CN1153653C - Regulator for plane parallel quasi-contact - Google Patents
Regulator for plane parallel quasi-contact Download PDFInfo
- Publication number
- CN1153653C CN1153653C CNB021090149A CN02109014A CN1153653C CN 1153653 C CN1153653 C CN 1153653C CN B021090149 A CNB021090149 A CN B021090149A CN 02109014 A CN02109014 A CN 02109014A CN 1153653 C CN1153653 C CN 1153653C
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- China
- Prior art keywords
- polished
- thimbles
- colloid
- paster dish
- dish
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Abstract
The present invention relates to a regulator for interplanar parallel quasi-contact, which belongs to a regulator of parallel quasi-contact between the surface of a polished piece and the surface of a polished abrasive disk in the technical field of an optics cold processing. The technical problem to be solved by the present invention is how to adjust two planes to a parallel and quasi-contact state. The present invention has the technical scheme for the technical problem that an adjustment scheme of three thimbles is adopted, and the three thimbles of which the upper stage and the lower stage mutually make an angle of 120 degrees; first-stage thimbles of the lower part regulate the plane of the polished piece and the three thimbles which are distributed and mutually make an angle of 120 degrees to be at the same surface, and a second-stage thimble on the upper part adjusts the three first-stage thimbles and the plane of the polished piece to be in parallel with the polished abrasive disk in the mode of quasi-contact. The device is shown in the picture 3: the device is formed by the organic connection of the polished abrasive disk, the first-stage thimbles, the second thimble, the polished piece, a workpiece shaft, a colloid paster disk, an elastic colloid and a paster disk of a processed piece. The device has the advantages of convenient operation, high reliability and greatly improved work efficiency.
Description
Technical field
The invention belongs to the adjusting device of parallel accurate contact between a kind of work piece plane and the mill plane in the optics cold processing technique field.
Background technology
In noncontact float glass process glossing, obtain best polishing effect in order to make polished surface, usually need to realize earlier that the parallel standard between polished surface and the polishing grinding pan plane contacts.Two interplanars can be formed in the technology of parallel accurate contact condition, with the most approaching prior art of the present invention shown in Fig. 1 and Fig. 2 (Ultraprecision Machining P367 National Defense Industry Press): form by polishing grinding pan 1, polished 2, workpiece spindle 3, metal ring 4.Metal ring 4 is sleeved on polished 2, and the polished plane that is adjusted to the following anchor ring that makes metal ring 4 and polished 2 is in same plane.Then,, polished 2 and metal ring 4 are adjusted to and polishing grinding pan 1 accurate contact condition jointly, enter the cold working polishing process again according to the contact resistance between metal ring 4 and the polishing grinding pan 1.
The subject matter that this adjusting device exists is: if the flatness of a metal ring 4 is undesirable, can greatly have influence on final resulting accurate contact condition; B, be difficult to guarantee polished 2 parallel fully with metal ring 4 and polishing grinding pan 1, if it is not parallel, according to the resistance between metal ring 4 and the polishing grinding pan 1, may think accurate contact between above-mentioned by mistake, can not guarantee that in fact polished 2 plane contacts with the standard of polishing grinding pan 1; C, can't adjust accurately polished 2 the plane and the anchor ring of metal ring 4, in order to overcome above-mentioned shortcoming, the adjusting device of a kind of new plane parallel quasi contact of ad hoc meter.
Summary of the invention
The technical problem to be solved in the present invention is: " how two planes are adjusted to parallel and accurate contact condition.
The technical scheme of technical solution problem is: adopt upper and lower two-stage to be mutually three thimble regulation schemes of 120 ° of distributions: the one-level thimble below regulating makes polished plane and is mutually three thimble point coplanes that hexagonal angle distributes, three thimbles of the secondary that is mutually 120 ° of distributions above regulating make work piece paster dish upper level be mutually three thimbles and polished the parallel accurate contact with mill in plane of 120 ° of distributions.
Detailed content of the present invention is as shown in Figure 3 and Figure 4: be made up of polishing grinding pan 5, one-level thimble 6, secondary thimble 7, polished 8, workpiece spindle 9, colloid paster dish 10, elastic gel 11, work piece paster dish 12.
On the plane of polishing grinding pan 5, placement has polished 8 of three one-level thimbles 6, firmly stick together with work piece paster dish 12 for polished 8, there are three to be mutually the screwed hole that hexagonal angle distributes at work piece paster dish 12 places of keeping to the side, screwed hole to the distance of center circle of work piece paster dish 12 from, greater than polished 8 radius, the screwed hole of one-level thimble 6 and work piece paster dish 12 is with being threaded, and both keep the insulation contact; On plane on the work piece paster dish 12, placement has the elastic gel 11 of three secondary thimbles 7, both firmly stick together, elastic gel 11 firmly sticks together with colloid paster dish 10, workpiece spindle 9 is perpendicular and reinforce in the center of colloid paster dish 10, there are three to be mutually the screwed hole that hexagonal angle distributes at colloid paster dish 10 places of keeping to the side, screwed hole to the distance of center circle of colloid paster dish 10 from, radius greater than elastic gel 11, screwed hole on secondary thimble 7 and the colloid paster dish 10 is with being threaded, and both keep insulation to connect; The position of three screwed holes that are mutually the hexagonal angle distribution on the position that is mutually three screwed holes that hexagonal angle distributes on the colloid paster dish 10 and the work piece paster dish 12 is corresponding one by one, in twos in the positional alignment of same radius.
Operation principle explanation: according to 3 principles that determine a plane, in the employing, following two-stage is mutually three thimbles adjustment schemes that hexagonal angle distributes, three thimble 6 coplanes of one-level that following one-level thimble is adjusted polished 8 polished plane and become hexagonal angle to distribute, above three the secondary thimbles 7 that hexagonal angle distributes of being mutually adjust three one-level thimbles 6 being mutually that hexagonal angle distributes and polished 8 polished surface and polishing grinding pan 5 parallel accurate contacts by work piece paster dish 12, according to the contact resistance of three one-level thimbles 6, determine their parallel accurate contact relation with polishing grinding pan 5.
Good effect: this device is adjusted the principle science of plane parallel quasi contact, and is simple, convenient, reliability is high, increases work efficiency greatly.
Description of drawings
Fig. 1 is the side-looking structural representation of prior art, and Fig. 2 is the vertical view of prior art, and Fig. 3 is a side-looking structural representation of the present invention, and Fig. 4 is a vertical view of the present invention, and Figure of abstract also adopts Fig. 3.
The specific embodiment
The present invention presses Fig. 3 and structure shown in Figure 4 is implemented, one-level thimble 6 is fixedly secured on workpiece to be machined paster dish 12, secondary thimble 7 is fixedly secured on colloid paster dish 10, the two-stage thimble is connected by the nut that has accurate thread with the paster dish, insulate between nut and paster dish, guarantee the insulation between thimble and the above-mentioned metal patch dish 10,12, three one-level thimbles 6 are corresponding one by one on positional alignment with three secondary thimbles 7, arrange on same radial location in twos.
Claims (1)
1, a kind of adjusting device of plane parallel quasi contact, comprise polishing grinding pan, polished, workpiece spindle, it is characterized in that the present invention also comprises one-level thimble (6), secondary thimble (7), colloid paster dish (10), elastic gel (11), work piece paster dish (12); On the plane of polishing grinding pan (5), placement has polished (8) of three one-level thimbles (6), polished (8) firmly stick together with work piece paster dish (12), there are three to be mutually the screwed hole that hexagonal angle distributes at work piece paster dish (12) place of keeping to the side, screwed hole to the distance of center circle of work piece paster dish (12) from radius greater than polished (8), the screwed hole of one-level thimble (6) and work piece paster dish (12) is with being threaded, and both keep the insulation contact; On the last plane of work piece paster dish (12), placement has the elastic gel (11) of three secondary thimbles (7), both firmly stick together, elastic gel (11) firmly sticks together with colloid paster dish (10), workpiece spindle (9) is perpendicular and reinforce in the center of colloid paster dish (10), there are three to be mutually the screwed hole that hexagonal angle distributes at colloid paster dish (10) place of keeping to the side, screwed hole to the distance of center circle of colloid paster dish (10) from radius greater than elastic gel (11), screwed hole on secondary thimble (7) and the colloid paster dish (10) is with being threaded, and both keep insulation to connect; The position of three screwed holes that are mutually the hexagonal angle distribution on the position that is mutually three screwed holes that hexagonal angle distributes on the colloid paster dish (10) and the work piece paster dish (12) is corresponding one by one, in twos in the positional alignment of same radius.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021090149A CN1153653C (en) | 2002-01-07 | 2002-01-07 | Regulator for plane parallel quasi-contact |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB021090149A CN1153653C (en) | 2002-01-07 | 2002-01-07 | Regulator for plane parallel quasi-contact |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1358611A CN1358611A (en) | 2002-07-17 |
| CN1153653C true CN1153653C (en) | 2004-06-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB021090149A Expired - Fee Related CN1153653C (en) | 2002-01-07 | 2002-01-07 | Regulator for plane parallel quasi-contact |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1153653C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106908676B (en) * | 2017-03-06 | 2023-06-20 | 国家电网公司 | Intelligent substation relay protection state monitoring and fault diagnosis system body |
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2002
- 2002-01-07 CN CNB021090149A patent/CN1153653C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1358611A (en) | 2002-07-17 |
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