CN109735799A - A kind of cutting tool surface multi-layer step high temperature wear-resistant coating and preparation method thereof - Google Patents
A kind of cutting tool surface multi-layer step high temperature wear-resistant coating and preparation method thereof Download PDFInfo
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Abstract
The invention belongs to the high-speed cutting modified field of tool surface vacuum coating, it is related to a kind of cutting tool surface multi-layer step high temperature wear-resistant coating and preparation method thereof.The coating by be in turn attached to cutting tool matrix surface with a thickness of the Cr bombardment implant layer of 5~15nm, the Cr transition zone with a thickness of 1~2 μm, the CrN performance bearing bed with a thickness of 2~4 μm and form with a thickness of 5~15 μm of AlCrN hard core layer；The coating is prepared by HIPIMS and DCMS composite codeposition technology.The coating has the advantages that hardness is high and matrix adhesion property is good and high-temperature wearable.
Description
Technical field
The invention belongs to the high-speed cutting modified fields of tool surface vacuum coating, are related to a kind of cutting tool surface multi-layer
Step high temperature wear-resistant coating and preparation method thereof.High-power impulse magnetron sputtering technology is specifically used, its metal targets is utilized
The high feature of ionization level is superimposed appropriate pulsed bias in matrix, prepares multi-layer C r/CrN/ in high-speed cutting tool surface
AlCrN step high temperature wear-resistant coating.
Background technique
Currently, the development of High Speed Cutting Technique is to the hardness of Cr base coating, interface bond strength, wearability, resistance to height
Warm oxidisability proposes more harsh requirement, and single layer Cr base coating is difficult to meet performance requirement, and CrN coating hardness is lower,
Wear-resistant grain wear resistance is weaker, to further increase its performance, using polytechnics addition Al, Ti, Ta, W etc., wherein most generation
Table is Cr-Al-N families of coatings.Face-centred cubic CrN structure cell can be dissolved compared with TiN structure cell more Al (70~
80at.%, Al content highest 66at.% in cube TiAlN phase)；Al and N is increased in coating with Covalent bonding together, thermal stability,
Crystal grain is more uniform tiny, and coating is made to have enough hardness；But service life of the AlCrN coating under high-speed dry type cutting operating condition
It is still to be improved.
High-power impulse magnetron sputtering technology (HIPIMS) is widely noticed in recent years with its high sputtering ionization level；It should
The peak power of item technology can produce density and be up to 10 up to 100 times or more of conventional magnetron sputtering technology18/m3Magnitude etc.
Gas ions, and without large granular impurities such as " molten drops " in the higher deposited particles line of ionization level.Therefore it is controlling
Can get excellent film base binding performance while coating microstructure, improve coating compactness, in terms of have compared with
For significant technical advantage.But for traditional magnetically controlled DC sputtering technology (DCMS), HIPIMS still has apparent lack
Point, deposition velocity is generally relatively low, and discharge stability and controllability are to be improved.
Summary of the invention
In view of this, the purpose of the present invention is to provide a kind of cutting tool surface multi-layer step high temperature wear-resistant coating and its
Preparation method effectively improves service life of such cutter under high-speed dry type cutting operating condition, exists to meet such material
The application of the modified aspect in high speed cutting tool surface.The present invention uses chemical cleaning, plasma clean to increase matrix table first
Face cleanliness enhances matrix surface chemical activity；Then by being superimposed appropriate pulsed negative bias to matrix, matrix surface is formed
Cr bombards implant layer and Cr transition zone, significantly improves the adhesive force between film layer and substrate；Then pass through CrN performance bearing bed
AlCrN hard core layer and matrix mechanics and physical property transition are adjusted, coating adhesion and fatigue behaviour are improved；Pass through
The AlCrN hard kernel layer implementation unification of high rigidity, high tenacity and antioxygenic property, so that the high temperature for improving coating entirety is resistance to
Grind performance.
To achieve the above object, technical scheme is as follows.
A kind of cutting tool surface multi-layer high-temperature wear resistant coating, the coating is by being in turn attached to cutting tool matrix surface
Cr bombardment implant layer, Cr transition zone, CrN performance bearing bed and AlCrN hard core layer composition；Wherein, Cr bombards implant layer
With a thickness of 5nm~15nm, Cr transition zone with a thickness of 1 μm~2 μm, CrN performance bearing bed with a thickness of 2 μm~4 μm, ingredient
Are as follows: the atomic percent of Cr is that the atomic percent of 45%~55%, N is the thickness of 45%~55%, AlCrN hard core layer
It is 5 μm~15 μm, ingredient are as follows: the atomic percent that the atomic percent of Al is 20%~30%, Cr is 15%~25%, N's
Atomic percent is 50%~55%.
A kind of preparation method of cutting tool surface multi-layer high-temperature wear resistant coating, using compound high-power impulse magnetron sputtering
Technology prepares Cr/CrN/AlCrN high-temperature wear resistant coating on high-speed cutting cutter material surface, the method comprises the following steps:
(1) chemistry cleans matrix: cutting tool matrix first dips in petroleum ether with cotton swab and cleans sample surfaces to be plated, removes surface
Apparent grease and dust particles；
(2) 25 respectively successively chemical cleaning matrix: are carried out to cutter for cutting matrix using petroleum ether, acetone and dehydrated alcohol
~30min ultrasonic cleaning, deoils to workpiece surface and cleaning treatment, and clean cutting tool matrix is obtained；
(3) it heats and vacuumizes: clean cutting tool matrix is mounted on high-power impulse magnetron sputtering equipment plated film
On the work rest of vacuum chamber, guarantee that plated film vacuum room temperature adds when film deposits in certain temperature and vacuum range
For heat to 150 DEG C~200 DEG C, vacuum degree is less than or equal to 2 × 10-3Pa；
(4) ion beam cleaning matrix: being passed through Ar gas in plated film vacuum chamber, until vacuum degree is 1.5 × 10-2Pa~5.0 × 10-2Pa is superimposed the pulsed bias of 150V~200V on matrix, opens ion source, and the operating voltage of ion source is 800V~1000V,
Matrix surface is cleaned with ion beam, the time is 15min~30min；
(5) deposition Cr bombard implant layer: plated film vacuum chamber is passed through Ar gas, by vacuum degree control 0.3Pa~0.9Pa it
Between, it is superimposed the pulsed bias of 800V~1000V on matrix, opens Cr high-power impulse magnetron sputtering source (Cr target), adjusts Cr high
The power of Power Impulse Magnetron sputtering source be 2kW~4kW, matrix surface deposition Cr bombard implant layer, sedimentation time 15min~
30min；
(6) deposit Cr transition zone: plated film vacuum chamber is passed through Ar gas, by vacuum degree control between 0.3Pa~0.9Pa, base
It is superimposed the pulsed bias of 150V~250V on body, opens Cr high-power impulse magnetron sputtering source (Cr target), adjusts Cr high power arteries and veins
The power for rushing controlled sputtering source is 4kW~6kW, the deposition Cr transition zone on Cr bombardment implant layer, sedimentation time 50min~
90min；
(7) deposit CrN performance bearing bed: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput be 250sccm~
350sccm, N2Throughput is 250sccm~350sccm, and vacuum degree control is superimposed 50V between 0.3Pa~0.9Pa on matrix
The pulsed bias of~100V is opened Cr high-power impulse magnetron sputtering source (Cr target), and Cr high-power impulse magnetron sputtering source is adjusted
Power be 4kW~6kW, on Cr transition zone deposit CrN performance bearing bed, sedimentation time be 2h~4h；
(8) depositing Al CrN hard core layer: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput be 250sccm~
350sccm, N2Throughput is 200sccm~350sccm, by vacuum degree in vacuum chamber control between 0.3Pa~0.9Pa, matrix
The pulsed bias of upper superposition 50V~100V, is opened AlCr high-power impulse magnetron sputtering source (AlCr target), wherein Al atom hundred
Score is that 60%, Cr atomic percentage is 40%, and the power for adjusting AlCr high-power impulse magnetron sputtering source is 8kW~10kW,
Al target magnetic control sputtering source is opened, adjusting Al target magnetic control sputtering source power is 2kW~4kW, is deposited on CrN performance bearing bed
AlCrN hard core layer, sedimentation time 6h~12h obtain a kind of multi-layer high-temperature wear-resistant coating on cutting tool matrix.
The utility model has the advantages that
The present invention uses HIPIMS/DCMS composite codeposition technology prepares coating, and the target sputtered by direct current target is former
Son carries out " charge-exchange " with the high ionization level ion beam current that HIPIMS is generated, and then increases depositing ions beam current density, improves
Coating deposition rate.Composite deposition technology can guarantee that the plasma that maintenance one is weaker in entire sputtering process exists, i.e.,
It discharges high power pulse and generates the effect of a pre- ionization, so that pulsed discharge is on the basis of certain, thus significantly
Reduce starting voltage.In addition, being added with for compound direct current is conducive to eliminate target discharge delay, reduces " beating arc phenomenon ", increase and discharge
Stability.
It is hard using HIPIMS/DCMS composite codeposition technology preparation high-performance Cr/CrN/AlCrN multi-gradient high-temperature wearable
Matter coating has hardness high relative to the single layer AlCrN coating using traditional technology preparation, and matrix adhesion property is good, coating
The smooth densification in surface, coefficient of friction and the small advantage of cutting force.The design of coating multi-gradientization can be effectively between buffer coat
Internal stress and improve the binding force of coating and matrix, not only maintain nitride coatings high rigidity, low friction, strong abrasion is anti-
Power also reduces brittleness, guarantees surface mechanical properties.In addition, the advantages of sputter material ionization level high using HIPIMS technology,
Under the effect of higher substrate bias, Cr ion is made to be injected into intrinsic silicon with high energy bombardment state, about 5 are formed in matrix surface~
The Cr of 15nm bombards implant layer, and the nearly interface zone Cr concentration of element of the layer it is reachable~40%, so high concentration will make to apply
Layer realizes local epitaxial growth on matrix, to greatly improve the film base binding performance of coating.In addition, using composite magnetic controlled
Sputtering technology is deposited by Al target, will significantly improve the content of Al element in core hard layer, to effectively overcome due to sputtering
The case where yield and reverse sputtering effect cause Al constituent content to reduce, further improve the high temperature oxidation resistance of coating.Deposition
Having the high-speed dry type cutting cutter of the type Cr/CrN/AlCrN multi-gradient high-temperature wear resistant coating has very excellent cutting
Service life.It is more than the hardness of 30GPa that experiment test, which shows that the type Cr/CrN/AlCrN multi-gradient high-temperature wear resistant coating has,
The Tool in Cutting service life for being deposited with the type coating is about 2 times of conventional arc and sputter coating cutter.It is made using the present invention
Cutter for cutting, mechanical wear resistance can and high temperature oxidation resistance be improved largely, can satisfy High-speed machining
Demand to the more preferable performance of cutter material has huge market potential and use value.
Detailed description of the invention
Fig. 1 is cutting tool surface multi-layer step high temperature wear-resistant coating schematic diagram of the present invention.
Fig. 2 is X-ray diffraction (XRD) figure for the coating that embodiment 1 is prepared；
Fig. 3 is the hardness profile for the coating that embodiment 1 is prepared；
Fig. 4 is that coating hardness is prepared with annealing temperature trend chart in embodiment 1；
Fig. 5 is X-ray diffraction (XRD) figure for the coating that embodiment 2 is prepared；
Fig. 6 is the hardness profile for the coating that embodiment 2 is prepared；
Fig. 7 is that coating hardness is prepared with annealing temperature trend chart in embodiment 2.
Specific embodiment
The present invention will be further described in detail below with reference to specific embodiments.
In following embodiment:
(1) it is realized using high-power impulse magnetron sputtering filming equipment, the raw material used mainly have purity for 99.99%
High-purity Cr target, AlCr target, the Al and atomic percent of Cr is 60:40, high-purity Al target that purity is 99.99%, purity are
99.99% high-purity Ar gas, the high-purity N that purity is 99.99%2Gas.
(2) X-ray diffraction (XRD) is tested: mutually being analyzed using object of the electronic diffraction principle to material, is used herein
Philips Panalytical X ' pert type turns target X-ray diffractometer and carries out material phase analysis to prepared AlCrN coating, enters
Penetrating X-ray is CuKu ray, grazing angle: wavelength 0.15nm 1 °, scanning step: 0.03 °, scanning speed: 6.0 °/min, is swept
Retouch range: 20 °~90 °.
(3) scanning electron microscope (SEM) is tested: using HitachiS-3400N type scanning electron microscope, characterization is put
Big multiple is 30000 times, is characterized to the thickness of coating.
(4) energy dispersive spectrum (EDS) is tested: being characterized using constituent of the KEVEX energy dispersive spectrometry to coating.
(5) use nano-hardness tester to test the hardness of coating: nano hardness uses radius for 2 μm
Berkovich type diamond penetrator, is tested using maximum load control mode, maximum load 20mN, applies load speed
Rate is 20mN/min.
(6) use the binding performance between micron scratching instrument testing coating and matrix: instrument uses radius for 200 μm
Rockell diamond penetrator, application load range are 1.0~150.0N, and application rate of loading is 100.0N/min.
(7) Mechanics Performance Testing is carried out to the sample after annealing using nanohardness tester: is set using high vacuum annealing
Standby vacuum annealing process coating carried out under different temperatures.Annealing conditions are as follows: Chamber vacuum degree≤10-2Pa；Heating rate
For 5 DEG C/min；1h is kept the temperature respectively at 600 DEG C, 800 DEG C, 1000 DEG C；Natural cooling cooling.
Embodiment 1
A kind of preparation method of cutting tool surface multi-layer high-temperature wear resistant coating, the method comprises the following steps:
(1) chemistry clean matrix 1: by the high speed cutting tool matrix 1 being ready for first with cotton swab dip in petroleum ether clean to
Plate sample surfaces, the apparent grease in removal surface and dust particles；
(2) chemical cleaning matrix 1: be respectively adopted petroleum ether, acetone, dehydrated alcohol to high speed cutting tool matrix 1 respectively into
Row 30min ultrasonic cleaning；
(3) it heats and vacuumizes: clean cutting tool matrix 1 is mounted on high-power impulse magnetron sputtering equipment plated film
On the work rest of vacuum chamber, heating temperature is set as 200 DEG C, and vacuum degree is less than or equal to 2 × 10-3Pa。
(4) ion beam cleaning matrix 1: being passed through Ar gas in plated film vacuum chamber, until vacuum degree is 1.5 × 10-2Pa~5.0 ×
10-2Pa is superimposed the pulsed bias of 200V on matrix 1, opens ion source, the operating voltage of ion source is 800V, with ion beam pair
1 surface of matrix is cleaned, time 30min；
(5) deposition Cr bombards implant layer 2: plated film vacuum chamber is passed through Ar gas, adjusts Ar throughput, vacuum degree control is existed
0.3Pa is superimposed the pulsed bias of 800V on matrix 1, opens Cr high-power impulse magnetron sputtering source (Cr target), adjusts Cr high power
The power in pulsed magnetron sputtering source is 4kW, and on 1 surface of matrix, deposition Cr bombards implant layer 2, sedimentation time 15min；
(5) it deposits Cr transition zone 3: being passed through Ar gas into vacuum chamber, adjust Ar throughput, be by vacuum degree in vacuum chamber control
0.3Pa, matrix 1 are superimposed the pulsed bias of 200V, open Cr high-power impulse magnetron sputtering source, adjust Cr high power pulse magnetic control
The operating power of sputtering source is 4kW, carries out the deposition of Cr transition zone 2, sedimentation time 50min.
(7) deposit CrN performance bearing bed 4: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput are 250sccm, N2Gas
Flow is 250sccm, and vacuum degree control is superimposed the pulsed bias of 100V on 0.3Pa, matrix 1, opens Cr high power pulse magnetic
It controls sputtering source (Cr target), the power for adjusting Cr high-power impulse magnetron sputtering source is 6kW, and CrN is deposited on Cr transition zone 3
Energy bearing bed 4, sedimentation time 120min；
(8) depositing Al CrN hard core layer 5: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput are 250sccm, N2
Throughput is 200sccm, and vacuum degree in vacuum chamber control is superimposed to the pulsed bias of 100V on 0.3Pa, matrix 1, opens AlCr
High-power impulse magnetron sputtering source (AlCr target), the power for adjusting AlCr high-power impulse magnetron sputtering source is 10kW, opens Al
Controlled sputtering source, the power for adjusting Al target magnetic control sputtering source is 2kW, the depositing Al CrN hard core on CrN performance bearing bed 4
Central layer 5, sedimentation time 360min obtain a kind of multi-layer high-temperature wear-resistant coating on cutting tool matrix 1.
XRD test result: as shown in Fig. 2, the coating center heart hard layer shows typical nitride hard coating face
Heart cubic structure is related to (111) (200) (220) and (311) 4 crystallographic plane diffraction peaks, since aluminium content is relatively fewer, with displacement
The form of solid solution is present in lattice, consistent with the lattice parameter of CrN, so can't detect Al phase in XRD.
SEM test result: the coating bombards implant layer, Cr transition by the Cr for being in turn attached to cutting tool matrix surface
Layer, CrN performance bearing bed and AlCrN hard core layer composition；Wherein, Cr bombard implant layer with a thickness of 10nm, Cr transition zone
With a thickness of 1.0 μm, CrN performance bearing bed with a thickness of 2 μm, AlCrN hard core layer with a thickness of 5.6 μm.
EDS test result: CrN performance carries composition of layer are as follows: the atomic percent of Cr is 46.73at%, the atomic percent of N
Than for 53.27at%, AlCrN hard core composition of layer are as follows: the atomic percent of Al is 23.04at%, the atomic percent of Cr
For 20.57at%, the atomic percent of N is 56.39at%.
The hardness test result of coating: as shown in figure 3, showing the coating hardness up to 36.8GPa.
Binding performance result between coating and matrix: the critical load for showing the coating scratch test is 51.4N.
Sample after annealing carries out mechanical experimental results: as shown in figure 4, show after high annealing is tested,
The coating mechanical property is declined, but the hardness of 27.6GPa can be still kept at 800 DEG C, and mechanical behavior under high temperature is more excellent
It is different.
Embodiment 2
A kind of preparation method of cutting tool surface multi-layer high-temperature wear resistant coating, the method comprises the following steps:
(1) chemistry clean matrix 1: by the high speed cutting tool matrix 1 being ready for first with cotton swab dip in petroleum ether clean to
Plate sample surfaces, the apparent grease in removal surface and dust particles；
(2) chemical cleaning matrix 1: be respectively adopted petroleum ether, acetone, dehydrated alcohol to high speed cutting tool matrix 1 respectively into
Row 30min ultrasonic cleaning；
(3) it heats and vacuumizes: clean cutting tool matrix 1 is mounted on high-power impulse magnetron sputtering equipment plated film
On the work rest of vacuum chamber, heating temperature is set as 200 DEG C, and vacuum degree is less than or equal to 2 × 10-3Pa。
(4) ion beam cleaning matrix 1: being passed through Ar gas, keeps vacustat 1.5 × 10-2Pa~5.0 × 10-2Pa it
Between, ion source cleaning sample surface is opened, the operating voltage of ion source is 800V, and matrix 1 is superimposed 200V pulsed bias, plasma
The body cleaning time is 30min；
(5) deposition Cr bombards implant layer 2: plated film vacuum chamber is passed through Ar gas, adjusts Ar throughput, vacuum degree control is existed
0.9Pa is superimposed the pulsed bias of 1000V on matrix 1, opens Cr high-power impulse magnetron sputtering source (Cr target), adjusts Cr Gao Gong
The power in rate pulsed magnetron sputtering source is 6kW, and on 1 surface of matrix, deposition Cr bombards implant layer 2, sedimentation time 30min；
(6) deposit Cr transition zone 3: plated film vacuum chamber is passed through Ar gas, adjusts Ar throughput, by vacuum degree control in 0.9Pa,
It is superimposed the pulsed bias of 150V on matrix 1, opens Cr high-power impulse magnetron sputtering source (Cr target), adjusts Cr high power pulse magnetic
The power for controlling sputtering source is 6kW, deposits Cr transition zone 3, sedimentation time 90min on Cr bombardment implant layer 2；
(7) deposit CrN performance bearing bed 4: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput are 350sccm, N2Gas
Flow is 350sccm, and vacuum degree control is superimposed the pulsed bias of 150V on 0.9Pa, matrix 1, opens Cr high power pulse magnetic
It controls sputtering source (Cr target), the power for adjusting Cr high-power impulse magnetron sputtering source is 6kW, and CrN is deposited on Cr transition zone 3
Energy bearing bed 4, sedimentation time 240min；
(8) depositing Al CrN hard core layer 5: plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput are 350sccm, N2
Throughput is 350sccm, and vacuum degree in vacuum chamber control is superimposed to the pulsed bias of 100V on 0.3Pa, matrix 1, opens AlCr
High-power impulse magnetron sputtering source (AlCr target), the power for adjusting AlCr high-power impulse magnetron sputtering source is 10kW, opens Al
Target magnetic control sputtering source, the power for adjusting Al target magnetic control sputtering source is 4kW, the depositing Al CrN hard on CrN performance bearing bed 4
Core layer 5, sedimentation time 720min obtain a kind of multi-layer high-temperature wear-resistant coating on cutting tool matrix 1.
XRD test result: as shown in figure 5, the core hard layer shows typical nitride hard coating face-centered cubic
Structure is related to (111) (200) and (220) 3 crystallographic plane diffraction peaks；Due to the apparent increase of Al constituent content in coating, can see
Out, occur six side's aluminium nitride phases in coating heterogeneous microstructure, be related to (100) and (110) two crystallographic plane diffraction peaks.
SEM test result: the coating bombards implant layer, Cr transition by the Cr for being in turn attached to cutting tool matrix surface
Layer, CrN performance bearing bed and AlCrN hard core layer composition；Wherein, Cr bombard implant layer with a thickness of 15nm, Cr transition zone
With a thickness of 1.5 μm, CrN performance bearing bed with a thickness of 3.8 μm, AlCrN hard core layer with a thickness of 10.82 μm.
EDS test result: CrN performance carries composition of layer are as follows: the atomic percent of Cr is 48.26at%, the atomic percent of N
Than for 51.74at%, AlCrN hard core composition of layer are as follows: the atomic percent of Al is 30.35at%, the atomic percent of Cr
For 19.23at%, the atomic percent of N is 50.42at%.
The hardness test result of coating: as shown in fig. 6, showing the coating hardness up to 34.6GPa.
Binding performance result between coating and matrix: the critical load for showing the coating scratch test is 61.4N.
Sample after annealing carries out mechanical experimental results: as shown in fig. 7, show after high annealing is tested,
Coating mechanical property is declined, but the hardness of 28.8GPa can be still kept at 800 DEG C, and the raising of Al constituent content can be effective
Improve the mechanical behavior under high temperature of coating.
In conclusion invention includes but is not limited to above embodiments, it is all to be carried out under the spirit and principles in the present invention
Any equivalent replacement or local improvement, all will be regarded as within protection scope of the present invention.
Claims (2)
1. a kind of cutting tool surface multi-layer high-temperature wear resistant coating, it is characterised in that: the coating is by being in turn attached to bite
Have Cr bombardment implant layer (2), Cr transition zone (3), CrN performance bearing bed (4) and the AlCrN hard core layer on matrix (1) surface
(5) it forms；Wherein, Cr bombard implant layer (2) with a thickness of 5nm~15nm, Cr transition zone (3) with a thickness of 1 μm~2 μm, CrN
Performance bearing bed (4) with a thickness of 2 μm~4 μm, ingredient are as follows: the atomic percent of Cr is the atomic percent of 45%~55%, N
It is 45%~55%, AlCrN hard core layer (5) with a thickness of 5 μm~15 μm, ingredient are as follows: the atomic percent of Al is 20%
The atomic percent that the atomic percent of~30%, Cr are 15%~25%, N is 50%~55%.
2. a kind of preparation method of cutting tool surface multi-layer high-temperature wear resistant coating as described in claim 1, it is characterised in that:
The method comprises the following steps:
(1) it heats and vacuumizes: clean cutting tool matrix (1) is mounted on high-power impulse magnetron sputtering equipment plated film
On the work rest of vacuum chamber, plated film vacuum room temperature is heated to 150 DEG C~200 DEG C, and vacuum degree is less than or equal to 2 × 10-3Pa；
(2) ion beam cleaning matrix (1): being passed through Ar gas in plated film vacuum chamber, until vacuum degree is 1.5 × 10-2Pa~5.0 × 10- 2Pa is superimposed the pulsed bias of 150V~200V on matrix (1), opens ion source, the operating voltage of ion source be 800V~
1000V cleans matrix (1) surface with ion beam, and the time is 15min~30min；
(3) deposition Cr bombardment implant layer (2): plated film vacuum chamber is passed through Ar gas, by vacuum degree control 0.3Pa~0.9Pa it
Between, it is superimposed the pulsed bias of 800V~1000V on matrix (1), opens Cr high-power impulse magnetron sputtering source, adjusts Cr high power
The power in pulsed magnetron sputtering source is 2kW~4kW, in matrix (1) surface deposition Cr bombardment implant layer (2), sedimentation time 15min
~30min；
(4) deposit Cr transition zone (3): plated film vacuum chamber is passed through Ar gas, by vacuum degree control between 0.3Pa~0.9Pa, base
It is superimposed the pulsed bias of 150V~250V on body (1), opens Cr high-power impulse magnetron sputtering source, adjusts Cr high power pulse magnetic
The power for controlling sputtering source is 4kW~6kW, deposits Cr transition zone (3) in Cr bombardment implant layer (2), sedimentation time 50min~
90min；
(5) deposit CrN performance bearing bed (4): plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput be 250sccm~
350sccm, N2Throughput is 250sccm~350sccm, and between 0.3Pa~0.9Pa, matrix is superimposed vacuum degree control on (1)
The pulsed bias of 50V~100V opens Cr high-power impulse magnetron sputtering source, adjusts the function in Cr high-power impulse magnetron sputtering source
Rate is 4kW~6kW, deposits CrN performance bearing bed (4) on Cr transition zone (3), and sedimentation time is 2h~4h；
(6) depositing Al CrN hard core layer (5): plated film vacuum chamber is passed through Ar gas and N2Gas, Ar throughput be 250sccm~
350sccm, N2Throughput is 200sccm~350sccm, by vacuum degree in vacuum chamber control between 0.3Pa~0.9Pa, matrix
(1) it is superimposed the pulsed bias of 50V~100V on, opens AlCr high-power impulse magnetron sputtering source, wherein Al atomic percentage is
60%, Cr atomic percentage are 40%, and the power for adjusting AlCr high-power impulse magnetron sputtering source is 8kW~10kW, open Al
Target magnetic control sputtering source, adjusting Al target magnetic control sputtering source power are 2kW~4kW, and depositing Al CrN is hard on CrN performance bearing bed (4)
Matter core layer (5), 6~12h of sedimentation time obtain a kind of multi-gradient high-temperature wear resistant coating on cutting tool matrix (1).
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111041430A (en) * | 2020-01-10 | 2020-04-21 | 安徽纯源镀膜科技有限公司 | Production process of high-temperature-resistant diamond-like carbon film layer |
| CN111101104A (en) * | 2020-01-10 | 2020-05-05 | 安徽纯源镀膜科技有限公司 | Method for metalizing surface of insulating material |
| CN113652638A (en) * | 2021-08-17 | 2021-11-16 | 科汇纳米技术（常州）有限公司 | Ultrahigh hard tool coating and preparation method thereof |
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