CN109866416A - Totally digitilized nanometer increasing material manufacturing system and its working method - Google Patents
Totally digitilized nanometer increasing material manufacturing system and its working method Download PDFInfo
- Publication number
- CN109866416A CN109866416A CN201910183257.8A CN201910183257A CN109866416A CN 109866416 A CN109866416 A CN 109866416A CN 201910183257 A CN201910183257 A CN 201910183257A CN 109866416 A CN109866416 A CN 109866416A
- Authority
- CN
- China
- Prior art keywords
- electrode
- pattern
- nanometer
- lattice
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Technical solution of the present invention discloses totally digitilized nanometer increasing material manufacturing system and its working method, including electrode, absorption ink, power-supply system, driving unit, nanometer transfer printing system, and electrode includes the working electrode of pattern changeable and to electrode;Multiple lattice electrodes that working electrode includes substrate, is distributed in substrate, lattice electrode includes electrode pattern and the driving unit that connect with electrode pattern, driving unit includes the driving part connecting with electrode pattern, the scanning conducting wire connecting with driving part, and scanning conducting wire is connected to external control system;Nanometer transfer printing system includes hot-pressing system, nanostructure can be transferred in target substrate from pattern electrode.The electrode of pattern changeable of the invention passes through the digitlization programming Control driving unit of external control system, so that the switch of coordination electrode pattern in lattice electrode to form different field distributions, the lattice electrode with different pattern is ultimately formed, realizes and forms different pattern electrodes on same electrode.
Description
Technical field
The present invention relates to increase material technology technical field, and in particular to a kind of total digitalization nanometer increasing material manufacturing system and its work
Make method, more particularly, to the preparation system and its work of the electrode for increasing one of material method manufacture nanostructure pattern changeable
Make method.
Background technique
Nano material typically refers to nanoscale system of the size between micro and macro, is compared to other materials,
Nano material can show its unique property and new rule, such as quantum size effect, skin effect and macroscopic quantum tunneling
The characteristics such as effect.The other increasing material manufacturing method of micro/nano level mainly passes through mode of printing at present, including inkjet printing, transfer or
The techniques such as person's silk-screen printing, but it is constrained to manufacturing method, these modes can only provide the precision of micron level mostly, and prepare
Speed is slower.
Ahmed professor Busnaina of Northwestern Univ USA develops a kind of nanometer transfer printing mode based on electric field absorption,
The preparation precision of Nano grade may be implemented, preparation speed is higher than traditional printing mode and can transfer the nanoparticle of any kind
Son, wherein the nanoparticle in solution can charge, can also be not charged, and preparation principle mainly uses nanoassemble work
Skill.
Charged nanosize dispersion liquid migrates under electric field action, carries out self assembly on patterned adsorption electrode surface,
Nano material is transferred in other substrates by way of transfer again, to realize quick, high-resolution nano material
Preparation.Uncharged particle has certain dielectric property, they will receive different degrees of polarization under electric field action, and polarize grain
Son will receive net electric field force under the action of inhomogeneous field power, and determining for non-band charged particle may be implemented by controlling electric field change
To assembling.
Adsorption electrode generallys use photoetching or the processing preparation of ion sputtering technique, electrode dimensions and can receive in the prior art
Meter level is other, thus resolution ratio is minimum less than 100nm.But the technique of the prior art has an outstanding feature " single mould
Plate " is only capable of preparing a kind of nano material of pattern, prepares the nano material of multiple patterns, and needing replacing pattern then needs to prepare
Various template, therefore, it is difficult to realize rapid prototyping and manufacture of the digitlization pattern preparation of nano material with micro-nano meter in circuit.
Summary of the invention
Present invention solves the technical problem that being in the adsorption electrode structure of the prior art, single template is only capable of preparing a kind of figure
The nano material of case will replace the electrode with other different patterns when needing to prepare the nano material of different pattern, difficult
To realize that the digitlization of nano material increases material preparation.
In order to solve the above technical problems, technical solution of the present invention provides a kind of totally digitilized nanometer increasing material manufacturing system,
Including electrode, absorption ink, power-supply system, driving unit, nanometer transfer printing system, wherein electrode includes the work of pattern changeable
Make electrode and to electrode;Pattern changeable working electrode include substrate, orderly or be disorderly distributed in multiple in the substrate
Lattice electrode, each lattice electrode includes an electrode pattern and the driving unit that connect with the electrode pattern, described
Driving unit includes the driving part connecting with the electrode pattern, the scanning conducting wire connecting with the driving part, described to sweep
It retouches conducting wire and is connected to external control system;Adsorb the dispersion solution that ink is nano material;Nanometer transfer printing system includes hot pressing system
System, nanostructure can be transferred in target substrate from pattern electrode.
Optionally, the driving part is that transistor or transistor and capacitor form.
Optionally, when the driving part is transistor, the number of transistors is one or two.
Optionally, the driving part is transistor and capacitor.
Optionally, when the driving part is transistor and capacitor, the number of transistors is one, the capacitor quantity
It is one;Or the number of transistors is two, the capacitor quantity is one.
Optionally, there is insulating layer, and described in insulating layer cladding between the electrode pattern and the scanning conducting wire
Driving part.
Optionally, the shape of the electrode pattern is circle, triangle, quadrangle or polygon.
Optionally, it is multiple lattice electrodes that multiple lattice electrodes are arranged in the mode in the substrate in an orderly manner
It is lateral, longitudinal or it is oblique be distributed in the substrate uniform sequentially, orderly include multiple lattice electrodes laterally, it is longitudinal
Horizontal direction on oblique direction or level height it is consistent and, in transverse direction, Zong Xianghuo between lattice electrode described in every two
Being equidistant obliquely.
Optionally, it is multiple lattice electrodes that multiple lattice electrodes, which are disorderly arranged in the mode in the substrate,
It is lateral, longitudinal or oblique be randomly distributed about in the substrate.
In order to solve the above technical problems, technical solution of the present invention also provides a kind of totally digitilized nanometer increasing material manufacturing system
Working method, wherein the working method is as follows:
It is programmed by digitlization, voltage signal is converted by driving circuit by preset pattern data and is transferred to work
In the driving unit array of electrode, and carry out switch state/duration control of driving unit;
Power-supply system is connect with lattice electrode, forms potential on lattice electrode surface, and form inner orientation with to electrode
Electric field;
Working electrode is connect by power-supply system with a pair of electrodes and is placed in nano material dispersion liquid, in dispersion liquid
On the electrode pattern that charged particle is enriched in electrification under the driving of internal electric field and form corresponding different pattern;
The multiple electrodes pattern of lattice electrode is scanned by scanning conducting wire, and changes the electricity in multiple electrodes pattern
Field distribution carries out realization and prepares different nanostructures to form different pattern electrodes;
The nanostructure being adsorbed on electrode pattern is transferred in target substrate by nanometer transfer printing system, to realize
The totally digitilized nanometer increasing material manufacturing in particular substrate.
The beneficial effect of technical solution of the present invention is:
The electrode of pattern changeable of the invention passes through the digitlization programming Control driving unit of external control system, thus
The switch of coordination electrode pattern ultimately forms the dot matrix electricity with different pattern to form different field distributions in lattice electrode
Pole realizes and forms different pattern electrodes on same electrode.
Detailed description of the invention
Fig. 1 is schematic illustration when single electrode works;
Fig. 2 is the lateral arrangement schematic diagram of the electrode of pattern changeable in the embodiment of the present invention;
Fig. 3 is the longitudinal arrangement structural schematic diagram of the electrode of pattern changeable in the embodiment of the present invention;
Fig. 4 is the top view of the electrode of pattern changeable in the embodiment of the present invention;
Fig. 5 is the cross-sectional view in Fig. 4 at A;
Fig. 6 is circuit diagram when driving part is a transistor in the embodiment of the present invention;
Fig. 7 is circuit diagram when driving part is a transistor, a capacitor in the embodiment of the present invention;
Fig. 8 is circuit diagram when driving part is two transistors, a capacitor in the embodiment of the present invention;
Fig. 9 is the workflow signal of the working method of totally digitilized nanometer increasing material manufacturing system in the embodiment of the present invention
Figure.
In attached drawing:
1 it is substrate, 2 be lattice electrode, 3 be scanning conducting wire, 4 be insulating layer, 5 be data line, 6 be power supply line, 7 is crystal
Pipe, 8 be capacitor, 10 be working electrode, 20 be electrode pattern to electrode, 21,22 be driving unit, 30 be power supply, 40 be electric
Adsorb ink.
Specific embodiment:
The present invention will be further explained below with reference to the attached drawings and specific examples, but not as the limitation of the invention.
Schematic illustration when single electrode as shown in Figure 1 works, working electrode 10 pass through power-supply system to electrode 20
30 connections are placed in Electro Sorb ink 40 and are powered, and working principle is in single pixel region (i.e. single electrode), work electricity
From to different voltage differences are generated between electrode 30, Electro Sorb ink 40 is adsorbed on working electrode 10, that is, is driven miniature for pole 10
One or two electrodes aggregation in chip or charged nanosize particle phase forms pattern by scanning entire array.
It refers to shown in Fig. 4 and Fig. 5, shows a kind of totally digitilized nanometer increasing material manufacturing system of embodiment, including electricity
Pole, absorption ink 40, power-supply system 30, driving unit, nanometer transfer printing system 50, wherein electrode includes the work of pattern changeable
Make electrode 10 and to electrode 20;The electrode 10 of pattern changeable include substrate 1, orderly or be disorderly distributed in more in substrate 1
A lattice electrode 2, each lattice electrode 2 include an electrode pattern 21 and the driving unit connecting with electrode pattern 21, driving
Unit includes the driving part 22 connecting with electrode pattern 21, the scanning conducting wire 3 connecting with driving part 22, and scanning conducting wire 3 connects
It is connected to external control system;Adsorb the dispersion solution that ink 40 is nano material;Nanometer transfer printing system 50 includes hot-pressing system, can
Nanostructure to be transferred in target substrate from electrode pattern 21.
In the present embodiment, driving part is transistor 7 or driving part is transistor 7 and capacitor 8, and driving part is
When transistor 7 and capacitor 8,7 quantity of transistor is one, and 8 quantity of capacitor is one (as shown in Figure 7);Or 7 quantity of transistor is
Two, 8 quantity of capacitor is one (as shown in Figure 8).
In the present embodiment, there is insulating layer 4, and insulating layer 4 coats driving part between electrode pattern 21 and scanning conducting wire 3
22, further insulating layer 4 can coat driving part 22, electrode pattern 21, scanning conducting wire 3.
In the present embodiment, the shape of electrode pattern 21 is circle, triangle, quadrangle or polygon, electrode pattern 21
Shape with no restriction, can be the two-dimensional surface shape of arbitrary shape, various different in order to be formed when follow-up work
Pattern electrodes.
In the present embodiment, multiple lattice electrodes 2 be arranged in an orderly manner the mode in substrate 1 be multiple lattice electrodes 2 laterally,
It is longitudinal or it is oblique be distributed in substrate 1 uniform sequentially, orderly include multiple lattice electrodes 2 in lateral, longitudinal or oblique direction
On horizontal direction or level height it is consistent and, between every two lattice electrode 2 laterally, longitudinal or distance phase obliquely
Deng.As shown in Fig. 2, multiple lattice electrodes 2 are transversely arranged on the base 1, each connection of lattice electrode 2 scanning conducting wire 3.Such as figure
Shown in 3, on the base 1, each connection of lattice electrode 2 scans conducting wire 3 to multiple 2 longitudinal arrangements of lattice electrode.As shown in figure 4,
The intuitive top view of the appearance of the electrode of pattern changeable, multiple lattice electrodes 2 are with uniformly arrangement mode is set at equal intervals in length and breadth
In substrate 1.
In the present embodiment, multiple lattice electrodes 2 be disorderly arranged in the mode in substrate 1 be multiple lattice electrodes laterally,
It is longitudinal or it is oblique be randomly distributed about (not shown) in substrate, i.e., between the lattice electrode 2 other than such as Fig. 2, Fig. 3 and Fig. 4
Or can not find regular arrangement mode between lattice electrode 2, substrate 1, random arrangement mode is not shown one by one herein, as long as dot matrix is electric
The arrangement mode non-regularity of pole 2 on the base 1, skilled artisans appreciate that.
This lattice electrode and electrode will be placed in the dispersion liquid of nano material, it, can be with by the scanning of drive array
Change the field distribution situation on lattice electrode, charged particle, can be in the dot matrix electricity with electric field under the driving of internal electric field
Pole or to electrode over-assemble.And change the switch state of driving unit, the field distribution situation on adjustable lattice electrode, from
And control the directional assembly of nano material.The advantage of this mode is can to realize to appoint by the switch of control driving lattice electrode
The preparation of meaning nano graph, to realize the self assembly of Digital Control nano material.
It is an object of the invention to overcome in the prior art nano material prepare pattern Single-issue, such as single template is only
A kind of nano material of pattern can be prepared, can not quickly prepare the replaceable nano material of arbitrary graphic pattern, it is difficult to realize nanometer material
Rapid prototyping and manufacture of the totally digitilized pattern preparation of material with micro-nano meter in circuit, the present invention provide a kind of totally digitilized nanometer increasing
Material manufacture system and method, driving circuit by control different pixels working electrode (i.e. different lattice electrodes) switch with
And duration realizes that the electric field controls on pixel operation electrode, manipulation nano-particle solution orient self assembly, realizes that nanometer increases material
Total digitalization preparation.
Further instruction, compared to the prior art, a kind of electrode template can only carry out a kind of pattern in traditional scheme
Nanoassemble preparation, prepares the nano material of other patterns if necessary, only by preparing new electrode template, cannot achieve
The total digitalization preparation of arbitrary graphic pattern replacement.
Electric pulse field parameter on the switching characteristic control pixel operation electrode that the present invention passes through driving unit, such as electric field strength,
Distribution etc., nano material is adsorbed on the pixel operation electrode surface of field distribution.By digitizing programming Control driving unit
The switch of array is realized and is beaten with ink-jet so that a kind of pattern can only be prepared by solving each template electrode in the prior art
Print similar digitized template preparation.
A kind of electrode template can only carry out a kind of nanoassemble preparation of pattern in traditional scheme, prepare it if necessary
The nano material of his pattern have to prepare new electrode template.Our scheme is the battle array described by digitlization programming driving
The switch of column driving unit is to control the field distribution on array electrode, so that nano material is adsorbed on the array of field distribution
On electrode.The switch of drive array can be by digitizing programming Control, to solve each template electric in existing scheme
Pole can only prepare a kind of the problem of pattern, realize the digitized template preparation similar with inkjet printing.
Pass through the following characteristic and function for illustrating that further insight is of the invention.
Please comparative diagram 1, shown in Fig. 4, Fig. 5 and Fig. 9, a kind of totally digitilized nanometer increasing material manufacturing system is also provided in the present embodiment
The working method of system, the working principle of the electrode of pattern changeable referring to background technique as shown in Figure 1, illustrate, wherein the work
It is as follows to make method:
It is programmed by digitlization, voltage signal is converted by driving circuit by preset pattern data and is transferred to work
(the present embodiment working electrode 10 is as shown in Figure 1, preferred working electrode 10 includes substrate 1 and multiple is set in substrate 1 electrode 10
Lattice electrode 2, the quantity of lattice electrode 2 is N*M) lattice electrode 2 driving unit array in, and carry out driving unit
Switch state/duration control;
Power-supply system is connect with lattice electrode 2, forms potential on 2 surface of lattice electrode, and form inside with to electrode 20
Orient electric field;
Working electrode 10 is connect with a pair of electrodes 20 by power-supply system 30 and is placed in nano material dispersion liquid and (adsorbs
Ink 40) in, the charged particle in dispersion liquid is enriched in the working electrode 10 for charging and (obtaining electric) under the driving of internal electric field
On electrode pattern 21 in lattice electrode 2 and form corresponding different pattern;
The multiple electrodes pattern of lattice electrode 2 is scanned by scanning conducting wire 3, and is changed in multiple electrodes pattern 21
Field distribution to formed different pattern electrodes (i.e. control section electrode pattern 21 electric, 21 power loss of partial electrode pattern,
So that obtaining electric electrode pattern 21 continuously and forming certain specific shape), it carries out realization and prepares different nanostructures;
The nanostructure being adsorbed on electrode pattern 21 is transferred in target substrate by nanometer transfer printing system 50, thus
Realize nanometer increasing material manufacturing totally digitilized in particular substrate.
In conclusion the electrode of pattern changeable of the invention is driven by the digitlization programming Control of external control system
Unit, so that the switch of coordination electrode pattern is ultimately formed with forming different field distributions in lattice electrode with different figures
The lattice electrode of case realizes and forms different pattern electrodes on same electrode.
The above is only preferred embodiments of the present invention, are not intended to limit the implementation manners and the protection scope of the present invention, right
For those skilled in the art, it should can appreciate that and all replace with being equal made by description of the invention and diagramatic content
It changes and obviously changes obtained scheme, should all be included within the scope of the present invention.
Claims (10)
1. a kind of total digitalization nanometer increasing material manufacturing system, including electrode, absorption ink, power-supply system, driving unit, nanometer turn
Print system, which is characterized in that electrode includes the working electrode of pattern changeable and to electrode;The working electrode packet of pattern changeable
Include substrate, orderly or multiple lattice electrodes for being disorderly distributed in the substrate, each lattice electrode include an electrode
Pattern and the driving unit connecting with the electrode pattern, the driving unit include the driving connecting with the electrode pattern
Component, the scanning conducting wire connecting with the driving part, the scanning conducting wire are connected to external control system;Absorption ink is to receive
The dispersion solution of rice material;Nanometer transfer printing system includes hot-pressing system, nanostructure can be transferred to target from pattern electrode
In substrate.
2. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that the driving part is crystalline substance
Body pipe or transistor and capacitor form.
3. total digitalization nanometer increasing material manufacturing system according to claim 2, which is characterized in that the driving part is crystalline substance
When body pipe, the number of transistors is one or two.
4. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that the driving part is crystalline substance
Body pipe and capacitor.
5. total digitalization nanometer increasing material manufacturing system according to claim 4, which is characterized in that the driving part is crystalline substance
When body pipe and capacitor, the number of transistors is one, and the capacitor quantity is one;Or the number of transistors is two,
The capacitor quantity is one.
6. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that the electrode pattern and institute
Stating has insulating layer between scanning conducting wire, and the insulating layer coats the driving part.
7. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that the shape of the electrode pattern
Shape is circle, triangle, quadrangle or polygon.
8. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that multiple lattice electrodes
The mode being arranged in the substrate in an orderly manner is that multiple lattice electrodes are lateral, longitudinal or oblique be distributed in uniform sequentially
It orderly include horizontal direction or horizontal high of multiple lattice electrodes on lateral, longitudinal or oblique direction in the substrate
Degree it is consistent and, between lattice electrode described in every two laterally, longitudinal or being equidistant obliquely.
9. total digitalization nanometer increasing material manufacturing system according to claim 1, which is characterized in that multiple lattice electrodes
The mode being disorderly arranged in the substrate be multiple lattice electrodes it is lateral, it is longitudinal or it is oblique be randomly distributed about it is described
In substrate.
10. according to claim 1 in -9 any totally digitilized nanometer increasing material manufacturing system working method, feature exists
In the working method is as follows:
It is programmed by digitlization, voltage signal is converted by driving circuit by preset pattern data and is transferred to working electrode
Driving unit array in, and carry out the switch state of driving unit/duration control;
Power-supply system is connect with lattice electrode, forms potential on lattice electrode surface, and form inner orientation electric field with to electrode;
Working electrode is connect by power-supply system with a pair of electrodes and is placed in nano material dispersion liquid, the electrification in dispersion liquid
On the electrode pattern that particle is enriched in electrification under the driving of internal electric field and form corresponding different pattern;
The multiple electrodes pattern of lattice electrode is scanned by scanning conducting wire, and changes the electric field in multiple electrodes pattern point
Cloth carries out realization and prepares different nanostructures to form different pattern electrodes;
The nanostructure being adsorbed on electrode pattern is transferred in target substrate by nanometer transfer printing system, to realize in spy
Determine nanometer increasing material manufacturing totally digitilized in substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910183257.8A CN109866416B (en) | 2019-03-12 | 2019-03-12 | Full-digital nano additive manufacturing system and working method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910183257.8A CN109866416B (en) | 2019-03-12 | 2019-03-12 | Full-digital nano additive manufacturing system and working method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109866416A true CN109866416A (en) | 2019-06-11 |
CN109866416B CN109866416B (en) | 2021-03-30 |
Family
ID=66920321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910183257.8A Active CN109866416B (en) | 2019-03-12 | 2019-03-12 | Full-digital nano additive manufacturing system and working method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN109866416B (en) |
Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11287831A (en) * | 1998-04-01 | 1999-10-19 | Canon Inc | Method and device for measuring resistance, and device of electronic source and its manufacture |
JP2001052599A (en) * | 1999-08-05 | 2001-02-23 | Hitachi Denshi Ltd | Manufacture and structure of cold cathode array element and cold cathode array image pick-up element |
CN1745334A (en) * | 2003-05-30 | 2006-03-08 | 东芝松下显示技术有限公司 | Array substrate for flat display device |
CN101009186A (en) * | 2006-01-27 | 2007-08-01 | 东元电机股份有限公司 | The method for making the carton nano tube electronic radiation source with the point matrix sequential electrophoresis sediment |
CN101405083A (en) * | 2006-03-21 | 2009-04-08 | 皇家飞利浦电子股份有限公司 | Microelectronic device with field electrodes |
CN101788516A (en) * | 2010-02-22 | 2010-07-28 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for manufacturing alternating current electrophoresis directionally assembled carbon nanotube array sensing device |
JP2011108705A (en) * | 2009-11-13 | 2011-06-02 | Seiko Epson Corp | Processing method of silicon substrate, and method of manufacturing liquid injection head |
CN103145095A (en) * | 2013-03-26 | 2013-06-12 | 吉林大学 | Preparation method of panchromatic structural color or color variation pattern array |
CN104040694A (en) * | 2011-11-08 | 2014-09-10 | 东北大学 | Damascene Template For Directed Assembly And Transfer Of Nanoelements |
CN105600743A (en) * | 2016-01-27 | 2016-05-25 | 东南大学 | 3D (three-dimensional) solid electrode dielectrophoresis nano wire operating and control system |
CN105797792A (en) * | 2016-03-28 | 2016-07-27 | 南京理工大学 | Driving method for low-voltage medium liquid drops on digital microfluidic chip |
CN106033157A (en) * | 2015-03-07 | 2016-10-19 | 上海冠显光电科技有限公司 | A liquid crystal display device |
CN106457846A (en) * | 2014-07-31 | 2017-02-22 | 惠普发展公司,有限责任合伙企业 | Ion writing calibration |
US20170336624A1 (en) * | 2016-05-23 | 2017-11-23 | Seiko Epson Corporation | Electrooptical device, electronic device, and method for manufacturing electrooptical device |
CN108831904A (en) * | 2018-06-22 | 2018-11-16 | 福州大学 | A kind of vertical structure organic thin film transistor array and preparation method thereof |
-
2019
- 2019-03-12 CN CN201910183257.8A patent/CN109866416B/en active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11287831A (en) * | 1998-04-01 | 1999-10-19 | Canon Inc | Method and device for measuring resistance, and device of electronic source and its manufacture |
JP2001052599A (en) * | 1999-08-05 | 2001-02-23 | Hitachi Denshi Ltd | Manufacture and structure of cold cathode array element and cold cathode array image pick-up element |
CN1745334A (en) * | 2003-05-30 | 2006-03-08 | 东芝松下显示技术有限公司 | Array substrate for flat display device |
CN101009186A (en) * | 2006-01-27 | 2007-08-01 | 东元电机股份有限公司 | The method for making the carton nano tube electronic radiation source with the point matrix sequential electrophoresis sediment |
CN101405083A (en) * | 2006-03-21 | 2009-04-08 | 皇家飞利浦电子股份有限公司 | Microelectronic device with field electrodes |
JP2011108705A (en) * | 2009-11-13 | 2011-06-02 | Seiko Epson Corp | Processing method of silicon substrate, and method of manufacturing liquid injection head |
CN101788516A (en) * | 2010-02-22 | 2010-07-28 | 中国科学院苏州纳米技术与纳米仿生研究所 | Method for manufacturing alternating current electrophoresis directionally assembled carbon nanotube array sensing device |
CN104040694A (en) * | 2011-11-08 | 2014-09-10 | 东北大学 | Damascene Template For Directed Assembly And Transfer Of Nanoelements |
CN103145095A (en) * | 2013-03-26 | 2013-06-12 | 吉林大学 | Preparation method of panchromatic structural color or color variation pattern array |
CN106457846A (en) * | 2014-07-31 | 2017-02-22 | 惠普发展公司,有限责任合伙企业 | Ion writing calibration |
CN106033157A (en) * | 2015-03-07 | 2016-10-19 | 上海冠显光电科技有限公司 | A liquid crystal display device |
CN105600743A (en) * | 2016-01-27 | 2016-05-25 | 东南大学 | 3D (three-dimensional) solid electrode dielectrophoresis nano wire operating and control system |
CN105797792A (en) * | 2016-03-28 | 2016-07-27 | 南京理工大学 | Driving method for low-voltage medium liquid drops on digital microfluidic chip |
US20170336624A1 (en) * | 2016-05-23 | 2017-11-23 | Seiko Epson Corporation | Electrooptical device, electronic device, and method for manufacturing electrooptical device |
CN108831904A (en) * | 2018-06-22 | 2018-11-16 | 福州大学 | A kind of vertical structure organic thin film transistor array and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
CN109866416B (en) | 2021-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Cho et al. | Large-area cross-aligned silver nanowire electrodes for flexible, transparent, and force-sensitive mechanochromic touch screens | |
Lou et al. | Programmable three-dimensional advanced materials based on nanostructures as building blocks for flexible sensors | |
Wajahat et al. | Flexible strain sensors fabricated by meniscus-guided printing of carbon nanotube–polymer composites | |
CN106904002B (en) | The extensive inkjet printing methods of three-dimensional metamaterial array | |
KR20090086192A (en) | Display method and device using photonic crystal characteristics | |
KR101519906B1 (en) | Flexible Transparent Electrode and Manufacturing Method Thereof | |
CN103296922A (en) | Nano-piezoelectric generator and method of manufacturing the same | |
CN102076501B (en) | Method for depositing ink on substrate and device therefor | |
CN103199737B (en) | Nanopiezoelectric generator and manufacture method thereof | |
KR102075272B1 (en) | Transparent light emitting device display | |
Zhang et al. | Electro-hydrodynamic direct-writing technology toward patterned ultra-thin fibers: Advances, materials and applications | |
Cai et al. | Mechanisms, influencing factors, and applications of electrohydrodynamic jet printing | |
CN105600743B (en) | 3D (three-dimensional) solid electrode dielectrophoresis nano wire operating and control system | |
Yin et al. | Electrohydrodynamic direct-writing for flexible electronic manufacturing | |
Wang et al. | Fabrication of micro/nano-structures by electrohydrodynamic jet technique | |
Diwakar et al. | AC electrohydrodynamic propulsion and rotation of active particles of engineered shape and asymmetry | |
CN109866416A (en) | Totally digitilized nanometer increasing material manufacturing system and its working method | |
Meng et al. | Micro/nanoscale electrohydrodynamic printing for functional metallic structures | |
EP3433879B1 (en) | Bottom-up method for forming wire structures upon a substrate | |
CN109467046B (en) | The method for composite material of particle three-dimensional micro-nano structureization arrangement based on micro-nano-scale | |
CN113193110B (en) | Activation function generator based on magnetic domain wall driving type magnetic tunnel junction and preparation method | |
KR101154372B1 (en) | Display method and device using photonic crystal characteristics | |
CN203178305U (en) | Construction device of nanometer-sized electrostatic field | |
US11490526B2 (en) | Method of forming a structure upon a substrate | |
KR101580529B1 (en) | Manufacturing Apparatus Method Of Function Nano-Composites Using Electric Field |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |