CN1804723A - Making method of through printing forme for screen printing - Google Patents
Making method of through printing forme for screen printing Download PDFInfo
- Publication number
- CN1804723A CN1804723A CN 200610041668 CN200610041668A CN1804723A CN 1804723 A CN1804723 A CN 1804723A CN 200610041668 CN200610041668 CN 200610041668 CN 200610041668 A CN200610041668 A CN 200610041668A CN 1804723 A CN1804723 A CN 1804723A
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- China
- Prior art keywords
- printing
- printing forme
- silk screen
- layer
- screen
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
The invention relates to a method making screen painting used image missing plate, which first coats a layer of photosensitive resist layer with needed thickness on the screen and dries it at 30-60 deg.; then it coats the second layer of photosensitive resist layer with needed thickness on the screen and dries it at 30-60 deg.; at last it uses etching method to form the needed image missing plate.
Description
Technical field
The present invention relates to a kind of method for making of through printing forme, particularly a kind of serigraphy method for making of through printing forme.
Background technology
The method that tradition forms plasma display screen barrier is to utilize silk screen print method and sand-blast, no matter which kind of method is when forming the barrier material layer, can form the barrier material layer with silk screen print method, yet in traditional through printing forme printing barrier, because silk screen is thinner, generally have only tens microns, and the dry-film resist of through printing forme is also thinner, has only several microns.Slurry when therefore printing in the graph area is less-and the blanking amount is fewer, causes print pass to increase, and is time-consuming, causes the huge waste of manpower and materials.
Form in the print process of plasma panel electrode in tradition, usually because the dry-film resist of through printing forme figure is thinner, the silk thread of silk screen can stay impression on glued membrane, and the uneven phenomenon of electrode edge when causing printing.
Summary of the invention
The objective of the invention is to overcome the shortcoming of above-mentioned prior art, a kind of method for making that can make the minimizing of barrier print pass, the neat serigraphy of electrode edge printing use through printing forme is provided.
For achieving the above object, the technical solution used in the present invention is: at first, on silk screen, apply the photosensitive layer of one deck desired thickness with coating process, and dry down at 30-60 ℃; Then, at silk screen positive coating second layer photoresists and dry under 30-60 ℃, last, form required through printing forme by photoetching process.
Another characteristics of the present invention are: silk screen back side coating second layer photoresists and 30-60 ℃ of drying; The thickness of second layer photoresists is the 3-30 micron.
Because the present invention applies photoresists and forms required through printing forme by photoetching process on silk screen, make that print pass reduces, and has reduced production cost when the printing slurry, pattern edge is also neat than before when printing in addition, has improved printing quality.
Description of drawings
Fig. 1 is the silk screen schematic cross-section;
Fig. 2 is a through printing forme sectional view of the present invention;
Fig. 3 is the sectional view of another structure of through printing forme of the present invention.
Embodiment
Below in conjunction with accompanying drawing the present invention is described in further detail.
Referring to Fig. 1,2,3, through printing forme manufacturing process of the present invention is as follows: the photosensitive layer 2 that at first applies one deck desired thickness on silk screen 3 with coating process, dry under 30-60 ℃, be the second layer photoresists 1 of 3-30 micron in the positive applied thickness of silk screen then, 30-60 ℃ is dry down, the present invention can be 3-30 micron second layer photoresists 1` in silk screen back side applied thickness also, 30-60 ℃ of drying.If photoresists thickness does not reach requirement, then can continue coating and dry, reach required thickness until photosensitive layer, form required figure with photoetching process at last.
Claims (3)
1, a kind of serigraphy method for making of through printing forme is characterized in that:
1) at first, go up the photosensitive layer [] 2 that applies one deck desired thickness with coating process at silk screen [3], and dry down at 30-60 ℃;
2) then, at silk screen positive coating second layer photoresists [1] and dry under 30-60 ℃,
3) last, form required through printing forme by photoetching process.
2, serigraphy according to claim 1 is characterized in that: said at silk screen back side coating second layer photoresists [1`] and 30-60 ℃ of drying with the method for making of through printing forme.
3, serigraphy according to claim 1 and 2 is characterized in that with the method for making of through printing forme: the thickness of said second layer photoresists [1,1`] is the 3-30 micron.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610041668 CN1804723A (en) | 2006-01-13 | 2006-01-13 | Making method of through printing forme for screen printing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200610041668 CN1804723A (en) | 2006-01-13 | 2006-01-13 | Making method of through printing forme for screen printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1804723A true CN1804723A (en) | 2006-07-19 |
Family
ID=36866787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200610041668 Pending CN1804723A (en) | 2006-01-13 | 2006-01-13 | Making method of through printing forme for screen printing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1804723A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101698367B (en) * | 2009-09-27 | 2011-01-05 | 天津市中环高科技有限公司 | Manufacturing method of screen used for screen printing of special-shaped surfaces |
| CN103331995A (en) * | 2013-06-14 | 2013-10-02 | 广东东鹏陶瓷股份有限公司 | Checking device for screen print of ceramic tile and use method thereof |
-
2006
- 2006-01-13 CN CN 200610041668 patent/CN1804723A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101698367B (en) * | 2009-09-27 | 2011-01-05 | 天津市中环高科技有限公司 | Manufacturing method of screen used for screen printing of special-shaped surfaces |
| CN103331995A (en) * | 2013-06-14 | 2013-10-02 | 广东东鹏陶瓷股份有限公司 | Checking device for screen print of ceramic tile and use method thereof |
| CN103331995B (en) * | 2013-06-14 | 2016-03-30 | 广东东鹏陶瓷股份有限公司 | A kind of calibration equipment of screen printing of ceramic tiles and use its method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: SICHUAN SHIJI SHUANGHONG DISPLAY DEVICES CO., LTD Free format text: FORMER OWNER: IRICO GROUP ELECTRONICS CO., LTD. Effective date: 20070622 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20070622 Address after: 621000, Zhou Yonghong, No. 35 Tung Hing East Road, hi tech Zone, Sichuan, Mianyang Applicant after: Sichuan Sterope Orion Display Co., Ltd. Address before: 712021 No. 1 Rainbow Road, Shaanxi, Xianyang Applicant before: IRICO Group Electronics Co., Ltd. |
|
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |