation of expression the 2nd following side that is brought into glass substrate of carrying body applies the explanatory view in the processing components.
Figure 18 is that expression the 2nd carries the band of body to retreat and the resist of situation that glass substrate is rearward carried applies the explanatory view in the processing components.
Figure 19 is the vertical view of the structure of expression coating development processing apparatus applicatory of the present invention.
Figure 20 is the schema of processing sequence of the coating development processing apparatus of expression embodiment.
Figure 21 is the integrally-built roughly vertical view that the resist of the coating development processing apparatus of expression embodiment applies processing components.
Figure 22 is the stereographic map of the structure of the resist of the expression embodiment coating handling part that applies processing components.
Figure 23 is the general perspective view that the resist of expression embodiment applies the situation of handling.
Figure 24 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 25 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 26 is the roughly vertical view in a stage of the effect of expression embodiment.
Figure 27 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 28 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 29 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 30 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 31 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 32 is the roughly side-view in a stage of the effect of expression embodiment.
Figure 33 is the stereographic map of structure example of the movable transfer mechanism of expression embodiment.
Figure 34 is the integrally-built roughly vertical view of roller feed drive portion of the movable transfer mechanism of expression embodiment.
Figure 35 is the sectional view to the A-A line of Figure 34.
Figure 36 is the roughly side-view of the structure of the roller feed drive portion in the socle girder portion of movable transfer mechanism of expression embodiment.
Figure 37 is the roughly side-view of the structure that moves horizontally driving part of the movable transfer mechanism of expression embodiment.
Figure 38 is the roughly vertical view of structure of a variation of the movable transfer mechanism (particularly conveying-bridge) of expression embodiment.
Figure 39 is the roughly side-view of another variation of the movable transfer mechanism of expression embodiment.
Embodiment
Below, preferred embodiment describe of the present invention.Fig. 1 is the vertical view of overview of structure of the coating development processing apparatus 1 of the expression substrate conveyance system that is mounted with this embodiment.
It is as shown in Figure 1 to apply development processing apparatus 1, has the outside to be sent into the box station 2 seen off, disposed in photo-mask process treatment station 3 and the structure that is connected integratedly at the interface station 5 of carrying out the handing-over of glass substrate G between treatment station 3 and the exposure apparatus 4 with treatment station 3 adjacent settings of implementing the various processing components of set processing with single sheet type with for example to be used for a plurality of glass substrate G be unit with the box.
In box station 2, be provided with box and carry and put platform 10, this box carries to be put platform 10 and makes a plurality of box C go up to list with one at directions X (above-below direction among Fig. 1) to put freely.In box station 2, be provided with the substrate that on transport path 11, moves freely and carry body 12 towards directions X.Also move freely in the orientation (Z direction, vertical direction) of the glass substrate G of substrate conveying body 12 in being housed in box C, can the glass substrate G in each the box C that on directions X, arranges be visited selectively.
Substrate carries body 12 on the θ direction of Z axle, rotating, also can to after the Excimer UV rayed assembly 20 and 33 visits of processing under cooling assembly of treatment bench 3 sides stated.
In the landline B of the rear side (directions X positive dirction side (upper side of Fig. 1)) of treatment bench 3, from the interface station 5 sides towards the box station 2 sides successively will be for example with the development treatment assembly 30 that glass substrate G is carried out development treatment, carry out i line UV illumination module 31, heat treated assembly 32 and processing under cooling assembly 33 that the decolouring of glass substrate G handles and be configured to row point-blank.
Between the development treatment assembly 30 of the outer platform 28 of landline A and landline B, be provided with the conveying body 40 of the conveying of the glass substrate G that carries out between this.This conveying body 40 also can to after the expansion cooling module 60 at the interface station 5 stated carry glass substrate G.
In interface station 5, be provided with for example have refrigerating function go forward side by side oozy glass substrate G handing-over expansion cooling module 60, temporarily accommodate buffer pocket 61 and the external device (ED) module 62 of glass substrate G.Externally in the apparatus module 62, be provided with the machine at quarter (TITLER) of the code that glass substrate G exposure production management is used and with the peripheral exposure apparatus of the periphery exposure of glass substrate G.In interface station 5, be provided with and carry the substrate of glass substrate G to carry body 63 to above-mentioned expansion cooling module 60, buffer pocket 61, external device (ED) module 62 and exposure apparatus 4.
Then, the structure that the resist of the substrate conveyance system that possesses this embodiment is applied processing components 24 describes.
For example like Fig. 2 and shown in Figure 3, the central part that applies processing components 24 at resist is provided with as the platform 70 that carries the coating handling part of putting glass substrate G.Platform 70 is configured among the landline A.
In each lifter pin group 80a, 80b, 80c, 80d, 80e, be separately installed with the up-down driving part 81 of cylinder etc.Each lifter pin group 80a, 80b, 80c, 80d, 80e go up and down independently of each other, can be projected into the top of platform 70.In addition, in this embodiment, constitute hoisting appliance through for example lifter pin group 80a, 80b, 80c, 80d, 80e and up-down driving part 81.
On platform 70, be provided with the nozzle 90 of glass substrate G being discharged resist liquid.Nozzle 90 is for example as shown in Figure 4, forms long roughly rectangular shape towards the Y direction.Nozzle 90 for example forms longer than the width of the Y direction of glass substrate G.On the bottom of nozzle 90, be formed with the relief outlet 90a of slit-shaped.Connecting the resist liquid supply-pipe 92 that is communicated to resist liquid supply source 91 on the top of nozzle 90.
For example on nozzle 90, be equipped with and make nozzle 90, nozzle 90 is spreaded all between the both ends of the glass substrate G on the platform 70 and move back and forth along the driving mechanism 93 that directions X moves.In driving mechanism 93, also be provided with elevating function, can make nozzle 90 declines and approach the glass substrate G on the platform 70.Approach at nozzle 90 under the state of glass substrate G, move to the other end from the end of glass substrate G, can resist liquid be coated on the upper surface of glass substrate G thus while discharge resist liquid.
In the both sides of the Y of platform 70 direction, be provided with carry out and platform 70 between the conveying body 100,101 of conveying of glass substrate G.A plurality of rollers 110 of carrying the 1st of bodies to carry body 100 to have on the horizontal direction of Y direction, to arrange as other of the upstream side that is in landline A (Y direction negative direction side), as the retainer 111 of the holding member that keeps these rollers 110 integratedly with the track plate 112 of this retainer 111 is installed.
On track plate 112, be formed with the track 112a along the Y direction, retainer 111 moves freely along this track 112a.Retainer 111 can move on track 112a under the effect of the horizontal drive portion 114 of motor etc.The 1st carries body 100 to move along the Y direction through making retainer 111, and a plurality of rollers 110 are advanced and retreat to platform 70 from upstream side.
Carry body 101 to have and the 1st carry the same structure of body 100 as the 2nd of the conveying body of the downstream side that is in landline A (Y direction positive dirction side).The 2nd carries body 101 to have a plurality of roller 120, retainer 121 and track plate 122.Retainer 121 is made up of the pair of L type 121a of portion, the L type 121a of portion support freely by rotation a plurality of rollers 120 the end horizontal part 121b and constitute towards the vertical component effect 121c that lower direction forms and is installed on the track plate 122 from the end of the Y direction positive dirction side of this horizontal part 121b.On the L type 121a of portion, be provided with the rotary driving part 123 of the motor that makes 120 rotations of each roller etc.
On track plate 122, be formed with the track 122a along the Y direction, retainer 121 can move on track 122a under the effect of horizontal drive portion 124.The 2nd carries body 101 to move to the Y direction through making retainer 121, and a plurality of rollers 120 are advanced and retreat from the downstream side to platform 70.In addition, in this embodiment, constitute travel mechanism by track plate 122 and horizontal drive portion 124.
The action of the drive system of the rotary driving part 123 of the rotary driving part 113 of above-mentioned the 1st conveying body 100 and horizontal drive portion the 114, the 2nd conveying body 101 and horizontal drive portion 124, lifter pin group 80a, 80b, 80c, 80d, the up-down driving part 81 of 80e, the driving mechanism 93 of nozzle 90 etc. receives control part for example shown in Figure 1 130 controls.The action of control part 130 these drive systems of control, the resist of stating after can realizing applies the coating treatment process of processing components 24.
In addition, in this embodiment, for example carry body the 100, the 2nd to carry body 101, lifter pin group 80a, 80b, 80c, 80d, 80e and up-down driving part 81 to constitute substrate conveyance system by the 1st.
Like Fig. 2 and shown in Figure 3, the Y direction negative direction side at the 1st conveying body 100 is disposed with a plurality of upstream rollers R1 that are used for carrying out the roller conveying along the Y direction, is formed with the substrate transport path of the processing under cooling assembly 23 that is communicated to upstream side.Y direction positive dirction side at the 2nd conveying body 101 is disposed with a plurality of downstream rollers R2 along the Y direction, forms the substrate transport path of the drying under reduced pressure assembly 25 that is communicated to the downstream side.
Then, the coating treatment process that above such resist that constitutes is applied processing components 24 is with being described by the technology that applies the photo-mask process that development processing apparatus 1 carries out.
At first, a plurality of glass substrate G in the box C at box station 2 are carried body 12 to be transported to the Excimer UV rayed assembly 20 of treatment station 3 successively by substrate.Carry through roller; Glass substrate G is transported to Excimer UV rayed assembly 20, washer cleaning assembly 21, heat treated assembly 22, processing under cooling assembly 23, resist coating processing components 24, drying under reduced pressure assembly 25, heat treated assembly 26 and processing under cooling assembly 27 successively along collinear landline A, manages the set processing of enforcement in the assembly throughout.Glass substrate G after the processing under cooling that is through with is transported to outer platform 28.Then, glass substrate G is transported to interface station 5, carries body 63 to be transported to exposure apparatus 4 through substrate through carrying body 40.
The glass substrate G of the exposure-processed that will in exposure apparatus 4, be through with carries body 63 to send back to interface station 5 through substrate, is transported to the development treatment assembly 30 of treatment station 3 through carrying body 40.Through the roller conveying glass substrate G is transported to development treatment assembly 30, i line UV illumination module 31, heat treated assembly 32 and processing under cooling assembly 33 successively along collinear landline B, manages the set processing of enforcement in the assembly throughout.In processing under cooling assembly 33, carry body 12 to send back among the box C at box station 2 through substrate the glass substrate G of the processing under cooling that is through with, a series of photo-mask process is through with.
Then, the coating treatment process to resist coating processing components 24 describes.
At first, roller 110 standbies as shown in Figure 6 of the 1st conveying body 100 are on the stand-by station nearby of platform 70, and roller 110 is continuous with upstream rollers R1.The glass substrate G of the processing under cooling that in processing under cooling assembly 23, is through with carries on the roller 110 of body 100 through being transported to the 1st on the upstream rollers R1.
Then, as shown in Figure 7, the 1st carries the retainer 111 of body 100 to move to Y direction positive dirction side, and roller 110 enters into the top of platform 70.Thus, will be transported to the top of platform 70 by the glass substrate G of roller 110 supportings.Then, as shown in Figure 8, while make roller 110 through retainer 111 it moved back to Y direction negative direction rear flank to the dextrad rotation of Fig. 8, so that glass substrate G can not move with respect to the position of platform 70.Match therewith; Lifter pin group 80a, 80b, 80c, 80d, 80e from the lifter pin group of Y direction positive dirction side begin successively, promptly the order with lifter pin group 80e, 80d, 80c, 80b, 80a rises; So that it does not conflict with roller 110, come supporting glass substrate G.If the 1st carries body 100 to get back to original stand-by station, then as shown in Figure 9, glass substrate G is flatly supported by all lifter pin group 80a, 80b, 80c, 80d, 80e above platform 70.
Then, lifter pin group 80a, 80b, 80c, 80d, 80e descend simultaneously, and that kind as shown in Figure 2 is carried glass substrate G and put on platform 70.If glass substrate G carried put on platform 70,, resist liquid is coated on whole of surface of glass substrate G Yi Bian then nozzle 90 is discharged resist liquid one edge directions X and on glass substrate G, moved.
The coating of resist liquid if be through with, then lifter pin group 80a, 80b, 80c, 80d, 80e rise once more, glass substrate G are lifted to the top of platform 70.Then, shown in figure 10, the retainer 121 of the 2nd conveying body 101 is to Y direction negative direction side shifting, and roller 120 enters into the below of glass substrate G.At this moment, a plurality of rollers 120 begin to contact successively on the lower surface of glass substrate G from the roller in the place ahead, are supporting glass substrate G.In addition, this moment, each roller 120 rotated to the dextrad of Figure 10, so that glass substrate G can not squint with respect to the position of platform 70.And then; This moment lifter pin group 80a, 80b, 80c, 80d, 80e from the lifter pin group of Y direction positive dirction side begin successively, promptly the order with lifter pin group 80e, 80d, 80c, 80b, 80a descends; So that do not conflict, glass substrate G joined to roller 120 with the roller 120 that gets into.If the roller in the place ahead 120 has reached the end of the Y direction negative direction side of glass substrate G, and is then shown in figure 11, glass substrate G is fully by roller 120 supportings.
Then, retainer 121 is shown in figure 12, glass substrate G is being bearing under the state on the roller 120 to Y direction positive dirction side shifting, and the 2nd carries body 101 to retreat into original stand-by station.Thus, glass substrate G is seen off from platform 70.At this moment, make roller 120 with low speed to the rotation of the dextrad of Figure 12, make glass substrate G on roller 120 also to Y direction positive dirction side shifting.The glass substrate G of this moment is adjusted to the speed of getting back to the degree that stand-by station front glass substrate G can not fall from roller 120 at retainer 121 with respect to the speed of relative movement of roller 120.
If roller 120 is got back to stand-by station with retainer 121, and is then shown in figure 13, give downstream rollers R2 with glass substrate G from roller 120 handing-over, flow to ensuing drying under reduced pressure assembly 25 through this downstream rollers R2.
According to above embodiment, carry body 101 owing to be provided with the 2nd, on one side so Yi Bian can support the glass substrate G of the coating that is through with and make it on roller 120, move the drying under reduced pressure assembly 25 that flows to the downstream side through roller 120 in the downstream side of platform 70.In the case, owing to carrying central roll 120 to contact equably on the lower surface of glass substrate G, so on glass substrate G, can not produce the temperature inequality, the coating that can suppress resist liquid is uneven.In addition, the 2nd carries body 101 can the glass substrate G on the platform 70 be taken on the roller 120, sees off to downstream rollers R2 through these roller 120 former states.Therefore, carry out at short notice smoothly from platform 70 conveying of the glass substrate G of side downstream, the temperature that has also reduced glass substrate G from this point is uneven, has reduced applying inequality.
Because lifter pin group 80a, 80b, 80c, 80d, 80e go up and down freely independently of each other; Come supporting glass substrate G so roller 120 enters into the lower surface of glass substrate G, and lifter pin group 80a, 80b, 80c, 80d, 80e are descended from Y direction positive dirction side successively. Lifter pin group 80a, 80b, 80c, 80d, 80e thus, can correctly carry out the handing-over of glass substrate G, so that can not conflict with roller 120 each other.
A plurality of rollers 120 are rotated so that can not squint in the position of glass substrate G when the roller from the place ahead begins to contact successively on the lower surface of glass substrate G; And enter into the lower face side of glass substrate G, so can correctly carry out the handing-over to the glass substrate G of roller 120 from lifter pin group 80a, 80b, 80c, 80d, 80e.
Since the upstream side of platform 70 be provided with the 2nd carry body 101 same the 1st carry body 100, so can put on roller 110, give platform 70 from these roller 110 handing-over with carrying in the glass substrate G former state of carrying on the upstream rollers R1.As a result, also level and smooth and short period of time ground carries out to sending into of the glass substrate G of platform 70.In addition, because the delivery system that can on collinear landline A, take in relative platform 70, so also can reduce the ground area occupied.
The 1st carries a plurality of rollers 110 of body 100 entering on the platform 70 under the state that is supporting glass substrate G, retreats while rotate then from platform 70, so that can not squint in the position of the glass substrate G on the platform 70.In addition, lifter pin group 80a, 80b, 80c, 80d, 80e match with retreating of a plurality of rollers 110, begin to rise successively from the lifter pin group of Y direction positive dirction side, come supporting glass substrate G.Through like this, can correctly carry out glass substrate G from the handing-over of roller 110 to lifter pin group 80a, 80b, 80c, 80d, 80e.
In above embodiment, when the retainer 121 that on platform 70, has obtained substrate G returns stand-by station, roller 120 rotation and with glass substrate G downstream side carry, but also can make roller 120 positive and negative transferring that glass substrate G is moved forward and backward.In addition, glass substrate forwardly is in the drying under reduced pressure assembly 25, can not be with applying glass substrate G after processing finishes directly under the situation that drying under reduced pressure assembly 25 sides are carried, and also can for example make glass substrate G move standby before and after on roller 120.Through like this, in standby, can on glass substrate G, not produce the temperature inequality, can suppress the uneven generation of coating of the resist liquid on the glass substrate G.
In addition, when the retainer 121 that has obtained glass substrate G is got back to stand-by station, roller 120 is stopped.In the case, compare, can carry out the conveying of glass substrate G at short notice, so it is uneven to reduce the coating that the temperature variation of glass substrate G brings with the conveying of passing through the glass substrate G that the vertical transport assembly carries out in the past.
In above embodiment; Dispose lifter pin group 80a, 80b, 80c, 80d, 80e so that the integral body of the glass substrate G equably on the supporting station 70, but also can that kind shown in figure 14 lifter pin 140 be set so that the both ends of the directions X of supporting glass substrate G only.In the case, also can carry the retainer 121 of body 101 to form the retainer 111 and the 2nd of the 1st conveying body 100, can be inserted into from viewed in plan between the lifter pin 140 of directions X both sides.Through like this,, also can make roller 110,120 not interfere and enter on the platform 70 with lifter pin 140 even do not go up and down each lifter pin 140 respectively.
In above embodiment,, but also can replace roller and through rotating band supporting glass substrate G through a plurality of roller 110,120 supporting glass substrate G.
In this case, for example shown in figure 15, carry in the body 100 the 1st, replace a plurality of rollers 110 and on the leading section of retainer 111 and rearward end, pulley 150,151 be installed, with annular band 152 hang over this pulley 150, between 151.Be with 152 can rotate in the Y direction through make pulley 151 rotations by rotary driving part 113.Carry in the body 101 the 2nd, and the 1st carry body 100 likewise on the leading section of retainer 121 and rearward end, pulley 160,161 to be installed, with annular band 162 hang over this pulley 160, between 161.Be with 162 can rotate in the Y direction through make pulley 161 rotations by rotary driving part 123.In addition, for other formations, since identical with above-mentioned embodiment, so omit explanation.
And, glass substrate G is being sent to 70 last times of platform, at first glass substrate G is transported to the 1st from upstream rollers R1 and carries being with on 152 of body 100.If glass substrate G is transported to is with on 152, then retainer 111 is to Y direction positive dirction side shifting, with 152 move to platform 70 the top, glass substrate G is transported to the top of platform 70.Then, shown in figure 16, with 152 in Figure 16 right handed while retainer 111 with retreat and get back to original stand-by station with 152 so that glass substrate G does not move with respect to the position of platform 70.Meanwhile, lifter pin group 80e, 80d, 80c, 80b, 80a rise according to this in proper order, supporting glass substrate G.
Then, lifter pin group 80a, 80b, 80c, 80d, 80e descend, and glass substrate G is carried put on platform 70, and 90 couples of glass substrate G apply resist liquid through nozzle.
With glass substrate G when platform 70 is seen off, through lifter pin group 80a, 80b, 80c, 80d, 80e glass substrate G is lifted, the 2nd carry body 101 with 162 enter into this glass substrate G below.At this moment, shown in figure 17, begin to contact with the lower surface of glass substrate G successively from front side with 162, come supporting glass substrate G.In addition, with 162 dextrad rotations, so that does not move the position of glass substrate G to Figure 17.In addition, lifter pin group 80a, 80b, 80c, 80d, 80e begin to descend successively from Y direction positive dirction side, so as not be with 162 to contact.If be with 162 to move on the platform 70, then glass substrate G is supported in fully and is with on 162.
Then, to Y direction positive dirction side shifting, retreat into original stand-by station under retainer 121 states on being bearing in glass substrate G with 162 shown in figure 18 with 162.Thus, glass substrate G is seen off from platform 70.At this moment, make with 162 and rotate to the dextrad of Figure 18, glass substrate G is being with on 162 also to Y direction positive dirction side shifting with low speed.If retainer 121 with got back to original stand-by station with 162, then glass substrate G is by from being with 162 handing-over to give downstream rollers R2.
In this embodiment, also through glass substrate G, so it is uneven to suppress the coating of the resist liquid that the temperature variation of glass substrate G brings with 162 level and smooth and short period of time ground transport platform 70.In addition because glass substrate G is moved being with on 162, so also can further reduce the temperature of glass substrate G uneven and reduce apply uneven.
In this embodiment, that is supporting glass substrate G is with 162 to dextrad rotation and make glass substrate G to Y direction positive dirction side shifting, is with 162 to carry out positive and negative then glass substrate G is moved forward and backward but also can make.In addition, also can not make be with 162 the rotation and glass substrate G is stopped.
In addition, in above embodiment, be provided with the 1st in the front and back of platform 70 and carry body 100 and the 2nd to carry body 101, carry body 101 but also can only be provided with the 2nd.In addition, the conveying of the glass substrate G in the upstream side of platform 70 and downstream side is to carry through the roller that roller R1, R2 carry out, but also can be the conveying of carrying out through the band transfer roller.Above-mentioned embodiment is an example of the platform 70 that applies resist liquid being carried glass substrate G, but under the situation of other coating handling parts that apply liquid such as developing solution being carried glass substrate G, also can use the present invention.
Then, other embodiments are described.
In Figure 19, expression is as the coating development processing apparatus that can use a structure example of base board delivery device of the present invention and substrate board treatment.This coating development processing apparatus 210 is arranged in the dust free chamber, be with the glass substrate that for example LCD uses carry out as substrate, in the LCD ME in the photo-mask process cleaning, resist coating, prebake, development and after each device of handling such as cure.Exposure-processed is to be undertaken by the exposure apparatus 212 with the outside of this adjacent setting of system.
This coating development processing apparatus 210 disposes the treatment station (P/S) 216 of growing crosswise at central part, on its length direction (directions X) both ends, disposes box station (C/S) 214 and interface station (I/F) 218.
Box station (C/S) the 214th, the box that applies development processing apparatus 210 is sent into and is seen mouth off, possesses to put 4 box platform 220 and the box C on this box platform 220 is carried out the transfer mechanism 222 that sending into of glass substrate G seen off can the multistage range upon range of and box C that accommodates multi-disc glass substrate G of glass substrate G being gone up to arrange to carry in the direction (Y direction) of level.Transfer mechanism 222 has the conveying arm 222a that can keep glass substrate G, can carry out the handing-over of glass substrate G with adjacent treatment station (P/S) 216 sides with 4 actions of X, Y, Z, θ.
Treatment station (P/S) 216 with each handling part according to the arranged in order of technical process or operation in a parallel and reverse itinerary A who extends along the system length direction (directions X) of level, B.
More particularly; From the processing route A of the upstream portion of box station (C/S) 214 side direction interface stations (I/F) 218 sides, with the 224, the 1st thermal treatment portion 226 of clean portion, applying handling part 228 and the 2nd thermal treatment portion 230, to begin with this arranged in order along the 1st horizontal feed path 232 from upstream side be row.More particularly, in clean portion 224, begin to be provided with successively Excimer UV rayed assembly (e-UV) 234 and washer cleaning assembly (SCR) 236 along the 1st horizontal feed path 232 from upstream side.In the 1st thermal treatment portion 226, begin to be provided with successively dehydration along the 1st horizontal feed path 232 from upstream side and cure assembly (DHP) 238, adhesive component (AD) 240 and processing under cooling assembly (COL) 242.Apply handling part 228 and begin to be provided with successively resist coating processing components (CT) 244 and drying under reduced pressure assembly (VD) 246 along the 1st horizontal feed path 232 from upstream side.The 2nd thermal treatment portion 230 begins to be provided with successively prebake assembly (PREBAKE) 250 and processing under cooling assembly (COL) 252 along the 1st horizontal feed path 232 from upstream side.
On the other hand; From the processing route B of the downstream portion of interface station (I/F) 218 side direction box stations (C/S) 214 sides, with developing device (DEV) 254, i line UV illumination module (i-UV) 256, after cure assembly (POBAKE) 258, processing under cooling assembly 260 and inspection assembly (AP) 262 and begin to become row according to this arranged in order along the 2nd horizontal feed path 264 from upstream side.In addition, cure assembly (POBAKE) 258 and processing under cooling assembly 260 formations the 3rd thermal treatment portion 259 after.
Handling to be provided with auxiliary conveying space 266 between route A, the B at two, can be that unit level ground carries the shuttle 268 of putting glass substrate G and can be under the effect of not shown driving mechanism goes up two-way moving handling route direction (directions X) with a slice.
Interface station (I/F) 218 have be used for the above-mentioned the 1st and the 2nd horizontal feed path 232,264 carry out glass substrate G exchange e Foerderanlage 270 and be used for carrying out the e Foerderanlage 272 of the exchange of glass substrate G with adjacent exposure apparatus 212, around them, dispose buffer table (BUF) 274, expansion cooling table (EXTCOL) 276 and peripheral device 278.Upload the buffer pocket (not shown) that is equipped with fixed at buffer table (BUF) 274.Expansion cooling table (EXTCOL) the 276th possesses the platform that the substrate delivery/reception of refrigerating function is used, when at two e Foerderanlages 270, use during exchange glass substrate G between 272.Peripheral device 278 can for example be with the structure of machine at quarter (TITLER) with peripheral exposure apparatus (EE) stacked on top of one another.Each e Foerderanlage 270,272 has conveying arm 270a, the 272a that can keep glass substrate G, can visit each adjacent one for the handing-over of carrying out glass substrate G.
Among Figure 20 expression this apply the order to the processing of 1 sheet glass substrate G of development processing apparatus.At first; In box station (C/S) 214; Take out a slice glass substrate G transfer mechanism 222 any box C from platform 220, the glass substrate G of this taking-up is sent to the i.e. starting point (step S1) in the 1st horizontal feed path 232 of loading part of the processing route A side of treatment station (P/S) 216 with the posture (being processed of substrate faced up) of facing upward.
Like this, glass substrate G is carried towards the downstream side of handling route A on the 1st horizontal feed path 232 with the posture of facing upward.In the clean portion 224 of initial section, implement ultraviolet clean and washing clean (step S2, S3) successively through Excimer UV rayed assembly (e-UV) 234 and 236 couples of glass substrate G of washer cleaning assembly (SCR).In washer cleaning assembly (SCR) 236; The glass substrate G that moves in the horizontal feed path 232 is cleaned or winding-up is cleaned and emboliform dirt is removed from substrate surface through implementing to scrub; Implement rinsing processing then, utilize air knife etc. to make glass substrate G dry at last.The a series of clean of washer cleaning assembly (SCR) 236 if be through with, then glass substrate G former state is advanced in the 1st horizontal feed path 232 and the 1st thermal treatment portion 226 of passing through.
In the 1st thermal treatment portion 226, glass substrate G at first cures the processed that assembly (DHP) 238 is heated in dehydration, moisture is removed (step S4).Then, glass substrate G makes to be processed face hydrophobization (step S5) in the adhesion process of the vaporish HMDS of adhesive component (AD) 240 enforcement uses.After this adhesion process finished, glass substrate G was cooled to set substrate temperature (step S6) by processing under cooling assembly (COL) 242.Then, glass substrate G also advances in the 1st horizontal feed path 232 and is transported to coating handling part 228.
In applying handling part 228; Glass substrate G at first applies in the processing components (CT) 244 at resist and utilizes gap nozzle to go up coating resist liquid at upper surface of base plate (being processed face) through for example non-rotational method, in the adjacent drying under reduced pressure assembly (VD) 246 in downstream side, receives the drying treatment (step S7) based on decompression then.In addition; Apply in the processing components (CT) 244 at resist; As after state, temporarily glass substrate G is loaded on the platform 280 (Figure 21) from the 1st horizontal feed path 232, on platform 280, receive resist and apply to handle the back by from platform 280 unloadings and got back to the 1st horizontal feed path 232.
The glass substrate G that comes out from coating handling part 228 advances the 1st horizontal feed path 232 and the 2nd thermal treatment portion 230 of passing through.In the 2nd thermal treatment portion 230, thermal treatment after glass substrate G at first applies as resist in prebake assembly (PREBAKE) 250 or the thermal treatment before the exposure and receive prebake (step S8).Through this prebake, the solvent evaporation in the resist film that remains on the glass substrate G is removed, also strengthened the close property of resist film for substrate.Then, glass substrate G is cooled to set substrate temperature (step S9) in processing under cooling assembly (COL) 252.Then, glass substrate G is pulled on the e Foerderanlage 270 at interface station (I/F) 218 by the terminal point (unloading part) from the 1st horizontal feed path 232.
In interface station (I/F) 218; Glass substrate G is sent to the peripheral exposure apparatus (EE) of peripheral device 278 from expansion cooling table (EXTCOL) 276; Receive there and be used for being sent to adjacent exposure apparatus 212 (step S10) after the exposure of when developing, removing attached to the resist of the periphery of glass substrate G.
In exposure apparatus 212, set circuit pattern makes public on the resist on the glass substrate G.Then; The glass substrate G of the pattern exposure that is through with is sent back to back (step S10) the interface station (I/F) 218 from exposure apparatus 212; At first be fed in the machine at quarter (TITLER) of peripheral device 278, there the set information (step S11) of the specified location marked on substrate.Then, glass substrate G is sent back to expansion cooling table (EXTCOL) 276.The conveying of glass substrate G in the interface station (I/F) 218 and carry out through e Foerderanlage 270,272 with the exchange of the glass substrate G of exposure apparatus 212.At last, glass substrate G is sent to the starting point (loading part) that is laid on the 2nd horizontal feed path 264 of handling the route B side of treatment station (P/S) 216 through e Foerderanlage 270.
Like this, glass substrate G is carried towards the downstream side of handling route B on the 2nd horizontal feed path 264 with the posture of facing upward specifically.In initial developing device (DEV) 254, glass substrate G is implemented development, rinsing, a series of development treatment of exsiccant (step S12) during being transferred with horizontality.
Glass substrate G after a series of development treatment that in developing device (DEV) 254, is through be loaded in by former state in the 2nd horizontal feed path 264 and with this state through the adjacent i line illumination module (i-UV) 256 in downstream side, receive the decolouring of carrying out through the irradiation of i line there and handle (step S13).Then, make under the state of glass substrate G in being loaded in the 2nd horizontal feed path 264 successively through the 3rd thermal treatment portion 259 and inspection assembly (AP) 262.In the 3rd thermal treatment portion 259, glass substrate G at first after cure in the assembly (POBAKE) 258 and to cure (step S14) as the thermal treatment after the development treatment after receiving.Through curing after this, developing solution in the resist film that remains on the glass substrate G and scavenging solution evaporation are removed, also strengthened the close property of resist pattern for substrate.Then, glass substrate G is cooled to set substrate temperature (step S15) in processing under cooling assembly (COL) 260.In inspection assembly (AP) 262, carry out (step S16) such as non-contacting live width inspection and membranous, thickness inspections for the resist pattern on the glass substrate G.
(C/S) 214 sides at the box station; Transfer mechanism 222 obtains whole operations of the coating development treatment that is through with from the terminal (unloading part) in the 2nd horizontal feed path 264 glass substrate G accommodates the glass substrate G that obtains among any box C (being generally original box) (step S1).
Apply in the development processing apparatus 210 at this, can in the substrate carrying mechanism in the resist that applies handling part 228 applies processing components (CT) 244 and this assembly, use the present invention.
Below, according to Figure 21～Figure 39, explain that at length resist preferred embodiment of the present invention applies the structure and the effect of the substrate carrying mechanism in processing components (CT) 244 and this assembly.
The resist of this embodiment of expression applies the structure of the major portion of processing components (CT) 244 among Figure 21.As shown in the figure; This resist applies processing components (CT) 244 and is provided with at the assembly central part and applies the platform 280 of handling usefulness and apply handling part 282, has substrate in its both sides and sends into the transport platform of usefulness or go into transport platform or the appearance (OUT) 286 that platform (IN) 284 and substrate are seen usefulness off.
Concrete structure example and the effect thereof that applies handling part 282 is described according to Figure 22.This coating handling part 282 has the resist liquid feed mechanism 290 that comprises the nozzle 288 of supplying with resist and is applying the nozzle moving mechanism 292 that makes the set horizontal direction (Y direction) of nozzle 288 direction on platform 280 move or scan when handling.In resist liquid feed mechanism 290; Nozzle 288 has the relief outlet of the slit-shaped that the length that covers the glass substrate G on the platform 280 passing through extends at directions X, is connected on the resist liquid supply-pipe 294 from resist liquid supply source (not shown).Nozzle moving mechanism 292 has the frame 296 of anti-groove shape that nozzle supporting mass 295 via the beam shape flatly supports nozzle 288 or door shape and makes this shape frame 296 driven in translation portion 298 that two-direction moving moves on the Y direction.This driven in translation portion 298 can be by for example constituting with the linear motor mechanism or the ball screw framework of guidance part.In addition, be used for changing or regulate nozzle 288 height location, be located between a shape frame 296 and the nozzle supporting mass 295 by the hoisting appliance 300 that for example constitutes with the ball screw framework of guidance part.
When applying processing, make nozzle 288 approach platform 280, so that between lower end of nozzle 288 (relief outlet) and glass substrate G, form the for example coating clearance D of 100 μ m.Then; On this nozzle height position, nozzle 288 is moved horizontally with certain speed through nozzle moving mechanism 292; It is vertically blocked platform 280 tops along the Y direction, simultaneously in resist liquid feed mechanism 290 from the slit-shaped relief outlet of nozzle 288 resist liquid is supplied on the glass substrate G at the zonal discharging current of unfolded on the directions X.Through the coating scanning of such nozzle 288, shown in figure 23, on glass substrate G, form the coated film RM of resist liquid towards the other end from the end of glass substrate G with the mode of following nozzle 288.
In this embodiment; Owing near platform 280, causing the equipment such as transfer robot that mechanical vibration are such in the process that is not arranged on coating scanning fully; So can apply vibration for the glass substrate G on the platform 280, apply handling part 282 and can be under the state that is keeping the coating gap as set carry out stable coating processing from substrate end-to-end from the outside.Thus, can be on glass substrate G form the coated film RM of resist liquid with uniform thickness.
In addition; For carry out with glass substrate G be loaded on the platform 280, with glass substrate G from platform 280 unloadings, or above the platform 280 with after the movable conveying-bridge (320A, 320B) stated carry out the handing-over of glass substrate G, be provided with the many lifting pins 302 (Figure 21) that connect platform 280 and can constitute up or down.Among pedestal 285, be provided with the lifting pin hoisting appliance (not shown) that these lifting pins 302 are moved up and down.
Also in Figure 21, going into platform (IN) 284 and putting into effect on (OUT) 286, with platform 280 on coating scanning direction (Y direction) orthogonal horizontal direction (directions X) on be respectively arranged with fixed horizontal feed path 232A, 232B. Fixedly transport path 232A, 232B constitute the interval in the 1st horizontal feed path 232 (Figure 19) respectively for these; The fixedly transport path 232A that sends into side is as being introduced in the platform (IN) 284 from the prolongation of the adjacent processing under cooling assembly (COL) 242 (Figure 19) of upstream side; The fixedly transport path 232B that sees side off is starting point again, drying under reduced pressure assembly (VD) 46 (Figure 19) extension that side is adjacent downstream to put into effect (OUT) 286.Two fixedly transport path 232A, 232B across the superjacent air space of platform 280 and separate and opposed each other.
In addition, fixedly the illustrated structure of transport path 232A, 232B is an example, can carry out various distortion.For example, also can replace roller 304A, 304B are constituted with 1 axle and constitute with a plurality of stationary rolls that are configured to row.Perhaps, also can replace the roller mode of movement and make the band mode of movement.
And then, going into platform (IN) 284 and putting into effect on (OUT) 286, below fixedly transport path 232A, 232B, be respectively equipped with movable advection transfer mechanism 320A, 320B.Shown in figure 24, movable transfer mechanism 320A, 320B have and can and liftably be loaded in conveying-bridge 326A, the 326B of the last cantilever style of this base portion 324A, 324B along mobile base portion 324A, the 324B of guide rail 322A, the 322B along continuous straight runs (directions X) laid abreast with fixedly transport path 232A, 232B.
Each conveying- bridge 326A, 326B have up-down main body 328A, 328B and stretch out many (the being 4) 330A of socle girder portion, 330B of extension and separate certain interval embodiment illustrated to platform 280 sides from this up-down main body 328A, 328B and be installed in the 330A of each socle girder portion, last a plurality of roller 332A, the 332B of 330B; As after constitute stating; On moving position, make up-down main body 328A, 328B and the 330A of socle girder portion, 330B at set pedestal, on moving position, roller 332A, 332B are rotatablely moved at set bridge with respect to base portion 324A, 324B lifting moving.
Here, according to Figure 24～Figure 32, explain to be used for the glass substrate Gi after on platform 280, handling is switched to a series of action of the next glass substrate Gi+1 before handling.
During carrying out on the platform 280 the resist coating of glass substrate Gi is handled; Shown in figure 24; Going into platform (IN) 284 and putting into effect on (OUT) 286, movable transfer mechanism 320A, 320B be set in fixedly transport path 232A, 232B under toward moving the static or standby in position.At this on moving position, each conveying- bridge 326A, 326B hide each fixedly transport path 232A, 232B below.Roller 332A, 332B are also keeping stationary state.
This resist applies and handles if be through with, and is then shown in figure 25, and lifting pin 302 is outstanding and glass substrate Gi is lifted under horizontality surpasses the fixedly set height location (unloading) of the height of transport path 232A, 232B to the top among the platform 280.Then, going into platform (IN) 284 and putting into effect on (OUT) 286, transfer mechanism 320A, 320B toward moving to be set near the platform 280 toward moving the position.Like Figure 25 and shown in Figure 26; At this on moving position; Two conveying- bridge 326A, 326B extract out in fixing lower direction platform 280 sides of transport path 232A, 232B; And be erected at the top of platform 280 from the left and right sides, so that on the central position of the platform 280 on the throughput direction (directions X), front end is bonded with each other.In addition, shown in figure 26, each conveying- bridge 326A, 326B do not collide with the lifting pin 302 that is projected on the platform 280.
Then, shown in figure 27, last at two movable transfer mechanism 320A, 320B, conveying- bridge 326A, 326B rise under the state of flat-hand position toward moving position, with fixedly transport path 232A, 232B become same.At this on moving position; On the terminal of the fixedly transport path 232A that sends into side, connecting upstream side conveying-bridge 326A; On the initiating terminal of the fixedly transport path 232B that sees side off, connecting downstream side conveying-bridge 326B, two conveying- bridge 326A, 326B also make front end involutory each other and connect.That is, the fixedly transport path 232A that will send into side via two conveying- bridge 326A, 326B links with the fixedly transport path 232B that sees side off, temporarily forms the 1st horizontal feed path 232.On the other hand, the next glass substrate Gi+1 before handling is sent on the platform (IN) 284 on set opportunity from the adjacent processing under cooling assembly (COL) 242 (Figure 19) of upstream side, temporarily stops sending on the fixedly transport path 232A of side.
Then, shown in figure 28, lifting pin 302 descends and moves to set height location (the for example yielding position in the platform 280), and in it descended the way, glass substrate Gi was lifted on pin 302 transfers to two a conveying-bridge 326A, the 326B.
Then; Shown in figure 29; Two conveying- bridge 326A, 326B begin rotatablely moving of roller 332A, 332B simultaneously, glass substrate Gi is seen off to putting into effect (OUT) 286 sides, and the fixedly transport path 232B that sees side off also make roller 304B rotation and accepts glass substrate Gi.Here, roller 332A, 332B, 304B are respectively with set speed of rotation rotation, so that carry glass substrate Gi with identical roller transfer rate.On the other hand, the fixedly transport path 232A that sends into side also makes roller 304A rotation and next glass substrate Gi+1 is seen off to platform 280 sides.Here, also set the speed of rotation of roller 304A, 332A, 332B, so that carry glass substrate Gi+1 with identical roller transfer rate.
Like this; Linking for the fixedly transport path 232A, conveying-bridge 326A, the 326B that send into side of straight line and seeing off on the fixedly transport path 232B of side, glass substrate Gi after handling simultaneously with the mode of index feed and the switching of handling preceding next glass substrate Gi+1.And, if glass substrate Gi+1 has come the desired location directly over the platform 280, then carve rotatablely moving of the roller 304A that stops two conveying- bridge 326A, 326B simultaneously, 304B at this moment, on two conveying- bridge 326A, 326B, glass substrate Gi+1 is located.On the other hand, the glass substrate Gi after the processing advances in seeing the fixedly transport path 232B of side off, is fed in the adjacent drying under reduced pressure assembly (VD) 249 (Figure 19) in downstream side.
Then, shown in figure 30 on platform 280, lifting pin 302 rises once more and moves to toward moving position, obtains glass substrate Gi+1 from two conveying- bridge 326A, 326B with horizontal state.
Then, shown in figure 31, two movable transfer mechanism 320A, 320B make conveying- bridge 326A, 326B drop to the height location of double action on platform 280.
Then, shown in figure 32, two movable transfer mechanism 320A, 320B retreats or make a concession the double action position, and lifting pin 302 descends and moves to the double action position then, and glass substrate Gi+1 is loaded on the platform 280 with flat-hand position.
As stated; Resist at this embodiment applies in the processing components (CT) 244; Because carrying, the roller through advection carries out simultaneously, so can short period of time ground realize the switching of high efficiency substrate for the seeing off of the glass substrate Gi after the sending into and handle of the glass substrate Gi+1 before the processing of platform 280.Thus, improve the conveying turnout in the 1st horizontal feed path 232 on the processing route A under this assembly (CT) 244, and also improved the conveying turnout and the production efficiency of entire system.
In addition, be not rotated on the ground and the transfer robot of lifting moving owing near platform 280, be arranged on fully, thus can from around not bring deleterious mechanical vibration for platform 280.Fixedly the last roller of transport path 232A, 232B carries that to compare with the conveying action of transfer robot be very quiet. Movable transfer mechanism 320A, 320B apply on the platform 280 processing during static below fixedly transport path 232A, 232B, can not vibrate yet.In addition, owing to be not rotated motion, so also better aspect the security when flase operation.
Then, according to Figure 33～Figure 34, the movable transfer mechanism 320A in the above-mentioned embodiment, the concrete structure example of 320B are described.Two movable transfer mechanism 320A, 320B are because the left and right symmetrically action, so have identical structure usually.
The one-piece construction of the movable transfer mechanism 320 (320A, 320B) of expression one embodiment among Figure 33.Base portion 324 is made up of leveling board, is bearing in slidably on the parallel pair of guide rails 322 via slide section 340.Up-down main body 328 also is made up of leveling board, liftably is installed on the base portion 324 via bridge lifting unit 342.Here; Bridge lifting unit 342 has cylinder 344 and the linear bearing 346 that for example is fixed on the base portion 324 and is fixed on the slide shaft 345 on the up-down main body 328; The piston rod 344a of cylinder 344 is combined on the up-down main body 328, makes slide shaft 345 along being bearing in slidably on the linear bearing 346 on the vertical direction.
On conveying-bridge 326, each socle girder portion 330 constitutes the square rod of hollow, the roller driving part that is used for rotating driving roll 332 is housed within it in housing 348 inside of portion and base end side, and the electromotor 350 of drive source is installed on a side of housing 348.
The structure of expression roller driving part among Figure 34～Figure 36.Shown in figure 34; Among housing 348; Be provided with and combine with the turning axle of in addition electromotor 350 and, on this rotating driveshaft 352, on the position that intersects with each socle girder portion 330, drive pulley 356 is installed by the rotatably mounted rotating driveshaft 352 of bearing 354.Each drive pulley 356 combines with each roller 332 action through the transmission rig 358 that extends to the belt in each socle girder portion 330.In addition, be used for the vapor pipe 355 that the dust and dirt that reach in the housing 348 in the socle girder portion 330 are discharged is connected on the side of housing 348.
Shown in figure 35, in the inside of socle girder portion 330, roller 332 is with 366 synchronously via what combined, on gear pulley 364, be wound with to be communicated to drive pulley 356 integratedly with gear pulley 364 by the rotating driveshaft 362 of bearing 360 supporting.The top of roller 332 is outstanding from the opening 368 on the upper surface that is formed at socle girder portion 330, glass substrate G is carried to put on its end face carry.
Shown in figure 36, with between 366 follow-up pulleies 370 that are erected on the leading section that is disposed at the drive pulley 356 in the housing 348 and is disposed at each socle girder portion 330, on the way partly be wound on the periphery of each gear pulley 364 synchronously.Near each gear pulley 364, dispose idler sheaves 372, also can dally through making idler sheaves 372 be displaced to the off-position 372 ' shown in the long and short dash line from the open site of solid line.
For movable transfer mechanism 320 (particularly base portion 324) is moved horizontally on guide rail 322, shown in figure 37, can use the for example driving mechanism of belt.Set up cyclic rotating band 380 in the drive pulley 376 of double action position side and between the follow-up pulley 378 of moving position side, base portion 324 has been fixed on this rotating band 380.Drive pulley 376 is driven by electromotor 382 rotations, for example transfers driving movable transfer mechanism 320 through the dextrorotation of electromotor 382 and advances, and transfers driving movable transfer mechanism 320 through the derotation of electromotor 382 and retreats.
The variation of expression conveying- bridge 326A, 326B among Figure 38.As shown in the figure; Make the 330AE of socle girder portion, the 330BE at many (for example 4) 330A of socle girder portion among each conveying-bridge 326A, the 326B, the two ends among the 330B parallel, make its inboard 330AC of socle girder portion, 330BC oblique with the appropriate tilt angle lapping with respect to throughput direction (directions X) with throughput direction (directions X).Thus, last a plurality of roller 332A, the 332B of the 330AC of socle girder portion, 330BC that is installed in the inboard going up with set spacing biasing with the orthogonal horizontal direction of throughput direction (directions X) (Y direction) and is being configured to row.
According to this structure; Will apply glass substrate G after handling at conveying- bridge 326A, 326B is last when carrying; The ratio that the 330AE of socle girder portion, the last inboard substrate regions (product area) except both side ends of 330BE point-blank contact with roller 332A, 332B on throughput direction (directions X) tails off, so can prevent the variation (bar is uneven) because of the resist coated film RM that produces to the heat flow of roller from substrate effectively.In addition, also can be only the 330AE of socle girder portion, the roller 332A of 330BE, 332B through two side ends carry out driving that roller carries, the 330AC of socle girder portion, the roller 332A of 330BC, the 332B of inboard made the structure of the non-driving that can rotate freely.The 330AE of socle girder portion of two side ends, 330BE be the side edge part of supporting glass substrate G (for example apart from the edge 15mm) preferably.
In addition; The material of roller 332A, 332B be preferably above-mentioned that kind not only from substrate to the less and anti-static behaviour of the heat flow of roller and wearability also material preferably, for example for example can preferably adopting, the ultrahigh molecular weight polyethylene(UHMWPE) of electroconductibility (is called for short: UHMW-PE).
In above-mentioned embodiment; Be to dispose symmetrical movable transfer mechanism 320A, 320B, involutory and past moving above platform 280 in the both sides of platform 280 through making each conveying- bridge 326A, 326B; Glass substrate G is sent into, passes out to the structure on the platform 280 with each burden of 1/2, is favourable for the maximization of substrate.But,, then also can that kind shown in figure 39 make the structure of sending into, seeing off of only carrying out glass substrate G through the movable transfer mechanism 320A in one-sided (for example left side) if the size of platform 280 and glass substrate G is so not big.
The structure of platform 280 also can be carried out various distortion, for example also can be to make glass substrate G on the platform 280, float to the non-whirl coating that carries out coating scanning between aerial, as to float state glass substrate G and the nozzle.In addition, the present invention also can be applicable to the whirl coating that on platform 280, makes glass substrate G rotation, and then, being not limited to applying device, the present invention also can be applicable in the substrate board treatment arbitrarily that on platform, carries out processing substrate.Thereby, as treatment solution of the present invention, except resist liquid, also can be the coating liquid of interlayer dielectic, dielectric material, wiring material etc. for example, also can be developing solution and rinsing liquid etc.And then the present invention is not limited to platform, can be applicable to carrying out in the base board delivery device of sending into, seeing off of substrate at both handling parts arbitrarily of the enterprising capable processing substrate of allocation.
More than, preferred embodiment be illustrated of the present invention with reference to accompanying drawing, but the present invention is not limited to this.For a person skilled in the art, in the category of the thought in being recorded in the scope of claims, can expect various variation certainly or revise example, will be appreciated that they also belong in the technical scope of the present invention certainly.
In addition, the present invention also can be applicable to the situation of other substrates such as masterplate that other FPD (flat-panel monitor) that carry beyond the glass substrate G or photomask use, semiconductor wafer, CD substrate, printed base plate.
Industrial applicibility
The present invention does not have practicality at conveying substrate so that the coating liquid on the substrate does not produce when applying inequality.
Claims (23)
1. a substrate conveyance system is coated to the coating handling part conveying substrate on the substrate with respect to applying liquid, it is characterized in that possessing:
Carry body, have can supporting substrates and a plurality of rollers of arranging of along continuous straight runs, integratedly support above-mentioned a plurality of rollers support unit, above-mentioned support unit is moved and make above-mentioned a plurality of roller with respect to the travel mechanism that applies the handling part advance and retreat and make the rotary driving part of above-mentioned a plurality of roller rotations;
Hoisting appliance makes the substrate elevating of above-mentioned coating handling part.
2. substrate conveyance system as claimed in claim 1 is characterized in that,
Above-mentioned a plurality of roller; Begin to contact successively mode on the lower surface of the substrate of above-mentioned coating handling part, enter into downside and the supporting substrates of the substrate of above-mentioned coating handling part with roller, retreat from above-mentioned coating handling part supporting under the state of aforesaid substrate from the place ahead of above-mentioned coating handling part side.
3. substrate conveyance system as claimed in claim 2 is characterized in that,
Above-mentioned a plurality of roller rotates so that can not squint in the position of the substrate of above-mentioned coating handling part on one side, Yi Bian enter into above-mentioned coating handling part.
4. substrate conveyance system as claimed in claim 2 is characterized in that,
Through rotation substrate rearward side conveying with supporting, from above-mentioned coating handling part retreat on one side by one side for above-mentioned a plurality of roller.
5. substrate conveyance system as claimed in claim 2 is characterized in that,
Above-mentioned hoisting appliance possesses the lower surface of supporting substrates and a plurality of Lift Parts that go up and down,
Above-mentioned a plurality of Lift Part begins to descend successively from the Lift Part of the approaching side of above-mentioned roller, so that match with the entering of above-mentioned a plurality of rollers and do not contact with this roller, gives roller with substrate delivery/reception.
6. like claim 1,2,3,4 or 5 described substrate conveyance systems, it is characterized in that,
Possess other that have identical structure with above-mentioned conveying body and have a plurality of other rollers, other support units, other travel mechanisms, other rotary driving parts and carry bodies,
Above-mentioned a plurality of other rollers enter into above-mentioned coating handling part supporting under the state of substrate, on one side rotation retreat from above-mentioned coating handling part on one side so that can not squint in the position of the substrate of above-mentioned coating handling part.
7. substrate conveyance system as claimed in claim 6 is characterized in that,
Above-mentioned hoisting appliance possesses the lower surface of supporting substrates and a plurality of Lift Parts that go up and down,
Above-mentioned a plurality of Lift Part begins to rise successively from the Lift Part of the approach axis front side that is in above-mentioned other rollers, so that match with retreating of above-mentioned a plurality of other rollers and do not contact with this roller, comes supporting substrates.
8. a substrate conveyance system is coated to the coating handling part conveying substrate on the substrate with respect to applying liquid, it is characterized in that possessing:
Carry body, having can supporting substrates and the support unit of the rotating band that can rotate, the above-mentioned rotating band of supporting, above-mentioned support unit is moved and make above-mentioned rotating band with respect to the travel mechanism that applies the handling part advance and retreat and make the rotary driving part of above-mentioned rotating band rotation;
Hoisting appliance makes the substrate elevating of above-mentioned coating handling part.
9. substrate conveyance system as claimed in claim 8 is characterized in that,
Above-mentioned rotating band; Begin to contact successively with the place ahead from above-mentioned coating handling part side above-mentioned coating handling part substrate lower surface mode, enter into downside and the supporting substrates of the substrate of above-mentioned coating handling part, retreat from above-mentioned coating handling part supporting under the state of aforesaid substrate.
10. substrate conveyance system as claimed in claim 9 is characterized in that,
Above-mentioned rotating band rotates so that can not squint in the position of the substrate of above-mentioned coating handling part on one side, Yi Bian enter into above-mentioned coating handling part.
11. substrate conveyance system as claimed in claim 9 is characterized in that,
Above-mentioned rotating band on one side through rotation with the substrate of supporting rearward side carry, on one side retreat from above-mentioned coating handling part.
12. substrate conveyance system as claimed in claim 9 is characterized in that,
Above-mentioned hoisting appliance possesses the lower surface of supporting substrates and a plurality of Lift Parts that go up and down,
Above-mentioned a plurality of Lift Part begins to descend successively so that match with the entering of above-mentioned rotating band and do not contact with rotating band from the Lift Part of the approaching side of above-mentioned rotating band, gives rotating band with substrate delivery/reception.
13. like claim 8,9,10,11 or 12 described substrate conveyance systems, it is characterized in that,
Possess other conveying bodies that have the structure identical and have other rotating bands, other support units, other driving mechanisms and other rotary driving parts with above-mentioned conveying body;
Above-mentioned other rotating bands enter into above-mentioned coating handling part supporting under the state of substrate, on one side rotation retreat from above-mentioned coating handling part on one side so that applying the position of the substrate of handling part can not squint.
14. substrate conveyance system as claimed in claim 13 is characterized in that,
Above-mentioned hoisting appliance possesses the lower surface of supporting substrates and a plurality of Lift Parts of going up and down,
Above-mentioned a plurality of Lift Part begins to rise successively so that match and do not contact with other rotating bands with above-mentioned other retreating of rotating band from the Lift Part of the approach axis front side that is in above-mentioned other rotating bands, comes supporting substrates.
15. a base board delivery device, the aforesaid substrate after the aforesaid substrate before being used for will handling with respect to the handling part of on both allocations, substrate being implemented set processing is sent into, will be handled is seen off, it is characterized in that having:
The 1st fixing transport path is laid and is used for carrying the 1st of aforesaid substrate to carry body with horizontality, and a sidepiece at above-mentioned handling part on the 1st direction of level has the terminal;
The 2nd fixing transport path is laid and is used for carrying the 2nd of aforesaid substrate to carry body with horizontality, and another sidepiece at above-mentioned handling part on above-mentioned the 1st direction has initiating terminal;
Movable conveying-bridge; Constitute to be equipped with and be used for carrying the 3rd of aforesaid substrate to carry body with horizontality; Can be at bridge toward moving between moving position and the bridge double action position, said bridge toward moving position be used for aforesaid substrate be sent in the above-mentioned handling part perhaps with aforesaid substrate from above-mentioned handling part see off the above-mentioned the 1st fixedly transport path terminal or the above-mentioned the 2nd fixedly the initiating terminal of transport path be connected and be erected at the top of above-mentioned handling part, said bridge double action position hide make a concession when the processing substrate that is used at above-mentioned handling part the above-mentioned the 1st or the 2nd fixedly transport path below;
In order aforesaid substrate to be sent in the above-mentioned handling part and linkage driving the above-mentioned the 1st carry body and the above-mentioned the 3rd carry body, for aforesaid substrate is seen off and linkage driving the above-mentioned the 2nd is carried body and above-mentioned the 3rd conveying body from above-mentioned.
16. base board delivery device as claimed in claim 15 is characterized in that, has:
Movable base is loaded above-mentioned movable conveying-bridge;
The pedestal moving part makes said base move between moving position corresponding to the pedestal double action position of above-mentioned bridge double action position and corresponding to the pedestal of above-mentioned bridge toward moving position on above-mentioned the 1st direction;
Make the bridge lifting unit of above-mentioned movable conveying-bridge lifting moving on said base.
17. base board delivery device as claimed in claim 15 is characterized in that,
Above-mentioned movable conveying-bridge is divided into the 1st cantilever style conveying-bridge and the 2nd cantilever style conveying-bridge by 2;
Above-mentioned the 1st cantilever style conveying-bridge constitutes, can with the above-mentioned the 1st fixedly the terminal of transport path be connected and be erected at above-mentioned above Bridge 1 toward moving position with hide the above-mentioned the 1st fixedly mobile between the Bridge 1 double action position under the transport path,
Above-mentioned the 2nd cantilever style conveying-bridge constitutes, can with the above-mentioned the 2nd fixedly the initiating terminal of transport path be connected and be erected at above-mentioned above Bridge 2 toward moving position with hide fixedly mobile between the Bridge 2 double action position under the transport path the above-mentioned the 2nd.
18. base board delivery device as claimed in claim 17 is characterized in that, has:
The 1st movable pedestal loads above-mentioned the 1st cantilever style conveying-bridge;
The 1st pedestal moving part makes above-mentioned the 1st pedestal move between moving position corresponding to the 1st pedestal double action position of above-mentioned Bridge 1 double action position with corresponding to the 1st pedestal of above-mentioned Bridge 1 toward moving position on above-mentioned the 1st direction;
The Bridge 1 lifting unit makes above-mentioned the 1st cantilever style conveying-bridge lifting moving on above-mentioned the 1st pedestal;
The 2nd movable pedestal loads above-mentioned the 2nd cantilever style conveying-bridge;
The 2nd pedestal moving part makes above-mentioned the 2nd pedestal move between moving position corresponding to the 2nd pedestal double action position of above-mentioned Bridge 2 double action position with corresponding to the 2nd pedestal of above-mentioned Bridge 2 toward moving position on above-mentioned the 2nd direction;
The Bridge 2 lifting unit makes above-mentioned the 2nd cantilever style conveying-bridge lifting moving on above-mentioned the 2nd pedestal.
19. base board delivery device as claimed in claim 17 is characterized in that,
Above-mentioned the 1st pedestal moving part makes above-mentioned the 1st pedestal move horizontally between moving position in above-mentioned the 1st pedestal double action position and above-mentioned the 1st pedestal,
Above-mentioned Bridge 1 lifting unit makes above-mentioned the 1st cantilever style conveying-bridge lifting moving on above-mentioned the 1st pedestal at above-mentioned the 1st pedestal on moving position,
Above-mentioned the 2nd pedestal moving part makes above-mentioned the 2nd pedestal move horizontally between moving position in above-mentioned the 2nd pedestal double action position and above-mentioned the 2nd pedestal,
Above-mentioned Bridge 2 lifting unit makes above-mentioned the 2nd cantilever style conveying-bridge lifting moving on above-mentioned the 2nd pedestal at above-mentioned the 2nd pedestal on moving position.
20. like claim 17,18 or 19 described base board delivery devices, it is characterized in that,
Above-mentioned the 1st cantilever style conveying-bridge has:
The 1st up-down main body liftably is bearing on above-mentioned the 1st pedestal;
Many socle girder portions stretch out and extend to above-mentioned side from above-mentioned the 1st up-down main body;
A plurality of the 1st rollers carry body to be rotatably installed in each above-mentioned socle girder portion as the above-mentioned the 3rd;
The 1st roller driving part is located on the above-mentioned Bridge 1 main body in order to produce the power that drives above-mentioned the 1st roller rotation;
The 1st driving section is used for the rotary driving force that is produced by above-mentioned the 1st roller driving part is passed to a part or whole above-mentioned the 1st rollers;
Above-mentioned the 2nd cantilever style conveying-bridge has:
The 2nd up-down main body liftably is bearing on above-mentioned the 2nd pedestal;
Many socle girder portions stretch out and extend to above-mentioned side from above-mentioned the 2nd up-down main body;
A plurality of the 2nd rollers carry body to be rotatably installed in each above-mentioned socle girder portion as the above-mentioned the 3rd;
The 2nd roller driving part is located on the above-mentioned Bridge 2 main body in order to produce the power that drives above-mentioned the 2nd roller rotation;
The 2nd driving section is used for the rotary driving force that is produced by above-mentioned the 2nd roller driving part is passed to a part or whole above-mentioned the 2nd rollers.
21. base board delivery device as claimed in claim 20 is characterized in that,
In a part or whole above-mentioned socle girder portion, above-mentioned a plurality of the 1st rollers with the 2nd direction of the orthogonal level of above-mentioned the 1st direction on set spacing biasing and arrange.
22. substrate board treatment; Have on platform approximate horizontal ground supporting substrates and implement the handling part of set processing and be used for will handling with respect to above-mentioned handling part before the following base board delivery device seen off of the aforesaid substrate of aforesaid substrate after sending into, maybe will handling; It is characterized in that
The aforesaid substrate e Foerderanlage has:
The 1st fixing transport path is laid and is used for carrying the 1st of aforesaid substrate to carry body with horizontality, and a sidepiece at above-mentioned handling part on the 1st direction of level has the terminal;
The 2nd fixing transport path is laid and is used for carrying the 2nd of aforesaid substrate to carry body with horizontality, and another sidepiece at above-mentioned handling part on above-mentioned the 1st direction has initiating terminal;
Movable conveying-bridge; Constitute to be equipped with and be used for carrying the 3rd of aforesaid substrate to carry body with horizontality; Can be at bridge toward moving between moving position and the bridge double action position, said bridge toward moving position be used for aforesaid substrate be sent in the above-mentioned handling part perhaps with aforesaid substrate from above-mentioned handling part see off the above-mentioned the 1st fixedly transport path terminal or the above-mentioned the 2nd fixedly the initiating terminal of transport path be connected and be erected at the top of above-mentioned handling part, said bridge double action position hide make a concession when the processing substrate that is used at above-mentioned handling part the above-mentioned the 1st or the 2nd fixedly transport path below;
In order aforesaid substrate to be sent in the above-mentioned handling part and linkage driving the above-mentioned the 1st carry body and the above-mentioned the 3rd carry body, for aforesaid substrate is seen off and linkage driving the above-mentioned the 2nd is carried body and above-mentioned the 3rd conveying body from above-mentioned.
23. substrate board treatment as claimed in claim 22 is characterized in that,
Above-mentioned handling part for aforesaid substrate is loaded on the above-mentioned platform, with aforesaid substrate from above-mentioned unloading, or above above-mentioned, carry out the handing-over of aforesaid substrate with above-mentioned movable conveying-bridge, have and connect above-mentioned and the many lifting pins that can constitute up or down.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005350880A JP4745040B2 (en) | 2005-12-05 | 2005-12-05 | Substrate transport apparatus and substrate processing apparatus |
| JP2005350880 | 2005-12-05 | ||
| JP2005-350880 | 2005-12-05 | ||
| JP2005-375304 | 2005-12-27 | ||
| JP2005375304 | 2005-12-27 | ||
| JP2005375304A JP4593461B2 (en) | 2005-12-27 | 2005-12-27 | Substrate transfer system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1978356A CN1978356A (en) | 2007-06-13 |
| CN1978356B true CN1978356B (en) | 2012-03-21 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2006101642025A Expired - Fee Related CN1978356B (en) | 2005-12-05 | 2006-12-05 | Substrate conveying system, substrate conveying device and substrate treatment device |
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| JP (1) | JP4745040B2 (en) |
| CN (1) | CN1978356B (en) |
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|---|---|---|---|---|
| JPH0625010Y2 (en) * | 1988-10-19 | 1994-06-29 | 株式会社東京精密 | Wafer delivery mechanism |
| JP3070006B2 (en) * | 1997-02-07 | 2000-07-24 | 株式会社オーク製作所 | How to transport thin work |
| JP2005247516A (en) * | 2004-03-05 | 2005-09-15 | Tokyo Electron Ltd | Levitated substrate conveying treatment device |
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2005
- 2005-12-05 JP JP2005350880A patent/JP4745040B2/en not_active Expired - Fee Related
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1455951A (en) * | 2001-02-27 | 2003-11-12 | 住友精密工业株式会社 | Lift type substrate treatment device, and substrate treatment system with the substrate treatment device |
| CN1426087A (en) * | 2001-11-30 | 2003-06-25 | 东京毅力科创株式会社 | Lining treatment system |
| CN1532128A (en) * | 2003-03-24 | 2004-09-29 | 三菱电机株式会社 | Base board transport device |
Non-Patent Citations (2)
| Title |
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| JP特开2005-272061A 2005.10.06 |
| JP特开平6-41746A 1994.02.15 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104176466A (en) * | 2013-05-28 | 2014-12-03 | 北京中电科电子装备有限公司 | Workpiece transmitting device with cleaning function |
| CN104176466B (en) * | 2013-05-28 | 2017-06-09 | 北京中电科电子装备有限公司 | Workpiece transmitting device with cleaning function |
| CN112659760A (en) * | 2020-12-15 | 2021-04-16 | 深圳市升达康科技有限公司 | Floating support device and code printing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007158005A (en) | 2007-06-21 |
| JP4745040B2 (en) | 2011-08-10 |
| CN1978356A (en) | 2007-06-13 |
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