CN110671981B - Smooth blasting method for vertical shaft tunneling in high stress environment - Google Patents
Smooth blasting method for vertical shaft tunneling in high stress environment Download PDFInfo
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- CN110671981B CN110671981B CN201910956835.7A CN201910956835A CN110671981B CN 110671981 B CN110671981 B CN 110671981B CN 201910956835 A CN201910956835 A CN 201910956835A CN 110671981 B CN110671981 B CN 110671981B
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42D—BLASTING
- F42D1/00—Blasting methods or apparatus, e.g. loading or tamping
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42D—BLASTING
- F42D3/00—Particular applications of blasting techniques
- F42D3/04—Particular applications of blasting techniques for rock blasting
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Abstract
The invention relates to a smooth blasting method for vertical shaft tunneling in a high stress environment, and belongs to the technical field of mine development. The method comprises the steps of arranging a central hole in the central position of blast hole arrangement of the vertical shaft rock in a high stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, arranging non-coupling explosive charging devices in the main blast holes, and arranging the non-coupling explosive charging devices in the smooth-surface blast holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay mode through the digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay mode through the digital electronic detonators. The method can effectively carry out blasting operation in a high-stress environment and carry out blasting pressure relief work.
Description
Technical Field
The invention relates to a smooth blasting method for vertical shaft tunneling in a high stress environment, and belongs to the technical field of mine development.
Background
The excavation and mining depth of resources is continuously increased, and the problems are gradually increased along with the increase of the mining depth, for example, the high stress condition under the deep environment, and the mine original rock stress and the structural stress are continuously strengthened and linearly increased along with the increase of the mining depth. And blasting operation under high stress condition easily causes rock burst (rock burst) to appear, which is a potential threat to underground personnel and equipment.
Disclosure of Invention
The invention provides a smooth blasting method aiming at the condition of carrying out shaft tunneling blasting operation in the high stress environment, and the smooth blasting method can effectively carry out blasting pressure relief work and ensure the effectiveness of blasting operation and the safety of personnel and equipment in the high stress environment.
The delay time of the detonators in the holes is required to be set in advance for the digital electronic detonators, and when accurate short-delay detonation is carried out layer by layer or hole by hole, the edge stress distribution of the edges of the blast holes is changed through time difference, so that the stress of the blast holes is concentrated, cracks are expanded and communicated in the direction of the connecting line of the blast holes, and the vibration is effectively reduced compared with the simultaneous firing surface blasting.
The technical scheme adopted by the invention for solving the technical problem is as follows:
a smooth blasting method for vertical shaft tunneling in a high stress environment is characterized in that a central hole is formed in the central position of arrangement of blast holes of vertical shaft rock in the high stress environment, a plurality of layers of annular main blast holes are formed in the periphery of the central hole, annular smooth blasting holes are formed in the periphery of the main blast holes, uncoupled explosive charging devices are arranged in the main blast holes, and uncoupled explosive charging devices are arranged in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay mode through the digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay mode through the digital electronic detonators.
The interlayer spacing of the main blast holes of the adjacent layers is 60-80 cm, the hole spacing of the main blast holes of each layer is 8-12 times of the aperture of the main blast hole, the spacing of the smooth blasting holes is 8-12 times of the aperture of the blasting holes, and the delay time of the digital electronic detonator is 9-12 ms.
Preferably, the uncoupled explosive loading device for smooth blasting comprises a cartridge fixing arc-shaped plate 3, an explosive cartridge 2, an explosive cartridge 1 and a digital electronic detonator 4, wherein the explosive cartridge 2 is fixedly arranged on the cartridge fixing arc-shaped plate 3, the explosive cartridge 2 is sequentially connected with the explosive cartridge 1, the digital electronic detonator 4 is arranged at the end of the cartridge fixing arc-shaped plate 3, the digital electronic detonator 4 is close to the orifice end of the smooth blasting hole, stemming 5 is filled in the orifice of the smooth blasting hole, and a leg wire 6 of the digital electronic detonator 4 penetrates through the stemming 5 and is externally connected with an electronic detonator through a wire.
Further, the charge decoupling coefficient of the explosive cartridge 2 is 1.8-2.3; the top of fixed arc 3 of batch roll is close to the drill way end of plain noodles blast hole, 1/3~2/5 of fixed arc 3 of batch roll is the bottom, the powder charge distance of fixed arc 3 bottom of batch roll is d1, 1/3~2/5 of fixed arc 3 of batch roll is the middle part, the powder charge distance of fixed arc 3 middle part of batch roll is d2, 1/3~1/5 of fixed arc 3 of batch roll is the top, the powder charge distance of fixed arc 3 top of batch roll is d3, 3cm is less than or equal to d1 and is less than or equal to d2 and is less than or equal to d3 and is less than or equal to 5 cm.
The smooth blasting method for vertical shaft tunneling in the high stress environment comprises the following specific steps:
(1) selecting explosive cartridges with gap distances of more than or equal to 3 cm;
(2) selecting a cartridge fixing arc plate with the length of the explosive cartridges being matched with that of the smooth-surface blasting holes, binding and fixing the explosive cartridges on the cartridge fixing arc plate, and ensuring that adjacent explosive cartridges have uncoupled intervals and the explosive-charging uncoupled coefficient is 1.8-2.3; the detonating cord is sequentially bound and connected with the explosive cartridge; arranging a digital electronic detonator at the top end of the explosive binding device and inserting the digital electronic detonator into the explosive cartridge, wherein the insertion depth of the digital electronic detonator is not less than 2/3 of the length of the digital electronic detonator;
(3) arranging a central hole in the central position of the arrangement of blast holes of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, and feeding the explosive binding device filled with the explosive cartridge in the step (2) into the blast holes from the top of the blast holes; wherein the main blast hole is internally provided with non-coupling explosive charging devices, and the smooth blast hole is internally provided with non-coupling explosive charging devices at intervals;
(4) extending the leg wire of the digital electronic detonator upwards along the blasting hole and connecting the leg wire with the electronic detonator through a conducting wire, and filling the stemming into the blasting hole above the digital electronic detonator;
(5) the electronic detonator is adopted to control the digital electronic detonator to detonate, so that the digital electronic detonator can accurately delay to detonate the uncoupled charge devices in the main blast holes layer by layer from inside to outside, the uncoupled charge devices in each layer of the main blast holes detonate simultaneously, and the uncoupled charge devices in the annular smooth blast holes are detonated hole by hole in an accurate delay manner.
The digital electronic detonator is an electric detonator which controls the detonation process by adopting an electronic control module, wherein the electronic control module is a special circuit module which is arranged in the digital electronic detonator, has the functions of controlling the detonation delay time and the detonation energy of the detonator, is internally provided with a detonator identity information code and a detonation password, can test the self function and performance and the electrical performance of a detonator ignition element, and can communicate with a detonation controller and other external control equipment.
The digital electronic detonator is a commercially available product;
the electronic detonator can be selected from a strong detonator MFB-50, a CZQBQ-50, a 90, a 150, a 200 type and the like.
The central hollow hole can reduce the influence between the blast holes when the first circle of blast holes are detonated, improve the blasting fragmentation degree and play a role in guiding.
The blasting sequence can be that after the inner layer is completely blasted, the final blasting smooth surface blasting group can meet the requirement that the contour line meets the design after blasting, and the blank surface is smooth.
Stress superposition among blast holes is minimum when the delay time is 9-12 ms, and the influence on the vibration effect and the destructive effect of surrounding rocks is minimum.
And the aperture of the main blast hole and the aperture of the smooth blast hole are determined according to the actual situation on site.
The invention has the beneficial effects that:
(1) the smooth blasting method for vertical shaft tunneling in high stress environment realizes non-coupled charging and adopts digital electronic detonators to perform accurate short-time delay blasting layer by layer or hole by hole; by setting the optimal delay time of the electronic detonator, the energy generated by the explosive detonated first enables the adjacent blast holes to be in a prestressed state, and when the explosive detonated later explodes, stress waves generated by the two groups of explosives are superposed, so that good blasting acting force coupling is generated; so as to improve the destructive effect in the cutting direction and be beneficial to forming cracks on the center connecting line of the blast hole;
(2) the smooth blasting method for vertical shaft tunneling in the high stress environment effectively prevents and treats rock burst caused by natural occurrence or blasting operation under the high stress condition;
(3) the smooth blasting method for vertical shaft tunneling in the high stress environment effectively reduces the vibration influence on the surrounding rock of the shaft wall during detonation, and ensures the safety of underground personnel and equipment;
(4) the smooth blasting method for vertical shaft tunneling in high stress environment can ensure that the contour line can meet the design requirement after blasting and the blank surface is smooth.
Drawings
FIG. 1 is a smooth blasting hole diagram (front view) of vertical shaft tunneling in a high stress environment;
FIG. 2 is a smooth blasting hole diagram (side sectional view) for vertical shaft tunneling in a high stress environment;
FIG. 3 is a diagram of a non-coupled charge configuration;
in the figure: 1-detonating cord, 2-explosive cartridge, 3-cartridge fixing arc plate, 4-digital electronic detonator, 5-stemming and 6-leg wire.
Detailed Description
The present invention will be further described with reference to the following embodiments.
Example 1: as shown in fig. 1-2, a smooth blasting method for vertical shaft tunneling in a high stress environment includes the steps of forming a central hollow hole in the central position of arrangement of blast holes of vertical shaft rock in the high stress environment, forming a plurality of layers of annular main blast holes on the periphery of the central hollow hole, forming annular smooth blasting holes on the periphery of the main blast holes, arranging uncoupled explosive charging devices in the main blast holes, and arranging uncoupled explosive charging devices in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay manner through digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay manner through the digital electronic detonators; the interlayer spacing of the main blast holes of the adjacent layers is 60-80 cm, the hole spacing of the main blast holes of each layer is 8-12 times of the aperture of the main blast hole, the spacing of the smooth blasting holes is 8-12 times of the aperture of the blasting holes, and the delay time of the digital electronic detonator is 9-12 ms.
Example 2: as shown in fig. 1-2, a smooth blasting method for vertical shaft tunneling in a high stress environment includes the steps of forming a central hollow hole in the central position of arrangement of blast holes of vertical shaft rock in the high stress environment, forming a plurality of layers of annular main blast holes on the periphery of the central hollow hole, forming annular smooth blasting holes on the periphery of the main blast holes, arranging uncoupled explosive charging devices in the main blast holes, and arranging uncoupled explosive charging devices in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay manner through digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay manner through the digital electronic detonators; the interlayer spacing of the main blast holes of the adjacent layers is 60-80 cm, the hole spacing of the main blast holes of each layer is 8-12 times of the aperture of the main blast hole, the spacing of the smooth blasting holes is 8-12 times of the aperture of the blasting holes, and the delay time of the digital electronic detonator is 9-12 ms;
as shown in fig. 3, the uncoupled explosive charging device for smooth blasting comprises an explosive cartridge fixing arc-shaped plate 3, an explosive cartridge 2, an explosive cord 1 and a digital electronic detonator 4, wherein the explosive cartridge 2 is fixedly arranged on the explosive cartridge fixing arc-shaped plate 3, the explosive cord 1 is sequentially connected with the explosive cartridge 2, the digital electronic detonator 4 is arranged at the end of the explosive cartridge fixing arc-shaped plate 3, the digital electronic detonator 4 is close to the orifice end of the smooth blasting hole, the smooth blasting orifice is filled with stemming 5, and a leg wire 6 of the digital electronic detonator 4 penetrates through the stemming 5 and is externally connected with an electronic detonator through a lead wire; the explosive cartridge 2 has an explosive non-coupling coefficient of 1.8-2.3; the top end of the cartridge fixing arc-shaped plate 3 is close to the orifice end of the smooth blasting hole, 1/3-2/5 of the cartridge fixing arc-shaped plate 3 is the bottom, the charging distance of the bottom of the cartridge fixing arc-shaped plate 3 is d1, 1/3-2/5 of the cartridge fixing arc-shaped plate 3 is the middle part, the charging distance of the middle part of the cartridge fixing arc-shaped plate 3 is d2, 1/3-1/5 of the cartridge fixing arc-shaped plate 3 is the top part, the charging distance of the top part of the cartridge fixing arc-shaped plate 3 is d3, d1 is larger than 3cm and smaller than d2 and smaller than d3 and smaller than 5 cm;
the smooth blasting method for vertical shaft tunneling in the high stress environment comprises the following specific steps:
(1) selecting explosive cartridges with gap distances of 3 cm;
(2) selecting a cartridge fixing arc plate with the length of the explosive cartridges being matched with that of the smooth-surface blasting holes, binding and fixing the explosive cartridges on the cartridge fixing arc plate, and ensuring that adjacent explosive cartridges have uncoupled intervals and the explosive-charging uncoupled coefficient is 1.8-2.3; the detonating cord is sequentially bound and connected with the explosive cartridge; arranging a digital electronic detonator at the top end of the explosive binding device and inserting the digital electronic detonator into the explosive cartridge, wherein the insertion depth of the digital electronic detonator is not less than 2/3 of the length of the digital electronic detonator;
(3) arranging a central hole in the central position of the arrangement of blast holes of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth-surface blast holes on the periphery of the main blast holes, and feeding the explosive binding device filled with the explosive cartridge in the step (2) into the blast holes from the top of the blast holes; wherein the main blast hole is internally provided with non-coupling explosive charging devices, and the smooth blast hole is internally provided with non-coupling explosive charging devices at intervals;
(4) extending the leg wire of the digital electronic detonator upwards along the blasting hole and connecting the leg wire with the electronic detonator through a conducting wire, and filling the stemming into the blasting hole above the digital electronic detonator;
(5) an electronic detonator is adopted to control the digital electronic detonator to detonate, so that the digital electronic detonator can accurately delay to detonate the uncoupled charge devices in the main blast holes layer by layer from inside to outside, the uncoupled charge devices in each layer of main blast holes can detonate simultaneously, and the uncoupled charge devices in the annular smooth blast holes can detonate hole by hole in an accurate delay manner;
the digital electronic detonator is an electric detonator which controls the detonation process by adopting an electronic control module, wherein the electronic control module is a special circuit module which is arranged in the digital electronic detonator, has the functions of controlling the detonation delay time and the detonation energy of the detonator, is internally provided with a detonator identity information code and a detonation password, can test the self function and performance and the electrical performance of a detonator ignition element, and can communicate with a detonation controller and other external control equipment;
the electronic detonator can be a strong detonator MFB-50, CZQBQ-50, 90, 150, 200 and the like;
the central hollow hole can reduce the influence among the blast holes when the first circle of blast holes are detonated, improve the blasting fragmentation degree and play a role in guiding; the blasting sequence can be that after the inner layer is completely blasted, the final blasting smooth surface blasting group can meet the requirement that the contour line meets the design requirement after blasting, and the blank surface is smooth; stress superposition among blast holes is minimum when the delay time is 9-12 ms, and the influence on the vibration effect and the destructive effect of surrounding rocks is minimum.
While the present invention has been described in detail with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, and various changes and modifications can be made within the knowledge of those skilled in the art without departing from the spirit of the present invention.
Claims (3)
1. A smooth blasting method for vertical shaft tunneling in a high stress environment is characterized in that: arranging a central hole in the central position of the blast hole arrangement of the vertical shaft rock in the high-stress environment, arranging a plurality of layers of annular main blast holes on the periphery of the central hole, arranging annular smooth blasting holes on the periphery of the main blast holes, arranging non-coupling explosive devices in the main blast holes, and arranging the non-coupling explosive devices in the smooth blasting holes at intervals; the uncoupled explosive devices in the main blast holes are controlled to detonate layer by layer from inside to outside in an accurate delay manner through digital electronic detonators, the uncoupled explosive devices in each layer of main blast holes detonate simultaneously, and the uncoupled explosive devices in the annular smooth blast holes are controlled to detonate hole by hole in an accurate delay manner through the digital electronic detonators;
the interlayer spacing of the main blast holes of the adjacent layers is 60-80 cm, the hole spacing of the main blast holes of each layer is 8-12 times of the aperture of the main blast hole, the spacing of the smooth blasting holes is 8-12 times of the aperture of the blasting holes, and the delay time of the digital electronic detonator is 9-12 ms.
2. The smooth blasting method for vertical shaft tunneling in high stress environment according to claim 1, wherein: the uncoupled explosive charging device for smooth blasting comprises a cartridge fixing arc-shaped plate (3), an explosive cartridge (2), an explosive fuse (1) and a digital electronic detonator (4), wherein the explosive cartridge (2) is fixedly arranged on the cartridge fixing arc-shaped plate (3), the explosive fuse (1) is sequentially connected with the explosive cartridge (2), the digital electronic detonator (4) is arranged at the end of the cartridge fixing arc-shaped plate (3) and the orifice end of the digital electronic detonator (4) close to a smooth blasting hole, stemming (5) is filled in the smooth blasting orifice, and a foot line (6) of the digital electronic detonator (4) penetrates through the stemming (5) and is externally connected with an electronic detonator through a lead.
3. The smooth blasting method for vertical shaft tunneling in the high stress environment according to claim 2, wherein the smooth blasting method comprises the following steps: the explosive cartridge (2) has a charging uncoupling coefficient of 1.8-2.3; the top end of the cartridge fixing arc-shaped plate (3) is close to the orifice end of the smooth blasting hole, 1/3-2/5 of the cartridge fixing arc-shaped plate (3) is the bottom, the charging distance of the bottom of the cartridge fixing arc-shaped plate (3) is d1, 1/3-2/5 of the cartridge fixing arc-shaped plate (3) is the middle part, the charging distance of the middle part of the cartridge fixing arc-shaped plate (3) is d2, 1/3-1/5 of the cartridge fixing arc-shaped plate (3) is the top, the charging distance of the top of the cartridge fixing arc-shaped plate (3) is d3, d1 is larger than or equal to 3cm and smaller than or equal to d2 and smaller than or equal to d3 and smaller than or equal to 5 cm.
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111578802A (en) * | 2020-05-28 | 2020-08-25 | 广州市顺兴石场有限公司 | High-acquisition-degree mine smooth blasting mining method |
| CN112696997A (en) * | 2020-12-22 | 2021-04-23 | 北京科技大学 | Efficient blasting and tunneling method for vertical shaft |
| CN113188394B (en) * | 2021-04-20 | 2022-09-27 | 中海石油(中国)有限公司 | Operation method for driving pile shoe of self-elevating platform into mud by underwater blasting of hard stratum |
| CN114001605A (en) * | 2021-11-24 | 2022-02-01 | 昆明理工大学 | Smooth blasting method for tunneling |
| CN114812309A (en) * | 2022-03-18 | 2022-07-29 | 淄博圣世达***工程有限公司 | Pre-splitting blasting engineering method for digital electronic detonator |
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Patent Citations (5)
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| CN1434191A (en) * | 2002-01-25 | 2003-08-06 | 中国人民解放军工程兵第四十一旅 | Bore construction method by bore explosion |
| CN102401616A (en) * | 2011-10-11 | 2012-04-04 | 中国矿业大学(北京) | Blasting excavation method of vertical shaft |
| CN107131806A (en) * | 2017-05-09 | 2017-09-05 | 深圳市中金岭南有色金属股份有限公司 | Service shaft is disposable into well blasting method |
| CN108036684A (en) * | 2017-12-12 | 2018-05-15 | 中交公局第二工程有限公司 | A kind of Pile Diameter is the bridge cylinder pile foundation blasting method of 1.7-1.9m |
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