CN108607367A - Low vacuolar membrane cleaning agent - Google Patents
Low vacuolar membrane cleaning agent Download PDFInfo
- Publication number
- CN108607367A CN108607367A CN201810453086.1A CN201810453086A CN108607367A CN 108607367 A CN108607367 A CN 108607367A CN 201810453086 A CN201810453086 A CN 201810453086A CN 108607367 A CN108607367 A CN 108607367A
- Authority
- CN
- China
- Prior art keywords
- acid
- low
- carbon chain
- short carbon
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
- B01D65/022—Membrane sterilisation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Detergent Compositions (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The invention discloses a kind of low vacuolar membrane cleaning agents, belong to water-treatment technology field, and in particular to the cleaning of film medium.It is mainly characterized by the low few residual of bubble, including low foaming surfactant, chelating agent etc., the present invention is free of antifoaming agent, and cleaning efficiency is high, easily rinses, basic noresidue.
Description
Technical field
The invention discloses a kind of low vacuolar membrane cleaning agents, belong to water-treatment technology field, and in particular to the cleaning of film medium.
Background technology
Current green technology, application of membrane separation technology is more extensive, has been widely used for chemical industry, water process, food
The multiple fields such as product industry, paper industry.But increasing with application, the cleaning and maintenance of the film as separating medium are aobvious
It obtains more important.Especially some large-scale membrane modules cannot be replaced frequently, need to carry out it cleaning physically or chemically, ensure
System runs well.
The type of UF membrane medium is more, there is microfiltration membranes, NF membrane, reverse osmosis membrane etc..Film group passes through long-play,
The dirt generated on film will pollute entire UF membrane system, and membrane module flux is caused to become smaller, and operating pressure increases, serious
It can lead to quick-fried film etc., system is caused to can not operate normally, while film group scraps and also has larger economic loss, it is therefore desirable to and
When carry out the cleaning of film group.Dirt composition in film group mainly has following a few classes：1, inorganic salts, minerals, iron rust etc., 2, because
Possible grease, protein residues, the starch etc. that separation system is different and generates, 3, microorganism include bacterium etc..Since film is situated between
The particularity of matter application, mainly acidic cleaner, the alkaline cleaner that current Membrane cleaning uses, it will usually strong using strong acid
Alkali causes cleaning load larger, while cleaning efficiency is not high.Still it can enhance cleaning using surfactant in many formulas
Effect, but most is still conventional surfactant, and foam is high, easily residual, and cleaning efficiency is low, this is in purity requirements height
System in be prodigious drawback.Also have in patent and mention with low foaming surfactant, as patent CN 101457182 is a kind of
Liquid enzyme film cleaning agent, that use is the PE6100 or PE6200 with foam-inhibiting effect, the cleaning efficiency of this chemicals compared with
It is low, the effect of cleaning cannot be primarily served in formula.
Invention content
The present invention is directed to be combined as main cleaning substance with chelating agent with the low foaming surfactant Jing Guo type selecting,
The cleaning agent easily rinses main Fouling Cleaning cleaning efficiency height, and cycle-index is low, and less energy consumption, scavenging period is shorter, and
And it can be as the generally applicable cleaning agent of various Membrane cleanings.
There are mainly three types of signified low bubble nonionic surfactants of the invention, and one is low bubble non-ionic surface actives
Agent, one is low bubble anion surfactant, another kind is low bubble amphoteric surfactant.Low bubble nonionic surfactant
It is optional to contain short carbon chain（C4-11）Fatty alcohol polyoxyethylene ether, contain short carbon chain（C4-11）Isomery fatty alcohol polyoxyethylene ether,
Containing short carbon chain（C4-11）Fatty alcohol polyoxyethylene polyoxypropylene ether, contain short carbon chain（C4-11）Isomery aliphatic alcohol polyethenoxy
Polyethenoxy ether, the fatty acid methyl ester APEO containing short carbon chain, the fatty acid methyl ester polyoxyethylene polyoxy third containing short carbon chain
The one of which of alkene ether or their compound, preferably iso-octyl polyoxyethylene poly-oxygen propylene aether, more preferable HLB value is in 12-15
With polyoxypropylene block iso-octyl polyoxyethylene ether.It is the optional low bubble alkyl glycosides of low bubble anion surfactant, low
Steep Sulfonates, low bubble even benzenedisulfonic acid salt, low bubble Sulfates, low bubble acetic acid salt, low bubble naphthoic acid salt etc.；Low bubble
The optional low bubble betaines of amphoteric surfactant, low bubble oxidation amine, low bubble imidazolines, low bubble iminodipropionate
The one of which of class or its compound.
The optional sodium citrate of chelating agent, gluconic acid sodium salt, tetrasodium salt of EDTA (EDTA), secondary ammonia selected by the present invention
Base triacetic acid trisodium salt (NTA), ethanoldiglycines disodium salt (EDG), diethanol glycine sodium salt (DEG) and the Asias 1,3- third
Base ethylenediamine tetraacetic acid (EDTA) (PDTA), two carboxymethyl glutamic acid tetrasodium salts (GLDA), methylglycine-N-N- oxalic acid trisodium salts
(MGDA) and iminodisuccinic acid sodium salt (IDS), N- hydroxy ethylenes ethylenediamine triacetic acid (HEDTA), ethylene diamine tetrem
Sour (EDTA), complexon I (NTA), diethylene-triamine pentaacetic acid (DTPA), four propionic acid of ethylene diamine, triethylene
Four hexaacetic acids (TTHA) and their corresponding alkali metal, ammonium and substituted ammonium salt, organic phosphine include being not limited to amino
This methylenephosphonic acid ATMP, 1-hydroxy ethylidene-1,1-diphosphonic acid HEDP, ethylene diamine tetra methylene phosphonic acid sodium EDTMPS, ethylene diamine tetra methylene phosphonic acid
ECTMPA, diethylene triamine pentamethylene phosphonic DTPMP, 2- phosphonobutane -1,2,4- tricarboxylic acids PBTCA, Polyol Phosphate
PAPE, 2- hydroxyethylidene diphosphonic acid guanidine-acetic acid HPAA, hexapotassium HDTMPA, polyamino polyether base methylenephosphonic acid PAPEMP,
Two oneself fan's alkene triamine pentamethylene phosphonic acids BHMTPMPA etc..Due to the particularity that UF membrane requires, preferably environmentally friendly sodium citrate,
Gluconic acid sodium salt, GLDA, MGDA etc..
The neutral chemical product composition being only made of low foaming surfactant and chelating agent can substantially meet Membrane cleaning
Requirement, and the component for the cleaning that can routinize as film, periodic cyclic cleaning accomplishes General Maintenance, it is quick-fried to greatly reduce film
Probability greatly increases the run time of film.
But for different film mediums, different pollutants, different pollution levels, the composition can increase cleaning and help
Agent, sterilization Liu, antibiotic, algicide, antisludging agent, or acid or alkali composition is added to enhance specific aim, the applicability of the component
And cleaning efficiency.
Builder can be selected one kind or its compound of silicate, metasilicate, phosphate, carbonate etc., it is common as
Sodium metasilicate, sodium tripolyphosphate, sodium bicarbonate etc..Builder is in usually alkalescent, provides the environment of system weak base, is wanted with right
9 are asked to partially overlap.Also include antisludging agent in the cleaning agent of the present invention, antisludging agent can also select chelating agent to serve as, but this
The invention antisludging agent refers mainly to Sodium Polyacrylate, Styrene-acrylic copolymer, horse propylene copolymer, naphthalene sulfonic sodium, sodium lignosulfonate
One or more, polymer of the preferred molecular weight in 2000-5000.
Cleaning agent may include strong acid, highly basic, weak acid, weak base in the present invention, and inorganic acid, organic acid, inorganic base can also be divided to have
Machine alkali etc. common are hydrofluoric acid, nitric acid, sulfuric acid, acetic acid, sulfamic acid, lactic acid, sodium hydroxide, potassium hydroxide, monoethanolamine
Etc..
To ensure that the equity of the present invention, cleaning component of the invention include its concentration or dilution.
Embodiment：
1. a kind of low vacuolar membrane cleaning agent, formula composition are as follows：（Following components content is mass percent）
Iso-octyl polyoxyethylene polyoxypropylene (HLB value 12.5)：30%
GLDA: 30%（Mass percent）
Water：Surplus
The formula can as needed dilute 30-1000 times and use, easily as the conventional on-line cleaning medicament of reverse osmosis membrane
It rinses, noresidue.
2. a kind of low vacuolar membrane cleaning agent, formula composition are as follows：（Following components content is mass percent）
Iso-octyl glucoside 15%
Iso-octyl polyoxyethylene polyoxypropylene (HLB value 10.8)：5%（Mass percent）
MGDA: 10%
Sodium citrate：10%
Sodium polyacrylate homopolymer：1%
Sodium hydroxide：5%
Water：Surplus
The formula can have good cleaning strength and scaling property energy as all purpose cleaner of various films.It can be according to pollution
Degree uses stoste dilution for 30-1000 times.
3. a kind of low vacuolar membrane cleaning agent, formula composition are as follows：（Following components content is mass percent）
Alkyl polyoxyethylene ether（Containing 11 carbon linear chain structures and 5 EO）: 10%
Nonyl dipropionic acid sodium：5%
GLDA: 5%
Sodium metasilicate:8%
Sterilizing and algae-removing agent 1227：5%
Sodium hydroxide： 1%
The formula can be adapted for various films, have very strong applicability, while be also equipped with the effect of sterilizing and algae-removing.It can root
Stoste dilution is used for 20-500 times according to pollution level.
Claims (10)
1. a kind of low vacuolar membrane cleaning agent, it is characterised in that contain the low bubble nonionic surfactants of 0.001-50%, 0.001-50%
Chelating agent and water.
2. a kind of low vacuolar membrane cleaning agent, it is characterised in that the low foaming surfactant containing 0.001-50%, the chela of 0.001-50%
Mixture and water.
3. requiring the low vacuolar membrane cleaning agent according to right 1, low bubble nonionic surfactant is optional to contain short carbon chain（C4-11）
Fatty alcohol polyoxyethylene ether, contain short carbon chain（C4-11）Isomery fatty alcohol polyoxyethylene ether, contain short carbon chain（C4-11）Fat
Fat alcohol polyoxyethylene poly-oxygen propylene aether contains short carbon chain（C4-11）Isomery Fatty alcohol polyoxyethylene polyoxypropylene ether, contain short carbon chain
Fatty acid methyl ester APEO, the one of which of fatty acid methyl ester polyoxyethylene poly-oxygen propylene aether containing short carbon chain or they
Compound, preferred iso-octyl polyoxyethylene poly-oxygen propylene aether, more preferable HLB value is in 12-15 with the different of polyoxypropylene sealing end
Octyl polyoxyethylene ether.
Can be low bubble anion surfactant, low bubble nonionic 4. requiring the low foaming surfactant according to right 2
Surfactant, low bubble amphoteric surfactant or their compound；The low optional low bubble alkyl of bubble anion surfactant
Glycoside, low bubble Sulfonates, low bubble connect benzenedisulfonic acid salt, low bubble Sulfates etc.；Low bubble nonionic surfactant can
Choosing contains short carbon chain（C4-11）Fatty alcohol polyoxyethylene ether, contain short carbon chain（C4-11）Isomery fatty alcohol polyoxyethylene ether, contain
Short carbon chain（C4-11）Fatty alcohol polyoxyethylene polyoxypropylene ether, contain short carbon chain（C4-11）Isomery aliphatic alcohol polyethenoxy it is poly-
Oxypropylene ether, the fatty acid methyl ester APEO containing short carbon chain, the fatty acid methyl ester polyoxyethylene polyoxypropylene containing short carbon chain
The one of which of ether or their compound；It is the optional low bubble betaines of low bubble amphoteric surfactant, low bubble oxidation amine, low
Steep acetic acid salt, low bubble naphthoic acid salt, low bubble imidazolines, low bubble iminodipropionate class one of which or its is compound
Object.
5. requiring the low vacuolar membrane cleaning agent, the optional sodium citrate of chelating agent, gluconic acid sodium salt, second two according to right 1,2,3,4
Amine tetraacethyl tetrasodium salt (EDTA), complexon I trisodium salt (NTA), ethanoldiglycines disodium salt (EDG), diethanol are sweet
Propylhomoserin sodium salt (DEG) and 1,3- trimethylene diamines tetraacethyl (PDTA), two carboxymethyl glutamic acid tetrasodium salts (GLDA), methyl are sweet
Propylhomoserin-N-N- oxalic acid trisodium salt (MGDA) and iminodisuccinic acid sodium salt (IDS), N- hydroxy ethylene ethylenediamine triacetic acids
(HEDTA), ethylene diaminetetraacetic acid (EDTA), complexon I (NTA), diethylene-triamine pentaacetic acid (DTPA), Asia
Four propionic acid of ethyldiamine, triethylenetetraaminehexaacetic acid (TTHA) and their corresponding alkali metal, ammonium and substituted ammonium salt, have
Machine phosphine includes being not limited to this methylenephosphonic acid of amino ATMP, 1-hydroxy ethylidene-1,1-diphosphonic acid HEDP, ethylene diamine tetra methylene phosphonic acid sodium
EDTMPS, ethylene diamine tetra methylene phosphonic acid ECTMPA, diethylene triamine pentamethylene phosphonic DTPMP, 2- phosphonobutane -1,2,4- tricarboxylics
Sour PBTCA, Polyol Phosphate PAPE, 2- hydroxyethylidene diphosphonic acid guanidine-acetic acid HPAA, hexapotassium HDTMPA, polyamino are more
Ether methylenephosphonic acid PAPEMP, two oneself fan's alkene triamine pentamethylene phosphonic acids BHMTPMPA etc..
6. the low vacuolar membrane cleaning agent is required according to right 1,2,3,4,5, including builder, can be silicate, metasilicic acid
One kind of salt, phosphate, carbonate etc. or its compound.
7. requiring the low vacuolar membrane cleaning agent according to right 1,2,3,4,5,6, contain fungicide, antibiotic or algicide, it can be with
It is 1227.
8. the low vacuolar membrane cleaning agent is required according to claim 1,2,3,4,5,6,7, including antisludging agent, optional polyacrylic acid
The one or more of sodium, Styrene-acrylic copolymer, horse propylene copolymer, naphthalene sulfonic sodium, sodium lignosulfonate, preferred molecular weight is in 2000-
5000 polymer.
9. requiring the low vacuolar membrane cleaning agent according to right 1,2,3,4,5,6,7,8, contain strong acid, weak acid, highly basic or weak base body
System.
Can be concentration or dilution 10. requiring the low vacuolar membrane cleaning agent according to claim 1,2,3,4,5,6,7,8,9
Liquid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810453086.1A CN108607367A (en) | 2018-05-14 | 2018-05-14 | Low vacuolar membrane cleaning agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810453086.1A CN108607367A (en) | 2018-05-14 | 2018-05-14 | Low vacuolar membrane cleaning agent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108607367A true CN108607367A (en) | 2018-10-02 |
Family
ID=63663064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810453086.1A Pending CN108607367A (en) | 2018-05-14 | 2018-05-14 | Low vacuolar membrane cleaning agent |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108607367A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110564516A (en) * | 2019-09-10 | 2019-12-13 | 上海丰信环保科技有限公司 | neutral cleaning agent for cleaning MBR system |
| CN114276814A (en) * | 2021-12-15 | 2022-04-05 | 湖北兴福电子材料有限公司 | Cleaning fluid for silicon wafer etching |
| WO2022117450A1 (en) * | 2020-12-04 | 2022-06-09 | Basf Se | Scrub-free cleaning composition |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102343217A (en) * | 2011-09-21 | 2012-02-08 | 石家庄开发区德赛化工有限公司 | Ultrafiltration membrane alkaline cleaner |
| CN105705220A (en) * | 2013-03-12 | 2016-06-22 | 艺康美国股份有限公司 | Surfactant blends for cleaning filtration membranes |
| CN106178965A (en) * | 2016-08-25 | 2016-12-07 | 常州联江环保科技有限公司 | A kind of Membrane cleaning protective agent |
| CN106943879A (en) * | 2017-04-14 | 2017-07-14 | 杭州开宇环保科技有限公司 | A kind of cleaning agent of the organic dirt of reverse osmosis membrane |
| CN107149877A (en) * | 2016-03-02 | 2017-09-12 | 上海丰信环保科技有限公司 | Treated sewage reusing film alkaline cleaner |
| CN107469630A (en) * | 2017-09-12 | 2017-12-15 | 山东天庆科技发展有限公司 | Reverse osmosis membrane alkaline cleaner and its application process |
-
2018
- 2018-05-14 CN CN201810453086.1A patent/CN108607367A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102343217A (en) * | 2011-09-21 | 2012-02-08 | 石家庄开发区德赛化工有限公司 | Ultrafiltration membrane alkaline cleaner |
| CN105705220A (en) * | 2013-03-12 | 2016-06-22 | 艺康美国股份有限公司 | Surfactant blends for cleaning filtration membranes |
| CN107149877A (en) * | 2016-03-02 | 2017-09-12 | 上海丰信环保科技有限公司 | Treated sewage reusing film alkaline cleaner |
| CN106178965A (en) * | 2016-08-25 | 2016-12-07 | 常州联江环保科技有限公司 | A kind of Membrane cleaning protective agent |
| CN106943879A (en) * | 2017-04-14 | 2017-07-14 | 杭州开宇环保科技有限公司 | A kind of cleaning agent of the organic dirt of reverse osmosis membrane |
| CN107469630A (en) * | 2017-09-12 | 2017-12-15 | 山东天庆科技发展有限公司 | Reverse osmosis membrane alkaline cleaner and its application process |
Non-Patent Citations (2)
| Title |
|---|
| 李波等: "水基型清洗剂的研究现状及发展趋势", 《清洗世界》 * |
| 赖小娟: "两性表面活性剂的合成及其洗涤作用", 《中国洗涤用品工业》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110564516A (en) * | 2019-09-10 | 2019-12-13 | 上海丰信环保科技有限公司 | neutral cleaning agent for cleaning MBR system |
| WO2022117450A1 (en) * | 2020-12-04 | 2022-06-09 | Basf Se | Scrub-free cleaning composition |
| CN114276814A (en) * | 2021-12-15 | 2022-04-05 | 湖北兴福电子材料有限公司 | Cleaning fluid for silicon wafer etching |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8933009B2 (en) | Surfactant blends for cleaning filtration membranes | |
| US10246665B2 (en) | Viscoelastic amphoteric surfactant based cleaning compositions | |
| CN108607367A (en) | Low vacuolar membrane cleaning agent | |
| US20150218489A1 (en) | Acidic viscoelastic surfactant based cleaning compositions | |
| EP2638138B1 (en) | Process for cleaning and label removal for bottles | |
| US8216988B2 (en) | Method of removing enhanced food soil from a surface using a sulfonated alkyl polyglucoside composition | |
| US20220176324A1 (en) | Use of extended surfactants in process membrane cleaning | |
| US6546940B1 (en) | Cleaning composition and method for using the same | |
| US11629312B2 (en) | Solvent application in bottle wash using amidine based formulas | |
| JP2007016263A (en) | Detergent composition for copper or copper alloy | |
| JP2006335896A (en) | Cleaning agent composition for container and cleaning method using the same | |
| CN104593791A (en) | Cleaning solution for high-zinc copper alloy cold-rolled pipes | |
| CA2176336A1 (en) | Additive for use in glass-bottle washing and its use in decreasing glass corrosion | |
| CN100549156C (en) | A kind of clean-out system | |
| JP4163754B2 (en) | Cleaning method for polyethylene terephthalate container | |
| US20220372398A1 (en) | High Alkaline High Foam Cleaners with Controlled Foam Life | |
| JP2007277769A (en) | Cleanser for paper/pulp manufacturing process and cleansing method for paper/pulp manufacturing process system | |
| AU2002341620A1 (en) | Cleaning composition and method for using the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181002 |
|
| WD01 | Invention patent application deemed withdrawn after publication |