CN113411430A - Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device - Google Patents
Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device Download PDFInfo
- Publication number
- CN113411430A CN113411430A CN202110772511.5A CN202110772511A CN113411430A CN 113411430 A CN113411430 A CN 113411430A CN 202110772511 A CN202110772511 A CN 202110772511A CN 113411430 A CN113411430 A CN 113411430A
- Authority
- CN
- China
- Prior art keywords
- region
- cover plate
- manufacturing
- areas
- pits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 239000011521 glass Substances 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 238000005530 etching Methods 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims description 19
- 230000003746 surface roughness Effects 0.000 claims description 16
- 238000000889 atomisation Methods 0.000 claims description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 239000010410 layer Substances 0.000 claims description 7
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 4
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 4
- 238000005488 sandblasting Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000003754 machining Methods 0.000 claims description 3
- 238000007723 die pressing method Methods 0.000 claims description 2
- 238000010329 laser etching Methods 0.000 claims description 2
- 238000005498 polishing Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000003666 anti-fingerprint Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000013003 hot bending Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000005365 phosphate glass Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The application discloses a manufacturing method of an anti-glare cover plate, the anti-glare cover plate and an electronic device. The manufacturing method of the anti-dazzle cover plate comprises the steps of providing a glass substrate, wherein the glass substrate comprises a first surface and a second surface which are oppositely arranged, the first surface comprises a plurality of first areas and a plurality of second areas, and the first areas and the second areas are connected. A plurality of pits are formed on the plurality of first areas. Etching the first area and the second area by using an etching solution to form a first frosted surface on the first area and a second frosted surface on the second area, thereby obtaining the anti-glare cover plate; wherein the roughness of the first frosted surface is greater than the roughness of the second frosted surface. The anti-dazzle cover plate is manufactured by the manufacturing method. Therefore, the anti-dazzle cover plate has the anti-dazzle effect of different areas, is unique and novel in appearance, has relatively fine hand feeling while preventing fingerprints, and is simple in manufacturing process and low in cost.
Description
Technical Field
The application relates to the technical field of anti-glare glass, in particular to a manufacturing method of an anti-glare cover plate, the anti-glare cover plate and an electronic device.
Background
At present, the anti-glare glass can not only increase the aesthetic feeling for space decoration, but also can enable the shell of the electronic device to have the anti-glare effect when being applied to the shell of the electronic device, but also can not meet the pursuit of users on the rich and various appearance effects of the shell.
Disclosure of Invention
The embodiment of the application provides a manufacturing method of an anti-dazzle cover plate, the anti-dazzle cover plate and an electronic device.
The manufacturing method of the anti-glare cover plate comprises the following steps:
providing a glass substrate, wherein the glass substrate comprises a first surface and a second surface which are oppositely arranged, the first surface comprises a plurality of first areas and a plurality of second areas, and the first areas are connected with the second areas;
forming a plurality of pits on a plurality of the first areas;
etching the first region and the second region with an etching solution to form a first frosted surface on the first region and a second frosted surface on the second region, thereby obtaining the anti-glare cover plate; wherein the roughness of the first sanding surface is greater than the roughness of the second sanding surface.
The anti-glare cover plate according to the embodiment of the present invention is manufactured by the method for manufacturing the anti-glare cover plate according to the embodiment.
The electronic device of the embodiment of the present application includes a main body and the anti-glare cover plate of the above embodiment. The anti-dazzle cover plate covers the main body.
In the method for manufacturing the anti-glare cover plate, the anti-glare cover plate and the electronic device, the first region on the first surface of the glass substrate can be pretreated to form the plurality of pits, and then the first region and the second region are etched by the etching solution, so that the first frosted surface and the second frosted surface with different roughness are formed on the first region and the second region, and the anti-glare cover plate with the combined anti-glare effect is obtained.
Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.
Drawings
The above and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic flow chart illustrating a method of manufacturing an anti-glare cover sheet according to an embodiment of the present disclosure;
FIG. 2 is an initial cross-sectional schematic view of a glass substrate according to an embodiment of the present application;
FIG. 3 is a schematic cross-sectional view of a glass substrate according to an embodiment of the present invention in which a pit is formed;
FIG. 4 is a schematic perspective view of an anti-glare cover sheet according to an embodiment of the present application;
FIG. 5 is a schematic flow chart illustrating a method of manufacturing an anti-glare cover sheet according to an embodiment of the present disclosure;
FIG. 6 is a schematic flow chart illustrating a method of manufacturing an anti-glare cover sheet according to an embodiment of the present disclosure;
FIG. 7 is a further schematic flow chart illustrating a method of fabricating an anti-glare cover panel in accordance with an embodiment of the present disclosure;
fig. 8 is a schematic perspective view of an electronic device according to an embodiment of the present application.
Description of the main element symbols:
the anti-glare cover plate comprises a glass substrate 10, a first surface 11, a second surface 12, a first region 111, pits 1111, a second region 112, an anti-glare cover plate 20, a first frosted surface 21, a second frosted surface 22, an electronic device 100 and a main body 30.
Detailed Description
Reference will now be made in detail to embodiments of the present application, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative and are only for the purpose of explaining the present application and are not to be construed as limiting the present application.
The following disclosure provides many different embodiments or examples for implementing different features of the application. In order to simplify the disclosure of the present application, specific example components and arrangements are described below. Of course, they are merely examples and are not intended to limit the present application. Moreover, the present application may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, examples of various specific processes and materials are provided herein, but one of ordinary skill in the art may recognize applications of other processes and/or use of other materials.
Referring to fig. 1 to 4, a method for manufacturing an anti-glare cover sheet 20 according to an embodiment of the present disclosure includes:
s10: providing a glass substrate 10, wherein the glass substrate 10 comprises a first surface 11 and a second surface 12 which are oppositely arranged, the first surface 11 comprises a plurality of first areas 111 and a plurality of second areas 112, and the first areas 111 are connected with the second areas 112;
s30: a plurality of pits 1111 are formed on the plurality of first areas 111;
s50: etching the first region 111 and the second region 112 using an etching solution to form a first frosted surface 21 in the first region 111 and a second frosted surface 22 in the second region 112, thereby obtaining the anti-glare cover sheet 20; wherein the roughness of the first sanding surface 21 is greater than the roughness of the second sanding surface 22.
In the method for manufacturing the anti-glare cover plate 20, the anti-glare cover plate 20 and the electronic device 100 according to the embodiment of the present disclosure, the first region 111 on the first surface 11 of the glass substrate 10 may be pre-treated to form the plurality of pits 1111, and then the first region 111 and the second region 112 may be etched by the etching solution to form the first frosted surface 21 and the second frosted surface 22 having different roughness on the first region 111 and the second region 112, so as to obtain the anti-glare cover plate 20 having the combined anti-glare effect.
"glare" is a poor lighting phenomenon, which makes people not see objects in front of eyes clearly when the brightness of a light source is extremely high or the brightness difference between the background and the center of the visual field is large, and has a great influence on the visual health. "anti-dazzle" can be through carrying out certain dull polish processing at the glass surface for the glass surface becomes roughly, and then can make light produce diffuse reflection on the glass surface when light shines, reduces the light of penetrating the eye directly, makes light soft and not dazzling, can play the effect of protection vision. The anti-glare may be achieved in other ways, of course, the present application is not limited thereto,
as shown in fig. 2, in step S10, the glass substrate 10 may be a rectangular glass plate, the glass substrate 10 may be, but not limited to, cut according to a preset size, and the specific shape, material amount, etc. may be selected according to actual situations. The glass substrate 10 may be a silicate glass, for example, quartz glass, high silica glass, soda lime glass, aluminosilicate glass, borosilicate glass, or the like. Of course, the glass substrate 10 may be a borate glass, a phosphate glass, or the like. Furthermore, the glass substrate 10 can have better wear resistance and higher strength, and can better satisfy the use requirements of the electronic device 100.
In some embodiments, the specific structural configuration of the glass substrate 10 may be a 2D glass configuration or a 2.5D glass configuration, and further, in order to make the structural configuration of the subsequent anti-glare cover plate 20 more abundant and meet more shape requirements, the glass substrate 10 may be formed into a 3D glass substrate 10 through a hot bending process. The first surface 11 may be a convex surface of the 3D glass substrate 10, and the second surface 12 may be a concave surface of the 3D glass substrate 10.
In order to enable the anti-glare cover 20 to exhibit various different effects and to increase the variety of appearances of the anti-glare cover 20, a plurality of first regions 111 and second regions 112 are formed on the first surface 11. The shape of the first region 111 and the second region 112 may be a regular geometric shape, for example, a rectangle, a triangle, a circle, an ellipse, etc., and the first region 111 and the second region 112 are arranged on the first surface 11 at a splice or a space. Of course, the shape of the first region 111 and the second region 112 may also be irregular, for example, the outline of the first region 111 may be any shape or pattern surrounded by straight lines and curved lines, and the second region 112 is a region of the first surface 11 except the first region 111. The present application is not limited to the specific shape of the first region 111 and the second region 112.
As shown in fig. 3, in step S30, a plurality of pits 1111 are formed on the first region 111, and further, compared with the unprocessed second region 112, the surface roughness of the first region 111 is greater than that of the second region 112, so that the anti-glare cover plate 20 can have a combined anti-glare effect, and the appearance effect is enriched, and meanwhile, by arranging the surfaces with different roughness, the anti-glare cover plate 20 can have a better anti-fingerprint property and a finer hand feeling, and the manufacturing process is simple and the cost is low. The shape of the pits 1111 may be any shape such as circular, rectangular, and a combination thereof. The pits 1111 may be uniformly distributed on the first area 111, but may be non-uniformly distributed according to actual requirements. The shape and distribution of the pits 1111 are not limited in this application.
As shown in fig. 4, in step S50, the etching solution contains an acidic chemical, and the main chemical composition of the glass substrate 10 is SiO2. SiO in glass substrate 102Capable of reacting chemically with acidic compounds, wherein, due to SiO2Forming a silicate with the acidic compound, the silicate being capable of adhering to the surface of the glass substrate 10, and the acidic compound being capable of corroding only the surface layer of the glass substrate 10, the adhesion of the silicate being capable of preventing the acidic compound from continuing to adhere to SiO in the surface layer2And (4) reacting. The surface of the glass substrate 10 is etched to form an uneven surface, i.e., the first region 111 forms the first frosted surface 21 and the second region 112 forms the second frosted surface 22. The roughness of the first region 111 is greater than the roughness of the second region 112, and thus the roughness of the first sanding surface 21 is greater than the roughness of the second sanding surface 22.
Meanwhile, as the plurality of pits 1111 are formed in the first region 111, the pits 1111 can provide nucleation points for insoluble salt crystals generated in etching, the nucleation points are convenient for the adhesion of the insoluble salt crystals, so that the energy generated by the crystals is reduced, the time for generating the crystals is shortened, the etching of the etching solution in the first region 111 is more uniform and comprehensive, and the condition of underetching is not easy to occur. Physical lattice defects are increased by forming the pits, so that the uneven state of the lattice defects generated by single chemical etching can be effectively compensated, and the appearance uniformity of the formed frosted surface is better.
The glass substrate 10 etched by the etching solution is appropriately processed to form the desired anti-glare cover plate 20.
Referring to fig. 5, in some embodiments, before step S30, the method for manufacturing the anti-glare cover sheet 20 further includes:
s20: spraying an ink protective layer on the second area 112 and the second surface 12;
before step S50, the method for manufacturing the anti-glare cover sheet 20 further includes:
s40: and removing the ink protective layer.
In this way, the ink protection layer can protect the glass substrate 10 from affecting the second region 112 and the second surface 12 when the pits 1111 are formed in the first region 111.
Specifically, the ink in the ink protective layer may include at least one of a photo-curable ink or a thermal-curable ink. In step S20, the ink sprayed on the second area 112 and the second surface 12 can be cured to form an ink protection layer on the surface after being irradiated with light or heated. When the pits 1111 are formed in the first region 111 in a chemical manner, the ink has better chemical stability and does not participate in the reaction; when the first region 111 physically forms the pits 1111, the ink can distinguish the first region 111 from the second region 112 to prevent the pits 1111 from being formed on the second region 112 and the second surface 12.
In step S40, the ink protection layer on the second region 112 needs to be removed before etching the glass substrate 10 on which the pits 1111 are formed, but if the second surface 12 needs to be etched as well, the ink protection layer on the second surface 12 is also removed. The method of removing the ink is not limited in the present application, and the glass substrate 10 may not be damaged, and for example, the glass substrate may be cleaned with ammonia solution.
Referring to fig. 6, in some embodiments, step S30 includes:
s31: the first region 111 is processed by at least one of sand blasting, numerical control processing, die pressing, and laser etching to form a plurality of pits 1111 in the first region 111.
In step S31, the pits 1111 of the first area 111 may be formed in various ways. For example, the pits 1111 on the first region 111 may be formed by sand blasting. After the ink protection layer is sprayed on the second region 112 and the second surface 12 of the glass substrate 10, the surface of the first region 111 is sandblasted for 3S with a sandblasting distance of 50cm using 240# brown emery, and then the sandblasted surface is cleaned to remove the remaining sand and impurities, thereby forming a plurality of pits 1111 in the first region 111. Then removing the ink protection layer, and etching the glass substrate 10; the pits 1111 in the first region 111 may also be formed by machining using numerical control machining. The glass substrate 10 is placed in a numerical control machine, the range of the first region 111 is inputted, and the numerical control machine is precisely adjusted, so that a plurality of pits 1111 are formed in the first region 111. Then, the glass substrate 10 is removed from the nc machine tool, and the etching operation is performed on the glass substrate 10.
Of course, in some embodiments, the pits 1111 in the first area 111 may also be formed by matching in various ways, and the application is not limited to the formation way of the pits 1111.
Referring to fig. 3 and 4, in some embodiments, the plurality of first regions 111 and the plurality of second regions 112 are sequentially arranged at intervals.
Thus, the first region 111 and the second region 112 can be arranged and combined in different ways, so that the anti-glare shell has richer and more diversified appearances, and can meet the requirements of more users.
Specifically, the roughness of the first region 111 is relatively large, so that the fingerprint prevention effect can be better achieved; the roughness of the second region 112 is small, so that the second region can have anti-glare and finer hand feeling; the two can make the outward appearance of anti-dazzle apron 20 have more selectivity with arbitrary mode's combination, can arrange according to user's actual demand, satisfies user's operation requirement.
In some embodiments, the pits 1111 are micron-scale pits.
The radial size of the pits 1111 should not be too large, and too large a radial size may cause too large roughness and affect the hand feeling of the user, and too large a radial size may weaken the anti-glare effect. By "micron-sized pits" it is understood that the largest radial dimension of the pits 1111 is in micron-sized. The "radial dimension" may be understood as the distance between any two points on the contour of the dimple 1111.
In some embodiments, the radial dimension of the pits 1111 is less than 2 μm. For example, the radial size of the pits 1111 may be 1.8 μm, 1.6 μm, 1.4 μm, 0.8 μm, etc., and the present application is not limited thereto.
Referring to fig. 3 and 4, in some embodiments, the first abrasive surface 21 has a surface roughness of 1.5 to 3.0 μm and an atomization level of 75 to 90%, and the second abrasive surface 22 has a surface roughness of 0.1 to 0.35 μm and an atomization level of 70 to 80%.
The surface roughness refers to the small distance formed by deformation of a processing surface and the unevenness of tiny peaks and valleys, and the distance between adjacent peaks and valleys is small and belongs to microscopic geometric shape errors. Wherein the smaller the surface roughness, the smoother the surface.
The "fogging degree" may be a ratio of a scattered light flux to a transmitted light flux that is transmitted through the antiglare cover sheet 20 to deviate from the incident light direction. Wherein the greater the degree of fogging, the more blurred the view seen through the anti-glare cover 20.
In some embodiments, the etching solution includes: 15-45 parts of ammonium bifluoride, 1-5 parts of hydrochloric acid, 0-15 parts of sulfuric acid and 3-10 parts of hydrofluoric acid, and the balance of deionized water.
In one embodiment, the etching solution may include 35 parts by weight of ammonium bifluoride, 5 parts by weight of hydrochloric acid, 0 part by weight of sulfuric acid, 8 parts by weight of hydrofluoric acid, and 52 parts by weight of deionized water.
After the glass substrate 10 with the pits 1111 formed in the first region 111 is etched by the etching solution in the ratio, the surface roughness of the first frosted surface 21 may be 1.6-2.2 μm, and the degree of atomization may be 80 ± 5%, for example, the surface roughness of the first frosted surface 21 is 1.5 μm, and the degree of atomization is 83%; the second sanding surface 22 may have a surface roughness between 0.15 and 0.25 μm and a degree of atomization of 75 ± 3%, for example, the second sanding surface 22 may have a surface roughness of 0.18 μm and a degree of atomization of 77%.
In another embodiment, the etching solution may include 30 parts by weight of ammonium bifluoride, 5 parts by weight of hydrochloric acid, 8 parts by weight of sulfuric acid, 5 parts by weight of hydrofluoric acid, and 52 parts by weight of deionized water.
After the glass substrate 10 with the pits 1111 formed in the first region 111 is etched by the etching solution in the ratio, the surface roughness of the first frosted surface 21 may be 2.2-3.0 μm, and the degree of atomization may be 85 ± 5%, for example, the surface roughness of the first frosted surface 21 is 2.8 μm, and the degree of atomization is 88%; the second sanding surface 22 may have a surface roughness of between 0.2 and 0.35 μm and a degree of atomization of 78 ± 3%, for example, the second sanding surface 22 may have a surface roughness of 0.28 μm and a degree of atomization of 80%.
The specific weight proportion of the etching solution is not limited, and the etching solution can be matched according to actually required roughness and atomization degree.
Referring to fig. 7, in some embodiments, the method for manufacturing the anti-glare cover sheet 20 further includes:
s60: the anti-glare cover sheet 20 is subjected to a polishing process.
The surface of the anti-glare cover plate 20 corroded by the etching solution may have sharp crystals, and thus a user may have a bad hand-scraping experience during use. Further, after the etching solution is corroded, the anti-glare cover plate 20 still needs to be polished. Of course, in some other embodiments, the method for manufacturing the anti-glare cover 20 further includes performing hole opening, finishing, and the like on the anti-glare cover 20, which is not limited in this application.
Referring to fig. 4, the anti-glare cover 20 according to the embodiment of the present disclosure is manufactured by the method for manufacturing the anti-glare cover 20 according to the above embodiment. Thus, the anti-glare cover sheet 20 manufactured by the above-described manufacturing method can have multiple effects. According to the difference of the surface roughness of the anti-glare cover plate 20, the anti-glare cover plate 20 has novel and unique appearance while having anti-glare, so that a user can have more use experiences.
Referring to fig. 8, an electronic device 100 according to an embodiment of the present disclosure includes a main body 30 and an anti-glare cover 20 according to the above embodiment, wherein the anti-glare cover 20 is disposed over the main body 30.
The anti-glare cover plate 20 can be coated outside the main body 30, so that the main body 30 can be protected, and meanwhile, the anti-glare cover plate 20 after the steps of grinding, polishing and the like has certain attractiveness while preventing glare. The electronic device 100 includes, but is not limited to, an electronic device with a protective housing, such as a mobile phone, a tablet computer, a wearable device (e.g., a smart watch), and the like. Taking a mobile phone as an example, the main body 30 may include a middle frame and a display screen, and the anti-glare cover 20 may be a rear case of the mobile phone or a cover of the display screen, which is not limited herein.
In the description herein, references to the description of the terms "one embodiment," "certain embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present application have been shown and described, it will be understood by those of ordinary skill in the art that: numerous changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the application, the scope of which is defined by the claims and their equivalents.
Claims (11)
1. A method for manufacturing an anti-glare cover plate is characterized by comprising the following steps:
providing a glass substrate, wherein the glass substrate comprises a first surface and a second surface which are oppositely arranged, the first surface comprises a plurality of first areas and a plurality of second areas, and the first areas are connected with the second areas;
forming a plurality of pits on a plurality of the first areas;
etching the first region and the second region with an etching solution to form a first frosted surface on the first region and a second frosted surface on the second region, thereby obtaining the anti-glare cover plate; wherein the roughness of the first sanding surface is greater than the roughness of the second sanding surface.
2. The method of manufacturing according to claim 1, wherein before said forming a plurality of pits on a plurality of said first areas, said method of manufacturing further comprises:
spraying an ink protective layer on the second area and the second surface;
before the etching the first region and the second region with the etching liquid to form a first frosted surface on the first region and a second frosted surface on the second region, the manufacturing method further includes:
and removing the ink protection layer.
3. The method of manufacturing according to claim 1, wherein said forming a plurality of pits on a plurality of said first areas comprises:
processing the first region by at least one of sand blasting, numerical control machining, die pressing, and laser etching to form a plurality of the pits on the first region.
4. The method according to claim 1, wherein the plurality of first regions and the plurality of second regions are arranged in sequence at intervals.
5. The method of claim 1, wherein the dimples are micro-scale dimples.
6. The method of claim 5, wherein the radial dimension of the pits is less than 2 μm.
7. The method of claim 1, wherein the first abrasive surface has a surface roughness of 1.5 to 3 μm and an atomization level of 75 to 90%, and the second abrasive surface has a surface roughness of 0.1 to 0.35 μm and an atomization level of 70 to 80%.
8. The method of claim 1, wherein the etching solution comprises:
15-45 parts by weight of ammonium bifluoride;
1-5 parts by weight of hydrochloric acid;
0-15 parts by weight of sulfuric acid;
3-10 parts by weight of hydrofluoric acid;
the rest of the components are deionized water.
9. The method of manufacturing of claim 1, further comprising:
and polishing the anti-dazzle cover plate.
10. An anti-glare cover sheet manufactured by the manufacturing method of any one of claims 1 to 9.
11. An electronic device, comprising:
a main body; and
the anti-glare cover of claim 10, wherein the anti-glare cover is disposed over the body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110772511.5A CN113411430A (en) | 2021-07-08 | 2021-07-08 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110772511.5A CN113411430A (en) | 2021-07-08 | 2021-07-08 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113411430A true CN113411430A (en) | 2021-09-17 |
Family
ID=77685592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110772511.5A Pending CN113411430A (en) | 2021-07-08 | 2021-07-08 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113411430A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113772955A (en) * | 2021-09-14 | 2021-12-10 | Oppo广东移动通信有限公司 | Processing method, cover plate and electronic device |
| CN115028370A (en) * | 2022-07-05 | 2022-09-09 | 杭州老板电器股份有限公司 | Textured glass panel, method of making and use thereof |
| CN115284178A (en) * | 2022-07-08 | 2022-11-04 | 中国科学院光电技术研究所 | Low-cost preparation method of high-integration-level laser scattering device |
| WO2023134355A1 (en) * | 2022-01-17 | 2023-07-20 | 比亚迪股份有限公司 | Flash glass and preparation method therefor, and electronic device housing |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105693101A (en) * | 2014-11-24 | 2016-06-22 | 联想(北京)有限公司 | Glass processing method |
| CN107002272A (en) * | 2014-11-21 | 2017-08-01 | 夏普株式会社 | Mould, the manufacture method of mould, the manufacture method of antireflection film and antireflection film |
| CN110267925A (en) * | 2017-01-30 | 2019-09-20 | 康宁股份有限公司 | Texturing glass surface and its manufacturing method with low flash of light |
| CN110561962A (en) * | 2019-09-19 | 2019-12-13 | 华为技术有限公司 | workpiece, preparation method of workpiece, shell and electronic equipment |
| CN111586221A (en) * | 2020-05-25 | 2020-08-25 | Oppo广东移动通信有限公司 | Shell assembly, preparation method thereof and electronic equipment |
-
2021
- 2021-07-08 CN CN202110772511.5A patent/CN113411430A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107002272A (en) * | 2014-11-21 | 2017-08-01 | 夏普株式会社 | Mould, the manufacture method of mould, the manufacture method of antireflection film and antireflection film |
| CN105693101A (en) * | 2014-11-24 | 2016-06-22 | 联想(北京)有限公司 | Glass processing method |
| CN110267925A (en) * | 2017-01-30 | 2019-09-20 | 康宁股份有限公司 | Texturing glass surface and its manufacturing method with low flash of light |
| CN110561962A (en) * | 2019-09-19 | 2019-12-13 | 华为技术有限公司 | workpiece, preparation method of workpiece, shell and electronic equipment |
| CN111586221A (en) * | 2020-05-25 | 2020-08-25 | Oppo广东移动通信有限公司 | Shell assembly, preparation method thereof and electronic equipment |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113772955A (en) * | 2021-09-14 | 2021-12-10 | Oppo广东移动通信有限公司 | Processing method, cover plate and electronic device |
| WO2023134355A1 (en) * | 2022-01-17 | 2023-07-20 | 比亚迪股份有限公司 | Flash glass and preparation method therefor, and electronic device housing |
| CN115028370A (en) * | 2022-07-05 | 2022-09-09 | 杭州老板电器股份有限公司 | Textured glass panel, method of making and use thereof |
| CN115284178A (en) * | 2022-07-08 | 2022-11-04 | 中国科学院光电技术研究所 | Low-cost preparation method of high-integration-level laser scattering device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN113411430A (en) | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device | |
| TWI788339B (en) | Manufacturing method of processed member, plate member, and opening member | |
| EP3984971A1 (en) | Housing assembly, preparation method therefor, and electronic device | |
| TWI579250B (en) | Anti-glare glass sheet having compressive stress equipoise and methods thereof | |
| CN105263877B (en) | Method and its product for control of glistening | |
| US20150175478A1 (en) | Textured glass surface and methods of making | |
| CA2341189C (en) | Diffuser master and method of manufacture | |
| WO2021238349A1 (en) | Housing assembly and preparation method therefor, and electronic device | |
| WO2021052457A1 (en) | Workpiece, method for preparing workpiece, housing, and electronic device | |
| JP2017001940A (en) | Glass substrate and method for producing the same, cover glass and method for producing the same, portable information terminal, and display device | |
| JP2016190786A (en) | Glass substrate and manufacturing method therefor | |
| TWI698403B (en) | Glass article comprising light extraction features and methods for making the same | |
| CN107265882B (en) | Processing method of glass cover plate and mobile terminal | |
| US10081569B2 (en) | Process for producing glass substrate, and glass substrate | |
| CN113800776B (en) | Shell assembly, preparation method thereof and mobile terminal | |
| CN110740597A (en) | Shell, preparation method and electronic equipment | |
| CN113973456A (en) | Shell, shell preparation method and electronic equipment | |
| JP7305982B2 (en) | Concavo-convex glass substrate and manufacturing method thereof | |
| CN105579409B (en) | The method of cutting and chamfering strengthened glass | |
| JP2018030231A (en) | Mold having uneven surface structure and manufacturing method therefor, and manufacturing method of antiglare resin structure using the mold | |
| CN115477475A (en) | Glass with haze and smoothness and preparation method thereof | |
| CN118026539A (en) | Transparent substrate processing method, transparent substrate and household appliance | |
| CN110834233A (en) | Polishing method for surface of to-be-polished piece, glass piece, application of glass piece and polishing jig | |
| JP2005201890A (en) | Manufacturing method of indication plate,indication plate,and time measuring device | |
| CN101178444A (en) | Optical lenticular manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |