CN1341773A - Equipment and process for producing porous sponge metal - Google Patents
Equipment and process for producing porous sponge metal Download PDFInfo
- Publication number
- CN1341773A CN1341773A CN 01128040 CN01128040A CN1341773A CN 1341773 A CN1341773 A CN 1341773A CN 01128040 CN01128040 CN 01128040 CN 01128040 A CN01128040 A CN 01128040A CN 1341773 A CN1341773 A CN 1341773A
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- Prior art keywords
- magnetic control
- equipment
- roll
- control sputtering
- housing
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- 239000002184 metal Substances 0.000 title claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title description 5
- 230000008569 process Effects 0.000 title description 5
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 238000004804 winding Methods 0.000 claims abstract description 12
- 230000007704 transition Effects 0.000 claims abstract description 9
- 238000004544 sputter deposition Methods 0.000 claims description 24
- 238000009434 installation Methods 0.000 claims description 10
- 230000007246 mechanism Effects 0.000 claims description 9
- 238000007664 blowing Methods 0.000 claims description 7
- 238000005516 engineering process Methods 0.000 claims description 7
- 239000004519 grease Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 23
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 10
- 238000007747 plating Methods 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 9
- 239000006260 foam Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Abstract
The present invention relates to a production equipment of porous spongy metal and its production process. Said equipment includes a shell body and a vacuum system connected with said shell body. Said shell body is equipoped with door, sliding handcart, magnetron sputtering cathode, winding device, the door body is mounted on the handcart, and the magnetron sputtering cathodes are divided into two rows, and parallelly mounted, every row at least contains a target electrode. Its winding device includes rotary cylinder driven by motor for taking up and giving up material and drawing roll, between the rotary cylinder and drawing roll a transition roll and a line speed sensor are mounted, on the radial surface of the drawing roll a pressure roll is set. Said invention can implement film-plating operation on both sides of plated material by one step, and the film layer is uniform, and its production efficiency is high and cost is low.
Description
The present invention relates to a kind of production unit and technology of porous sponge metal, be a kind of winding magnetic control sputtering coating equipment specifically and adopt this coating equipment to be coated with the coating process of porous sponge metal.
Porous sponge metal is of many uses in the middle of modern industry, for example utilize nickel foam to make the battery lead plate of high performance store battery, owing to itself be vesicular, the surface-area of formation is big, so can fully contact with accumulator liquid, thereby make the performance of store battery improve greatly.In other field, the application of porous sponge metal is also very extensive, is used as catalyzer as substituting sheet material at chemical industry, and is used for filtration and sound-proof material etc.So the production of porous sponge metal receives much attention in recent years, and relative Technology is not rarely seen in patent documentation yet.
In the middle of the manufacture craft of porous sponge metal, the step of most critical is to adopt the mode of plated film to make sea class material metalization, and in all kinds of coating equipments, the winding magnetic control sputtering coating equipment has characteristics such as coating temperature is low, efficient is high, cost is low.By the disclosed devices of coiled vacuum coating machine of domestic and foreign literature and market evaporating coating equipment and magnetron sputtering film device are arranged now, the product that can be coated with is poly-bright, the polyester mylar of Gao Laqiang, it is atresia, densification, transparent and translucent material, draw by force from height by material in the process of being coated with, linear velocity can reach when obtaining to curl: V 〉=340m/min.But for foam sponge class material, be not allow the tension distortion in the process of being coated with, can not bear higher temperature simultaneously, so existing spirally wound evaporation coating machine and magnetron sputtering coater all are not suitable for being coated with foam sponge class material.Owing to be subjected to the restriction of equipment, in the middle of present disclosed employing vacuum magnetic-control sputtering method is coated with the technology of foam sponge material, do not find that also the continuous reeling formula is coated with the technology of foam sponge class material, and the foam sponge class material that is coated with in disclosed process materials is all single sheet, this technology can not continuous production, and the setting of the sputtering target utmost point in the existing installation also limited the raising of production efficiency, so existing production efficiency of equipment is low, and the production cost height.
The purpose of this invention is to provide a kind of winding magnetic control sputtering coating equipment and coating process that is suitable for being coated with porous sponge metal, it can overcome existing shortcoming in the prior art, is suitable for being coated with foam sponge class material, makes its conductionization, and the production efficiency height, low production cost.
The object of the present invention is achieved like this: a kind of production unit of porous sponge metal, it comprises housing and the vacuum system and the inflation system that are connected with housing, magnetic control sputtering cathode and plated body winding mechanism are installed in housing, it is characterized in that the parallel in two separate ranks installation of magnetic control sputtering cathode, every row include a target utmost point at least, wind2 comprises the receipts that dragged by motor, blowing roller and take off roll, receiving, between blowing roller and the take off roll transition roller is installed, and the linear velocity tension pick-up is housed, also have two pressure rolls to divide and be pressed in addition on the sagittal plane of two take off roll with the housing hinge joint.
Can optionally be added with counterweight on the pressure roll, its weight 〉=0 is adjustable.The purpose of counterweight is the pressure size of adjusting between pressure roll and the take off roll, in order to improve the tension force of plated body in the magnetron sputtering zone.
Plated body among the present invention is set out by the blowing roller, via transition roller, again by passing through between take off roll and the pressure roll, and then be wound on the rewinding roller via transition roller, let slip Cheng Dangzhong at this volume, plated body carries out sputter coating to the two sides of plated body, the disposable process for plating of finishing the double-sided metal coating of plated body through the sputtering zone of the target utmost point simultaneously by two row's target utmost points.
The processing parameter that the present invention is coated with porous sponge metal is: power=80-100kw, voltage=400-600v, the linear velocity=0.5-10m/min of plated body, the thickness=0.5-3mm of plated body.
Advantage of the present invention is: plated body is via the sputter area of the target utmost point time, just in time be to be between two take off roll, because pressure roll cuts off the pulling force that produces from the retractable roller tube to the power that plated body is executed, make plated body this zone in stressed except that the gravity of plated body self, the suffered external force in its transverse section is similar to zero, so plated body can not produce distortion, be suitable for the requirement that is coated with of sponge kind object fully.Because two row's magnetron sputtering target utmost points carry out sputter coating to the two sides of plated body simultaneously, the rete that can disposablely finish the two sides is coated with, thus the production efficiency height, and also cost is low, is suitable for suitability for industrialized production.Because the extremely parallel installation of two row's targets, and parallel with plated body, so the even film layer that is coated with.
Below in conjunction with embodiment and accompanying drawing thereof invention is further described in detail.
Fig. 1 is the overall structure synoptic diagram of the embodiment of the invention one (vertical structure).
Fig. 2 is the front section view of casing shown in Figure 1.
Fig. 3 is the vertical view of Fig. 2.
Fig. 4 is provided with forward and backward dolly in the vacuum chamber of the present invention, and after dolly pulled out structural representation.
Fig. 5 is the structural representation of winding mechanism.
Fig. 6 is the I portion enlarged view among Fig. 5.
Fig. 7 is the II portion enlarged view among Fig. 5.
Fig. 8 is the arrangement synoptic diagram of the magnetron sputtering target utmost point of vertical structure of the present invention.
Fig. 9 is the vacuum chamber structure synoptic diagram of the embodiment of the invention two (horizontal type structure).
As seen from Figure 1, embodiment one mainly is made up of following several major parts: casing 1, winding mechanism 2, magnetic control sputtering cathode 3 and vacuum system 4.
The present invention reaches vacuum tightness rapidly and requires to keep vacuum tightness even simultaneously for making in the vacuum chamber, respectively establish a cover vacuum system in the both sides of housing, the high vacuum system of the routine that it is made up of annexes such as mechanical pump 5, lobe pump 6, diffusion pump 7 and valves 8.
By Fig. 2, Fig. 3 and Fig. 4 as seen, housing of the present invention is except that both sides are equipped with vacuum system, also have Qianmen 9 and back door 10, for the convenience of operating, be provided with Qianmen dolly 11 and back door dolly 12, the magnetron sputtering target utmost point 3 is installed on the back door dolly 12, and the winding mechanism 2 of plated body then is installed on the Qianmen dolly 11, housing is provided with the tongued and grooved flanges of forward and backward door, and the door body 13 and 14 of forward and backward door is fixed on Qianmen dolly and the back door dolly.
Be installed in the plated body on the dolly of back door the rich mechanism of volume overall structure as shown in Figure 5, it comprises emptying roller 15, material receiving roller 26, these two rollers are dragged by two motors respectively, bear blowing and rewinding, also have two take off roll 16 and 25 that drag by motor, radial side at these two take off roll, a pressure roll 19,22 respectively is installed, two pressure rolls link on housing by connecting arm 27 and 28 (Fig. 6 and shown in Figure 7), pressure roll is pressed on the take off roll, in order to reduce the tension force of plated body in sputter area.Between emptying roller 15 and take off roll 16, transition roller 17 and 18 are installed, the stationkeeping of transition roller 17,18 position is adjustable, the adjustable transition roller 23 of transition roller 21 and position of stationkeeping also is installed at the rewinding end equally, and be separately installed with linear velocity and tension pick- up 20 and 24 at blowing and rewinding end, control and guarantee the constant airspeed of emptying roller 15 and material receiving roller 26 respectively.
As shown in Figure 6 and Figure 7, counterweight 29 and 30 are installed on connecting arm 27 and 28, the weight of counterweight is adjusted in 〉=0 scope, can make like this plated body material between take off roll and pressure roll through out-of-date, be subjected to suitable pressure effect, make two materials between the take off roll, though the material in the magnetron sputtering zone eliminated from put, the pulling force of material receiving roller, make its suffered external force approach zero, avoided bearing pulling force and produce distortion.Between emptying roller 15 and take off roll 26, be equipped with
As seen from Figure 8, the parallel installation of file in 31 minutes two of eight target utmost points of magnetic control sputtering cathode, 4 of every row, target surface is relative, and extremely the centre row is out-of-date by two row targets when the plated body material, and two sides while quilt is coated with metalized coated.
Referring to Fig. 8, the setting angle that can see magnetic control sputtering cathode can be the vertical installation shown in a figure, also can with target utmost point center vertical planar center line be axle≤adjustable between ± 7.5 °, the position when scheming institute as b figure and c.The line of centres of two take off roll can be shown in a figure among Fig. 5 in the winding mechanism simultaneously, the vertical installation, also can be axial left and right deflection with the mid point of the line of centres, and the angle between the plummet is≤± 7.5 ° adjustable, it is parallel with the target polar plane to remain plated body, can guarantee the quality of rete so effectively.
Referring to Fig. 9, the structural representation of visible an alternative embodiment of the invention.What this embodiment was different with the foregoing description is that vacuum chamber has adopted the horizontal type level drawing structure, vacuum chamber one end of present embodiment opens the door, be provided with the dolly 34 that a bottom is equipped with the walking track, the wind2 33 of the magnetron sputtering target utmost point 32 and plated body together is installed on the dolly, 8 target utmost point fixed installations of magnetic control sputtering cathode, horizontally, divide two rows, target surface in the same way, all down, wind2 is identical structural principle with the structure and the embodiment one of vacuum system, and just the modification of some adaptation row has been done in the installation site of each parts according to the horizontal type structure needs.The plated body material successively passes through the sputtering zone of every row's target utmost point, and the two sides is coated with metalized coated.
A plurality of targets of the magnetic control sputtering cathode among the present invention extremely can be independently-powered respectively, and the several target utmost points that also can choose wantonly are wherein powered simultaneously.
Power=the 80-100kw of embodiments of the invention, voltage=400-600V, the linear velocity=0.5-10m/min of plated film can be coated with fabric width=500-2000mm, the foam sponge class material of thickness=0.5-3mm,
Claims (9)
1, a kind of production unit of porous class sponge grease, it comprises housing and the vacuum system and the inflation system that are connected with housing, magnetic control sputtering cathode and plated body winding mechanism are installed in housing, it is characterized in that having on the housing door, and be provided with plug-type dolly, magnetic control sputtering cathode, wind2 and door body are installed on the dolly, the parallel in two separate ranks installation of magnetic control sputtering cathode, every row include a target utmost point at least, winding mechanism comprises the receipts that dragged by motor, blowing roller and take off roll, receiving, between blowing roller and the take off roll transition roller is installed, and linear velocity and tension pick-up are housed, also have two pressure rolls to be pressed on respectively on the radial surface of two take off roll with the housing hinge joint.
2,, it is characterized in that being equipped with on the pressure roll counterweight, its weight 〉=0 and adjustable according to the said equipment of claim 1.
3, according to the said equipment of claim 1, it is characterized in that housing is forward and backward opens the door, and be provided with forward and backward door dolly, the magnetic control sputtering cathode of vertical arrangement and back door body are installed on the dolly of back door, the target utmost point mounted in pairs of magnetic control sputtering cathode, target surface relatively or contrarily, wind2 and Qianmen body are installed on the dolly of Qianmen.
4,, it is characterized in that housing one end opens the door, and be provided with a dolly that the magnetic control sputtering cathode of horizontal arrangement and wind2 and door body are installed on the dolly according to the said equipment of claim 1.
5, according to the said equipment of claim 1, it is characterized in that housing each side be equipped with one the cover vacuum system.
6, according to the said equipment of claim 3, the setting angle that it is characterized in that magnetic control sputtering cathode is that the center line with the central plane of the two row target utmost points is an axle, relatively its center vertical plane deflection≤± 7.5 °, the setting angle of the two take off roll lines of centres is relative plummet deflection≤± 7.5 ° in the rich mechanism of volume.
7, according to the said equipment of claim 4, it is characterized in that the target utmost points of two row's magnetic control sputtering cathodes are installed as the parallel installation of horizontal two rows, target utmost point mounted in pairs, its target surface direction is identical and down.
8,, it is characterized in that each target utmost point of magnetic control sputtering cathode is powered respectively according to the said equipment of claim 1.
9, a kind of technology of producing porous sponge metal is characterized in that plated film power=80-100kw, voltage=400-600V, the thickness=0.5-3mm of plated body, linear velocity=0.5-10m/min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011280409A CN1167825C (en) | 2001-08-15 | 2001-08-15 | Equipment and process for producing porous sponge metal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB011280409A CN1167825C (en) | 2001-08-15 | 2001-08-15 | Equipment and process for producing porous sponge metal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1341773A true CN1341773A (en) | 2002-03-27 |
| CN1167825C CN1167825C (en) | 2004-09-22 |
Family
ID=4667938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB011280409A Expired - Lifetime CN1167825C (en) | 2001-08-15 | 2001-08-15 | Equipment and process for producing porous sponge metal |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1167825C (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007121659A1 (en) * | 2006-04-18 | 2007-11-01 | Inco Advanced Technology Materials (Dalian) Co., Ltd | Porous metal materials with elliptic type pores and their manufacturing process |
| CN106435514A (en) * | 2016-09-22 | 2017-02-22 | 铜陵市铜创电子科技有限公司 | Fluctuation-preventing vacuum coating equipment for processing metallic films |
-
2001
- 2001-08-15 CN CNB011280409A patent/CN1167825C/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007121659A1 (en) * | 2006-04-18 | 2007-11-01 | Inco Advanced Technology Materials (Dalian) Co., Ltd | Porous metal materials with elliptic type pores and their manufacturing process |
| CN106435514A (en) * | 2016-09-22 | 2017-02-22 | 铜陵市铜创电子科技有限公司 | Fluctuation-preventing vacuum coating equipment for processing metallic films |
| CN106435514B (en) * | 2016-09-22 | 2019-01-11 | 铜陵市铜创电子科技有限公司 | A kind of processing of metallized film is with preventing floating vacuum coating equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1167825C (en) | 2004-09-22 |
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| Date | Code | Title | Description |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: YINGKE HIGH-TECH MATERIALS (SHENYANG) CO., LTD. Free format text: FORMER OWNER: SHENYANG JINCHANG PUXIN MATERIAL CO. LTD. Effective date: 20050805 |
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| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20050805 Address after: Hunnan New Century Road 110179 Shenyang city of Liaoning Province, No. 22 Patentee after: INCO Advanced Technology Materials (Shenyang) Company Ltd. Address before: 110179 Liaoning Province, Shenyang Hunnan hi tech Industrial Development Zone Century Road Patentee before: Shenyang Jinchang Puxin Material Co., Ltd. |
|
| C56 | Change in the name or address of the patentee |
Owner name: ALANTUM ADVANCED TECHNOLOGY MATERIALS (SHENYANG) C Free format text: FORMER NAME: INCO ADVANCED TECHNOLOGY MATERIALS (SHENYANG) CO., LTD. |
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| CP03 | Change of name, title or address |
Address after: 110179 China Shenyang Hunnan New Century Road No. 8 Patentee after: Advanced Technology Materials (Shenyang)Co.,Ltd. Address before: Hunnan New Century Road 110179 Shenyang city of Liaoning Province, No. 22 Patentee before: Yingke High-New Tech. Material (Shenyang) Co., Ltd. |
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| CX01 | Expiry of patent term |
Granted publication date: 20040922 |
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| CX01 | Expiry of patent term |