Summary of the invention
Technical problems to be solved by the inivention
However, need to be introduced directly into the process of hydrogen in the manufacturing technology of the hydrogen-rich water disclosed by patent document 1,
It is controlled and processing is upper problematic.In addition, existing market demand is using low cost and to living body and intravital highly-safe
Hydrogen generate hydrogen-rich water, its manufacturing method and its manufacturing device of material, (on site) simplicity on the spot.
The present invention solves at least one above-mentioned technical problem, efficiently uses small silicon particle, has by meb excellent
Safety, economy and payable manufacturing method generate hydrogen, for it is simple and it is safe containing hydrogen solution, containing the system of hydrogen solution
Make the reality of the manufacturing device of method and manufacturing device or hydrogen-rich water, the manufacturing method of hydrogen-rich water and hydrogen-rich water containing hydrogen solution
Now make big contribution.
The present inventor is directed to the effective use of silicon fine particle in semiconductor or light-emitting component and is studied.Another party
It is furtherd investigate for the technology from silicon fine particle manufacture with excellent practicability and payable hydrogen in face.It is tied
Fruit is, it was found that though room temperature it is mild under conditions of, disperse water for the small silicon particle of the material of low cost and safety
In, hydrogen can be generated from water, and find that hydrogen is made to be dissolved in the water, the hydrogen-rich water with controlled hydrogen concentration may be implemented.
The present invention is creator based on above-mentioned viewpoint.
Solve the technological means of technical problem
It is of the invention it is a kind of be containing hydrogen solution will be by the thin nano particle of silicon and/or the aggregation of the thin nano particle of the silicon
Hydrogen generated is contacted with water or aqueous solution to be dissolved among above-mentioned water or above-mentioned aqueous solution, wherein the thin nano particle of silicon and/or
Above-mentioned aggregation be the thin nano particle of silicon that silicon fine particle is crushed and made in ethanol and/or the above-mentioned aggregation with
Hydrogenperoxide steam generator contact.
Also, a kind of living body of the invention includes with hydrogen generation material: making in ethanol to crush silicon fine particle obtained
The thin nano particle of above-mentioned silicon that the aggregation of the thin nano particle of silicon and/or the thin nano particle of the silicon is contacted with hydrogenperoxide steam generator
And/or above-mentioned aggregation.
Also, a kind of manufacturing method containing hydrogen solution of the invention includes following technique: by ethanol by silicon thin
The technique that grain is crushed to form the aggregation of the thin nano particle of silicon and/or the thin nano particle of the silicon;Hydrogenperoxide steam generator processing
Technique contacts the thin nano particle of above-mentioned silicon and/or above-mentioned aggregation with hydrogenperoxide steam generator;And dissolution process, in above-mentioned mistake
It, will be by connecing the thin nano particle of above-mentioned silicon and/or above-mentioned aggregation with water or aqueous solution after hydrogen peroxide solution treatment process
The hydrogen for touching and generating is dissolved among above-mentioned water or above-mentioned aqueous solution.
Also, a kind of manufacturing device containing hydrogen solution of the invention includes smashing portion, by ethanol by silicon fine particle powder
The broken aggregation to form the thin nano particle of silicon and/or the thin nano particle of the silicon;Hydrogenperoxide steam generator processing unit makes above-mentioned silicon
Thin nano particle and/or above-mentioned aggregation are contacted with hydrogenperoxide steam generator;And dissolution process portion, it will be by making and above-mentioned peroxidating
The thin nano particle of above-mentioned silicon and/or above-mentioned aggregation of hydrogen solution contact contact hydrogen generated with water or aqueous solution and are dissolved in
It states among water or above-mentioned aqueous solution.
Also, a kind of hydrogen-rich water of the invention, wherein the silicon for making silicon fine particle or further crushing above-mentioned silicon fine particle
The aggregation of fine grained (hereinafter referred to as " the thin nano particle of silicon ") and/or the thin nano particle of the silicon contacts and/or is scattered in water
In to generate hydrogen, and above-mentioned hydrogen is made to be directly dissolved in above-mentioned water and seal in a reservoir.
A kind of manufacturing device of hydrogen-rich water of the invention includes: smashing portion, to form silicon fine particle or by above-mentioned silicon it is thin
The thin nano particle of the silicon that particle further crushes;And hydrogen-rich water generating unit, connect the thin nano particle of above-mentioned silicon and/or its aggregation
It touches or is scattered in water or aqueous solution, be dissolved in hydrogen in above-mentioned water and seal to manufacture hydrogen-rich water.
By the manufacturing device of this hydrogen-rich water, make the thin nano particle of silicon and/or its aggregation contact in a sealed container or
Person is scattered in water or aqueous solution, and it is dense the hydrogen with enough practicabilities can be manufactured on the spot with high accuracy, low cost and safely
The hydrogen-rich water of degree and amount.By the manufacturing device of this hydrogen-rich water, the industrial productivity of the manufacture of hydrogen-rich water can be greatly improved.
Also, a kind of manufacturing method of hydrogen-rich water of the invention includes: disintegrating process forms silicon fine particle;And hydrogen-rich water
Technique is generated, the thin nano particle of silicon and/or its aggregation is made to contact or be scattered in water or aqueous solution to generate hydrogen, and is made described
Hydrogen is dissolved in the water and seals.
It can be manufactured using silicon fine particle as starting material with enough practicabilities by the manufacturing method of this hydrogen-rich water
Hydrogen concentration and amount hydrogen-rich water.Also, the manufacturing method of this hydrogen-rich water not only efficiently uses the thin nano particle of silicon, to environmental protection
Big contribution is made, it also can be as drinking water etc..By the manufacturing method of this hydrogen-rich water, the manufacture of hydrogen-rich water can be substantially cut down
Cost, and greatly improves industrial productivity.
Also, the thin nano particle of silicon and/or its aggregation used in a kind of manufacture of hydrogen-rich water of the invention are crystallites
Diameter is distributed as 100nm (nanometer) hereinafter, preferably 50nm range below.It is suitable for generating hydrogen-rich water using this range,
That is, generating hydrogen in water, it is dissolved in the hydrogen in the water, and be sealed in container.
In addition, to carry out chemical treatment, (representativeness processing is aftermentioned each implementation form among the thin nano particle of silicon
In handled by the removing of aqueous fluorine acid solution and/or the oxidation film of ammonium fluoride aqueous solution) person is to be suitable as hydrogen-rich water manufacture
With an example of the thin nano particle of silicon.Also, a kind of manufacturing method of hydrogen-rich water of the invention includes the powder for forming the thin nano particle of silicon
Broken technique.
In addition, among the thin nano particle of silicon, it is (representative to have in aftermentioned each implementation form to carry out chemical treatment
The heat treatment by hydrogenperoxide steam generator) person be suitable as in living body and the intravital thin nanometer of hydrogen-rich water manufacture silicon
An example of particle, a kind of manufacturing method containing hydrogen solution or hydrogen-rich water of the invention are included in form the thin nano particle of silicon
Disintegrating process in ethyl alcohol.
By the thin nano particle of silicon and its manufacturing method of above-mentioned hydrogen-rich water manufacture, provide the thin nano particle of silicon and/or
Its aggregation, the material with living body safety as the hydrogen-rich water for effectively manufacturing hydrogen concentration and amount with enough practicabilities
Material.
Invention effect
A kind of manufacturing device containing hydrogen solution or hydrogen-rich water and one kind of the invention through the invention contains hydrogen solution or richness
The manufacturing method of hydrogen water, the thin nano particle of silicon are used in high precision as the starting material containing hydrogen solution or hydrogen-rich water is generated
Property, low cost and safely, on the spot manufacture have enough practicabilities hydrogen concentration and amount contain hydrogen solution or hydrogen-rich water.Therefore,
The thin nano particle of silicon and/or its aggregation can be efficiently used, is not only contributed to environmental protection or living body safety, it is also right
The substantially reduction of manufacturing cost containing hydrogen solution or hydrogen-rich water contributes.
Specific embodiment
[embodiment 1]
Based on the appended schema implementation form that the present invention will be described in detail.
An example of the silicon fine particle of this implementation form is commercially available high purity silicon powder (also referred to as " high-purity Si powder ")
(for example, company, high-purity chemical research institute manufactures,Purity 99.9%, i type silicon).Also, this implementation shape
An example of the thin nano particle of the silicon of state is, will be described high-purity by bead mill method using the high purity silicon powder as starting material
Spend Si powder microminiaturization.In closed container, contact silicon fine particle or the thin nano particle of silicon and the aqueous solution of plural type.This
Outside, an example of the aqueous solution is the aqueous solution for being mixed with the alkalescent potassium borate buffer solution that pH value is 8, the aqueous solution
Another example is the ultrapure water that pH value is 7.Also, yet another example of the aqueous solution is the standard tap water that pH value is 7.1 to 7.3.
In closed container, each aqueous solution is made to contact silicon fine particle or the thin nano particle of silicon respectively.
In addition, the above-mentioned thin nano particle of silicon is, using bead mill device, (AIMEX joint-stock company is manufactured: RMB type batch Ready
Grinder), high purity silicon powder 15g is distributed in 99% or more isopropanol (IPA) 300ml, is added0.5 μm of oxidation
Zirconium globule (capacity 300ml) is crushed (stage size reduction) 4 hours with rotation number 2500rpm.As a result, passing through X-ray
Around the measurement of injection device (XRD), the thin nano particle of silicon that Average crystallite diameter (volume distribution) is 20.0nm is obtained.It reuses
The zirconium oxide globule (capacity 300ml) of 0.3mm is crushed (second order to the thin nano particle of above-mentioned silicon with rotation number 2500rpm
Section crushes) 4 hours, by the measurement of XRD, Average crystallite diameter (volume distribution) is obtained as the thin nano particle of silicon of 10.9nm.
Fig. 1 is the crystallization of the thin nano particle of silicon obtained after the stage disintegrating process for showing the ball mill in the present embodiment
Section TEM (transmission electron microscope) photo of structural example.Fig. 1 shows a part cohesion due to the thin nano particle of silicon, and
Form the slightly larger fine grain state below of unsetting about 0.5 μm.Also, Fig. 2 is expanded for the other thin nano particle of silicon
TEM photo after big.As in Fig. 2 with white line surround region shown in, the thin nanometer of the silicon of the size of about 5nm to 10nm can be confirmed
Particle.Also, can be confirmed that the thin nano particle of this silicon has crystallinity ((111) face).Appearance is unsetting shape, it is seen that one
Part is the aggregation of the thin nano particle of silicon.Although it is not shown, however by the analysis of two-stage smashed TEM photo, obtain
To the thin nano particle of silicon with smashed about 1/2 or so crystallinity below ((111) face) of a stage.
Fig. 3 is that display is measured and divided around injection device (joint-stock company Rigaku, ProductName " SmartLab ") using X-ray
Analysis, embodiment as a stage size reduction as a result, the knot that the crystallite diameter of the example of the obtained thin nano particle of silicon is distributed
The figure of fruit.In Fig. 3, horizontal axis indicates crystallite diameter (nm), and the longitudinal axis indicates frequency.Also, solid line shows the micro- of number distribution benchmark
Brilliant diameter distribution, dotted line display body integrate the crystallite diameter distribution of cloth benchmark.In number distribution, mode diameter (Mode
It diameter) is 0.29nm, median diameter (Median diameter) (50% crystallite diameter) is 0.75nm, and average diameter is
1.2nm.Also, mode diameter 4.9nm, median diameter 12.5nm, average diameter is as described above in volume distribution
20.0nm。
Fig. 4 is that display is analyzed as by X-ray around injection device (XRD) measurement, the knot as the embodiment that the two-stage crushes
Fruit, the figure of the result of the crystallite diameter distribution of the obtained thin nano particle of silicon.In Fig. 4, horizontal axis indicates crystallite diameter (nm),
The longitudinal axis indicates frequency.Also, solid line shows the crystallite diameter distribution of number distribution benchmark, dotted line display body integrates the crystallite of cloth benchmark
Diameter distribution.As shown in figure 4, mode diameter 0.14nm, median diameter (50% crystallite diameter) is in number distribution
0.37nm, average diameter 0.6nm.Also, mode diameter 2.6nm, median diameter 6.7nm are average straight in volume distribution
Diameter is 10.9nm as described above.By it is described equal as a result, it is known that the two-stage crush after the obtained thin nano particle of silicon,
Compared with a stage size reduction, about 1/2 microminiaturization below can be reached.At crushing by using the bead mill method of the various embodiments described above
Reason, confirmation have obtained crystallite diameter and have been distributed in 100nm range below, the thin nanometer of silicon of especially 50nm range below
Grain.
Following detailed description, which is used, crushes the hydrogeneous molten of the manufactured thin nano particle of silicon with a stage size reduction and two-stage
The control of hydrogen concentration is dissolved in the generation of liquid or hydrogen-rich water with it.
Above-mentioned silicon comprising the globule thin nano particle manufactured with a stage size reduction and two-stage crushing can be under
Technique is stated to obtain.Specifically, using be mounted in globule separation vessel (manufacture of AIMEX joint-stock company) SUS filter (Globule in the case where, filter use mesh 0.35mm,Globule in the case where use mesh
0.06mm), isopropanol (IPA) solution is injected from upper part, it includes the thin nano particles of the silicon containing globule.Thereafter, by into
Row classification processing attracts filtering, separation globule, and obtains the IPA solution comprising the thin nano particle of silicon.Thereafter, by using subtracting
Vaporising device is pressed, IPA is evaporated processing at 40 DEG C, and obtains the thin nano particle of silicon.
Then, contact or be immersed in fluorspar acid solution the processing in fluorspar acid solution (hereinafter, being also known as " fluorine merely
Acid processing ".) in the case where, additional processing below.The thin nano particle of obtained silicon is immersed in the fluorspar acid solution of 5% concentration
In 10 minutes.Thereafter, processing is filtered in an atmosphere with the membrane filter of the fluororesin of 100nm, by the thin nano particle of silicon
It collects on membrane filter, in stratiform remaining.The thin nano particle of silicon on this membrane filter is placed on fluororesin beaker,
In the case where carrying out fluoric acid processing, from ethyl alcohol is added dropwise thereon, to remove fluoric acid ingredient.By the thin nanometer of silicon on membrane filter
Grain carries out drying process in 30 minutes or so in air, and is carried out the thin nano particle of silicon of fluoric acid processing.
The silica film thickness of the equal thin nano grain surface of silicon is measured by XPS method.In the feelings for not carrying out fluoric acid processing
Under condition, the silicon oxide film for being 1.6nm or so with film thickness.In the case where carrying out fluoric acid processing, oxidation film is etched removing,
As 0.07nm hereinafter, hardly having oxidation film.
By the vial of obtained silicon thin nano particle 10mg merging capacity 30ml (pyrex, thickness 1mm or so,
The Laboran spiral phial of ASONE company manufacture), thereafter, ethyl alcohol 1ml is put into, the dispersion made adds scheduled aqueous solution about
29ml makes full dose as 30ml, until the opening for being filled up to vial, covers inner cover in a manner of not allowing air to enter, and cover
Upper cover (long 1cm), is fully sealed.Lid is polypropylene (thickness 2mm), and inner cover uses polyethylene and polyacrylic multilayer
Filter producer.By above structure, it can sufficiently slow down penetrating or leaking for the hydrogen of generation.
It is keeping at room temperature, increasingly generating hydrogen from the thin nano particle of silicon in closed vial under this state, it can
So that the hydrogen dissolution with predetermined concentration is in aqueous solution, and can obtain safe containing hydrogen solution or hydrogen-rich water.
When the measurement of the reaction time dependence of dissolution hydrogen concentration in aqueous solution, manufactured using East Asia DKK company
Portable dissolved hydrogen densimeter.Firstly, showing the pH for using the thin nano particle of silicon in the case where not carrying out fluoric acid processing in Fig. 5
Measurement result in the case where the ultrapure water that value is 7.
Fig. 5 shows that not crushing high purity silicon powder, a stage size reduction (average crystal grain diameter 20.0nm) and two-stage crushes
The measured value of dissolution hydrogen concentration in the ultra-pure water solution of (average crystal grain diameter 10.9nm).It is understood that due to partial size (crystallite
Diameter) become smaller, the surface area of the thin nano particle of silicon increases, and the hydrogen for reacting generation on the surface increases, and dissolution hydrogen concentration increases.
Also, as the dissolution hydrogen concentration that the increase in reaction time obtains increases, under reaction in (about 7 hours) 400 minutes Zuo You, even if
The dissolution hydrogen concentration of 0.4ppm or so is also reached in ultrapure water.The dissolution hydrogen concentration of 1ppm or more in order to obtain, as long as increasing
Add the amount of the thin nano particle of silicon.
Also, the dissolution hydrogen concentration in visible aqueous solution also has dependence for the pH value of aqueous solution.Specifically, very
Clear when making pH value 8.0, compared with ultrapure water, the dissolution hydrogen concentration in aqueous solution is increased significantly.
Fig. 6 is shown by applying fluorine to the thin nano particle of the silicon for carrying out a stage size reduction (Average crystallite diameter 20.0nm)
Acid handles the example (warning triangle in figure) in the case where removing oxidation film and does not apply the example in the case where fluoric acid processing
The result that (in figure × label) compares.In addition, the pH value of the aqueous solution of the two is 8.
Using the thin nano particle of silicon for carrying out fluoric acid processing, reached at 20 minutes or so more than 1ppm,
Reached the dissolution hydrogen concentration more than 1.4ppm at 100 minutes.In the case where being intended to further shorten the time, carefully received as long as increasing silicon
The input amount of rice grain.
Also, drinking possible tap water (pH value 7.1 to 7.3 or so) using the standard of Japan, a stage size reduction is carried out,
The thin nano particle of silicon (Average crystallite diameter 20.0nm) in the case where fluoric acid processing is not carried out to mix into tap water and manufacture
Containing hydrogen solution or hydrogen-rich water.Fig. 7 shows its measured value, also shows the measurement in the case where replacing tap water using ultrapure water simultaneously
Value.
As shown in fig. 7, significant increase is shown compared with dissolution hydrogen concentration when being blended in ultrapure water (pH value 7.0),
1ppm is reached within 200 minutes or so.
In addition, the thin nano particle of silicon for carrying out two-stage crushing (Average crystallite diameter is 10.9nm) is mixed in originally
In water, manufacture contains hydrogen solution or hydrogen-rich water.Although it is not shown, as a result, compared with the thin nanometer of silicon for using a stage size reduction
The dissolution hydrogen concentration of the case where grain, further increases 1.4 to 1.6 times or so.
It can be appreciated that and be able to use tap water, do not carry out fluoric acid processing, safe hydrogen concentration 1ppm or more is obtained with low cost
Contain hydrogen solution or hydrogen-rich water.In the case where being intended to further shorten the time, as long as the input amount for increasing the thin nano particle of silicon is
It can.
Fig. 8 shows the case where in order to compare the case where applying fluoric acid processing with fluoric acid processing is not applied, will carry out single order
The measurement knot of the ongoing change of dissolution hydrogen concentration when the thin nano particle of silicon that section crushes is dispersed in ultrapure water (pH value 7.0)
Fruit.In addition, despite relatively shorter 20 hours, also having reached 1ppm dissolved hydrogen in the case where carrying out fluoric acid processing
Concentration.In the case where not carrying out fluoric acid processing, after 160 hours (1 week or so), reach 1ppm dissolution hydrogen concentration.
It may determine that from the above, in the case where not carrying out fluoric acid processing, since the surface of the thin nano particle of silicon is deposited
Reaction, silicon oxide film one side in ultrapure water are generated in the hydrogen in ultrapure water of silicon oxide film, therefore the thin nano particle of silicon
It gradually dissolves, one side pole slowly occurs.As a result, hydrogen concentration under long-time, continues while increasing, such as Fig. 8 institute
Show.
[embodiment 2]
Based on appended schema other implementation forms (embodiment 2) that the present invention will be described in detail.
The thin nano particle of silicon is to manufacture as follows, that is, uses bead mill device (AIMEX joint-stock company: RMB type batch Ready
Grinder), make high purity silicon (Si) powder (for example, company, high-purity chemical research institute manufacture,It is pure
Degree 99.9%, i type silicon)) 60g is dispersed in the ethyl alcohol 250ml of 99.5wt%, it is added0.5 μm of zirconium oxide globule (capacity
300ml), (stage size reduction) is crushed 4 hours with rotation number 2500rpm.
The obtained volume distribution of one stage disintegrating process of the ball mill in through this embodiment and the thin nano particle of silicon
Crystalline texture, it can be determined that be and embodiment 1 generally identical result.
Following detailed description in ethyl alcohol stage size reduction manufacture, use aftermentioned hydrogenperoxide steam generator treated silicon
The control of hydrogen concentration and hydrogen production quantity is dissolved in the generation containing hydrogen solution or hydrogen-rich water of thin nano particle with it.
The above-mentioned thin nano particle of silicon comprising by carrying out the obtained globule of a stage size reduction in ethyl alcohol can pass through
Following technique obtains.Specifically, using be mounted in globule separation vessel (AIMEX joint-stock company) SUS filter (Globule in the case where filter mesh be 0.35mm,Globule in the case where use mesh
0.06mm), ethanol solution is injected from upper part, it includes the thin nano particles of the silicon containing globule.Thereafter, handled by classification,
Attract filtering, separation globule, obtains the ethanol solution comprising the thin nano particle of silicon.Thereafter, by using be evaporated under reduced pressure device,
Processing is evaporated to ethyl alcohol at 30 DEG C to 35 DEG C, obtains the thin nano particle of silicon and/or its aggregation (hereinafter, as general name
Referred to as " the thin nano particle of silicon ").
As hydrogenperoxide steam generator processing, by obtained silicon thin nano particle investment include hydrogenperoxide steam generator (for example,
3.5wt%, 100ml) heat resistance glass in, carry out heat treatment (about 75 DEG C of temperature) in 30 minutes.
Hydrogenperoxide steam generator, treated that the thin nano particle of silicon moves on in centrifuge tube, passes through centrifugal treating, carries out solid-liquid
Separation, liquid is abandoned, and puts into ethyl alcohol (for example, 3.5% or 99.5%, 100ml) again.Thereafter, stir silicon is thin in ethanol
Nano particle is similarly centrifuged, and processing same as described above is carried out.Thereafter, similarly, the second with above-mentioned same amount is added
Alcohol carries out centrifugal treating similar to the above, and obtains the thin nano particle of silicon.
Thereafter, it carries out spontaneously drying 1 day or so (long-time).In the state of after 1 day or so, it is believed that ethyl alcohol
And hydrogenperoxide steam generator is completely removed generally.
Also, the other examples as above-mentioned example, carry out heat treatment (about 75 DEG C of temperature) in hydrogenperoxide steam generator 60 minutes
And same centrifugal treating, and obtain silicon fine particle.
As described above, being filled by the thin nano particle of the silicon that will be mixed with hydrogenperoxide steam generator using known centrifugal treating
It sets, hydrogenperoxide steam generator is removed by solid-liquid separation treatment, it is available that surface treatment has been carried out by hydrogenperoxide steam generator
The thin nano particle of silicon.In addition, by being surface-treated with hydrogenperoxide steam generator, it can remove that there are the thin nano grain surfaces of silicon
On alkyl (for example, methyl).As a result, the thin nano particle of the silicon and its aggregation can be formed as, entirety can be with
The hydrophily on surface is kept, and also having simultaneously can be with the state that may include the surface that medium that water contains liquid directly contacts.
By applying such special surface treatment, the generation of hydrogen can be promoted with more high accuracy.
By the thin nano particle 11mg of silicon obtained by above-mentioned each technique (hydrogenperoxide steam generator processing (handling within 30 minutes))
It is placed in the vial (pyrex thickness 1mm or so, ASONE company manufacture Laboran spiral phial) of capacity 115ml,
Make its dispersion, so that full dose is added scheduled aqueous solution (pure water) about 115ml as the mode of 115ml and (meet day with sodium bicarbonate
This pharmacopeia person puts into about 20g, becomes 1.88wt%, obtain pH about 8.3).Thereafter, until the opening for being filled up to vial,
Inner cover is covered in a manner of not allowing air to enter, and is closed the lid (long 1cm), is fully sealed.The material of lid is poly- third
Alkene (thickness 2mm), inner cover use polyethylene and polyacrylic multi-bed filter producer.By above structure, can sufficiently subtract
The slow hydrogen generated penetrating or leaking.The thin nano particle of silicon is uniformly mixed in the entirety of aqueous solution directly with the state
In.This may be considered due to being handled by hydrogenperoxide steam generator, and the thin nano particle of silicon effectively becomes hydrophilic reason.It changes
Sentence talk about, it is believed that be to be handled by hydrogenperoxide steam generator, suitably keep silicon fine particle surface it is hydrophilic simultaneously, can
To realize the state with the sufficient surface area that can directly contact with the aqueous solution.
In addition, (handling within 60 minutes) about hydrogenperoxide steam generator processing, using the thin nano particle 5mg of silicon, hydrogen generation is carried out
Experiment.
In the state of keeping being fully sealed, at room temperature, gradually given birth in closed vial from the thin nano particle of silicon
Cheng Qing can be such that the hydrogen with scheduled concentration dissolves in aqueous solution.Therefore, in example 2, due to not having as embodiment
1 equally uses IPA or fluoric acid, therefore is worth illustrating, can pass through to the living body or in vivo safer medicine felt at ease
Liquid and project treatment and obtain the thin nano particle of silicon and containing hydrogen solution or hydrogen-rich water.
The measurement of the reaction time dependence of dissolution hydrogen concentration in aqueous solution is taken using what East Asia DKK company manufactured
Formula dissolved hydrogen densimeter.In Fig. 9 (a), the measurement knot of dissolution hydrogen concentration when display is using following three kinds of silicon thin nano particle
Fruit: the thin nano particle of silicon in the case where hydrogenperoxide steam generator processing is not carried out, handles 30 minutes silicon with hydrogenperoxide steam generator
Thin nano particle or the thin nano particle of silicon for using hydrogenperoxide steam generator to handle 60 minutes.Also, Fig. 9 (b) is indicated for above-mentioned each
Condition, display are converted into the hydrogen production quantity of every 1g silicon (Si).The longitudinal axis of Fig. 9 (a) indicates dissolution hydrogen concentration, when horizontal axis indicates reaction
Between (h: hour).Also, the longitudinal axis of Fig. 9 (b) indicates hydrogen production quantity, horizontal axis indicates reaction time (h: hour).
As shown in figure 9, being handled by hydrogenperoxide steam generator, hydrogen, which generates, quickly to be increased.This be due to the thin nano particle of silicon at
For hydrophily, and be dispersed in it is in aqueous solution therefore.In the condition using " hydrogenperoxide steam generator processing (handling for 30 minutes) "
When, obtain being worth explanation concentration be 2 hours 400ppb, at 4 hours close to 1000ppb.Also, reaching at 24 hours
2000ppb。
On the other hand, using the condition of " hydrogenperoxide steam generator processing (handling for 60 minutes) ", hydrogen production quantity
It is low when compared with the condition of " hydrogenperoxide steam generator processing (handling for 30 minutes) ".This is due to using " hydrogenperoxide steam generator processing (60
Minute processing) " condition, then the surface film oxide ratio " hydrogenperoxide steam generator processing (30 minutes handle) " of the thin nano particle of silicon
Film thickness when condition is thicker, therefore hydrogen production quantity is suppressed.Although in addition, not shown herein, with " hydrogenperoxide steam generator
The condition of processing (15 minutes handle) " has carried out experiment similar to the above, obtained experimental result with " at hydrogenperoxide steam generator
The condition of reason (handling for 30 minutes) " is generally identical.In processing in 1 to 2 minute, with it is non-treated when be same degree, do not obtain
Effective hydrogen generates.
Therefore, the time of hydrogenperoxide steam generator processing was appropriate with 5 to 30 minutes.Mixed carbonic acid hydrogen sodium, can be equivalent to
The pH state of the small intestine of general living body generates effective hydrogen in vivo and generates.The hydrogen that Fig. 9 (b) display is converted into every 1g Si generates
Amount.The longitudinal axis indicates the hydrogen production quantity (ml) of every 1g Si, and horizontal axis indicates reaction time (h: hour).As shown in Fig. 9 (b), in peroxide
Under conditions of changing hydrogen solution processing (handling within 30 minutes), very effective hydrogen production quantity can be continuously obtained at 2 hours or more
(40ml)。
From the point of view of above-mentioned experimental result, do not use IPA or fluoric acid, can manufacture even if using in living body, it is also safer and
The thin nano particle of the silicon felt at ease, therefore safely in vivo hydrogen can be made to generate.Furthermore, using the thin nanometer of this silicon
Grain is added in known additive or food, can manufacture living body hydrogen and generate material.
In order to obtain the dissolution hydrogen concentration of 1ppm or more within a few hours in reaction time, as long as increasing the thin nano particle of silicon
Amount.
However, as silicon fine particle, other than high purity silicon (Si) powder, the silicon substrate of solar battery grade is utilized
Silicon generated cuts powder or semiconductor grade lapping rejects when cutting processing, also can be generated containing hydrogen solution or hydrogen-rich water.Also, not only
It is i type, N-shaped, p-type also can be used.
Utilization possibility in industry
The present invention is can to manufacture the thin nano particle of silicon with living body safety, and can be efficiently used and be developed
Contain hydrogen solution or hydrogen-rich water and its manufacturing technology person at excellent safety, practicability and economy, especially it is possible to
Using to the hydrogen containing unsoundness, the thin nano particle of medical silicon generate the health such as material (agent), washing water or healthy drinking water,
Dietetic food, product scope.