CN1617019A - 利用真空的蒙片支撑装置和曝光***及其使用方法 - Google Patents
利用真空的蒙片支撑装置和曝光***及其使用方法 Download PDFInfo
- Publication number
- CN1617019A CN1617019A CNA2004100884422A CN200410088442A CN1617019A CN 1617019 A CN1617019 A CN 1617019A CN A2004100884422 A CNA2004100884422 A CN A2004100884422A CN 200410088442 A CN200410088442 A CN 200410088442A CN 1617019 A CN1617019 A CN 1617019A
- Authority
- CN
- China
- Prior art keywords
- heat absorbing
- frisket
- absorbing glass
- vacuum
- bracing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/62—Holders for the original
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030080249 | 2003-11-13 | ||
KR1020030080249A KR100578262B1 (ko) | 2003-11-13 | 2003-11-13 | 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1617019A true CN1617019A (zh) | 2005-05-18 |
CN100342284C CN100342284C (zh) | 2007-10-10 |
Family
ID=34567722
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100884422A Expired - Fee Related CN100342284C (zh) | 2003-11-13 | 2004-10-29 | 利用真空的蒙片支撑装置和曝光***及其使用方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7206061B2 (zh) |
JP (1) | JP4128171B2 (zh) |
KR (1) | KR100578262B1 (zh) |
CN (1) | CN100342284C (zh) |
TW (1) | TWI290267B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102402131A (zh) * | 2011-11-11 | 2012-04-04 | 深南电路有限公司 | 一种曝光*** |
CN101730865B (zh) * | 2007-05-17 | 2013-11-06 | Kse株式会社 | 用于紫外线曝光装置的真空吸附器 |
CN104020643B (zh) * | 2013-03-01 | 2016-08-24 | 上海微电子装备有限公司 | 一种用于光刻设备的大掩模板面型补偿装置 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100742385B1 (ko) * | 2006-01-23 | 2007-07-24 | 삼성에스디아이 주식회사 | 마스크 정렬장치 및 그 정렬방법 |
KR100828969B1 (ko) * | 2007-06-29 | 2008-05-13 | 주식회사 디엠에스 | 실란트 경화장치의 마스크글라스 고정유닛 |
JP5112151B2 (ja) * | 2008-04-08 | 2013-01-09 | 株式会社アルバック | 光照射装置 |
JP5523206B2 (ja) * | 2010-05-31 | 2014-06-18 | 株式会社トプコン | 露光装置 |
JP6096515B2 (ja) * | 2013-01-15 | 2017-03-15 | 株式会社アドテックエンジニアリング | Itoパターン露光装置 |
JP6986317B2 (ja) * | 2017-12-05 | 2021-12-22 | 株式会社アドテックエンジニアリング | マスクユニット及び露光装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4054383A (en) * | 1976-02-02 | 1977-10-18 | International Business Machines Corporation | Jig and process for contact printing |
JPS60146674A (ja) * | 1984-01-05 | 1985-08-02 | Canon Inc | チヤツク装置 |
GB2224136B (en) * | 1988-10-19 | 1992-08-12 | Dainippon Screen Mfg | Auxiliary sheet for use with film holder of step-and-repeat machine |
JPH04298753A (ja) * | 1990-08-02 | 1992-10-22 | Canon Inc | レチクル支持装置 |
KR960018757A (ko) * | 1994-11-30 | 1996-06-17 | 엄길용 | 포토마스크의 평탄성 유지하는 방법 |
KR970051901A (ko) * | 1995-12-28 | 1997-07-29 | 이우복 | 대면적 하드 마스크용 마스크 홀더 |
KR200141130Y1 (ko) * | 1996-10-07 | 1999-04-01 | 문정환 | 마스크 검사기의 마스크 흡착장치 |
SE9704193D0 (sv) * | 1997-11-14 | 1997-11-14 | Micronic Laser Systems Ab | Device and method for flat holding of a substrate in microlithography |
JP4048592B2 (ja) * | 1998-04-03 | 2008-02-20 | ソニー株式会社 | 露光装置 |
JP2002251017A (ja) * | 2001-02-23 | 2002-09-06 | Adtec Engineeng Co Ltd | 露光装置 |
JP2003100619A (ja) * | 2001-09-27 | 2003-04-04 | Nikon Corp | マスク保持装置、マスク保持方法、および露光装置 |
KR100522725B1 (ko) * | 2002-04-04 | 2005-10-20 | 주식회사 디엠에스 | 대면적 마스크 및 이를 구비한 노광 시스템 |
KR20030082729A (ko) * | 2002-04-18 | 2003-10-23 | 주식회사 디엠에스 | 노광 시스템 |
US6822731B1 (en) * | 2003-06-18 | 2004-11-23 | Asml Holding N.V. | Method and apparatus for a pellicle frame with heightened bonding surfaces |
-
2003
- 2003-11-13 KR KR1020030080249A patent/KR100578262B1/ko not_active IP Right Cessation
-
2004
- 2004-10-18 TW TW093131545A patent/TWI290267B/zh not_active IP Right Cessation
- 2004-10-18 US US10/967,367 patent/US7206061B2/en active Active
- 2004-10-29 CN CNB2004100884422A patent/CN100342284C/zh not_active Expired - Fee Related
- 2004-11-12 JP JP2004329575A patent/JP4128171B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101730865B (zh) * | 2007-05-17 | 2013-11-06 | Kse株式会社 | 用于紫外线曝光装置的真空吸附器 |
CN102402131A (zh) * | 2011-11-11 | 2012-04-04 | 深南电路有限公司 | 一种曝光*** |
CN104020643B (zh) * | 2013-03-01 | 2016-08-24 | 上海微电子装备有限公司 | 一种用于光刻设备的大掩模板面型补偿装置 |
Also Published As
Publication number | Publication date |
---|---|
US7206061B2 (en) | 2007-04-17 |
TWI290267B (en) | 2007-11-21 |
KR20050046221A (ko) | 2005-05-18 |
JP2005148747A (ja) | 2005-06-09 |
TW200516355A (en) | 2005-05-16 |
JP4128171B2 (ja) | 2008-07-30 |
KR100578262B1 (ko) | 2006-05-11 |
US20050105074A1 (en) | 2005-05-19 |
CN100342284C (zh) | 2007-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140227 |
|
TR01 | Transfer of patent right |
Effective date of registration: 20140227 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
TR01 | Transfer of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20071010 Termination date: 20191029 |
|
CF01 | Termination of patent right due to non-payment of annual fee |