CN1755526A - 基板处理*** - Google Patents
基板处理*** Download PDFInfo
- Publication number
- CN1755526A CN1755526A CNA2005101079651A CN200510107965A CN1755526A CN 1755526 A CN1755526 A CN 1755526A CN A2005101079651 A CNA2005101079651 A CN A2005101079651A CN 200510107965 A CN200510107965 A CN 200510107965A CN 1755526 A CN1755526 A CN 1755526A
- Authority
- CN
- China
- Prior art keywords
- substrate
- table top
- treating
- resist
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
- B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
- B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004287596 | 2004-09-30 | ||
JP2004287596A JP2006100722A (ja) | 2004-09-30 | 2004-09-30 | 基板処理システム |
Publications (1)
Publication Number | Publication Date |
---|---|
CN1755526A true CN1755526A (zh) | 2006-04-05 |
Family
ID=36240209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNA2005101079651A Pending CN1755526A (zh) | 2004-09-30 | 2005-09-30 | 基板处理*** |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2006100722A (ja) |
KR (1) | KR20060051463A (ja) |
CN (1) | CN1755526A (ja) |
TW (1) | TWI281704B (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102166559A (zh) * | 2010-01-08 | 2011-08-31 | 大日本网屏制造株式会社 | 基板处理装置 |
CN102046840B (zh) * | 2008-03-25 | 2012-08-01 | 奥宝科技Lt太阳能有限公司 | 处理装置及处理方法 |
CN102687240A (zh) * | 2009-12-28 | 2012-09-19 | 龙云株式会社 | 基板用涂布装置及基板涂布方法 |
CN101281372B (zh) * | 2007-04-04 | 2012-11-28 | 细美事有限公司 | 涂布机及使用该涂布机以涂布溶液涂布基板的方法 |
CN103199031A (zh) * | 2012-01-04 | 2013-07-10 | 沈阳芯源微电子设备有限公司 | 全自动胶膜涂覆、显影装置 |
CN104597716A (zh) * | 2013-10-31 | 2015-05-06 | 上海和辉光电有限公司 | 曝光及显影设备以及曝光及显影方法 |
CN117184835A (zh) * | 2022-05-31 | 2023-12-08 | 上海德沪涂膜设备有限公司 | 涂布设备 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009065000A (ja) * | 2007-09-07 | 2009-03-26 | Tokyo Electron Ltd | 基板の処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム |
JP4900397B2 (ja) * | 2009-01-29 | 2012-03-21 | 東京エレクトロン株式会社 | 液処理装置 |
JP2011156482A (ja) * | 2010-02-01 | 2011-08-18 | Sharp Corp | 液体塗布装置 |
-
2004
- 2004-09-30 JP JP2004287596A patent/JP2006100722A/ja active Pending
-
2005
- 2005-09-12 TW TW094131361A patent/TWI281704B/zh not_active IP Right Cessation
- 2005-09-21 KR KR1020050087591A patent/KR20060051463A/ko not_active Application Discontinuation
- 2005-09-30 CN CNA2005101079651A patent/CN1755526A/zh active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101281372B (zh) * | 2007-04-04 | 2012-11-28 | 细美事有限公司 | 涂布机及使用该涂布机以涂布溶液涂布基板的方法 |
CN102046840B (zh) * | 2008-03-25 | 2012-08-01 | 奥宝科技Lt太阳能有限公司 | 处理装置及处理方法 |
CN102687240A (zh) * | 2009-12-28 | 2012-09-19 | 龙云株式会社 | 基板用涂布装置及基板涂布方法 |
CN102166559A (zh) * | 2010-01-08 | 2011-08-31 | 大日本网屏制造株式会社 | 基板处理装置 |
CN102166559B (zh) * | 2010-01-08 | 2013-08-21 | 大日本网屏制造株式会社 | 基板处理装置 |
CN103199031A (zh) * | 2012-01-04 | 2013-07-10 | 沈阳芯源微电子设备有限公司 | 全自动胶膜涂覆、显影装置 |
CN103199031B (zh) * | 2012-01-04 | 2015-10-14 | 沈阳芯源微电子设备有限公司 | 全自动胶膜涂覆、显影装置 |
CN104597716A (zh) * | 2013-10-31 | 2015-05-06 | 上海和辉光电有限公司 | 曝光及显影设备以及曝光及显影方法 |
CN117184835A (zh) * | 2022-05-31 | 2023-12-08 | 上海德沪涂膜设备有限公司 | 涂布设备 |
Also Published As
Publication number | Publication date |
---|---|
JP2006100722A (ja) | 2006-04-13 |
TWI281704B (en) | 2007-05-21 |
KR20060051463A (ko) | 2006-05-19 |
TW200627519A (en) | 2006-08-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20060405 |