CN111752091B - Habi类混合光引发剂在uvled光固化中的应用 - Google Patents

Habi类混合光引发剂在uvled光固化中的应用 Download PDF

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Publication number
CN111752091B
CN111752091B CN201910248385.6A CN201910248385A CN111752091B CN 111752091 B CN111752091 B CN 111752091B CN 201910248385 A CN201910248385 A CN 201910248385A CN 111752091 B CN111752091 B CN 111752091B
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meth
habi
acrylate
compound
bis
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CN111752091A (zh
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钱晓春
杨金梁
严春霞
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Changzhou Tronly New Electronic Materials Co Ltd
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Changzhou Zhengjie Intelligent Manufacturing Technology Co ltd
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Priority to CN201910248385.6A priority Critical patent/CN111752091B/zh
Priority to PCT/CN2020/081292 priority patent/WO2020200019A1/zh
Priority to KR1020217035062A priority patent/KR102648080B1/ko
Priority to JP2021557999A priority patent/JP7223456B2/ja
Publication of CN111752091A publication Critical patent/CN111752091A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
CN201910248385.6A 2019-03-29 2019-03-29 Habi类混合光引发剂在uvled光固化中的应用 Active CN111752091B (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201910248385.6A CN111752091B (zh) 2019-03-29 2019-03-29 Habi类混合光引发剂在uvled光固化中的应用
PCT/CN2020/081292 WO2020200019A1 (zh) 2019-03-29 2020-03-26 Habi类混合光引发剂在uvled光固化中的应用
KR1020217035062A KR102648080B1 (ko) 2019-03-29 2020-03-26 Habi계 혼합 광개시제의 uvled 광경화에서의 응용
JP2021557999A JP7223456B2 (ja) 2019-03-29 2020-03-26 Ｈａｂｉ類混合光開始剤のｕｖｌｅｄ光硬化への応用

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CN201910248385.6A CN111752091B (zh) 2019-03-29 2019-03-29 Habi类混合光引发剂在uvled光固化中的应用

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CN111752091B true CN111752091B (zh) 2022-09-06

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JP (1) JP7223456B2 (ko)
KR (1) KR102648080B1 (ko)
CN (1) CN111752091B (ko)
WO (1) WO2020200019A1 (ko)

Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
CN112062721B (zh) * 2019-05-23 2023-06-30 常州正洁智造科技有限公司 能够提升体系稳定性的habi类光引发剂及其应用
CN115128899A (zh) * 2021-03-26 2022-09-30 常州正洁智造科技有限公司 一种具有提升的体系色相稳定性的感光性树脂组合物
CN113121726A (zh) * 2021-04-20 2021-07-16 优缔贸易(上海)有限公司 含有双咪唑类光引发剂的组合物及其应用
CN219123339U (zh) 2021-10-22 2023-06-02 株式会社Lg新能源 圆筒形电池、包括它的电池组及汽车
CN114349886B (zh) * 2022-01-13 2022-11-08 苏州大学 一种基于分子开关的光控自由基聚合方法
CN114751861B (zh) * 2022-04-07 2023-10-20 浙江扬帆新材料股份有限公司 一种含有吡唑啉和n,n-二烷基苯甲酸酯的分子内敏化大分子光引发剂及制备方法和用途

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CN1292892A (zh) * 1998-03-11 2001-04-25 纳幕尔杜邦公司 残留物含量降低的感光组合物连续液态加工法
CN101302257A (zh) * 2008-06-03 2008-11-12 江南大学 一种紫外光敏复合引发体系及其应用
CN101418051A (zh) * 2008-12-01 2009-04-29 常州强力电子新材料有限公司 一种含有不对称性六芳基双咪唑光引发剂及其制备方法
CN108121159A (zh) * 2016-11-29 2018-06-05 常州强力电子新材料股份有限公司 一种感光性树脂组合物及其应用
WO2019056019A1 (en) * 2017-09-18 2019-03-21 The Regents Of The University Of Colorado, A Body Corporate 3D PRINTING WITH PARTICLES OF NANOGEL POLYMER

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JPH1036354A (ja) * 1996-07-19 1998-02-10 Nippon Kayaku Co Ltd ヘキサアリールビスイミダゾール類の製造方法
JP4327413B2 (ja) 2002-06-07 2009-09-09 昭和電工株式会社 光重合開始剤組成物及びそれを含む光重合性組成物
JP2008058636A (ja) * 2006-08-31 2008-03-13 Fujifilm Corp パターン形成材料及びパターン形成方法
JP5726462B2 (ja) * 2010-09-01 2015-06-03 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、および液晶表示装置
CN103339566B (zh) * 2011-02-10 2016-04-13 富士胶片株式会社 化合物、着色硬化性组成物、彩色滤光片及其制造方法、液晶显示装置及固体摄像元件
WO2014045818A1 (ja) 2012-09-20 2014-03-27 富士フイルム株式会社 光重合方法、インクセット、画像形成方法、インク組成物並びにこれらに用いる光重合開始剤および水溶性ビイミダゾール
CN102888180A (zh) * 2012-10-09 2013-01-23 深圳市深赛尔股份有限公司 抗菌紫外光固化涂料及其制备方法
JP2015038607A (ja) * 2013-07-16 2015-02-26 三菱化学株式会社 感光性組成物、硬化物、スペーサー及び画像表示装置
JP6159309B2 (ja) * 2014-01-31 2017-07-05 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1292892A (zh) * 1998-03-11 2001-04-25 纳幕尔杜邦公司 残留物含量降低的感光组合物连续液态加工法
CN101302257A (zh) * 2008-06-03 2008-11-12 江南大学 一种紫外光敏复合引发体系及其应用
CN101418051A (zh) * 2008-12-01 2009-04-29 常州强力电子新材料有限公司 一种含有不对称性六芳基双咪唑光引发剂及其制备方法
CN108121159A (zh) * 2016-11-29 2018-06-05 常州强力电子新材料股份有限公司 一种感光性树脂组合物及其应用
WO2019056019A1 (en) * 2017-09-18 2019-03-21 The Regents Of The University Of Colorado, A Body Corporate 3D PRINTING WITH PARTICLES OF NANOGEL POLYMER

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KR20210142189A (ko) 2021-11-24
CN111752091A (zh) 2020-10-09
KR102648080B1 (ko) 2024-03-18
JP2022528234A (ja) 2022-06-09
WO2020200019A1 (zh) 2020-10-08
JP7223456B2 (ja) 2023-02-16

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