CN1162131A - 用于光敏树脂印板的显影剂和制备光敏树脂印板的方法 - Google Patents
用于光敏树脂印板的显影剂和制备光敏树脂印板的方法 Download PDFInfo
- Publication number
- CN1162131A CN1162131A CN97102492A CN97102492A CN1162131A CN 1162131 A CN1162131 A CN 1162131A CN 97102492 A CN97102492 A CN 97102492A CN 97102492 A CN97102492 A CN 97102492A CN 1162131 A CN1162131 A CN 1162131A
- Authority
- CN
- China
- Prior art keywords
- photosensitive resin
- printing forme
- hydrogen
- contain
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP055378/96 | 1996-02-20 | ||
JP5537896 | 1996-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1162131A true CN1162131A (zh) | 1997-10-15 |
CN1092346C CN1092346C (zh) | 2002-10-09 |
Family
ID=12996831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN97102492A Expired - Lifetime CN1092346C (zh) | 1996-02-20 | 1997-02-20 | 光敏树脂印板的制备方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5856066A (zh) |
EP (1) | EP0791859B1 (zh) |
CN (1) | CN1092346C (zh) |
AU (1) | AU685720B2 (zh) |
DE (1) | DE69704969T2 (zh) |
ES (1) | ES2157494T3 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111051074A (zh) * | 2017-08-31 | 2020-04-21 | 富士胶片株式会社 | 平版印刷版原版及平版印刷版的制作方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0822902B1 (de) * | 1995-04-27 | 2000-01-26 | METRONIC GERÄTEBAU GMBH & CO. | Verfahren und vorrichtung zum härten von uv-druckfarben |
EP0880076B1 (en) | 1996-12-06 | 2010-03-31 | Asahi Kasei Kabushiki Kaisha | Process for the production of photosensitive resin printing plates and treating fluid |
US6582886B1 (en) | 2001-11-27 | 2003-06-24 | Nupro Technologies, Inc. | Developing solvent for photopolymerizable printing plates |
US6994026B2 (en) * | 2002-03-22 | 2006-02-07 | Agfa-Gevaert | Preparation of a flexographic printing plate |
KR100725570B1 (ko) * | 2003-02-19 | 2007-06-08 | 아사히 가세이 케미칼즈 가부시키가이샤 | 볼록판 인쇄용 수현상성 인쇄판의 제조 방법 |
EP1698942B1 (en) * | 2003-12-26 | 2016-04-13 | Asahi Kasei Chemicals Corporation | Water-developable photopolymer plate for letterpress printing |
US7247344B2 (en) * | 2004-11-16 | 2007-07-24 | Timothy Gotsick | Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development |
JP5164982B2 (ja) | 2007-06-18 | 2013-03-21 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物、フレキソ印刷版、及びフレキソ印刷版の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3429852A (en) * | 1967-03-30 | 1969-02-25 | Nat Starch Chem Corp | Ethylenically unsaturated derivatives of benzophenone and crosslinkable polymers thereof |
US3776889A (en) * | 1971-01-07 | 1973-12-04 | Powers Chemco Inc | Allyl carbamate esters of hydroxy-containing polymers |
JPS53143669A (en) * | 1977-05-23 | 1978-12-14 | Asahi Chem Ind Co Ltd | Elimination of surface tuckiness of radically-polymerizable resin cured product |
JPS5616182A (en) * | 1979-07-18 | 1981-02-16 | Tokyo Shibaura Electric Co | Character pattern generator |
US4603058A (en) * | 1984-10-05 | 1986-07-29 | Macdermid, Incorporated | Post-treatment of cured, radiation sensitive, polymerizable resins to eliminate surface tack |
JPH073581B2 (ja) * | 1984-11-16 | 1995-01-18 | 旭化成工業株式会社 | 感光性樹脂版の作成方法 |
DE3512179A1 (de) * | 1985-04-03 | 1986-12-04 | Merck Patent Gmbh, 6100 Darmstadt | Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen |
GB8529448D0 (en) * | 1985-11-29 | 1986-01-08 | Ward Blenkinsop & Co Ltd | Thioxanthone derivatives |
JPS62187848A (ja) * | 1986-02-10 | 1987-08-17 | Fuotopori Ouka Kk | 感光性樹脂表面の粘着防止方法 |
GB8716378D0 (en) * | 1987-07-11 | 1987-08-19 | Autotype Int Ltd | Photopolymerisable compositions |
DE3836403A1 (de) * | 1988-10-26 | 1990-05-03 | Hoechst Ag | Entwicklungsloesemittel fuer durch photopolymerisation vernetzbare schichten sowie verfahren zur herstellung von reliefformen |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
IT1228982B (it) * | 1989-03-07 | 1991-07-11 | Lamberti Flli Spa | Dispersioni acquose di fotoiniziatori e loro impiego. |
DE3908059A1 (de) * | 1989-03-13 | 1990-09-27 | Basf Ag | Verfahren zur herstellung einer reliefdruckplatte mit klebfreier druckender oberflaeche |
JPH04366847A (ja) * | 1991-06-13 | 1992-12-18 | Konica Corp | 湿し水不要感光性平版印刷版用現像液 |
-
1997
- 1997-02-12 ES ES97102229T patent/ES2157494T3/es not_active Expired - Lifetime
- 1997-02-12 EP EP97102229A patent/EP0791859B1/en not_active Expired - Lifetime
- 1997-02-12 DE DE69704969T patent/DE69704969T2/de not_active Expired - Lifetime
- 1997-02-18 AU AU14830/97A patent/AU685720B2/en not_active Ceased
- 1997-02-20 CN CN97102492A patent/CN1092346C/zh not_active Expired - Lifetime
- 1997-02-20 US US08/808,989 patent/US5856066A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111051074A (zh) * | 2017-08-31 | 2020-04-21 | 富士胶片株式会社 | 平版印刷版原版及平版印刷版的制作方法 |
Also Published As
Publication number | Publication date |
---|---|
DE69704969D1 (de) | 2001-07-05 |
AU1483097A (en) | 1997-08-28 |
US5856066A (en) | 1999-01-05 |
DE69704969T2 (de) | 2002-04-04 |
EP0791859A3 (en) | 1998-01-21 |
ES2157494T3 (es) | 2001-08-16 |
EP0791859A2 (en) | 1997-08-27 |
AU685720B2 (en) | 1998-01-22 |
EP0791859B1 (en) | 2001-05-30 |
CN1092346C (zh) | 2002-10-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent for invention or patent application | ||
CB02 | Change of applicant information |
Applicant after: Asahi Kasei Kogyo K. K. Applicant before: Asahi Kasei Kogyo K. K. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: ASAHI KASEI CORPORATION TO: ASAHI KASEI CORPORATION |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ASAHI KASEI ELECTRONICS MATERIALS CO., LTD. Free format text: FORMER OWNER: ASAHI KASEI CORPORATION Effective date: 20091016 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20091016 Address after: Tokyo, Japan Patentee after: Asahi Chemical Corp. Address before: Osaka Japan Patentee before: Asahi Kasei Kogyo K. K. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160506 Address after: Tokyo, Japan, Japan Patentee after: Asahi Kasei Kogyo K. K. Address before: Tokyo, Japan Patentee before: Asahi Chemical Corp. |
|
CX01 | Expiry of patent term |
Granted publication date: 20021009 |
|
CX01 | Expiry of patent term |