CN108977864A - A kind of process improving etching machine bench top electrode service life - Google Patents
A kind of process improving etching machine bench top electrode service life Download PDFInfo
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- CN108977864A CN108977864A CN201810841354.7A CN201810841354A CN108977864A CN 108977864 A CN108977864 A CN 108977864A CN 201810841354 A CN201810841354 A CN 201810841354A CN 108977864 A CN108977864 A CN 108977864A
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
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Abstract
The invention discloses a kind of processes for improving etching machine bench top electrode service life, include the following steps: the sandblasting roughening treatment later Step 1: to sandblasting space out is covered around the stomata of top electrode；Step 2: removal veil and sand material impurity；Step 3: to upper electrode surface anodic oxidation to form anode oxide film；Step 4: spray space out to covering around the stomata of top electrode, spraying ceramic coat later；Step 5: removal veil impurity, is dried later.The present invention can effectively improve top electrode service life, and corrosion resistance is more excellent.
Description
Technical field
The invention belongs to the anti-lithographic technique field of electrode, and in particular to a kind of to improve etching machine bench top electrode service life
Process.
Background technique
Dry etching board is the key equipment in liquid crystal display panel preparation process, and top electrode is the critical component in dry etching board,
Upper electrode surface is uniformly covered with stomata (0.5~1mm), as shown in Figure 1.When etching machine bench works, plasma etching gas passes through
Stomata enters etching cavity, and upper electrode surface stomata realizes that plasma etching gas is uniformly distributed and adjusts, in top electrode under
Apply voltage between electrode, form high voltage electric field between upper/lower electrode, plasma etching gas bombards under high voltage electric field effect
It removes substrate and carries out dry etching.Plasma etching gas, also can the generation of top electrode working face while etching glass substrate
Etching, especially into the stomata of plasma gas.
Top electrode is aluminium material at present, and top electrode anti-plasma corrosive nature is improved using the mode of anodic oxidation.
With the development of liquid crystal display panel industry, requirements at the higher level are proposed to etching cavity runing time (life time), in addition high generation
Plasma etching atmosphere is more severe in (G8.5, G10.5) etching cavity, and etching power is also higher and higher, at top electrode stomata
Etching is serious, leads to occur particle and paradoxical discharge phenomenon at stomata, seriously affects equipment capacity and glass substrate yield.
Existing anode oxidation process is no longer satisfied requirement, it is necessary to provide effective solution to the above problem.
Summary of the invention
The present invention provides a kind of process for improving etching machine bench top electrode service life, it is therefore an objective to effectively improve and power on
Pole service life.
To achieve the goals above, the technical scheme adopted by the invention is as follows:
A kind of process improving etching machine bench top electrode service life, includes the following steps:
Step 1: to sandblasting space out is covered around the stomata of top electrode, sandblasting roughening treatment later；
Step 2: removal veil and sand material impurity；
Step 3: to upper electrode surface anodic oxidation to form anode oxide film；
Step 4: spray space out to covering around the stomata of top electrode, spraying ceramic coat later；
Step 5: removal veil impurity, is dried later.
The method that sandblasting space out is covered in the step 1 is that sandblasting protection jig is arranged in 5 around top electrode stomata
At~12mm, so as to which sandblasting roughening treatment is carried out around stomata in the space of 5~12mm；By heatproof double-sided adhesive by sandblasting protection
Jig is adhered in upper electrode surface.
The blasting pressure of the sandblasting roughening treatment is 0.2~0.5Mpa, sandblasting 300~600mm of distance, sandblasting posterior spiracle
Periphery rough degree reaches 3~6 μm of Ra.Sandblasting is micron order, around stomata when blasting treatment, will not be blocked inside stomata.
The method of the step 2 removal veil and sand material impurity is first to dip in acetone removal top electrode table using non-dust cloth
The residue glue in face, then high-pressure washing removal residual sand material, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, pressure
Power is 50~100bar, is finally dried up using compressed air, and dry 2~4h under the conditions of 60~80 DEG C of temperature.
The step 3 Anodic Oxidation film thickness is 5~60 μm, film thickness and top electrode table at the blasting treatment of stomata periphery
The anode film thickness of face other positions is suitable, and the anode film roughness at the blasting treatment of stomata periphery reaches Ra2~4 μm.
The method that spraying space out is covered in the step 4 is that sprayed protection jig is arranged in 5 around top electrode stomata
At~12mm, so as to which spray treatment is carried out around stomata in the space of 5~12mm；By heatproof double-sided adhesive by sprayed protection jig
It is adhered in upper electrode surface.
Ceramic coated layer is to first pass through plasma spray priming operation ceramic layer in the step 4, passes through suspension etc. again later
Plasma spray top layer ceramic layer.
The ceramic powders that the plasma spray priming operation ceramic layer uses are YAG, Y2O3、YF3With one of YOF or more
Kind mixed-powder, granularity are 10~60 μm, spraying parameter are as follows: main gas Ar flow 30~50L/min, secondary gas H2Flow 4~
10L/min, 58~62V of voltage, 500~600A of electric current, 10~20g/min of powder sending quantity, 100~150mm of spray distance, spraying 5
~10 back and forth, and every spraying 1~2 purges stomata 2~4 from the vertical upper electrode surface in back using nitrogen or compressed air back and forth
Time, stomata inner wall residual powder is removed, gas pressure is 0.5~0.8MPa, and 30~80 μm of bottom ceramic layer thickness, coating is coarse
Degree is Ra4~8 μm, coating porosity 3%~6%.
The suspending liquid plasma spraying top layer ceramic layer use three cathode spray guns, the slurry used include solid powder,
Deionized water and ethyl alcohol, wherein the mass fraction of solid powder is 5%~30%, and the volume ratio of water and ethyl alcohol is 1:1, solid powder
Last granularity is 200-900nm, solid powder material YAG, Y2O3、YF3With one of YOF or a variety of mixing；Spraying process ginseng
Number are as follows: main gas Ar flow 50~80L/min, secondary gas H2 8~15L/min of flow, 70~90V of voltage, 450~550A of electric current, slurry
15~50ml/min of doses, 60~100mm of spray distance, back and forth, every spraying 1~2 uses nitrogen back and forth for spraying 20~40
Or compressed air purges stomata 2~4 times from the vertical upper electrode surface in back, removes stomata inner wall residual powder, gas pressure 0.5
~0.8MPa, top layer ceramic layer thickness are 40~80 μm, and coating roughness is 0.8~1.5 μm of Ra, and coating porosity is lower than
1.5%.
The method of the step 5 removal masking impurity is that the residue glue of acetone removal upper electrode surface is dipped in using non-dust cloth, so
High-pressure washing afterwards, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, and pressure is 50~100bar, water jets under high pressure
The cleaning of face stomata, is finally dried up using compressed air, and dry 1~2h under the conditions of 60~80 DEG C of temperature.
Beneficial effects of the present invention:
1, compared with anode oxide film, YAG (yttrium-aluminium-garnet), Y2O3(yttria), YF3(yttrium fluoride), YOF (fluorine
Yttrium oxide) material is with excellent resistant to plasma etching gas corrosive nature, using plasma spray coating process in anode oxide film
Upper preparation YAG, Y2O3、YF3, YOF coating, top electrode service life can be effectively improved, plasma spraying coating is finer and close,
Corrosion resistance is more excellent.
2, the coating porosity high (3%~6%) of conventional plasma spraying process preparation, compactness are poor, but preparation cost
It is lower；The coating porosity of suspending liquid plasma spraying preparation low (being lower than 1.5%), compactness are high, resistant to plasma etching gas
Corrosive nature is more excellent, but preparation cost is higher.The present invention combines two kinds of spraying process advantages, is sprayed using conventional plasma
Technique prepares bottom ceramic layer, prepares top layer ceramic layer using suspending liquid plasma spraying, while reducing cost, and can be into one
Step improves service life, and life time is 2~4 times of anode oxidation process.
3, the present invention solves that anode oxidation surface roughness is low, and the coating of plasma spray coating process preparation, which can not adhere to, asks
Topic.Before anodic oxidation, to blasting treatment is carried out in stomata periphery (5~12mm) range, roughness reaches Ra3~6 μm, then again
Anodized is carried out, can guarantee that anodic oxidation posterior spiracle periphery rough degree reaches 2~4 μm in this way, be conducive to subsequent etc.
The adherency of plasma spray coating, while anodic oxidation film thickness is suitable with other positions around stomata, does not influence its insulation performance.
4, the present invention provides effective sandblastings and spraying shielding scheme, just for more perishable stomata periphery diameter 5
Improved within the scope of~12mm, is effectively controlled production cost.
Detailed description of the invention
This specification includes the following drawings, and shown content is respectively:
Fig. 1 is the structural schematic diagram of the equal qi-emitting hole of upper electrode surface；
Fig. 2 is top electrode sandblasting masking structure schematic diagram；
Fig. 3 is top electrode spraying shielding structural schematic diagram；
Fig. 4 is the anti-etching structure schematic diagram of upper electrode surface.
In the figure, it is marked as
1, top electrode, 2, sandblasting protection jig, 3, heatproof double-sided adhesive, 4, sprayed protection jig, 5, anode oxide film, 6, bottom
Layer ceramic layer, 7, top layer ceramic layer.
Specific embodiment
Below against attached drawing, by the description of the embodiment, making to a specific embodiment of the invention further details of
Explanation, it is therefore an objective to those skilled in the art be helped to have more complete, accurate and deep reason to design of the invention, technical solution
Solution, and facilitate its implementation.
A kind of process improving etching machine bench top electrode service life, includes the following steps:
Step 1: to sandblasting space out is covered around the stomata of top electrode, sandblasting roughening treatment later；Wherein, top electrode
Degreasing and burnishing part are carried out to top electrode first for the ease of carrying out better subsequent processing to top electrode for aluminium material component
Reason, sandblasting roughening treatment can carry out blasting treatment in upper electrode surface, it is contemplated that production cost problem uses above-mentioned spray
Masking scheme before sand, the method for covering sandblasting space out are only arranged in sandblasting protection jig 25 around 1 stomata of top electrode
At~12mm, so as to sandblasting roughening treatment is carried out around stomata in the space of 5~12mm, sandblasting protection jig with a thickness of 2~
5mm, material are Al or SUS, 5~12mm of jig aperture.To prevent sandblasting protection jig in sandblasting procedures by sand material or pressure
Contracting air effect and upper electrode surface generate sliding, and sandblasting range mistake and upper electrode surface is caused to scratch, double by heatproof
Sandblasting protection jig 2 is adhered on 1 surface of top electrode by face glue 3.Sandblasting: white fused alumina sand material, 60~100# of mesh number, sandblasting are used
0.2~0.5Mpa of pressure, sandblasting 300~600mm of distance, sandblasting posterior spiracle periphery rough degree reach 3~6 μm of Ra.Sandblasting is micro-
Meter level around stomata when blasting treatment, will not block inside stomata.It is coarse in upper electrode surface formation waveform after sandblasting
Face is conducive to the adherency of subsequent plasma spraying coating.
Step 2: removal veil and sand material impurity, it is therefore an objective to remove upper electrode surface masking, specifically first use
Non-dust cloth dips in acetone removal surface residue glue that may be present, and then using high-pressure washing removal residual sand material, high-pressure washing is used
Deionized water resistivity be greater than 4M Ω * cm, pressure be 50~100bar, finally dried up using compressed air, and 60~80
Dry 2~4h under the conditions of DEG C temperature.
Step 3: to upper electrode surface anodic oxidation to form anode oxide film 5: using conventional anodization technique, sun
25~60 μm of pole film thickness, the film thickness at the blasting treatment of stomata periphery is suitable with upper electrode surface other positions anode film thickness, stomata
Anode film roughness at periphery (5~12mm) blasting treatment reaches 2~4 μm, is conducive to the viscous of subsequent plasma spraying coating
It is attached.
Step 4: spray space out to covering around the stomata of top electrode, spraying ceramic coat later；In spraying shielding
Before, in order to guarantee coating quality and performance, be first cleaned and dried: using scouring pad grinding process, then high-pressure washing is removed
Surface p article, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, and pressure is 50~100bar, finally make
It is dried up with compressed air, and dry 8~12h under the conditions of 60~80 DEG C of temperature.Masking scheme is before spraying: sprayed protection is controlled
Tool 4 is arranged in around top electrode stomata at 5~12mm, so as to spray treatment is carried out around stomata in the space of 5~12mm, spraying
1~4mm of jig thickness is protected, material is Al or SUS, sprayed protection jig 5~12mm of aperture.To prevent jig in spraying process
In by spraying gas shock effect and upper electrode surface generated sliding, cause spray range mistake and upper electrode surface to draw
Sprayed protection jig, is adhered in upper electrode surface by wound by heatproof double-sided adhesive.In order to further increase service life, spray
Ceramic layer is to first pass through plasma spray priming operation ceramic layer 6, passes through suspending liquid plasma spraying top layer ceramic layer 7 again later；Deng
The ceramic powders that plasma spray bottom ceramic layer uses are YAG, Y2O3、YF3With one of YOF or a variety of mixed-powders, powder
Purity reaches 99.99% (wt.%) or more, and granularity is 10~60 μm, controls plasma gun using six axis robot when spraying
It is mobile, spraying parameter are as follows: main gas Ar flow 30~50L/min, secondary gas H24~10L/min of flow, 58~62V of voltage, electricity
500~600A, 10~20g/min of powder sending quantity, 100~150mm of spray distance are flowed, 5~10 pass (back and forth), every spraying are sprayed
1~2 pass is purged stomata 2~4 times using nitrogen or compressed air from the vertical upper electrode surface in back, and removal stomata inner wall is residual
Powder is stayed, gas pressure is 0.5~0.8MPa, and 30~80 μm of bottom ceramic layer thickness, coating roughness is Ra4~8 μm, coating
Porosity 3%~6%；Suspending liquid plasma spraying top layer ceramic layer uses three cathode spray guns, and the slurry used includes solid powder
End, deionized water and ethyl alcohol, wherein powder solid content is 5%~30%wt, and the volume ratio of water and ethyl alcohol is 1:1, solid powder
Granularity is 200-900nm, solid powder material YAG, Y2O3、YF3With one of YOF or a variety of mixing；Suspending liquid plasma
It is mobile using six axis robot manipulation spray gun when spraying, spraying parameter are as follows: main gas Ar flow 50~80L/min, secondary gas H2
8~15L/min of flow, 70~90V of voltage, 450~550A of electric current, 15~50ml/min of amount of slurry, spray distance 60~
100mm, sprays 20~40 pass, and every 1~2 pass of spraying uses nitrogen or compressed air from the vertical upper electrode surface in back
Purging stomata 2~4 times, remove stomata inner wall residual powder, 0.5~0.8MPa of gas pressure, top layer ceramic layer thickness be 40~
80 μm, coating roughness is 0.8~1.5 μm of Ra, and coating porosity is lower than 1.5%.
Step 5: removal veil impurity, it is therefore an objective to remove upper electrode surface masking, dip in acetone using non-dust cloth
Except surface residue glue that may be present, then high-pressure washing, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, pressure
Power is 50~100bar, and water jets under high pressure is parallel with hole diameter direction, and the cleaning of face stomata is finally blown using compressed air
It is dry, and dry 1~2h under the conditions of 60~80 DEG C of temperature.
Step 6: in 1000 grades or more toilets, 60~80 DEG C of dryings 12 of progress~handle for 24 hours use height after cooling
Pure nitrogen gas or Ar are purged and are vacuum-packed, and are stored by vacuum packaging, are further increased service life.
It is described in detail below by preferred embodiment:
Embodiment 1
A kind of process improving etching machine bench top electrode service life, includes the following steps
(1) extremely aluminium material component is powered on, first progress degreasing and grinding process；
(2) covered before sandblasting: using structure setting shown in Fig. 2 carry out sandblasting before protect, only to 5~12mm around stomata into
Row sandblasting roughening treatment, sandblasting protection jig thickness 3mm in Fig. 2, material are Al or SUS, jig aperture 6mm.It is double using heatproof
Face adhesive tape adheres to jig and top electrode；
(3) white fused alumina sand material, mesh number 60#, blasting pressure 0.3Mpa, sandblasting distance 300mm, gas after sandblasting sandblasting: are used
Hole periphery rough degree reaches 3.5 μm of Ra；
(4) be cleaned and dried: removal upper electrode surface masking, first using non-dust cloth dip in acetone removal surface there may be
Residue glue, then using high-pressure washing removal residual sand material, the deionized water resistivity that high-pressure washing uses be greater than 4M Ω * cm,
Pressure is 60bar, is finally dried up using compression stomata, 60 DEG C of dry 4h.
(5) anodic oxidation: using conventional anodization technique, and 25 μm of anode film thickness, the sun at the blasting treatment of stomata periphery
Pole film thickness is suitable with other positions, and the anode film roughness at stomata periphery (6mm) blasting treatment reaches 3 μm；
(6) it is cleaned and dried: using scouring pad grinding process, then high-pressure washing removes surface p article, high-pressure washing
The deionized water resistivity used is greater than 4M Ω * cm, and pressure 60bar is finally dried up using compressed air, 60 DEG C of dry 12h.
(7) it masking before spraying: carries out spraying preceding protection using structure setting shown in Fig. 3, subsequent to 6mm around stomata week
Spray treatment, Fig. 3 sprayed protection jig thickness 2mm are carried out, material is Al or SUS, jig aperture 6mm, using two-sided shown in Fig. 2
High temperature gummed tape adheres to jig and top electrode；
(8) conventional plasma sprayed layer undercoat: the ceramic powders that plasma spraying primer coating uses are YAG, Y2O3And YOF
In mixed-powder, powder purity reaches 99.99% (wt.%) or more, and granularity is 15 μm.Six axis robot control is used when spraying
Plasma gun processed is mobile, spraying parameter: main gas Ar flow 35L/min, secondary gas H2Flow 5L/min, voltage 60V, electric current
500A, powder sending quantity 10g/min, spray distance 100mm spray 6 pass.Every 1 pass of spraying uses nitrogen or compressed air
From back, vertical upper electrode surface is purged stomata 3 times, removes stomata inner wall residual powder, gas pressure 0.6MPa.Bottom applies
Thickness degree reaches 40 μm, and coating roughness is Ra4 μm, coating porosity 3%.
(9) suspending liquid plasma spraying working lining: suspending liquid plasma spraying uses three cathode spray guns, the slurry packet used
Containing solid powder, deionized water, ethyl alcohol, wherein powder solid content is 10%wt, water: ethyl alcohol=1:1, powder size 200nm,
Dusty material is YAG, Y2O3With the mixed-powder of YOF.It is moved when suspending liquid plasma spraying using six axis robot manipulation spray gun
It is dynamic, spraying parameter are as follows: main gas Ar flow 50L/min, secondary gas H2Flow 10L/min, voltage 75V, electric current 450A, amount of slurry
18ml/min, spray distance 60mm, spray 20 pass, and every 1 pass of spraying is vertical from back using nitrogen or compressed air
Upper electrode surface purges stomata 3 times, removes stomata inner wall residual powder, gas pressure 0.6MPa.Top coat with a thickness of 40 μm,
Coating roughness is 1.0 μm of Ra, and coating porosity is lower than 1.5%.
(10) be cleaned and dried: it is that may be present to dip in acetone removal surface using non-dust cloth by removal upper electrode surface masking
Residue glue, then high-pressure washing, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, pressure 50bar, high pressure water
Column is parallel with hole diameter direction, and the cleaning of face stomata is finally dried up using compressed air, 60 DEG C of dry 2h.
(11) final process: in 1000 grades or more toilets, carrying out 60 DEG C of dryings and handle for 24 hours, uses after cooling high-purity
Nitrogen or Ar are purged and are vacuum-packed.
Embodiment 2
A kind of process improving etching machine bench top electrode service life, includes the following steps
(1) extremely aluminium material component is powered on, first progress degreasing and grinding process；
(2) it covers before sandblasting: being protected before carrying out sandblasting using structure setting shown in Fig. 2, only 12mm around stomata is carried out
Sandblasting roughening treatment, sandblasting is maintained law and order protector thickness 5mm in Fig. 2, and material is Al or SUS, jig aperture 10mm.To prevent jig from existing
Sliding is generated with upper electrode surface by sand material or compressed air effect in sandblasting procedures, sandblasting range mistake is caused and powers on
Pole surface scratches, and adheres to jig and top electrode using double faced adhesive tape shown in Fig. 2；
(3) white fused alumina sand material, mesh number 100#, blasting pressure 0.5Mpa, sandblasting distance 600mm, gas after sandblasting sandblasting: are used
Hole periphery rough degree reaches 6 μm of Ra；
(4) be cleaned and dried: removal upper electrode surface masking, first using non-dust cloth dip in acetone removal surface there may be
Residue glue, then using high-pressure washing removal residual sand material, the deionized water resistivity that high-pressure washing uses be greater than 4M Ω * cm,
Pressure is 100bar, is finally dried up using compression stomata, 80 DEG C of dry 2h.
(5) anodic oxidation: using conventional anodization technique, and 50 μm of anode film thickness, the sun at the blasting treatment of stomata periphery
Pole film thickness is suitable with other positions, and the anode film roughness at stomata periphery (12mm) blasting treatment reaches 4 μm, is conducive to subsequent etc.
The adherency of plasma spray coating；
(6) it is cleaned and dried: using scouring pad grinding process, then high-pressure washing removes surface p article, high-pressure washing
The deionized water resistivity used is greater than 4M Ω * cm, and pressure 100bar is finally dried up using compressed air, 80 DEG C of dry 8h.
(7) masking before spraying: spray preceding protection using method shown in Fig. 3, subsequent to 12mm around stomata week into
Row spray treatment, Fig. 3 sprayed protection jig thickness 4mm, material are Al or SUS, jig aperture 12mm, using two-sided shown in Fig. 2
High temperature gummed tape adheres to jig and top electrode；
(8) conventional plasma sprayed layer undercoat: the ceramic powders that plasma spraying primer coating uses are YAG, Y2O3、YF3With
The mixed-powder of YOF, powder purity reach 99.99% (wt.%) or more, and granularity is 60 μm.Six axis robot is used when spraying
It is mobile to control plasma gun, spraying parameter: main gas Ar flow 50L/min, secondary gas H2Flow 10L/min, voltage 62V,
Electric current 600A, powder sending quantity 20g/min, spray distance 150mm spray 10 pass.Every 2 pass of spraying use nitrogen or compression
Air purges stomata 4 times from the vertical upper electrode surface in back, removes stomata inner wall residual powder, gas pressure 0.8MPa.It crosses
It crosses a layer coating layer thickness and reaches 80 μm, coating roughness is 8 μm of Ra, coating porosity 6%.
(9) suspending liquid plasma spraying working lining: suspending liquid plasma spraying uses three cathode spray guns, the slurry packet used
Containing solid powder, deionized water, ethyl alcohol, wherein powder solid content is 30%wt, water: ethyl alcohol=1:1, powder size 900nm,
Dusty material is YAG, Y2O3、YF3With the mixed-powder of YOF.Spray gun is manipulated using six axis robot when suspending liquid plasma spraying
It is mobile, spraying parameter are as follows: main gas Ar flow 80L/min, secondary gas H2Flow 15L/min, voltage 90V, electric current 550A, slurry
50ml/min, spray distance 100mm are measured, 40 pass are sprayed, every 2 pass of spraying are hung down using nitrogen or compressed air from back
Straight upper electrode surface purges stomata 3 times, removes stomata inner wall residual powder, gas pressure 0.8MPa.Working lining coating layer thickness is
80 μm, coating roughness is 1.5 μm of Ra, and coating porosity is lower than 1.5%.
(10) be cleaned and dried: it is that may be present to dip in acetone removal surface using non-dust cloth by removal upper electrode surface masking
Residue glue, then high-pressure washing, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, pressure 100bar, high pressure water
Column is parallel with hole diameter direction, and the cleaning of face stomata is finally dried up using compressed air, 80 DEG C of dry 1h.
(11) final process: in 1000 grades or more toilets, 80 DEG C of dry 12h processing is carried out, are used after cooling high-purity
Nitrogen or Ar are purged and are vacuum-packed.
Reach 10MPa or more, working lining coating using the binding force between coating prepared in the above embodiments and top electrode
Porosity is lower than 1.5%, has excellent resistant to plasma etching gas corrosive nature, can be effectively reduced and particle and different occurs
The often possibility of electric discharge problem, improves top electrode service life, is 2~4 times of anode oxidation process service life, meets high generation
(G8.5, G10) and the demand for improving production capacity.
The present invention is exemplarily described in conjunction with attached drawing above.Obviously, present invention specific implementation is not by above-mentioned side
The limitation of formula.As long as using the improvement for the various unsubstantialities that the inventive concept and technical scheme of the present invention carry out；Or not
It is improved, above-mentioned conception and technical scheme of the invention are directly applied into other occasions, in protection scope of the present invention
Within.
Claims (10)
1. a kind of process for improving etching machine bench top electrode service life, which comprises the steps of:
Step 1: to sandblasting space out is covered around the stomata of top electrode, sandblasting roughening treatment later；
Step 2: removal veil and sand material impurity；
Step 3: to upper electrode surface anodic oxidation to form anode oxide film；
Step 4: spray space out to covering around the stomata of top electrode, spraying ceramic coat later；
Step 5: removal veil impurity, is dried later.
2. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the step
The method that sandblasting space out is covered in rapid one be sandblasting protection jig is arranged in around top electrode stomata at 5~12mm so that
Sandblasting roughening treatment is carried out around stomata in the space of 5~12mm；Sandblasting protection jig is adhered to by heatproof double-sided adhesive
On electrode surface.
3. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the spray
The blasting pressure of coarsening processing is 0.2~0.5Mpa, sandblasting 300~600mm of distance, and sandblasting posterior spiracle periphery rough degree reaches
3~6 μm of Ra.
4. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the step
The method of rapid two removal veil and sand material impurity is that the residue glue of acetone removal upper electrode surface is first dipped in using non-dust cloth, then high
Pressure washing removal residual sand material, the deionized water resistivity that high-pressure washing uses are greater than 4M Ω * cm, and pressure is 50~100bar,
It is finally dried up using compressed air, and dry 2~4h under the conditions of 60~80 DEG C of temperature.
5. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the step
Rapid three Anodic Oxidations film thickness is 5~60 μm, the sun of film thickness and upper electrode surface other positions at the blasting treatment of stomata periphery
Pole film thickness is suitable, and the anode film roughness at the blasting treatment of stomata periphery reaches Ra2~4 μm.
6. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the step
Covered in rapid four out spray space method be sprayed protection jig is arranged in around top electrode stomata at 5~12mm so that
Spray treatment is carried out around stomata in the space of 5~12mm；Sprayed protection jig is adhered to top electrode by heatproof double-sided adhesive
On surface.
7. improving the process of etching machine bench top electrode service life according to claim 1, which is characterized in that the step
Ceramic coated layer is to first pass through plasma spray priming operation ceramic layer in rapid four, is made pottery again by suspending liquid plasma spraying top layer later
Enamel coating.
8. improving the process of etching machine bench top electrode service life according to claim 7, which is characterized in that described etc.
The ceramic powders that plasma spray bottom ceramic layer uses are YAG, Y2O3、YF3With one of YOF or a variety of mixed-powders, granularity
It is 10~60 μm, spraying parameter are as follows: main gas Ar flow 30~50L/min, secondary gas H24~10L/min of flow, voltage 58~
62V, 500~600A of electric current, 10~20g/min of powder sending quantity, 100~150mm of spray distance spray 5~10 back and forth, every spraying
1~2 is purged stomata 2~4 times using nitrogen or compressed air from the vertical upper electrode surface in back back and forth, and removal stomata inner wall is residual
Powder is stayed, gas pressure is 0.5~0.8MPa, and 30~80 μm of bottom ceramic layer thickness, coating roughness is Ra4~8 μm, coating
Porosity 3%~6%.
9. improving the process of etching machine bench top electrode service life according to claim 7, which is characterized in that described outstanding
Supernatant liquid plasma spraying top layer ceramic layer uses three cathode spray guns, and the slurry used includes solid powder, deionized water and ethyl alcohol,
Wherein the mass fraction of solid powder is 5%~30%, and the volume ratio of water and ethyl alcohol is 1:1, and solid powder granularity is 200-
900nm, solid powder material YAG, Y2O3、YF3With one of YOF or a variety of mixing；, spraying parameter are as follows: main gas Ar
Flow 50~80L/min, secondary gas H2 8~15L/min of flow, 70~90V of voltage, 450~550A of electric current, amount of slurry 15~
50ml/min, 60~100mm of spray distance, back and forth, every spraying 1~2 is empty using nitrogen or compression back and forth for spraying 20~40
Gas purges stomata 2~4 times from the vertical upper electrode surface in back, removal stomata inner wall residual powder, and gas pressure 0.5~
0.8MPa, top layer ceramic layer thickness are 40~80 μm, and coating roughness is 0.8~1.5 μm of Ra, and coating porosity is lower than
1.5%.
10. improving the process of etching machine bench top electrode service life according to claim 7, which is characterized in that described
The method of step 5 removal masking impurity is that the residue glue of acetone removal upper electrode surface is dipped in using non-dust cloth, then high-pressure washing,
The deionized water resistivity that high-pressure washing uses is greater than 4M Ω * cm, and pressure is 50~100bar, and water jets under high pressure face stomata is clear
It washes, is finally dried up using compressed air, and dry 1~2h under the conditions of 60~80 DEG C of temperature.
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| CN109628873A (en) * | 2018-12-28 | 2019-04-16 | 深圳市金中瑞通讯技术有限公司 | A kind of spraying method of feeding point |
| CN110218965A (en) * | 2019-05-28 | 2019-09-10 | 沈阳富创精密设备有限公司 | A kind of preparation method of advanced ceramics layer |
| CN111564356A (en) * | 2020-05-09 | 2020-08-21 | 芜湖通潮精密机械股份有限公司 | Lower electrode surface dielectric layer and manufacturing process thereof |
| CN111778469A (en) * | 2020-07-20 | 2020-10-16 | 矿冶科技集团有限公司 | Method for improving bonding strength of thermal spraying coating on surface of light alloy part |
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| CN104357840A (en) * | 2014-10-28 | 2015-02-18 | 沈阳富创精密设备有限公司 | Preparation method for surface pure aluminum or aluminum alloy coating of metal structural material |
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| CN109628873A (en) * | 2018-12-28 | 2019-04-16 | 深圳市金中瑞通讯技术有限公司 | A kind of spraying method of feeding point |
| CN110218965A (en) * | 2019-05-28 | 2019-09-10 | 沈阳富创精密设备有限公司 | A kind of preparation method of advanced ceramics layer |
| CN112126960A (en) * | 2019-06-25 | 2020-12-25 | 株式会社爱发科 | Surface treatment method |
| CN112126960B (en) * | 2019-06-25 | 2021-09-03 | 株式会社爱发科 | Surface treatment method |
| CN112442719B (en) * | 2019-08-28 | 2022-02-18 | 芜湖通潮精密机械股份有限公司 | Shielding method before anodic oxidation of aluminum and aluminum alloy sunken hole |
| CN112442719A (en) * | 2019-08-28 | 2021-03-05 | 芜湖通潮精密机械股份有限公司 | Shielding method before anodic oxidation of aluminum and aluminum alloy sunken hole |
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| CN111778469A (en) * | 2020-07-20 | 2020-10-16 | 矿冶科技集团有限公司 | Method for improving bonding strength of thermal spraying coating on surface of light alloy part |
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| CN112133622A (en) * | 2020-09-22 | 2020-12-25 | 重庆臻宝实业有限公司 | Upper electrode pore repairing process |
| CN112133622B (en) * | 2020-09-22 | 2023-09-05 | 重庆臻宝科技股份有限公司 | Repair process for upper electrode air hole |
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| CN112521183A (en) * | 2020-11-30 | 2021-03-19 | 合肥微睿光电科技有限公司 | Meltallizing method of ceramic piece for dry etching process |
| CN112553559A (en) * | 2020-12-07 | 2021-03-26 | 苏州众芯联电子材料有限公司 | Base material plasma spraying process |
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