CN110571184A - Supporting device for dry etching machine - Google Patents
Supporting device for dry etching machine Download PDFInfo
- Publication number
- CN110571184A CN110571184A CN201910917590.7A CN201910917590A CN110571184A CN 110571184 A CN110571184 A CN 110571184A CN 201910917590 A CN201910917590 A CN 201910917590A CN 110571184 A CN110571184 A CN 110571184A
- Authority
- CN
- China
- Prior art keywords
- supporting
- dry etching
- etching machine
- machine table
- main supporting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 title claims abstract description 42
- 239000011521 glass Substances 0.000 claims abstract description 50
- 230000007246 mechanism Effects 0.000 claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- ing And Chemical Polishing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention discloses a supporting device of a dry etching machine table, which is characterized in that: the device comprises a main supporting mechanism arranged below a dry etching lower electrode plate, wherein the main supporting mechanism is supported and arranged at the corner edge position of a glass substrate, and the supporting device is also provided with a middle supporting mechanism which is supported at the two sides of the glass substrate and is close to the middle position. The supporting device for the dry etching machine table is reasonable in structural arrangement, good in supporting performance for the glass substrate, capable of effectively preventing glass from being damaged, capable of improving the applicability of the dry etching machine table and good in application prospect.
Description
Technical Field
The invention belongs to the technical field of dry etching machine tables, and particularly relates to a supporting device of a dry etching machine table.
Background
The glass substrates currently in commercial use are mainly 0.5-0.7 mm thick, and are taking the step of thinner (0.4mm) process. One TFT-LCD panel requires two glass substrates, which are used as a bottom glass substrate (TFT) and a Color Filter (Color Filter) substrate, respectively. In the dry etching process, basic etching environment is provided by dry etching machine equipment and a cavity, a dry etching lower electrode is positioned on a machine and used for supporting and adsorbing glass, the glass has structural stress, and the thermal stress is changed along with the change of external temperature; the glass substrate becomes thinner and the stress value increases. With the continuous development of science and technology, ultrathin requirements are provided by display equipment, the thickness of the corresponding main structure glass is also thinned, and when thinner glass is to be transported to the machine, the middle part of the glass can sag, so that the risk of glass breakage is increased.
Disclosure of Invention
The invention aims to solve the problems in the prior art and provides the dry etching machine table supporting device which is reasonable in structural arrangement, good in glass substrate supporting performance, capable of preventing glass from being damaged and capable of improving the applicability of a dry etching machine table.
In order to achieve the purpose, the invention adopts the technical scheme that: this kind of dry etching board strutting arrangement who provides, its characterized in that: the device comprises a main supporting mechanism arranged below a dry etching lower electrode plate, wherein the main supporting mechanism is supported and arranged at the corner edge position of a glass substrate, and the supporting device is also provided with a middle supporting mechanism which is supported at the two sides of the glass substrate and is close to the middle position.
In order to make the technical scheme more detailed and concrete, the invention also provides the following further preferable technical scheme to obtain satisfactory practical effect:
The main supporting mechanism comprises a main supporting seat, a main supporting pin for supporting the glass substrate is arranged on the main supporting seat, and a driving piece for driving the main supporting seat to move is further arranged on the main supporting seat.
Two main supporting pins which are arranged at intervals are arranged on the main supporting seat and respectively and correspondingly supported at the adjacent edges of the glass substrate.
Two adjacent main supporting mechanisms form a group of supporting modules, the supporting device comprises two groups of symmetrically arranged supporting modules, and one middle supporting mechanism is connected between each group of supporting modules.
The middle supporting mechanism comprises linkage beams, two ends of the linkage beams are respectively connected with the two sides of the main supporting seat.
The linkage beam is connected with a middle supporting seat, a middle supporting pin supported in the middle of the glass substrate is arranged on the middle supporting seat, and the middle supporting seat is connected to one side, close to the middle, of the linkage beam.
The middle position of the main supporting seat is connected with a connecting block, and two ends of the linkage cross beam are connected to the connecting block through rotating pin shafts.
The middle supporting pin is sleeved with a corrugated pipe.
The linkage beam is supported in a supporting frame, the supporting frame is fixedly connected to a fixed bottom plate, and the supporting modules of the same group are supported on the fixed bottom plate.
And a guide upright post is arranged between the supporting frame and the middle supporting seat.
Compared with the prior art, the invention has the following advantages: the supporting device for the dry etching machine table is reasonable in structural arrangement, good in supporting performance for the glass substrate, capable of effectively preventing glass from being damaged, capable of improving the applicability of the dry etching machine table and good in application prospect.
Drawings
The contents of the drawings and the reference numerals in the drawings of the present specification will be briefly described as follows:
FIG. 1 is a schematic view of a supporting device of a dry etching machine of the present invention;
FIG. 2 is a schematic structural diagram of a supporting device of a dry etching machine of the present invention;
FIG. 3 is a schematic structural diagram of a supporting device of a dry etching machine of the present invention;
FIG. 4 is a schematic view of a supporting device of the dry etching machine of the present invention.
FIG. 5 is a schematic diagram showing the arrangement position of the support holes on the dry etching lower electrode according to the present invention.
labeled as: 1. the device comprises a main supporting mechanism 11, a main supporting seat 12, a driving piece 13, a main supporting pin 2, a middle supporting mechanism 21, a supporting frame 22, a linkage beam 23, a middle supporting seat 24, a middle supporting pin 25, a corrugated pipe 26, a guide upright post 3, a fixed bottom plate 4, a connecting block 5, a dry etching lower electrode 51, a main supporting hole 52 and a middle supporting hole.
Detailed Description
the following description of the embodiments of the present invention will be made in detail with reference to the accompanying drawings.
The supporting device of the dry etching machine table comprises a main supporting mechanism 1 arranged below a lower electrode plate 5 for dry etching, wherein the main supporting mechanism 1 is supported and arranged at the corner edge position of a glass substrate, and a middle supporting mechanism 2 supported at two sides of the glass substrate close to the middle position is further arranged on the supporting device, as shown in figures 1, 2, 3 and 4. In the etching process, the main supporting mechanism 1 and the middle supporting mechanism 2 stably support the glass, so that the loading and unloading of the glass are controlled, and the risk of over-thin and breakage of the glass is reduced.
In the present invention, as shown in fig. 1 and 2, the main supporting mechanism 1 includes a main supporting base 11, a main supporting pin 13 for supporting the glass substrate is disposed on the main supporting base 11, and a driving member 12 for driving the main supporting base 11 to move is further disposed on the main supporting base 11. Two main supporting pins 13 which are arranged at intervals are arranged on the main supporting seat 11 and respectively and correspondingly supported at the adjacent edges of the glass substrate. As shown in fig. 5, eight main supporting holes 51 are arranged on the lower electrode at the dry etching position, and the driving member 12 controls the main supporting base 11 to drive the main supporting pins 13 to move up and down through the main supporting holes 51 to support and unload the glass.
In the present invention, as shown in fig. 1 and 3, two adjacent main supporting mechanisms 1 form a group of supporting modules, the supporting device includes two groups of symmetrically arranged supporting modules, and a middle supporting mechanism 2 is connected between each group of supporting modules. Namely, the embodiment of the invention is provided with eight edge main supports and two middle supports to support the glass substrate, thereby effectively preventing the glass from being damaged and improving the applicability of the dry etching machine.
In the present invention, as shown in fig. 2, the middle supporting mechanism 2 includes a linkage beam 22 having two ends respectively connected to the two main supporting bases 11, and the linkage beam 22 is supported on the supporting frame 21. A middle supporting seat 23 is arranged on one side of the linkage beam 22 close to the middle part, and a middle supporting pin 24 supported on the middle part of the glass substrate is arranged on the middle supporting seat 23. In the action process, the main supporting mechanism 1 and the middle supporting mechanism 2 are driven by a driving piece 12 arranged on the main supporting seat 11, and the linkage control of the main supporting pin 13 and the middle supporting pin 2 is realized through the linkage cross beam 22, so that synchronous supporting and unloading are realized. And this kind of middle part bearing structure 2 arranges rationally, and structural stability is good.
In the invention, the middle support seat 23 is connected to one side of the linkage beam 22 close to the middle, and the two middle support mechanisms are symmetrically arranged to ensure that the corresponding part of the middle support pin 24 passes through the middle support hole 52 arranged on the dry etching lower electrode 5. The supporting frame 21 is provided with a guide upright post 26, the middle supporting seat 23 is provided with a guide sleeve penetrating through the guide upright post 26, and the linkage cross beam 22 drives the middle supporting seat 23 to move up and down along the guide upright post 26 to control the moving stability of the middle supporting seat 23. The middle supporting PIN 24 is sleeved with a vacuum corrugated pipe 25, the vacuum corrugated pipe 25 can ensure that the sealing below the PIN shaft sleeve matched with the upper surface of the machine table is good, the bottom of the corrugated pipe is provided with a fine adjustment mechanism, and the fine adjustment mechanism is adjustable through a fine adjustment screw, so that the axial adjustment between the PIN and the hole is realized.
In the present invention, the driving members can be electric cylinders, hydraulic cylinders or electric motors, and two or three or more driving members are arranged on the main supporting base 11 at intervals to meet the requirement of driving movement. The middle position of the main supporting seat 11 is connected with a connecting block 4, and two ends of the linkage beam 22 are connected to the connecting block 4 through rotating pin shafts. The connecting block 4 is arranged in the middle of the main supporting seat 11, and the driving pieces 12 are symmetrically arranged on two sides of the connecting block 4, so that extra loss caused by uneven stress can be avoided.
In the invention, the same group of supporting modules are supported on the fixed bottom plate 3, the supporting frame 21 is fixedly connected on the fixed bottom plate 3, the fixed bottom plate 3 is fixed on the machine table top 2, and the fixed bottom plate 3 further promotes the connection relation of the whole supporting device.
As shown in fig. 5, the surface of the table for dry etching the lower electrode 5 has a main supporting hole 51 in the peripheral area and two middle supporting holes 52 in the middle area. The support pin is an elongated metal member shaped like a needle/round bar, and is movable up and down in the corresponding support hole in response to the action of the driving member 12 (electric cylinder/motor). The specific schematic diagram is as shown in fig. 1 and 2, the driving member 12 is lifted to drive the same group of support pins to synchronously move up and down, and the support pins are used for supporting glass in etching and loading and unloading the glass. Due to the thinning of the glass, the supporting device with the structure can effectively avoid the phenomenon of breaking and breaking the middle of the glass.
Divide into two sets of supporting component with strutting arrangement, i.e. I group of PIN and II group of PIN, each big group is fixed respectively on PMKD 3, is driven by respective driving piece 12 and goes up and down. In the support structure controlled by the drive 12 of each group, there are two main support pins 13. A middle supporting mechanism (two sides in common, structural central symmetry, 2 increase altogether) is added at 3 central line positions of same side PMKD, uses with I group of former machine platform PIN and II cooperations of PIN, increases the strong point in the glass middle part, alleviates the fragment problem that drooping leads to in the middle of the glass.
On original structure, for example I group of PIN one side, in PIN mechanism's subassembly, the driving piece is fixed in PMKD 3 through main supporting seat 11 on, PMKD 3 fixes on the board, and the driving piece motion, whole driving piece can promote the supporting PIN and shift up, can drive when sinking and move down, and PMKD 3 plays the effect of bridging, is similar to the crossbeam.
In this embodiment, the supporting component on the same side is provided with four driving members 12, during the operation process, the main supporting seat 11 of the main supporting mechanism 1 can be driven to move along with the synchronous operation of the four driving members 12 arranged on the same side, the main supporting seat 11 can drive the linkage beam 22 and the middle supporting seat 23 and the middle supporting pin 24 to move together, the lifting effect on the glass is realized, and when the glass is kept still, the supporting frame 21 and the fixed bottom plate 3 can support each other. The four driving parts on the same side and the four driving parts on the other side move synchronously, so that the ten supporting pins move at the same height, and the loaded or unloaded glass is ensured to be horizontal.
In the present invention, a central support hole having a diameter specified by a customer is formed on the dry-etched lower electrode 5 at a position corresponding to the central support pin 24 by machining. Firstly, a smooth through hole with a specified inner diameter is manufactured on a metal substrate, a ceramic shaft sleeve is bonded on the inner wall of the through hole by using vacuum adhesive (torr seal), and the ceramic shaft sleeve can be used after being dried. The inner diameter of the ceramic shaft sleeve is the diameter of the support hole specified by a customer.
The supporting device for the dry etching machine table is reasonable in structural arrangement, good in supporting performance for the glass substrate, capable of effectively preventing glass from being damaged and improving the applicability of the dry etching machine table, and has strong practicability and good application prospect.
The invention has been described above with reference to the accompanying drawings, but the invention is not limited to the above-described embodiments, and it is within the scope of the invention to use various insubstantial modifications of the inventive concept and solutions or to apply them directly to other applications.
Claims (10)
1. Dry etching board strutting arrangement, its characterized in that: the device comprises a main supporting mechanism arranged below a dry etching lower electrode plate, wherein the main supporting mechanism is supported and arranged at the corner edge position of a glass substrate, and the supporting device is also provided with a middle supporting mechanism which is supported at the two sides of the glass substrate and is close to the middle position.
2. The support device for a dry etching machine table as claimed in claim 1, wherein: the main supporting mechanism comprises a main supporting seat, a main supporting pin for supporting the glass substrate is arranged on the main supporting seat, and a driving piece for driving the main supporting seat to move is further arranged on the main supporting seat.
3. The support device for a dry etching machine table as claimed in claim 2, wherein: two main supporting pins which are arranged at intervals are arranged on the main supporting seat and respectively and correspondingly supported at the adjacent edges of the glass substrate.
4. The support device for a dry etching machine table as claimed in claim 3, wherein: two adjacent main supporting mechanisms form a group of supporting modules, the supporting device comprises two groups of symmetrically arranged supporting modules, and one middle supporting mechanism is connected between each group of supporting modules.
5. The supporting device of the dry etching machine table as claimed in any one of claims 2 to 4, wherein: the middle supporting mechanism comprises linkage beams, two ends of the linkage beams are respectively connected with the two sides of the main supporting seat.
6. The support device for a dry etching machine table as claimed in claim 5, wherein: the linkage beam is connected with a middle supporting seat, a middle supporting pin supported in the middle of the glass substrate is arranged on the middle supporting seat, and the middle supporting seat is connected to one side, close to the middle, of the linkage beam.
7. The support device for a dry etching machine table as claimed in claim 6, wherein: the middle position of the main supporting seat is connected with a connecting block, and two ends of the linkage cross beam are connected to the connecting block through rotating pin shafts.
8. The support device for a dry etching machine table as claimed in claim 7, wherein: the middle supporting pin is sleeved with a corrugated pipe.
9. The support device for a dry etching machine table as claimed in claim 5, wherein: the linkage beam is supported in a supporting frame, the supporting frame is fixedly connected to a fixed bottom plate, and the supporting modules of the same group are supported on the fixed bottom plate.
10. The support device for a dry etching machine table as claimed in claim 9, wherein: and a guide upright post is arranged between the supporting frame and the middle supporting seat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910917590.7A CN110571184A (en) | 2019-09-26 | 2019-09-26 | Supporting device for dry etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910917590.7A CN110571184A (en) | 2019-09-26 | 2019-09-26 | Supporting device for dry etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110571184A true CN110571184A (en) | 2019-12-13 |
Family
ID=68782576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910917590.7A Pending CN110571184A (en) | 2019-09-26 | 2019-09-26 | Supporting device for dry etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110571184A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101047143A (en) * | 2006-03-31 | 2007-10-03 | 东京毅力科创株式会社 | Basal plate carrying table and basal plate processing device |
| CN101136353A (en) * | 2006-08-31 | 2008-03-05 | 东京毅力科创株式会社 | Substrate carrying mechanism and connecting method |
| CN102915944A (en) * | 2011-08-02 | 2013-02-06 | 东京毅力科创株式会社 | Substrate connecting method |
| JP2015167159A (en) * | 2014-03-03 | 2015-09-24 | 東京エレクトロン株式会社 | Board mounting device and board treatment device |
| CN210403693U (en) * | 2019-09-26 | 2020-04-24 | 芜湖通潮精密机械股份有限公司 | Supporting device for dry etching machine table |
-
2019
- 2019-09-26 CN CN201910917590.7A patent/CN110571184A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101047143A (en) * | 2006-03-31 | 2007-10-03 | 东京毅力科创株式会社 | Basal plate carrying table and basal plate processing device |
| CN101136353A (en) * | 2006-08-31 | 2008-03-05 | 东京毅力科创株式会社 | Substrate carrying mechanism and connecting method |
| CN102915944A (en) * | 2011-08-02 | 2013-02-06 | 东京毅力科创株式会社 | Substrate connecting method |
| JP2015167159A (en) * | 2014-03-03 | 2015-09-24 | 東京エレクトロン株式会社 | Board mounting device and board treatment device |
| CN210403693U (en) * | 2019-09-26 | 2020-04-24 | 芜湖通潮精密机械股份有限公司 | Supporting device for dry etching machine table |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102057314B (en) | Substrate processing system | |
| JP2006289625A (en) | Substrate breaking apparatus of laminated substrate and substrate breaking method | |
| CN101658833A (en) | Coating machine and a method for coating mash thereby | |
| CN102057313A (en) | Method for processing substrate of mother board | |
| CN210403693U (en) | Supporting device for dry etching machine table | |
| KR20130135531A (en) | Substrate separation device and for method for separating the substrate using thereof | |
| CN2829982Y (en) | Aligning device | |
| JP2006227181A (en) | Device and method for inverting substrate, and device for manufacturing substrate | |
| CN203092546U (en) | Arm of base plate carrying robot and base plate carrying robot | |
| CN110571184A (en) | Supporting device for dry etching machine | |
| JP2014135333A (en) | Sucking and lifting/lowering device | |
| CN203754043U (en) | Faceplate turnover device | |
| CN108396300A (en) | A kind of vapor deposition substrate separator and evaporation coating device | |
| JP3897469B2 (en) | Inspection apparatus and inspection method for flat object | |
| JPH11227943A (en) | Substrate transfer device | |
| US20100089961A1 (en) | Apparatus and method of cutting liquid crystal display device | |
| KR100666021B1 (en) | Sticking device for flat panel substrate | |
| CN212528692U (en) | Downloading table for curved surface laminating equipment | |
| JP2019196281A (en) | Substrate dividing device | |
| CN212528980U (en) | Laminating roller device and curved surface laminating equipment | |
| CN111605177B (en) | Curved surface fitting equipment and method | |
| JP2014176969A (en) | Sucking and inverting device | |
| KR100490053B1 (en) | Glass Stage for Liquid Crystal Display | |
| JP6271683B2 (en) | Adsorption reversing device | |
| KR101021986B1 (en) | A scribing apparatus and a scribing method for forming a scribe line |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |