CN113649348A - Cleaning system for special-shaped semiconductor parts - Google Patents
Cleaning system for special-shaped semiconductor parts Download PDFInfo
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- CN113649348A CN113649348A CN202110987113.5A CN202110987113A CN113649348A CN 113649348 A CN113649348 A CN 113649348A CN 202110987113 A CN202110987113 A CN 202110987113A CN 113649348 A CN113649348 A CN 113649348A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 75
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 230000007246 mechanism Effects 0.000 claims abstract description 91
- 238000007599 discharging Methods 0.000 claims abstract description 34
- 238000002791 soaking Methods 0.000 claims abstract description 21
- 238000010926 purge Methods 0.000 claims abstract description 14
- 230000001360 synchronised effect Effects 0.000 claims description 4
- 238000007664 blowing Methods 0.000 description 10
- 239000007788 liquid Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 206010066054 Dysmorphism Diseases 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 210000003141 lower extremity Anatomy 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/044—Cleaning involving contact with liquid using agitated containers in which the liquid and articles or material are placed
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/14—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects using gases or vapours other than air or steam, e.g. inert gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Robotics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention provides a cleaning system for a special-shaped semiconductor part, which comprises a bearing frame, cleaning equipment and a manipulator, wherein the bearing frame is used for placing a plurality of special-shaped semiconductor parts; the cleaning equipment comprises a shell, a cleaning platform, a plurality of soaking grooves, a plurality of purging mechanisms, a feeding mechanism and a discharging mechanism, wherein the cleaning platform is fixed inside the shell, the length direction of the cleaning platform is consistent with the horizontal axial direction of the shell, the shell comprises a left side wall and a right side wall, the connecting line of the left side wall and the right side wall is perpendicular to the length direction of the cleaning platform, the cleaning platform is sequentially provided with the feeding mechanism, the soaking grooves, the purging mechanisms and the discharging mechanism in an one-to-one alternating mode, a feeding hole and a discharging hole are formed in the left side wall, the position of the feeding hole corresponds to the position of the feeding mechanism, and the position of the discharging hole corresponds to the position of the discharging mechanism.
Description
Technical Field
The invention belongs to the technical field of part cleaning, and particularly relates to a cleaning system for a special-shaped semiconductor part.
Background
The integrated circuit industry is the basis of information network technology and microelectronic technology which are developed in the future since the 20 th century, is a core technology which influences the daily life of people and various industries and is closely related to the daily life of people. From the current mobile phone and computer network which people can not live at present to the research and development of various vehicles, almost every industry can not develop related special electronic elements and semiconductor industries, and the special-shaped electronic elements are deeply buried in the aspect of life and play more and more important roles along with the development of social industry technology.
The special-shaped electronic element is the core and main body of special industry, and is the foundation for accelerating the development and creation of semiconductor integrated circuit industry. The cleaning effect of the special workpiece determines the qualification of the workpiece, so that the requirements for effective cleaning of the surface of the special workpiece and the internal gap are quite high. With the continuous development of the technology of special-shaped workpieces, the effective cleaning of the surfaces and gaps of the workpieces without chemical reagent or water stain is an increasingly important subject, and the traditional tank body cleaning method cannot effectively clean the narrow space between the gaps of the special-shaped workpieces.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a cleaning system for a special-shaped semiconductor piece, which solves the problems that the existing cleaning equipment for the special-shaped semiconductor piece can not effectively clean the surface and the gap of a workpiece and chemical reagents or water agents are remained.
The invention provides a cleaning system for a special-shaped semiconductor part, which comprises a bearing frame, cleaning equipment and a manipulator, wherein the bearing frame is used for placing a plurality of special-shaped semiconductor parts; the cleaning equipment comprises a shell, a cleaning platform, a plurality of soaking grooves, a plurality of purging mechanisms, a feeding mechanism and a discharging mechanism, wherein the cleaning platform is fixed inside the shell, the length direction of the cleaning platform is consistent with the horizontal axial direction of the shell, the shell comprises a left side wall and a right side wall, the connecting line of the left side wall and the right side wall is perpendicular to the length direction of the cleaning platform, the cleaning platform is sequentially provided with the feeding mechanism, the soaking grooves, the purging mechanisms and the discharging mechanism which are alternately arranged one by one, a feeding hole and a discharging hole are formed in the left side wall, the position of the feeding hole corresponds to the position of the feeding mechanism, and the position of the discharging hole corresponds to the position of the discharging mechanism; the manipulator includes execution structure and supporting part, feed mechanism can be inside and outside reciprocating sliding of feed inlet relatively, bear the frame and can place on the feed mechanism who slides outside the feed inlet, make feed mechanism will bear the frame and send into, execution structure can grasp bears the frame, supporting part horizontal sliding connection is inside the shell, make the manipulator can be along cleaning platform's length direction horizontal migration, make bear the frame in proper order through the soaking groove that sets up in turn and sweep the mechanism and carry out the operation, execution structure sliding connection is on the supporting part, make execution structure oscilaltion, make things convenient for execution structure to grasp to bear the frame, and make things convenient for the carrier to bear the frame and soak the groove and sweep the position switching between the mechanism, discharge mechanism can be inside and outside reciprocating sliding of discharge gate relatively, bear the frame and can place on discharge mechanism, make discharge mechanism will bear the frame and send out.
Further, bear the frame including the splint, be equipped with two rows of circular through-holes about being equipped with on the splint, go up the upper edge of going up every circular through-hole and splint and all communicate one and go up the breach, the lower limb of going down every circular through-hole and splint all communicates one lower breach, and the splint have elasticity, the width of going up breach and lower breach is less than the diameter of circular through-hole, the diameter of dysmorphism piece equals the diameter of circular through-hole, in the circular through-hole of going up the row can be put into to the breach from last breach, in the circular through-hole of going down can be put into from lower breach to the dysmorphism piece.
Further, the executing structure comprises a vertical sliding table, a fixed beam, a first external plate, a second external plate, a first hook, a second hook, a rotating motor, a shaking mechanism, a rotating shaft, a driving chain wheel, a driven chain wheel, an annular chain, a driving gear and a driven gear, wherein one end of the fixed beam is fixed at one end of the sliding table, the fixed beam is vertical to the axial direction of the sliding table, the axial direction of the sliding table is consistent with the axial direction of the supporting part, the sliding table can move in the axial direction of the supporting part, a machine body of the rotating motor is fixed on the sliding table, the top ends of the first external plate and the second external plate are respectively fixed at the two ends of the fixed beam, the output shaft of the rotating motor is coaxially connected with the rotating shaft, the free end of the rotating shaft extends out of the first external plate, the driving chain wheel is fixed at the free end, the bottom end of the first external plate is provided with the driven chain wheel, and the driven chain wheel and the driving chain wheel are sleeved together by the annular chain, the driven chain wheel is coaxially connected with a driving gear, two ends of the bearing frame are respectively fixedly provided with a connecting shaft, the first hook and the second hook are respectively connected to the first external plate and the second external plate in a sliding mode, the two connecting shafts are hung on hook portions of the first hook and the second hook, a driven gear is fixed on the connecting shaft close to the first external plate and meshed with the driving gear, the shaking mechanism is fixed between the first external plate and the second external plate, and the top ends of the first hook and the second hook are connected with the shaking mechanism.
Further, a first lead screw is fixed on the supporting portion, a fixed fixing frame is fixed at the bottom of the supporting portion, the first lead screw is close to the bottom part and rotates to be hung on the right side of the fixing frame, a lifting motor is fixed on the left side of the fixing frame, a driving belt wheel is fixed on an output shaft of the lifting motor, a driven belt wheel is fixed at the bottom of the first lead screw, the driving belt wheel and the driven belt wheel are sleeved by an annular synchronous belt together, a sliding block structure is fixed on one side, opposite to the supporting portion, of the sliding table, the sliding block structure is sleeved on the first lead screw, the sliding block structure can slide along the axial direction of the first lead screw, and a first guide structure is further arranged between the supporting portion and the sliding table.
Furthermore, a horizontal movement motor and an axle seat are respectively fixed on the front side and the rear side of the cleaning equipment, a second screw rod is connected between an output shaft of the horizontal movement motor and the axle seat, a ball nut is fixed on one side of the supporting part, which deviates from the sliding table, the ball nut is sleeved on the second screw rod, and a second guide structure is arranged between the supporting part and the cleaning equipment.
Furthermore, the shaking mechanism comprises a first fixing plate, a second fixing plate, a third fixing plate and two electric push rods, the fixing plate I and the fixing plate III are fixed with the external plate I and the external plate II respectively, two ends of the fixing plate II are fixed with the hook I and the hook II respectively, the fixing plate I is arranged below the fixing beam, the fixing plate II is arranged below the fixing plate I, the fixing plate III is fixed below the fixing plate II, two electric push rods are fixed at two ends of the fixing plate I, the shaking motor is fixed on one surface of the fixing plate I facing the fixing plate II, the cam is fixed on an output shaft of the shaking motor, the cam impacts the fixing plate II when rotating, a sliding shaft of the electric push rods is connected with the fixing plate II, and the linear spring is connected between the fixing plate II and the fixing plate III.
The invention has the following beneficial effects:
the invention comprises a bearing frame for grabbing and bearing a special-shaped piece through a manipulator, the bearing frame is sequentially moved to an immersion groove and a blowing unit, chemical cleaning liquid is arranged in the immersion groove, the bearing frame is immersed into the chemical cleaning liquid by the manipulator for immersion, in the process, the bearing frame is intermittently shaken and rotated by the manipulator, the rotation is to fully contact each part of the special-shaped piece with the chemical cleaning liquid and comprises a gap, the shaking is to shake off bubbles generated on the surface of the special-shaped piece due to chemical reaction so as to facilitate the continuous chemical reaction between the cleaning liquid and the special-shaped piece, the bearing frame is hung on a rack of the blowing unit for draining and controlling water, the blowing unit sprays hydrogen to blow and dry the residual liquid, meanwhile, the manipulator shakes and rotates the bearing frame, the shaking is to drop large water drops remained after draining, and the rotation is to cooperate with the blowing of the blowing unit, allowing nitrogen to be blown to the parts of the profile. The special-shaped semiconductor cleaning device can effectively clean gaps and surfaces of special-shaped semiconductor pieces, can also effectively remove residual cleaning liquid on the surfaces of the special-shaped semiconductor pieces, and improves the quality of the special-shaped semiconductor pieces.
Drawings
FIG. 1 is a perspective view of a cleaning system for semiconductor profile parts according to the present invention;
FIG. 2 is a perspective view of the present invention with the robot removed;
FIG. 3 is a perspective view of the feed mechanism of the present invention;
FIG. 4 is a perspective view of the discharge mechanism of the present invention;
FIG. 5 is a schematic view of the horizontal movement structure of the robot of the present invention;
FIG. 6 is an enlarged view of portion A of FIG. 5;
FIG. 7 is a first perspective view of the robot gripping carriage of the present invention (with the support removed);
FIG. 8 is a second perspective view of the robot of the present invention (with the support removed);
FIG. 9 is a third perspective view of the robot of the present invention (with the support removed);
FIG. 10 is a perspective view of the slide table of the present invention;
FIG. 11 is a schematic view of the power source of the sliding table of the present invention;
FIG. 12 is a first perspective view of a carrier of the present invention;
fig. 13 is a second perspective view of the loading frame of the present invention.
In the above figures, 100, the carrier; 200. cleaning equipment; 300. a manipulator; 400. a special-shaped piece; 210. a housing; 220. cleaning the platform; 230. a soaking tank; 240. a purging mechanism; 250. a feeding mechanism; 260. a discharging mechanism; 211. a left side wall; 212. a right side wall; 211a, a feed inlet; 211b and a discharge hole; 310. an execution structure; 320. a support portion; 110. a splint; 120. a connecting shaft; 111. a circular through hole; 112. an upper notch; 113. a lower notch; 311. a sliding table; 312. a fixed beam; 313. a first external plate; 314. a second external plate; 315. a first hook is arranged; 316. a second hook; 317. a rotating electric machine; 318. a shaking mechanism; 319. a rotating shaft; 31a, a drive sprocket; 31b, a driven sprocket; 31c, an endless chain; 31d, a driving gear; 31e, a driven gear; 321. a first screw rod; 322. a fixed mount; 323. a lifting motor; 324. a driving pulley; 325. a driven pulley; 326. a synchronous belt; 311a, a slider structure; 311b, a first guiding structure; 270. a horizontal movement motor; 280. a shaft seat; 290. a second screw rod; 327. a ball nut; 328. a second guide structure; 318a and a first fixing plate; 318b and a second fixing plate; 318c, a third fixing plate; 318d, an electric push rod; 318e, linear spring; 318f, a shaking motor; 318g, a cam; 251. a feeding platform; 252. a sliding table cylinder I; 261. a discharge platform; 262. and a sliding table cylinder II.
Detailed Description
The technical solution of the present invention is further described with reference to the accompanying drawings 1-13 and the embodiments.
As shown in fig. 1-2, the present invention includes a carrier 100, a cleaning apparatus 200, and a robot 300, wherein the carrier 100 is used for holding a plurality of profile members 400; the cleaning equipment 200 comprises a shell 210, a cleaning platform 220, a plurality of soaking grooves 230, a plurality of purging mechanisms 240, a feeding mechanism 250 and a discharging mechanism 260, wherein the cleaning platform 220 is fixed inside the shell 210, the length direction of the cleaning platform 220 is consistent with the horizontal axial direction of the shell 210, the shell 210 comprises a left side wall 211 and a right side wall 212, the connecting line of which is vertical to the length direction of the cleaning platform 220, the cleaning platform 220 is sequentially provided with the feeding mechanism 250, the soaking grooves 230, the purging mechanisms 240 and the discharging mechanism 260 which are alternately arranged one by one along the length direction, the left side wall 211 is provided with a feeding hole 211a and a discharging hole 211b, the position of the feeding hole 211a corresponds to the position of the feeding mechanism 250, and the position of the discharging hole 211b corresponds to the position of the discharging mechanism 260; the robot 300 includes an actuator 310 and a support 320. The feeding mechanism 250 is reciprocally slidable inside and outside the inlet 211a, the carriage 100 is placed on the feeding mechanism 250 sliding outside the inlet 211a, so that the feeding mechanism 250 feeds the carrier 100, the actuating structure 310 can grasp the carrier 100, the supporting portion 320 is horizontally slidably coupled inside the outer case 210, so that the robot 300 can horizontally move along the length direction of the cleaning platform 220, the loading frame 100 sequentially passes through the immersion tanks 230 and the purge mechanism 240, the actuating structure 310 is slidably coupled to the supporting portion 320, so that the actuating structure 310 can be lifted up and down, the actuating structure 310 can conveniently catch the loading frame 100, and the position of the bearing frame 100 between the soaking tank 230 and the purging mechanism 240 is convenient to switch, the discharging mechanism 260 can slide back and forth relative to the discharging port 211b, and the bearing frame 100 can be placed on the discharging mechanism 260, so that the discharging mechanism 260 sends the bearing frame 100 out.
As shown in fig. 12 to 13, the loading frame 100 includes a clamping plate 110, two rows of circular through holes 111 are provided on the clamping plate 110, each circular through hole 111 in the upper row communicates with an upper edge of the clamping plate 110 to form an upper notch 112, each circular through hole 111 in the lower row communicates with a lower notch 113 in the lower edge of the clamping plate 110, the clamping plate 110 has elasticity, the widths of the upper notch 112 and the lower notch 113 are smaller than the diameter of the circular through hole 111, the diameter of the profile 400 is equal to the diameter of the circular through hole 111, the profile 400 can be placed into the circular through hole 111 in the upper row from the upper notch 112, and the profile 400 can be placed into the circular through hole 111 in the lower row from the lower notch 113.
As shown in fig. 7-9, the actuating structure 310 includes a vertical sliding table 311, a fixed beam 312, a first outer plate 313, a second outer plate 314, a first hook 315, a second hook 316, a rotating electrical machine 317 and a shaking mechanism 318, wherein one end of the fixed beam 312 is fixed at one end of the sliding table 311, the fixed beam 312 is perpendicular to the sliding table 311 in the axial direction, the sliding table 311 is in the axial direction of the supporting portion 320, the sliding table 311 is movable in the axial direction of the supporting portion 320, the body of the rotating electrical machine 317 is fixed on the sliding table 311, the top ends of the first outer plate 313 and the second outer plate 314 are respectively fixed at the two ends of the fixed beam 312, a rotating shaft 319 is coaxially connected to the output shaft of the rotating electrical machine, the free end of the rotating shaft 319 extends out of the first outer plate 313, and the free end fixes a driving sprocket 31a, a driven sprocket 31b is arranged at the bottom end of the first outer plate 313, the driven sprocket 31b and the driving sprocket 31a are jointly covered by an annular chain 31c, the driven sprocket 31b is coaxially connected with a driving gear 31d, two ends of the bearing frame 100 are respectively fixed with a connecting shaft 120, a first hook 315 and a second hook 316 are respectively connected on a first external plate 313 and a second external plate 314 in a sliding manner, the two connecting shafts 120 are hung on hooks of the first hook 315 and the second hook 316, a driven gear 31e is fixed on the connecting shaft 120 close to the first external plate 313, the driven gear 31e is meshed with the driving gear 31d, a shaking mechanism 318 is fixed between the first external plate 313 and the second external plate 314, and top ends of the first hook 315 and the second hook 316 are connected with the shaking mechanism 318.
As shown in fig. 10-11, a first lead screw 321 is fixed on the supporting portion 320, a fixing frame 322 is fixed at the bottom of the supporting portion 320, a portion of the first lead screw 321 near the bottom end is rotatably suspended at the right side of the fixing frame 322, a lifting motor 323 is fixed at the left side of the fixing frame 322, a driving pulley 324 is fixed at an output shaft of the lifting motor 323, a driven pulley 325 is fixed at the bottom end of the first lead screw 321, the driving pulley 324 and the driven pulley 325 are jointly sleeved by an annular synchronous belt 326, a slider structure 311a is fixed at a side of the sliding table 311 opposite to the supporting portion 320, the slider structure 311a is sleeved on the first lead screw 321, the slider structure 311a can slide along the axial direction of the first lead screw 321, and a guide structure 311b is further arranged between the supporting portion 320 and the sliding table 311.
As shown in fig. 5 to 6, a horizontal moving motor 270 and a shaft seat 280 are respectively fixed on the front side and the rear side of the cleaning device 200, a second lead screw 290 is connected between an output shaft of the horizontal moving motor 270 and the shaft seat 280, a ball nut 327 is fixed on one side of the support portion 320, which is away from the sliding table 311, and is sleeved on the second lead screw 290, and a second guide structure 328 is arranged between the support portion 320 and the cleaning device 200.
As shown in fig. 7-8, the shaking mechanism 318 includes a first fixed plate 318a, a second fixed plate 318b, a third fixed plate 318c, two electric push rods 318d, a linear spring 318e, a shaking motor 318f and a cam 318g, the first fixed plate 318a, the second fixed plate 318b and the third fixed plate 318c are disposed between the first external plate 313 and the second external plate 314, the first fixed plate 318a and the third fixed plate 318c are both fixed with the first external plate 313 and the second external plate 314, two ends of the second fixed plate 318b are respectively fixed with the first hook 315 and the second hook 316, the first fixed plate 318a is disposed below the fixed beam 312, the second fixed plate 318b is disposed below the first fixed plate 318a, the third fixed plate 318c is fixed below the second fixed plate 318b, the two electric push rods 318d are fixed at two ends of the first fixed plate 318a, the shaking motor 318f is fixed on a surface of the first fixed plate 318a facing the second fixed plate 318b, the output shaft of the shaking motor 318f is fixed with a cam 318g, the cam 318g strikes a second fixed plate 318b when rotating, the sliding shaft of the electric push rod 318d is connected with the second fixed plate 318b, and a linear spring 318e is connected between the second fixed plate 318b and a third fixed plate 318 c.
As shown in fig. 3-4, the feeding mechanism 250 includes a feeding platform 251 and a sliding table cylinder 252, the sliding table cylinder 252 is fixed at one end of the cleaning platform 220 close to the feeding port 211a, the feeding platform 251 is fixed on a moving table of the sliding table cylinder 252, the feeding platform 251 can slide along with the moving table, the discharging mechanism 260 includes a discharging platform 261 and a sliding table cylinder 262, the sliding table cylinder 262 is fixed at one end of the cleaning platform 220 close to the discharging port 211b, the discharging platform 261 is fixed on a moving table of the sliding table cylinder 262, and the moving table on which the discharging platform 261 can slide.
The working principle and the working process of the invention are as follows: firstly, manually putting the special-shaped piece 400 into the bearing frame 100; secondly, manually placing the carrier 100 on the feeding platform 251, and sliding the feeding platform 251 into the shell 210 to feed the carrier 100 into the cleaning device 200; thirdly, the sliding table 311 of the robot 300 descends to make the hook parts of the first hook 315 and the second hook 316 descend below the connecting shaft 120, then the sliding table 311 ascends, the first hook 315 and the second hook 316 hook the connecting shaft 120 at two sides of the bearing frame 100, then the support part 320 moves along the axial direction of the cleaning platform 220, the first hook 315 and the second hook 316 hang to put the bearing frame 100 into the first soaking tank 230 for soaking and cleaning, at this time, the rotating motor 317 rotates in a unidirectional and circumferential direction to make the bearing frame 100 do a circumferential motion on the hook to make the special-shaped piece 400 fully contact with the cleaning solution, when the special-shaped piece 400 is soaked in the cleaning solution, the shaking mechanism 318 acts, the shaking mechanism 318 can shake off air bubbles generated by the chemical reaction to facilitate the chemical reaction between the cleaning solution and the special-shaped piece 400, then the support part 320 continues to move horizontally to move the bearing frame 100 to the first purging mechanism 240, meanwhile, the shaking mechanism 318 functions to shake off large water drops of the cleaning liquid remaining on the special-shaped member 400, the blowing mechanism 240 sprays nitrogen to blow dry the cleaning liquid on the special-shaped member 400, the rotating motor 317 can rotate at a fixed point and rotate at a circumference, the fixed point can rotate the bearing frame 100 to a certain angle and then does not move, and specific parts of the special-shaped member 400 are blown dry, the circumference rotation is to continuously rotate the bearing frame 100 in the blow-dry process, then the supporting part 320 translates again, the bearing frame 100 is moved into the second soaking tank 230 for soaking and cleaning, each soaking tank 230 is filled with different soaking liquids and then moved to the second blowing mechanism 240 for blowing, the soaking tanks 230 and the blowing mechanisms 240 are not limited to two and can be multiple, the blowing mechanisms 240 correspond to the soaking tanks 230 one by one, then the manipulator 300 moves the cleaned special-shaped member 400 together with the discharging mechanism 260, the discharging mechanism 260 then sends the carrier out of the housing 210, and finally the carrier is manually taken down.
Finally, the above embodiments are only for illustrating the technical solutions of the present invention and not for limiting, although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions may be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all of them should be covered in the claims of the present invention.
Claims (6)
1. A cleaning system for semiconductor special-shaped pieces (400) is characterized by comprising a bearing frame (100), a cleaning device (200) and a manipulator (300),
the bearing frame (100) is used for placing a plurality of special-shaped pieces (400);
the cleaning equipment (200) comprises a shell (210), a cleaning platform (220), a plurality of soaking grooves (230), a plurality of purging mechanisms (240), a feeding mechanism (250) and a discharging mechanism (260), wherein the cleaning platform (220) is fixed inside the shell (210), the length direction of the cleaning platform (220) is consistent with the horizontal axial direction of the shell (210), the shell (210) comprises a left side wall (211) and a right side wall (212) which are connected with the cleaning platform (220) and vertical to the length direction, the cleaning platform (220) is sequentially provided with the feeding mechanism (250), the soaking grooves (230), the purging mechanisms (240) and the discharging mechanism (260) which are alternately arranged one by one, a feeding hole (211a) and a discharging hole (211b) are arranged on the left side wall (211), and the position of the feeding hole (211a) corresponds to the position of the feeding mechanism (250), the position of the discharge hole (211b) corresponds to the position of the discharge mechanism (260);
the manipulator (300) comprises an actuating structure (310) and a support (320),
the feeding mechanism (250) can slide in and out in a reciprocating manner relative to the feeding hole (211a), the bearing frame (100) can be placed on the feeding mechanism (250) which slides outside the feeding hole (211a), so that the feeding mechanism (250) feeds the bearing frame (100), the executing mechanism (310) can grasp the bearing frame (100), the supporting part (320) is horizontally and slidably connected inside the shell (210), so that the manipulator (300) can horizontally move along the length direction of the cleaning platform (220), the bearing frame (100) sequentially passes through the soaking tanks (230) and the purging mechanism (240) which are alternately arranged to operate, the executing mechanism (310) is slidably connected to the supporting part (320), so that the executing mechanism (310) can move up and down, and the executing mechanism (310) is convenient for the executing mechanism (310) to grasp the bearing frame (100), the position of the bearing frame (100) is convenient to switch between the soaking tank (230) and the purging mechanism (240), the discharging mechanism (260) can slide inside and outside relative to the discharging port (211b) in a reciprocating mode, and the bearing frame (100) can be placed on the discharging mechanism (260) so that the discharging mechanism (260) can send the bearing frame (100) out.
2. A system for cleaning a semiconductor profile-member (400) according to claim 1, the bearing frame (100) comprises a clamping plate (110), an upper row and a lower row of circular through holes (111) are arranged on the clamping plate (110), an upper notch (112) is communicated between each circular through hole (111) in the upper row and the upper edge of the clamping plate (110), a lower notch (113) is communicated between each circular through hole (111) in the lower row and the lower edge of the clamping plate (110), the clamping plate (110) has elasticity, the width of the upper notch (112) and the lower notch (113) is smaller than the diameter of the circular through hole (111), the diameter of the profile (400) is equal to the diameter of the circular through hole (111), the special-shaped piece (400) can be placed into the circular through hole (111) on the upper row from the upper notch (112), the special-shaped piece (400) can be placed into the circular through hole (111) in the lower row from the lower notch (113).
3. A cleaning system for semiconductor shaped articles (400) according to claim 1, characterized in that the actuating structure (310) comprises a vertical sliding table (311), a fixed beam (312), an outer plate one (313) and an outer plate two (314), a hook one (315), a hook two (316), a rotating motor (317), a shaking mechanism (318), a rotating shaft (319), a driving sprocket (31a), a driven sprocket (31b), an endless chain (31c), a driving gear (31d), a driven gear (31e), wherein one end of the fixed beam (312) is fixed at one end of the sliding table (311), the fixed beam (312) is perpendicular to the sliding table (311), the axial direction of the sliding table (311) coincides with the axial direction of the supporting portion (320), the sliding table (311) is movable in the axial direction of the supporting portion (320), and the body of the rotating motor (317) is fixed on the sliding table (311), the top ends of the first external plate (313) and the second external plate (314) are respectively fixed at two ends of the fixed beam (312), an output shaft of the rotating motor (317) is coaxially connected with a rotating shaft (319), the free end of the rotating shaft (319) extends out of the first external plate (313), a driving sprocket (31a) is fixed at the free end, a driven sprocket (31b) is arranged at the bottom end of the first external plate (313), the driven sprocket (31b) and the driving sprocket (31a) are jointly sleeved by an annular chain (31c), the driven sprocket (31b) is coaxially connected with a driving gear (31d), two connecting shafts (120) are respectively fixed at two ends of the bearing frame (100), and the first hook (315) and the second hook (316) are respectively connected onto the first external plate (313) and the second external plate (314) in a sliding manner, the two connecting shafts (120) are hung on the hook portions of the first hook (315) and the second hook (316), a driven gear (31e) is fixed on the connecting shaft (120) close to the first external plate (313), the driven gear (31e) is meshed with the driving gear (31d), the shaking mechanism (318) is fixed between the first external plate (313) and the second external plate (314), and the top ends of the first hook (315) and the second hook (316) are connected with the shaking mechanism (318).
4. A cleaning system for semiconductor shaped members (400) according to claim 3, wherein a first lead screw (321) is fixed on the supporting portion (320), a fixed frame (322) is fixed at the bottom of the supporting portion (320), the first lead screw (321) is rotatably suspended at the right side of the fixed frame (322) near the bottom end, a lifting motor (323) is fixed at the left side of the fixed frame (322), a driving pulley (324) is fixed at the output shaft of the lifting motor (323), a driven pulley (325) is fixed at the bottom end of the first lead screw (321), the driving pulley (324) and the driven pulley (325) are jointly sleeved by an annular synchronous belt (326), a slider structure (311a) is fixed at the side of the sliding table (311) opposite to the supporting portion (320), and the slider structure (311a) is sleeved on the first lead screw (321), the sliding block structure (311a) can slide along the axial direction of the first screw rod (321), and a first guide structure (311b) is arranged between the supporting part (320) and the sliding table (311).
5. A cleaning system for semiconductor shaped articles (400) according to claim 3, characterized in that a horizontal moving motor (270) and a shaft seat (280) are respectively fixed at the front side and the rear side of the cleaning device (200), a second screw rod (290) is connected between the output shaft of the horizontal moving motor (270) and the shaft seat (280), a ball nut (327) is fixed at the side of the supporting part (320) departing from the sliding table (311), the ball nut (327) is sleeved on the second screw rod (290), and a second guiding structure (328) is arranged between the supporting part (320) and the cleaning device (200).
6. A cleaning system for semiconductor shaped members (400) according to claim 3, characterized in that the shaking mechanism (318) comprises a first fixing plate (318a), a second fixing plate (318b), a third fixing plate (318c), two electric push rods (318d), a linear spring (318e), a shaking motor (318f) and a cam (318g), the first fixing plate (318a), the second fixing plate (318b) and the third fixing plate (318c) are arranged between the first external plate (313) and the second external plate (314), the first fixing plate (318a) and the third fixing plate (318c) are fixed with the first external plate (313) and the second external plate (314), the two ends of the second fixing plate (318b) are respectively fixed with the first hook (315) and the second hook (316), the first fixing plate (318a) is arranged below the fixing beam (312), the fixed plate II (318b) is arranged below the fixed plate I (318a), the fixed plate III (318c) is fixed below the fixed plate II (318b), the two electric push rods (318d) are fixed at two ends of the fixed plate I (318a), the shaking motor (318f) is fixed on one surface, facing the fixed plate II (318b), of the fixed plate I (318a), the cam (318g) is fixed on an output shaft of the shaking motor (318f), the cam (318g) impacts the fixed plate II (318b) when rotating, a sliding shaft of the electric push rod (318d) is connected with the fixed plate II (318b), and the linear spring (318e) is connected between the fixed plate II (318b) and the fixed plate III (318 c).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110987113.5A CN113649348A (en) | 2021-08-26 | 2021-08-26 | Cleaning system for special-shaped semiconductor parts |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110987113.5A CN113649348A (en) | 2021-08-26 | 2021-08-26 | Cleaning system for special-shaped semiconductor parts |
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| CN113649348A true CN113649348A (en) | 2021-11-16 |
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| CN202110987113.5A Pending CN113649348A (en) | 2021-08-26 | 2021-08-26 | Cleaning system for special-shaped semiconductor parts |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114653662A (en) * | 2022-02-08 | 2022-06-24 | 苏州泾碧清电子科技有限公司 | Indium phosphide cleaning system with high cleaning efficiency |
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Application publication date: 20211116 |