CN201326012Y - A continuous winding-type magnetron sputtering vacuum plating equipment - Google Patents
A continuous winding-type magnetron sputtering vacuum plating equipment Download PDFInfo
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- CN201326012Y CN201326012Y CNU2008202359377U CN200820235937U CN201326012Y CN 201326012 Y CN201326012 Y CN 201326012Y CN U2008202359377 U CNU2008202359377 U CN U2008202359377U CN 200820235937 U CN200820235937 U CN 200820235937U CN 201326012 Y CN201326012 Y CN 201326012Y
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Abstract
The utility model belongs to a continuous plating equipment of solar selective absorbing coating in the plate solar energy. A continuous winding-type magnetron sputtering vacuum plating equipment comprises an unwinding chamber, a winding chamber, a tension control chamber, a pre-processing chamber and a process chamber; the unwinding chamber and the winding chamber are respectively arranged at both ends of the equipment; the unwinding chamber and the winding chamber are respectively connected with the tension control chamber; the tension control chamber at one end of the unwinding chamber is connected with the pre-processing chamber; at least one process chamber is arranged between the tension control chambers at the ends of the pre-processing chamber and the winding chamber; one ends of the unwinding chamber and the winding chamber and both ends of the tension control chamber, the pre-processing chamber and the process chamber are provided with flanges in the same specifications; the unwinding chamber, the winding chamber, the tension control chamber, the pre-processing chamber and the process chamber are connected as a whole via the flanges. The utility model can provide a specialized coating equipment for long-term continuous solar selective coating plating; and the utility model has the advantages of high production efficiency, stable quality and excellent film performance.
Description
[technical field]
The utility model belongs to the continuous coating device of the solar selectively absorbing coating in the plate-type solar, belongs to solar energy heat utilization field, especially can continue uninterruptedly to be coated with on metal coil tape the production equipment special of selectivity plated film coating.
[background technology]
Solar water heater is exactly the radiant heat energy that absorbs the sun, and heating cold water offers the energy-efficient equipment that people use in life, production.It is a maturation and product of the future the most the most in China's solar thermal utilization.The New-type water heater product of environmental protection, safe, energy-conservation, health is provided for the common people.The solar water heater that I cross a few years ago mainly is based on solar vacuum-tube water heater, but uses in the small-sized independent solar water heater that uses solar vacuum-tube aqueous vapor the time.Continuous progress along with the sun power utilization, some large-scale solar water heaters adopt the flat solar water heater more now, because what the thermal-arrest plate in this solar water heater adopted all is metal sheet, aspect sturdy and durable, have significant advantage, can reach substantially with fabrication and have identical work-ing life.And the selective coating on thermal-arrest plate surface wherein be coated with quality and performance, be the gordian technique of the whole solar facilities performance of decision.By inquiry to Chinese patent, a kind of solar selectively absorbing coating continuous coating apparatus is disclosed in the Chinese patent 200420077793.6, be to adopt before each chamber in this device, perhaps between two chambers an independently vacuum excessive device is set during continuous coating, can reaches being coated with continuously of individual components like this.But above-mentioned equipment is in the process of being coated with, and workpiece enters in the vacuum excessive device after the vacuum environment that all can come off after each plated film, and workpiece changes in temperature and vacuum condition in the process owing to being coated with at twice like this, influences the quality of plated film easily.Above-mentioned in addition continuous coating apparatus is the continuous coating apparatus of individual components, also can't realize carrying out the production of long-time continuous plated film for the metal band of rolling.Along with popularizing and expansion that China's plate-type solar equipment is used.Be badly in need of a kind of production efficiency height in the industry, and the highly stable novel film coating apparatus of quality product.Above-mentioned problem long-term existence does not obtain a very effective technical solution so far in the industry.
[summary of the invention]
Main purpose of the present utility model provides a kind of special-purpose filming equipment that continues to be coated with solar selective coat for a long time, and this equipment has the production efficiency height, the advantage of steady quality and film performance excellence.
In order to reach above-mentioned technical purpose, the technical solution that the utility model adopts comprises following technology contents: a kind of continuous winding magnetic control sputtering vacuum coating device, comprise and unreel the chamber, the rolling chamber, the tension control chamber, pretreatment chamber, chamber is formed, unreel chamber and rolling chamber and lay respectively at the head and end of equipment, unreeling the chamber is connected with a tension control chamber respectively with the rolling chamber, the tension control chamber that unreels chamber one end is connected with pretreatment chamber, be provided with at least one chamber between the tension control chamber of pretreatment chamber and rolling chamber one end, the above-mentioned chamber that unreels, one end of rolling chamber and tension control chamber, pretreatment chamber, the two ends of chamber are provided with the ring flange of same size, and connect the above-mentioned chamber that unreels successively by ring flange, the rolling chamber, the tension control chamber, pretreatment chamber, chamber is an one, the described chamber that unreels, the tension control chamber, pretreatment chamber, chamber, the rolling chamber is vacuum chamber, the described chamber that unreels, the tension control chamber, pretreatment chamber, chamber, be equipped with the roller that transmission is used in the rolling chamber.
Described unreeling is provided with the cryogenic absorption trap in the chamber, general cryogenic absorption trap is set to-120 ℃ of cryogenic trap, its middle part be provided with placement by the roller of plated film band, unreel indoor chamber and be connected with vacuum system such as diffusion pump equal vacuum pump.
Described rolling chamber is provided with the wind-up roll of placing band equally, and the indoor chamber of rolling is connected with vacuum system such as diffusion pump equal vacuum pump.
Inner chamber is connected with vacuum system such as diffusion pump equal vacuum pump in described two tension control chambers, and is horizontally disposed with the trilateral tenslator that is made of three rollers in its inner chamber.
Be provided with ion source in the described pretreatment chamber, connect vacuum system such as molecular pump equal vacuum pump in its cavity.
Be provided with one group of intermediate frequency target in the described chamber, wherein be provided with three rollers, the intermediate frequency target is arranged around the home roll at middle part, so that target material evenly is splashed to ribbon of material surface to be plated when doing magnetron sputtering, the home roll at middle part is a water cooled rolls, be convenient to regulate the needed equilibrium temperature of coating process by water-cooled, chamber is divided into two cavitys up and down, separate with division board, connect independent vacuum system (as the molecular pump system) respectively, vacuumize respectively, and control different vacuum tightness, prevent that the reactant gases of chamber is gone here and there mutually up and down, described one group of intermediate frequency target mainly is to adjust according to product technology, and the thin thickness of the rete that is coated with if desired so only uses an intermediate frequency target just can satisfy the requirement of process for plating, if the thickness of the rete that is coated with is thicker, then need to be provided with two three even more intermediate frequency target.
Described chamber is more than one, can be according to different processing requirement, and plating trilamellar membrane or four tunics are example with four chamber plating trilamellar membranes, one group of intermediate frequency target in first chamber is the stainless steel target, the splash-proofing sputtering metal transition layer, regulating vacuum tightness is 10
-4Pa, voltage 480V is to improve strip surface bonding force to be plated and corrosion resistance; One group of intermediate frequency target in second chamber is the aluminium target, and logical nitrogen carries out reactive sputtering, and the sputtering chamber internal gas pressure remains on 0.5Pa--1 * 10
-1Pa, voltage 400V; One group of intermediate frequency target in the 3rd chamber is the aluminium target also, and air pressure remains on 0.5 * 10
-1The logical equally nitrogen of Pa, voltage 380V carries out reactive sputtering, obtains the rete of different metal volume fractions by controlling the 3rd air pressure different with second Room, thereby obtains film with certain spectral response curve, and this rete has the selectivity absorptive character to visible light; One group of intermediate frequency target aluminium target in the 4th chamber, logical oxygen carries out reactive sputtering, second and trilamellar membrane on plating one deck antireflective coating, this rete also has preservative activity simultaneously, improves the weathering resistance of rete.
Be provided with between described terminal tension control chamber and the chamber and detect the correction chamber, wherein be provided with the multiple spot continuous detecting equipment of solar absorptance and emittance and the roller and the power assembly of conveying band.
The described chamber, rolling chamber, tension control chamber, pretreatment chamber, a plurality of chambers two ends of unreeling has at least an end to be provided with division board, this division board all or at least contact part uses elastic material to make, the opposed slit of a pair of division board is airtight by resilient material, this slit and band by position corresponding and band by passing through in the slit.
Because the utility model has adopted above-mentioned technical solution, have following positive technique effect and advantage: at first the utility model is by having adopted the equipment that relates in the coating process process, all adopt standardized ring flange to connect, make above-mentioned production unit possess performance capable of being combined, can be that above-mentioned equipment can be changed easily like this, to satisfy various coating process process, the adaptive faculty of the increase equipment that this structure can be detailed; The utility model is used the strong roller of diffusion pump and weight capacity by the structure of cryogenic absorption trap is set in unreeling the chamber in addition, makes above-mentioned rolling copper strips or aluminium strip obtain quality in advance, for subsequent technique provides good processing condition; The utility model is by being provided with the tension control chamber at a plurality of vacuum chambers two ends, makes the tension force of the metal band in the chamber obtain good control, makes band enter above-mentioned chamber with the state of the best; In the utility model by the structure of division board is set in a plurality of chambers, be the gordian technique characteristics in the utility model, by being provided with of division board chamber is separated into two parts up and down, and band is entered in each chamber by issuing of chamber, this is to bleed at the molecular pump that uses respectively up and down of each chamber, can effectively prevent the gas gas blowby of chamber, the processing condition that form in the assurance chamber, adopt the chamber of this structure, can making up and down, two chambers have different air pressure, and air pressure has only several handkerchiefs at zero point above the chamber, below air pressure have 10
-2Therefore handkerchief has the matter of two orders of magnitude poor, and can guarantee up and down not can gas blowby, and band passes in and out chamber from the bottom, because of the working gas on top under the effect of pressure reduction, can not scurry following, can gas blowby between the different chamber about so just having guaranteed yet; In the utility model in chamber employed roller be water cooled rolls, the employing water cooled rolls can be by the temperature of control roller, reach the effect of control strip temperature, the heat that the ion bombardment strip surface can be produced makes it control to best equilibrium operating temperature by water cooled rolls like this; Be provided with at above-mentioned a plurality of chamber ends at last and detect the correction chamber, after above-mentioned band is finished plated film, carrying out solar absorptance and emittance immediately detects, when detected result produces deviation, can be according to above-mentioned detected result, in time the working conditions in the adjusting process chamber or the transfer rate of band are effectively guaranteed the coating quality of band.
In a word, the utility model is by adopting above-mentioned a series of rational design, a kind of novel plating equipment that can uninterruptedly be coated with solar selective coat continuously to coil strip is provided, this equipment can be controlled in conjunction with dynamic processing condition according to the quality examination to plated film in real time, not only significantly improved production efficiency, also made the quality of above-mentioned plated film coating obtain very effective assurance simultaneously.
[description of drawings]
Fig. 1 is the structural representation of continuous coating apparatus of the present utility model.
[embodiment]
Next step is further detailed the utility model in conjunction with the accompanying drawings:
The utility model is the specific equipment at the coating for selective absorption that is coated with on the thermal-arrest plate surface of using in the plate-type solar thermal collector, the main advantage of this equipment is a kind of continuous winding magnetic control sputtering vacuum coating device, carrying out continuing for a long time plated film work at large-scale web-like band, can significantly improve the production efficiency of plated film, reduce production costs and improve the excellent of coating quality.As shown in Figure 1, comprise and unreel chamber 1, rolling chamber 2, tension control chamber 3, pretreatment chamber 4, chamber 5 composition production lines, unreel chamber 1 and rolling chamber 2 and lay respectively at the head and end of equipment, main function is to be used for placing and collecting sheet metal strip, and band commonly used is the copper strips or the aluminium strip of thickness at a few tenths of a mm.Unreel chamber 1 and be connected with a tension control chamber 3 respectively with rolling chamber 2, the tension control chamber 3 that unreels chamber 1 one ends is connected with pretreatment chamber 4, and pretreatment chamber 4 is an impurity of removing strip surface before plated film, improves the sticking power of coating.Be provided with at least one chamber 5 between the tension control chamber 3 of pretreatment chamber 4 and rolling chamber 2 one ends, the quantity that these chambers 5 are provided with is relevant with formation with the material of the technology of plated film and the alternative coating that is coated with, promptly according to the number of plies of coating and the chamber 5 of process using different quantities.Mentality of designing of the present utility model is to adopt modular design, so above-mentioned equipment all has unified standard flange 6 coupling ends, and so in process of production can be according to using the product coating process to carry out the equipment adjustment easily.So in an end that unreels chamber 1, rolling chamber 2 and tension control chamber 3, the two ends of pretreatment chamber 4, chamber 5 are provided with the ring flange 6 of same size, and connect the above-mentioned chamber 1, rolling chamber 2, tension control chamber 3, pretreatment chamber 4, chamber 5 that unreel successively by ring flange 6 and be one, the described chamber 1, tension control chamber 3, pretreatment chamber 4, chamber 5, rolling chamber 2 of unreeling is vacuum chamber, and described unreeling is equipped with the roller 9 that transmission is used in chamber 1, tension control chamber 3, pretreatment chamber 4, chamber 5, the rolling chamber 2.Make up the chamber of working alone by above-mentioned a plurality of difference in functionalitys, and promptly constitutes continuous winding magnetic control sputtering vacuum coating device of the present utility model.
Be described in detail at each working spaces below:
It is described that what unreel that 1 middle part, chamber installs is the roller 9 of placing band 8, it also is equipped with the cryogenic absorption trap in unreeling chamber 1, so that form the vacuum environment of the temperature of-120 degree, under such Working environment, help to adsorb the gas on the band, thereby reduce the gas in the chamber after entering, make to have better film coating environment in the chamber 5.In an above-mentioned side that unreels chamber 1, be provided with the lobe pump that connects by bivalve, also can use other vacuum pumps such as diffusion pump, be used to form the vacuum environment that unreels in the chamber 1.Also be connected with the drive-motor that driving roll rotates on the above-mentioned in addition roller 9, in unreeling the chamber, drive-motor can be set, and realize the process of unreeling by the pulling of the drive-motor in rolling chamber band.The exit of one end is provided with division board 10, this division board 10 all or at least contact part uses elastic material to make, a pair of division board 10 opposed slits are airtight by resilient material, this slit and band 8 by position corresponding and band 8 by passing through in the slit.For the throughput direction that makes band 8 in above-mentioned slit direction level, a side of the roller of placing at band 8 is provided with the roller 9 that is used to adjust band 8 directions.
Described rolling chamber 2 structures are basic identical in unreeling chamber 1 structure, just wherein do not need to be provided with the cryogenic absorption trap, because passed through after the coating process, band after the film forming there is no need to carry out adsorption treatment, in the rolling chamber, be provided with drive-motor and speed change gear in addition, this drive-motor is used for driving the roller rotation of rolling chamber 2 and driving ribbon motion, it should be noted that this motor should adjust rotating speed, because band 8 process of plating need above-mentioned band 8 to have the constant linear velocity.
Inner chamber is connected with diffusion pump in described two tension control chambers 3, and this diffusion pump is arranged on a side of tension control chamber 3, is used for making tension control chamber 3 to form vacuum environment.Its two ends are provided with and unreel the ring flange 6 of unified specifications such as chamber 2, are provided with division board 10 at least one ring flange 6.Be horizontally disposed with the triangle tenslator that constitutes by three rollers 9 in its inner chamber of tension control chamber 3.
Be provided with ion source and power supply in the described pretreatment chamber 4, vacuum chamber and vacuumize after, in pretreatment chamber 4, feed Ar gas, open cathodic power source, add cathode voltage 350V-500V ionization Ar gas, utilize Ar under electric field action, to obtain kinetic energy accelerating impact target surface, the target surface atom sputtering is come out and be deposited on substrate surface and realize thin film deposition, magnetic field, target back side fixed electron increases the electronic impact probability simultaneously, improves high rate.Be provided with molecular pump in its cavity, so that form vacuum environment, equally at the two ends of pretreatment chamber 4, be provided with the ring flange 6 of unified specification, ring flange 6 inboards are division boards 10.Form the structure of two relatively independent cavitys up and down in the above-mentioned pretreatment chamber 4 in order to make, be provided with division board 10 at the middle part of pretreatment chamber 4, this division board 10 all or at least contact part uses elastic material to make, a pair of division board 10 opposed slits are airtight by resilient material, this slit and band 8 by position corresponding and band 8 by passing through in the slit.The actual use is the division board 10 that can situation uses different structure, be set to three as the division board among Fig. 1 10, being positioned at division board 10 at band 10 middle parts and two other division board 10 of band 8 both sides cooperatively interacts, form two slits by the resilient material closure, band 8 is respectively by passing in and out in these two slits.Ion source in the pretreatment chamber 4 and power supply operated by rotary motion are in the upper center of pretreatment chamber 4, and its middle part is the thicker home roll of diameter 11, and the both sides of home roll 11 are provided with the roller 9 that is used to adjust strip direction.
Be provided with one group of intermediate frequency target 12 in the described chamber 5, chamber 5 wherein is provided with three rollers, and what be arranged on the middle part is as the home roll 11 that is coated with process groundwork face, and its both sides are rollers 9 of adjusting strip direction.The diameter of home roll 11 is thicker, makes its surface ratio broader, so that intermediate frequency target 12 carries out being coated with of rete.Intermediate frequency target 12 is positioned at the top of the home roll 11 at middle part, what adopt in the utility model is that correspondence is provided with one group of intermediate frequency target 12, being set to more than one of intermediate frequency target 12, and the quantity that is provided with is relevant with the requirement of technology, the rete that is coated with if desired is very thick, then needs to use more intermediate frequency target 12.Be provided with molecular pump in its cavity.Need to prove that the roller in chamber 5 is a water cooled rolls 9.Because in coating process, can produce heat in the time of the ion bombardment metallic surface, carry out the temperature that water-cooled can balancing control band 8 so in roller 9, feed cold water, in addition because the mode of the non-stop run that the continuous winding magnetic control sputtering vacuum coating device in the utility model adopts, a plated film is at least more than 20 hours, and adopting water cooled rolls 9 is necessary temperature control devices.With the two ends of the same chamber 5 in previous working spaces the standard flange 6 of unified specification is set also, its inboard is provided with division board 10, and the effect of this division board 10 mainly is the air of isolating between each chamber, places gas blowby between the chamber.
Be provided with chamber division board 10 in addition at described chamber 5 middle parts chamber 5 is separated into two air chambers up and down, this division board 10 is a writing board shape, and being two is oppositely arranged chamber 5 is separated into two individual cavity, this division board 10 all or at least contact part uses elastic material to make, a pair of division board 10 opposed slits are airtight by resilient material, by passing through in the slit, the above-mentioned inlet that is coated with band 8 is below chamber 5 by position corresponding and band for this slit and band 8.Wherein up and down be respectively arranged with molecular pump in two cavitys, make the environment of the different vacuum tightness of formation in above-mentioned two cavitys.Requirement in the chamber 5 is up and down can not gas blowby, can not gas blowby about between each chamber 5.By using molecular pump to form different vacuum environment in two gases at chamber about in the of 5, generally top is several handkerchiefs at zero point, is 10 below
-2-10
-3Handkerchief has the matter of two orders of magnitude poor, and having guaranteed in two cavitys not can gas blowby, and simultaneously shown in 1 figure, band 8 is from the bottom turnover, because of the working gas on top under the effect of pressure reduction, can not scurry following, can gas blowby about so just having guaranteed yet.
The structure of a key in the utility model is exactly the setting of division board 10, by in the chamber cavity, establishing division board 1, division board 10 is set between different working spacess, can guarantee in whole production line, to form a plurality of relatively independent, and the individual cavity that vacuum tightness is different satisfies being coated with the different processing condition that require in the process.
Be provided with between described terminal tension control chamber 3 and the chamber 5 and detect correction chamber 13, wherein be provided with solar absorptance and emittance test set, detect in the correction chamber and be provided with four rollers 9, so that make the band on its top be in horizontality, the equipment of being convenient to detects, the effect of above-mentioned detection correction chamber 13 mainly is to carry out the online detection of solar absorptance and emittance to being coated with the band of finishing, after above-mentioned technical indicator emission departs from, technical parameter in the timely adjusting process chamber 5, the coating quality of assurance band 8.
Adopt in the utility model that to have four chambers be example.Whole continuous winding magnetic control sputtering vacuum coating device is described, all independently are provided with according to production technique each working spaces, in the present example, first is tension control chamber 3, pretreatment chamber 4, four chambers 5 for unreeling chamber 1, one side, detect correction chamber 13, tension control chamber 3, be rolling chamber 2 at last.Connect by ring flange 6 between these working spacess, between the ring flange 6 sealing-ring is set and guarantees sealing property.Two intermediate frequency targets 12 in first are respectively stainless steel intermediate frequency target and Mo intermediate frequency target, mainly are responsible for being coated with metal substrate in this chamber 5, and regulating vacuum tightness is 10
-4Pa, voltage 480V is to improve strip surface bonding force to be plated and corrosion resistance; Two intermediate frequency targets 12 in second all are set to aluminium intermediate frequency target, mainly are to do reactive sputtering with aluminium, do the logical nitrogen of aluminium sesquioxide and carry out reactive sputtering, and the sputtering chamber internal gas pressure remains on 0.5Pa--1 * 10
-1Pa, voltage 400V; Two aluminium intermediate frequency targets 12 are set in the 3rd equally, do reactive sputtering, Al, O
2, air pressure remains on 0.5 * 10
-1The logical equally nitrogen of Pa, voltage 380V carries out reactive sputtering, obtains the rete of different metal volume fractions by controlling the 3rd air pressure different with second Room, thereby obtains film with certain spectral response curve, and this rete has the selectivity absorptive character to visible light; It in the 4th aluminium intermediate frequency target.Be used to be coated with Al
3O
2The protection ceramic layer, logical oxygen carries out reactive sputtering, second and trilamellar membrane on plating one deck antireflective coating, this rete also has preservative activity simultaneously, improves the rete weathering resistance.Above-mentioned equipment is fit to be coated with two kinds of film systems, first kind as top introduction, and second kind of film system interferes with absorptive-type absorbing film, is exactly the interference absorbing film with low metal volume fraction, promptly at Al
3O
2In the rete, the embedded with metal particle.
Foregoing description can only be counted as preferred embodiment.Those those of skill in the art in the art and those manufacturings or use people of the present invention by the suggestion content in this patent can not need creative work, can learn other multiple variation pattern of the present invention.Therefore, it being understood that the above-mentioned illustrated embodiment usefulness that only presents a demonstration, it can't be construed as limiting scope of the present invention, scope of the present invention according to the principle of patent law, comprise that the claim that the principle of equivalent is explained limits.
Claims (10)
1, a kind of continuous winding magnetic control sputtering vacuum coating device, comprise and unreel the chamber, the rolling chamber, the tension control chamber, pretreatment chamber, chamber is formed, it is characterized in that: unreel the head and end that chamber and rolling chamber lay respectively at equipment, unreeling the chamber is connected with a tension control chamber respectively with the rolling chamber, the tension control chamber that unreels chamber one end is connected with pretreatment chamber, be provided with at least one chamber between the tension control chamber of pretreatment chamber and rolling chamber one end, the above-mentioned chamber that unreels, one end of rolling chamber and tension control chamber, pretreatment chamber, the two ends of chamber are provided with the ring flange of same size, and connect the above-mentioned chamber that unreels successively by ring flange, the rolling chamber, the tension control chamber, pretreatment chamber, chamber is an one, the described chamber that unreels, the tension control chamber, pretreatment chamber, chamber, the rolling chamber is vacuum chamber, the described chamber that unreels, the tension control chamber, pretreatment chamber, chamber, be equipped with the roller that transmission is used in the rolling chamber.
2, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: described unreeling is provided with the cryogenic absorption trap in the chamber, its middle part be provided with placement by the roller of plated film band, to unreel indoor chamber be that vacuum pump is connected with vacuum system.
3, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1 is characterized in that: described rolling chamber is provided with the wind-up roll of placing band equally, and the indoor chamber of rolling is that vacuum pump is connected with vacuum system.
4, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1 is characterized in that: inner chamber connection vacuum system is that vacuum pump connects in described two tension control chambers.And be horizontally disposed with the trilateral tenslator that constitutes by three rollers in its inner chamber.
5, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1 is characterized in that: be provided with ion source in the described pretreatment chamber, connecting vacuum system in its cavity is that vacuum pump connects.
6, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: be provided with one group of intermediate frequency target in the described chamber, wherein be provided with three rollers, the intermediate frequency target is positioned at the top of the home roll at middle part, connecting vacuum system in its cavity is that vacuum pump connects, and the roller that is arranged on wherein is a water cooled rolls.
7, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: described chamber middle part is provided with the chamber division board chamber is separated into two chambers up and down, this division board is a writing board shape, and being two is oppositely arranged chamber is separated into two individual cavity, this division board all or at least contact part uses the elastic material of softish to make, the opposed slit of a pair of division board is sealed by soft resilient material, this slit and band by position corresponding and band by passing through in the slit, the above-mentioned inlet that is coated with band is below chamber, there is flexible materials at band contact dividing plate place, prevents that rete from scratching.
8, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: described chamber is more than one, can be according to the difference of institute's coatings, the number of any adjusting process chamber, satisfy the process requirements that is coated with different retes, the coating process of best plating adopts four chambers, and wherein the intermediate frequency target in first chamber is respectively stainless steel target or molybdenum target; Intermediate frequency target in second chamber all is set to the aluminium target; In the 3rd chamber aluminium target is set equally; Be similarly the aluminium target in the 4th chamber.
9, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: be provided with between described terminal tension control chamber and the chamber and detect the correction chamber, wherein be provided with solar absorptance and emittance multiple spot continuous detecting equipment and proofread and correct device that band wanders off and the roller of carrying band.
10, a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1, it is characterized in that: the described chamber, rolling chamber, tension control chamber, pretreatment chamber, a plurality of chambers two ends of unreeling has at least an end to be provided with division board, this division board all or at least contact part uses flexible elastic material to make, the opposed slit of a pair of division board is airtight by resilient material, this slit and band by position corresponding and band by passing through in the slit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008202359377U CN201326012Y (en) | 2008-12-30 | 2008-12-30 | A continuous winding-type magnetron sputtering vacuum plating equipment |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008202359377U CN201326012Y (en) | 2008-12-30 | 2008-12-30 | A continuous winding-type magnetron sputtering vacuum plating equipment |
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| CN201326012Y true CN201326012Y (en) | 2009-10-14 |
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| CNU2008202359377U Expired - Fee Related CN201326012Y (en) | 2008-12-30 | 2008-12-30 | A continuous winding-type magnetron sputtering vacuum plating equipment |
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| CN102409336A (en) * | 2011-12-04 | 2012-04-11 | 西北有色金属研究院 | Continuous preparation device and preparation method for bismuth-series high temperature superconductive thick film |
| CN101768726B (en) * | 2008-12-30 | 2012-12-12 | 深圳市鹏桑普太阳能股份有限公司 | Continuous winding magnetic control sputtering vacuum coating device |
| CN101839576B (en) * | 2010-01-05 | 2013-02-13 | 云南省玉溪市佳利太阳能设备有限公司 | Process for producing solar heat collection strip anode coating film |
| CN103290385A (en) * | 2013-05-24 | 2013-09-11 | 深圳市生波尔机电设备有限公司 | Roll-to-roll vertical type magnetic control film plating device |
| CN103451615A (en) * | 2013-05-13 | 2013-12-18 | 辽宁北宇真空科技有限公司 | Continuously winding vacuum ion film plating machine for preparing negative carbon foil of film-type capacitor |
| CN103741109A (en) * | 2013-12-31 | 2014-04-23 | 北京工业大学 | Device and method for continuously coating fiber with metallic conductive function film through magnetron sputtering |
| CN103787119A (en) * | 2012-10-29 | 2014-05-14 | 财团法人工业技术研究院 | Transmission device |
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| CN101768726B (en) * | 2008-12-30 | 2012-12-12 | 深圳市鹏桑普太阳能股份有限公司 | Continuous winding magnetic control sputtering vacuum coating device |
| CN101839576B (en) * | 2010-01-05 | 2013-02-13 | 云南省玉溪市佳利太阳能设备有限公司 | Process for producing solar heat collection strip anode coating film |
| CN102409336B (en) * | 2011-12-04 | 2013-06-12 | 西北有色金属研究院 | Continuous preparation device and preparation method for bismuth-series high temperature superconductive thick film |
| CN102409336A (en) * | 2011-12-04 | 2012-04-11 | 西北有色金属研究院 | Continuous preparation device and preparation method for bismuth-series high temperature superconductive thick film |
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