CN1745197A - 复合的阻隔膜和方法 - Google Patents
复合的阻隔膜和方法 Download PDFInfo
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- CN1745197A CN1745197A CNA2003801094877A CN200380109487A CN1745197A CN 1745197 A CN1745197 A CN 1745197A CN A2003801094877 A CNA2003801094877 A CN A2003801094877A CN 200380109487 A CN200380109487 A CN 200380109487A CN 1745197 A CN1745197 A CN 1745197A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/048—Forming gas barrier coatings
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2365/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31547—Of polyisocyanurate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
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- Materials Engineering (AREA)
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- Metallurgy (AREA)
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- Polymers & Plastics (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
用于沉积的塑料 | Arton | PET | PET | PET | HC/ArtonLintec | HC/PETAutotype |
来源/级别 | JSRG-7810 | Dupont Teijin膜,ST-505 | GE | DH | CHC-PN188WPFW | AutoFlexEBA180L |
厚度(um) | 188 | 175 | 175 | 175 | 188 | 180 |
表面RMS(nm) | 3.7 | 5.2 | 2.7 | 3.8 | 2.3 | 未检测 |
Tg(C) | 171 | 78 | ~78 | ~78 | 171 | 78 |
MVTR(g/m2/day)(℃/RH) | 35.1(40/100) | 3.41(40/100) | 2.82(35/90) | 2.73(35/90) | 31.4(40/100) | 3.5(35/90) |
OTR(cc/m2/day)(℃/RH) | 1060(35/90) | 10.41(35/90) | 11.1(35/90) | 11.1(35/90) | 163(35/90) | 13.8(35/90) |
表面能(mN/M) | 38.9 | 43.3 | NA | NA | 36.3 | 40.4-42.0 |
%透射率(@550nm) | 91.31 | 92.75 | >90 | >85 | 91.14 | 89 |
实施例 | N2/Ar流量比 | 溅射功率(W) | SiN厚度(nm) |
1 | 10/0 | 1200 | 25.24 |
2 | 8/2 | 1500 | 37.5 |
3 | 10/0 | 1200 | 33.31 |
4 | 8/2 | 1500 | 41.52 |
5 | 8/2 | 1500 | 135.4 |
6 | 8/2 | 1500 | 42.4 |
7 | 8/2 | 1500 | 77.7 |
8 | 8/2 | 1500 | 100.7 |
9 | 8/2 | 1500 | 120.3 |
10 | 8/2 | 1000 | 125.6 |
11 | 8/2 | 1500 | 219.5 |
12 | 8/2 | 1200 | 24.4 |
13 | 8/2 | 1200 | 12.4 |
14 | 8/2 | 1200 | 20.0 |
15 | 8/2 | 2000 | 61.44 |
16 | 8/2 | 1000 | 19.7 |
17 | 8/2 | 1200 | 27.36 |
18 | 7/2 | 1500 | 127.53 |
19 | 8/2 | 1500 | 88.45 |
20 | 6/2 | 1000 | 75.88 |
21 | 7/2 | 1200 | 69.79 |
22 | 7/2 | 800 | 45.46 |
23 | 6/2 | 600 | 48.88 |
24 | 8/2 | 2000 | 100.06 |
25 | 8/2 | 1500 | 23.77 |
26 | 8/2 | 1500 | 10.27 |
实施例 | 基材 | SiN厚度(nm) |
27 | GE PET | 37.5 |
28 | GE PET | 42.4 |
29 | GE PET | 77.7 |
30 | GE PET | 120.3 |
31 | GE PET | 125.6 |
32 | GE PET | 135.4 |
33 | GE PET | 219.5 |
34 | HC/PET | 37.5 |
35 | HC/PET | 42.4 |
36 | HC/PET | 77.7 |
37 | HC/PET | 125.6 |
38 | HC/PET | 135.4 |
实施例的复合物 | 原子% | 原子比 | ||||
C | N | O | Si | Si/N | O/N | |
1 | 12.6 | 31.0 | 18.4 | 38.0 | 1.23 | 0.59 |
3 | 7.0 | 36.9 | 14.1 | 42.0 | 1.14 | 0.38 |
5 | 5.8 | 38.9 | 12.5 | 42.8 | 1.10 | 0.32 |
6 | 3.9 | 38.1 | 13.3 | 44.7 | 1.17 | 0.35 |
12 | 7.8 | 36.8 | 14.9 | 40.5 | 1.10 | 0.41 |
实施例的复合物 | SiN表面厚度(nm) | RMS复合物表面(nm) | Rmax(nm) |
对照物 | 0 | 2.3 | NA |
17 | 12.4 | 1.07 | 16 |
14 | 20.0 | 1.1 | 26 |
12 | 24.4 | 1.3 | 20 |
2 | 37.5 | 1.2 | 19 |
6 | 42.4 | 1.1 | 14 |
7 | 77.7 | 1.1 | 24 |
9 | 120.3 | 1.1 | 17 |
11 | 219.5 | 1.2 | 22 |
实施例 | SiN厚度(nm) | MVTR g/m2/天 | OTR cc/m2/天 |
对照物 | 0 | 31.4* | 163 |
1 | 25.24 | <0.005 | 1.13 |
2 | 37.5 | <0.005 | <0.005 |
3 | 33.31 | <0.005 | <0.005 |
4 | 41.52 | <0.005 | <0.005 |
5 | 135.4 | <0.005 | <0.005 |
6 | 42.4 | <0.005 | <0.005 |
7 | 77.7 | <0.005 | <0.005 |
8 | 100.7 | <0.005 | 0.96 |
9 | 120.3 | <0.005 | <0.005 |
10 | 125.6 | <0.005 | <0.005 |
11 | 219.5 | <0.005 | <0.005 |
12 | 24.44 | <0.005 | 0.69 |
13 | 12.40 | <0.005 | 1.59 |
15 | 61.44 | <0.005 | <0.005 |
16 | 19.7 | <0.005 | 0.005 |
实施例 | 基材 | SiN厚度(nm) | MVTRg/m2/天 | OTRcc/m2/天 |
对照物 | GE PTE | 0 | 2.82 | 11.1 |
27 | GE PTE | 37.5 | 0.09 | 0.53 |
28 | GE PTE | 42.4 | 0.16 | 0.35 |
29 | GE PTE | 77.7 | 0.05 | 0.51 |
30 | GE PTE | 120.3 | 0.07 | 1.75 |
31 | GE PTE | 125.6 | 0.11 | 0.40 |
32 | GE PTE | 135.4 | <0.005 | 0.19 |
33 | GE PTE | 219.5 | 0.04 | 0.45 |
对照物 | HC/PTE | 0 | 3.5 | 13.8 |
34 | HC/PTE | 37.5 | 0.44 | 1.43 |
35 | HC/PTE | 42.4 | 0.49 | 1.10 |
36 | HC/PTE | 77.7 | 0.26 | 0.50 |
37 | HC/PTE | 125.6 | 0.18 | 1.00 |
38 | HC/PTE | 135.4 | 0.25 | 1.05 |
实施例的复合膜 | 基材类型 | SiN膜厚度(nm) | T%@550nm | 雾度 | 清晰度% |
对照物 | HC/Arton | 0 | 91.14 | NA | NA |
5 | HC/Arton | 135.4 | 97.5 | 0.31 | 99.8 |
7 | HC/Arton | 77.7 | 85.5 | 0.72 | 99.6 |
8 | HC/Arton | 100.7 | 91.9 | 0.36 | 99.9 |
10 | HC/Arton | 125.6 | 98.3 | 0.39 | 99.8 |
12 | HC/Arton | 24.44 | 95.83 | 0.27 | 99.7 |
对照物 | GE PET | 0 | 92.75 | 1.45 | 99.15 |
1 | GE PET | 25.34 | 98.81 | 1.54 | 99.2 |
29 | GE PET | 77.7 | 88.0 | 1.55 | 99.5 |
31 | GE PET | 125.6 | 96.1 | 1.72 | 99.6 |
32 | GE PET | 135.4 | 94.8 | 1.23 | 99.7 |
实施例 | SiN膜厚度(nm) | 8wca(度) |
对照物 | 0 | 64.0 |
1 | 25.34 | 24.5 |
29 | 77.7 | 27.0 |
31 | 125.6 | 35.0 |
32 | 135.4 | 31.5 |
实施例 | 膜厚度(nm) | 剥离力(g) | 表面情况 | ||
被沉积时和交叉划上阴影线时 | 180°剥离试验之后 | ||||
胶带810 | 交叉划上阴影线+胶带810 | ||||
15 | 61.44 | 437.18 | 没有可观察到的损害 | 没有可观察到的损害 | 没有可观察到的损害 |
18 | 127.53 | 288.25 | 画上交叉阴影线:沿着切割线形成裂缝 | 与上面相同 | 沿着切割线有裂缝和剥落 |
19 | 88.45 | 337.21 | 与上面的18相同 | 与上面相同 | 与上面的18相同 |
20 | 75.88 | 325.69 | 画上交叉阴影线:沿着切割线形成一些裂缝 | 与上面相同 | 沿着切割线形成一些裂缝和剥落 |
21 | 69.79 | 350.37 | 画上交叉阴影线:沿着切割线形成一些裂缝 | 与上面相同 | 沿着切割线形成一些裂缝和剥落 |
22 | 45.46 | 380.56 | 画上交叉阴影线:较少的细小裂缝 | 与上面相同 | 沿着切割线形成很少的较小裂缝 |
23 | 48.88 | 322.42 | 没有可观察到的损害 | 与上面相同 | 没有可观察到的损害 |
24 | 100.06 | 434.42 | 画上交叉阴影线:沿着切割线形成裂缝 | 与上面相同 | 沿着切割线有裂缝和剥落 |
25 | 23.77 | 383.52 | 没有可观察到的损害 | 与上面相同 | 没有可观察到的损害 |
26 | 10.27 | 371.08 | 没有可观察到的损害 | 与上面相同 | 没有可观察到的损害 |
Claims (46)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/325,575 US20040121146A1 (en) | 2002-12-20 | 2002-12-20 | Composite barrier films and method |
US10/325,575 | 2002-12-20 |
Publications (1)
Publication Number | Publication Date |
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CN1745197A true CN1745197A (zh) | 2006-03-08 |
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Application Number | Title | Priority Date | Filing Date |
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CNA2003801094877A Pending CN1745197A (zh) | 2002-12-20 | 2003-12-09 | 复合的阻隔膜和方法 |
Country Status (8)
Country | Link |
---|---|
US (2) | US20040121146A1 (zh) |
EP (1) | EP1590502A4 (zh) |
JP (1) | JP2006512482A (zh) |
KR (1) | KR20050089062A (zh) |
CN (1) | CN1745197A (zh) |
AU (1) | AU2003296345A1 (zh) |
BR (1) | BR0317040A (zh) |
WO (1) | WO2004061158A1 (zh) |
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CN101992888A (zh) * | 2009-08-21 | 2011-03-30 | 翁文桂 | 一种用于阻隔性包装的无金属箔的叠层材料 |
CN102683379A (zh) * | 2011-03-10 | 2012-09-19 | 三星移动显示器株式会社 | 柔性显示装置及其制造方法 |
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JP2011508062A (ja) * | 2007-12-28 | 2011-03-10 | スリーエム イノベイティブ プロパティズ カンパニー | 可撓性封入フィルムシステム |
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KR20220004836A (ko) * | 2020-07-02 | 2022-01-12 | 삼성디스플레이 주식회사 | 표시 장치 |
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- 2003-12-09 JP JP2004565265A patent/JP2006512482A/ja active Pending
- 2003-12-09 KR KR1020057011569A patent/KR20050089062A/ko not_active Application Discontinuation
- 2003-12-09 BR BR0317040A patent/BR0317040A/pt not_active Application Discontinuation
- 2003-12-09 AU AU2003296345A patent/AU2003296345A1/en not_active Abandoned
- 2003-12-09 EP EP03814669A patent/EP1590502A4/en not_active Withdrawn
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CN101992888A (zh) * | 2009-08-21 | 2011-03-30 | 翁文桂 | 一种用于阻隔性包装的无金属箔的叠层材料 |
CN101992888B (zh) * | 2009-08-21 | 2014-01-15 | 翁文桂 | 一种用于阻隔性包装的无金属箔的叠层材料 |
CN101805891A (zh) * | 2010-04-01 | 2010-08-18 | 河北大学 | 一种低温高速沉积氢化非晶氮化硅薄膜的方法 |
CN102683379A (zh) * | 2011-03-10 | 2012-09-19 | 三星移动显示器株式会社 | 柔性显示装置及其制造方法 |
CN102683379B (zh) * | 2011-03-10 | 2016-05-11 | 三星显示有限公司 | 柔性显示装置及其制造方法 |
US9614190B2 (en) | 2011-03-10 | 2017-04-04 | Samsung Display Co., Ltd. | Flexible display device and manufacturing method thereof |
CN109402566A (zh) * | 2018-12-18 | 2019-03-01 | 深圳先进技术研究院 | 一种两步法制备柔性氧化钒薄膜的方法 |
CN114351084A (zh) * | 2021-12-09 | 2022-04-15 | 深圳市恒鼎新材料有限公司 | 一种高分子材料表面增亮耐磨镀膜工艺及其制得的光学镀膜 |
CN114351084B (zh) * | 2021-12-09 | 2024-04-19 | 深圳市恒鼎新材料有限公司 | 一种高分子材料表面增亮耐磨镀膜工艺及其制得的光学镀膜 |
Also Published As
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US20040121146A1 (en) | 2004-06-24 |
EP1590502A1 (en) | 2005-11-02 |
US20050109606A1 (en) | 2005-05-26 |
EP1590502A4 (en) | 2008-01-23 |
JP2006512482A (ja) | 2006-04-13 |
AU2003296345A1 (en) | 2004-07-29 |
BR0317040A (pt) | 2005-10-25 |
KR20050089062A (ko) | 2005-09-07 |
WO2004061158A1 (en) | 2004-07-22 |
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