CN113219695A - Color film substrate, manufacturing method thereof and display panel - Google Patents
Color film substrate, manufacturing method thereof and display panel Download PDFInfo
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- CN113219695A CN113219695A CN202110429056.9A CN202110429056A CN113219695A CN 113219695 A CN113219695 A CN 113219695A CN 202110429056 A CN202110429056 A CN 202110429056A CN 113219695 A CN113219695 A CN 113219695A
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- black matrix
- partition structure
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
Abstract
The application discloses a color film substrate, a manufacturing method thereof and a display panel, wherein the manufacturing method of the color film substrate comprises the following steps: forming a partition structure which surrounds the display area and is made of an insulating material in the non-display area of the substrate; forming a first black matrix layer cut or thinned by the partition structure in a non-display area of the substrate, and forming a second black matrix layer in a display area of the substrate; forming a color resistance layer arranged at intervals with the second black matrix layer in the display area of the substrate; and forming a support pillar, a flat layer and a common electrode layer on the first black matrix, the second black matrix and the color resistance layer. According to the method, before the black matrix layer of the non-display area is formed, the partition structure made of the insulating material is formed on the substrate, and when the black matrix layer is deposited on the partition structure, the partition structure can be cut off or thinned, so that the anti-static effect is achieved.
Description
Technical Field
The application relates to the technical field of display, in particular to a color film substrate, a manufacturing method thereof and a display panel.
Background
With the development of display technology, people have pursued higher display quality of display devices, wherein narrow-frame or even frameless display screens have become one of the bright spots for display screen design. In the manufacturing process of the display device, the array substrate is usually independently manufactured in advance, and then the array substrate and the color film substrate are aligned to form a liquid crystal cell. The black matrix layer in the display area on the color film substrate corresponds to the positions of the data lines, the scanning lines, the thin film transistors and other components on the array substrate so as to shield the data lines, the scanning lines, the thin film transistors and other components; the black matrix layer in the non-display area on the color film substrate corresponds to the peripheral metal signal lines to shield the peripheral metal signal lines and prevent light leakage.
In order to avoid the bad display caused by abnormal liquid crystal deflection caused by static electricity introduced into the liquid crystal box through the black matrix layer due to the exposure of the black matrix layer in the non-display area to the environment. Usually, a groove is formed around the black matrix to cut off the edge and the inside of the black matrix, thereby cutting off the static electricity introduction path and preventing static electricity from entering the liquid crystal cell. However, the groove design of the black matrix is easy to cause light leakage, which affects the display effect.
Disclosure of Invention
The application aims to provide a light leakage and static electricity preventing color film substrate, a manufacturing method thereof and a display panel.
The application discloses a manufacturing method of a color film substrate, which comprises the following steps:
forming a partition structure surrounding the display area in the non-display area of the substrate;
forming a first black matrix layer cut or thinned by the partition structure in a non-display area of the substrate, and forming a second black matrix layer in a display area of the substrate;
forming a color resistance layer arranged at intervals with the second black matrix layer in the display area of the substrate; and
forming a support pillar, a flat layer and a common electrode layer on the first black matrix, the second black matrix and the color resistance layer;
wherein the partition structure is made of an insulating material.
The application also discloses a color film substrate manufactured by the manufacturing method, which comprises a substrate, a partition structure and a black matrix layer, wherein the substrate comprises a display area and a non-display area, and the non-display area is arranged around the display area; the partition structure is made of insulating materials, is arranged in the non-display area of the substrate and surrounds the display area; the black matrix layer comprises a first black matrix layer arranged in the non-display area and a second black matrix layer arranged in the display area, and the first black matrix layer covers the partition structure; the partition structure cuts off or thins the first black matrix layer.
Optionally, the width of the partition structure near the substrate is greater than the width of the partition structure far from the substrate.
Optionally, an included angle between at least one side surface of the partition structure and a surface close to the substrate is 45-75 °.
Optionally, the height of the partition structure is not less than twice the thickness of the first black matrix layer.
Optionally, the width of the partition structure far away from one side of the substrate is 5-10um, and the width of the side attached to the substrate is 15-20 um.
Optionally, the cross section of the partition structure is triangular, and the bottom of the triangle is disposed on the substrate.
Optionally, the distance between the partition structure and the edge of the substrate is 30-300 um.
Optionally, the number of the partition structures is not less than two, the color film substrate includes a frame adhesive coating area, and the frame adhesive coating area is used for coating frame adhesives;
the number of the partition structures is not less than two, one partition structure of the two partition structures is arranged between the frame glue coating area and the edge of the substrate, and the other partition structure is arranged between the frame glue coating area and the display area.
The application also discloses a display panel, which comprises the color film substrate and an array substrate arranged in a box-to-box manner with the color film substrate.
Compared with the scheme that the anti-static electricity is achieved by digging grooves on the black matrix layer in the non-display area, the partition structure made of the insulating material is formed on the substrate before the black matrix layer of the non-display area is formed, and when the black matrix layer is deposited on the partition structure, the partition structure can be cut off or thinned, so that the anti-static electricity effect is achieved; in addition, the black matrix is not required to be subjected to grooving by exposure and development, and the grooving depth and width are not required to be accurately controlled; in addition, the partition structure is used as a structure protruding out of the substrate, so that the upper part of the partition structure protrudes out of other positions, and the partition structure is arranged around the display area, so that the partition structure can also prevent the alignment liquid from overflowing, and the display effect is improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
fig. 1 is a flowchart of a method for manufacturing a color filter substrate according to an embodiment of the present disclosure;
fig. 2 is a schematic plan view of a color filter substrate according to an embodiment of the present disclosure;
FIG. 3 is a schematic view of a partition structure for thinning a first black matrix according to an embodiment of the present disclosure;
fig. 4 is a schematic view of a partition structure such that a first black matrix is cut off according to an embodiment of the present application;
FIG. 5 is a schematic illustration of a cross-sectional shape of a partition structure according to an embodiment of the present application;
FIG. 6 is a schematic illustration of another partition structure cross-sectional shape of an embodiment of the present application;
fig. 7 is a schematic view of a color filter substrate according to an embodiment of the present application, which includes a plurality of partition structures;
fig. 8 is a schematic diagram of a display panel according to another embodiment of the present application.
100, a display panel; 200. a color film substrate; 210. a substrate; 211. a display area; 212. a non-display area; 220. a black matrix layer; 221. a first black matrix layer; 222. a second black matrix layer; 230. a partition structure; 300. an array substrate.
Detailed Description
It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. The terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that one or more other features, integers, steps, operations, elements, components, and/or combinations thereof may be present or added.
Further, terms of orientation or positional relationship indicated by "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, are described based on the orientation or relative positional relationship shown in the drawings, are simply for convenience of description of the present application, and do not indicate that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application.
Furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly and may include, for example, fixed connections, removable connections, and integral connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, or through both elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
The present application will now be described in detail with reference to the drawings and alternative embodiments, it being understood that any combination of the various embodiments or technical features described below may form new embodiments without conflict.
As shown in fig. 1, it is a flowchart of a method for manufacturing a color filter substrate. As an embodiment of the present application, a method for manufacturing a color film substrate is disclosed, which includes the steps of:
s1: forming a partition structure surrounding the display area in the non-display area of the substrate;
s2: forming a first black matrix layer cut or thinned by the partition structure in a non-display area of the substrate, and forming a second black matrix layer in a display area of the substrate;
s3: forming a color resistance layer arranged at intervals with the second black matrix layer in the display area of the substrate;
s4: forming a support pillar, a flat layer and a common electrode layer on the first black matrix, the second black matrix and the color resistance layer;
wherein the partition structure is made of an insulating material.
Before the black matrix layer is manufactured, the partition structure made of the insulating materials is formed on the non-display area of the substrate, the black matrix layer is deposited behind the partition structure, the black matrix layer is cut off or thinned through the shape of the partition structure, and the partition structure is non-conductive, so that the transfer of charges in the black matrix layer is more difficult, and the anti-static effect is achieved.
Fig. 2 is a schematic plan view of a color filter substrate 200, and cross-sectional views thereof are shown in fig. 3 and fig. 4. As another embodiment of the present application, a color filter substrate 200 manufactured by the manufacturing method of the color filter substrate 200 is further disclosed, where the color filter substrate 200 includes a substrate 210, a partition structure 230, and a black matrix layer 220, the substrate 210 includes a display area 211 and a non-display area 212, and the non-display area 212 is disposed around the display area 211; the partition structure 230 is made of an insulating material, is disposed in the non-display region 212 of the substrate 210, and is disposed around the display region 211; the black matrix layer 220 includes a first black matrix layer 221 disposed in the non-display region 212, and a second black matrix layer 222 disposed in the display region 211, the first black matrix layer 221 covering the partition structure 230; the partition structure 230 cuts or thins the first black matrix layer 221.
With the improvement of the appearance requirement of display screen products, ebl (entry border) technology is mostly adopted to produce products in the market, that is, the products are designed without a frame, but the light leakage problem at the edge is brought at the same time. In the conventional design, the size of the glass of the color filter substrate 210 is increased, so that the black matrix layer 220 is flush with the edge of the color filter substrate 210. This design utilizes the black matrix layer 220 to achieve the light blocking effect of the edge to achieve a better user experience. However, the design may cause the black matrix layer 220 to be excessively exposed (close to the edge of the glass), so that the black matrix on the color film substrate 200 corresponds to the peripheral metal signal lines on the array substrate 300, and when the display panel 100 operates, the black matrix may generate induced voltage, generate Static electricity, and affect liquid crystal deflection, thereby greatly increasing the risk of ESD (Electro-Static discharge) and reducing the performance of the product. At present, static electricity is prevented from being transferred into the display region 211 by mostly turning off the black matrix in the non-display region 212; however, this may cause a risk of light leakage, which may affect the display effect of the product.
Before the black matrix layer 220 of the non-display area 212 is formed, the partition structure 230 made of an insulating material is formed on the substrate 210, and when the black matrix layer 220 is deposited on the partition structure 230, the black matrix layer is cut off or thinned by the partition structure 230, so that the anti-static effect is achieved; in addition, the black matrix is not required to be subjected to grooving by exposure and development, and the grooving depth and width are not required to be accurately controlled; in addition, the partition structure 230 is a structure protruding from the substrate 210, such that the upper portion thereof protrudes from other positions, and the partition structure 230 is disposed around the display region 211, such that the partition structure 230 can also prevent the alignment liquid from overflowing, and improve the display effect.
The width of the partition structure 230 on the side close to the substrate 210 is greater than the width on the side far from the substrate 210. Thus, the side surfaces of the partition structure 230 are inclined, and when the first black matrix layer 221 is deposited on the partition structure 230, the first black matrix layer will slide down along the side surfaces of the partition structure 230, so that the portion of the first black matrix layer 221 contacting the side surfaces or the top of the partition structure 230 is broken or even thinned.
Further, an included angle between at least one side surface of the partition structure 230 and a surface close to the substrate 210 is 45 ° to 75 °; the inclination degree of the side surface of the partition structure 230 is large due to the design, and the first black matrix layer 221 is easily broken. Alternatively, the height of the partition structure 230 is not less than twice the thickness of the first black matrix layer 221; the first black matrix layer is difficult to climb by increasing the height of the partition structure 230, and the first black matrix layer is not easily attached to the side of the partition structure 230, so the first black matrix layer 221 is also easily broken. Or, by reducing the area of the top of the partition structure 230, the black matrix material is not easily deposited on the top of the partition structure 230, so that the black matrix material is easily dropped, and the molded first black matrix layer 221 is broken. The first black matrix layer 221 can be broken or even thinned by one of the above methods, and two or three of the methods can be combined to further improve the effects of breaking and thinning the first black matrix layer 221.
Fig. 5 is a schematic view showing a sectional shape of the partition structure 230. In the present application, the cross-sectional shape of the partition structure 230 may be trapezoidal, that is, the width of the top of the partition structure 230 is smaller than the width of the bottom, and the inclined side of the partition structure 230 is utilized to make the first black matrix layer 221 slide along the sidewall of the partition structure 230 during deposition. Specifically, the top width of the partition structure 230 may be 5-10um, the bottom width is 15-20um, and the bottom width may also be equal to the bottom width of the support column (PS) in the display area 211; since the top width of the support pillar is 15-30um, the top is flat, and the black matrix layer 220 can be normally deposited, the top width is reduced on the basis of the support pillar, so that the effects of saving a photomask and reducing the cost can be achieved. Certainly, the top width of the partition structure 230 may also be in other dimensions, the height of the partition structure 230 may be more than twice the thickness of the first black matrix layer 221, and an included angle between one or more side surfaces of the partition structure 230 and a surface close to the substrate 210 is 45 ° to 75 °, so that the breaking effect of the first black matrix layer 221 on the partition structure 230 may be further increased, the breaking width is increased, and the anti-static effect is further increased.
Fig. 6 is a schematic view showing another cross-sectional shape of the partition structure 230. The cross-sectional shape of the partition structure 230 may also be a triangle, the bottom of the triangle is disposed on the substrate 210, the first black matrix layer 221 is deposited on the sharp corner of the partition structure 230, and the sharp corner easily partitions the first black matrix layer 221; in addition, the height of the partition structure 230 may be increased, and the included angle between the side surface and the bottom surface of the partition structure 230 may be increased to improve the partition effect of the first black matrix layer 221. Of course, the cross section of the partition structure 230 may have other shapes, may have a regular shape, or may have an irregular shape, and is not limited herein. The partition structure 230 is made of PS material, color resist material or other light shielding material, which has an insulating effect and a light shielding effect, so that the light leakage problem caused by thinning or cutting off the first black matrix layer 221 by the partition structure 230 can be prevented.
In addition, the color film substrate 200 includes a frame glue coating area for coating frame glue; the position of the partition structure 230 can be set between the sealant coating region and the edge of the substrate 210, so that the distance between the partition structure 230 and the edge of the substrate 210 (i.e. the cutting line) is 30-300 um; when cutting the panel like this, cut off structure 230 and can strengthen the support between two base plates of panel edge, prevent that the glass that the cutting caused from bursting apart badly, improve the product quality. Or, the partition structure 230 may be disposed between the sealant coating region and the display region 211, such that the partition structure 230 is closer to the display region 211, which can perform a supporting function similar to the secondary supporting pillar of the display region 211, thereby preventing sensitive light leakage caused by pressing, and simultaneously blocking the overflow of the alignment liquid.
Of course, as shown in fig. 7, it is a schematic diagram that the color film substrate 200 includes a plurality of partition structures 230; the partition structures 230 may be simultaneously disposed between the sealant coating region and the edge of the substrate 210 to further enhance the support between the two substrates at the edge of the panel, and the partition structures 230 may also be simultaneously disposed between the sealant coating region and the display region 211 to further prevent the alignment liquid from overflowing and enhance the support; a part of the two intervals can be arranged, so that multiple effects are achieved simultaneously; in addition, the height of the partition structure 230 between the sealant coating region and the edge of the substrate 210 is increased to be greater than the height of the partition structure 230 between the sealant coating region and the display region 211, so that it is ensured that at least one partition structure 230 can cut off the first black matrix layer 221, and the structure is located between the sealant coating region and the edge of the substrate 210, thereby preventing external static electricity from being introduced.
In the present application, the color filter substrate 200 includes, in addition to the substrate 210, the partition structure 230, and the black matrix layer 220, a color resist layer, a main support pillar, an auxiliary support pillar, and a common electrode layer, where the color resist layer and the second black matrix layer 222 are disposed at an interval, the main support pillar and the auxiliary support pillar are disposed on the black matrix layer, and the common electrode layer is disposed on the main support pillar, the auxiliary support pillar, and the black matrix layer; in addition, the color film substrate can further comprise a flat layer, the flat layer is arranged between the black matrix layer and the common electrode layer, and the flat layer can increase and improve the flatness of the surface of the color film substrate.
Fig. 8 is a schematic diagram of a display panel 100. The display panel 100 comprises the color film substrate 200, the array substrate 300 and the frame glue, wherein the color film substrate 200 and the array substrate 300 are arranged in a box-to-box manner, the frame glue is arranged between the color film substrate 200 and the array substrate 300, the frame glue seals the liquid crystal between the color film substrate 200 and the array substrate 100, and the frame glue is overlapped with the frame glue coating area; the color film substrate 200 comprises a substrate 210, a partition structure 230 and a black matrix layer 220, wherein the substrate 210 comprises a display area 211 and a non-display area 212, and the non-display area 212 is arranged around the display area 211; the partition structure 230 is made of an insulating material, is disposed in the non-display region 212 of the substrate 210, and is disposed around the display region 211; the black matrix layer 220 includes a first black matrix layer 221 disposed in the non-display region 212, and a second black matrix layer 222 disposed in the display region 211, the first black matrix layer 221 covering the partition structure 230; the partition structure 230 cuts or thins the first black matrix layer 221.
By additionally arranging the partition structure 230 below the black matrix, the black matrix layer in the non-display area is partitioned or thinned, the ESD risk of the display panel is improved, and the display effect of the display panel is improved.
It should be noted that, the limitations of each step in the present disclosure are not considered to limit the order of the steps without affecting the implementation of the specific embodiments, and the steps written in the foregoing may be executed first, or executed later, or even executed simultaneously, and as long as the present disclosure can be implemented, all the steps should be considered as belonging to the protection scope of the present application.
The technical solution of the present application can be widely applied to various display panels, such as TN (Twisted Nematic) display panel, IPS (In-Plane Switching) display panel, VA (Vertical Alignment) display panel, MVA (Multi-Domain Vertical Alignment) display panel, and of course, other types of display panels may be used, and the above solution can be applied.
The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the specific implementations of the present application are not to be considered limited to these descriptions. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.
Claims (10)
1. A manufacturing method of a color film substrate is characterized by comprising the following steps:
forming a partition structure surrounding the display area in the non-display area of the substrate;
forming a first black matrix layer cut or thinned by the partition structure in a non-display area of the substrate, and forming a second black matrix layer in a display area of the substrate;
forming a color resistance layer arranged at intervals with the second black matrix layer in the display area of the substrate; and
forming a support pillar, a flat layer and a common electrode layer on the first black matrix, the second black matrix and the color resistance layer;
wherein the partition structure is made of an insulating material.
2. A color film substrate manufactured by the manufacturing method of claim 1, comprising:
a substrate including a display area and a non-display area, the non-display area being disposed around the display area;
the partition structure is made of insulating materials, arranged in the non-display area of the substrate and arranged around the display area; and
the black matrix layer comprises a first black matrix layer arranged in the non-display area and a second black matrix layer arranged in the display area, and the first black matrix layer covers the partition structure;
and the first black matrix layer is cut off or thinned by the partition structure.
3. The color filter substrate of claim 2, wherein the width of the partition structure on the side close to the substrate is greater than the width of the side far from the substrate.
4. The color filter substrate according to claim 3, wherein an included angle between at least one side surface of the partition structure and a surface close to the substrate is 45 ° to 75 °.
5. The color filter substrate of claim 3, wherein the height of the partition structure is not less than twice the thickness of the first black matrix layer.
6. The color film substrate of claim 3, wherein the width of the side of the partition structure away from the substrate is 5-10um, and the width of the side attached to the substrate is 15-20 um.
7. The color filter substrate according to claim 3, wherein the cross section of the partition structure is a triangle, and the bottom of the triangle is disposed on the substrate.
8. The color filter substrate of claim 2, wherein a distance between the partition structure and the edge of the substrate is 30-300 um.
9. The color film substrate of claim 2, wherein the color film substrate comprises a frame glue coating area, and the frame glue coating area is used for coating frame glue;
the number of the partition structures is not less than two, one partition structure of the two partition structures is arranged between the frame glue coating area and the edge of the substrate, and the other partition structure is arranged between the frame glue coating area and the display area.
10. A display panel comprising the color filter substrate according to any one of claims 2 to 9, and an array substrate disposed in a box-to-box relationship with the color filter substrate.
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| CN108121107A (en) * | 2017-12-27 | 2018-06-05 | 武汉华星光电技术有限公司 | A kind of liquid crystal display panel and preparation method thereof |
| CN110596939A (en) * | 2019-08-22 | 2019-12-20 | 武汉华星光电技术有限公司 | Display panel and display module |
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