CN109939618A - Spray structure and chemical source supply system - Google Patents

Spray structure and chemical source supply system Download PDF

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Publication number
CN109939618A
CN109939618A CN201910230796.2A CN201910230796A CN109939618A CN 109939618 A CN109939618 A CN 109939618A CN 201910230796 A CN201910230796 A CN 201910230796A CN 109939618 A CN109939618 A CN 109939618A
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CN
China
Prior art keywords
sieve plate
porous matrix
spray structure
fixed frame
matrix sieve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910230796.2A
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Chinese (zh)
Inventor
王卓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Piotech Inc
Original Assignee
Piotech Shenyang Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Piotech Shenyang Co Ltd filed Critical Piotech Shenyang Co Ltd
Priority to CN201910230796.2A priority Critical patent/CN109939618A/en
Publication of CN109939618A publication Critical patent/CN109939618A/en
Priority to TW108125859A priority patent/TWI708637B/en
Pending legal-status Critical Current

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Abstract

A kind of spray structure, it includes: porous matrix sieve plate is be uniformly distributed the air-flow from chemical source;And fixed frame, it is for supporting previous porous matrix sieve plate.

Description

Spray structure and chemical source supply system
Technical field
The present disclosure generally relates to a kind of spray structures, especially with regard to the spray structure for being applied to chemical source supply system.
Background technique
With the progress of technique and the needs of each section of processing procedure, various gases can be mostly supplied in consersion unit.In gas phase In reaction unit, it is known that reaction gas uniformity can uniformity performance, yield to finished product etc. generate great influence.For this purpose, The field of uniformity in to(for) gas supply has required more.
In the past, when gas is supplied to the reaction chamber of consersion unit, mostly gas can be allowed equably to send using spray structure To reaction chamber.It is by spray head (top plate), baffle (baffle plate), shower plate in passing spray structure (face plate) and support construction are constituted, and wherein spray head plays the function of mixed device, and baffle is then to downgrade pressure, is adjusted The uniformity of pressure.Shower plate be then for transport gas use, and support construction be then for support spray head, baffle and Shower plate.So in passing spray structure, not only structure is complicated, and dismounting formality is complicated, constitutes phase really for the maintenance of equipment When the burden of degree.Also it is therefore contemplated that can have the structure of relative simplicity, the effect of to reach better than passing spray structure.
Summary of the invention
The present invention provides a kind of spray structure, it includes: porous matrix sieve plate is to make the gas from chemical source Stream is uniformly distributed;And fixed frame, it is for supporting previous porous matrix sieve plate.
Preferably, the porosity of previous porous matrix sieve plate ties up between 1%-25%.Previous porous matrix sieve plate Upper surface, it is high in presentation around low massif body.The upper surface system of previous porous matrix sieve plate has the pattern of fluctuating. The upper surface system of previous porous matrix sieve plate has honeycomb duct.Aforementioned fixed frame system have a supporting ring structure, be for Support previous porous matrix sieve plate.Aforementioned fixed frame system has a support plate, is for supporting previous porous matrix to sieve Plate, and there are multiple through-holes.Aforementioned fixed frame system have a support construction, be for supporting previous porous matrix sieve plate, and It is open with multiple regions.
The present invention separately provides a kind of chemical source supply system, it includes: chemical source is supply chemical gas;Aforementioned spray Drench structure;And feeding pipe, it is that one end is connected to afore mentioned chemical source, the other end is connected to the previous porous of aforementioned spray structure Property matrix sieve plate.
By spray structure as described above, it can porous matrix sieve plate directly replaces institute in passing spray structure Spray head, baffle and the shower plate needed, and reach identical effect simultaneously.And then the complexity in maintenance is reduced, together The uniformity coefficient of Shi Gaishan air-flow.
Detailed description of the invention
The stereoscopic figure of Fig. 1 system spray structure of the invention.
The appearance exploded view of Fig. 2 system spray structure of the invention.
The stereoscopic figure of the first state of porous matrix sieve plate in Fig. 3 system spray structure of the invention.
The stereoscopic figure of second of state of porous matrix sieve plate in Fig. 4 system spray structure of the invention.
The stereoscopic figure of the third state of porous matrix sieve plate in Fig. 5 system spray structure of the invention.
The stereoscopic figure of the first state of fixed frame in Fig. 6 system spray structure of the invention.
The stereoscopic figure of second of state of fixed frame in Fig. 7 system spray structure of the invention.
The stereoscopic figure of the third state of fixed frame in Fig. 8 system spray structure of the invention.
Symbol description is as follows in figure:
10 spray structures
11,21,31 porous matrix sieve plate
12,22,32 fixed frame
111,211,311 annular portion
112,212,312 round plate
119,219,319 upper surface
121 outer fixing portions
122,222,322 integral support portion
123 lugs
129 hollow portions
218 holes
318 diversion trenches
224 Porous Bases
324 support bridges
The space S
Specific embodiment
" spray structure " alleged by the present invention means the component groups of the uniformity for improving gas supply.Alleged by the present invention " Porous matrix sieve plate " means the component as made by the material with hole, and reaches the effect of sieve gas body." porosity The shared volume ratio of hole is about 1%~25% in matrix sieve plate ".The material of " porous matrix sieve plate ", specifically can be By porous metals, porous ceramics, high molecular material or the composite material institute structure that will not be reacted with the chemical gas supplied At, and as the gaseous species supplied are different, a kind of consumptive material can be designed to be or it is non-consumptive material, it specifically can be by powder Molding, isostatic pressing Injection molded syringe, 3D print, laser is sintered etc., and modes are made." fixed frame " alleged by the present invention, means The structure that porous matrix sieve plate can mechanically be fixed, is preferably made of the good material of intensity.
Referring to Fig. 1, being the stereoscopic figure of spray structure 10 of the invention.As shown, 10 system of spray structure is by more Permeability matrix sieve plate 11 and fixed frame 12 are constituted.Wherein, porous matrix sieve plate 11 is repeatedly taken in fixed frame 12 toward radially inside (Fig. 2 please be join) on the integral support portion 122 of upper extension.
Referring to Fig. 2, being the appearance exploded view of spray structure 10 of the invention.As shown, more in spray structure 10 11 system of permeability matrix sieve plate is constituted by ceramic porous property substrate is integrally formed at annular portion 111 and round plate 112.Wherein disk 112 system, portion is located at the lower section of annular portion 111, and the outer diameter system of round plate 112 is greater than the internal diameter of annular portion 111, whereby with disk The under shed in the 119 sealed circular ring portion 111 of upper surface in portion 112, and the space S of a upper end opening is collectively formed with annular portion 111. 12 system of fixed frame has outer fixing portion 121 and integral support portion 122 by the integrally formed circlewise structure of a rigid.Its China and foreign countries Support portion 121 has the lug 123 extended toward radial outside, so that fixed frame 12 can be fixed in the inside of reaction unit chamber Upper wall (not shown).The internal diameter of integral support portion 122 and be less than the outer diameter of 11 annular portion 111 of porous matrix sieve plate so that circle Ring portion 111 is able to repeatedly take on integral support portion 122.And 11 round plate of porous matrix sieve plate, 112 outer diameter system is slightly less than inner support The internal diameter in portion 122.It is taken when the integral support portion 122 of fixed frame 12 when the annular portion 111 of porous matrix sieve plate 11 changes, annular portion 111, which are able to insertion integral support portion 122, is formed by hollow portion 129.
When use when the spray structure 10 of the present invention, first with the lug 123 of fixed frame 12, fixed frame 12 is fixed on instead The chamber upper wall (not shown) of device is answered, so that the annular portion 111 of porous matrix sieve plate 11 is engaged with chamber upper wall, and will be empty Between S seal.At this point, the chemical source supply system of reaction unit, is the chemical source (figure for being connected to supply chemical gas through one end Do not show), the other end is connected to the feeding pipe of space S and is connected to porous matrix sieve plate 11.Hereat, it is supplied from chemical source After the chemical gas of system is supplied to space S, through the porous material of porous matrix sieve plate 11, so that air-flow is depressured, And it improves in porous matrix the sieve plate 11 radially pressure of chemical gas and flow distribution situation, enhances chemical gas The uniformity of supply.In addition, can further promote chemical gas through the adjusting of porous matrix sieve plate 11 porosity and aperture Purity, and penetrate regulation porous matrix sieve plate 11 thickness, it is adjustable from the hole of porous matrix sieve plate 11 spread Air-flow and gas pressure distribution situation out, achieve the effect that spray whereby.Since this spray structure 10 has significantly simplified mechanical composition, Increase the convenience of dismounting, thus can substantially shorten the time of maintenance, thus develops efficiency.
Fig. 3-Fig. 5 is please referred to, is three kinds of states of porous matrix sieve plate in spray structure of the invention (11,21,31) The stereoscopic figure of sample.Porous matrix sieve plate (11,21,31) difference of three kinds of aspects is round plate (112,212,312) The pattern of upper surface.112 upper surface of round plate, 119 system shown in Fig. 3 presents planar.212 upper surface of round plate shown in Fig. 4 219 systems are presented the massif shape that swells upwards of the center of circle, and in different radial positions be equipped with circumferential ring around hole 218.Fig. 5 institute The massif shape swelled upwards in the center of circle is also presented in 312 upper surface 319 of round plate shown, and forms radiation diffusion type in hill portion Diversion trench 318.By porous matrix sieve plate (11,21,31) round plate (112,212,312) upper surface (119,219,319) Pattern adjustment, be adjusted the distribution of chemical gas air pressure and air-flow radially, and can be with needing or gas Species differences, to adjust required pattern.
Fig. 6-8 is please referred to, is that the appearance of three kinds of aspects of fixed frame in spray structure of the invention (12,22,32) is vertical Body figure.Fixed frame (12,22,32) difference of three kinds of aspects is the pattern of integral support portion (122,222,322).Shown in Fig. 6 it 122 system of integral support portion be annular shape, and can connect be butted on porous matrix sieve plate (11,21,31) round plate (112,212, 312).Integral support portion 222 shown in Fig. 7 is in addition to identical with Fig. 6 circular outer, also with a Porous Base 224, and can connect to In the lower surface of porous matrix sieve plate (11,21,31) round plate (112,212,312).Integral support portion 322 shown in Fig. 8 removes It is identical with Fig. 6 circular outer, also with the support bridge 324 of a multiple spot connection, can connect be butted on porous matrix sieve plate (11, 21,31) lower surface of round plate (112,212,312).It is designed by different fixed frame (12,22,32), it can be further with It needs or the Species differences of gas to adjust the supply mode of air-flow reaches more uniformly gas flow optimized.
So far, the preferred embodiment of the spray structure of the present invention, is illustrated via above description and schema.At this Disclosed all features all may be in conjunction with other means in specification, each disclosed feature can in this specification Can selectivity with replaced identical, equal or similar purpose feature, it is therefore, all other than especially significant feature Feature disclosed by this specification is only an example in equal or similar features.By the description of present pre-ferred embodiments Afterwards, being familiar with this technical field personnel should understand that, a present invention actually novel, progress and the invention for having industrial applicability, Deep tool dynamogenetic value.The present invention as the people Ren Shi craftsman for being familiar with skill thinks and be it is all as modify (such as fixed frame or porosity base The pattern or combination of body sieve plate), it is so not de- as attached application range is intended to Protector.

Claims (8)

1. a kind of spray structure, it includes:
Porous matrix sieve plate is be uniformly distributed the air-flow from chemical source;And
Fixed frame is for supporting previous porous matrix sieve plate.
2. spray structure as described in claim 1, which is characterized in that wherein the porosity of previous porous matrix sieve plate ties up to Between 1%-25%.
3. spray structure as described in claim 1, which is characterized in that the wherein upper surface of previous porous matrix sieve plate is in The low massif body of high surrounding in existing.
4. spray structure as claimed in claim 3, which is characterized in that the wherein upper surface system tool of previous porous matrix sieve plate There is honeycomb duct.
5. spray structure as described in claim 1, which is characterized in that wherein aforementioned fixed frame system has a supporting ring structure, It is for supporting previous porous matrix sieve plate.
6. spray structure as described in claim 1, which is characterized in that wherein aforementioned fixed frame system has a support plate, is For supporting previous porous matrix sieve plate, and there are multiple through-holes.
7. spray structure as described in claim 1, which is characterized in that wherein aforementioned fixed frame system has a support construction, is For supporting previous porous matrix sieve plate, and there is multiple regions opening.
8. a kind of chemistry source supply system, it includes:
Chemical source is supply chemical gas;
Spray structure as described in any one of claim 1 to 7;And
Feeding pipe is that one end is connected to afore mentioned chemical source, and the other end is connected to the aforementioned porosity base of aforementioned spray structure Body sieve plate;By previous porous matrix sieve plate, so that afore mentioned chemical gas is able to equably be sprayed by aforementioned spray structure.
CN201910230796.2A 2019-03-26 2019-03-26 Spray structure and chemical source supply system Pending CN109939618A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201910230796.2A CN109939618A (en) 2019-03-26 2019-03-26 Spray structure and chemical source supply system
TW108125859A TWI708637B (en) 2019-03-26 2019-07-22 Spray structure and chemical source supply system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910230796.2A CN109939618A (en) 2019-03-26 2019-03-26 Spray structure and chemical source supply system

Publications (1)

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CN109939618A true CN109939618A (en) 2019-06-28

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CN (1) CN109939618A (en)
TW (1) TWI708637B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113295811A (en) * 2021-05-20 2021-08-24 西部宝德科技股份有限公司 Chromatographic column sieve plate and preparation method thereof
CN114192955A (en) * 2021-12-23 2022-03-18 江苏兆铝金属制品有限公司 Aluminum profile welding equipment

Citations (4)

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Publication number Priority date Publication date Assignee Title
CN1696768A (en) * 2004-05-12 2005-11-16 应用材料股份有限公司 Plasma uniformity control by gas diffuser hole design
KR101073373B1 (en) * 2009-06-17 2011-10-13 주식회사 원익아이피에스 Showerhead and Substrate processing apparatus using the same
CN202337819U (en) * 2011-11-29 2012-07-18 台钻科技(郑州)有限公司 Chemical vapor deposit (CVD) furnace gas diffusion device
JP5543088B2 (en) * 2007-07-20 2014-07-09 アプライド マテリアルズ インコーポレイテッド Diffusion plate with slit valve compensation

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4993610B2 (en) * 2005-11-08 2012-08-08 国立大学法人東北大学 Shower plate and plasma processing apparatus using shower plate
JP2008047869A (en) * 2006-06-13 2008-02-28 Hokuriku Seikei Kogyo Kk Shower plate and its fabrication process, plasma processing equipment employing it, plasma processing method and process for fabricating electronic device
CN104715993B (en) * 2013-12-13 2017-02-22 中微半导体设备(上海)有限公司 Plasma processing cavity, gas spraying head and manufacturing method thereof
TWM569066U (en) * 2018-06-20 2018-10-21 凱樂士股份有限公司 Structure of shower head nozzle

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1696768A (en) * 2004-05-12 2005-11-16 应用材料股份有限公司 Plasma uniformity control by gas diffuser hole design
JP5543088B2 (en) * 2007-07-20 2014-07-09 アプライド マテリアルズ インコーポレイテッド Diffusion plate with slit valve compensation
KR101073373B1 (en) * 2009-06-17 2011-10-13 주식회사 원익아이피에스 Showerhead and Substrate processing apparatus using the same
CN202337819U (en) * 2011-11-29 2012-07-18 台钻科技(郑州)有限公司 Chemical vapor deposit (CVD) furnace gas diffusion device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113295811A (en) * 2021-05-20 2021-08-24 西部宝德科技股份有限公司 Chromatographic column sieve plate and preparation method thereof
CN114192955A (en) * 2021-12-23 2022-03-18 江苏兆铝金属制品有限公司 Aluminum profile welding equipment

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Publication number Publication date
TW202035027A (en) 2020-10-01
TWI708637B (en) 2020-11-01

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Address after: No.900 Shuijia, Hunnan District, Shenyang City, Liaoning Province

Applicant after: Tuojing Technology Co.,Ltd.

Address before: No.900 Shuijia, Hunnan District, Shenyang City, Liaoning Province

Applicant before: SHENYANG PIOTECH Co.,Ltd.

RJ01 Rejection of invention patent application after publication
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Application publication date: 20190628