CN110376853A - High-precision full-automatic sided exposure machine - Google Patents
High-precision full-automatic sided exposure machine Download PDFInfo
- Publication number
- CN110376853A CN110376853A CN201910795902.1A CN201910795902A CN110376853A CN 110376853 A CN110376853 A CN 110376853A CN 201910795902 A CN201910795902 A CN 201910795902A CN 110376853 A CN110376853 A CN 110376853A
- Authority
- CN
- China
- Prior art keywords
- plate
- exposure
- axis
- mask plate
- slide unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007599 discharging Methods 0.000 claims abstract description 17
- 238000009434 installation Methods 0.000 claims abstract description 11
- 230000007246 mechanism Effects 0.000 claims description 66
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- 239000000741 silica gel Substances 0.000 claims description 32
- 229910002027 silica gel Inorganic materials 0.000 claims description 32
- 239000000758 substrate Substances 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 29
- 230000003139 buffering effect Effects 0.000 claims description 19
- 229910000831 Steel Inorganic materials 0.000 claims description 17
- 239000010959 steel Substances 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000001360 synchronised effect Effects 0.000 claims description 11
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000006073 displacement reaction Methods 0.000 claims description 7
- 238000003825 pressing Methods 0.000 claims description 7
- 102000010637 Aquaporins Human genes 0.000 claims description 6
- 108010063290 Aquaporins Proteins 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims description 4
- 238000009833 condensation Methods 0.000 claims description 2
- 230000005494 condensation Effects 0.000 claims description 2
- 239000011295 pitch Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 230000007306 turnover Effects 0.000 description 6
- 238000001914 filtration Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 229910000639 Spring steel Inorganic materials 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 108091006146 Channels Proteins 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 241000252254 Catostomidae Species 0.000 description 1
- 235000012550 Pimpinella anisum Nutrition 0.000 description 1
- 240000004760 Pimpinella anisum Species 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a kind of high-precision full-automatic sided exposure machines comprising rack, the modules being used to support in installation exposure machine and system;Upper frame system is located at machine frame inside, including providing the upper mask plate of pattern for the exposure of product upper surface;Barebone precisely aligns Barebone for realizing upper mask plate and lower mask plate, the lower section of upper frame system is set to Barebone including providing the lower mask plate of pattern for the exposure of product lower surface;Discharging system, including feed system and discharge system, for product automatic feed and self-emptying;Arm-and-hand system;Vision system;Exposure module;Constant temperature and humidity module;Control system.The present invention can prevent pattern when exposure from misplacing, improve exposure quality by the alignment to mask plate above and below Barebone and vision system realization sided exposure machine, can complete multi-direction and angle adjustment, alignment precision height by aligned units.
Description
Technical field
The invention belongs to exposure machine technical field more particularly to a kind of high-precision full-automatic sided exposure machines.
Background technique
Ultraviolet exposure machine refers to the ultraviolet light that UVA wavelength is issued by opening light, will be on film or other transparent bodies
Image information be transferred to the machinery equipment on the surface for being coated with photoactive substance, exposure machine has single-side exposure machine and double-sided exposure
Machine.
It includes board that Chinese patent CN106547174B, which discloses a kind of Full-automatic double-side exposure machine, on Yu Tongyi axis according to
Secondary setting material feeding region, the first face exposure region, transfer turnover panel area, the second face exposure region and discharge zone;It is equipped with charging transfer
Structure, the first exposure mechanism shift panel turnover mechanism, are located above transfer the first face of turnover panel region exposure region, and will complete first
The plate of face exposure transfers load to transfer turnover panel area by the first face exposure region, and the plate for completing the exposure of the first face is turned over by the first face
The second face is gone to, discharge transfer device, the second exposure mechanism, by laterally setting the first face exposure region and the second face exposure region
It sets, can effectively reduce the length of two-sided automatic exposure machine, and can expose by the first exposure stage of transverse shifting or second
Optical platform realizes the operation of exposure.
Chinese patent CN108255029A discloses a kind of sided exposure machine and its exposure method, including the first exposure machine
Structure, the second exposure mechanism and turnover mechanism, first exposure mechanism include the first exposure device and are slideably positioned in the first exposure
The first exposure stage below electro-optical device, first exposure stage are provided with the first camera shooting alignment device, second exposure
Mechanism includes the second exposure device and the second exposure stage for being slideably positioned in below the second exposure device, and second exposure is flat
Platform is provided with the second camera shooting alignment device.
Double-sided exposure is realized in the overturning that sided exposure machine in above-mentioned two patent of invention passes through workpiece, and is exposed every time
Light has to overturn, and working procedure is lengthy and jumbled, inefficiency.Necessarily equipment volume is caused to increase using turnover mechanism simultaneously, and
It is not high for exposing patterns and the alignment control precision of workpiece upper and lower surfaces.
Summary of the invention
It is an object of the invention in view of the foregoing drawbacks, provide a kind of high degree of automation, high-efficient, expose accurate high
Precision Full-automatic double-side exposure machine.
For the attainment of one's purpose, technical solution provided by the invention are as follows:
A kind of high-precision full-automatic sided exposure machine of the present invention comprising
Rack, the modules being used to support in installation exposure machine and system;
Upper frame system is located at machine frame inside, including providing the upper mask plate of pattern for the exposure of product upper surface;
Barebone above covers Barebone including providing the lower mask plate of pattern for the exposure of product lower surface
Film version and lower mask plate precisely align, and the lower section of upper frame system is set to Barebone;
Discharging system, including feed system and discharge system, for product automatic feed and self-emptying;
Arm-and-hand system is set to above discharging system, for product to be exposed to be transported to pair from feed system
On Barebone, the product that exposure is completed is transported in discharge system;
Vision system is located to below Barebone, is directed at required displacement to provide Barebone;
Exposure module, including upper exposure module and lower exposure module, upper exposure module are mounted on the top of frame system, are
The exposure of product upper surface provides light source, and lower exposure module is set to below Barebone, provides light source for the exposure of product lower surface;
Constant temperature and humidity module, is mounted on the rack, and controls the temperature and humidity in exposure machine;
Control system, for controlling upper frame system, to Barebone, discharging system, arm-and-hand system, vision system, exposure
The coordinated operation of optical module and constant temperature and humidity module.
Preferably, the discharge system and discharge system respectively include first support, rodless cylinder, slide unit, sliding rail, light
Electric transducer, lifting cylinder and platform mechanism, the first support are fixed on the rack, and sliding rail is mounted on the two of first support
Side, rodless cylinder are mounted in first support, and two sides and the sliding rail of the slide unit are slidably connected, and slide unit and rodless cylinder are driven
Connection;The lifting cylinder is fixed in first support, and photoelectric sensor is set to lifting cylinder side;The platform mechanism
Including material conveying platform, stepper motor, screw rod, straight optical axis, buffering branch angle and buffering branch angle mounting base;The material conveying platform bottom
Portion is equipped with connecting shaft, is equipped with bearing at the top of slide unit, and material conveying platform is mounted in bearing by connecting shaft, and connects with lifting cylinder
It connects;Stepper motor, screw rod and the straight optical axis is mounted on the bottom of material conveying platform, and stepper motor is connect with screw rod transmission,
Straight optical axis is located at the two sides of screw rod, and buffering branch angle mounting base is set on straight optical axis and connect with screw rod, the buffering
Branch angle is fixed on the both ends of buffering branch angle installation and is located at the top of material conveying platform.Feed system and discharging system in discharging system
Structure of uniting is identical, transports platform mechanism by rodless cylinder and passes in and out feeding, the buffering branch angle in platform mechanism can play fixation
The effect of product, and the position at buffering branch angle, material conveying platform and slide unit can be adjusted as free-standing company according to the size of product
It connects, after photoelectric sensor senses material conveying platform in place, material conveying platform can be gone up and down by lifting cylinder.
Preferably, the arm-and-hand system includes X-axis carrying mechanism and Liang Ge carrying sucker mechanism;The carrying is inhaled
Disc mechanism is mounted on X-axis carrying mechanism;The X-axis carrying mechanism includes X-axis bracket, two linear motor stator electrics, two
Linear motor rotor and X-axis linear guide, the X-axis bracket are fixed on the rack, and X-axis linear guide is mounted on X-axis bracket
Top, linear motor stator electric are mounted on X-axis stent side portion, and linear motor rotor is mounted on linear motor stator electric;The suction
Disc mechanism includes sucker mounting rack, Mobile base, vacuum generator, vacuum solenoid and sucker;The Mobile base and straight-line electric
It motor-driven sub- connection and is slidably connected with X-axis linear guide;Sucker mounting rack is fixed on Mobile base, and sucker is fixed on sucker installation
Frame bottom, vacuum generator are connect by vacuum solenoid with sucker.Liang Ge carrying sucker mechanism is each responsible for feeding and blanking,
It works independently, improves efficiency.Using the driving device as carrying sucker mechanism of linear motor, space hold can be reduced.
Preferably, the upper frame system includes second support, outline border, inside casing, upper ledge cylinder, steel plate press strip, spring steel
Plate, upper mask plate and upper mask plate pressing plate;The second support is located at the two sides of outline border and is fixed on the rack, upper ledge cylinder
Fixed the cylinder rod of upper ledge cylinder is connect with outline border on the secondary support bracket, and inside casing is set in outline border, and the surrounding of inside casing passes through spring steel
Plate is connect with outline border, and is fixed by steel plate press strip;The upper mask plate is fixed in inside casing by upper mask plate pressing plate
The two sides in portion, outline border are connect by rotating assembly with second support.In order to achieve the purpose that upper mask plate floats up and down, make
The steel spring plate connection inside casing and outline border on four sides are symmetrically distributed in four.Steel spring plate two sides are fixed on press strip interior respectively
On frame and outline border, both ends are positioned using pin hole, and intermediate screw locking, position is accurate, and connection is reliable.Steel spring plate has very high
Tensile strength, yield limit and very high fatigue strength, ensure that inside casing and outline border be connected in XY both direction have it is non-
Often high rigidity, while inside casing can have certain displacement due to the elastic deformation of steel spring plate in z-direction.It is entire in this way
Upper frame system can make mask plate that can also carry out one in z-direction while guaranteeing fixed accurate location on the direction XY
Fixed lifting, when lower mask plate being avoided to rise fitting, rigid collision, which occurs, leads to breakage.It is just completed using four flat spring steel plates
The floating mount of mask plate, it is low in cost, it is convenient for disassembly and assembly, it is highly reliable, while occupied space very little, avoid equipment entirety ruler
It is very little excessive.
Preferably, described includes lower frame component, several floating cushions, several aligned units, pedestal and Z shaft to Barebone
Mechanism, the lower frame component are mounted on the base by floating cushion and aligned units, and Z-axis mechanism is located at the two sides of pedestal, right
Barebone is smoothly jacked up lower frame component by floating cushion, then passes through aligned units for upper mask plate and lower mask plate position
It precisely aligns.The lower frame component includes working panel, D type silica gel strip and lower mask plate;The working panel is hollow knot
Structure, lower mask plate are mounted on the inside of working panel, and D type silica gel strip is mounted on the working panel of lower mask plate periphery, described
Floating cushion and aligned units be set to the bottom of working panel, lower mask plate is surrounded by vacuum orifice.Pass through vacuum orifice
Carrying out vacuumize process can be such that mask plate and lower mask plate is bonded completely with the upper and lower surface of workpiece, guarantee mask plate up and down
Correct exposure.
Preferably, the aligned units include voice coil motor, the second crossed roller guide rail, grating scale, flexible connecting plate,
Intermediate slide unit, upper slide unit and slid platform base;The intermediate slide unit is connected by the second crossed roller guide rail and slid platform base sliding
It connects, upper slide unit is slidably connected with intermediate slide unit, is equipped with self-locking body between upper slide unit and intermediate slide unit, voice coil motor intersects with second
Roller guide rail is drivingly connected, and grating scale is mounted on intermediate slide unit side, and flexible connecting plate is mounted on the top of upper slide unit, upper slide unit
It is mutually perpendicular to the moving direction of intermediate slide unit;Voice coil motor drives intermediate slide unit mobile by the second crossed roller guide rail, and
By grating scale precise measurement displacement, the accuracy of alignment is improved.
Preferably, the Z-axis mechanism includes side plate, Z axis motor, Z axis screw rod and the first crossed roller guide rail;Described
Z axis motor and Z axis screw rod are mounted on side plate, and Z axis motor is connect with Z axis screw rod transmission;The first crossed roller guide rail
It is connect with Z axis screw rod, the two sides of the pedestal are mounted on the first crossed roller guide rail.Z-axis mechanism drives lower frame component or more
It is mobile, so that upper mask plate and the contact of lower mask plate, and logical D type silica gel strip is close by the space between upper mask plate and lower mask plate
Envelope, stable performance is good, and mechanical energy consumption is small and precision is high, and speed is fast, large carrying capacity, Yi Shixian high rigidity, high load capacity fortune
It is dynamic.Aligned units enable to mask plate and lower mask plate to realize that high-precision is aligned.
Preferably, the vision system includes third bracket, servo motor, synchronous belt, camera mobile cylinder, CCD work
Industry camera mechanism, the first guide rail and crossbeam;First guide rail is set to the two sides of third bracket, and servo motor is mounted on third
On bracket, synchronous belt is connect with servo motor transmission, and there are two the crossbeam is set, the both ends of crossbeam are sliding with the first guide rail respectively
It is dynamic to connect and fixed with synchronous belt;Intersect on each crossbeam and is symmetrically installed two camera mobile cylinders;The CCD work
Industry camera mechanism includes CCD industrial camera, camera installing plate, camera connecting plate, camshaft bearing follower and sliding block;The phase
Machine mounting plate is fixed on four edges of third bracket, and camera installing plate is equipped with the second sliding rail and arc groove;The phase
Machine connecting plate is connect with the cylinder rod of camera mobile cylinder, and camshaft bearing follower and sliding block are mounted on camera connecting plate, cam
Bearing follower is connected in arc groove, and sliding block is slidably connected with the second sliding rail;The CCD industrial camera is fixed on camera company
Above fishplate bar, third bracket two sides are mounted on the first crossed roller guide rail.CCD work is realized by the push-and-pull of camera mobile cylinder
The work of industry camera is withdrawn.
Preferably, the upper exposure module includes the second array substrate, the second lens, the second guide post, locking
Second bearing, the second heat-conducting silica gel sheet, the second ultra-violet light-emitting diode, the second ultra-violet light-emitting diode array plate and the second water cooling
Plate;Second guide post is fixed on the rack, and the second water-cooled plate is mounted on the second guide post by locking second bearing;Institute
The second heat-conducting silica gel sheet stated is mounted below the second water-cooled plate, and the second ultra-violet light-emitting diode interval is mounted on the second ultraviolet hair
On light diode array plate, the second ultra-violet light-emitting diode array plate be equipped with it is multiple, be evenly arranged under the second heat-conducting silica gel sheet
Side, the second array substrate are mounted below the second ultra-violet light-emitting diode array plate, and the second lens separation is mounted on second
Setting is corresponded to each other on array substrate and with the second ultra-violet light-emitting diode, is equipped with the second water in second water-cooled plate
Channel.
Preferably, the lower exposure module includes the first array substrate, the first lens, the first guide post, locking
First bearing, the first heat-conducting silica gel sheet, the first ultra-violet light-emitting diode, the first ultra-violet light-emitting diode array plate and the first water cooling
Plate;First guide post is fixed on the rack, and the first water-cooled plate is mounted on the first guide post by locking first bearing;Institute
The first heat-conducting silica gel sheet stated is covered on above the first water-cooled plate, and the first ultra-violet light-emitting diode interval is mounted on the first ultraviolet hair
On light diode array plate, the first ultra-violet light-emitting diode array plate be equipped with it is multiple, be evenly arranged in the first heat conductive silica gel on piece
Side, the first array substrate are mounted on above the first ultra-violet light-emitting diode array plate, and the first lens separation is mounted on first
Setting is corresponded to each other on array substrate and with the first ultra-violet light-emitting diode, is equipped with the first water in first water-cooled plate
Channel.Upper exposure module in exposure module is identical with lower exposure module structure, and the light direction of upper exposure module is downward, lower exposure
The light direction of optical module is upward.First water-cooled plate and the second water-cooled plate take away the first ultra-violet light-emitting diode by flowing water
The aniseed heat generated with the second ultra-violet light-emitting diode, the first array substrate, the first ultra-violet light-emitting diode array plate
Whole height and position can be adjusted on the first guide post with the first water-cooled plate;Second array substrate, the second ultra-violet light-emitting two
Grade pipe array board and the second water-cooled plate can adjust whole height and position on the second guide post.
Preferably, the constant temperature and humidity system includes air filter, sink, fin heats pipe, condenser, fresh air system
Road under the overall leadership;The fresh air system pipeline is connect with condenser, and condenser is connect with air filter;Fin heats pipe is mounted on
In fresh air system pipeline, the sink is located at condenser side;The air outlet of fresh air system pipeline is close to vision system.Air
Filter filtering will enter the air inside machine, select condenser according to machine internal temperature and humidity status after filtering
Humidify or temperature adjustment is carried out by fin heats pipe, is delivered to inside machine by fresh air system pipeline.
Preferably, the floating cushion and aligned units are respectively equipped with three, and two of them floating cushion is arranged in working face
The both ends of plate the same side, the middle position of the side parallel with the same side is arranged in another;The setting of two of them aligned units
Between described two floating cushions, the middle position of the side vertical with described working panel the same side is arranged in another.It is logical
It is mobile in the direction XY respectively and rotate certain angle and complete coordinated adjustment to the position of Barebone to cross three aligned units,
Achieve the purpose that upper and lower mask plate is accurately bonded.The side of two aligned units is X-direction, the side of an independent aligned units
For Y-direction, when X-direction is mobile, the voice coil motor of Y-direction aligned units does not work, the voice coil motor work of X-direction aligned units
Make, the upper slide unit of Y-direction aligned units is with the moving direction movement of slide unit among X-direction aligned units, and working panel is in the side X
It moves up;When moving in the Y direction, the voice coil motor of X-direction aligned units does not work, the voice coil motor of Y-direction aligned units
Work, the upper slide unit of X-direction aligned units is with the moving direction movement of slide unit among Y-direction aligned units, and working panel is in Y
It is moved on direction;When adjusting the angle, the voice coil motor of Y-direction aligned units does not work, and between upper slide unit and intermediate slide unit
Self-locking body self-locking, the voice coil motors of X-direction aligned units work, when in X-direction aligned units is controlled by control system
Between slide unit it is mobile when, entire working panel is center of circle rotation using the aligned units of Y-direction.
Using technical solution provided by the invention, compared with prior art, have the following beneficial effects:
1, the present invention can be prevented by the alignment to mask plate above and below Barebone and vision system realization sided exposure machine
Pattern misplaces when exposure, improves exposure quality, can complete multi-direction and angle adjustment, alignment precision by aligned units
It is high.
2, the present invention realizes the automatic loading/unloading and input and output material of product, automation by discharging system and arm-and-hand system
Degree is high, improves working efficiency.
3, the exposure module in the present invention is cooled down automatically by water-cooled plate, can be prevented from generating a large amount of heat when work and be led
LED light and line failure are caused, is provided safeguard for exposure.
4, the present invention controls the temperature and humidity in exposure machine by constant temperature and humidity module, provides advantageous exposure for exposure
Environment.
Detailed description of the invention
Fig. 1 is three-dimensional structure diagram of the invention;
Fig. 2 is main view of the invention;
Fig. 3 is discharging system structural schematic diagram in the present invention;
Fig. 4 is the attachment structure schematic diagram of slide unit in the present invention;
Fig. 5 is the structural schematic diagram of platform mechanism in the present invention;
Fig. 6 is the structural schematic diagram of arm-and-hand system in the present invention;
Fig. 7 is the structural schematic diagram of X-axis carrying mechanism in the present invention;
Fig. 8 is the structural schematic diagram of carrying sucker mechanism in the present invention;
Fig. 9 is upper frame system and the position view to Barebone in the present invention;
Figure 10 is the structural schematic diagram of upper frame system in the present invention;
Figure 11 is the structural schematic diagram in the present invention to Barebone;
Figure 12 is the structural schematic diagram of aligned units in the present invention;
Figure 13 is the structural schematic diagram of Z-axis mechanism in the present invention;
Figure 14 is the structural schematic diagram of vision system in the present invention;
Figure 15 is the structural schematic diagram of lower exposure module in the present invention;
Figure 16 is the structural schematic diagram of the first ultra-violet light-emitting diode array plate in the present invention;
Figure 17 is the structural schematic diagram of the first water-cooled plate in the present invention;
Figure 18 is the structural schematic diagram of constant temperature and humidity module in the present invention;
Figure 19 is the structural schematic diagram of upper exposure module in the present invention;
Figure 20 is the structural schematic diagram of the second ultra-violet light-emitting diode array plate in the present invention;
Figure 21 is the structural schematic diagram of the second water-cooled plate in the present invention;
Mark explanation in schematic diagram:
1- rack;The upper frame system of 2-;3- is to Barebone;4- discharging system;5- arm-and-hand system;6- vision system;7-
Exposure module;8- constant temperature and humidity module;21- second support;22- outline border;23- inside casing;24- upper ledge cylinder;25- steel plate press strip;
26- steel spring plate;The upper mask plate of 27-;The upper mask plate pressing plate of 28-;31- lower frame component;Tri- floating cushions of 32-;33- tri- alignments
Unit;34- pedestal;35-Z rotating shaft mechanism;41- first support;42- rodless cylinder;43- slide unit;44- sliding rail;45- photoelectric sensing
Device;46- lifting cylinder;47- platform mechanism;48- bearing;51-X axis carrying mechanism;52- carrying sucker mechanism;61- third branch
Frame;62- servo motor;63- synchronous belt;64- camera mobile cylinder;65-CCD industrial camera mechanism;The first guide rail of 66-;67- is horizontal
Beam;Exposure module under 71-;Exposure module on 72;81- air filter;82- sink;83- fin heats pipe;84- condenser;
85- fresh air system pipeline;311- working panel;312-D type silica gel strip;Mask plate under 313-;331- voice coil motor;332- second
Crossed roller guide rail;333- grating scale;334- flexible connecting plate;Slide unit among 335-;337- upper slide unit;336- slid platform base;
351- side plate;352-Z spindle motor;353-Z axial filament bar;354- the first crossed roller guide rail;471- material conveying platform;472- stepping electricity
Machine;473- screw rod;474- straight optical axis;475- buffers branch angle;476- buffers branch angle mounting base;477- connecting shaft;511-X axis branch
Frame;512- linear motor stator electric;513- linear motor rotor;514-X axis linear guide;651-CCD industrial camera;652- camera
Mounting plate;653- camera connecting plate;654- camshaft bearing follower;655- sliding block;656 second sliding rails;657- arc groove;711-
First array substrate;The first lens of 712-;The first guide post of 713-;714- first band locks bearing;The first thermal conductive silicon of 715-
Film;716- the first ultra-violet light-emitting diode;717- the first ultra-violet light-emitting diode array plate;The first water-cooled plate of 718-;7171-
First aluminum substrate;The first connector of 7172-;7173- the first fluorescent tube installing port;The second array substrate of 721-;722- second
Lens;The second guide post of 723-;724- the second locking bearing;The second heat-conducting silica gel sheet of 725-;726- the second ultra-violet light-emitting second level
Pipe;727- the second ultra-violet light-emitting diode array plate;The second water-cooled plate of 728-;The second aluminum substrate of 7271-;7272- second is patched
Part;7273- the second fluorescent tube installing port.
Specific embodiment
To further appreciate that the contents of the present invention, the present invention is described in detail in conjunction with the embodiments, and following embodiment is used for
Illustrate the present invention, but is not intended to limit the scope of the invention.
As depicted in figs. 1 and 2, the present embodiment is related to a kind of high-precision full-automatic sided exposure machine, including rack 1, is used for
Modules and system in support installation exposure machine;
Upper frame system 2 is located inside rack 1, including providing the upper mask plate 27 of pattern for the exposure of product upper surface;
To Barebone 3, including providing the lower mask plate 313 of pattern for the exposure of product lower surface, for realizing upper mask plate
27 and lower mask plate 313 precisely align, the lower section of upper frame system 2 is set to Barebone 3;
Discharging system 4, including feed system and discharge system, for product automatic feed and self-emptying;
Arm-and-hand system 5 is set to 4 top of discharging system, for product to be exposed to be transported to from feed system
To on Barebone 3, the product that exposure is completed is transported in discharge system to Barebone 3;
Vision system 6 is located to 3 lower section of Barebone, to provide alignment required displacement Barebone 3;
Exposure module 7, including upper exposure module 72 and lower exposure module 71, upper exposure module 72 are mounted on frame system 2
Top, provide light source for the exposure of product upper surface, lower exposure module 71 is set to 3 lower section of Barebone, is exposed for product lower surface
Light provides light source;
Constant temperature and humidity module 8 is mounted in rack 1, controls the temperature and humidity in exposure machine;
Control system, for controlling upper frame system 2, to Barebone 3, discharging system 4, arm-and-hand system 5, vision system
6, the coordinated operation of exposure module 7 and constant temperature and humidity module 8.
As shown in Figure 3 and Figure 4, the feed system and discharge system respectively include first support 41, rodless cylinder 42,
Slide unit 43, sliding rail 44, photoelectric sensor 45, lifting cylinder 46 and platform mechanism 47, the first support fix 41 in rack 1
On, sliding rail 44 is mounted on the two sides of first support 41, and rodless cylinder 42 is mounted in first support 41, and the two of the slide unit 43
Side is slidably connected with sliding rail 44, and slide unit 43 and rodless cylinder 42 are sequentially connected;Rodless cylinder 42 drives slide unit 43 on sliding rail 44
It is mobile.The lifting cylinder solid 46 is scheduled in first support 41, and photoelectric sensor 45 is set to 46 side of lifting cylinder.
As shown in figure 5, the platform mechanism 47 includes material conveying platform 471, stepper motor 472, screw rod 473, line light
Axis 474, buffering branch angle 475 and buffering branch angle mounting base 476;471 bottom of material conveying platform is equipped with connecting shaft 477, slide unit
43 tops are equipped with bearing 48, and material conveying platform 471 is mounted in bearing 48 by connecting shaft 477, and material conveying platform 471 is flat by feeding
Platform bracket 49 is connect with lifting cylinder 46;Stepper motor 472, screw rod 473 and the straight optical axis 474 is mounted on material conveying platform
471 bottom, stepper motor 472 and screw rod 473 are sequentially connected, and straight optical axis 474 is located at the two sides of screw rod 473, buffer branch angle
Mounting base 476 is set on straight optical axis 474 and connect with screw rod 473, and the buffering branch angle 475 passes through material conveying platform 471
It is fixed on the both ends of buffering branch angle mounting base 476.Feed system in discharging system 4 is identical with discharge system structure, passes through
Rodless cylinder 42 transports platform mechanism 47 and passes in and out feeding, and the buffering branch angle 475 in platform mechanism 47 can play fixed product
Effect, and the position at buffering branch angle 475 can be adjusted according to the size of product, material conveying platform 471 and slide unit 43 are free-standing
Connection, after photoelectric sensor 45 senses material conveying platform 471 in place, material conveying platform 471 can be gone up and down by lifting cylinder 46.
As shown in Figure 6 to 8, the arm-and-hand system 5 includes X-axis carrying mechanism 51 and Liang Ge carrying sucker mechanism
52;The carrying sucker mechanism 52 is mounted on X-axis carrying mechanism 51;The X-axis carrying mechanism 51 includes X-axis bracket
511, two linear motor stator electrics, 512, two linear motor rotors 513 and X-axis linear guide 514, the X-axis bracket 511
It is fixed in rack 1, X-axis linear guide 514 is mounted on 511 top of X-axis bracket, and linear motor stator electric 512 is mounted on X-axis bracket
511 sides, linear motor rotor 513 are mounted on linear motor stator electric 512;The sucking disc mechanism 52 includes sucker mounting rack
521, Mobile base 522, vacuum generator, vacuum solenoid and sucker 523;The Mobile base 522 and linear motor rotor 513
It connects and is slidably connected with X-axis linear guide 514;Sucker mounting rack 521 is fixed on Mobile base 522, and multiple suckers 523 are spaced
Setting is connect by vacuum solenoid with sucker 523 in 521 bottom of sucker mounting rack, vacuum generator.Two carrying sucker machines
52 structures are each responsible for feeding and blanking, work independently, improve efficiency.Using the drive as carrying sucker mechanism 52 of linear motor
Dynamic device, can reduce space hold.
As shown in Figure 9 and Figure 10, the upper frame system 2 includes second support 21, outline border 22, inside casing 23, upper ledge cylinder
24, steel plate press strip 25, steel spring plate 26, upper mask plate 27 and upper mask plate pressing plate 28;The second support 21 is located at outline border
It 22 two sides and is fixed in rack 1, upper ledge cylinder 24 is fixed in second support 21, the cylinder rod and outline border 22 of upper ledge cylinder 24
Connection, inside casing 23 are set in outline border 22, the surrounding of inside casing 23 by four two-by-two symmetrical steel spring plate 26 connect with outline border 22,
And it is fixed by steel plate press strip 25;The upper mask plate 27 is fixed on the inside of inside casing 23 by upper mask plate pressing plate 28, outside
The two sides of frame 22 are connect by rotating assembly 29 with second support 21.The floating of upper mask plate 27 is completed by four buffering steel discs 26
Dynamic installation, it is low in cost, it is convenient for disassembly and assembly, it is highly reliable, while occupied space very little, it is excessive to avoid equipment overall dimensions.
As shown in figures 9 and 11, described includes that the alignment of the floating cushion 32, three of lower frame component 31, three is single to Barebone 3
Member 33, pedestal 34 and Z rotating shaft mechanism 35, the lower frame component 31 are mounted on pedestal 34 by floating cushion 32 and aligned units 33
On, Z-axis mechanism 35 is located at the two sides of pedestal 34.
As shown in figure 11, the lower frame component 31 includes working panel 311, D type silica gel strip 312 and lower mask plate 313;Institute
The working panel 311 stated is hollow structure, and lower mask plate 313 is mounted on the inside of working panel 311, and D type silica gel strip 312 is installed
On the working panel 311 of lower 313 periphery of mask plate, the floating cushion 32 and aligned units 33 are set to working panel 311
Bottom, lower mask plate are surrounded by vacuum orifice.Upper 27 He of mask plate can be made by carrying out vacuumize process by vacuum orifice
Lower mask plate 313 is bonded completely with the upper and lower surface of workpiece, guarantees the Correct exposure of mask plate up and down.
As shown in figure 12, the aligned units 33 include voice coil motor 331, the second crossed roller guide rail 332, grating scale
333, flexible connecting plate 334, intermediate slide unit 335, upper slide unit 337 and slid platform base 336;The intermediate slide unit 335 passes through the
Two crossed roller guide rails 332 are slidably connected with slid platform base 336, and voice coil motor 331 and intermediate slide unit 335 are drivingly connected, grating
Ruler 333 is mounted on intermediate 335 side of slide unit, for measuring the displacement of intermediate slide unit 335 to obtain the whole of working panel 311
Position moves, and the accuracy of measurement can be improved by grating scale 333, and upper slide unit 337 is slidably connected with intermediate slide unit 335, upper cunning
It is equipped with self-locking body between platform 337 and intermediate slide unit 335, self-locking body is controlled by control system, and flexible connecting plate 334 is mounted on cunning
The moving direction of the top of platform 377, upper slide unit 337 and intermediate slide unit 335 is mutually perpendicular to.Voice coil motor 331 intersects by second
Roller guide rail 332 drives intermediate slide unit 335 mobile, and by 333 precise measurement displacement of grating scale, improves the accurate of alignment
Degree.
As shown in figure 13, the Z-axis mechanism 35 includes side plate 351, Z axis motor 352, Z axis screw rod 353 and the first intersection
Roller guide rail 354;The Z axis motor 352 and Z axis screw rod 353 is mounted on side plate 351, Z axis motor 352 and Z axis screw rod
353 transmission connections;The first crossed roller guide rail 354 is connect with Z axis screw rod 353, and the two sides of the pedestal 34 are mounted on
On first crossed roller guide rail 354.Z-axis mechanism 35 drives lower frame component 31 to move up and down, so that upper mask plate 27 and lower exposure mask
Version 313 contacts, and logical D type silica gel strip 312, by the space sealing between upper mask plate 27 and lower mask plate 313, Z-axis mechanism 35 is transported
Row stability is good, and mechanical energy consumption is small and precision is high, and speed is fast, large carrying capacity, Yi Shixian high rigidity, high load capacity movement.It is right
Quasi- unit 33 enables to mask plate 27 and lower mask plate 313 to realize that high-precision is aligned.
The both ends of 311 the same side of working panel are arranged in two of them floating cushion 32, another setting is flat with the same side
The middle position of capable side;Two of them aligned units 33 are arranged between described two floating cushions 32, another setting exists
The middle position of the side vertical with described 311 the same side of working panel.It is moved respectively in the direction XY by three aligned units 33
It moves and rotates certain angle and complete coordinated adjustment to the position of Barebone, reach what upper and lower mask plate 313 was accurately bonded
Purpose.The side of two aligned units 33 is X-direction, and the side of an independent aligned units 33 is Y-direction, mobile in X-direction
When, the voice coil motor 331 of Y-direction aligned units 33 does not work, and the voice coil motor 331 of X-direction aligned units 33 works, Y-direction
The upper slide unit 337 of aligned units 33 is mobile with the moving direction of the intermediate slide unit 335 of X-direction aligned units 33, at this point, working face
Plate 311 moves in the X direction;When moving in the Y direction, the voice coil motor 331 of X-direction aligned units 33 does not work, Y-direction alignment
The voice coil motor 331 of unit 33 works, and the upper slide unit 337 of X-direction aligned units is with the intermediate slide unit of Y-direction aligned units 33
335 moving direction is mobile, at this point, working panel 311 moves in the Y direction;When adjusting the angle, Y-direction aligned units 33
Voice coil motor 331 do not work, and the self-locking body between upper slide unit 337 and intermediate slide unit 335 controlled by control system it is self-locking,
The voice coil motor 331 of X-direction aligned units 33 works, when the intermediate slide unit 331 of X-direction aligned units 33 is mobile, entire work
Make panel 311 with the aligned units 33 of Y-direction as center of circle rotation.
As shown in figure 14, the vision system 6 includes third bracket 61, servo motor 62, synchronous belt 63, camera movement
Cylinder 64, CCD industrial camera mechanism 65, the first guide rail 66 and crossbeam 67;First guide rail 66 is set to third bracket 61
Two sides, servo motor 62 are mounted on third bracket 61, and synchronous belt 63 and servo motor 62 are sequentially connected, and the crossbeam 67 is set
There are two, the both ends of crossbeam 67 are slidably connected with the first guide rail 66 respectively and fix with synchronous belt 63;Each crossbeam 67
Upper intersection is symmetrically installed two camera mobile cylinders 64.
The CCD industrial camera mechanism 65 includes CCD industrial camera 651, camera installing plate 652, camera connecting plate
653, camshaft bearing follower 654 and sliding block 655;The camera installing plate 652 is fixed on four corners of third bracket 61
Place, camera installing plate 652 are equipped with the second sliding rail 656 and arc groove 657;The mobile gas of the camera connecting plate 653 and camera
The cylinder rod of cylinder 64 connects, and camshaft bearing follower 654 and sliding block 655 are mounted on camera connecting plate 653, camshaft bearing follower
654 are connected in arc groove 657, and sliding block 655 is slidably connected with the second sliding rail 656;The CCD industrial camera 651 is fixed on
653 top of camera connecting plate, 61 two sides of third bracket are mounted on the first crossed roller guide rail 354.Pass through camera mobile cylinder
64 push-and-pull is realized the work of CCD industrial camera 651 or is withdrawn.
As shown in Figure 15 and 17, the lower exposure module 71 include the first array substrate 711, the first lens 712,
First guide post 713, first band locking bearing 714, the first heat-conducting silica gel sheet 715, the first ultra-violet light-emitting diode 716, first are purple
Luminous diode array plate 717 and the first water-cooled plate 718 outside;First guide post 713 is fixed in rack 1, the first water cooling
Plate 718 is mounted on the first guide post 713 by locking first bearing 714;First heat-conducting silica gel sheet 715 is covered on
One water-cooled plate, 718 top, the first ultra-violet light-emitting diode 716 interval are mounted on the first ultra-violet light-emitting diode array plate 717,
First ultra-violet light-emitting diode array plate 717 is mounted on 715 top of the first heat-conducting silica gel sheet, the first array substrate 711 peace
Above the first ultra-violet light-emitting diode array plate 717, the first lens 712 interval is mounted on the first array substrate 711
Setting above and with the first ultra-violet light-emitting diode 716 is corresponded to each other, is equipped with the first aquaporin in first water-cooled plate 718
7181.The disengaging runner cross-distribution of first water channel 7 181.Cooling water first flows to 718 center of the first water-cooled plate, then flows first
Water-cooled plate 718 out.Disengaging runner cross-distribution can preferably by heat absorption and discharge to greatest extent.First lens array
Substrate 711, the first ultra-violet light-emitting diode array plate 717 and the first water-cooled plate 718 can adjust whole on the first guide post 713
Height and position.
As shown in figure 16, the first ultra-violet light-emitting diode array plate 717 is equipped with multiple, is arranged at intervals on first and is led
Hot 715 top of silica gel piece, the first ultra-violet light-emitting diode array plate 717 includes the first aluminum substrate 7171 and the first connector
7172;First connector 7172 is mounted on the one end of the first aluminum substrate 7171, and the first aluminum substrate 7171 is equipped with more
A spaced first fluorescent tube installing port 7173, the first ultra-violet light-emitting diode 716 are mounted on the installation of the first fluorescent tube
In mouth 7173.First connector 7172 is for connecting external power supply and control device, the first ultra-violet light-emitting diode array plate 717
On each of the first ultra-violet light-emitting diode 716 pin can be separately provided, when the first ultra-violet light-emitting diode 716 when something goes wrong
The source of trouble can be accurately found, guarantees the integrality of exposure light.
As shown in Figure 19 and 21, the upper exposure module 72 include the second array substrate 721, the second lens 722,
Second guide post 723, the second locking bearing 724, the second heat-conducting silica gel sheet 725, the second ultra-violet light-emitting diode 726, second are purple
Luminous diode array plate 727 and the second water-cooled plate 728 outside;Second guide post 723 is fixed in rack 1, the second water cooling
Plate 728 is mounted on the second guide post 723 by locking second bearing 724;Second heat-conducting silica gel sheet 725 is mounted on
Two water-cooled plates, 728 lower section, the second ultra-violet light-emitting diode 726 interval are mounted on the second ultra-violet light-emitting diode array plate 727,
Second ultra-violet light-emitting diode array plate 727 is mounted on 725 lower section of the second heat-conducting silica gel sheet, the second array substrate 721 peace
Mounted in 727 lower section of the second ultra-violet light-emitting diode array plate, the second lens 722 interval is mounted on the second array substrate 721
Setting above and with the second ultra-violet light-emitting diode 726 is corresponded to each other, is equipped with the second aquaporin in second water-cooled plate 728
7281.The disengaging runner cross-distribution of second water channel 7 281.Cooling water first flows to 728 center of the second water-cooled plate, then flows second
Water-cooled plate 728 out.Disengaging runner cross-distribution can preferably by heat absorption and discharge to greatest extent.Second lens array
Substrate 721, the second ultra-violet light-emitting diode array plate 727 and the second water-cooled plate 728 can adjust whole on the second guide post 723
Height and position.
As shown in figure 20, the second ultra-violet light-emitting diode array plate 727 is equipped with multiple, is arranged at intervals on second and is led
Hot 725 top of silica gel piece, the second ultra-violet light-emitting diode array plate 727 includes the second aluminum substrate 7271 and the second connector
7272;Second connector 7272 is mounted on the one end of the second aluminum substrate 7271, and the second aluminum substrate 7271 is equipped with more
A spaced second fluorescent tube installing port 7273, the second ultra-violet light-emitting diode 726 are mounted on the installation of the second fluorescent tube
In mouth 7273.Second connector 7272 is for connecting external power supply and control device, the second ultra-violet light-emitting diode array plate 727
On each of the second ultra-violet light-emitting diode 726 pin can be separately provided, when the second ultra-violet light-emitting diode 726 when something goes wrong
The source of trouble can be accurately found, guarantees the integrality of exposure light.
As shown in figure 18, the constant temperature and humidity system 8 include air filter 81, it is sink 82, fin heats pipe 83, cold
Condenser 84 and fresh air system pipeline 85;The fresh air system pipeline 85 is connect with condenser 84, condenser 84 and air filtration
Device 81 connects;Fin heats pipe 83 is mounted in fresh air system pipeline 83, and the sink is located at 81 side of condenser for receiving
Collect condensed water;The air outlet of fresh air system pipeline 85 is close to vision system 6.The filtering of air filter 81 will enter inside machine
Air, after filtering, according to machine internal temperature and humidity status selection condensation, 84 are humidified or are passed through fin heats
Pipe 83 carries out temperature adjustment, is delivered to inside machine by fresh air system pipeline 85.
Working principle of the present invention:
Step 1: the servo motor 62 in vision system 6 drives crossbeam 67 mobile by synchronous belt 63, camera mobile cylinder
64 cylinder rod is inwardly withdrawn, the camera lens of CCD industrial camera 651 upward, CCD industrial camera 651 with crossbeam 67 be moved to it is upper
The position that mask plate 27 is aligned, mask plate 27 and lower 313 vertical direction of mask plate on four 651 Real-time Feedbacks of CCD industrial camera
Positional relationship.
Step 2: three floating cushions 32 jack up working panel 311 certain height, and three aligned units 33 cooperate with work
Make, according to the positional relationship that vision system 6 is fed back, adjust position and angle of the working panel 311 in the direction XY, so that alignment system
The lower mask plate 313 of system 3 is mutually aligned with the upper mask plate 27 in upper frame system 2.
Step 3: workpiece is placed on the material conveying platform 471 of feed system, and stepper motor 472 is driven slow by screw rod 473
The fixed workpiece in branch angle 475 is rushed, rodless cylinder 42 drives material conveying platform 471 that workpiece is moved to 5 lower section of arm-and-hand system, photoelectric transfer
Sensor 45 senses that signal intensity, lifting cylinder 46 drag material conveying platform 471 and be raised above.
Step 4: the sucker 523 of arm-and-hand system 5 picks up workpiece, and linear motor rotor 513 drives sucker mounting rack
521 are moved to lower 313 top of mask plate, and workpiece is placed on lower mask plate 313.
Step 5: Z axis motor 352 drives the first crossed roller guide rail 354 to move up, the first crossed roller guide rail 354
Drive moves up Barebone 2.It is mounted on and the D type silica gel strip 312 inflated in advance on working panel 311 is first touched
The upper frame system 1 of top, the at this moment extrusion deformation of D type silica gel strip 312 are bonded completely with the contact surface of the inside casing 23 of upper frame system 1,
Exposure region between upper mask plate 27 and lower mask plate 313 is fully sealed, and exposure area is isolated with outside air formation.
Step 6: vacuumize process, during vacuumizing, upper mask plate are carried out to exposure area by vacuum orifice
27 and lower mask plate 313 micro-strain can occur due to gravity air pressure.When fitting, upper mask plate 27 and lower mask plate
313 middle position can contact fitting with workpiece due to deformation protrusion, upper mask plate 27 and lower mask plate 313.
Step 7: the ultra-violet light-emitting diode 76 in exposure module 7, light pass through lens 72 and are radiated at 27 He of mask plate
On lower mask plate 313, the image information on upper mask plate 27 and lower mask plate 313 is transferred to the upper and lower surface of workpiece.
Step 8: Z axis motor 352 drives the first crossed roller guide rail 354 to move down, to Barebone 3 and upper frame system 2
It separates.The workpiece of exposure completion is transferred to the feeding of discharge system by sucker 523 by arm-and-hand system 5 from lower mask plate 313
On platform 471, the discharging of workpiece is realized eventually by discharge system.
It describes the invention in detail in conjunction with the embodiments above, but the content is only preferable implementation of the invention
Example, should not be considered as limiting the scope of the invention.It is all according to all the changes and improvements made by the present patent application range
Deng should all still fall within patent covering scope of the invention.
Claims (10)
1. a kind of high-precision full-automatic sided exposure machine, it is characterised in that: it includes
Rack, the modules being used to support in installation exposure machine and system;
Upper frame system is located at machine frame inside, including providing the upper mask plate of pattern for the exposure of product upper surface;
To Barebone, including providing the lower mask plate of pattern for the exposure of product lower surface, to Barebone for realizing upper mask plate
With precisely aligning for lower mask plate, the lower section of upper frame system is set to Barebone;
Discharging system, including feed system and discharge system, for product automatic feed and self-emptying;
Arm-and-hand system is set to above discharging system, for product to be exposed to be transported to alignment system from feed system
On system, the product that exposure is completed is transported in discharge system to Barebone;
Vision system is located to below Barebone, is directed at required displacement to provide Barebone;
Exposure module, including upper exposure module and lower exposure module, upper exposure module are mounted on the top of frame system, are product
Upper surface exposure provides light source, and lower exposure module is set to below Barebone, provides light source for the exposure of product lower surface;
Constant temperature and humidity module, is mounted on the rack, for controlling the temperature and humidity in exposure machine;
Control system, for controlling upper frame system, to Barebone, discharging system, arm-and-hand system, vision system, exposure mould
The coordinated operation of block and constant temperature and humidity module.
2. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the feed system and go out
Material system respectively includes first support, rodless cylinder, slide unit, sliding rail, photoelectric sensor, lifting cylinder and platform mechanism, described
First support be fixed on the rack, sliding rail is mounted on the two sides of first support, and rodless cylinder is mounted in first support, described
The two sides of slide unit be slidably connected with sliding rail, slide unit and rodless cylinder are sequentially connected;The lifting cylinder is fixed on first
On frame, photoelectric sensor is set to lifting cylinder side;The platform mechanism includes material conveying platform, stepper motor, screw rod, straight line
Optical axis, buffering branch angle and buffering branch angle mounting base;The material conveying platform bottom is equipped with connecting shaft, is equipped with bearing at the top of slide unit,
Material conveying platform is mounted in bearing by connecting shaft, and is connect with lifting cylinder;Stepper motor, screw rod and the straight optical axis
It is mounted on the bottom of material conveying platform, stepper motor is connect with screw rod transmission, and straight optical axis is located at the two sides of screw rod, buffering branch angle peace
Dress cover for seat is located on straight optical axis and connect with screw rod, and the buffering branch angle passes through material conveying platform and is fixed on the installation of buffering branch angle
The both ends of seat.
3. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the arm-and-hand system packet
Include X-axis carrying mechanism and Liang Ge carrying sucker mechanism;The carrying sucker mechanism is mounted on X-axis carrying mechanism;The X
Axis carrying mechanism includes X-axis bracket, two linear motor stator electrics, two linear motor rotors and X-axis linear guide, the X
Bracing strut is fixed on the rack, and X-axis linear guide is mounted on above X-axis bracket, and linear motor stator electric is mounted on X-axis bracket side
Portion, linear motor rotor are mounted on linear motor stator electric;The sucking disc mechanism includes sucker mounting rack, Mobile base, vacuum
Generator, vacuum solenoid and sucker;The Mobile base, which connect with linear motor rotor and slides with X-axis linear guide, to be connected
It connects;Sucker mounting rack is fixed on Mobile base, and sucker is fixed on sucker mounting rack bottom, and vacuum generator passes through vacuum solenoid
It is connect with sucker.
4. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the upper frame system includes
Second support, outline border, inside casing, upper ledge cylinder, steel plate press strip, steel spring plate, upper mask plate and upper mask plate pressing plate;Described
Two brackets are located at the two sides of outline border and are fixed on the rack, and upper ledge cylinder is fixed on the secondary support bracket, the cylinder rod of upper ledge cylinder with
Outline border connection, inside casing are set in outline border, the surrounding of inside casing by four two-by-two symmetrical steel spring plate connect with outline border, and pass through
Steel plate press strip is fixed;The upper mask plate is fixed on the inside of inside casing by upper mask plate pressing plate, and the two sides of outline border are by turning
Shaft assembly is connect with second support.
5. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: described to include to Barebone
Lower frame component, several floating cushions, several aligned units, pedestal and Z rotating shaft mechanism, the lower frame component pass through floating cushion and right
Quasi- unit is mounted on the base, and Z-axis mechanism is located at the two sides of pedestal;The lower frame component include working panel, D type silica gel strip and
Lower mask plate;The working panel is hollow structure, and lower mask plate is mounted on the inside of working panel, the installation of D type silica gel strip
On the working panel of lower mask plate periphery, the floating cushion and aligned units are set on the bottom of working panel, lower mask plate
Be surrounded by vacuum orifice;
The aligned units include voice coil motor, the second crossed roller guide rail, grating scale, flexible connecting plate, intermediate slide unit, on
Slide unit and slid platform base;The intermediate slide unit is slidably connected by the second crossed roller guide rail with slid platform base, upper slide unit with
Intermediate slide unit is slidably connected, and self-locking body is equipped between upper slide unit and intermediate slide unit, and voice coil motor and the second crossed roller guide rail drive
Dynamic connection, grating scale are mounted on intermediate slide unit side, and flexible connecting plate is mounted on the top of upper slide unit, upper slide unit and intermediate slide unit
Moving direction be mutually perpendicular to;
The Z-axis mechanism includes side plate, Z axis motor, Z axis screw rod and the first crossed roller guide rail;The Z axis motor and Z
Axial filament bar is mounted on side plate, and Z axis motor is connect with Z axis screw rod transmission;The first crossed roller guide rail and Z axis screw rod connects
It connects, the two sides of the pedestal are mounted on the first crossed roller guide rail.
6. high-precision full-automatic sided exposure machine according to claim 5, it is characterised in that: the vision system includes
Third bracket, servo motor, synchronous belt, camera mobile cylinder, CCD industrial camera mechanism, the first guide rail and crossbeam;Described
One guide rail is set to the two sides of third bracket, and servo motor is mounted on third bracket, and synchronous belt is connect with servo motor transmission, institute
There are two the crossbeam stated is set, the both ends of crossbeam are slidably connected with the first guide rail respectively and fix with synchronous belt;Each cross
Intersect on beam and is symmetrically installed two camera mobile cylinders;The CCD industrial camera mechanism includes CCD industrial camera, camera peace
Loading board, camera connecting plate, camshaft bearing follower and sliding block;The camera installing plate is fixed on four corners of third bracket
Place, camera installing plate are equipped with the second sliding rail and arc groove;The camera connecting plate is connect with the cylinder rod of camera mobile cylinder,
Camshaft bearing follower and sliding block are mounted on camera connecting plate, and camshaft bearing follower is connected in arc groove, sliding block and
Two sliding rails are slidably connected;The CCD industrial camera is fixed on above camera connecting plate, and third bracket two sides are mounted on the first friendship
It pitches on roller guide rail.
7. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the lower exposure module packet
Include the first array substrate, the first lens, the first guide post, locking first bearing, the first heat-conducting silica gel sheet, the first ultraviolet hair
Light diode, the first ultra-violet light-emitting diode array plate and the first water-cooled plate;First guide post is fixed on the rack, and first
Water-cooled plate is mounted on the first guide post by locking first bearing;First heat-conducting silica gel sheet is covered on the first water-cooled plate
Top, the first ultra-violet light-emitting diode interval are mounted on the first ultra-violet light-emitting diode array plate, the first ultra-violet light-emitting second level
Pipe array board is equipped with multiple, is evenly arranged in above the first heat-conducting silica gel sheet, it is ultraviolet that the first array substrate is mounted on first
Above Light-Emitting Diode array board, the first lens separation be mounted on the first array substrate and with the first ultra-violet light-emitting second level
Pipe corresponds to each other setting, is equipped with the first aquaporin in first water-cooled plate.
8. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the upper exposure module packet
Include the second array substrate, the second lens, the second guide post, locking second bearing, the second heat-conducting silica gel sheet, the second ultraviolet hair
Light diode, the second ultra-violet light-emitting diode array plate and the second water-cooled plate;Second guide post is fixed on the rack, and second
Water-cooled plate is mounted on the second guide post by locking second bearing;Second heat-conducting silica gel sheet is mounted on the second water-cooled plate
Lower section, the second ultra-violet light-emitting diode interval are mounted on the second ultra-violet light-emitting diode array plate, the second ultra-violet light-emitting second level
Pipe array board is equipped with multiple, is evenly arranged in below the second heat-conducting silica gel sheet, it is ultraviolet that the second array substrate is mounted on second
Below Light-Emitting Diode array board, the second lens separation be mounted on the second array substrate and with the second ultra-violet light-emitting second level
Pipe corresponds to each other setting, is equipped with the second aquaporin in second water-cooled plate.
9. high-precision full-automatic sided exposure machine according to claim 1, it is characterised in that: the constant temperature and humidity system
Including air filter, sink, fin heats pipe, condenser and fresh air system pipeline;The fresh air system pipeline and condensation
Device connection, condenser are connect with air filter;Fin heats pipe is mounted in fresh air system pipeline, and the sink is located at cold
Condenser side;The air outlet of fresh air system pipeline is close to vision system.
10. high-precision full-automatic sided exposure machine according to claim 5, it is characterised in that: the floating cushion and right
Quasi- unit is respectively equipped with three, and the both ends of working panel the same side are arranged in two of them floating cushion, another setting with it is same
The middle position of the parallel side in side;Two of them aligned units are arranged between described two floating cushions, another setting
In the middle position of the side vertical with described working panel the same side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910795902.1A CN110376853A (en) | 2019-08-27 | 2019-08-27 | High-precision full-automatic sided exposure machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910795902.1A CN110376853A (en) | 2019-08-27 | 2019-08-27 | High-precision full-automatic sided exposure machine |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110376853A true CN110376853A (en) | 2019-10-25 |
Family
ID=68260886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910795902.1A Pending CN110376853A (en) | 2019-08-27 | 2019-08-27 | High-precision full-automatic sided exposure machine |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN110376853A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111258189A (en) * | 2020-04-03 | 2020-06-09 | 深圳市大川光电设备有限公司 | Double-sided automatic alignment exposure equipment and method |
CN114779596A (en) * | 2022-06-07 | 2022-07-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
CN116360225A (en) * | 2023-03-17 | 2023-06-30 | 广东科视光学技术股份有限公司 | Double-sided PCB exposure machine and online automatic alignment device thereof |
CN116500867A (en) * | 2023-04-19 | 2023-07-28 | 广东科视光学技术股份有限公司 | Automatic alignment exposure equipment |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07271048A (en) * | 1994-03-31 | 1995-10-20 | Seikosha Co Ltd | Exposure device |
US20010024008A1 (en) * | 2000-03-23 | 2001-09-27 | Hitachi, Ltd. | Travelling worktable apparatus |
JP2004157341A (en) * | 2002-11-07 | 2004-06-03 | Toray Eng Co Ltd | Double-face exposure apparatus |
US20050213073A1 (en) * | 2002-07-17 | 2005-09-29 | Automa-Tech | Machine for exposing printed circuit boards |
JP2009194147A (en) * | 2008-02-14 | 2009-08-27 | Seiko Instruments Inc | Wafer exposure apparatus and wafer exposure method |
CN103676495A (en) * | 2012-09-13 | 2014-03-26 | 日本梅克特隆株式会社 | Photomask, photomask set, exposure apparatus and exposure method |
CN104483813A (en) * | 2014-12-01 | 2015-04-01 | 东莞科视自动化科技有限公司 | Exposure machine light source transformation method and UVLED light source mechanism |
CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
CN105301910A (en) * | 2014-05-26 | 2016-02-03 | 张河生 | Uv led light source structure and parallel light exposure machine |
CN108153118A (en) * | 2018-02-06 | 2018-06-12 | 成都凯景智能设备有限公司 | A kind of Full-automatic exposure machine |
CN108319114A (en) * | 2018-02-06 | 2018-07-24 | 成都凯景智能设备有限公司 | A kind of fully automatic exposure technique |
CN210864317U (en) * | 2019-08-27 | 2020-06-26 | 爱司凯科技股份有限公司 | High-precision full-automatic double-sided exposure machine |
-
2019
- 2019-08-27 CN CN201910795902.1A patent/CN110376853A/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07271048A (en) * | 1994-03-31 | 1995-10-20 | Seikosha Co Ltd | Exposure device |
US20010024008A1 (en) * | 2000-03-23 | 2001-09-27 | Hitachi, Ltd. | Travelling worktable apparatus |
US20050213073A1 (en) * | 2002-07-17 | 2005-09-29 | Automa-Tech | Machine for exposing printed circuit boards |
JP2004157341A (en) * | 2002-11-07 | 2004-06-03 | Toray Eng Co Ltd | Double-face exposure apparatus |
JP2009194147A (en) * | 2008-02-14 | 2009-08-27 | Seiko Instruments Inc | Wafer exposure apparatus and wafer exposure method |
CN103676495A (en) * | 2012-09-13 | 2014-03-26 | 日本梅克特隆株式会社 | Photomask, photomask set, exposure apparatus and exposure method |
CN105301910A (en) * | 2014-05-26 | 2016-02-03 | 张河生 | Uv led light source structure and parallel light exposure machine |
CN104483813A (en) * | 2014-12-01 | 2015-04-01 | 东莞科视自动化科技有限公司 | Exposure machine light source transformation method and UVLED light source mechanism |
CN105278263A (en) * | 2015-11-25 | 2016-01-27 | 四川聚能核技术工程有限公司 | 8CCD double-side simultaneous aligning method for exposure machine |
CN108153118A (en) * | 2018-02-06 | 2018-06-12 | 成都凯景智能设备有限公司 | A kind of Full-automatic exposure machine |
CN108319114A (en) * | 2018-02-06 | 2018-07-24 | 成都凯景智能设备有限公司 | A kind of fully automatic exposure technique |
CN210864317U (en) * | 2019-08-27 | 2020-06-26 | 爱司凯科技股份有限公司 | High-precision full-automatic double-sided exposure machine |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111258189A (en) * | 2020-04-03 | 2020-06-09 | 深圳市大川光电设备有限公司 | Double-sided automatic alignment exposure equipment and method |
CN111258189B (en) * | 2020-04-03 | 2024-06-07 | 深圳市大川光电设备有限公司 | Double-sided automatic alignment exposure equipment and method |
CN114779596A (en) * | 2022-06-07 | 2022-07-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
CN114779596B (en) * | 2022-06-07 | 2023-12-22 | 杭州爱新凯科技有限公司 | High-precision double-sided exposure machine |
CN116360225A (en) * | 2023-03-17 | 2023-06-30 | 广东科视光学技术股份有限公司 | Double-sided PCB exposure machine and online automatic alignment device thereof |
CN116360225B (en) * | 2023-03-17 | 2024-02-06 | 广东科视光学技术股份有限公司 | Double-sided PCB exposure machine and online automatic alignment device thereof |
CN116500867A (en) * | 2023-04-19 | 2023-07-28 | 广东科视光学技术股份有限公司 | Automatic alignment exposure equipment |
CN116500867B (en) * | 2023-04-19 | 2024-01-30 | 广东科视光学技术股份有限公司 | Automatic alignment exposure equipment |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110376853A (en) | High-precision full-automatic sided exposure machine | |
CN202608219U (en) | Photovoltaic solar silk screen printing device | |
CN111189777A (en) | Double-station ACF adhesive high-precision shearing and attaching mechanism | |
CN110785020A (en) | Semi-automatic PCB board solder mask double-sided LED exposure machine | |
JP2012504535A (en) | Photovoltaic module manufacturing method and manufacturing process | |
CN219040495U (en) | Photovoltaic cell piece equipment of arranging | |
CN210864317U (en) | High-precision full-automatic double-sided exposure machine | |
KR101169240B1 (en) | Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method | |
CN112209076A (en) | Paste dress conveyor and subsides dress equipment | |
CN216793710U (en) | Solar module frame dress frame machine | |
CN115610078A (en) | Vision positioning shuttle type screen process press | |
CN213876212U (en) | Vacuum laminating device and display panel production line | |
CN214298191U (en) | FPC material loading manipulator | |
CN114779596A (en) | High-precision double-sided exposure machine | |
CN110366332B (en) | Translational type hot melting machine aligned by camera | |
CN211867574U (en) | Mechanism for binding COF (chip on film) and thin glass side | |
CN210690982U (en) | Pre-alignment device of ULED screen substrate detection/measurement equipment | |
CN112558339A (en) | Vacuum laminating device and display panel production line | |
CN211741042U (en) | Double-station ACF adhesive high-precision shearing and attaching mechanism | |
CN211305416U (en) | Multi-section special-shaped FPC binding mechanism | |
CN104570592B (en) | A kind of big mask apparatus for shaping and method | |
CN114905190A (en) | High-precision eutectic welding equipment for tiny chips | |
CN112363337A (en) | FPC pre-compaction device | |
KR101138681B1 (en) | Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method | |
CN110774742A (en) | Battery piece alignment adjusting device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20191025 |