CN113451444A - Method for manufacturing solar cell - Google Patents
Method for manufacturing solar cell Download PDFInfo
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- CN113451444A CN113451444A CN202110737809.2A CN202110737809A CN113451444A CN 113451444 A CN113451444 A CN 113451444A CN 202110737809 A CN202110737809 A CN 202110737809A CN 113451444 A CN113451444 A CN 113451444A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 39
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- 238000001035 drying Methods 0.000 claims description 10
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
- H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention relates to the technical field of solar cells, in particular to a manufacturing method of a solar cell, which comprises the following steps: forming a raw solar cell, wherein the raw solar cell comprises a transparent conducting layer: dividing the original solar cell to form at least two sliced solar cells; cleaning at least the cutting surface of the sliced solar cell by adopting a wet cleaning process; and after the wet cleaning process is carried out, forming a grid line electrode on the surface of the sliced solar cell. According to the manufacturing method of the solar cell, the problem of reduction of photoelectric conversion efficiency of the solar cell caused by cutting can be solved by adjusting the forming sequence of the grid line electrodes, removing residual fragments of the transparent conducting layer caused by cutting by adopting a wet cleaning process and repairing the cutting surface.
Description
Technical Field
The invention relates to the technical field of solar cells, in particular to a manufacturing method of a solar cell.
Background
The solar cell has the advantages of cleanness, no pollution, reproducibility, stable working performance and the like. Solar cells are classified into different types according to their structure, preparation process and materials used. The method comprises the following steps: silicon-based solar cells, multi-compound thin-film solar cells, polymer multilayer modified electrode type solar cells, organic solar cells, and the like, wherein the silicon-based solar cells are the most developed, such as heterojunction solar cells and the like. Taking a heterojunction solar cell as an example, a semiconductor layer, a transparent conductive layer and a grid line electrode are prepared on one side or two sides of an N-type substrate to form a cell, a plurality of cells are interconnected and packaged to form an assembly, and the assembly is fed back to a power grid through an inverter after power generation.
In the field of solar cells, the half-chip technology is an effective way to reduce the package loss of the module and improve the power of the module. The half-chip technology is to divide a standard specification battery chip into two identical half-chip battery chips and then to interconnect the two half-chip battery chips. After the heterojunction solar cell is divided, fragments generated by the transparent conductive layer usually remain, and the fragments attached to the dividing surface can lead to conduction between the P-type layer and the N-type substrate, thereby reducing the photoelectric conversion efficiency of the cell. In addition, the cutting process is usually performed after the structure of the whole cell is completed, and the conventional method for cleaning the residual fragments is easy to damage the grid line electrodes on the surface of the heterojunction solar cell, so that the method is difficult to directly apply.
Disclosure of Invention
Therefore, the invention provides a method for manufacturing a solar cell, which aims to solve the problem that the photoelectric conversion efficiency of the divided solar cell is reduced.
The invention provides a manufacturing method of a solar cell, which comprises the following steps: forming a raw solar cell, wherein the raw solar cell comprises a transparent conducting layer: dividing the original solar cell to form at least two sliced solar cells; cleaning at least the cutting surface of the sliced solar cell by adopting a wet cleaning process; and after the wet cleaning process is carried out, forming a grid line electrode on the surface of the sliced solar cell.
Optionally, the step of cleaning the sliced solar cell by using a wet cleaning process includes: providing a cleaning solution; arranging the sliced solar cell above the liquid level of the cleaning liquid and arranging the dividing surface to face the liquid level of the cleaning liquid; after the dividing surface is arranged to face the liquid level of the cleaning liquid, at least part of the sliced solar cell is immersed into the cleaning liquid in the direction from the dividing surface to the liquid level of the cleaning liquid, so that the dividing surface is completely immersed into the cleaning liquid; immersing at least part of sliced solar cells into cleaning solution, and then immersing the cutting surfaces in the cleaning solution;
optionally, in the process of soaking the dividing surface in the cleaning solution, the distance from the liquid level of the cleaning solution to the dividing surface is 2mm-5 mm.
Optionally, the side wall of the sliced solar cell comprises a dividing surface; the step of cleaning the sliced solar cell by adopting a wet cleaning process comprises the following steps: providing a cleaning solution; immersing at least part of the sliced solar cell in the cleaning liquid in a direction that the dividing surface is vertical to the liquid level of the cleaning liquid; after at least part of the sliced solar cell is immersed in the cleaning liquid in the direction that the dividing surface is vertical to the liquid level of the cleaning liquid, the sliced solar cell moves in the cleaning liquid in the direction vertical to the dividing surface;
optionally, only a part of the sliced solar cell is immersed in the cleaning solution, and the dividing surface comprises an immersion area and an exposure area; and in the process that the sliced solar cell moves in the cleaning solution along the direction vertical to the dividing surface, the cleaning solution contacts the exposed area.
Optionally, the moving speed of the sliced solar cell in the cleaning solution along the direction vertical to the dividing surface is 0.5m/min-2 m/min; the longitudinal dimension of the sliced solar cell in the exposed area is 0-50 μm.
Optionally, after the wet cleaning process is performed and before the gate line electrode is formed, the method for manufacturing a solar cell further includes: carrying out first water washing treatment on the sliced solar cell; and after the first water washing treatment, carrying out first drying treatment on the sliced solar cell.
Optionally, the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone; or the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid; in the cleaning liquid, the mass percent concentration of the hydrogen fluoride is 0.5-3%; the mass percentage concentration of the hydrogen chloride is 0.01-1%; the temperature of the cleaning liquid is 20-25 ℃; when the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of the ozone in the cleaning solution is 5PPM-100 PPM; the cleaning time of the division surface in the cleaning liquid is 10s-120 s.
Optionally, the cleaning solution is phosphoric acid solution, and the mass percentage concentration of phosphoric acid is 5% -30%; the cleaning time of the division surface in the cleaning liquid is 180-1200 s.
Optionally, the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone; or the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid; in the cleaning liquid, the mass percent concentration of the hydrogen fluoride is 2-5%, and the mass percent concentration of the hydrogen chloride is 2-5%; the temperature of the cleaning liquid is 20-25 ℃; when the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid, the mass concentration of ozone in the cleaning solution is 30PPM-100PPM, and the soaking time is 120s-600 s.
Optionally, after the first drying treatment is performed and before the gate line electrode is formed, the method for manufacturing a solar cell further includes: and passivating the sliced solar cell.
Optionally, the step of performing passivation treatment on the sliced solar cell includes: passivating the cutting surface by adopting a passivation solution; the passivation solution contains ozone, and the mass concentration of the ozone is 30PPM-300 PPM; the time of passivation treatment is 20s-180 s;
optionally, after the passivation treatment is performed and before the gate line electrode is formed, the method for manufacturing a solar cell further includes: carrying out second washing treatment on the sliced solar cells; and after the second water washing treatment, performing second drying treatment on the sliced solar cell.
The invention has the beneficial effects that:
according to the manufacturing method of the solar cell, the sliced solar cell formed by dividing the original solar cell is cleaned in a wet method, the cleaning liquid is in full contact with the dividing surface in the wet cleaning process so as to treat residual fragments formed in the process of dividing the original solar cell, and meanwhile, the dividing damage of the film layer is effectively treated so as to repair the dividing surface, reduce the defects on the dividing surface and reduce the probability of recombination of carriers;
meanwhile, the forming sequence of the grid line electrode is adjusted, residual fragments of the transparent conducting layer caused by cutting are removed by adopting a wet cleaning process, and the step of forming the grid line electrode is carried out after wet cleaning, so that the step of wet cleaning cannot cause corrosion damage to the grid line electrode, the residual fragments and film damage can be fully treated, the influence on the surface flatness of the grid line electrode is avoided, the defect caused by cleaning of the surface flatness of the grid line electrode is avoided, and the photoelectric conversion efficiency of the solar cell is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
Fig. 1 is a schematic flow chart illustrating a method for manufacturing a solar cell according to an embodiment of the invention;
fig. 2 is a schematic structural diagram of a raw solar cell according to an embodiment of the invention;
fig. 3 is a schematic view illustrating a state in a process of cleaning a dividing surface of a sliced solar cell in a method of manufacturing a solar cell according to an embodiment of the present invention;
fig. 4 is a schematic view of a state of a sliced solar cell in a process of cleaning a dividing surface of the sliced solar cell in a method of manufacturing a solar cell according to another embodiment of the present invention.
Reference numerals:
100. a raw solar cell; 101. a semiconductor substrate layer; 102. a second intrinsic amorphous silicon layer; 103. a first intrinsic amorphous silicon layer; 104. a second conductive type semiconductor layer; 105. a first conductive type semiconductor layer; 106. a second transparent conductive layer; 107. a first transparent conductive layer; 200. slicing the solar cell; A. dividing the noodles; B. cleaning fluid; C. a dividing plane, C1, an exposed area; c2, immersion zone; D. and (5) cleaning the liquid.
Detailed Description
The embodiment of the invention provides a manufacturing method of a solar cell, which comprises the following steps: forming an original solar cell, wherein the original solar cell comprises a transparent conducting layer; dividing the original solar cell to form at least two sliced solar cells; cleaning at least the cutting surface of the sliced solar cell by adopting a wet cleaning process; and after the wet cleaning process is carried out, forming a grid line electrode on the surface of the sliced solar cell. According to the manufacturing method of the solar cell, the forming sequence of the grid line electrode is adjusted, the wet cleaning process is adopted to remove residual fragments of the transparent conducting layer caused by cutting and repair the cutting surface, and the step of forming the grid line electrode is carried out after the wet cleaning, so that the wet cleaning step does not cause corrosion damage to the grid line electrode, the influence on the surface flatness of the grid line electrode is avoided, the defect caused by cleaning of the surface flatness of the grid line electrode is avoided, and the photoelectric conversion efficiency of the solar cell is improved. Secondly, the cleaning liquid is fully contacted with the dividing surface in the wet cleaning, and residual fragments and film layer damage can be fully treated. Therefore, the problem that the photoelectric conversion efficiency of the divided solar cell is reduced is effectively solved.
The technical solutions of the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; the two elements may be directly connected or indirectly connected through an intermediate medium, or may be communicated with each other inside the two elements, or may be wirelessly connected or wired connected. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In addition, the technical features involved in the different embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
Example 1
Referring to fig. 1 to fig. 3, the present embodiment provides a method for manufacturing a solar cell, and the method of the present embodiment is suitable for tank cleaning, and includes the following steps:
s100: the original solar cell sheet 100 is formed.
S200: the original solar cell sheet 100 is divided to form at least two sliced solar cell sheets 200.
S300: and cleaning at least the dividing surface A of the sliced solar cell 200 by adopting a wet cleaning process.
S400: after the wet cleaning process is performed, a gate line electrode is formed on the surface of the sliced solar cell 200.
In the method for manufacturing a solar cell of the present embodiment, the sliced solar cell 200 formed by dividing the original solar cell 100 is wet-cleaned to treat the residual fragments of the first transparent conductive layer 107 formed when the original solar cell 100 is divided and repair the dividing surface, thereby reducing the defects on the dividing surface a and reducing the probability of recombination of carriers. Meanwhile, in the embodiment, by adjusting the forming sequence of the gate line electrode and adopting a wet cleaning process to remove residual fragments of the first transparent conductive layer 107 caused by the segmentation, the step of forming the gate line electrode is performed after the wet cleaning, so that the step of wet cleaning does not cause corrosion damage to the gate line electrode, the influence on the surface flatness of the gate line electrode is avoided, the defect caused by cleaning the surface flatness of the gate line electrode is avoided, and the photoelectric conversion efficiency of the solar cell is improved.
Specifically, when the solar cell is a heterojunction solar cell, the solar cell 100 is formed as shown in fig. 2.
The step S100 includes:
providing a semiconductor substrate layer 101, wherein the semiconductor substrate layer 101 in the embodiment can be an N-type crystalline silicon wafer;
forming a first intrinsic amorphous silicon layer 103 on one side surface of the semiconductor substrate layer 101;
forming a second intrinsic amorphous silicon layer 102 on the other side surface of the semiconductor substrate layer 101;
forming a first conductive type semiconductor layer 105 on the surface of the first intrinsic amorphous silicon layer 103, which is opposite to the semiconductor substrate layer 101, wherein the first conductive type semiconductor layer 105 is of a conductivity type opposite to that of the semiconductor substrate layer 101, the first conductive type semiconductor layer 105 is, for example, a P-type amorphous silicon layer, and the P-type amorphous silicon layer and an N-type crystalline silicon wafer form a PN junction;
forming a second conductive type semiconductor layer 104 on the surface of the second intrinsic amorphous silicon layer 102, which is opposite to the semiconductor substrate layer 101; the conductivity type of the second conductivity type semiconductor layer 104 is the same as the conductivity type of the semiconductor substrate layer 101, the second conductivity type semiconductor layer 104 is, for example, an N-type amorphous silicon layer, and the N-type amorphous silicon layer and the N-type crystalline silicon sheet form a high-low junction;
forming a first transparent conductive layer 107 on a side of the first conductivity-type semiconductor layer 105 facing away from the semiconductor substrate layer 101; second transparent conductive layer 106 is formed on a side of second conductivity-type semiconductor layer 104 facing away from semiconductor substrate layer 101. The first and second transparent conductive layers 107 and 106 are used to collect carriers to facilitate transmission to the gate line electrode, and at the same time, optical reflection can be reduced.
Referring to fig. 2, for the conventional solar cell splitting method, after splitting the heterojunction solar cell, fragments are usually generated in the first transparent conductive layer 107, and the fragments attached to the splitting plane a may cause the first conductive type semiconductor layer 105 (i.e., the P-type layer) and the semiconductor substrate layer 101 (i.e., the N-type silicon wafer) to be electrically connected, thereby reducing the photoelectric conversion efficiency of the split solar cell. The manufacturing method of the solar cell of the embodiment can avoid the problem and improve the photoelectric conversion efficiency of the solar cell.
The step S200 includes:
the original solar cell sheet 100 is divided along the dotted line in fig. 2 to form at least two sliced solar cell sheets 200. The sliced solar cell sheet 200 has a dividing plane a formed by dividing the original solar cell sheet 100. The cutting mode can specifically adopt a laser cutting process, and cutting residual fragments of the transparent conducting layer can be attached to the cutting surface A of the solar cell slice 200 cut into slices after laser cutting, because the transparent conducting layer has conductivity, the residual fragments of the transparent conducting layer can enable the N-type crystalline silicon wafer to be conducted with the P-type layer, and the photoelectric conversion efficiency of the solar cell is seriously reduced.
Step S300 includes:
and providing a cleaning solution. The method specifically comprises the following steps: a cleaning device is provided, wherein the cleaning device is provided with a cleaning liquid tank, and cleaning liquid B is contained in the cleaning liquid tank. The cleaning device has an automatic control structure, and can conveniently realize the control of the cleaning time, the cleaning temperature and the cleaning liquid concentration of the cleaning liquid.
The sliced solar cell 200 is placed above the liquid surface of the cleaning liquid B (i.e., the broken line in fig. 3) with the dividing surface a facing the liquid surface of the cleaning liquid B. In the present embodiment, the dividing surface a is always parallel to the liquid surface of the cleaning liquid B. Specifically, a solar cell clamp is provided, which is adapted to clamp the sliced solar cell 200 to maintain a fixed position and state, and the sliced solar cell 200 is clamped by the solar cell clamp so that the dividing surface a faces the liquid surface of the cleaning liquid B and the state is maintained. The solar cell clamp may be, for example, a basket clamp.
After the dividing surface a is set to face the liquid surface of the cleaning liquid, at least part of the sliced solar cells 200 are immersed in the cleaning liquid B in the direction from the dividing surface a to the liquid surface of the cleaning liquid B so that the dividing surface a is completely immersed in the cleaning liquid B. In some embodiments, the sliced solar cell sheet 200 is completely immersed in the cleaning solution B.
After at least a part of the sliced solar cells 200 are immersed in the cleaning solution B, the division surface a is subjected to an immersion treatment in the cleaning solution B. In different embodiments, the sliced solar cell pieces 200 are only partially immersed in the cleaning solution B, and the sliced solar cell pieces 200 are completely immersed in the cleaning solution B.
By the wet cleaning mode, the cutting surface is completely immersed in the cleaning liquid, residual fragments and film layer cutting damage are in full contact with the cleaning liquid, the residual fragments can be sufficiently removed, the film layer damage can be sufficiently treated, and the cutting surface is repaired. And the operation of the cleaning mode that the sliced solar cell 200 is soaked in the cleaning liquid B is simple.
Specifically, in the process of immersing the cut surface a of the sliced solar cell 200 in the cleaning solution B, the distance from the liquid surface of the cleaning solution B to the cut surface a is 2mm to 5mm, that is, the cut surface a is 2mm to 5mm below the liquid surface of the cleaning solution B, and may be, for example, 2mm, 3mm, 4mm, or 5 mm. If the distance from the liquid level of the cleaning liquid to the dividing surface is less than 2mm, insufficient contact between the dividing surface A and the cleaning liquid B may occur, and the treatment effect is poor; if the distance from the liquid surface of the cleaning liquid B to the dividing surface is greater than 5mm, each film layer of the sliced solar cell 200 may be damaged. The distance from the liquid surface of the cleaning liquid B to the dividing surface A is 2mm-5mm, and balance can be achieved between effective treatment of the dividing surface A and the minimum damage to the solar cell slices 200.
In this embodiment, the cleaning liquid B is a mixed solution of hydrofluoric acid, hydrochloric acid, and ozone; or the cleaning liquid B is a mixed solution of hydrofluoric acid and hydrochloric acid. Wherein, hydrofluoric acid can effectively oxidize the residual fragments to form oxides; the hydrochloric acid can quickly dissolve and remove the oxides to realize cleaning; ozone has oxidizing power different from that of hydrofluoric acid, and the ozone can improve the treatment effect on different residual fragments, so that the residual fragments can be removed more thoroughly and the cutting surface can be repaired.
In the cleaning liquid B, the mass percentage concentration of hydrogen fluoride may be 0.5% to 3%, for example, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%; the concentration of hydrogen chloride may be, for example, 0.01%, 0.05%, 0.1%, 0.2%, 0.5%, 0.8%, 1% by mass or more, and is 0.01% to 1% by mass or less; the temperature of the cleaning solution is 20 ℃ to 25 ℃, and may be, for example, 20 ℃, 21 ℃, 22 ℃, 23 ℃, 24 ℃ and 25 ℃.
When the cleaning solution B is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of the ozone in the cleaning solution is 5PPM-100PPM, such as 5PPM, 10PPM, 25PPM, 50PPM, 75PPM and 100 PPM;
the cleaning time of the division surface A in the cleaning liquid B is 10s-120s, and may be, for example, 10s, 20s, 30s, 60s, 90s, or 120 s.
By adopting the conditions, the residual fragments of the transparent conducting layer can be effectively removed, the cutting surface can be repaired, and the photoelectric conversion efficiency of the solar cell piece can be improved.
In other embodiments, the cleaning solution B is a phosphoric acid solution. Phosphoric acid hardly reacts on the film layers except the transparent conductive layer, so that residual fragments can be cleaned in a targeted manner, and other film layers are less damaged. The phosphoric acid may be 5% to 30% by mass, for example, 5%, 10%, 15%, 20%, 25%, 30%; the cleaning time of the division surface A in the cleaning liquid B is 180s-1200s, and may be, for example, 180s, 360s, 720s, or 1200 s. By adopting the conditions, the residual fragments of the transparent conducting layer can be effectively removed and the dividing surface can be repaired, namely, the photoelectric conversion efficiency of the solar cell is improved.
The method for manufacturing the solar cell sheet of the embodiment further includes:
step S400: after the wet cleaning process is performed, a gate line electrode is formed on the surface of the sliced solar cell 200.
In this embodiment, the method for manufacturing a solar cell further includes: after the wet cleaning process is performed and before the gate line electrode is formed (i.e., after step S300 and before step S400), a first water washing process is performed on the sliced solar cell 200; and, the first drying process is performed on the sliced solar cell 200. The first washing treatment prevents the cleaning solution of the wet cleaning process from remaining on the surface of the sliced solar cell 200, and prevents adverse effects on the formation of the gate line electrode. The first drying treatment removes moisture on the surface of the sliced solar cell 200, which is beneficial to the process of the grid line electrode.
In this embodiment, the method for manufacturing a solar cell further includes: after the first drying process is performed, and before the gate line electrode is formed, a passivation process is performed on the sliced solar cell 200. The passivation treatment can effectively treat the dangling bond on the dividing surface A of the sliced solar cell piece 200, the Si-dangling bond on the dividing surface A forms Si-O bond, and the dangling bond is passivated, so that the current carrier is not easy to be compounded on the dividing surface A, the loss of the current carrier is reduced, and the photoelectric conversion efficiency of the solar cell piece is improved.
Specifically, the step of performing passivation on the sliced solar cell 200 includes: passivating the cutting surface by adopting a passivation solution; the passivation solution contains ozone with mass concentration of 30-300 PPM, such as 30PPM, 60PPM, 90PPM, 120PPM, 180PPM, 240PPM, 300 PPM; the time of the passivation treatment is 20s to 180s, and may be, for example, 20s, 40s, 60s, 120s, or 180 s.
Further, the manufacturing method of the solar cell further comprises the following steps: after the passivation treatment is carried out and before the grid line electrode is formed, second washing treatment is carried out on the sliced solar cell 200; and, after the second water washing treatment, the second drying treatment is performed on the sliced solar cell 200.
The solar cell in the embodiment is an amorphous silicon/crystalline silicon heterojunction cell or an amorphous silicon/crystalline silicon heterojunction-perovskite laminated cell. In other embodiments, other solar cells may be used.
When the solar cell is a heterojunction solar cell, the manufacturing method of the solar cell of the embodiment can prevent the current carriers in the semiconductor substrate layer from rapidly entering the first transparent conductive layer, reduce the probability of recombination of the current carriers in the semiconductor substrate layer and the current carriers of the opposite conduction type from the first conduction type semiconductor layer, increase the current carriers which can be output by the solar cell, and improve the photoelectric conversion efficiency of the solar cell. The method can also effectively treat the segmentation damage to repair the segmentation surface, so that the segmentation damage part of the segmentation surface A of the sliced solar cell piece 200 is smoother, the recombination center caused by the unevenness is reduced, the probability of recombination of carriers of opposite conduction types at the recombination center is reduced, and the photoelectric conversion efficiency of the solar cell piece can be improved.
Example 2
Referring to fig. 1 to fig. 3, the present embodiment provides a method for manufacturing a solar cell, and the method of the present embodiment is also applicable to tank cleaning, and differs from the above embodiment 1 in that: the cleaning liquid B is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone; or the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid;
in the cleaning liquid, the mass percent concentration of the hydrogen fluoride is 2-5%, and the mass percent concentration of the hydrogen chloride is 2-5%; the temperature of the cleaning liquid is 20-25 ℃;
when the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of the ozone in the cleaning solution is 30PPM-100 PPM;
the soaking treatment lasts for 120-600 s.
The remaining cleaning conditions are the same as those in example 1, and are not described herein.
By adopting the conditions, the mass percentage concentration of the hydrogen fluoride and the hydrochloric acid is higher, the reaction time is longer, on one hand, the residual fragments of the transparent conducting layer can be effectively removed, on the other hand, the cutting damage of the cutting surface can be further processed to repair the cutting surface, so that the cutting surface is smoother, and the photoelectric conversion efficiency of the solar cell can be improved.
Example 3
Referring to fig. 1 and 4, the present embodiment provides a method for manufacturing a solar cell sheet, which is different from the above embodiment 1 in that: the method of the embodiment is suitable for chain type cleaning, and the step of cleaning the sliced solar cell 200 by adopting a wet cleaning process comprises the following steps:
providing a cleaning solution; the method specifically comprises the following steps: a cleaning device is provided, wherein the cleaning device is provided with a cleaning liquid tank, and cleaning liquid D is contained in the cleaning liquid tank. The cleaning device has an automatic control structure, and can conveniently realize the control of the cleaning time, the cleaning temperature and the cleaning liquid concentration of the cleaning liquid.
The side wall of the sliced solar cell sheet 200 includes a dividing plane C, and at least part of the sliced solar cell sheet 200 is immersed in the cleaning liquid D in a direction in which the dividing plane C is perpendicular to the liquid surface (refer to a dotted line in fig. 4) of the cleaning liquid D. Specifically, a solar cell carrier is provided, which is suitable for carrying the sliced solar cells 200 and transporting the sliced solar cells 200 to move in a fixed direction. Specifically, the solar cell carrier may be, for example, a roller chain set.
After at least part of the sliced solar cells 200 are immersed in the cleaning solution D in the direction in which the dividing plane C is perpendicular to the liquid level of the cleaning solution D, the sliced solar cells 200 move in the cleaning solution D in the direction perpendicular to the dividing plane C; specifically, the solar cell carrier, which transports the sliced solar cells 200, moves in the cleaning solution D in a direction perpendicular to the dividing plane C.
By such a manner of cleaning after division, the sliced solar cell 200 can be cleaned of the division surface C while moving, and the cleaning efficiency is high, and the method is suitable for mass cleaning.
In some embodiments, only a portion of the sliced solar cell sheet 200 is immersed in the cleaning liquid D, and the dividing plane C includes an immersion region C2 and an exposed region C1; while the sliced solar cell 200 is moving in the cleaning liquid D in the direction perpendicular to the dividing plane C, the cleaning liquid D contacts the exposed region C1. Since the sliced solar cell pieces 200 move in the cleaning liquid D in the direction perpendicular to the dividing plane C, a part of the liquid surface is stirred up to contact the exposed region C1 of the dividing plane C by the cleaning liquid D pushed by the sliced solar cell pieces 200, and complete cleaning of the dividing plane C is achieved. By thus immersing the sliced solar cell 200 only partially in the cleaning solution D, the sliced solar cell 200 can be immersed in the cleaning solution D as little as possible, and damage of the cleaning solution D to the film layers of the sliced solar cell 200 other than the dividing plane C (including the side wall of the sliced solar cell 200 facing the dividing plane C, the side wall of the sliced solar cell 200 perpendicular to the dividing plane C, and the film layers not immersed in the cleaning solution D) can be minimized.
In the present embodiment, the rate of movement of the sliced solar cell 200 in the cleaning liquid D in the direction perpendicular to the dividing plane C is 0.5m/min to 2m/min, and may be, for example, 0.5m/min, 1m/min, 1.5m/min, or 2 m/min; if the rate is less than 0.5m/min, a film layer (e.g., a transparent conductive layer) in the sliced solar cell 200, which is in contact with the cleaning solution D, may be corroded and damaged due to the long-term contact with the cleaning solution D of the mixed acid solution due to the increase of the reaction time; if the rate is more than 2m/min, the reaction time is too short to sufficiently treat the cleavage plane C. The moving speed of the sliced solar cell 200 in the cleaning liquid D along the direction vertical to the dividing surface is 0.5m/min-2 m/min; the method can balance between effective treatment of the dividing surface and the damage to the solar cell as little as possible. The cut solar cell sheet 200 has a longitudinal dimension of 0 to 50 μm in the exposed region, and may be, for example, 0, 10 μm, 20 μm, 30 μm, 40 μm, or 50 μm. If the longitudinal dimension of the sliced solar cell 200 in the exposed area is less than 0, the sliced solar cell 200 is completely immersed in the cleaning solution, and the mixed acid solution may cause more damage to the film layer in the cleaning process; if the longitudinal dimension of the sliced solar cell 200 in the exposed area is greater than 50 μm, the coverage of the sliced surface is insufficient, and the treatment effect on the residual fragments is not good; the longitudinal dimension of the sliced solar cell 200 in the exposed region is in the range of 0-50 μm, which balances efficient handling of the facets and minimal damage to the sliced solar cell.
In this embodiment, the cleaning solution D is a mixed solution of hydrofluoric acid, hydrochloric acid, and ozone; alternatively, the cleaning liquid D is a mixed solution of hydrofluoric acid and hydrochloric acid. The hydrofluoric acid can effectively oxidize the residual fragments to form oxides, and the hydrochloric acid can quickly dissolve and remove the oxides to realize cleaning; ozone has oxidizing power different from that of hydrofluoric acid, and can accelerate oxidation by adding ozone, so that residual fragments can be removed more thoroughly, and the repairing effect of the cutting surface is better.
In the cleaning liquid D, the concentration of hydrogen fluoride may be 0.5% to 3% by mass, for example, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%; the concentration of hydrogen chloride may be, for example, 0.01%, 0.05%, 0.1%, 0.2%, 0.5%, 0.8%, 1% by mass or more, and is 0.01% to 1% by mass or less; the temperature of the cleaning solution is 20 ℃ to 25 ℃, and may be, for example, 20 ℃, 21 ℃, 22 ℃, 23 ℃, 24 ℃ and 25 ℃.
When the cleaning solution D is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of ozone in the cleaning solution is 5-100 PPM, such as 5PPM, 10PPM, 25PPM, 50PPM, 75PPM and 100 PPM.
The cleaning time of the division surface C in the cleaning liquid D is 10s to 120s, and may be, for example, 10s, 20s, 30s, 60s, 90s, or 120 s.
By adopting the conditions, the residual fragments of the transparent conducting layer can be effectively removed, the cutting surface can be repaired, and the photoelectric conversion efficiency of the solar cell piece can be improved.
In other embodiments, the cleaning solution D is a phosphoric acid solution, and the phosphoric acid has a concentration of 5% to 30% by mass, for example, 5%, 10%, 15%, 20%, 25%, 30%; the cleaning time of the division surface C in the cleaning liquid D is 180s-1200s, and may be, for example, 180s, 360s, 720s, or 1200 s. By adopting the conditions, the residual fragments of the transparent conducting layer can be effectively removed and the dividing surface can be repaired, namely, the photoelectric conversion efficiency of the solar cell is improved.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (10)
1. A manufacturing method of a solar cell is characterized by comprising the following steps:
forming an original solar cell, wherein the original solar cell comprises a transparent conducting layer;
dividing the original solar cell to form at least two sliced solar cells;
cleaning at least the dividing surface of the sliced solar cell by adopting a wet cleaning process;
and forming a grid line electrode on the surface of the sliced solar cell after the wet cleaning process is carried out.
2. The method for manufacturing the solar cell piece according to claim 1, wherein the step of cleaning the sliced solar cell piece by using a wet cleaning process comprises:
providing a cleaning solution;
arranging the sliced solar cell above the liquid level of the cleaning liquid and arranging the dividing surface to face the liquid level of the cleaning liquid;
after the dividing surface is arranged to face the liquid level of the cleaning liquid, at least part of the sliced solar cell is immersed into the cleaning liquid in the direction from the dividing surface to the liquid level of the cleaning liquid, so that the dividing surface is completely immersed into the cleaning liquid;
and immersing at least part of the sliced solar cell into the cleaning solution, and then immersing the dividing surface in the cleaning solution.
3. The method for manufacturing a solar cell sheet according to claim 2, wherein a distance between a liquid surface of the cleaning liquid and the dividing surface is 2mm to 5mm in the process of immersing the dividing surface in the cleaning liquid.
4. The method of manufacturing a solar cell sheet according to claim 1, wherein the side wall of the sliced solar cell sheet includes a dividing plane; the step of cleaning the sliced solar cell by adopting a wet cleaning process comprises the following steps:
providing a cleaning solution;
immersing at least part of the sliced solar cell in the cleaning liquid in a direction in which the dividing plane is perpendicular to the liquid level of the cleaning liquid;
after at least part of the sliced solar cell is immersed in the cleaning liquid in a direction that the dividing plane is perpendicular to the liquid level of the cleaning liquid, the sliced solar cell moves in the cleaning liquid in a direction that is perpendicular to the dividing plane;
preferably, only a part of the sliced solar cell is immersed in the cleaning solution, and the dividing surface comprises an immersion area and an exposure area; the cleaning liquid contacts the exposed region while the sliced solar cell is moving in the cleaning liquid in a direction perpendicular to the dividing plane.
5. The method for manufacturing a solar cell sheet according to claim 4, wherein the rate of movement of the sliced solar cell sheet in the cleaning liquid in a direction perpendicular to the dividing plane is 0.5m/min to 2 m/min;
the longitudinal dimension of the sliced solar cell in the exposed area is 0-50 μm.
6. The method for manufacturing a solar cell sheet according to claim 2 or 4,
the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone; or the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid;
in the cleaning solution, the mass percent concentration of the hydrogen fluoride is 0.5-3%; the mass percentage concentration of the hydrogen chloride is 0.01-1%;
the temperature of the cleaning liquid is 20-25 ℃;
when the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of the ozone in the cleaning solution is 5-100 PPM;
the cleaning time of the dividing surface in the cleaning liquid is 10-120 s.
7. The method for manufacturing a solar cell sheet according to claim 2 or 4,
the cleaning solution is phosphoric acid solution, and the mass percentage concentration of phosphoric acid is 5-30%;
the cleaning time of the dividing surface in the cleaning liquid is 180-1200 s.
8. The method for manufacturing a solar cell sheet according to claim 2,
the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone; or the cleaning solution is a mixed solution of hydrofluoric acid and hydrochloric acid;
in the cleaning liquid, the mass percent concentration of hydrogen fluoride is 2-5%, and the mass percent concentration of hydrogen chloride is 2-5%;
the temperature of the cleaning liquid is 20-25 ℃;
when the cleaning solution is a mixed solution of hydrofluoric acid, hydrochloric acid and ozone, the mass concentration of the ozone in the cleaning solution is 30-100 PPM;
the soaking treatment lasts for 120-600 s.
9. The method for manufacturing the solar cell sheet according to claim 2 or 4, wherein after the wet cleaning process is performed and before the grid line electrode is formed, the method for manufacturing the solar cell sheet further comprises:
carrying out first washing treatment on the sliced solar cell; and the number of the first and second groups,
and after the first water washing treatment, carrying out first drying treatment on the sliced solar cell.
10. The method for manufacturing a solar cell sheet according to claim 9,
after the first drying treatment is performed and before the grid line electrode is formed, the method for manufacturing the solar cell sheet further comprises the following steps: passivating the sliced solar cell;
preferably, the step of passivating the sliced solar cell includes: passivating the cutting surface by adopting passivation solution; the passivation solution contains ozone, and the mass concentration of the ozone is 30-300 PPM; the time of passivation treatment is 20s-180 s;
preferably, after the passivation treatment is performed and before the gate line electrode is formed, the method for manufacturing a solar cell sheet further includes:
carrying out second washing treatment on the sliced solar cell; and the number of the first and second groups,
and after the second washing treatment, performing second drying treatment on the sliced solar cell.
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