CN108529898B - Device for treating glass by wide-width plasma - Google Patents
Device for treating glass by wide-width plasma Download PDFInfo
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- CN108529898B CN108529898B CN201810657512.3A CN201810657512A CN108529898B CN 108529898 B CN108529898 B CN 108529898B CN 201810657512 A CN201810657512 A CN 201810657512A CN 108529898 B CN108529898 B CN 108529898B
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- electrode
- plasma
- gas chamber
- medium blocking
- blocking plate
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/006—Other surface treatment of glass not in the form of fibres or filaments by irradiation by plasma or corona discharge
Abstract
The invention relates to a device for treating glass by wide-width plasma, which comprises a high-frequency high-voltage alternating-current plasma power supply, a gas chamber, a high-voltage electrode arranged at the bottom end outside the gas chamber and two medium blocking plates respectively positioned at two sides of the high-voltage electrode, wherein the gas chamber is provided with at least one air inlet hole and at least one air outlet hole, the high-voltage electrode is connected with the high-frequency high-voltage alternating-current plasma power supply, the outer side end of each medium blocking plate is connected with a first electrode, the two first electrodes are connected with a resistor, and the resistor is connected with the ground electrode. The invention can generate large-area plasma glow discharge under the atmospheric pressure; the plasma between the first electrodes can be led out to a certain width, so that the material surface treatment can be performed sufficiently and efficiently, the method can be applied to an industrial production line, and has important significance for the surface treatment of the plasma material under the atmospheric pressure; can effectively improve the water contact angle of quartz glass, obviously increases the hydrophilicity, and has important significance in changing the hydrophilicity of the glass.
Description
Technical Field
The invention relates to a device for treating glass by broad-width plasma.
Background
With the continuous progress of scientific development, the demands of materials used are increasing, for example, traditional metal or nonmetal materials cannot meet the current demands of production and living, so various material treatment modes are compliant. In recent years, low-temperature plasma material processing has been receiving a great deal of attention, mainly because low-temperature plasma has important value in material processing, not only can change the surface structure of the material, but also can introduce hydrophilic groups such as hydroxyl groups, amino groups and the like, and improve the hydrophilicity and cohesiveness of the material, so that the low-temperature plasma material processing is widely used for changing the surface characteristics of the material.
The discharge patterns at atmospheric pressure are mainly: corona discharge, glow discharge, arc discharge, but corona and arc cannot be used for most materials treatment mainly because local energy and temperature are too high to damage a sample to be treated when arc is generated, and corona discharge is weak, treatment efficiency is too low and is very uneven. The glow discharge has good uniformity under the atmospheric pressure, and can generate plasmas in a large area at the same time, and the material treatment is performed efficiently. In order to prevent the electrodes from being broken down, one or both electrodes need to be covered with an insulating medium to generate plasma, but most dielectric barrier discharge has the disadvantage that wire discharge is easy to generate and is unfavorable for material processing. The surface of quartz glass sold in the current market is basically free of hydrophilicity, but some enterprises begin to pursue quartz glass materials with better hydrophilicity, and the improvement of the hydrophilicity of the glass is one of the hot contents of the current research.
Disclosure of Invention
The invention overcomes the defects of the prior art and provides the device for treating glass by using the wide-width plasma with a simple structure.
In order to achieve the above purpose, the invention adopts the following technical scheme: the device for treating glass by using wide-width plasma comprises a high-frequency high-voltage alternating-current plasma power supply, a gas chamber, a high-voltage electrode arranged at the bottom end outside the gas chamber, and two medium blocking plates respectively arranged at two sides of the high-voltage electrode, wherein at least one air inlet hole and at least one air outlet hole are arranged on the gas chamber, the high-voltage electrode is connected with the high-frequency high-voltage alternating-current plasma power supply, a first electrode is connected with the outer side end of each medium blocking plate, two first electrodes are connected with a resistor, and the resistor is connected with a ground electrode.
In a preferred embodiment of the invention, the device for treating glass by broad-width plasma further comprises a conveying mechanism arranged below the high-voltage electrode, wherein the conveying mechanism comprises a driving roller, a driven roller, a conveying belt and two conveying rollers, the driving roller is connected with a chain wheel assembly, a second electrode is arranged at the bottom end of the conveying belt, and the second electrode is connected with the ground electrode.
In a preferred embodiment of the invention, the apparatus for treating glass with broad width plasma further comprises the air inlet hole with circular shape, and the diameter of the air inlet hole is 6mm.
In a preferred embodiment of the present invention, the apparatus for treating glass with broad-width plasma further includes a plurality of gas outlet holes spaced from the bottom end of the gas chamber, and a distance between adjacent gas outlet holes is 4mm.
In a preferred embodiment of the invention, the apparatus for treating glass with broad width plasma further comprises the air outlet hole which is elliptical, wherein the long diameter of the air outlet hole is 20mm, and the wide diameter of the air outlet hole is 4mm.
In a preferred embodiment of the invention, the device for treating glass by broad-width plasma further comprises a metal capillary and a quartz tube wrapped outside the metal capillary.
In a preferred embodiment of the present invention, the apparatus for treating glass by broad width plasma further comprises the quartz tube having an inner diameter of 1mm, a thickness of 0.5mm and a length of 40mm.
In a preferred embodiment of the present invention, the apparatus for treating glass with broad plasma further comprises a copper tape as the first electrode, and the first electrode is tightly adhered to the dielectric barrier plate.
In a preferred embodiment of the present invention, the apparatus for treating glass with broad width plasma further comprises the second electrode being copper tape, the second electrode having a length of 400mm and a width of 2mm.
The invention solves the defects existing in the background technology, and has the following beneficial effects:
(1) A large area plasma glow discharge can be generated at atmospheric pressure.
(2) The plasma between the first electrodes can be led out to a certain width, the material surface treatment can be performed sufficiently and efficiently, the method can be applied to industrial production lines, and the method has important significance for the surface treatment of the plasma material under the atmospheric pressure.
(3) Can be matched with a speed-regulating conveyor belt to efficiently process materials.
(4) Can effectively improve the water contact angle of quartz glass, obviously increases the hydrophilicity, and has important significance in changing the hydrophilicity of the glass.
Drawings
The invention will be further described with reference to the drawings and examples.
FIG. 1 is a front view of a preferred embodiment of the present invention without a conveyor belt;
FIG. 2 is a side view of a preferred embodiment of the present invention;
FIG. 3 is a periodic image of the current voltage during the discharge period of the preferred embodiment of the present invention;
FIG. 4 is a thermographic image of the discharge phase of a preferred embodiment of the present invention;
FIG. 5 is a graph comparing water contact angles before and after treatment of quartz glass in accordance with a preferred embodiment of the present invention;
fig. 6 is a graph showing a change in water contact angle when quartz glass according to a preferred embodiment of the present invention is conveyed on a conveyor belt and continuously treated at rest.
Detailed Description
The invention will now be described in further detail with reference to the drawings and examples, which are simplified schematic illustrations of the basic structure of the invention, which are presented only by way of illustration, and thus show only the structures that are relevant to the invention.
As shown in fig. 1 and 2, a device for treating glass by using broad-width plasma comprises a high-frequency high-voltage alternating-current plasma power supply 10, a gas chamber 12, a high-voltage electrode 14 arranged at the outer bottom end of the gas chamber 12, and two medium blocking plates 16 respectively positioned at two sides of the high-voltage electrode 14, wherein at least one gas inlet hole 18 and at least one gas outlet hole 20 are arranged on the gas chamber 12, the high-voltage electrode 14 is connected with the high-frequency high-voltage alternating-current plasma power supply 10, the outer end of each medium blocking plate 16 is connected with a first electrode 22, the two first electrodes 22 are connected with a resistor 24, and the resistor 24 is connected with a ground electrode 26.
The gas chamber 12 is preferably made of acrylic material with the thickness of 10mm and the specification of 500 multiplied by 40. The preferred air inlet holes 18 of the invention are circular, the diameter of the air inlet holes 18 is 6mm, and the number of the air inlet holes 18 is two, and the air inlet holes are respectively positioned at the left side and the right side of the air chamber 12. The air outlet hole 20 is preferably elliptical in shape, and the air outlet hole 20 is 20mm in long diameter and 4mm in wide diameter. It is further preferred that the bottom end of the gas chamber 12 is provided with a plurality of gas outlet holes 20 at intervals, and the interval between adjacent gas outlet holes 20 is 4mm.
The preferred high voltage electrode 14 of the present invention comprises a metal capillary 28, a quartz tube 30 encased outside the metal capillary 28. The quartz tube 30 preferably has an inner diameter of 1mm, a thickness of 0.5mm and a total length of 40mm, to which the output of the high-frequency high-voltage alternating-current plasma power supply 10 is connected. The medium barrier plate 16 is preferably a quartz medium barrier plate according to the present invention, and the space between the medium barrier plate 16 and the quartz tube 30 is 1mm. Further preferably, the medium barrier plate 16 has a length of 400mm, a width of 7mm, and a thickness of 1mm. The first electrode 22 is preferably a copper tape, which is tightly adhered to the dielectric barrier 16.
The invention preferably has a conveying mechanism arranged below the high-voltage electrode 14, the conveying mechanism comprises a driving roller 32, a driven roller 34, a conveying belt 36 and two conveying rollers 38, the driving roller 32 is connected with a chain wheel assembly, the bottom end of the conveying belt 36 is provided with a second electrode 40, and the second electrode 40 is connected with the ground electrode 26. It is further preferred that the sprocket assembly includes a drive sprocket 42, a driven sprocket 44, a motor 46 connecting the drive sprocket 42 and the driven sprocket 44, the driven sprocket 44 being fixed to the drive roller 32. The motor 46 is preferably a speed-adjusting motor capable of adjusting the conveying speed of the conveyor belt 36 to 0.1m/s. Preferably, the conveyor 36 is a PVC conveyor. Preferably, the second electrode 40 is a copper tape, the second electrode 40 has a length of 400mm and a width of 5mm, and the second electrode 40 is attached to the bottom end of the conveyor belt 36.
The preferred resistor 24 of the present invention is 2mΩ, which enables the first electrode 22 to be at a higher potential than the ground electrode 26.
The invention preferably adopts a low-temperature plasma experiment power supply with the model of CTP-2000K manufactured by Nanjing Su Man plasma technology Co.
When the invention is used, air pressure is added to 0.1MPa by an air compressor and an air pump, the air is led into the air chamber 12 through the air inlet hole 18, the high-frequency high-voltage alternating-current plasma power supply 10 is connected, when the voltage peak reaches 12KV, glow discharge is carried out in the area between the high-voltage electrode 14 and the two medium blocking plates 16 to generate uniform plasmas, meanwhile, the first electrodes 22 on two sides are connected with the 2MΩ 24 in series, so that the electric potential is higher than that of the lower ground electrode 26, the plasmas are led out from the space between the two first electrodes 22 under the action of air flow and potential difference, a uniform plasma discharge area 89 with a certain width is finally generated below the first electrodes 22, the plasmas in the plasma discharge area 89 can be processed efficiently, and the requirement of various materials can be met under the cooperation of the speed-adjustable conveyor belt 36.
Fig. 3 is a periodic image of current and voltage in the discharge period of the present invention, and it can be seen that high frequency and high voltage ac current can be detected on the electrode, and displacement current can be detected on the electrode, and burrs near the peak on the current image are the generated discharge channels, and as can be seen from the waveform, the peak-to-peak value of the current is larger, and is a glow discharge waveform, not a small current waveform of wire discharge, and it is fully proved that the discharge type is glow discharge, and the material treatment is convenient.
Fig. 4 is a thermal image of the discharge period of the present invention, showing that the temperature at a is 28.02 c, the temperature at b is 29.54 c, and the temperature at c is 29.67 c, the apparatus can generate a low and uniform plasma, and can be effectively used for material treatment.
Fig. 5 is a graph showing a comparison of water contact angles before and after treatment of quartz glass, and it can be seen from the graph that the water contact angle of quartz glass after treatment is significantly improved, and thus hydrophilicity is significantly increased.
FIG. 6 is a graph showing the change of the water contact angle when the quartz glass is processed at a conveying speed of 0.1m/s on a conveyor belt and when the quartz glass is continuously processed at rest, and it can be seen from the graph that the processing is effective once, and then the number of processing times and the processing limit can be increased according to the requirement.
The above-described preferred embodiments according to the present invention are intended to suggest that, from the above description, various changes and modifications can be made by the person skilled in the art without departing from the scope of the technical idea of the present invention. The technical scope of the present invention is not limited to the description, but must be determined according to the scope of claims.
Claims (5)
1. An apparatus for treating glass with broad width plasma, characterized in that: the high-frequency high-voltage alternating-current plasma power supply comprises a high-frequency high-voltage alternating-current plasma power supply, a gas chamber, a high-voltage electrode arranged at the outer bottom end of the gas chamber and two medium blocking plates respectively positioned at two sides of the high-voltage electrode, wherein the gas chamber is provided with at least one air inlet hole and at least one air outlet hole;
the conveying mechanism comprises a driving roller, a driven roller, a conveying belt and two conveying rollers, wherein the driving roller is connected with a chain wheel assembly, a second electrode is arranged at the bottom end of the conveying belt, and the second electrode is connected with the ground electrode;
the air inlet hole is circular, and the diameter of the air inlet hole is 6mm;
the high-voltage electrode comprises a metal capillary tube and a quartz tube wrapped outside the metal capillary tube;
the inner diameter of the quartz tube is 1mm, the thickness of the quartz tube is 0.5mm, and the length of the quartz tube is 40mm;
the first electrode is tightly adhered to the medium blocking plate; the medium blocking plate is a quartz medium blocking plate, and the distance between the medium blocking plate and the quartz tube is 1mm; the length of the medium blocking plate is 400mm, the width of the medium blocking plate is 7mm, and the thickness of the medium blocking plate is 1mm.
2. The apparatus for broad width plasma processing glass as in claim 1, wherein: the bottom of the gas chamber is provided with a plurality of air outlet holes at intervals, and the distance between every two adjacent air outlet holes is 4mm.
3. The apparatus for broad width plasma processing glass as in claim 1, wherein: the air outlet holes are elliptical, and the long diameter of the air outlet holes is 20mm, and the wide diameter of the air outlet holes is 4mm.
4. The apparatus for broad width plasma processing glass as in claim 1, wherein: the first electrode is a copper tape.
5. The apparatus for broad width plasma processing glass as in claim 1, wherein: the second electrode is a copper adhesive tape, and the length of the second electrode is 400mm and the width of the second electrode is 2mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810657512.3A CN108529898B (en) | 2018-06-25 | 2018-06-25 | Device for treating glass by wide-width plasma |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810657512.3A CN108529898B (en) | 2018-06-25 | 2018-06-25 | Device for treating glass by wide-width plasma |
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| CN108529898A CN108529898A (en) | 2018-09-14 |
| CN108529898B true CN108529898B (en) | 2023-10-13 |
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| CN201810657512.3A Active CN108529898B (en) | 2018-06-25 | 2018-06-25 | Device for treating glass by wide-width plasma |
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| CN114286488B (en) * | 2021-12-30 | 2023-02-28 | 南京工业大学 | Atmospheric pressure large-scale DBD material modification device based on gas circuit modularization |
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| CN1283076A (en) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| CN1932132A (en) * | 2006-09-27 | 2007-03-21 | 万京林 | Textile and non-woven cloth plasma surface treating device |
| CN101835336A (en) * | 2010-05-21 | 2010-09-15 | 江苏大学 | Double-dielectric barrier discharge low-temperature plasma generator |
| CN103327722A (en) * | 2013-07-05 | 2013-09-25 | 四川大学 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
| KR20140054676A (en) * | 2012-10-29 | 2014-05-09 | 연세대학교 산학협력단 | Non-thermal plasma device for activating reaction in the gasification and combustion |
| CN204014246U (en) * | 2014-09-02 | 2014-12-10 | 中国工程物理研究院流体物理研究所 | Multilayer dielectricity barrier discharge low-temperature plasma generation device |
-
2018
- 2018-06-25 CN CN201810657512.3A patent/CN108529898B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1283076A (en) * | 1999-07-27 | 2001-02-07 | 松下电工株式会社 | Electrode used for producing plasme body, plasma body processing equipment using said dectrode and plasma body processing using said equipment |
| CN1932132A (en) * | 2006-09-27 | 2007-03-21 | 万京林 | Textile and non-woven cloth plasma surface treating device |
| CN101835336A (en) * | 2010-05-21 | 2010-09-15 | 江苏大学 | Double-dielectric barrier discharge low-temperature plasma generator |
| KR20140054676A (en) * | 2012-10-29 | 2014-05-09 | 연세대학교 산학협력단 | Non-thermal plasma device for activating reaction in the gasification and combustion |
| CN103327722A (en) * | 2013-07-05 | 2013-09-25 | 四川大学 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
| CN204014246U (en) * | 2014-09-02 | 2014-12-10 | 中国工程物理研究院流体物理研究所 | Multilayer dielectricity barrier discharge low-temperature plasma generation device |
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