CN108873286B - Wide-field super-resolution microscopic imaging device based on silver nanowire electric field mode on multilayer dielectric film - Google Patents
Wide-field super-resolution microscopic imaging device based on silver nanowire electric field mode on multilayer dielectric film Download PDFInfo
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- CN108873286B CN108873286B CN201810767089.2A CN201810767089A CN108873286B CN 108873286 B CN108873286 B CN 108873286B CN 201810767089 A CN201810767089 A CN 201810767089A CN 108873286 B CN108873286 B CN 108873286B
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- silver nanowire
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- multilayer dielectric
- optical fiber
- silver
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- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 58
- 239000002042 Silver nanowire Substances 0.000 title claims abstract description 53
- 238000003384 imaging method Methods 0.000 title claims abstract description 25
- 230000005684 electric field Effects 0.000 title claims abstract description 18
- 239000013307 optical fiber Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims abstract description 7
- 230000005540 biological transmission Effects 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 claims description 25
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 3
- 230000007547 defect Effects 0.000 claims description 3
- 239000011241 protective layer Substances 0.000 claims description 3
- 229920000148 Polycarbophil calcium Polymers 0.000 claims 1
- 238000007654 immersion Methods 0.000 abstract description 5
- 238000000386 microscopy Methods 0.000 description 9
- 239000000523 sample Substances 0.000 description 4
- 238000004621 scanning probe microscopy Methods 0.000 description 4
- 238000004624 confocal microscopy Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000012634 optical imaging Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000399 optical microscopy Methods 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010869 super-resolution microscopy Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
Abstract
The invention discloses a wide-field super-resolution microscopic imaging device based on a silver nanowire electric field mode on a multilayer dielectric film, which comprises: a glass substrate layer (1), a multilayer dielectric film (2), silver nanowires (3) and an optical fiber taper (4); the device is characterized in that an intrinsic mode exists on a silver nanowire on the surface of a multilayer medium, an electric field is mainly distributed on two sides of the silver nanowire, the mode of 590nm laser capable of exciting the silver nanowire in a near field is realized through an optical fiber cone, light can leak into the multilayer medium film in the light transmission process and radiate downwards at a certain angle, a high numerical aperture oil immersion microscope objective lens is used for collecting signals below a substrate and imaging the signals in a far field, the leaked light signals on two sides of the silver nanowire can be distinguished in the far field, and the device realizes wide field super-resolution imaging of light fields on two sides of the silver nanowire because the diameter of the silver nanowire is smaller than 100nm and smaller than the resolution of the whole imaging system.
Description
Technical Field
The invention relates to the field of super-resolution optical imaging, in particular to a wide-field super-resolution microscopic imaging device based on a silver nanowire electric field mode on a multilayer dielectric film.
Background
The microscopy is the most direct means for people to know the microcosmic world, and the optical microscopy directly presents microcosmic world images in front of our eyes, is the most intuitive and common microscopy in all microscopy, but the traditional optical microscopy is limited by diffraction limit, and resolution can only reach half wavelength order, which cannot meet the resolution requirement of the current microscopy. In recent years, some super-resolution microscopy techniques are sequentially proposed and matured, and mainly comprise confocal microscopy techniques, scanning probe microscopy techniques, stimulated radiation fluorescence quenching microscopy techniques, random light reconstruction microscopy techniques and the like. The main microscopy techniques have limitations in practical application, and have the following problems:
1. the cost is high. For example, the scanning probe microscopy technology needs a control feedback system with high manufacturing cost as a support, and the stimulated radiation fluorescence quenching microscopy technology needs to be realized under the support of a confocal system, and meanwhile, has high requirements on fluorescent molecules and an excitation light source.
2. Scanning is time consuming. Both confocal microscopy and scanning probe microscopy require a long time to scan and then image the sample point by point, and cannot image the sample everywhere simultaneously.
3. Limitations. Confocal microscopy is limited in resolution improvement; conventional scanning probe microscopy techniques such as atomic force microscopy can only provide surface relief images of solid samples; the stimulated radiation fluorescence quenching microscopy requires an ultra-short pulse light source to achieve high resolution and precise control of the emission time of the pulses.
Disclosure of Invention
The invention aims to overcome the defect of resolution ratio of a traditional optical microscope, and provides a wide-field super-resolution microscopic imaging device based on an electric field mode of silver nanowires on a multilayer dielectric film.
The technical scheme for achieving the aim is as follows:
a wide field super resolution microscopic imaging device based on a silver nanowire electric field mode on a dielectric multilayer film, comprising: a glass substrate layer, a multilayer dielectric film, silver nanowires and an optical fiber cone; the silver nanowires are dispersed in ethanol, and are dripped on the multilayer dielectric film, after the ethanol volatilizes, the optical fiber cone for transmitting 590nm laser is used for approaching the silver nanowires, and the electric field mode of the silver nanowires is excited.
Wherein the multi-layer dielectric film consists ofHigh refractive index medium Si with thickness of 88nm 3 N 4 Layer and thickness 105nm low refractive index medium SiO 2 Alternating layers of top layer SiO 2 The layer thickness is 160nm, which is a defect layer and is 14 layers in total.
The silver nanowire is a silver nanowire with the diameter of 60nm, and the surface of the silver nanowire is coated with a PVP protective layer with the thickness of 15 nm.
The optical fiber taper is manufactured by using a single-mode optical fiber of a communication band through an optical fiber taper machine.
The technical scheme of the invention is as follows: a wide-field super-resolution microscopic imaging device based on an electric field mode of silver nanowires on a dielectric multilayer film is characterized in that an intrinsic mode exists on the silver nanowires on the surface of the multilayer dielectric film, an electric field is mainly distributed on two sides of the silver nanowires, the mode of the silver nanowires can be excited by 590nm laser in a near field mode through an optical fiber cone, in the light transmission process, light can leak into the multilayer film and radiate downwards at a certain angle, a high numerical aperture oil immersion microscope objective lens is used for collecting signals below a crystal and imaging in a far field, and the leaked light signals on two sides of the silver nanowires can be resolved in the far field, and because the diameter of the silver nanowires is smaller than 100nm and smaller than the resolution of the objective lens, the device achieves wide-field super-resolution imaging of light fields on two sides of the silver nanowires.
Compared with the prior imaging technology, the invention has the advantages that:
1. low cost: the method only needs to place the silver nanowire on the multilayer dielectric film, excite the electric field mode of the silver nanowire by using the optical fiber cone, collect the leakage signal by using the objective lens, and has simple and compact structure and low manufacturing cost;
2. high resolution: the diffraction limit of the traditional optical imaging is broken through, and super-resolution optical imaging is realized by utilizing a special electric field mode of silver nanowires on the one-dimensional photonic crystal;
3. wide field imaging: the device can image the sample everywhere simultaneously, need not to scan the sample point by point, saves time.
Drawings
FIG. 1 is a schematic diagram of a wide-field super-resolution microscopic imaging device based on a silver nanowire electric field mode on a dielectric multilayer film;
fig. 2 is an imaging light path diagram.
Fig. 3 is an image obtained by the imaging optical path with the apparatus, where a is an image imaged on the CCD, and b is a light intensity distribution along a white dotted line in a.
In the figure, 1 is a glass base; 2 is a multilayer dielectric film; 3 is silver nanowire; 4 is an optical fiber cone; 5 is high refractive index medium Si 3 N 4 A layer; 6 is low refractive index medium SiO 2 A layer; 7 is the top SiO 2 A layer; 8 is a substrate (comprising a multilayer dielectric film 2 and a glass base 1); 9 is a high numerical aperture oil immersion microscope objective; 10 is a mirror; 11 is an imaging lens; 12 is a CCD.
Detailed Description
The present invention will be described in further detail below with reference to the drawings, wherein like reference numerals refer to like parts throughout.
Referring to fig. 1-2, the wide-field super-resolution microscopic imaging device based on the silver nanowire electric field mode on the dielectric multilayer film comprises a glass basal layer 1, a multilayer dielectric film 2, silver nanowires 3, an optical fiber cone 4, a substrate 8 (comprising the multilayer dielectric film 2 and the glass basal layer 1), a high numerical aperture oil immersion microscope objective 9, a reflecting mirror 10, an imaging lens 11 and a CCD 12. Wherein the multilayer dielectric film consists of a high refractive index dielectric Si with the thickness of 88nm 3 N 4 Layer 5 and a low refractive index medium SiO 105nm thick 2 Layers 6 are alternately composed of top layer SiO 2 The layer 7 is 160nm thick, the silver nanowire 3 is a silver nanowire with the diameter of 60nm, the surface of the silver nanowire is coated with a PVP protective layer with the thickness of 15nm, and the optical fiber cone 4 is manufactured by using a single-mode optical fiber with a communication wave band through an optical fiber cone drawing machine.
The silver nanowires 3 are dispersed in ethanol and drop on the substrate 8, after the ethanol volatilizes, the optical fiber cone 4 excited by transmission 590nm is close to the silver nanowires, the electric field mode of the silver nanowires 3 is excited, during the light transmission process, the light leaks into the multi-layer dielectric film and irradiates down at a certain angle, the leaked optical signals are collected under the substrate 8 by using the oil immersion microscope objective 9 with high numerical aperture, and are imaged on the CCD 12 through the reflecting mirror 10 and the imaging lens 11. Fig. 3a is an image obtained on a CCD, and fig. 3b is a light intensity distribution along a white dotted line in fig. 3a, and leaked light at both sides of a silver nanowire is resolved because the diameter of the silver nanowire is less than 100nm, which is less than the minimum resolution of the entire imaging system, thereby realizing wide-field super-resolution imaging of the silver nanowire.
Parts of the invention not described in detail are well known in the art.
Claims (2)
1. A wide-field super-resolution microscopic imaging device based on a silver nanowire electric field mode on a multilayer dielectric film is characterized in that: comprising the following steps: a glass substrate layer (1), a multilayer dielectric film (2), silver nanowires (3) and an optical fiber taper (4); the method comprises the steps that silver nanowires (3) are dispersed in ethanol, the silver nanowires are dripped on a multilayer dielectric film (2), after the ethanol volatilizes, optical fiber cones (4) excited by transmission 590nm are close to the silver nanowires, and an electric field mode of the silver nanowires (3) is excited;
the multilayer dielectric film (2) is formed by a high refractive index medium Si with the thickness of 88nm 3 N 4 Layer (5) and low refractive index medium SiO with thickness of 105nm 2 Layers (6) are alternately composed, top layer SiO 2 The layer (7) is a defect layer and 14 layers are all;
the silver nanowire (3) is a silver nanowire with the diameter of 60nm, and the surface of the silver nanowire is coated with a PVP protective layer with the thickness of 15 nm.
2. The wide-field super-resolution microscopic imaging device based on the electric field mode of silver nanowires on a multilayer dielectric film according to claim 1, wherein the device is characterized in that: the optical fiber taper (4) is manufactured by using a single-mode optical fiber of a communication band through an optical fiber taper machine.
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| CN201810767089.2A CN108873286B (en) | 2018-07-13 | 2018-07-13 | Wide-field super-resolution microscopic imaging device based on silver nanowire electric field mode on multilayer dielectric film |
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| CN201810767089.2A CN108873286B (en) | 2018-07-13 | 2018-07-13 | Wide-field super-resolution microscopic imaging device based on silver nanowire electric field mode on multilayer dielectric film |
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| CN108873286B true CN108873286B (en) | 2024-03-29 |
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| CN110444315A (en) * | 2019-09-04 | 2019-11-12 | 中国科学技术大学 | A kind of particle control device based on multilayer dielectric film |
| CN113322182B (en) * | 2021-06-28 | 2023-04-25 | 中国科学技术大学 | Cell control device based on multilayer dielectric film |
| CN114577121B (en) * | 2022-05-09 | 2022-09-06 | 中国科学技术大学 | Detection device for detecting morphology of sub-wavelength medium nanowire based on surface wave directionality |
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| KR20130048333A (en) * | 2011-11-02 | 2013-05-10 | 한국과학기술원 | Transparent electrode comprising polymer passivation layer and ag nanowire network and the fabrication method thereof |
| CN104777332A (en) * | 2015-03-31 | 2015-07-15 | 中国科学技术大学 | High-efficiency probe capable of breaking through diffraction limit and preparation method of high-efficiency probe |
| CN106601337A (en) * | 2016-11-10 | 2017-04-26 | 上海交通大学 | Silver nano-wire flexible transparent conductive film and preparation method thereof |
| RU171556U1 (en) * | 2016-12-07 | 2017-06-06 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" | PROBE OF THE CLOSE-SOFT OPTICAL MICROSCOPE |
| CN208547762U (en) * | 2018-07-13 | 2019-02-26 | 中国科学技术大学 | A kind of wide field super-resolution microscopic imaging device based on silver nanowires electric field patterns on multilayer dielectric film |
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Patent Citations (6)
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| CN2585258Y (en) * | 2002-12-10 | 2003-11-05 | 中国科学技术大学 | Super identification carry/coverglass |
| KR20130048333A (en) * | 2011-11-02 | 2013-05-10 | 한국과학기술원 | Transparent electrode comprising polymer passivation layer and ag nanowire network and the fabrication method thereof |
| CN104777332A (en) * | 2015-03-31 | 2015-07-15 | 中国科学技术大学 | High-efficiency probe capable of breaking through diffraction limit and preparation method of high-efficiency probe |
| CN106601337A (en) * | 2016-11-10 | 2017-04-26 | 上海交通大学 | Silver nano-wire flexible transparent conductive film and preparation method thereof |
| RU171556U1 (en) * | 2016-12-07 | 2017-06-06 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Нижегородский государственный университет им. Н.И. Лобачевского" | PROBE OF THE CLOSE-SOFT OPTICAL MICROSCOPE |
| CN208547762U (en) * | 2018-07-13 | 2019-02-26 | 中国科学技术大学 | A kind of wide field super-resolution microscopic imaging device based on silver nanowires electric field patterns on multilayer dielectric film |
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