TWM569066U - Structure of shower head nozzle - Google Patents
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Abstract
本創作係揭露一種適用於晶圓表面處理之噴淋頭結構，所述噴淋頭結構包含：一座體，該座體的一面係設有一進氣口，且該座體係設有連通該進氣口一槽區；以及孔質陶瓷盤，係設置於該座體一面並覆蓋該槽區，且該多孔質陶瓷盤係具有複數個連通該槽區之連通孔隙；其中，該多孔質陶瓷盤(20)之孔隙率係為10%至50%，各該連通孔隙之直徑係為500μm以下。本創作能夠降低傳統使用金屬材質噴淋頭的製造成本，並能夠減少雜質產生，且增長噴淋頭使用壽命，進而改善製程作業穩定性。The present invention discloses a sprinkler head structure suitable for wafer surface treatment, the sprinkler head structure comprising: a body having an air inlet on one side of the body, and the seat system is provided with the air inlet a porous ceramic disk disposed on one side of the body and covering the groove region, and the porous ceramic disk has a plurality of communicating pores communicating with the groove region; wherein the porous ceramic disk ( 20) The porosity is 10% to 50%, and the diameter of each of the connected pores is 500 μm or less. This creation can reduce the manufacturing cost of traditional metal sprinklers, reduce the generation of impurities, and increase the life of the sprinklers, thereby improving the stability of the process.
Description
本創作是有關於一種噴淋頭，特別是有關於一種用於晶圓表面處理的設備之噴淋頭結構。This creation relates to a showerhead, and more particularly to a showerhead structure for a device for wafer surface treatment.
噴淋頭通常用於半導體製程設備中，可對晶圓之表面分佈製程氣體，進而執行沈積、蝕刻或其他製程作業。Sprinklers are commonly used in semiconductor process equipment to distribute process gases to the surface of the wafer for deposition, etching or other processing operations.
如第1圖所示，一般之噴淋頭結構係包含有座體1及花盤2，花盤2係設置於座體1之一面，且花盤2係具有複數個獨立孔洞201。當製程氣體經由座體1之進氣口101進氣時，可透過花盤2之複數個獨立孔洞201噴出，進而得以對晶圓之表面進行沈積或蝕刻等處理作業。As shown in Fig. 1, a general showerhead structure includes a seat body 1 and a faceplate 2, the faceplate 2 is disposed on one side of the seat body 1, and the faceplate 2 has a plurality of independent holes 201. When the process gas is introduced through the air inlet 101 of the base 1, the plurality of independent holes 201 of the disk 2 can be ejected, thereby performing processing such as deposition or etching on the surface of the wafer.
然而，習知之花盤2係為金屬材料所製，而每一個獨立孔洞201則是在花盤2製作完成之後再透過鑽頭進行鑽孔之方式逐一鑽孔加工形成，如此一來，不但鑽頭之損耗大，造成製造成本增加之外，鑽孔之作業也相當地費時費力。而且，金屬材質的噴淋頭因不耐製程氣體的腐蝕與沖蝕，會產生金屬微粒子雜質(particle)，汙染晶圓表面。又，花盤孔洞的孔徑受製程氣體的沖蝕逐漸擴大將造成製程作業之不穩定性。However, the conventional flower disk 2 is made of a metal material, and each of the individual holes 201 is formed by drilling a hole through the drill bit after the flower disk 2 is completed, so that not only the drill bit but also the drill bit In addition to the large losses, resulting in increased manufacturing costs, drilling operations are also quite time consuming and labor intensive. Moreover, metal sprinklers are resistant to corrosion and erosion of process gases, which can cause metal particles to contaminate the surface of the wafer. Moreover, the aperture of the disk hole is gradually enlarged by the erosion of the process gas, which will cause instability of the process operation.
有鑑於上述習知技藝之問題，本創作之目的就是在提供一種可降低傳統之金屬材質噴淋頭的製造成本，減少雜質(particle)產生，並增長噴淋頭使用壽命進而改善製程作業穩定性的多孔質(Porous)陶瓷盤之噴淋頭結構。In view of the above-mentioned problems of the prior art, the purpose of the present invention is to provide a manufacturing cost which can reduce the traditional metal sprinkler head, reduce the generation of particles, and increase the service life of the sprinkler to improve the stability of the process. The sprinkler structure of a Porous ceramic disc.
根據本創作之目的，提出一種噴淋頭結構，適用於晶圓表面處理，所述噴淋頭結構包含：一座體，該座體的一面係設有一進氣口，且座體係設有連通進氣口之一槽區；以及一多孔質陶瓷盤，係設置於座體之另一面並覆蓋槽區，且多孔質陶瓷盤係具有複數個連通槽區之連通孔隙，所述複數個連通孔隙係為多孔質陶瓷盤於生產製程中經乾壓成型與燒結作業所生成，其中，多孔質陶瓷盤之孔隙率係為10%至50%，各連通孔隙之直徑係為500μm以下。According to the purpose of the present invention, a showerhead structure is proposed, which is suitable for wafer surface treatment. The shower head structure comprises: a body, one side of the body is provided with an air inlet, and the seat system is provided with a connecting air inlet. a porous chamber disk; and a porous ceramic disk disposed on the other side of the body and covering the groove region, and the porous ceramic disk system has a plurality of communicating pores communicating with the groove region, the plurality of connected pore systems The porous ceramic disk is produced by dry pressing and sintering in a production process, wherein the porosity of the porous ceramic disk is 10% to 50%, and the diameter of each connected pore is 500 μm or less.
依據上述技術特徵，所述多孔質陶瓷盤之厚度為0.1mm至20mm。According to the above technical feature, the porous ceramic disk has a thickness of 0.1 mm to 20 mm.
依據上述技術特徵，所述多孔質陶瓷盤係由碳化矽所製。According to the above technical feature, the porous ceramic disk is made of tantalum carbide.
依據上述技術特徵，所述多孔質陶瓷盤係選自由碳化矽、氧化鋁、氮化鋁及氮化矽所組成的群組中之至少其中之一所製，或其他陶瓷材料或各種陶瓷複合材料所製。According to the above technical feature, the porous ceramic disk is selected from at least one of a group consisting of tantalum carbide, aluminum oxide, aluminum nitride, and tantalum nitride, or other ceramic materials or various ceramic composite materials. Made by.
前述噴淋頭結構的該多孔質陶瓷盤係由一多孔質陶瓷盤之製造方法所製備，該多孔質陶瓷盤之製造方法係包含下列步驟：The porous ceramic disk of the shower head structure is prepared by a method for manufacturing a porous ceramic disk, and the method for manufacturing the porous ceramic disk comprises the following steps:
一備料步驟：提供至少一種陶瓷粉末。A preparation step: providing at least one ceramic powder.
一混合步驟：將該陶瓷粉末與高分子材料、水或其他溶劑以及黏著劑進行混合攪拌以形成一泥漿物料。A mixing step: mixing the ceramic powder with a polymer material, water or other solvent, and an adhesive to form a slurry material.
一造粒步驟：將該泥漿物料放置於一造粒設備中，以使該泥漿物料經一噴霧造粒作業而形成複數個小粉體顆粒。A granulation step: placing the slurry material in a granulation apparatus to form a plurality of small powder granules by a spray granulation operation.
一壓型步驟：將該複數個小粉體顆粒放置於一模具內，並利用加壓設備對該複數個小粉末顆粒物進行乾壓成型作業，以獲得具有複數個連通孔隙之一生胚。A press-type step: placing the plurality of small powder particles in a mold, and performing dry pressing forming operation on the plurality of small powder particles by using a pressurizing device to obtain a green embryo having a plurality of connected pores.
一脫脂步驟：將該生胚的結構中所含之高分子材料以及黏著劑脫除，以獲得一胚體。A degreasing step: removing the polymer material and the adhesive contained in the structure of the raw embryo to obtain an embryo body.
一燒結步驟：將脫脂完成的該胚體放置於一燒結設備中進行燒結作業，以獲得一多孔質陶瓷盤半成品。A sintering step: placing the degreased embryo body in a sintering apparatus for sintering operation to obtain a porous ceramic disk semi-finished product.
一研磨成型步驟：將該多孔質陶瓷盤半成品放置於一研磨設備，並對該多孔質陶瓷盤半成品進行研磨加工作業，以獲得具該複數個連通孔隙之一多孔質陶瓷盤，其中，該多孔質陶瓷盤之孔隙率係為10%至50%，各該連通孔隙之直徑係為500μm以下。a grinding molding step: placing the porous ceramic disk semi-finished product in a grinding device, and performing a grinding operation on the porous ceramic disk semi-finished product to obtain a porous ceramic disk having the plurality of connected pores, wherein The porosity of the porous ceramic disk is 10% to 50%, and the diameter of each of the connected pores is 500 μm or less.
依據上述技術特徵，該脫脂步驟獲得之該胚體具有30%至60%之緻密度。According to the above technical features, the embryo body obtained by the degreasing step has a density of 30% to 60%.
依據上述技術特徵，所述陶瓷粉末可選自碳化矽、氧化鋁、氮化鋁、氮化矽之其中之一或其他陶瓷材料或各種陶瓷複合材料。According to the above technical features, the ceramic powder may be selected from one of tantalum carbide, aluminum oxide, aluminum nitride, tantalum nitride or other ceramic materials or various ceramic composite materials.
依據上述技術特徵，該壓型步驟中係以100至2,000kg/cm 2之壓力對該複數個粉體顆粒進行乾壓成型作業。 According to the above technical feature, the plurality of powder particles are subjected to a dry press forming operation at a pressure of 100 to 2,000 kg/cm 2 in the press molding step.
承上所述，本創作之噴淋頭結構主要係利用碳化矽或其他陶瓷材料製作出多孔質陶瓷盤，且多孔質陶瓷盤所具有之複數個連通孔隙，是在多孔質陶瓷盤於生產製程中經乾壓成型與燒結作業即可控制生成，相較於習知技術之金屬花盤，可省去後續之鑽孔加工作業，不僅可降低製造成本及作業工時之外，不會被製程氣體因沖蝕而產生小微粒雜質(particle)，並且孔徑不易受製程氣體之沖蝕擴大而造成製程作業之不穩定性，以更為符合晶圓表面處理之製程作業需求。According to the above description, the sprinkler head structure of the present invention mainly uses porous tantalum ceramic discs made of tantalum carbide or other ceramic materials, and the porous ceramic disc has a plurality of connected pores, which are in the production process of the porous ceramic disc. The medium-pressure dry forming and sintering operations can be controlled and produced. Compared with the metal discs of the prior art, the subsequent drilling operations can be omitted, which not only reduces the manufacturing cost and the working time, but also does not be processed. The gas generates small particle particles due to erosion, and the pore diameter is not easily affected by the erosion of the process gas, which causes instability of the process operation, and is more in line with the processing requirements of the wafer surface treatment.
為利 貴審查員瞭解本創作之技術特徵、內容與優點及其所能達成之功效，茲將本創作配合附圖，並以實施例之表達形式詳細說明如下，而其中所使用之圖式，其主旨僅為示意及輔助說明書之用，未必為本創作實施後之真實比例與精準配置，故不應就所附之圖式的比例與配置關係解讀、侷限本創作於實際實施上的權利範圍，合先敘明。In order to understand the technical characteristics, content and advantages of the creation and the effects that can be achieved by the examiner, the author will use the drawings in detail and explain the following in the form of the examples, and the drawings used therein The subject matter is only for the purpose of illustration and supplementary instructions. It is not necessarily the true proportion and precise configuration after the implementation of the original creation. Therefore, the proportions and configuration relationships of the attached drawings should not be interpreted or limited in the actual implementation scope. First described.
請參閱第2圖，其係為本創作之噴淋頭結構之第一示意圖。如圖所示，本創作之噴淋頭結構主要包含有一座體10及一多孔質陶瓷盤20；所述座體10的一面係設有一進氣口11，且座體10係設有連通進氣口11之一槽區12；所述多孔質陶瓷盤20係具有複數個連通孔隙21，需特別注意的是，所述複數個連通孔隙21係為多孔質陶瓷盤20於生產製程中經乾壓成型與燒結作業所控制生成，並且，所述多孔質陶瓷盤20之孔隙率係為10%至50%，各連通孔隙21之直徑則可控制在500μm以下。此外，所述多孔質陶瓷盤20之厚度較佳為0.1mm至20mm，但不以此為限。Please refer to Fig. 2, which is the first schematic diagram of the sprinkler structure of the present invention. As shown in the figure, the sprinkler head structure of the present invention mainly comprises a body 10 and a porous ceramic disk 20; one side of the seat body 10 is provided with an air inlet port 11, and the seat body 10 is connected to each other. a porous chamber disk 12 having a plurality of communicating pores 21; it is to be noted that the plurality of interconnecting pores 21 are hollow ceramic discs 20 which are dried during the production process. The pressure molding and the sintering operation are controlled, and the porosity of the porous ceramic disk 20 is 10% to 50%, and the diameter of each of the communication pores 21 is controlled to be 500 μm or less. In addition, the thickness of the porous ceramic disk 20 is preferably 0.1 mm to 20 mm, but is not limited thereto.
上述中，所述多孔質陶瓷盤20可由各種陶瓷材料所製成，所述各種陶瓷材料可選自碳化矽、氧化鋁、氮化鋁或氮化矽的其中之一或其他陶瓷材料或各種陶瓷複合材料，但不以此等所列舉而有所限制。In the above, the porous ceramic disk 20 may be made of various ceramic materials, which may be selected from one of tantalum carbide, aluminum oxide, aluminum nitride or tantalum nitride or other ceramic materials or various ceramics. Composite materials, but are not limited by this list.
再請一併參閱第3圖及第4圖，其分別係為本創作之噴淋頭結構之第二示意圖及第三示意圖。如圖所示，本創作之多孔質陶瓷盤20係設置於座體10之一面，並且多孔質陶瓷盤20係覆蓋住座體10之槽區12，當製程氣體經由座體10之進氣口11進入至槽區12時，所述製程氣體可透過多孔質陶瓷盤20之各連通孔隙21來噴出。Please refer to FIG. 3 and FIG. 4 together, which are the second schematic diagram and the third schematic diagram of the sprinkler structure of the present invention. As shown in the figure, the porous ceramic disk 20 of the present invention is disposed on one side of the seat body 10, and the porous ceramic disk 20 covers the groove portion 12 of the seat body 10, and the process gas passes through the air inlet of the seat body 10. When entering the trough area 12, the process gas can be ejected through the respective communication apertures 21 of the porous ceramic disk 20.
再請參閱第5圖，其係為本創作之噴淋頭結構之實施例之示意圖。本創作之噴淋頭結構可用於半導體製作模組中，以對晶圓之表面分佈製程氣體，進而執行沈積、蝕刻或其他製程作業。如圖所示，所述座體10之進氣口11可提供製程氣體進入至槽區12中，進而槽區12中的氣體可藉由多孔質陶瓷盤20之複數個連通孔隙21分佈至位於載台200上之晶圓300之表面，以達到表面處理之目的。Referring again to FIG. 5, it is a schematic diagram of an embodiment of the showerhead structure of the present invention. The sprinkler structure of the present invention can be used in a semiconductor fabrication module to distribute process gases to the surface of the wafer for deposition, etching or other processing operations. As shown, the air inlet 11 of the base 10 can provide process gas into the trough 12, and the gas in the trough 12 can be distributed to the plurality of interconnected pores 21 of the porous ceramic disk 20. The surface of the wafer 300 on the stage 200 is used for surface treatment purposes.
請參閱第6圖，其係為本創作之噴淋頭結構之多孔質陶瓷盤之製造方法之流程圖，其流程步驟包含如下：Please refer to FIG. 6 , which is a flow chart of a method for manufacturing a porous ceramic disk of the shower head structure of the present invention, and the process steps thereof are as follows:
一備料步驟S11：提供至少一種陶瓷粉末，其中，所述陶瓷粉末可為碳化矽、氧化鋁、氮化鋁、氮化矽之其中之一或其他陶瓷材料或各種陶瓷複合材料。A preparation step S11: providing at least one ceramic powder, wherein the ceramic powder may be one of tantalum carbide, aluminum oxide, aluminum nitride, tantalum nitride or other ceramic materials or various ceramic composite materials.
一混合步驟S12：將所述陶瓷粉末與高分子材料、水或其他溶劑以及黏著劑進行濕式混合攪拌以形成一泥漿物料。A mixing step S12: wet mixing and mixing the ceramic powder with a polymer material, water or other solvent and an adhesive to form a slurry material.
一造粒步驟S13：將所述泥漿物料放置於造粒設備中，以使泥漿物料經噴霧造粒作業而形成複數個小粉體顆粒。A granulation step S13: placing the slurry material in a granulation apparatus to form a plurality of small powder granules by a spray granulation operation.
一壓型步驟S14：將所述複數個小粉體顆粒放置於模具內，並利用油壓設備對複數個粉體顆粒進行乾壓成型作業，以獲得具有複數個連通孔隙之生胚；其中，可透過100至2,000kg/cm 2之壓力對複數個粉體顆粒進行乾壓成型作業。 a pressing step S14: placing the plurality of small powder particles in a mold, and performing dry pressing forming operation on the plurality of powder particles by using a hydraulic device to obtain a raw embryo having a plurality of connected pores; wherein A plurality of powder particles can be subjected to a dry press forming operation at a pressure of 100 to 2,000 kg/cm 2 .
一脫脂步驟S15：將所述生胚的結構中所含之高分子材料以及黏著劑脫除，脫脂完成的胚體具有30%至60%之緻密度。胚體的緻密度係為胚體的實體密度除以胚體的材料之理論密度，其中，胚體的實體密度係為胚體的重量除以胚體的體積，胚體的材料之理論密度係為胚體的材料之單位晶格(unit cell)內原子的重量除以單位晶格體積。基本上，材料的理論密度可查表得到，例如本創作之實施例中以碳化矽為材料的胚體而言，其理論密度為3.21g/cm 3。本創作之實施例中以碳化矽材料為例，碳化矽胚體具有長、寬、高分別為5cm、5cm 和1cm，因此胚體的體積係為25cm 3；又經過秤重得知胚體的重量係為45g，因此胚體的實體密度係為1.8g/cm 3，胚體的緻密度為56.1%，而剩餘的43.9%即為孔隙所佔的比率，換言之胚體的孔隙率係為43.9%。 A degreasing step S15: removing the polymer material and the adhesive contained in the structure of the green embryo, and the degreased embryo body has a density of 30% to 60%. The density of the embryo body is the physical density of the embryo body divided by the theoretical density of the material of the embryo body. The physical density of the embryo body is the weight of the embryo body divided by the volume of the embryo body, and the theoretical density of the material of the embryo body. The weight of the atom in the unit cell of the material of the embryo body divided by the unit cell volume. Basically, the theoretical density of the material can be obtained by looking up the table. For example, in the embodiment of the present invention, the theoretical density of the embryo body made of tantalum carbide is 3.21 g/cm 3 . In the embodiment of the present invention, the niobium carbide material is taken as an example, the body of the niobium carbide has a length, a width, and a height of 5 cm, 5 cm, and 1 cm, respectively, so that the volume of the embryo body is 25 cm 3 ; The weight is 45g, so the bulk density of the embryo body is 1.8g/cm 3 , the density of the embryo body is 56.1%, and the remaining 43.9% is the ratio of the pores. In other words, the porosity of the embryo body is 43.9. %.
一燒結步驟S16：將脫脂完成的胚體放置於燒結設備中進行燒結作業，以獲得一多孔質陶瓷盤半成品；其中，可依產品需求與陶瓷粉末種類使用1,000℃至2,150℃之燒結溫度，數小時之時間來對胚體進行燒結作業，例如，若多孔質陶瓷材料係採用碳化矽粉末，則燒結溫度可採用1,900℃至2,050℃，藉此多孔質陶瓷盤半成品可達70%至90%之緻密度。a sintering step S16: placing the degreased embryo body in a sintering device for sintering operation to obtain a porous ceramic disk semi-finished product; wherein, the sintering temperature of 1,000 ° C to 2,150 ° C can be used depending on the product demand and the ceramic powder type. A few hours to sinter the embryo body. For example, if the porous ceramic material is made of tantalum carbide powder, the sintering temperature can be 1,900 ° C to 2,050 ° C, whereby the porous ceramic disc semi-finished product can reach 70% to 90%. The density.
一研磨成型步驟S17：將所述多孔質陶瓷盤半成品放置於研磨加工設備，並對多孔質陶瓷盤半成品進行研磨加工作業，以獲得多孔質陶瓷盤的外型尺寸；其中，多孔質陶瓷盤之孔隙率係為10%至50%，各連通孔隙之直徑係為500μm以下。a grinding forming step S17: placing the porous ceramic disk semi-finished product in a grinding processing device, and performing a grinding operation on the porous ceramic disk semi-finished product to obtain an outer size of the porous ceramic disk; wherein, the porous ceramic disk The porosity is 10% to 50%, and the diameter of each connected pore is 500 μm or less.
具體而言，本創作之噴淋頭結構主要係利用多孔質陶瓷材料製作出具有複數個連通孔隙之多孔質陶瓷盤，而其中該連通孔隙是在多孔質陶瓷盤於製造途中經乾壓成型與燒結作業就已生成，相較於習知技術之金屬花盤，可省去後續之鑽孔加工作業，不但可降低製造成本及作業工時之外，還可較不易被製程氣體因沖蝕而產生小微粒雜質(particle)，並且孔徑不易受製程氣體之沖蝕擴大而造成製程作業之不穩定性，藉以提供更為符合晶圓表面處理之製程作業需求。Specifically, the sprinkler head structure of the present invention mainly uses a porous ceramic material to produce a porous ceramic disk having a plurality of interconnected pores, wherein the interconnected pores are dry pressed and formed during the manufacturing process of the porous ceramic disk. The sintering operation has been completed. Compared with the metal disc of the prior art, the subsequent drilling processing can be omitted, which not only reduces the manufacturing cost and the working time, but also is less susceptible to erosion by the process gas. Small particle particles are generated, and the pore size is not easily affected by the erosion of the process gas, which causes process instability, thereby providing a process operation that is more in line with wafer surface treatment.
綜觀上述，可見本創作在突破先前之技術下，確實已達到所欲增進之功效，且也非熟悉該項技藝者所易於思及，再者，本創作申請前未曾公開，且其所具之進步性、實用性，顯已符合專利之申請要件，爰依法提出專利申請，懇請 貴局核准本件創作專利申請案，以勵創作，至感德便。Looking at the above, it can be seen that under the previous technology, this creation has indeed achieved the desired effect, and it is not easy for people who are familiar with the art to think about it. Moreover, this creation has not been disclosed before the application, and it has Progressive and practical, it has already met the application requirements of the patent, and has filed a patent application according to law. You are requested to approve the application for the creation of this patent to encourage creation.
以上所述之實施例僅係為說明本創作之技術思想及特點，其目的在使熟習此項技藝之人士能夠瞭解本創作之內容並據以實施，當不能以之限定本創作之專利範圍，即大凡依本創作所揭示之精神所作之均等變化或修飾，仍應涵蓋在本創作之專利範圍內。The embodiments described above are only for explaining the technical idea and characteristics of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and implement them according to the scope of the patent. That is, the equivalent changes or modifications made by the people in accordance with the spirit revealed by this creation should still be covered by the scope of the patent of this creation.
1、10‧‧‧座體1, 10‧‧‧ body
101、11‧‧‧進氣口 101, 11‧‧ ‧ air inlet
2‧‧‧花盤 2‧‧‧Flower plate
201‧‧‧獨立孔洞 201‧‧‧Independent holes
21‧‧‧連通孔隙 21‧‧‧Connected pores
12‧‧‧槽區 12‧‧‧Slots
20‧‧‧多孔質陶瓷盤 20‧‧‧Porous ceramic plate
200‧‧‧載台 200‧‧‧stage
300‧‧‧晶圓 300‧‧‧ wafer
S11‧‧‧備料步驟 S11‧‧‧ Preparation steps
S12‧‧‧混合步驟 S12‧‧‧ mixing step
S13‧‧‧造粒步驟 S13‧‧‧granulation step
S14‧‧‧壓型步驟 S14‧‧‧Preform step
S15‧‧‧脫脂步驟 S15‧‧‧ Degreasing step
S16‧‧‧燒結步驟 S16‧‧‧Sintering step
S17‧‧‧研磨成型步驟 S17‧‧‧ Grinding step
第1圖 為習知技術之噴淋頭結構之示意圖。 第2圖 為本創作之噴淋頭結構之第一示意圖。 第3圖 為本創作之噴淋頭結構之第二示意圖。 第4圖 為本創作之噴淋頭結構之第三示意圖。 第5圖 為本創作之噴淋頭結構之實施例之示意圖。 第6圖 為本創作之噴淋頭結構之多孔質陶瓷盤之製造方法之流程圖。Figure 1 is a schematic view of a conventional showerhead structure. Figure 2 is the first schematic diagram of the sprinkler structure of the present invention. Figure 3 is the second schematic diagram of the sprinkler structure of the present invention. Figure 4 is the third schematic diagram of the sprinkler structure of the present invention. Figure 5 is a schematic view of an embodiment of the showerhead structure of the present invention. Fig. 6 is a flow chart showing a method of manufacturing a porous ceramic disk of the shower head structure of the present invention.
Claims (4)
Priority Applications (1)
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| TW107208281U TWM569066U (en) | 2018-06-20 | 2018-06-20 | Structure of shower head nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW107208281U TWM569066U (en) | 2018-06-20 | 2018-06-20 | Structure of shower head nozzle |
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| TWM569066U true TWM569066U (en) | 2018-10-21 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI708637B (en) * | 2019-03-26 | 2020-11-01 | 大陸商瀋陽拓荊科技有限公司 | Spray structure and chemical source supply system |
| CN114074373A (en) * | 2020-08-11 | 2022-02-22 | 香港科技大学 | Porous ceramic product, preparation method thereof and solid-state refrigeration system |
-
2018
- 2018-06-20 TW TW107208281U patent/TWM569066U/en unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI708637B (en) * | 2019-03-26 | 2020-11-01 | 大陸商瀋陽拓荊科技有限公司 | Spray structure and chemical source supply system |
| CN114074373A (en) * | 2020-08-11 | 2022-02-22 | 香港科技大学 | Porous ceramic product, preparation method thereof and solid-state refrigeration system |
| CN114074373B (en) * | 2020-08-11 | 2023-12-01 | 香港科技大学 | Porous ceramic article, method of making the same, and solid state refrigeration system |
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