CN113957542B - Corrosion machine with automatic cup pouring function - Google Patents

Corrosion machine with automatic cup pouring function Download PDF

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Publication number
CN113957542B
CN113957542B CN202111353547.6A CN202111353547A CN113957542B CN 113957542 B CN113957542 B CN 113957542B CN 202111353547 A CN202111353547 A CN 202111353547A CN 113957542 B CN113957542 B CN 113957542B
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Prior art keywords
guide rail
basket
tank
corrosion
moving
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CN113957542A (en
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刘胜男
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Hunan Kexintai Electronics Co ltd
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Hunan Kexintai Electronics Co ltd
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08Etching
    • C30B33/10Etching in solutions or melts
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/18Quartz
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

A corrosion machine with an automatic cup pouring function comprises a corrosion machine main body, wherein a washing tank and a corrosion tank are arranged in the corrosion machine main body side by side, a basket lifting motion mechanism is arranged above the washing tank and the corrosion tank, and a basket lifting mechanism facing the washing tank and the corrosion tank is arranged on the basket lifting motion mechanism; according to the automatic cup grabbing and pouring device, the full automation of the automatic cup grabbing and pouring process can be realized through the arrangement and mutual cooperation of the cleaning tank, the etching tank, the basket moving mechanism, the basket mechanism, the material tray moving mechanism and the grabbing mechanism, so that the labor consumption is saved; meanwhile, the cup pouring time is accurate, the risk of wrong cup pouring time by manpower is avoided, the cup pouring time is improved, the precision is high, and the minimum precision of the cup pouring interval can be 0.1 second.

Description

Corrosion machine with automatic cup pouring function
Technical Field
The invention belongs to the technical field of wafer processing equipment, and particularly relates to an etching machine with an automatic cup pouring function.
Background
Quartz wafers are the core components of quartz crystal resonators and oscillators. In the processing of quartz wafers, frequency is a key index parameter. The frequency and thickness of a quartz wafer are inversely related, i.e., the frequency is higher the thinner the wafer. For example, a thickness of about 0.08mm for 20MHz and about 0.04mm for 40MHz.
The thickness of the quartz wafer is processed by two methods, namely grinding and etching. Typically, etching is a process of final thickness (i.e., frequency).
The chemical component of the quartz wafer is silicon dioxide, and the chemical component can be commonly hydrofluoric acid or ammonium bifluoride solution which is called as etching solution.
During the processing of quartz wafers, it is necessary to finally achieve a narrow frequency range, for example 20100 + -100 KHz. If all wafers are etched together, the frequency concentration is not as desired. This requires measuring the frequency and dividing the frequency into cups, for example, each cup has a frequency range of 10KHz, before etching, and then pouring the cups into the etching solution at regular time intervals, sequentially from low to high, so that each cup of wafers is etched to the same frequency. This process we call "inverted cup corrosion". In this process, the frequency dispersion per cup will become large, and the frequency of each cup will vary, but the target dispersion of 100KHz can generally be achieved.
Therefore, wafer etching requires a machine, which we call an etcher. There are typically two tanks in the etcher: one is an etching tank which is used for containing ammonium bifluoride etching solution for etching the wafer; the other is a cleaning tank for holding clear water, and after the wafer is corroded, the wafer is put into the clear water to stop corrosion. According to the prior art, the inverted cup corrosion is all manual operation. Specifically, manually calculating the pouring interval time of two adjacent cups according to the corrosion rate of the corrosion solution and the frequency interval of each cup, and pouring each cup of wafers into the corrosion solution one by one according to a fixed time interval; the manual operation has the following disadvantages:
the manual operation process needs about 10 to 30 minutes, which consumes manpower;
(ii) human labor may have time errors resulting in a reduced frequency concentration.
Disclosure of Invention
The invention aims to solve the technical problem of providing a corrosion machine with an automatic cup pouring function.
In order to solve the technical problem, the invention adopts the following technical scheme:
a corrosion machine with an automatic cup pouring function comprises a corrosion machine main body, wherein a washing tank and a corrosion tank are arranged in the corrosion machine main body side by side, a basket lifting motion mechanism is arranged above the washing tank and the corrosion tank, and a basket lifting mechanism facing the washing tank and the corrosion tank is arranged on the basket lifting motion mechanism; and a material tray moving mechanism is arranged on one side of the corrosion tank or the cleaning tank, and a grabbing mechanism is arranged on the material tray moving mechanism.
In one embodiment, the etching machine main body is further provided with a control panel and a liquid storage tank, the liquid storage tank is communicated with the etching tank, and the control panel is electrically connected with the cleaning tank, the etching tank basket-lifting motion mechanism, the basket-lifting mechanism, the material tray motion mechanism and the grabbing mechanism.
In one embodiment, the basket moving mechanism comprises a horizontal linear ball guide rail, a Z-axis installation transverse plate arranged on the horizontal linear ball guide rail, a rodless cylinder driving the Z-axis installation transverse plate to move linearly, a Z-axis vertical plate arranged on the Z-axis installation transverse plate, a vertical linear ball guide rail and a vertical ball screw arranged on the Z-axis vertical plate, and a lifting transverse plate arranged on the vertical linear ball guide rail and the vertical ball screw.
In one embodiment, a bearing seat and a stepping motor are arranged on the lifting transverse plate, wherein a moving upright post is fixedly arranged on the bearing seat, a synchronizing wheel is fixedly arranged at one end of the moving upright post, and the synchronizing wheel is fixedly connected with an output shaft of the stepping motor in a transmission manner through a synchronous belt.
In one embodiment, an end of the moving column remote from the synchronizing wheel extends through the lifting cross plate and the Z-axis mounting cross plate and toward the cleaning or etching tank.
In one embodiment, the basket mechanism comprises a basket fixing plate fixedly connected with the moving upright post, a basket arranged on the basket fixing plate and a basket pressing claw sleeved on the moving upright post.
In one embodiment, the tray moving mechanism comprises a transverse moving guide rail and a longitudinal moving guide rail, wherein the grabbing mechanism is arranged on the transverse moving guide rail and can make transverse displacement on the transverse moving guide rail, a tray capable of longitudinally moving on the longitudinal moving guide rail is arranged on the longitudinal moving guide rail, and a groove for placing a cup is formed in the tray.
In one embodiment, the grasping mechanism includes; the sliding part is connected with the transverse moving guide rail in a sliding mode, the output end of the lifting cylinder is fixedly connected with the sliding part, the fixed plate is fixedly connected with the lifting cylinder, and the rotating cylinder is fixedly arranged on the fixed plate.
In one embodiment, the output end of the rotary cylinder is fixedly connected with a rotary bottom plate, a first linear ball guide rail and a second linear ball guide rail which are symmetrical are arranged on the rotary bottom plate, a first clamping jaw arm is arranged on the first linear ball guide rail, a second clamping jaw arm is arranged on the second linear ball guide rail, the first clamping jaw arm is far away from one end of the first linear ball guide rail, a first clamping jaw is fixedly arranged at one end of the second linear ball guide rail, and a second clamping jaw matched with the first clamping jaw to grab a cup is fixedly arranged at one end of the second linear ball guide rail.
In one embodiment, a gear is arranged between the first linear ball guide rail and the second linear ball guide rail, and racks meshed with the gear are arranged at the corresponding ends of the first clamping jaw arm and the second clamping jaw arm; and the rotating bottom plate is also provided with a driving device for driving the gear to rotate.
Compared with the prior art, the invention has the following beneficial effects:
1. according to the automatic cup grabbing and pouring device, the full automation of the automatic cup grabbing and pouring process can be realized through the arrangement and mutual cooperation of the cleaning tank, the corrosion tank, the basket moving mechanism, the basket lifting mechanism, the material tray moving mechanism and the grabbing mechanism, so that the labor consumption is saved; meanwhile, the cup pouring time is accurate, the risk of manual cup pouring time errors is avoided, the cup pouring time precision is also improved, and the minimum cup pouring interval precision can be 0.1 second.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a schematic structural diagram of the tray moving mechanism of the invention.
Fig. 3 is a schematic structural diagram of the grasping mechanism of the present invention.
Fig. 4 is a schematic structural view of the basket moving mechanism of the present invention.
Fig. 5 is a schematic structural view of the basket mechanism of the present invention.
In the figure: 1. a cleaning tank, 2, an etching tank, 3, a liquid storage tank, 4, a basket lifting mechanism, 5, a basket lifting mechanism, 6, a tray moving mechanism, 7, a grabbing mechanism, 8, a control panel, 101, a transverse linear ball guide rail, 102, a Z-axis installation transverse plate, 103, a Z-axis vertical plate, 104, a vertical linear ball guide rail, 105, a vertical ball screw, 106, a lifting transverse plate, 107, a bearing seat, 108, a stepping motor, 109, a motion upright, 110, a synchronizing wheel, 111, a synchronous belt, 112, a rodless cylinder, 120, a basket fixing plate, 121, a basket, 122, a basket pressing claw, 123, a spring fixing ring, 124, a pressing spring, 231, a transverse moving guide rail, 232, a longitudinal moving guide rail, 233, a tray, 234, a sliding part, 235, a lifting cylinder, 236, a fixing plate, 237, a rotating cylinder, 238, a rotating bottom plate, 239, a first linear ball guide rail, 240, a second linear ball guide rail, 241, a first clamping claw arm, 242, a second clamping claw arm, 244, a second clamping claw, a gear, 245, 246.
Detailed Description
In order to make the technical problems, technical solutions and advantages of the present invention more apparent, the following detailed description is given with reference to the accompanying drawings and specific embodiments. In the following description, characteristic details such as specific configurations and components are provided only to help the embodiments of the present invention be fully understood. It will therefore be apparent to those skilled in the art that various changes and modifications can be made in the embodiments described herein without departing from the scope and spirit of the invention. In addition, descriptions of well-known functions and constructions are omitted for clarity and conciseness.
It should be appreciated that reference throughout this specification to "one embodiment" or "an embodiment" means that a particular feature, structure or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, the appearances of the phrases "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
In various embodiments of the present invention, it should be understood that the sequence numbers of the following processes do not mean the execution sequence, and the execution sequence of each process should be determined by the function and the inherent logic of the process, and should not constitute any limitation to the implementation process of the embodiments of the present invention.
It should be understood that the term "and/or" herein is merely one type of association relationship that describes an associated object, meaning that three relationships may exist, e.g., a and/or B may mean: a exists alone, A and B exist simultaneously, and B exists alone. In addition, the character "/" herein generally indicates that the former and latter associated objects are in an "or" relationship.
In the embodiments provided herein, it should be understood that "B corresponding to a" means that B is associated with a from which B can be determined. It should also be understood that determining B from a does not mean determining B from a alone, but may also be determined from a and/or other information.
As shown in fig. 1, the present embodiment provides an etching machine with an automatic cup pouring function, which includes an etching machine main body, a cleaning tank 1, an etching tank 2, a basket moving mechanism 5, a basket mechanism 4, a tray moving mechanism 6, and a gripping mechanism 7; wherein, the cleaning tank 1 and the etching tank 2 are arranged in the etching main body side by side; the basket lifting mechanism 5 is arranged above the cleaning tank 1 and the corrosion tank 2, and the basket lifting mechanism 4 is arranged between the cleaning tank 1 and the corrosion tank 2 and the basket lifting mechanism 5 and is connected with the basket lifting mechanism 5; the material tray moving mechanism 6 is arranged on one side of the corrosion tank 2 or the cleaning tank 1; the grabbing mechanism 7 is arranged on the material tray moving mechanism 6; specifically, the etching bath 2 is used for etching the wafer; the cleaning tank 1 is used for cleaning the corroded wafer; the basket mechanism 4 is used for accommodating wafers to be corroded or cleaned to be corroded and cleaned in the corrosion tank 2 and the cleaning tank 1; the basket moving mechanism 5 is used for driving the basket mechanism 4 to move left and right, lift up and down and rotate in the cleaning tank 1 and the corrosion tank 2; the material tray moving mechanism 4 is used for driving the grabbing mechanism 7 to move; the grabbing mechanism 7 is used for grabbing a cup containing a wafer and pouring the wafer in the cup into the basket lifting mechanism 4.
Further, the etching machine main body is also provided with a control panel 8 and a liquid storage tank 3, wherein the liquid storage tank 3 is communicated with the etching tank 2 and is used for providing etching liquid for the etching tank 2; control panel 8 with washing tank 1, etch tank 2, hand-basket motion 5, hand-basket mechanism 4, charging tray motion 6, snatch mechanism 7 electricity and be connected for control washing tank 1, etch tank 2, hand-basket motion 5, hand-basket mechanism 4, charging tray motion 6, snatch mechanism 7 and move, realize full automatization.
Further, the control panel 8 is provided with a touch screen, various indicator lights, common buttons, a temperature controller and the like. The user sets the etching parameters by operating the panel, and performs various controls on the machine.
The structure and mechanism of action of the main components of the present invention will be further described below.
As shown in fig. 1, the cleaning tank 1 is cylindrical, the electromagnetic valve is arranged in the center of the bottom surface to control water inflow, the overflow port is arranged on the upper portion of the side surface, redundant water in the cleaning tank can flow out through the overflow port, further, a heater and two liquid level sensors are arranged in the cleaning tank 1, and a temperature controller is arranged outside the cleaning tank 1, so that the water temperature in the cleaning tank 1 is constant at a set temperature. In particular, the level sensor can ensure that the heater must heat up in the presence of water, ensuring that it does not burn empty. In addition, the edge of the cleaning tank is provided with four sprays, and the basket lifting mechanism 4 can be sprayed in the cleaning process, so that the cleaning effect of the wafer in the basket lifting mechanism 4 is ensured.
As shown in fig. 1, the etching bath 2 is cylindrical, and the etching bath 2 has the same size as the cleaning bath 1. Furthermore, a liquid inlet is arranged at the center of the bottom of the corrosion groove 2, a liquid return port is arranged beside the bottom, and a corrosion overflow port is arranged at the upper part of the side surface. Specifically, a flow regulating valve is arranged on a pipeline of the liquid return port, and the flow of the return liquid can be regulated. When the device works, corrosive liquid enters from the liquid inlet and flows back from the liquid return port, the liquid inlet speed is higher than that of the liquid return port, and redundant solution flows back from the upper overflow port.
Liquid storage tank
As shown in fig. 1, the liquid storage tank 3 is a rectangular tank for containing corrosive liquid. The top is equipped with circulating pump, filter equipment, a plurality of level sensor, heater. When the machine works, the circulating pump is started to inject the corrosive liquid into the corrosion tank through the filtering device. The heater is matched with an external temperature controller to keep the corrosive liquid at a set temperature. The liquid level sensor senses the liquid level height in the liquid storage tank, so that the control logic is realized, and the empty burning of the heater is avoided.
Tray movement mechanism
As shown in fig. 2, the tray moving mechanism 6 includes a lateral moving guide 231, a longitudinal moving guide 232, a tray 233, and a gripping mechanism 7, wherein the lateral moving guide 231 and the longitudinal moving guide 232 form an "L" shaped vertical structure, and the tray 233 is disposed on the longitudinal moving guide 232 and can move longitudinally on the longitudinal moving guide 232; the grabbing mechanism 7 is arranged on the transverse moving guide rail 231 and can transversely move on the transverse moving guide rail 231, and further, grooves for placing cups are formed in the tray 233, specifically, the grooves comprise grooves for horizontally placing 5 cups and grooves for longitudinally placing 8 cups, and the total number of the grooves for placing the cups is 40; so that the cup in the groove of the tray 233 can be grabbed by the cooperation of the tray 233 and the grabbing mechanism 7, and the wafer in the cup can be poured into the basket mechanism.
Further, the traverse guide 231 and the longitudinal guide 232 are both electrically driven guides, and the tray 233 and the grasping mechanism 7 can be controlled to perform a traverse displacement or a longitudinal displacement on the traverse guide 231 and the longitudinal guide 232.
As shown in fig. 3, the grasping mechanism 7 includes; the sliding device comprises a sliding part 234, a lifting cylinder 235, a fixing plate 236 and a rotating cylinder 237, wherein the sliding part 234 is slidably connected with the transverse moving guide rail 231, the output end of the lifting cylinder 235 is fixedly connected with the sliding part 234, the fixing plate 236 is fixedly connected with the lifting cylinder 235, so that the sliding part 234 is slidably connected with the transverse moving guide rail 231, the sliding part 234 can slide transversely on the transverse moving guide rail 231, meanwhile, the fixing plate 236 is fixedly connected with the lifting cylinder 235, the output shaft of the lifting cylinder 235 is fixedly connected with the sliding part 234, and the fixing plate 236 is driven to lift on the sliding part 234 by the lifting of the lifting cylinder 235; specifically, as shown in fig. 3, the fixing plate 236 is formed in a 7-shaped structure by a transverse plate and a longitudinal plate, and the elevating cylinder 235 is fixed to the transverse plate.
As further shown in fig. 3, the rotating cylinder 237 is fixedly disposed on the fixed plate 236, and in particular, the rotating cylinder 237 is fixed on a longitudinal plate,
further, the output end of the rotating cylinder 237 is fixedly connected with a rotating bottom plate 238, and the rotating bottom plate 238 can be driven to rotate synchronously by the rotation of the rotating cylinder 235; the rotating base plate 238 is provided with a first linear ball guide 239 and a second linear ball guide 240 which are symmetrical, the first linear ball guide 239 is provided with a first jaw arm 241, the second linear ball guide 240 is provided with a second jaw arm 242, and specifically, the length of the first jaw arm 241 is smaller than that of the second jaw arm 242.
Furthermore, a first clamping jaw 243 is fixedly arranged at one end, away from the first linear ball guide rail 239, of the first clamping jaw arm 241, and a second clamping jaw 244 which is matched with the first clamping jaw 243 to grab the cup is fixedly arranged at one end, away from the second linear ball guide rail 240, of the second clamping jaw arm 242, so that the cup can be taken and placed by the fact that the length of the first clamping jaw arm 241 is smaller than that of the second clamping jaw arm 242 and the matching of the first clamping jaw 243 and the second clamping jaw 244.
Further, a gear 245 is arranged between the first linear ball guide 239 and the second linear ball guide 240, and racks meshed with the gear 245 are respectively arranged at corresponding ends of the first jaw arm 241 and the second jaw arm 242; the rotating base plate 238 is further provided with a driving device 246 for driving the gear 245 to rotate, so that the gear 245 is driven to rotate forward and backward by the operation of the driving device 246, and the first clamping jaw arm 241 and the second clamping jaw arm 242 move relatively to realize the cup taking and placing.
Preferably, the driving means 246 includes an electric motor, a cylinder, a hydraulic pressure, etc.
Basket movement mechanism
As shown in fig. 4, the basket moving mechanism includes a horizontal linear ball guide 101, a Z-axis installation transverse plate 102, a Z-axis vertical plate 103, a vertical linear ball guide 104, a vertical ball screw 105, a lifting transverse plate 106, and a rodless cylinder 112, wherein the Z-axis installation transverse plate 102 is arranged on the horizontal linear ball guide 101, and the rodless cylinder 112 drives the Z-axis installation transverse plate 102 to move transversely on the horizontal linear ball guide 101;
the Z-axis vertical plate 103 is vertically arranged on the Z-axis installation transverse plate 102, the number of the vertical linear ball guide rails 104 is two, the two vertical linear ball guide rails 104 are arranged at two ends of the surface of the Z-axis vertical plate 103, the vertical ball screw 105 is arranged on the surface of the Z-axis vertical plate 103 and is located between the two vertical linear ball guide rails 104, two ends of the lifting transverse plate 106 are slidably connected with the vertical linear ball guide rails 104 at two ends of the surface of the Z-axis vertical plate 103, and meanwhile, the lifting transverse plate 106 is movably connected with the vertical ball screw 105, so that the lifting transverse plate 106 can be driven to lift on the Z-axis vertical plate 103 through the operation of the vertical ball screw 105.
Further, a bearing seat 107 and a stepping motor 108 are arranged on the lifting transverse plate 106, wherein a moving upright column 109 is fixedly arranged on the bearing seat 107, one end of the moving upright column 109 is fixedly provided with a synchronizing wheel 110, and the synchronizing wheel 110 is fixedly connected with an output shaft of the stepping motor 108 through a synchronizing belt 111 in a transmission manner; further, one end of the moving upright 109, which is far away from the synchronizing wheel 110, passes through the lifting cross plate 106 and the Z-axis mounting cross plate 102 and extends towards the cleaning tank 1 or the etching tank 2; so that the moving column 109 can be rotated by the operation of the stepping motor 108.
As shown in fig. 5, the basket lifting mechanism includes a basket fixing plate 120, a basket 121, a basket pressing claw 122, a spring fixing ring 123 and a pressing spring 124, wherein the basket fixing plate 120 is fixedly connected to the moving upright 109, the basket 121 is disposed on the basket fixing plate 120, the basket pressing claw 122, the pressing spring 124 and the spring fixing ring 123 are all sleeved on the moving upright 109, and the pressing spring 124 is disposed between the basket pressing claw 122 and the spring fixing ring 123, specifically, the number of the baskets 121 is four, the four baskets 121 are uniformly disposed on the basket fixing plate 120, and the basket pressing claw 122 is capable of better fixing the basket 121 on the basket fixing plate 120 through the stress of the pressing spring 124 and the spring fixing ring 123.
Further, the basket pressing claw 122 is sleeved on the moving upright column 109 and can freely move up and down and rotate on the moving upright column 109, and the movement of the basket pressing claw 122 on the moving upright column 109 can be limited through the action of the pressing spring 124 and the spring fixing ring 123.
The working principle of the invention is as follows:
step one, when a wafer needs to be corroded, a user places four corrosion baskets 121 on a basket fixing plate 120, fixes the baskets 121 on the basket fixing plate 120 through basket pressing claws 122, places the wafer needing to be corroded in a cup, places the cup in a groove in a tray 233, sets a cup pouring interval, corrosion time and cleaning time of a first cup on a touch screen of a control panel 2, and clicks to start pouring corrosion;
step two, the tray moving mechanism and the grabbing mechanism operate, firstly, the grabbing mechanism and the tray 233 move to enable the tray 233 to be located below the grabbing mechanism, then the fixed plate operates through the lifting cylinder 235 to enable the rotating bottom plate 238 to descend, then the driving device 246 on the rotating bottom plate 238 operates to control the first clamping jaw 243 and the second clamping jaw 244 on the first clamping jaw arm 241 and the second clamping jaw arm 242 to clamp the cup, after the cup is clamped, the lifting cylinder 235 drives the rotating bottom plate 238 to ascend, then the rotating bottom plate 238 is driven to move to the upper side of the lifting basket 121 through the transverse moving guide rail 231, meanwhile, the lifting basket 121 moves upwards to a higher position close to the cup, and the rotating cylinder 237 rotates 180 degrees to enable the wafer in the cup to be poured into the lifting basket 121; finally, the grabbing mechanism executes the opposite action to place the cup in the original position;
and step three, after the basket 121 in the basket mechanism receives the wafer, the basket 121 is rotated through the basket moving mechanism, so that the second, third and fourth baskets receive the wafer, the material tray moving mechanism repeats the step two until the wafers are all placed in the four baskets 121 in the basket mechanism, the basket mechanism enables the baskets 121 to enter the corrosion tank 2 through the basket moving mechanism to be corroded, after the corrosion is completed, the baskets 121 ascend through the operation of the basket moving mechanism and move leftwards to the upper part of the cleaning tank 1, then the basket moving mechanism operates to enable the baskets 121 to descend to enter the cleaning tank 1, meanwhile, the spraying on the upper part of the cleaning tank 1 starts, the basket moving mechanism starts up and down throwing and rotating to shake, and the cleaning time set by a user is completed.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, and not to limit it; although the technical solutions of the present invention have been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that the technical solutions described in the foregoing embodiments may be modified or some technical features may be equally replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (8)

1. The utility model provides an etching machine with automatic cup function that falls which characterized in that: the corrosion device comprises a corrosion machine main body, wherein a washing tank (1) and a corrosion tank (2) are arranged in the corrosion machine main body side by side, a basket moving mechanism (5) is arranged above the washing tank (1) and the corrosion tank (2), and a basket mechanism (4) facing the washing tank (1) and the corrosion tank (2) is arranged on the basket moving mechanism (5); a material tray moving mechanism (6) is arranged on one side of the corrosion tank (2) or the cleaning tank (1), and a grabbing mechanism (7) is arranged on the material tray moving mechanism (6); the tray moving mechanism (6) comprises a transverse moving guide rail (231) and a longitudinal moving guide rail (232), and the grabbing mechanism (7) is arranged on the transverse moving guide rail (231) and can make transverse displacement on the transverse moving guide rail (231); the gripping mechanism (7) comprises; the sliding device comprises a sliding part (234), a lifting cylinder (235), a fixed plate (236) and a rotating cylinder (237), wherein the sliding part (234) is connected with the transverse moving guide rail (231) in a sliding mode, the output end of the lifting cylinder (235) is fixedly connected with the sliding part (234), the fixed plate (236) is fixedly connected with the lifting cylinder (235), and the rotating cylinder (237) is fixedly arranged on the fixed plate (236);
the output end of the rotating cylinder (237) is fixedly connected with a rotating bottom plate (238), the rotating bottom plate (238) is provided with a first linear ball guide rail (239) and a second linear ball guide rail (240) which are symmetrical, the first linear ball guide rail (239) is provided with a first clamping claw arm (241), the second linear ball guide rail (240) is provided with a second clamping claw arm (242), one end, away from the first linear ball guide rail (239), of the first clamping claw arm (241) is fixedly provided with a first clamping claw (243), and one end, away from the second linear ball guide rail (240), of the second clamping claw arm (242) is fixedly provided with a second clamping claw (244) which is matched with the first clamping claw (243) to grab a cup.
2. The etching machine with the automatic cup pouring function according to claim 1, wherein: still be provided with control panel (8) and reservoir (3) on the etching machine main part, reservoir (3) with etch tank (2) intercommunication, control panel (8) with washing tank (1), etch tank (2), hand-basket motion (5), hand-basket mechanism (4), charging tray motion (6), snatch mechanism (7) electricity and connect.
3. The etching machine with the automatic cup pouring function according to claim 1, wherein: the basket moving mechanism (5) comprises a transverse linear ball guide rail (101), a Z-axis mounting transverse plate (102) arranged on the transverse linear ball guide rail (101), a rodless cylinder (112) driving the Z-axis mounting transverse plate (102) to move linearly, a Z-axis vertical plate (103) arranged on the Z-axis mounting transverse plate (102), a vertical linear ball guide rail (104) and a vertical ball screw (105) arranged on the Z-axis vertical plate (103), and a lifting transverse plate (106) arranged on the vertical linear ball guide rail (104) and the vertical ball screw (105).
4. The etching machine with automatic cup-pouring function according to claim 3, characterized in that: be provided with bearing frame (107) and step motor (108) on lift diaphragm (106), wherein, fixed motion stand (109) that is provided with on bearing frame (107), motion stand (109) one end is fixed and is provided with synchronizing wheel (110), synchronizing wheel (110) through hold-in range (111) with step motor (108) output shaft fixed transmission is connected.
5. The etching machine with automatic cup-pouring function according to claim 4, characterized in that: one end of the moving upright post (109) far away from the synchronizing wheel (110) penetrates through a lifting transverse plate (106) and a Z-axis mounting transverse plate (102) and extends towards the direction of the cleaning tank (1) or the corrosion tank (2).
6. The etching machine with the automatic cup pouring function according to claim 5, wherein: the basket lifting mechanism (4) comprises a basket fixing plate (120) fixedly connected with the moving upright post (109), a basket (121) arranged on the basket fixing plate (120) and a basket pressing claw (122) sleeved on the moving upright post (109).
7. The etching machine with automatic cup-pouring function according to claim 1, characterized in that: the tray (233) capable of longitudinally moving on the longitudinal moving guide rail (232) is arranged on the longitudinal moving guide rail (232), and a groove for placing a cup is formed in the tray (233).
8. The etching machine with the automatic cup pouring function according to claim 7, wherein: a gear (245) is arranged between the first linear ball guide rail (239) and the second linear ball guide rail (240), and racks meshed with the gear (245) are respectively arranged at the corresponding ends of the first clamping jaw arm (241) and the second clamping jaw arm (242); the rotating bottom plate (238) is also provided with a driving device (246) for driving the gear (245) to rotate.
CN202111353547.6A 2021-11-16 2021-11-16 Corrosion machine with automatic cup pouring function Active CN113957542B (en)

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CN114628268B (en) * 2022-05-12 2022-07-29 广东气派科技有限公司 Overtime-proof chip product corrosion ball inspection process

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JP2000188316A (en) * 1998-12-24 2000-07-04 Hitachi Ltd Method and device for conveyance and manufacture of semiconductor device using the same
CN101532180A (en) * 2009-03-11 2009-09-16 南京德研电子有限公司 Method for frequency corrosion of wafers and equipment thereof
CN201990731U (en) * 2011-01-17 2011-09-28 江阴市江海光伏科技有限公司 Chip frequency corrosion and cleaning device
CN202159647U (en) * 2011-06-13 2012-03-07 湖北致源电子股份有限公司 Wafer etching device

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