CN115284178A - Low-cost preparation method of high-integration-level laser scattering device - Google Patents
Low-cost preparation method of high-integration-level laser scattering device Download PDFInfo
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- CN115284178A CN115284178A CN202210799890.1A CN202210799890A CN115284178A CN 115284178 A CN115284178 A CN 115284178A CN 202210799890 A CN202210799890 A CN 202210799890A CN 115284178 A CN115284178 A CN 115284178A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 21
- 239000011521 glass Substances 0.000 claims abstract description 83
- 238000005530 etching Methods 0.000 claims abstract description 64
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000007788 liquid Substances 0.000 claims abstract description 25
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000005488 sandblasting Methods 0.000 claims abstract description 22
- 238000005516 engineering process Methods 0.000 claims abstract description 16
- 238000005482 strain hardening Methods 0.000 claims abstract description 13
- 238000009826 distribution Methods 0.000 claims description 9
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000005304 optical glass Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 239000005337 ground glass Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 3
- 238000005422 blasting Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000002560 therapeutic procedure Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses a low-cost preparation method of a high-integration laser scattering device, which comprises the following steps: (1) Forming a random fine structure on the surface of a glass substrate by a sand blasting or sanding technology of a glass cold working process; (2) Etching the glass by using etching liquid containing hydrofluoric acid; (3) The etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, and the preparation of the scattering device is completed. The process for preparing the scattering device is simple, the manufacturing cost is low, the prepared structure is a continuous surface type device, the scattering device can be used for scattering laser with different wavelengths, and the energy utilization rate and the practical value are high.
Description
Technical Field
The invention relates to the field of laser beam regulation and control, in particular to a low-cost preparation method of a high-integration laser scattering device.
Background
Since the advent of laser, laser sources have shown extremely important development activities and potentials, and are widely used in research fields such as material processing, information transmission, projection lithography, biomedical therapy, and the like due to their characteristics of high coherence, high power, narrow directivity, narrow emission spectral range, and the like. In some special emerging research fields, for example, emerging quantum correlation imaging technology is combined with laser, and an image of an object is indirectly reconstructed through correlation calculation of a laser speckle field, so that the laser has cloud penetrating and fog penetrating imaging capabilities, and has a wide application prospect. In this application field, the laser needs to be modulated in advance to form a randomly distributed speckle field with high energy utilization rate and no zero-order strong points. There are two common methods of generating randomly distributed speckle fields, one of which is to modulate the laser through ground glass. The ground glass is formed by grinding glass sand with a certain size on the surface of smooth glass, and has strong scattering property when laser irradiates the surface of the ground glass, so that randomly distributed speckle distributions can be generated when different positions of the ground glass are irradiated by the laser. But because the light is dispersed in the 2 pi space, a large part of light energy can not be utilized, and the energy utilization rate of the light source is greatly reduced. Another approach is to modulate the phase of the laser light by a diffractive optical element to produce random speckle. However, one relief structure of the diffractive element can only generate one speckle pattern in a distribution mode, and if a randomly distributed speckle pattern is to be generated, different diffractive optical element structures need to be designed. For the special application field of quantum correlation imaging, tens of thousands of different relief structures need to be designed, and the arrangement mode of the structures is processed, so that huge calculation amount exists, and time and labor are consumed. Meanwhile, the diffractive optical element is designed aiming at a single wavelength, when the diffractive optical element is used for laser modulation outside the designed wavelength, a zero-order strong point can be generated in the center of a speckle light field, the whole light field cannot be used, a new diffractive optical element needs to be designed and prepared aiming at new laser wavelength, and the cost is extremely high.
Disclosure of Invention
The invention aims to solve the technical problems that: the method overcomes the defects of low light energy utilization rate, time and labor consumption in design, suitability for single wavelength and the like in the existing laser modulation technology, provides a low-cost preparation method of a high-integration laser scattering device, and is used for developing a refraction type high-integration laser scattering device with high light energy utilization rate and suitability for a broadband.
The technical scheme adopted by the invention for solving the technical problems is as follows:
a low-cost preparation method of a high-integration laser scattering device comprises the following steps:
forming a random fine structure on the surface of a glass substrate by sand blasting or frosting technology of a glass cold working process;
etching the glass by using an etching solution containing hydrofluoric acid;
and (3) etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the scattering device is prepared.
Wherein, random fine structures are formed on the surface of the glass substrate in the step (1) by sand blasting or frosting technology of a glass cold working process, wherein the glass substrate can be different optical glass, and K9, soda glass or quartz can be selected.
Wherein, random fine structures are formed on the surface of the glass substrate by sand blasting or sanding technology of a glass cold working process in the step (1), wherein the roughness of the surface of the glass substrate can be changed by changing the particles, the jet flow or the time of sand blasting so as to form random fine structures with different distributions.
Wherein, random fine structures are formed on the surface of the glass substrate by sand blasting or sanding technology of a glass cold working process in the step (1), wherein the diameter of abrasive particles in the sanding technology can be changed to change the roughness of the surface of the glass substrate so as to form random fine structures with different distributions.
And (3) etching the glass by using an etching solution containing hydrofluoric acid in the step (2), wherein the surface quality of the prepared structure can be improved by adding dilute nitric acid, concentrated sulfuric acid or fluoride in the etching solution.
In the step (2), the etching liquid containing hydrofluoric acid is used for etching the glass, and the etching rate is related to the proportion of the etching liquid.
And (4) in the step (3), etching liquid infiltrates and erodes the surface of the glass substrate through the fine structure to form a randomly distributed continuous surface structure, the preparation of the scattering device is completed, and the random fine structure on the surface of the glass is etched into a continuous surface pit structure when the etching is completed.
And (4) in the step (3), the etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the preparation of the scattering device is completed, the etching time can be changed, and the preparation of the scattering devices with different divergence angles is completed.
The invention has the beneficial effects that:
the problems that the utilization rate of light energy is low, the design of a diffraction element consumes time and labor, and the device is limited to single-wavelength laser application in the technology of generating speckles by ground glass are solved through the developed refraction type scattering device. The refractive laser scattering device has high light energy utilization rate, greatly saves energy, contributes a part of force for the sustainable development of the society, and has simple preparation process and low preparation cost, and the prepared structure can be used for a wide waveband and has high practical value.
Drawings
FIG. 1 is a process flow for device fabrication in the examples;
FIG. 2 shows the microstructure of the surface of the glass substrate after sandblasting in the examples;
FIG. 3 is a microstructure of a glass surface when etching was not completed in the examples;
FIG. 4 is a microstructure of the glass surface after short etching in the examples;
FIG. 5 is a microstructure of a glass surface after long etching in the examples;
FIG. 6 is a scattering pattern of the microstructure of the glass surface after a short etching time by the laser in the examples.
Detailed Description
The invention is described in detail below with reference to the drawings and the detailed description. The following examples are only for explaining the present invention, the scope of the present invention shall include the full contents of the claims, and those skilled in the art can realize the full contents of the claims by the following examples.
The invention relates to a low-cost preparation method of a high-integration laser scattering device, which comprises the following steps of:
forming a random fine structure on the surface of a glass substrate by sand blasting or frosting technology of a glass cold working process;
random microstructures are formed on the surface of a glass substrate by a glass cold working process sand blasting or frosting technique, wherein the glass substrate can be different optical glass, such as K9, soda glass, quartz, etc.
The random microstructures are formed on the surface of the glass substrate by a glass cold working process blasting or frosting technique, wherein the particles, jets or time of blasting can be varied to vary the roughness of the surface of the glass substrate to form different distributions of random microstructures. For example, the surface of the glass substrate is subjected to sand blasting for 2s-3s by 180-mesh carborundum, and the surface fluctuation of the random fine structure can be different micrometer-scale dimensions such as 1 micrometer, 2 micrometers, 5 micrometers and the like.
The random microstructure is formed on the surface of the glass substrate by a glass cold working process sand blasting or frosting technique, wherein the diameter of abrasive particles in the frosting technique can be changed to change the roughness of the surface of the glass substrate to form different distributions of random microstructures. For example, the surface relief of the random microstructure of the abrasive particles can be on different scales of 1 micron, 2 microns, 5 microns, etc., by varying the diameter of the abrasive particles.
Etching the glass by using etching liquid containing hydrofluoric acid;
the glass is etched by using the etching liquid containing hydrofluoric acid, and the surface quality of the prepared structure can be improved by adding dilute nitric acid, concentrated sulfuric acid or fluoride in the etching liquid. For example, the composition of the etching solution may be HF (40%): deionized H 2 O:HNO 3 (65％-68％)＝2:5:2。
The etching liquid containing hydrofluoric acid is used for etching the glass, and the etching rate is related to the proportion of the etching liquid. Wherein the higher the concentration of HF, the faster the etching rate of the glass. For example, the etching rate per minute is about 120nm in the above exemplified composition.
And (3) etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the scattering device is prepared.
The etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, the preparation of the scattering device is completed, and the random fine structure on the surface of the glass is etched into a continuous surface pit structure when the etching is completed. For example, the aperture of the pit structure unit varies randomly from several tens micrometers to one hundred micrometers.
The etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the preparation of the scattering device is completed, the etching time can be changed, and the preparation of the scattering devices with different divergence angles is completed. For example, the aperture of the pit-structure unit varies randomly from several tens micrometers to hundreds micrometers at an etching time of 40 minutes. When the time is increased to 6 hours, the aperture of the pit structure unit changes randomly from hundreds of micrometers to hundreds of micrometers.
In a specific embodiment, a low-cost preparation method of a high-integration laser scattering device is as follows:
fig. 1 is a process flow for device fabrication. The surface of the soda glass 1 is treated by a sand blasting technology 0, a random fine structure is generated on the surface of the glass to form glass 11, and etching is carried out by etching liquid containing hydrofluoric acid to form a scattering device 12.
FIG. 2 shows the microstructure of the surface of the glass substrate after sandblasting in the examples. The sand blasting adopts 180-mesh carborundum, the sputtering is carried out for 2s on the surface of the soda glass, at the moment, a random fine particle structure is generated on the surface of the glass, the surface fluctuation of the random fine structure is randomly changed from 1 micron to 5 microns, and the roughness PV mean value of the structure surface is about 3 microns.
FIG. 3 is a microstructure of the glass surface when etching was not completed in the examples. And (3) putting the soda glass subjected to sand blasting into HF etching liquid to etch the microstructure after 10 minutes, wherein the structure etching is not completed, and a continuous surface type pit structure is not formed in some areas. The proportion of the HF etching solution can be HF (40%): deionized H 2 O:HNO 3 (65％-68％)＝2:5:2。
FIG. 4 is the microstructure of the glass surface after short etching in the examples. And (3) putting the soda glass subjected to sand blasting into HF etching liquid to etch the microstructure for 30 minutes at room temperature, wherein the structure is etched to be finished, a continuous surface type pit structure is formed, and the caliber of the pit is dozens of microns.
FIG. 5 shows the microstructure of the glass surface after long etching in the examples. The soda glass after sand blasting is put into etching liquid to etch the microstructure after 6 hours at room temperature, and the caliber of the continuous surface type pit structure is increased to hundreds of microns along with the increase of etching time.
FIG. 6 is a scattering pattern of the laser in the example after short etching of the microstructure of the glass surface in the example of FIG. 4. When the laser light passes through the scattering devices of fig. 4 and 5, respectively, the divergence angles of the light field are different due to the different dimensions of the microstructure of the device. The divergence angle of the laser light after passing through the structure shown in fig. 4 was 18 degrees, and the divergence angle after passing through the structure shown in fig. 5 was 5 degrees. The larger the scale of the microstructure, the smaller the divergence angle, but the intensity distributions are all approximately gaussian.
The invention has not been described in detail and is part of the common general knowledge of a person skilled in the art.
Claims (8)
1. A low-cost preparation method of a high-integration laser scattering device is characterized by comprising the following steps: comprises the following steps:
forming a random fine structure on the surface of a glass substrate by sand blasting or frosting technology of a glass cold working process;
etching the glass by using etching liquid containing hydrofluoric acid;
and (3) etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the scattering device is prepared.
2. The method for preparing a high-integration laser scattering device according to claim 1, wherein: in the step (1), random fine structures are formed on the surface of the glass substrate by sand blasting or frosting technology of a glass cold working process, wherein the glass substrate can be different optical glass, and K9, soda glass or quartz can be selected.
3. The method for preparing a high-integration laser scattering device of claim 1, wherein: in the step (1), random fine structures are formed on the surface of the glass substrate by sand blasting or sanding technology of a glass cold working process, wherein the particle, jet flow or time of sand blasting can be changed to change the roughness of the surface of the glass substrate so as to form random fine structures with different distributions.
4. The method for preparing a high-integration laser scattering device according to claim 1, wherein: in the step (1), random fine structures are formed on the surface of the glass substrate by sand blasting or sanding technology of a glass cold working process, wherein the diameter of abrasive particles in the sanding technology can be changed to change the roughness of the surface of the glass substrate so as to form random fine structures with different distributions.
5. The method for preparing a high-integration laser scattering device according to claim 1, wherein: and (3) etching the glass by using an etching solution containing hydrofluoric acid in the step (2), wherein the surface quality of the prepared structure can be improved by adding dilute nitric acid, concentrated sulfuric acid or fluoride in the etching solution.
6. The method for preparing a high-integration laser scattering device of claim 1, wherein: in the step (2), the etching liquid containing hydrofluoric acid is used for etching the glass, and the etching rate is related to the proportion of the etching liquid.
7. The method for preparing a high-integration laser scattering device of claim 1, wherein: and (3) etching liquid infiltrates and erodes the surface of the glass substrate through the fine structure to form a randomly distributed continuous surface type structure, the preparation of the scattering device is completed, and the random fine structure on the surface of the glass is etched into a continuous surface type pit structure when the etching is completed.
8. The method for preparing a high-integration laser scattering device according to claim 1, wherein: and (3) etching liquid infiltrates and erodes the surface of the glass substrate by the fine structure to form a randomly distributed continuous surface structure, so that the preparation of the scattering device is completed, the etching time can be changed, and the preparation of the scattering devices with different divergence angles is completed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210799890.1A CN115284178A (en) | 2022-07-08 | 2022-07-08 | Low-cost preparation method of high-integration-level laser scattering device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202210799890.1A CN115284178A (en) | 2022-07-08 | 2022-07-08 | Low-cost preparation method of high-integration-level laser scattering device |
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| CN115284178A true CN115284178A (en) | 2022-11-04 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001206726A (en) * | 2000-01-26 | 2001-07-31 | Nippon Sheet Glass Co Ltd | Tapering method of glass fine tube for connecting optical fiber |
| CN1538237A (en) * | 2003-04-15 | 2004-10-20 | ������������ʽ���� | Substrate, microlens substrat, transmission screen and back projecton with invagination parts |
| US20070021039A1 (en) * | 2005-07-20 | 2007-01-25 | Basil Haslett | Glass etching |
| TW201305067A (en) * | 2011-05-26 | 2013-02-01 | Corning Inc | Light scattering articles by abrasion and etch |
| CN103539364A (en) * | 2013-09-24 | 2014-01-29 | 沈阳建筑大学 | Fabrication method of frosted glass for laser display system |
| CN110727041A (en) * | 2019-10-23 | 2020-01-24 | 中国科学院光电技术研究所 | Preparation method of high-light-energy-utilization-ratio diffusion device |
| CN111606573A (en) * | 2019-02-26 | 2020-09-01 | Ａｇｃ株式会社 | Glass substrate with concave-convex shape and manufacturing method thereof |
| CN113411430A (en) * | 2021-07-08 | 2021-09-17 | Oppo广东移动通信有限公司 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
-
2022
- 2022-07-08 CN CN202210799890.1A patent/CN115284178A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001206726A (en) * | 2000-01-26 | 2001-07-31 | Nippon Sheet Glass Co Ltd | Tapering method of glass fine tube for connecting optical fiber |
| CN1538237A (en) * | 2003-04-15 | 2004-10-20 | ������������ʽ���� | Substrate, microlens substrat, transmission screen and back projecton with invagination parts |
| US20070021039A1 (en) * | 2005-07-20 | 2007-01-25 | Basil Haslett | Glass etching |
| TW201305067A (en) * | 2011-05-26 | 2013-02-01 | Corning Inc | Light scattering articles by abrasion and etch |
| CN103539364A (en) * | 2013-09-24 | 2014-01-29 | 沈阳建筑大学 | Fabrication method of frosted glass for laser display system |
| CN111606573A (en) * | 2019-02-26 | 2020-09-01 | Ａｇｃ株式会社 | Glass substrate with concave-convex shape and manufacturing method thereof |
| CN110727041A (en) * | 2019-10-23 | 2020-01-24 | 中国科学院光电技术研究所 | Preparation method of high-light-energy-utilization-ratio diffusion device |
| CN113411430A (en) * | 2021-07-08 | 2021-09-17 | Oppo广东移动通信有限公司 | Manufacturing method of anti-glare cover plate, anti-glare cover plate and electronic device |
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Application publication date: 20221104 |