CN211403122U - Resistance strain gauge developing automation mechanism and resistance strain gauge developing automation device - Google Patents
Resistance strain gauge developing automation mechanism and resistance strain gauge developing automation device Download PDFInfo
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- CN211403122U CN211403122U CN202020224810.6U CN202020224810U CN211403122U CN 211403122 U CN211403122 U CN 211403122U CN 202020224810 U CN202020224810 U CN 202020224810U CN 211403122 U CN211403122 U CN 211403122U
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Abstract
The utility model relates to a foil formula resistance strain gauge develops production manufacturing method and technology, especially relates to a resistance strain gauge development automated mechanism and resistance strain gauge development automation equipment that can effectively improve machining efficiency and ensure the processing quality. The automatic resistance strain gauge developing device comprises a rack and at least two groups of developing mechanisms, wherein each group of developing mechanism is provided with a resistance strain gauge developing automatic mechanism. The automatic resistance strain gauge developing mechanism comprises a developing solution tank, a cleaning tank and a lifting basket, wherein the developing solution tank is arranged in a water bath pot; the cleaning groove is provided with a water level controller and a water groove of an anti-overflow drain pipe, and the water level controller and the anti-overflow drain pipe have a height difference; a shaking cylinder is arranged above the lifting basket, the lifting basket is driven by a double-axial mechanical arm and works between the developing solution tank and the cleaning tank. The utility model discloses utilize the manual work among the mechanical equipment operation replacement traditional handicraft, labour saving and time saving to practice thrift the water.
Description
Technical Field
The utility model relates to a foil formula resistance strain gauge develops production manufacturing method and technology, especially relates to a resistance strain gauge development automated mechanism and resistance strain gauge development automation equipment that can effectively improve machining efficiency and ensure the processing quality.
Background
The developing process of the resistance strain gauge comprises the steps of coating photoresist on the surface of a metal foil by utilizing the photosensitive characteristic of the photoresist, transferring the pattern of a mask plate into the photoresist by ultraviolet light sensitization, carrying out developing and fixing on the photoresist to form the required pattern of the resistance strain gauge, removing the rest photoresist by adopting 8-12% sodium hydroxide solution as developing solution, and exposing the foil so as to be convenient for corrosion.
The existing traditional developing mode is adopted for processing, the traditional developing mode is developed by manually moving, soaking, the developing time is manually controlled, the production process is backward, time and labor are consumed, the working efficiency is low, and the quality is difficult to control.
SUMMERY OF THE UTILITY MODEL
The utility model provides a problem be how to promote the work efficiency and the processingquality of the development processing of resistance strain gauge.
In order to solve the above problem, the utility model provides a technical scheme of resistance foil gage development automated mechanism, it includes developing solution groove, washing tank and hand-basket, wherein:
the developing solution tank is arranged in a water bath pot;
the cleaning tank is a water tank provided with a water level controller and an anti-overflow drain pipe, and the water level controller and the anti-overflow drain pipe have a height difference;
and a shaking cylinder is arranged above the lifting basket, is driven by a double-axial mechanical arm and works between the developing solution tank and the cleaning tank.
Further preferred is: two axial arms include X axial subassembly, Y axial subassembly and armed lever, wherein:
the X-axis assembly comprises an X-axis slide rail and an X-axis cylinder, and the Y-axis assembly comprises a Y-axis slide rail and a Y-axis cylinder;
the lower end of the arm rod is connected with the shaking cylinder through a connecting disc, the upper end of the arm rod is connected to the Y-axis sliding rail in a sliding mode, the Y-axis cylinder drives the arm rod to move up and down along the Y-axis sliding rail, and the Y-axis sliding rail is vertically arranged on a displacement linkage frame;
the X axial slide rail is transversely arranged and erected, and the displacement linkage frame is driven by the X axial cylinder to slide on the X axial slide rail.
Further preferred is: the developing solution tank and the cleaning tank are arranged adjacently and are located below the X-axis sliding rail.
Further preferred is: the cleaning tank is an open slot with a water containing cavity, the water level controller and the anti-overflow drain pipe are respectively arranged on the outer side wall of the cleaning tank, and the anti-overflow drain pipe is communicated with the water containing cavity of the cleaning tank.
Further preferred is: and a high-precision temperature controller and a circulating water pump are arranged in the water bath.
The automatic developing device for the resistance strain gauges comprises a rack and at least two groups of developing mechanisms, wherein each group of developing mechanisms is the automatic developing mechanism for the resistance strain gauges.
Further preferred is: the two groups of developing mechanisms are symmetrically arranged and are arranged on the rack.
Further preferred is: the frame is an aluminum profile frame.
Compared with the prior art, the utility model has the advantages of it is following:
the utility model uses mechanical equipment to replace manual operation in the traditional process, in particular to use mechanical arms to drive a basket for placing products to be processed to be developed between the cleaning tank and the developing solution, thereby saving time and labor and saving water compared with the former manual washing method; in addition, this novel resistance strain gauge development automation equipment has the duplex position design at least, and easy operation is convenient, and the technological requirement is accurate to accuse to reduce intensity of labour, improve work efficiency, the maintenance cost is low.
Drawings
Fig. 1 is a perspective view of the embodiment of the present invention;
FIG. 2 is a front view of FIG. 1;
FIG. 3 is a side view of FIG. 2;
fig. 4 is a top view of fig. 2.
Detailed Description
The existing traditional developing mode is adopted for processing, the traditional developing mode is developed by manually moving, soaking, the developing time is manually controlled, the production process is backward, time and labor are consumed, the working efficiency is low, and the quality is difficult to control.
The inventor aims at the technical problems and continuously researches and discovers a technical scheme of an automatic resistance strain gauge developing mechanism through analyzing reasons, wherein the automatic resistance strain gauge developing mechanism comprises a developing solution tank, a cleaning tank and a lifting basket, and the technical scheme comprises the following steps:
the developing solution tank is arranged in a water bath pot;
the cleaning tank is a water tank provided with a water level controller and an anti-overflow drain pipe, and the water level controller and the anti-overflow drain pipe have a height difference;
and a shaking cylinder is arranged above the lifting basket, is driven by a double-axial mechanical arm and works between the developing solution tank and the cleaning tank.
By adopting the technical scheme, the manual operation in the traditional process is replaced by the operation of mechanical equipment, and particularly, the mechanical arm is used for driving the lifting basket for placing the product to be processed to be arranged between the cleaning tank and the developing solution for developing processing, so that the technical problem in the prior art is solved.
The following detailed description of the embodiments of the present invention will be made with reference to the accompanying drawings.
Example (b):
as shown in fig. 1, an automated developing device for resistance strain gauges includes a frame 1 and at least two developing mechanisms a.
The number of the developing mechanisms A can be set according to the product to be processed and the space of the processing factory building, and two groups of developing mechanisms A are specifically illustrated in the embodiment by taking the two groups of developing mechanisms A as examples, so that the corresponding automatic device of the resistance strain gauge obtains two processing stations in the embodiment.
Preferably: referring to fig. 1 and 2, two groups of the developing mechanisms a are symmetrically arranged and mounted on the frame 1; and each group of the developing mechanism A is a resistance strain gauge developing automatic mechanism.
As shown in fig. 1 to 3, the frame 1 is an aluminum frame. Specifically, the method comprises the following steps: the frame 1 is a frame type frame body, so that the operation, the monitoring, the maintenance and the repair are convenient, and the cost is reduced; in addition, the frame 1 in this embodiment is a frame body on which two sets of the developing mechanisms can be symmetrically installed, and the material of the frame 1 is preferably an aluminum profile.
As shown in fig. 1 and 2, the automatic resistance strain gauge developing mechanism includes a developing solution tank 2, a cleaning tank 3 and a basket 4, wherein the developing solution tank 2 is disposed in a water bath 5, and the water bath 5 and the cleaning tank 3 are disposed at intervals and are both mounted on a working platform of the frame 1; two cleaning tanks 3 in the two groups of resistance strain gauge developing automation mechanisms are arranged in parallel and are arranged closely.
As shown in fig. 1, the water bath 5 in each resistance strain gauge developing automation mechanism is a super water bath, and a high-precision temperature controller (not shown) and a circulating water pump (not shown) are installed inside the super water bath, so that the temperature of the developing solution in the developing solution tank 2 can be controlled to be ± 0.5 ℃, and a constant-temperature developing process effect can be realized; the super water bath kettle adopted in the embodiment has a high-stability operational amplifier and a double-integral high-precision A/D conversion technology, is provided with a water pump for internal circulation, has the characteristics of small temperature fluctuation, good uniformity and the like, and creates excellent conditions for the requirement of high-precision temperature of the developing solution.
As shown in fig. 1, in each resistance strain gauge developing automation mechanism, the cleaning tank 3 is a water tank 32 provided with a water level controller 31 and an anti-overflow drain pipe, and the water level controller 31 and the anti-overflow drain pipe 32 have a height difference; the cleaning tank 3 is an open slot with a water containing cavity, clear water is filled into the open slot, the water level controller 31 and the anti-overflow drain pipe 32 are respectively arranged on the outer side wall of the cleaning tank 3, the anti-overflow drain pipe 32 is a C-shaped pipe, and two ends of the anti-overflow drain pipe are respectively connected with the side wall and the bottom surface of the cleaning tank 3 to realize the communication with the inner cavity of the cleaning tank 3.
As shown in fig. 1 and 2, in each automated resistance strain gauge developing mechanism, the basket 4 is a structure provided with multiple positioning stations, a shaking cylinder 6 is installed at the upper end of the basket to cooperate with shaking of the basket, and a connecting disc is installed above the shaking cylinder 6, and the connecting disc may be a flange or other structures.
As shown in fig. 1 to 4, a dual-axis mechanical arm is connected to the upper end of the connecting pad, so that the basket is driven by the dual-axis mechanical arm to operate between the developer tank 2 and the cleaning tank 3, thereby realizing the development operation of the strain gauge in each positioning station of the basket 4.
Two axial arm includes X axial component 7, Y axial component and armed lever 9, wherein:
the X-axis assembly 7 comprises an X-axis slide rail 71 and an X-axis cylinder 72, and the Y-axis assembly comprises a Y-axis slide rail and a Y-axis cylinder 8;
the lower end of the arm rod 9 is connected with the shaking cylinder 6 through a connecting disc, the upper end of the arm rod 9 is connected to the Y-axis sliding rail in a sliding mode, the Y-axis cylinder 8 drives the arm rod to move up and down along the Y-axis sliding rail, and the Y-axis sliding rail is vertically arranged on a displacement linkage frame 10;
the X-axis sliding rail 71 is transversely arranged and erected, and the displacement linkage frame 10 is driven by the X-axis cylinder to slide on the X-axis sliding rail.
Specifically, the method comprises the following steps: referring to fig. 1 to 4, an X-axis slide rail 71 of each biaxial mechanical arm is mounted at the top end of the frame 1 and horizontally disposed, and an X-axis cylinder 72 drives the upper end of the displacement linkage frame 10 to slide back and forth along the X-axis slide rail 71, so that the basket 4 is horizontally disposed between the cleaning tank 3 and the developer tank 2; the Y-axis slide rail is arranged on the displacement linkage frame 10 along the vertical direction and is matched with the Y-axis cylinder 8 to realize lifting matching so as to drive the lifting basket to lift in the cleaning tank 3 or the developing solution tank 2; and finally, a shaking cylinder 6 arranged on the basket 4 is matched to drive the basket to shake.
In order to achieve the purpose of full automation, the automatic development device for the resistance strain gauge further comprises a control console or a control box (not shown) with a control panel, wherein the control console and the control box are electrically connected with the X, Y axial cylinder and are also electrically connected with the water bath kettle and the cleaning tank;
furthermore, the novel method specifically operates as follows:
1. before the equipment runs, setting the temperature of the super water bath 5 according to the development parameter requirement of a control console or a control box, and starting the internal circulation of water pumps in the water baths until the developing solution reaches the required working temperature;
2. setting parameters such as corresponding developing time, water filtering waiting time, shaking times and the like on a human-computer interface (control panel) according to different strain gauge models;
3. the strain gauge product to be developed is vertically placed in each positioning station on the basket 4, and is moved into a hanging groove on the shaking cylinder 6 through a handle of the basket 4, so that the basket 4 is connected with the shaking cylinder 5;
4. after the start button is pressed by hand, as shown in fig. 1, the X-axis cylinder 72 is controlled to drive the product to move to the position of the developing solution tank 2 along the X-axis slide rail 71, the basket is placed into the developing solution tank 2 along the Y-axis slide rail through the Y-axis cylinder 8 for developing, the shaking cylinder 6 shakes up and down according to parameter setting, part of residual photoresist is removed during developing, after the developing time is finished, the Y-axis cylinder 8 and the shaking cylinder 6 rise and wait for water filtration, then the X-axis cylinder 72 moves to the position above the automatic water replenishing rinse tank 3, the basket is placed into the rinse tank 3 through the Y-axis cylinder 8 and the shaking cylinder 6, and the shaking cylinder 6 is started to move up and down to improve the rinsing effect;
6. the washing tank 3 with automatic water replenishing has water level drop due to the consumption of washing water or the water entering the lifting basket, the washing water can discharge sewage through the anti-overflow drain pipe 32, and clean water is added through the water level controller 31; after the cleaning is finished, the Y-axis air cylinder 8 and the shaking air cylinder 6 ascend, water filtering waiting is carried out, and an operator can wait for taking down the hanging basket from the hanging groove to the next corrosion process.
After the strain gauge is matched with a control console or a control box, an operator only needs to insert a strain gauge needing to be developed into the lifting basket, and the strain gauge can be automatically operated according to the set parameter control equipment after one-key starting, so that the whole process of strain gauge development is completed.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to limit the present invention, and those skilled in the art can make modifications and changes without departing from the spirit and scope of the present invention.
Claims (8)
1. Resistance foil gage development automated mechanism, its characterized in that: it includes developing solution groove, washing tank and hand-basket, wherein:
the developing solution tank is arranged in a water bath pot;
the cleaning tank is a water tank provided with a water level controller and an anti-overflow drain pipe, and the water level controller and the anti-overflow drain pipe have a height difference;
and a shaking cylinder is arranged above the lifting basket, is driven by a double-axial mechanical arm and works between the developing solution tank and the cleaning tank.
2. The automated resistive strain gage development mechanism of claim 1, wherein: two axial arms include X axial subassembly, Y axial subassembly and armed lever, wherein:
the X-axis assembly comprises an X-axis slide rail and an X-axis cylinder, and the Y-axis assembly comprises a Y-axis slide rail and a Y-axis cylinder;
the lower end of the arm rod is connected with the shaking cylinder through a connecting disc, the upper end of the arm rod is connected to the Y-axis sliding rail in a sliding mode, the Y-axis cylinder drives the arm rod to move up and down along the Y-axis sliding rail, and the Y-axis sliding rail is vertically arranged on a displacement linkage frame;
the X axial slide rail is transversely arranged and erected, and the displacement linkage frame is driven by the X axial cylinder to slide on the X axial slide rail.
3. The automated resistive strain gage development mechanism of claim 2, wherein: the developing solution tank and the cleaning tank are arranged adjacently and are located below the X-axis sliding rail.
4. The automated resistive strain gage development mechanism of claim 1, wherein: the cleaning tank is an open slot with a water containing cavity, the water level controller and the anti-overflow drain pipe are respectively arranged on the outer side wall of the cleaning tank, and the anti-overflow drain pipe is communicated with the water containing cavity of the cleaning tank.
5. The automated resistive strain gage development mechanism of claim 1, wherein: and a high-precision temperature controller and a circulating water pump are arranged in the water bath.
6. Resistance foil gage development automation equipment, its characterized in that: the automatic developing mechanism comprises a frame and at least two groups of developing mechanisms, wherein each group of developing mechanisms is the automatic developing mechanism for the resistance strain gauges according to any one of claims 1-5.
7. The automated resistive strain gage development apparatus of claim 6, wherein: the two groups of developing mechanisms are symmetrically arranged and are arranged on the rack.
8. The automated resistive strain gauge developing device according to claim 6 or 7, wherein: the frame is an aluminum profile frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020224810.6U CN211403122U (en) | 2020-02-28 | 2020-02-28 | Resistance strain gauge developing automation mechanism and resistance strain gauge developing automation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020224810.6U CN211403122U (en) | 2020-02-28 | 2020-02-28 | Resistance strain gauge developing automation mechanism and resistance strain gauge developing automation device |
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| Publication Number | Publication Date |
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| CN211403122U true CN211403122U (en) | 2020-09-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202020224810.6U Active CN211403122U (en) | 2020-02-28 | 2020-02-28 | Resistance strain gauge developing automation mechanism and resistance strain gauge developing automation device |
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| CN (1) | CN211403122U (en) |
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