CN1400106A - Ink jet printing method for preparing metal film - Google Patents

Ink jet printing method for preparing metal film Download PDF

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Publication number
CN1400106A
CN1400106A CN 01128004 CN01128004A CN1400106A CN 1400106 A CN1400106 A CN 1400106A CN 01128004 CN01128004 CN 01128004 CN 01128004 A CN01128004 A CN 01128004A CN 1400106 A CN1400106 A CN 1400106A
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China
Prior art keywords
ink
metallic film
solvent
prepare
raw material
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CN 01128004
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Chinese (zh)
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CN1199794C (en
Inventor
赵岩
郝传勇
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Institute of Metal Research of CAS
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Institute of Metal Research of CAS
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Publication of CN1199794C publication Critical patent/CN1199794C/en
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Abstract

The method for preparing metal film by using ink-jet printing process includes the following steps: 1. using the compound which can be heated and decomposed into metal as raw material and dissolving it in solvent, the weight ration of the described raw material and solvent in 1-20:100; 2. adding additive to regulate the properties of viscosity, surface tension and drying speed, its added quantity is 0.1-5% of weight of solvent, the controlled solution viscosity is 20-60 mPa.s, surface tension is 20-50 mNm(-1), and preparing ink-jet ink; 3. injecting the above-mentioned ink into ink box, adopting conventional ink-jet printing process to make the ink deposit on the substrate according to the predefined pattern; 4. heating film layer deposited on the substrate at 200-600 deg.C to form metal film.

Description

Inkjet printing prepares the method for metallic film
Technical field
The present invention relates to the metallic film technology of preparing, specifically a kind of inkjet printing prepares the method for metallic film.
Background technology
Metallic film is widely used, and especially the metallic film that has certain figure and a physical and chemical performance at microelectronic has constituted the basis of nearly all microelectronic component.Metallic film not only is used to connect lead, contact, and can be used for finishing multiple functions such as sensing, catalysis, electromagnetic shielding.Conventional now metallic film preparation technology generally needs technologies such as plated film and etching, the preparation process complexity, and cost is higher.
Inkjet technology is one of major technique that generally adopts in the modern handle official bussiness printing, is divided into continous way and random mode two classes according to ink-jetting style.The continous inkjet technology utilizes Piexoelectric actuator that the shower nozzle ink inside is applied fixation pressure, makes its continuous injection, utilizes the heading of deflecting electrode change ink droplet and forms pattern.The only ink-jet when needed of random mode ink-jet technology, it mainly contains two kinds of bubble type and piezoelectric types.Bubble type is provided with heater on the tube wall of shower nozzle, under the electric pulse effect, form very little bubble on the heater, and the bubble expanded by heating produces pressure-driven ink droplet jetting nozzle.Piezoelectric type utilizes the minute-pressure electric device to make transducer, produces pressure wave and drive the ink droplet jetting nozzle under the pulse voltage effect.The a plurality of ink-jet systems of configuration in the general printer, each ink-jet system connects with the print cartridge that the different colours ink is housed, and can print colourful pattern.In recent years, the researcher begins to attempt it is used for the preparation of plane function material, and obtain some preliminary results, as prepare conducting polymer film (D.Pede, G.erra, andDe Rossi, Mater.Sci.Eng.C.5 (1998) 289), preparation color organic light emitting diode (Adv.Mater.11 (1999) 734 for S.-C.Chang, et al), prepare function nano structure graph (H.Y.Fan by the self organizing function ink that has that contains surfactant, et al, Nature, 405 (2000) 56).Inkjet technology is as the functional material preparation means of plane function material particularly because it has and is easy to prepare complex figure, but and the characteristics of pointwise control composition, be expected under a stable condition, to be used to replace plated film, the photoetching process of existing complexity.But utilize inkjet technology to prepare metallic film and yet there are no report.
Summary of the invention
The purpose of this invention is to provide the method that a kind of technology is simple, cost is low inkjet printing prepares metallic film.
To achieve these goals, technical scheme of the present invention is: operation as follows: 1) getting the compound that can add thermal decomposition generation metal is raw material, and it is dissolved in the solvent, and the weight ratio of described raw material and solvent is 1-20: 100; 2) add additive and regulate performances such as viscosity, surface tension and rate of drying, addition is the 0.1-5% of weight of solvent, and the control solution viscosity is that 20-60mPas, surface tension are 20-50mNm -1, be made into ink-jet ink; 3) described ink is injected in the print cartridge, adopts conventional inkjet technology spray deposited to substrate by predetermined pattern; 4) deposit to on-chip rete through 200-600 ℃ heat treatment with described, form metallic film;
In addition, raw material described in the step 1) is a metal nanoparticle, and it is dispersed in water or the organic solvent;
Also have, after the step 4), the substrate that forms metallic film is put into chemical plating fluid, technology is carried out the plated film of required metal routinely;
Described solvent can be deionized water; Described solvent can be organic solvents such as alcohols, ester class; Described additive is anionic surfactant such as odium stearate, lauryl sodium sulfate, neopelex, cationic surface active agent such as softex kw, nonionic surface active agent such as dodecyl diethanol amine, dodecyl acyl diethanol amine, amphoteric surfactant, high molecular surfactant such as polyvinyl alcohol, Sodium Polyacrylate etc.
The present invention has following advantage:
1. the present invention utilizes the printing high accuracy characteristics of inkjet technology, and the figure and the composition of the control of pointwise simply and easily rete make pattern precision higher, and sharpness of border is evenly distributed, and need not plated film and etching and other complex processes.
2. adopt the present invention to make ink by oneself, adapt to the little requirement of nozzle bore, can prepare multiple metallic film and multiple layer metal film, as monobasic and multi-element metal thin-film materials such as Fe, Au, Cu, Ag, Pb, Pt; Cycle is short, and cost is low, can be widely used in the preparation process of electronic device.
3. the present invention not only can directly prepare metallic film, and can be applied to depositing noble metal film activation substrate and induce next step chemical plating process.
The specific embodiment
Below in conjunction with embodiment the present invention being made further detail describes.
Embodiment 1
Prepare golden lead
Operation as follows: 1) get 1g and can add the compd A uCl that thermal decomposition generates metallic gold Au 3Be raw material, it be dissolved in the 50ml deionized water that the weight ratio of described raw material and deionized water is 2: 100; 2) add lauryl sodium sulfate 0.1g, addition is 0.2% of a deionized water weight, is that 50mPas (room temperature), surface tension are 30mNm with the viscosity of controlling ink -1Be made into golden ink; 3) described ink is injected in the print cartridge, adopts conventional inkjet technology to deposit on the substrate by predetermined pattern; 4) deposit to on-chip rete through 250 ℃ heat treatment with described, reaction forms has the gold thin film of predetermined pattern.
Embodiment 2
Prepare silver-colored lead
Operation as follows: 1) get 2g and can add the compd A gNO that thermal decomposition generates metal A g 3Be raw material, it be dissolved in the 50ml organic solvent absolute ethyl alcohol that the weight ratio of described raw material and organic solvent is 4: 100; 2) add softex kw 0.1g, addition is 0.2% of an organic solvent weight, is that 40mPas (room temperature), surface tension are 40mNm with the viscosity of controlling ink -1Be made into silver-colored ink; 3) described ink is injected in the print cartridge, adopts conventional inkjet technology to deposit on the substrate by predetermined pattern; 4) deposit to on-chip rete through 500 ℃ heat treatment with described, reaction forms the silver-colored film with predetermined pattern.
Embodiment 3
Inkjet printing assistant chemical depositing process prepares copper conductor:
Operation as follows: 1) get 1g and can add the compd A uCl that thermal decomposition generates metal 3Be raw material, it be dissolved in the 50ml deionized water that the weight ratio of described raw material and water or organic solvent is 2: 100; 2) add nonionic surface active agent dodecyl diethanol amine 0.2g, addition is 0.4% of water or an organic solvent weight, is that 30mPas (room temperature), surface tension are 30mNm with the viscosity of controlling ink -1Be made into golden ink; 3) described ink is injected in the print cartridge, adopts conventional inkjet technology to deposit on the substrate by predetermined pattern; 4) deposit to on-chip rete through 250 ℃ heat treatment with described, reaction forms gold thin film.
Described substrate is put into the conventional chemical copper plating solution, under 60 ℃ of temperature,,, on substrate, form the copper film of predetermined pattern at the surface deposition copper of golden film through 10 minutes.
In addition, as another embodiment, difference from Example 1 is: raw material described in the step 1) of the present invention also is bronze, and it is dispersed in water or the absolute ethyl alcohol.
The present invention also can adopt the dodecyl acyl diethanol amine in odium stearate in the anionic surfactant, neopelex, the nonionic surface active agent, polyvinyl alcohol, Sodium Polyacrylate or the amphoteric surfactant etc. in the high molecular surfactant.
Adopt the present invention can prepare as multiple metallic film and multiple layer metal films such as Fe, Au, Cu, Ag, Pb, Pt.

Claims (6)

1. an inkjet printing prepares the method for metallic film, it is characterized in that operating as follows: get 1) that can to add the compound that thermal decomposition generates metal be raw material, it is dissolved in the solvent, the weight ratio of described raw material and solvent is 1-20: 100; 2) add additive, addition is the 0.1-5% of weight of solvent, and the control solution viscosity is that 20-60mPas, surface tension are 20-50mNm -1, be made into ink-jet ink; 3) described ink is injected in the print cartridge, adopts conventional inkjet technology to deposit on the substrate by predetermined pattern; 4) deposit to on-chip rete through 200-600 ℃ heat treatment with described, form metallic film.
2. prepare the method for metallic film according to the described inkjet printing of claim 1, it is characterized in that: raw material described in the step 1) is a metal nanoparticle, and it is dispersed in water or the organic solvent.
3. prepare the method for metallic film according to claim 1 or 2 described inkjet printings, it is characterized in that: after the step 4), with the substrate that forms metallic film routinely technology carry out the plated film of required metal.
4. prepare the method for metallic film according to claim 1 or 2 described inkjet printings, it is characterized in that: described solvent can be deionized water.
5. prepare the method for metallic film according to claim 1 or 2 described inkjet printings, it is characterized in that: described solvent can be alcohols, ester class organic solvent.
6. prepare the method for metallic film according to claim 1 or 2 described inkjet printings, it is characterized in that: described additive is anionic surfactant, cationic surface active agent, nonionic surface active agent, high molecular surfactant or amphoteric surfactant.
CN 01128004 2001-08-03 2001-08-03 Ink jet printing method for preparing metal film Expired - Fee Related CN1199794C (en)

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Cited By (12)

* Cited by examiner, † Cited by third party
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CN100403511C (en) * 2003-05-12 2008-07-16 精工爱普生株式会社 Pattern and fabricating method therefor, device and fabricating method therefor, electro-optical apparatus, electronic apparatus
CN101522557B (en) * 2006-09-29 2012-06-20 Lg化学株式会社 Ink for ink jet printing and method for preparing metal nanoparticles used therein
CN102529479A (en) * 2011-12-23 2012-07-04 中国科学院苏州纳米技术与纳米仿生研究所 Post-treatment method for improving printing evenness of electronic material
US8492183B2 (en) 2009-08-14 2013-07-23 Boe Technology Co., Ltd. Manufacturing method of film pattern of micro-structure and manufacturing method of TFT-LCD array substrate
CN103753995A (en) * 2014-01-09 2014-04-30 湖南大学 Method for preparing antireflection film having gradient refractive index based on colour ink-jet printing
CN106098545A (en) * 2016-08-12 2016-11-09 京东方科技集团股份有限公司 A kind of display base plate and preparation method thereof, display device
CN106274110A (en) * 2015-05-13 2017-01-04 广东聚华印刷显示技术有限公司 A kind of method of low-temp. spraying ink print nano metal pattern
CN106335298A (en) * 2015-07-09 2017-01-18 广东聚华印刷显示技术有限公司 Ink jet printing metal patterns, and preparation method thereof
CN106972115A (en) * 2017-05-27 2017-07-21 深圳市华星光电技术有限公司 The preparation method and OLED display panel of OLED display panel
CN107230747A (en) * 2017-05-27 2017-10-03 深圳市华星光电技术有限公司 The preparation method and OLED display panel of OLED display panel
CN107690269A (en) * 2016-08-31 2018-02-13 江苏汉印机电科技股份有限公司 The inkjet printing manufacture method of electro-magnetic screen layer
US10505154B2 (en) 2017-05-27 2019-12-10 Shenzhen China Star Optoelectronics Technology Co., Ltd. Manufacturing method of organic light emitting diode display panel and organic light emitting diode display panel

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KR20100021460A (en) * 2007-06-14 2010-02-24 메사츄세츠 인스티튜트 어브 테크놀로지 Method and apparatus for thermal jet printing

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100403511C (en) * 2003-05-12 2008-07-16 精工爱普生株式会社 Pattern and fabricating method therefor, device and fabricating method therefor, electro-optical apparatus, electronic apparatus
CN101522557B (en) * 2006-09-29 2012-06-20 Lg化学株式会社 Ink for ink jet printing and method for preparing metal nanoparticles used therein
US8492183B2 (en) 2009-08-14 2013-07-23 Boe Technology Co., Ltd. Manufacturing method of film pattern of micro-structure and manufacturing method of TFT-LCD array substrate
CN102529479B (en) * 2011-12-23 2014-10-08 中国科学院苏州纳米技术与纳米仿生研究所 Post-treatment method for improving printing evenness of electronic material
CN102529479A (en) * 2011-12-23 2012-07-04 中国科学院苏州纳米技术与纳米仿生研究所 Post-treatment method for improving printing evenness of electronic material
CN103753995B (en) * 2014-01-09 2016-01-20 湖南大学 A kind of based on the color ink jet printed method preparing graded index anti-reflection film
CN103753995A (en) * 2014-01-09 2014-04-30 湖南大学 Method for preparing antireflection film having gradient refractive index based on colour ink-jet printing
CN106274110A (en) * 2015-05-13 2017-01-04 广东聚华印刷显示技术有限公司 A kind of method of low-temp. spraying ink print nano metal pattern
CN106274110B (en) * 2015-05-13 2018-11-06 广东聚华印刷显示技术有限公司 A kind of method of low temperature ink jet printing nano metal pattern
CN106335298B (en) * 2015-07-09 2018-08-10 广东聚华印刷显示技术有限公司 Ink jet printing metal pattern and preparation method thereof
CN106335298A (en) * 2015-07-09 2017-01-18 广东聚华印刷显示技术有限公司 Ink jet printing metal patterns, and preparation method thereof
CN106098545A (en) * 2016-08-12 2016-11-09 京东方科技集团股份有限公司 A kind of display base plate and preparation method thereof, display device
CN107690269A (en) * 2016-08-31 2018-02-13 江苏汉印机电科技股份有限公司 The inkjet printing manufacture method of electro-magnetic screen layer
CN106972115A (en) * 2017-05-27 2017-07-21 深圳市华星光电技术有限公司 The preparation method and OLED display panel of OLED display panel
CN107230747A (en) * 2017-05-27 2017-10-03 深圳市华星光电技术有限公司 The preparation method and OLED display panel of OLED display panel
WO2018218740A1 (en) * 2017-05-27 2018-12-06 深圳市华星光电技术有限公司 Oled display panel manufacturing method and oled display panel
WO2018218741A1 (en) * 2017-05-27 2018-12-06 深圳市华星光电技术有限公司 Oled display panel manufacturing method and oled display panel
CN106972115B (en) * 2017-05-27 2019-03-12 深圳市华星光电技术有限公司 The production method and OLED display panel of OLED display panel
US10355248B2 (en) 2017-05-27 2019-07-16 Shenzhen China Star Optoelectronics Technology Co., Ltd. Manufacturing method of organic light emitting diode display panel and organic light emitting diode display panel
US10505154B2 (en) 2017-05-27 2019-12-10 Shenzhen China Star Optoelectronics Technology Co., Ltd. Manufacturing method of organic light emitting diode display panel and organic light emitting diode display panel

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