CN112962129B - 一种晶圆双面电镀铜厚膜设备 - Google Patents
一种晶圆双面电镀铜厚膜设备 Download PDFInfo
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- CN112962129B CN112962129B CN202110147539.XA CN202110147539A CN112962129B CN 112962129 B CN112962129 B CN 112962129B CN 202110147539 A CN202110147539 A CN 202110147539A CN 112962129 B CN112962129 B CN 112962129B
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- wafer
- outer side
- copper
- clamping
- main frame
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202110147539.XA CN112962129B (zh) | 2021-02-03 | 2021-02-03 | 一种晶圆双面电镀铜厚膜设备 |
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CN202110147539.XA CN112962129B (zh) | 2021-02-03 | 2021-02-03 | 一种晶圆双面电镀铜厚膜设备 |
Publications (2)
Publication Number | Publication Date |
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CN112962129A CN112962129A (zh) | 2021-06-15 |
CN112962129B true CN112962129B (zh) | 2023-04-14 |
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CN202110147539.XA Active CN112962129B (zh) | 2021-02-03 | 2021-02-03 | 一种晶圆双面电镀铜厚膜设备 |
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CN (1) | CN112962129B (zh) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6024856A (en) * | 1997-10-10 | 2000-02-15 | Enthone-Omi, Inc. | Copper metallization of silicon wafers using insoluble anodes |
JP3942507B2 (ja) * | 2002-07-29 | 2007-07-11 | Necエレクトロニクス株式会社 | ウェハーめっき装置およびウェハーめっき方法 |
CN1272474C (zh) * | 2002-11-22 | 2006-08-30 | 财团法人工业技术研究院 | 晶圆电镀装置与方法 |
CN207646310U (zh) * | 2017-12-19 | 2018-07-24 | 昆山成功环保科技有限公司 | 一种晶圆电镀夹具 |
CN208586366U (zh) * | 2018-08-09 | 2019-03-08 | 德淮半导体有限公司 | 晶圆电镀工艺腔 |
CN111446180A (zh) * | 2020-04-29 | 2020-07-24 | 陕西哈斯福商贸有限公司 | 一种半导体封装检测设备 |
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2021
- 2021-02-03 CN CN202110147539.XA patent/CN112962129B/zh active Active
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CN112962129A (zh) | 2021-06-15 |
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Date | Code | Title | Description |
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PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20220119 Address after: 510665 no.371 Huanshi East Road, Yuexiu District, Guangzhou City, Guangdong Province Applicant after: Li Zhiqiang Address before: 510665 no.371 Huanshi East Road, Yuexiu District, Guangzhou City, Guangdong Province Applicant before: Guangzhou Xingjin Hardware Co.,Ltd. |
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TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20230310 Address after: 518104 211, Building 5, Block B, Xueziwei Industrial Zone, Yabian Community, Shajing Street, Bao'an District, Shenzhen City, Guangdong Province Applicant after: Shenzhen Yongyuan Microelectronics Technology Co.,Ltd. Address before: 510665 no.371 Huanshi East Road, Yuexiu District, Guangzhou City, Guangdong Province Applicant before: Li Zhiqiang |
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