CN108227408A

CN108227408A - Exposure device and exposure method

Info

Publication number: CN108227408A
Application number: CN201711449976.7A
Authority: CN
Inventors: 加藤正纪
Original assignee: Nikon Corp
Current assignee: Nikon Corp
Priority date: 2013-04-30
Filing date: 2014-03-26
Publication date: 2018-06-29
Anticipated expiration: 2034-03-26
Also published as: JP2020064317A; HK1246405B; JP6662473B2; JP2018081320A; KR102096961B1; KR101924255B1; CN105359040A; KR20200019782A; JP6816814B2; JP2019074769A; JP6638835B2; KR20180128521A; CN107255910B; JPWO2014178244A1; TW201907244A; CN107255910A; TWI681263B; WO2014178244A1; TWI610143B; TW201809909A

Abstract

There is provided a kind of can produce the substrate board treatment of high quality substrate, device making method and light shield with high productivity.Have：Light shield bearing part, in illumination region by along by regulation curvature bending into the first face of cylinder planar in a manner of support the pattern of light shield；Substrate supporting component supports the substrate in view field in a manner of along defined second face；And driving mechanism, it rotates light shield bearing part in a manner of the pattern of light shield to be made to be moved to defined scan exposure direction, and move substrate supporting component in a manner of substrate to be made to be moved to scan exposure direction, light shield bearing part meets 1.3≤L/ φ≤3.8 in the case where the diameter in the first face to be set as to φ, length of first face on the direction orthogonal with scan exposure direction is set as L.

Description

Exposure device and exposure method

The present patent application be international filing date be on March 26th, 2014, international application no PCT/JP2014/058590, National applications number into National Phase in China is 201480037519.5, entitled " substrate board treatment, device manufacture The divisional application of the patent application of method and cylinder light shield ".

Technical field

The present invention relates to project the pattern of light shield to substrate, and expose the processing substrate dress of the pattern on the substrate It puts, device making method and the cylinder light shield for this.

Background technology

There is a kind of device inspection apparatus for manufacturing the various devices such as display devices, the semiconductors such as liquid crystal display.Device system The system of making has the substrate board treatments such as exposure device.Substrate board treatment recorded in patent document l will be configured in lighting area The picture of the pattern formed on light shield in domain projects to configuration substrate in view field etc., and exposes this on substrate Pattern.There are planar light shield, cylindric light shield etc. for the light shield of substrate board treatment.

Existing technical literature

Patent document

Patent document 1：Japanese Unexamined Patent Publication 2007-299918 bulletins

Substrate board treatment can be carried out continuously by the way that light shield is made cylindrical shape and rotates light shield on substrate Exposure.In addition, as substrate board treatment, it is also a kind of that substrate is done into the flake of strip and is continually fed into throwing Roll-to-roll (roll to roll) mode under the domain of shadow zone.In this way, substrate board treatment be with regard to that can rotate the light shield of cylindrical shape, It also,, being capable of continuous conveying substrate and light shield both sides by using roll-to-roll mode as the transport method of substrate.

Here, substrate board treatment is usually required to efficiently to expose pattern on substrate and improves productivity.It uses In the case that cylinder light shield is as light shield and in this way.

Invention content

The purpose of the present invention is to provide it is a kind of can with high productivity come produce the substrate board treatment of high quality substrate, Device making method and cylinder light shield.

First method according to the present invention provides a kind of substrate board treatment, has：Projection optical system, future The light beam of the pattern for the light shield that autogamy is placed in the illumination region of illumination light is projected to the view field for being configured with substrate；Light shield branch Bearing portion part, in illumination region by along by regulation curvature bending into the first face of cylinder planar in a manner of support the figure of light shield Case；Substrate supporting component, in view field in a manner of along defined second face supporting substrates；And driving mechanism, It rotates light shield bearing part in a manner of the pattern of light shield to be made to be moved to defined scan exposure direction, and so that substrate to The mode of the scan exposure direction movement moves substrate supporting component, and light shield bearing part is set as by the diameter in the first face φ, in the case that length of first face on the direction orthogonal with scan exposure direction is set as L, meet 1.3≤L/ φ≤3.8.

Second method according to the present invention provides a kind of device making method, including：Use the base described in first method Plate processing unit forms the pattern of the light shield on the substrate；And supply the substrate to the substrate board treatment.

Third Way according to the present invention provides a kind of cylinder light shield, and electronics is formed with along cylindric peripheral surface The mask pattern of device, and being rotated around center line, the cylinder light shield have a diameter of φ, described of the peripheral surface Length of the peripheral surface on the direction of the center line is the cylinder base material of La, when will be formed in the outer of the cylinder base material Mask pattern on circumferential surface is when the maximum length on the direction of the center line is set as L, described straight in the range of L≤La The ratio L/ φ of the diameter φ and length L are set as the range of 1.3≤L/ φ≤3.8.

Fourth way according to the present invention provides a kind of cylinder light shield, solid along having relative to defined center line The barrel surface for determining radius is formed with mask pattern, and be mounted on exposure device in a manner of it can be rotated around the center line On, wherein, in the barrel surface, arrangement form has n in a manner of the circumferencial direction interval Sx along the barrel surface The rectangular light shield region of (n >=2) display panel, which including long edge size is Ld, short side dimension Lc and Length-width ratio Asp is the display picture area of Ld/Lc and the peripheral circuit area that is disposed adjacently with its periphery, when by the light The size L for covering the long side direction in region is set as the e of the long edge size Ld for showing picture area₁(e again₁>=1), by the light The size for covering the short side direction in region is set as the e of the short side dimension Lc for showing picture area₂(e again₂>=1) when, the cylinder The length on the direction of the center line in face is set as more than the size L, also, works as and set the diameter of the barrel surface For φ, pi is set as π when, be set as π φ=n (e₂Lc+Sx), further, so that the size L and the diameter The ratio L/ φ of φ are that the mode of the range of 1.3≤L/ φ≤3.8 sets the diameter phi, the number n, the interval Sx.

Invention effect

Mode according to the present invention, by by the light shield shape of the cylinder kept by light shield bearing part planar or being formed It is such that above range is set in the diameter phi of cylinder planar shape and the relationship of length L of the pattern on light shield, it can be with height Productivity efficiently carries out the exposure and transfer of device pattern.In addition, by the way that the relationship of diameter phi and length L are set to above-mentioned Range is such, even if in the situation for multi-panel that the pattern of multiple display panels is arranged along the periphery of cylinder light shield Under, the panels of various display sizes also can efficiently be configured.

Description of the drawings

Fig. 1 is the integrally-built figure for the device inspection apparatus for representing first embodiment.

Fig. 2 is the integrally-built figure for the exposure device (substrate board treatment) for representing first embodiment.

Fig. 3 is the figure of the illumination region for representing exposure device shown in Fig. 2 and the configuration of view field.

Fig. 4 is the figure of the structure of the lamp optical system and projection optical system that represent exposure device shown in Fig. 2.

Fig. 5 is the state for the illuminating bundle for representing to be irradiated on cylinder light shield and the projected light beam generated from cylinder light shield State figure.

Fig. 6 is the stereogram for representing to form the Sketch of the cylinder wheel of cylinder light shield and light shield.

Fig. 7 is the configuration represented in the case of the light shield of display panel is configured one side on the light shield face of cylinder light shield The expanded view of example.

Fig. 8 is to represent that the light shield of identical size three forms a line on the light shield face of cylinder light shield and three faces are configured The expanded view of example is configured.

Fig. 9 is to represent that the light shield of identical size four forms a line on the light shield face of cylinder light shield and four sides is configured The expanded view of example is configured.

Figure 10 is to represent that the light shield of identical size is configured four in a manner that two rows two arrange on the light shield face of cylinder light shield The expanded view of the configuration example in face.

Figure 11 is to illustrate that length-width ratio is 2:The expanded view of the configuration example on the configuration two sides of the light shield of 1 display panel.

Figure 12 is defocused under tolerance specifically, diameter and the relationship of exposure slit width of simulation cylinder light shield Chart.

Figure 13 is represented the expanded view of the concrete example in the case of the light shield configuration one side of 60 inches of display panels.

Figure 14 is the expanded view of the configuration example on the configuration two sides for representing light shield.

Figure 15 is the expanded view of the first configuration example on the configuration two sides for the light shield for representing 32 inches of display panels.

Figure 16 is the expanded view of the second configuration example on the configuration two sides for the light shield for representing 32 inches of display panels.

Figure 17 is represented the expanded view of the concrete example in the case of the light shield configuration one side of 32 inches of display panels.

Figure 18 is the expanded view of the concrete configuration example in three face of configuration for the light shield for representing 32 inches of display panels.

Figure 19 is the expanded view of the concrete configuration example in three face of configuration for the light shield for representing 37 inches of display panels.

Figure 20 is the integrally-built figure for the exposure device (substrate board treatment) for representing second embodiment.

Figure 21 is the integrally-built figure for the exposure device (substrate board treatment) for representing third embodiment.

Figure 22 is the flow chart for the device making method for representing to be carried out by device inspection apparatus.

Specific embodiment

About to implement the mode (embodiment) of the present invention, it is described as follows with reference to attached drawing.The present invention not by The restriction of content recorded in implementation below.In addition, in the inscape recorded below, certainly comprising people in the art The element and substantially the same element that member is readily apparent that.Furthermore the inscape recorded below can suitably carry out group It closes.In addition, without departing from the scope of the gist of the present invention, various omissions, displacement or the change of inscape can be carried out.Example Such as, in the following embodiments, it although being illustrated in case of manufacturing flexible display as device, is not limited to This.As device, moreover it is possible to which manufacture is formed with the circuit board of the wiring pattern of the compositions such as copper foil, is formed with multiple semiconductor devices Substrate of part (transistor, diode etc.) etc..

[first embodiment]

In first embodiment, the substrate board treatment that exposure-processed is imposed to substrate is exposure device.In addition, exposure dress It puts to be assembled in apply the substrate after exposure and manufacture in the device inspection apparatus of device in various process.First, device is manufactured System illustrates.

Fig. 1 is the figure of the structure for the device inspection apparatus for representing first embodiment.Device inspection apparatus 1 shown in FIG. 1 It is production line (flexible display production line) of the manufacture as the flexible display of device.As flexible display, such as have Machine EL display etc..The device inspection apparatus 1 sends out the base from the supply that flexible substrate P is wound into a roll to tubular with reel FR1 Plate P, and after continuously being applied in various process to the substrate P sent out, by treated, substrate P is wound up into back as flexible devices It receives and uses on reel FR2, i.e., so-called roll-to-roll (Roll to Roll) mode.In the device inspection apparatus 1 of first embodiment In, it shows and sends out the sheet material of film-form i.e. substrate P, and the substrate sent out from supply with reel FR1 from supply reel FR1 P successively by n platform processing units U1, U2, U3, U4, U5 ... Un and example until being wound to recycling reel FR2. First, the substrate P of the process object to becoming device inspection apparatus 1 illustrates.

Substrate P is such as foil (foil) formed using resin film, the metal or alloy by stainless steel etc..It is thin as resin The material of film, such as including polyvinyl resin, acrylic resin, polyester resin, vinyl copolymer resin, polyvinyl chloride tree Fat, cellulose tree vinegar, polyamide, polyimide resin, polycarbonate resin, polystyrene resin, vinyl acetate resin One or more of.

The preferably selected apparent little material of such as coefficient of thermal expansion of substrate P, so as to substantially ignore to substrate P The deflection generated when heated in the various processing implemented.Coefficient of thermal expansion for example can also be by the way that inorganic filler be mixed Into resin film, and it is set to smaller than the threshold value of corresponding technological temperature etc..Inorganic filler can be such as titanium oxide, oxygen Change zinc, aluminium oxide, silica etc..In addition, the very thin glass that it is 100 μm or so with the thickness of the manufactures such as floating preparation method that substrate P, which can be, The individual layers of glass or the laminated body that above-mentioned resin film, foil etc. are fitted on the very thin glass.

Thus the substrate P formed is scroll-like into reel FR1, and the supply reel for the supply by being wound into FR1 is installed on device inspection apparatus 1.Supply is installed with the device inspection apparatus 1 of reel FR1 to from supply reel The substrate P that FR1 is sent out performs the various processing for manufacturing a device repeatedly.Substrate P that treated as a result, becomes multiple devices The state that part is connected.That is, become the substrate of configuration multi-panel with the substrate P that reel FR1 is sent out from supply.In addition, base Plate P can also be by prespecified pretreatment by the modification of its surface and the substrate activated or be existed with stamped method The substrate of the fine spacer structures (concaveconvex structure) for precise pattern is formd on surface.

Substrate P that treated scroll-like is recovered with reel FR2 as recycling by being wound into.Recycling reel FR2 is installed on cutter device (not shown).The cutter device of recycling reel FR2 is installed by will treated substrate P is split (cutting) by each device and multiple devices is made.About the size of substrate P, such as the width direction (side of short side To) size for 10cm~2m or so, the size of length direction (direction of long side) is more than 10m.In addition, the size of substrate P It is not limited to above-mentioned size.

X-direction, Y-direction and the orthogonal orthogonal coordinate system of Z-direction are formed in Fig. 1.X-direction is in the horizontal plane will supply The direction linked with reel FR1 and recycling reel FR2 is the left and right directions in Fig. 1.Y-direction be in the horizontal plane with X-direction Orthogonal direction is the front-rear direction in Fig. 1.Y-direction is into the axis direction of reel FR1 for the supply and recycling reel FR2.Z Direction is vertically oriented, and is the upper and lower directions in Fig. 1.

Device inspection apparatus 1 has：The substrate feeding device 2 of supplying substrate P；To the base supplied by substrate feeding device 2 Plate P applies processing unit U1~Un in various process；Recycling is returned by the substrate of processing unit U1~Un substrate Ps that impose that treated Receiving apparatus 4；And the host control device 5 of each device of control device manufacture system 1.

Supply reel FR1 is installed on substrate feeding device 2 in a manner of it can rotate.Substrate feeding device 2 has Have and send out the driven roller DR1 of substrate P with reel FR1 from the supply installed and adjust substrate P in width direction (Y-direction) Position marginal position controller EPC1.Driven roller DR1 rotates while the front and back sides that hold substrate P, and by base Plate P is sent out from supply with reel FR1 toward the conveying direction towards recycling reel FR2, so as to which substrate P is supplied to processing unit U1~Un.At this moment, marginal position controller EPC1 so that substrate P in the position at width direction end (edge) relative to target position The mode fallen in the range of ± more than ten μm or so of range to ± tens μm or so is put, substrate P is made to move in the direction of the width, So as to correct the position of substrate P in the direction of the width.

Recycling reel FR2 is installed on substrate retracting device 4 in a manner of it can rotate.Substrate retracting device 4 has Have the driven roller DR2 of treated substrate P pulls to recycling reel FR2 sides and adjustment substrate P in width direction (Y-direction) On position marginal position controller EPC2.4 one side of substrate retracting device is hold the table back of the body two of substrate P by driven roller DR2 Face rotates on one side, and substrate P is pulled to conveying direction, and rotates recycling reel FR2, so as to roll substrate P.At this moment, edge Positioner EPC2 is identical with marginal position controller EPC1 structures, corrects the position of substrate P in the direction of the width, to avoid The end (edge) of the width direction of substrate P is irregular in the direction of the width.

Processing unit U1 is to apply photonasty functional liquid on the surface of substrate P come from the supply of substrate feeding device 2 Applying device.As photonasty functional liquid, for example, using photoresist, (photonasty is close and distant for the silane coupled agent material of photonasty Fluidity modified material, photonasty plating reducing material etc.), UV solidified resin liquid etc..Processing unit U1 is from the conveying direction of substrate P Upstream side rise successively be equipped with applying mechanism Gp1 and drier Gp2.Pressure roller R1s of the applying mechanism Gp1 with winding substrate P, The application roll R2 opposite with pressure roller R1.Applying mechanism Gp1 in a state that the substrate P supplied is wound on pressure roller R1, Substrate P is clamped by pressure roller R1 and application roll R2.Then, applying mechanism Gp1 is by rotating pressure roller R1 and application roll R2, and one While substrate P is made to be moved to conveying direction applies photonasty functional liquid with application roll R2 on one side.Drier Gp2 blows out hot wind or dry The drying such as dry air air makes to be coated with photosensitive sexual function to remove the solute contained in photonasty functional liquid (solvent or water) The substrate P drying of liquid, so as to form photonasty functional layer in substrate P.

Processing unit U2 be in order to make to be formed in the photonasty functional layer on substrate P surface to be stablized, and will be from processing unit The substrate P that U1 is transferred out is heated to the heating unit of set point of temperature (such as several 10~120 DEG C or so).Processing unit U2 is from substrate The upstream side of the conveying direction of P is risen is equipped with heating room HA1 and cooling chamber HA2 successively.It heats room HA1 and is equipped with multiple rollers inside it With multiple air inversion bars (air turn bar), multiple rollers and multiple air inversion bars constitute the transport path of substrate P.It is more A roller is set in a manner of being in rolling contact with the substrate P back side, and multiple air inversion bars are set on the surface of substrate P with contactless state Side.Multiple rollers and multiple air inversion bars are configured to the transport path of bended to lengthen the transport path of substrate P.From In heating room HA1 by substrate P conveyed on one side along the transport path of bended, be heated to set point of temperature on one side.It is cold But room HA2 is in order to make the environment temperature of the temperature of substrate P and subsequent handling (processing unit U3) heated in heating room HA1 Unanimously, substrate P is cooled to environment temperature.Cooling chamber HA2 is equipped with multiple rollers inside it, and multiple rollers and heating room HA1 are same The transport path of bended is configured to sample to lengthen the transport path of substrate P.Out of cooling chamber HA2 by substrate P It is cooled while the transport path along bended is by conveying.It is equipped with and drives in the downstream side of the conveying direction of cooling chamber HA2 Dynamic roller DR3, driven roller DR3 hold on one side rotate on one side by the substrate P after cooling chamber HA2, thus by substrate P direction processing Device U3 is supplied.

Processing unit (substrate board treatment) U3 is to coming from processing unit U2 supplies, being formed with photonasty work(on surface Substrate (photosensitive substrate) P of ergosphere projects the exposure device of the pattern of simultaneously exposure display circuit or wiring etc..It is specific detailed It sees below, processing unit U3 illuminates the cylinder light shield M (cylinder wheel 21) of reflection-type with illuminating bundle, and by illuminating bundle The projected light beam obtained from light shield M reflection projects and is exposed to substrate P.Processing unit U3 has and will be supplied from processing unit U2 The substrate P come is sent to the position of the driven roller DR4 and adjustment substrate P of conveyance direction downstream side in width direction (Y-direction) Marginal position controller EPC3.Driven roller DR4 rotates while the front and back sides that hold substrate P, and by substrate P to conveying Direction downstream side is sent out, so as to supply substrate P to the rotating cylinder (substrate supporting for carrying out stable support to it in exposure position Cylinder) 25.Marginal position controller EPC3 is identical with marginal position controller EPC1 structures, corrects substrate P in the direction of the width Position, so that the width direction of the substrate P on exposure position becomes target location.

In addition, processing unit U3 has buffer part DL, buffer part DL have the substrate P after exposure is paid it is loose Under state, substrate P is sent to two groups of driven rollers DR6, DR7 of conveyance direction downstream side.Two groups of driven rollers DR6, DR7 are in substrate P Conveying direction on be configured with separating predetermined distance.Driven roller DR6 holds the upstream side rotation of transported substrate P, and drives Dynamic roller DR7 holds the downstream side rotation of transported substrate P, thus supplies substrate P to processing unit U4.At this moment, substrate P Due to having been paid relaxation, so the conveying speed generated compared with driven roller DR7 in conveyance direction downstream side can be absorbed Variation, and the variation that can eliminate conveying speed is influenced caused by the exposure-processed of substrate P.In addition, in processing unit U3, it is The picture for making a part for the mask pattern of cylinder light shield M (being also only called light shield M below) relatively aligned with substrate P (be aligned, Alignment), it is equipped with and detects the alignment mark being previously formed in substrate P or be formed in rotating cylinder (substrate supporting cylinder) 25 Collimation microscope AMG1, AMG2 of reference pattern in a part for peripheral surface etc..

Processing unit U4 is the development treatment, non-to carrying out wet type from the substrate P after the exposure that processing unit U3 conveyings come It is electrolysed the wet type processing device of immersion plating processing etc..Processing unit U4 is inside it with vertically (Z-direction) form a social stratum Multiple rollers of three treatment troughs BT1, BT2, BT3 and conveying substrate P.Multiple rollers are with will be in three treatment troughs BT1, BT2, BT3 The mode that portion is formed as the transport path that substrate P is passed sequentially through is configured.It is equipped with and drives in the conveyance direction downstream side for the treatment of trough BT3 Dynamic roller DR8, driven roller DR8 are hold on one side by being rotated while substrate P after treatment trough BT3, so as to supplying substrate P to place Manage device U5.

Though the illustration is omitted, processing unit U5 is the drying device of substrate P drying for making to come from processing unit U4 conveyings. Processing unit U5 removings are attached to the drop in substrate P in processing unit U4 through wet processed, and adjust the moisture of substrate P Content.Processing unit Un is transported to after further via several processing units by the dried substrate Ps of processing unit U5. Then, after being pocessed by processing unit Un, substrate P is winding to the recycling of substrate retracting device 4 on reel FR2.

The pool control base board of host control device 5 feedway 2, substrate retracting device 4 and multiple processing unit U1~ Un.5 control base board feedway 2 of host control device and substrate retracting device 4, by substrate P from substrate feeding device 2 to substrate Retracting device 4 conveys.In addition, host control device 5 and the conveying of substrate P synchronously control multiple processing unit U1~Un System makes it perform the various processing to substrate P.

Then, with reference to exposure devices of the Fig. 2 to Fig. 5 to the processing unit U3 as first embodiment, (processing substrate fills Put) structure illustrate.Fig. 2 be represent first embodiment exposure device (substrate board treatment) it is integrally-built Figure.Fig. 3 is the figure of the illumination region for representing exposure device shown in Fig. 2 and the configuration of view field.Fig. 4 is represented shown in Fig. 2 Exposure device lamp optical system and projection optical system structure figure.Fig. 5 is the illumination for representing to be irradiated on light shield Light beam and the figure of the state of projected light beam projected from light shield.

Exposure device U3 shown in Fig. 2 is so-called scanning-exposure apparatus, is on one side conveyed substrate P along conveying direction, one While the picture for the mask pattern being formed on the peripheral surface of cylindric light shield M is projected and is exposed on the surface of substrate P.In addition, X-direction, Y-direction and the orthogonal orthogonal coordinate system of Z-direction are formed in Fig. 2, is the orthogonal coordinate system identical with Fig. 1.

First, the light shield M (the cylinder light shield M in Fig. 1) for being used for exposure device U3 is illustrated.Light shield M is, for example, to make With the reflection-type light shield of made of metal cylinder.The pattern of light shield M is formed on cylinder base material, which has and make with along Y The peripheral surface (periphery) that radius of curvature centered on the first axle AX1 of direction extension is Rm.The periphery of light shield M becomes and is formed There is light shield face (the first face) P1 of defined mask pattern.Light shield face P1 is included towards prescribed direction with the height of high efficiency the reflected beams Reflecting part and the reflection suppression portion (low reflecting part) not towards prescribed direction reflection or with inefficient the reflected beams.Mask pattern by High reflection portion and reflection suppression portion are formed.As long as here, reflection suppression portion reduces the light reflected towards prescribed direction.Cause This, reflection suppression portion can by light absorbing material, make material or the material for making in addition to specific direction x-ray diffraction that light penetrates It forms.As the light shield M of above structure, exposure device U3 can use the light made of the cylinder base material of the metals such as aluminium or SUS Cover.Therefore, exposure device U3 can be exposed with inexpensive light shield.

In addition, light shield M could be formed with the entirety or a part of panel pattern corresponding with a display device, also may be used To be formed with panel pattern corresponding with multiple display devices.In addition, light shield M can also be in the circle around first axle AX1 The light shield of the configuration multi-panel of multiple panel patterns is concatenated to form in circumferential direction or on the direction parallel with first axle AX1 It is concatenated to form the light shield of the configuration multi-panel of multiple small panel patterns.Furthermore light shield M, which can also be, is formed with the first display The panel of the second display part different from the first display device such as the panel of device pattern and size is formed different with pattern The light shield of the configuration multi-panel of size pattern.In addition, as long as light shield M is Rm with the radius of curvature made centered on first axle AX1 Periphery, be not limited to the shape of cylinder.For example, light shield M can also be the arc-shaped plank with periphery. In addition, light shield M can be lamellar, laminal light shield M bendings can also be made with periphery.

Then, exposure device U3 shown in Fig. 2 is illustrated.Exposure device U3 remove with above-mentioned driven roller DR4, Outside DR6, DR7, substrate supporting cylinder 25, marginal position controller EPC3 and collimation microscope AMG1, AMG2, also kept with light shield Mechanism 11, base supporting mechanism 12, lamp optical system IL, projection optical system PL and slave control device 16.Exposure dress Putting U3 will shine from the illumination light that light supply apparatus 13 projects via a part of lamp optical system IL and projection optical system PL It is incident upon and pattern has been formed by the light shield M of light shield holding cylinder 21 (the hereinafter also referred to cylinder wheel 21) bearing of light shield holding mechanism 11 Light shield face P1 on, and by the projected light beam (imaging) reflected in the light shield face P1 of light shield M via projection optical system PL throw It is incident upon in the substrate P supported by the substrate supporting cylinder 25 of base supporting mechanism 12.

Slave control device 16 controls each section of exposure device U3, and each section is made to perform processing.Slave control device 16 can be part or all of the host control device 5 of device inspection apparatus 1.In addition, slave control device 16 can also It is to be controlled and another device different from host control device 5 by host control device 5.Slave control device 16 for example including Computer.

The first driving portion 22 that light shield holding mechanism 11 has the cylinder wheel 21 for keeping light shield M and rotates cylinder wheel 21. Light shield M is kept into using first axle AX1 as cylinder of the radius of curvature of rotation center for Rm by cylinder wheel 21.First driving portion 22 with Slave control device 16 connects, and cylinder wheel 21 is made to be rotated by rotation center of first axle AX1.

Though in addition, the cylinder wheel 21 of light shield holding mechanism 11 on its peripheral surface by high reflection portion and the direct shape of low reflecting part Into mask pattern, but it is not limited to this structure.Cylinder wheel 21 as light shield holding mechanism 11 can also be along its peripheral surface It winds and keeps laminal reflection-type light shield M.In addition, as light shield holding mechanism 11 cylinder wheel 21 can also will in advance with The plate reflection-type light shield M that radius Rm bends to arc-shaped is maintained on the peripheral surface of cylinder wheel 21 in which can assemble and disassemble.

Base supporting mechanism 12 has：The substrate supporting cylinder 25 of supporting substrates P；Make the second drive that substrate supporting cylinder 25 rotates Dynamic portion 26；A pair of of air inversion bar ATB1, ATB2；And a pair of of deflector roll 27,28.Substrate supporting cylinder 25 is formed as having with along Y The cylindrical shape for the peripheral surface (periphery) that radius of curvature centered on second axis AX2 of direction extension is Rp.Here, first axle AX1 is mutually parallel with the second axis AX2, and will be set as median plane CL by the face of (including) first axle AX1 and the second axis AX2.Base A part for the periphery of plate bearing cylinder 25 becomes the bearing surface P2 of supporting substrates P.That is, substrate supporting cylinder 25 pass through by Substrate P is wound up on its bearing surface P2, and substrate P is made to bend to cylinder planar steadily to be supported.Second driving portion 26 It is connect with slave control device 16, and substrate supporting cylinder 25 is made to be rotated by rotation center of the second axis AX2.A pair of of air inversion bar ATB1, ATB2 and a pair of of deflector roll 27,28 separate substrate supporting cylinder 25 be separately positioned on substrate P conveying direction upstream side and under Swim side.Deflector roll 27 guides the substrate P come from driven roller DR4 conveyings to substrate supporting cylinder 25 via air inversion bar ATB1, and Deflector roll 28 will be guided via the substrate P that substrate supporting cylinder 25 comes from air inversion bar ATB2 conveyings to driven roller DR6.

Base supporting mechanism 12 will be directed into substrate supporting by rotating substrate supporting cylinder 25 by the second driving portion 26 The substrate P side of cylinder 25 is supported by the bearing surface P2 of substrate supporting cylinder 25, while (X-direction) conveys along its length with fixing speed.

At this moment, with the slave control device 16 that the first driving portion 22 and the second driving portion 26 are connect by make cylinder wheel 21 with Substrate supporting cylinder 25 with defined rotary speed than synchronous rotary, and the mask pattern that will be formed on the light shield face P1 of light shield M Projection image it is continuous and surface of repeatedly scan exposure to the substrate P on the bearing surface P2 of substrate supporting cylinder 25 is (suitable The face of periphery bending) on.Exposure device U3, the first driving portion 22 and the second driving portion 26 become the movement of present embodiment Mechanism.In addition, in exposure device U3 shown in Fig. 2, positioned at the part of the conveying direction upstream side of substrate P compared with deflector roll 27 As to the substrate supply unit of the bearing surface P2 supplying substrates P of substrate supporting cylinder 25.On substrate supply unit, can also directly it set Put supply reel FR1 shown in FIG. 1.Similarly, compared with deflector roll 28 positioned at substrate P conveyance direction downstream side part into To recycle the substrate recoverer of substrate P from the bearing surface P2 of substrate supporting cylinder 25.On substrate recoverer, can also directly it set Recycling reel FR2 shown in FIG. 1.

Light supply apparatus 13 projects the illuminating bundle EL1 illuminated to light shield M.Light supply apparatus 13 has light source 31 and leaded light Component 32.Light source 31 is the light source for the light for projecting provision wavelengths.Light source 31 is, for example, lamp sources, the excimer lasers such as mercury vapor lamp Wait the Solid State Lasers light sources such as gas lasers light source, laser diode, light emitting diode (LED).The illumination light example that light source 31 projects The bright line (g lines, h lines, i lines) of ultra-violet (UV) band can be utilized such as in the case where using mercury vapor lamp, is using quasi-molecule laser source In the case of can utilize the far ultraviolet of KrF excimer laser (wavelength 248nm) or ArF excimer laser (wavelength 193nm) etc. Light (DUV light).Here, light source 31 is preferred to project the illuminating bundle EL1 for including the wavelength shorter than i line (wavelength of 365nm).As This illuminating bundle EL1, moreover it is possible to the laser (wavelength 355nm) of the third higher hamonic wave injection used as YAG laser, conduct The laser (wavelength 266nm) that 4th higher hamonic wave of YAG laser projects.

The illuminating bundle EL1 projected from light source 31 is oriented to lamp optical system IL by light guide member 32.Light guide member 32 by The compositions such as the relay module of optical fiber or use speculum.In addition, light guide member 32 is equipped with multiple lamp optical system IL's In the case of, the illuminating bundle EL1 from light source 31 is divided into a plurality of, and a plurality of illuminating bundle EL1 is oriented to multiple illumination lights System IL.The illuminating bundle EL1 that the light guide member 32 of present embodiment makes to project from light source 31 is as defined polarization state Light and be incident upon polarization beam apparatus PBS.Polarization beam apparatus PBS in order to light shield M carry out broadside directive illumination and be arranged on light shield M with Between projection optical system PL, it will be reflected, and become the straight line of P polarization light as the light beam of the rectilinearly polarized light of S-polarization light The light beam of polarised light penetrates.Therefore, light supply apparatus 13, which projects, makes the illuminating bundle EL1 for being incident upon polarization beam apparatus PBS become straight The illuminating bundle EL1 of the light beam of linearly polarized light (S-polarization light).Light supply apparatus 13 projects wavelength and phase to polarization beam apparatus PBS Consistent polarization laser.For example, light supply apparatus 13 makes when the light beam projected from light source 31 is polarised light as light guide member 32 With polarization maintaining optical fibre, carried out in the case of the polarization state of laser for maintaining to export from light supply apparatus 13 guide-lighting.In addition, for example, The light beam that fiber guides can also be used to be exported from light source 31, and the light polarization from optical fiber output is made by polarizer.That is, light Source device 13 can also polarize the light beam of random polarization with polarizer when the light beam of random polarization is guided.In addition, Light supply apparatus 13 can also guide the light beam exported from light source 31 by using the relay optical system of lens etc..

Here, as shown in figure 3, the exposure device U3 of first embodiment is the exposure dress for contemplating so-called poly-lens mode It puts.In addition, the vertical view obtained by the illumination region IR being held in from-Z sides on the light shield M of cylinder wheel 21 is shown in Fig. 3 Figure (left figure of Fig. 3) and the vertical view obtained by the view field PA that is supported in from+Z sides in the substrate P of substrate supporting cylinder 25 Scheme (right figure of Fig. 3).The reference numeral Xs of Fig. 3 represents the moving direction (direction of rotation) of cylinder wheel 21 and substrate supporting cylinder 25. The exposure device U3 of poly-lens mode to multiple (in first embodiment be, for example, six) illumination region IR1 on light shield M~ IR6 is illuminated respectively with illuminating bundle EL1, and each illuminating bundle EL1 is obtained by each illumination region IR1~IR6 reflections A plurality of projected light beam EL2 is projected and is exposed to multiple (being, for example, six in first embodiment) view field PA1 in substrate P ~PA6.

First, to being illustrated by multiple illumination region IR1~IR6 that lamp optical system IL is illuminated.Such as Fig. 3 institutes Show, multiple illumination region IR1~IR6 separate median plane CL, swim be configured with the first lighting area on the light shield M of side in a rotational direction Domain IR1, third illumination region IR3 and the 5th illumination region IR5 are configured with the second photograph on the light shield M in direction of rotation downstream side Area pellucida domain IR2, the 4th illumination region IR4 and the 6th illumination region IR6.Each illumination region IR1~IR6, which becomes, to be had along light shield The parallel short side of axis direction (Y-direction) extension of M and the elongated trapezoid area of long side.At this moment, trapezoidal each illumination region IR1 ~IR6 is located at median plane CL sides as its short side, its long side is located at the region in outside.First illumination region IR1, third lighting area Domain IR3 and the 5th illumination region IR5 are configured with separating predetermined distance in axial direction.In addition, the second illumination region IR2, the 4th Illumination region IR4 and the 6th illumination region IR6 are configured with separating predetermined distance in axial direction.At this moment, the second illumination region IR2 It is configured in axial direction between the first illumination region IR1 and third illumination region IR3.Similarly, third illumination region IR3 exists It is configured in axis direction between the second illumination region IR2 and the 4th illumination region IR4.4th illumination region IR4 is in axial direction It is configured between third illumination region IR3 and the 5th illumination region IR5.5th illumination region IR5 is configured in axial direction Between four illumination region IR4 and the 6th illumination region IR6.Each illumination region IR1~IR6 is so that along the adjacent trapezoidal photograph of Y-direction The triangular part in the bevel edge portion in area pellucida domain is each other in circumferencial direction (X-direction) rotation along light shield M overlapped (overlap) Mode is configured.In addition, in the first embodiment, although each illumination region IR1~IR6 is trapezoid area but it is also possible to be length Square region.

It is formed with the pattern forming region A3 of mask pattern in addition, light shield M has and is not formed the non-figure of mask pattern Case forming region A4.Non- pattern forming region A4 is the low reflector space (reflection suppression portion) for being difficult to indirect illumination light beam EL1, with Mode in the shape of a frame around pattern forming region A3 is configured.First to the 6th illumination region IR1~IR6 forms area with overlay pattern The mode of the overall with of the Y-direction of domain A3 is configured.

Lamp optical system IL and multiple illumination region IR1~IR6 be accordingly equipped with it is multiple (in first embodiment for example It it is six).For multiple lamp optical systems (segmentation lamp optical system) IL1~IL6, injected respectively from light supply apparatus 13 Illuminating bundle EL1.Each illuminating bundle EL1 injected from light supply apparatus 13 is individually directed by each lamp optical system IL1~IL6 Each illumination region IR1~IR6.That is, illuminating bundle EL1 is oriented to the first illumination region by the first lamp optical system IL1 Illuminating bundle EL1 is oriented to the second to the 6th illumination region by IR1, similarly, second to the 6th lamp optical system IL2~IL6 IR2~IR6.Multiple lamp optical system IL1~IL6 separate median plane CL, are being configured with first, third, the 5th illumination region The side (left side of Fig. 2) of IR1, IR3, IR5 are configured with the first lamp optical system IL1, third lamp optical system IL3 and Five lamp optical system IL5.First lamp optical system IL1, third lamp optical system IL3 and the 5th lamp optical system IL5 is configured with separating predetermined distance in the Y direction.In addition, multiple lamp optical system IL1~IL6 separate median plane CL, with The side (right side of Fig. 2) for being equipped with second, the four, the 6th illumination region IR2, IR4, IR6 is configured with the second lamp optical system IL2, the 4th lamp optical system IL4 and the 6th lamp optical system IL6.Second lamp optical system IL2, the 4th light optics System IL4 and the 6th lamp optical system IL6 are configured with separating predetermined distance in the Y direction.At this moment, the second lamp optical system IL2 is configured in axial direction between the first lamp optical system IL1 and third lamp optical system IL3.Similarly, third is shone Bright optical system IL3, the 4th lamp optical system IL4, the 5th lamp optical system IL5 are arranged respectively at second in axial direction Between lamp optical system IL2 and the 4th lamp optical system IL4, third lamp optical system IL3 and the 5th illumination optical system Between system IL5, between the 4th lamp optical system IL4 and the 6th lamp optical system IL6.In addition, the first lamp optical system IL1, third lamp optical system IL3 and the 5th lamp optical system IL5 and the second lamp optical system IL2, the 4th illumination light System IL4 and the 6th lamp optical system IL6 are symmetrically configured from the point of view of Y-direction.

Then, each lamp optical system IL1~IL6 is illustrated with reference to Fig. 4.Further, since each lamp optical system The structure of IL1~IL6 is identical, thus by taking the first lamp optical system IL1 (hereinafter referred merely to as lamp optical system IL) as an example into Row explanation.

Lamp optical system IL in order to be illuminated with uniform illumination to illumination region IR (the first illumination region IR1), And the illuminating bundle EL1 of the light source 31 from light supply apparatus 13 is subjected to Kohler illumination to the illumination region IR on light shield M.Separately Outside, illumination optical system IL becomes the broadside directive lighting system using polarization beam apparatus PBS.Lamp optical system IL is from from light supply apparatus The light incident side of 13 illuminating bundle EL1 rises has illumination optics module ILM, polarization beam apparatus PBS and 1/4 wavelength plate 41 successively.

As shown in figure 4, illumination optics module ILM from the light incident side of illuminating bundle EL1 includes collimation lens 51, answers successively Eyelens 52, multiple collector lenses 53, cylindrical lens 54, illumination visual field aperture 55 and relay lens system 56, and it is arranged on the On one optical axis BX1.The incident light projected from light guide member 32 of collimation lens 51, and irradiate fly's-eye lens 52 light incident side it is entire Face.The center configuration in the face of the emitting side of fly's-eye lens 52 is on primary optic axis BX1.The generation auto-collimation in future of fly's-eye lens 52 is saturating The illuminating bundle EL1 of mirror 51 is divided into the area source picture of multiple point light source pictures.Illuminating bundle EL1 is generated from the area source picture.This When, generate the fly's-eye lens 52 of point light source picture emitting side face by from fly's-eye lens 52 via illumination visual field aperture 55 to rear The various lens of the first concave mirror 72 of the projection optical system PL stated, with the pupil where with the reflecting surface of the first concave mirror 72 The mode that face is optically conjugated is configured.Optical axis set on the collector lens 53 of 52 emitting side of fly's-eye lens is configured in primary optic axis On BX1.Collector lens 53 is illuminating the light of each from the multiple point light source pictures for being formed in 52 emitting side of fly's-eye lens It is overlapped on visual field aperture 55, and illumination visual field aperture 55 is irradiated with uniform Illumination Distribution.Illumination visual field aperture 55 has and Fig. 3 Trapezoidal or rectangular rectangular aperture portion similar shown illumination region IR, the center configuration of the opening portion is in primary optic axis On BX1.By being arranged on from the relay lens system (imaging system) 56 illuminated in visual field aperture 55 to the light path of light shield M, partially Shake beam splitter PBS, 1/4 wavelength plate 41, and the opening portion of illumination visual field aperture 55 is made to be configured to and the illumination region on light shield M IR is the relationship being optically conjugated.Relay lens system 56 by be configured along primary optic axis BX1 multiple lens 56a, 56b, 56c, 56d are formed, and be will transmit through the illuminating bundle EL1 behind the opening portion of illumination visual field aperture 55 and are irradiated via polarization beam apparatus PBS Illumination region IR on to light shield M.On the emitting side of collector lens 53 and the position adjacent with illumination visual field aperture 55, it is equipped with Cylindrical lens 54.Cylindrical lens 54 is the piano convex cylindrical lens that light incident side is plane, emitting side is dome cylinder lens face.Cylinder is saturating The optical axis of mirror 54 is configured on primary optic axis BX1.Cylindrical lens 54 makes the illuminating bundle irradiated to the illumination region IR on light shield M Each chief ray of EL1 is restrained in XZ faces, and in the Y direction into parastate.

Polarization beam apparatus PBS is configured between illumination optics module ILM and median plane CL.Polarization beam apparatus PBS is with wave battle array Face divisional plane is reflected as the light beam of the rectilinearly polarized light of S-polarization light, and become the light beam of the rectilinearly polarized light of P polarization light Through.If here, the illuminating bundle EL1 for being incident upon polarization beam apparatus PBS to be set as to the rectilinearly polarized light of S-polarization light, illuminate Light beam EL1 is reflected by the division of wave front face of polarization beam apparatus PBS, becomes circularly polarized light and irradiation light through 1/4 wavelength plate 41 Cover the illumination region IR on M.The projected light beam EL2 of illumination region IR reflections on light shield M passes through again by 1/4 wavelength plate 41 and be in line P polarization light from circularly polarized light conversion, the division of wave front face through polarization beam apparatus PBS and towards projection optics System PL.Polarization beam apparatus PBS will preferably be incident upon most of reflection of the illuminating bundle EL1 in division of wave front face, and make throwing The most of of shadow light beam EL2 penetrates.Polarization separation characteristic on the division of wave front face of polarization beam apparatus PBS is with extinction ratio table Show, but since the extinction ratio also can be because changing, so division of wave front face during the incidence angle of the light towards division of wave front face Characteristic by imaging performance in practical use influence will not become problem in a manner of, be also contemplated for illuminating bundle EL1 and projection It is designed in the case of the NA (opening number) of light beam EL2.

Fig. 5 is illuminating bundle EL1 in the illumination region IR being emitted onto on light shield M and is reflected by illumination region IR The action of the projected light beam EL2 figure that amplification represents in XZ faces (face vertical with first axle AX1).As shown in figure 5, above-mentioned illumination Optical system IL becomes the side of telecentricity (collateral series) with the chief ray of projected light beam EL2 reflected by the illumination region IR of light shield M Formula, each chief ray for being emitted onto illuminating bundle EL1 in the illumination region IR of light shield M are (vertical with first axle AX1 in XZ faces Face) in be purposely set as the state of non-telecentricity, and the state of telecentricity is set as in YZ faces (parallel with median plane CL).Illuminating bundle This characteristic of EL1 is assigned by the cylindrical lens 54 shown in Fig. 4.

Specifically, pass through simultaneously court setting the point Q1 from the circumferencial direction center of the illumination region IR on the P1 of light shield face After intersection point Q2 (1/2 radial location) between 1/2 circle of radius Rm that the line and radius of first axle AX1 are light shield face P1, In a manner of making each chief ray by the illuminating bundle EL1 of illumination region IR in XZ faces towards intersection point Q2, setting cylinder is saturating The curvature of the dome cylinder lens face of mirror 54.Thus, each chief ray in the projected light beam EL2 of illumination region IR internal reflections exists In XZ faces become with from first axle AX1, point Q1, intersection point Q2 by straight line parallel (telecentricity) state.

Then, to being illustrated by multiple view field PA1~PA6 of projection optical system PL projection exposures.Such as Fig. 3 institutes Show, the configurations corresponding with multiple illumination region IR1~IR6 on light shield M of multiple view field PA1~PA6 in substrate P.Also It is to say, multiple view field PA1~PA6 in substrate P separate median plane CL, swim be configured in the substrate P of side in the conveying direction There are the first view field PA1, third view field PA3 and the 5th view field PA5, in the substrate P of conveyance direction downstream side It is configured with the second view field PA2, the 4th view field PA4 and the 6th view field PA6.Each view field PA1~PA6 becomes With the short side of width direction (Y-direction) extension along substrate P and elongated trapezoidal (rectangular-shaped) region of long side.At this moment, it is terraced Each view field PA1~PA6 of shape is located at median plane CL sides as its short side, its long side is located at the region in outside.First projection Region PA1, third view field PA3 and the 5th view field PA5 are configured with separating predetermined distance in the direction of the width.In addition, Second view field PA2, the 4th view field PA4 and the 6th view field PA6 match with separating predetermined distance in the direction of the width It puts.At this moment, the second view field PA2 is configured in axial direction between the first view field PA1 and third view field PA3. Similarly, third view field PA3 is configured in axial direction between the second view field PA2 and the 4th view field PA4.The Four view field PA4 are configured in axial direction between third view field PA3 and the 5th view field PA5.5th projected area Domain PA5 is configured in axial direction between the 4th view field PA4 and the 6th view field PA6.Each view field PA1~PA6 In the same manner as each illumination region IR1~IR6 so that along the bevel edge portion of the adjacent trapezoidal projection region PA of Y-direction triangular part that This mode that (overlap) is overlapped on the conveying direction of substrate P is configured.At this moment, view field PA becomes and makes in adjacent projections Light exposure in the repeat region of the region PA shape substantially identical with the light exposure in not repeat region.Moreover, first to 6th view field PA1~PA6 is configured in a manner that the overall with of the Y-direction of the exposure area being exposed in substrate P A7 is covered.

Herein, in Fig. 2, when being observed in XZ faces, the central point of the slave illumination region IR1 (and IR3, IR5) on light shield M is extremely Circumferential length until the central point of illumination region IR2 (and IR4, IR6) be set to in the substrate P of bearing surface P2 from Circumferential length until the central point to the central point of view field PA2 (and PA4, PA6) of view field PA1 (and PA3, PA5) It is substantially equal.

Projection optical system PL and multiple view field PA1~PA6 be correspondingly arranged on it is multiple (in first embodiment for example It it is six).Multiple projection optical systems (segmentation projection optical system) PL1~PL6 is injected respectively from multiple illumination regions Multiple projected light beam EL2 of IR1~IR6 reflections.Each projection optical system PL1~PL6 will be by each projected light beam of light shield M reflection EL2 is individually directed each view field PAl~PA6.That is, the first projection optical system PL1 will come from the first illumination region The projected light beam EL2 of IR1 is oriented to the first view field PA1, and similarly, second to the 6th projection optical system PL2~PL6 is in the future Each projected light beam EL2 of from second to the 6th illumination region IR2~IR6 is oriented to second to the 6th view field PA2~PA6.It is more A projection optical system PL1~PL6 separates median plane CL, is being configured with first, third, the 5th view field PA1, PA3, PA5 Side (left side of Fig. 2) be configured with the first projection optical system PL1, third projection optical system PL3 and the 5th projection optics System PL5.First projection optical system PL1, third projection optical system PL3 and the 5th projection optical system PL5 are in the Y direction It is configured with separating predetermined distance.In addition, multiple projection optical system PL1~PL6 separate median plane CL, it is being configured with second, 4th, the side (right side of Fig. 2) of the 6th view field PA2, PA4, PA6 is configured with the second projection optical system PL2, the 4th projection Optical system PL4 and the 6th projection optical system PL6.Second projection optical system PL2, the 4th projection optical system PL4 and Six projection optical system PL6 are configured with separating predetermined distance in the Y direction.At this moment, the second projection optical system PL2 is in axis direction On be configured between the first projection optical system PL1 and third projection optical system PL3.Similarly, third projection optical system PL3, the 4th projection optical system PL4, the 5th projection optical system PL5 are respectively arranged at the second projection optics system in axial direction Unite between PL2 and the 4th projection optical system PL4, between third projection optical system PL3 and the 5th projection optical system PL5, And the 4th between projection optical system PL4 and the 6th projection optical system PL6.In addition, the first projection optical system PL1, Three projection optical system PL3 and the 5th projection optical system PL5 and the second projection optical system PL2, the 4th projection optical system PL4 and the 6th projection optical system PL6 are symmetrically configured in terms of Y-direction.

Again, each projection optical system PL1~PL6 is illustrated with reference to Fig. 4.Further, since each projection optical system PL1~PL6 is identical structure, thus by taking the first projection optical system PL1 (hereinafter referred merely to as projection optical system PL) as an example into Row explanation.

Projection optical system PL is by the picture of the mask pattern in the illumination region IR (the first illumination region IR1) on light shield M In projection to the view field PA in substrate P.Projection optical system PL is from the light incident side of the projected light beam EL2 from light shield M There is 1/4 above-mentioned wavelength plate 41, above-mentioned polarization beam apparatus PBS and projection optical module PLM successively.

1/4 wavelength plate 41 and polarization beam apparatus PBS and lamp optical system IL dual-purposes.In other words, lamp optical system IL 1/4 wavelength plate 41 and polarization beam apparatus PBS are shared with projection optical system PL.

The projected light beam EL2 reflected by illumination region IR becomes telecentricity state (state that each chief ray is mutually parallel), and It is incident upon projection optical system PL.The projected light beam EL2 as circularly polarized light reflected by illumination region IR is by 1/4 wavelength Plate 41 is incident upon polarization beam apparatus PBS after circularly polarized light is converted into rectilinearly polarized light (P polarization light).It is incident upon polarization Projected light beam EL2 in beam splitter PBS is incident upon projection optical module PLM after through polarization beam apparatus PBS.

Projection optical module PLM is correspondingly arranged with illumination optics module ILM.That is, the first projection optical system PL1 The first illumination regions for will being illuminated by the illumination optics module ILM of the first lamp optical system IL1 of projection optical module PLM The picture of the mask pattern of IR1 projects the first view field PA1 to substrate P.Similarly, the second to the 6th projection optical system The projection optical module LM of PL2~PL6 will be shone by the illumination optics module ILM of second to the 6th lamp optical system IL2~IL6 The picture of bright second to the mask pattern of the 6th illumination region IR2~IR6 projects the second to the 6th view field to substrate P PA2~PA6.

As shown in figure 4, projection optical module PLM has：During the picture of mask pattern in illumination region IR is imaged in Between the first optical system 61 on image planes P7；By at least part reimaging of intermediary image being imaged by the first optical system 61 in The second optical system 62 in the view field PA of substrate P；And projection of the configuration on the intermediate image plane P7 for forming intermediary image Visual field aperture 63.In addition, projection optical module PLM, which has focus, corrects optical component 64, as switching optical component 65, multiplying power It corrects with optical component 66, rotation correction mechanism 67 and polarization adjustment mechanism (polarization adjustment device) 68.

First optical system 61 and the second optical system 62 are, for example, wear the telecentricity after gloomy (Dyson) system variant catadioptric Penetrate optical system.The optical axis (hereinafter referred to as the second optical axis BX2) of first optical system 61 is substantially orthogonal relative to median plane CL. First optical system 61 has the first deviation component 70, the first lens group 71 and the first concave mirror 72.First, which is biased to component 70, is Prism with the first reflecting surface P3 and the second reflecting surface P4.First reflecting surface P3, which becomes, to be made from polarization beam apparatus PBS's Projected light beam EL2 reflects, and reflected projected light beam EL2 is made to be incident upon the first concave mirror 72 after by the first lens group 71 Face.Second reflecting surface P4 becomes for being penetrated after by the first lens group 71 by the projected light beam EL2 that the first concave mirror 72 reflects Enter, and the face that the projected light beam EL2 injected is reflected towards projection visual field aperture 63.First lens group 71 includes various Mirror, and the optical axis of various lens is configured on the second optical axis BX2.The pupil in the first optical system 61 is configured in first concave mirror 72 On face, and it is set to being the relationship being optically conjugated by multiple point light source pictures that fly's-eye lens 52 generates.

The first reflecting surface P3 that projected light beam EL2 from polarization beam apparatus PBS is biased to component 70 by first reflects, and The first concave mirror 72 is incident upon after top half area of visual field by the first lens group 71.It is incident upon the throwing of the first concave mirror 72 Shadow light beam EL2 is reflected by the first concave mirror 72, and is incident upon after the lower half portion area of visual field by the first lens group 71 One is biased to the second reflecting surface P4 of component 70.The projected light beam EL2 for being incident upon the second reflecting surface P4 is reflected by the second reflecting surface P4, And projection visual field aperture 63 is incident upon after by focus amendment optical component 64 and as switching optical component 65.

Projecting visual field aperture 63 has the opening of shape of regulation view field PA.That is, the opening of projection visual field aperture 63 Shape provide the essential shape of view field PA.Therefore, in opening the illumination visual field aperture 55 in lamp optical system IL Mouthful shape when being set as similar to the essential shape of view field PA trapezoidal, projection visual field aperture 63 can be omitted.

Second optical system 62 is identical structure with the first optical system 61, and separates intermediate image plane P7 and the first optical system System 61 is symmetrical arranged.The optical axis (hereinafter referred to as third optical axis BX3) of second optical system 62 relative to median plane CL substantially just It hands over, and parallel with the second optical axis BX2.It is recessed that second optical system 62 has the second deviation component 80, the second lens group 81 and second Face mirror 82.Second, which is biased to component 80, has third reflecting surface P5 and the 4th reflecting surface P6.Third reflecting surface P5, which becomes, to be made to haul oneself willingly into The projected light beam EL2 reflections of video display open country aperture 63, and reflected projected light beam EL2 is made to be injected after by the second lens group 81 To the face of the second concave mirror 82.4th reflecting surface P6 become for by the projected light beam EL2 that the second concave mirror 82 reflects by the It is injected after two lens groups 81, and the face that the projected light beam EL2 injected is reflected towards view field PA.Second lens group 81 is wrapped Various lens are included, and the optical axis of various lens is configured on third optical axis BX3.Second concave mirror 82 is configured in the second optical system On 62 pupil plane, and the multiple point light source pictures being set to and image on the first concave mirror 72 are the relationship being optically conjugated.

The third reflecting surface P5 that projected light beam EL2 from projection visual field aperture 63 is biased to component 80 by second reflects, and The second concave mirror 82 is incident upon after the top half area of visual field by the second lens group 81.It is incident upon the second concave mirror 82 Projected light beam EL2 is reflected by the second concave mirror 82, and is incident upon after the lower half portion area of visual field by the second lens group 81 Second is biased to the 4th reflecting surface P6 of component 80.The projected light beam EL2 for being incident upon the 4th reflecting surface P6 is anti-by the 4th reflecting surface P6 It penetrates, and view field PA is projected to after by multiplying power amendment optical component 66.Mask pattern in illumination region IR as a result, Picture by with equimultiple (× 1) projection to view field PA.

Focus is corrected optical component 64 and is configured between the first deviation component 70 and projection visual field aperture 63.Focus corrects light The adjustment of department of the Chinese Academy of Sciences's part 64 is projected to the focus state of the picture of the mask pattern in substrate P.It is for example to make that focus, which corrects optical component 64, Two panels prism wedge is reverse (being reverse relative to X-direction in Fig. 4), and is overlapped in a manner of integrally becoming transparent parallel flat Obtained from component.By making this pair of of prism in the state of the interval between not changing face relative to each other along bevel direction It slides, and makes the variable thickness as parallel flat.The actual effect optical path length of the first optical system 61 is finely adjusted as a result, So as to be finely adjusted to the focusing state of the picture of mask pattern being formed in intermediate image plane P7 and view field PA.

It is biased between component 70 and projection visual field aperture 63 first as switching optical component 65 is configured.As switching is used up Department of the Chinese Academy of Sciences's part 65 is can make the picture of the mask pattern in projection to substrate P be adjusted in a manner of movement to it in image planes.Picture Switching optical component 65 by can the tilted transparent parallel plate glass in the XZ faces of Fig. 4, with can be in the YZ faces introversion of Fig. 4 Oblique transparent parallel plate glass is formed.By adjusting each tilt quantity of this two panels parallel plate glass, can make to be formed in Intermediate image plane P7 and the picture of the mask pattern in view field PA move (shift) a little in X-direction or Y-direction.

Multiplying power amendment optical component 66, which is configured, is biased to second between component 80 and substrate P.Multiplying power amendment optical section Part 66 is for example configured to concavees lens, convex lens, this three pieces of concavees lens arranged coaxial, and front and rear concavees lens are at predetermined intervals It is fixed, intermediate convex lens is made to be moved on optical axis (chief ray) direction.The light shield figure being formed in as a result, in view field PA The picture of case only micro zooms in or out to the sides' of grade property while the image formation state for maintaining telecentricity.It is used in addition, forming multiplying power amendment The optical axis of the three pieces lens group of optical component 66 is tilted in XZ faces in a manner of parallel with the chief ray of projected light beam EL2.

Rotation correction mechanism 67 is, for example, to make the first deviation component 70 around parallel with Z axis by actuator (diagram is omited) The mechanism that axis rotates a little.The rotation correction mechanism 67 can make to be formed in intermediary image by the rotation of the first deviation component 70 The picture of mask pattern on the P7 of face rotates a little in intermediate image plane P7.

Polarization adjustment mechanism 68 is, for example, to make 1/4 wavelength plate 41 around the axis orthogonal with plate face by actuator (diagram is omited) Rotate the mechanism to adjust polarization direction.Polarization adjustment mechanism 68 can be by making the rotation of 1/4 wavelength plate 41 be projected to adjust The illumination of the projected light beam EL2 of view field PA.

In projection optical system PL configured as described above, the projected light beam EL2 from light shield M is from illumination region IR with telecentricity State (state that each chief ray is mutually parallel) project, and be incident upon after by 1/4 wavelength plate 41 and polarization beam apparatus PBS First optical system 61.The projected light beam EL2 of the first optical system 61 is incident upon by the first bias portion of the first optical system 61 The first reflecting surface (plane mirror) P3 reflections of part 70, and reflected after by the first lens group 71 by the first concave mirror 72.By The projected light beam EL2 of one concave mirror 72 reflection is again by the second reflecting surface for being biased to component 70 by first after the first lens group 71 (plane mirror) P4 reflects, and the projection visual field is incident upon after through focus amendment optical component 64 and as switching optical component 65 Aperture 63.The of component 80 is biased to by the second of the second optical system 62 by projecting the projected light beam EL2 after visual field aperture 63 Three reflectings surface (plane mirror) P5 reflects, and is reflected after by the second lens group 81 by the second concave mirror 82.By the second concave mirror The projected light beam EL2 of 82 reflections is again by the 4th reflecting surface (plane mirror) for being biased to component 80 by second after the second lens group 81 P6 reflects, and is incident upon multiplying power amendment optical component 66.It is penetrated from multiplying power amendment with the projected light beam EL2 that optical component 66 projects Enter the view field PA to substrate P, and the picture for appearing in the mask pattern in illumination region IR is projected extremely with equimultiple (× 1) View field PA.

In the present embodiment, although the first the second reflecting surface (plane mirror) P4 and second for being biased to component 70 is biased to component 80 third reflecting surface (plane mirror) P5 becomes tilts 45 ° of face relative to median plane CL (or optical axis BX2, BX3), but first partially The 4th reflecting surface (plane mirror) P6 of component 80 is biased in the first reflecting surface (plane mirror) P3 of component 70 and second Heart face CL (or optical axis BX2, BX3) is set to the angle in addition to 45 °.In Fig. 5, point Q1, intersection point Q2, first axle will passed through When the straight line of AX1 is set as θ s ° with median plane CL angulations, first is biased to the first reflecting surface P3 of component 70 relative to center The angle [alpha] ° (absolute value) of face CL (or optical axis BX2) is confirmed as the relationship of α °=45 °+θ s °/2.Similarly, will be from substrate Support cylinder 25 peripheral surface circumferencial direction on view field PA in central point by projected light beam EL2 chief ray with When angles of the median plane CL in ZX faces is set as ε s °, second be biased to component 80 the 4th reflecting surface P6 relative to median plane CL (or Second optical axis BX2) angle beta ° (absolute value) be confirmed as the relationships of β °=45 °+ε s °/2.

Then, using Fig. 6 and Fig. 7 to the cylinder wheel of the light shield holding mechanism 11 in the exposure device U3 of first embodiment The structure of (light shield holding cylinder) 21 and light shield M illustrates.Fig. 6 is the light shield for representing cylinder wheel 21 and being formed on its peripheral surface The stereogram of the outline structure of M.Fig. 7 is the outline knot for representing the light shield face P1 when peripheral surface by cylinder wheel 21 is launched into plane The expanded view of structure.

In the present embodiment, light shield M is set as to the thin slice light shield of reflection-type, although being either wound in cylinder wheel 21 In the case of on peripheral surface or with metal cylinder base material formed cylinder wheel 21 and on the peripheral surface of cylinder base material it is straight Connecing can be applicable in the case of forming reflection-type mask pattern, but here for simplicity, be illustrated with the situation of the latter.Such as elder generation Shown in preceding Fig. 3, the light shield M on peripheral surface (diameter phi) the i.e. light shield face P1 of cylinder wheel 21 is formed in by pattern forming region A3 It is formed with non-pattern forming region (shading region) A4.Fig. 6, light shield M shown in fig. 7 via projection optical system PL1~ A3 pairs of pattern forming region in the exposure area A7 in projection to substrate P in each view field PA1~PA6 and Fig. 3 of PL6 It should.Light shield M (pattern forming region A3) though be formed in the substantially the entire area of the circumferencial direction of 21 peripheral surface of cylinder wheel, When the width (length) in the direction (Y-direction) parallel with first axle AX1 is set as L, than 21 peripheral surface of cylinder wheel and first axle The length La in direction (Y-direction) parallel AX1 is small.In addition, in this case, light shield M is not outside cylinder wheel 21 It is tightly configured in the range of 360 ° of circumferential surface, but the remaining white portion 92 for separating predetermined size in a circumferential direction is set.Therefore, this is remaining The terminal and beginning of the both ends of the circumferencial direction in white portion 92 and light shield M (pattern forming region A3) on scan exposure direction are corresponding.

In addition, in Fig. 6, the axis SF coaxial with first axle AX1 is equipped on the both ends face of cylinder wheel 21.Axis SF is via setting It puts the bearing on the specified position in exposure device U3 and carrys out supporting cylinder wheel 21.Bearing uses and has used metal balls or needle roller Deng contact or hydrostatic gas-lubricated bearing etc it is contactless.It further, can also be in the peripheral surface (light of cylinder wheel 21 Cover P1) in, in each end regions in the parallel Y-directions of first axle AX1 compared with the region of light shield M in the outer part, Grating (the encoder for the rotary angle position of accurately measure cylinder wheel 21 (light shield M) is upwardly formed in whole circumference side scale).It will can also carve to be equipped with and coaxially be fixed with axis SF for measuring the scale plectane of the grating of rotary angle position.

Here, Fig. 7 is the shape being unfolded after the peripheral surface of the cylinder wheel 21 of Fig. 6 is cut off with the cutting line 94 in remaining white portion 92 State.In addition, in the following description, orthogonal with Y-direction direction in the state of after peripheral surface is unfolded is set as θ directions.Such as Fig. 7 It is shown, due to a diameter of φ, so by pi be set as π then light shield face P1 whole circumference length be π φ.In addition, relative to Overall length La on the direction parallel with first axle AX1 of light shield face P1, light shield M (pattern forming region A3) with first axle AX1 Length L in parallel Y-direction is formed with L≤La, and is formed on θ directions with length Lb.From the whole circumference of light shield face P1 Length π φ subtract total size that the length after length Lb is the θ directions in remaining white portion 92.Y-direction in remaining white portion 92 it is each In a distributed locations, be also formed with for carry out light shield M contraposition alignment mark.

Here, light shield M shown in Fig. 7 is the light shield for being used to form pattern, the pattern in liquid crystal display, organic EL with showing Show that one of display panel used in device etc. is corresponding.In this case, as the pattern being formed on light shield M, to be formed makes to show Show the TFT electrodes of each pixel driver of the display picture of panel or the pattern of wiring, each picture for showing picture of display device The pattern of element and the pattern of the colored filter of display device and black matrix" etc..As shown in fig. 7, in light shield M (pattern shapes Into region A3) on, exist equipped with the display picture area DPA and configuration for forming pattern corresponding with the display picture of display panel Show around picture area DPA and formed the peripheral circuit area TAB of the pattern of the circuit for driving display picture etc..

The size of display picture area DPA on light shield M and the size (diagonal of the display unit for the display panel to be manufactured The inch dimension of length Le) it is corresponding, in the feelings that the projection multiplying power of Fig. 2, projection optical system PL shown in Fig. 4 are equimultiple (× 1) Under condition, the actual size (catercorner length Le) of the display picture area DPA on light shield M is as the practical inch for showing picture Size.In the present embodiment, the rectangle that display picture area DPA is long side Ld and short side Lc, long side Ld and short side Lc's Length ratio (length-width ratio) is Ld in typical example:Lc=16:9 or Ld:Lc=2:1.Length-width ratio 16:9 be so-called high picture The aspect ratio of picture that matter size (wide size) uses.In addition, length-width ratio 2:1 is known as the picture of display (scope) size The aspect ratio in face is length-width ratio used in the superelevation image quality size of 4K2K in TV set image.For example, if length and width Than being 16:9 and if display panel of the picture dimension for 50 inches (Le=127cm), then the display picture area on light shield M The long side Ld of DPA is about 110.7cm, short side Lc is about 62.3cm.If in addition, same frame size (50 inches) and length-width ratio It is 2:If 1, then the long side Ld that shows picture area DPA is about 113.6cm, short side Lc is about 56.8cm.

As shown in fig. 7, by the light shield M of a display panel (including display picture area DPA and peripheral circuit area TAB in the case of) being formed on the peripheral surface of cylinder wheel 21, preferably with show the direction of the long side Ld of picture area DPA become θ The mode in direction (circumferencial direction of cylinder wheel 21) is configured.This is because the diameter phi of cylinder wheel 21 need not be made too small, without The reason for making the length La in the first axle AX1 directions of cylinder wheel 21 excessive.Herein, it lifts one and includes peripheral circuit area TAB's The example of the size (Lb × L) of light shield M including width dimensions.Though the width dimensions of peripheral circuit area TAB can be because of circuit knot Structure and have various different situations, but can be by the peripheral circuit of two end side of Y-direction for being located at display picture area DPA in Fig. 7 The 10% of total Y-direction length Lc for being set as display picture area DPA of the width of the Y-direction of region TAB, and display will be located at The total of the width in the θ directions of the peripheral circuit area TAB of two end side of θ directions of picture area DPA is set as display picture area The 10% of the θ directions length Ld of DPA.

In this case, in length-width ratio 16:In 9 50 inches of display panels, the long side Lb of light shield M is 121.76cm, short Side L is 68.49cm.Since size of the remaining white portion 92 on θ directions is more than zero, thus the diameter phi of cylinder wheel 21 according to φ >= The calculating of Lb/ π is more than 38.76cm.Therefore, in order to by length-width ratio 16:The pattern scan exposure of 9 50 inches of display panels To substrate P, it is more than 38.76mm to need diameter phi, length Las of the light shield face P1 on the direction parallel with first axle AX1 is The cylinder wheel 21 of more than short side L (68.49cm).In this case, the ratio L/ φ of the short side L of diameter phi and light shield M are about 1.77.If in addition, assume that the width in the θ directions of peripheral circuit area TAB adds up to the θ directions length of display picture area DPA If the 20% of Ld, then the long side Lb of light shield M is 132.83cm, and short side L is 68.49cm, and the diameter phi of cylinder wheel 21 is The ratio L/ φ of the short side L of more than 42.28cm, diameter phi and light shield M are about then 1.62.

Under identical condition, if length-width ratio 2:If 1 50 inches of display panels, then the long side Lb of light shield M is 124.96cm, short side L are 62.48cm.The diameter phi of cylinder wheel 21 is according to the calculating of φ >=Lb/ π as a result, be 39.78cm with On.Therefore, in order to by length-width ratio 2:The pattern scan of 1 50 inches of display panels is exposed in substrate P, needs the diameter phi to be The length La of more than 39.78cm, light shield face P1 on the direction parallel with first axle AX1 is the circle of more than short side L (62.48cm) Cylinder wheel 21.In this case, the ratio L/ φ of the short side L of diameter phi and light shield M are about 1.57.If in addition, assume peripheral circuit If the 20% of the θ directions length Ld for adding up to display picture area DPA of the width in the θ directions of region TAB, then light shield M Long side Lb is 136.31cm, and short side L is 62.48cm, and the diameter phi of cylinder wheel 21 is more than 43.39cm, and diameter phi is with light shield M's The ratio L/ φ of short side L are about then 1.44.

As shown in fig. 7, it is configured in the light shield M that will be formed with single display panel pattern in cylinder wheel (light shield holding cylinder) In the case of on 21 peripheral surface, the diameter of the length L and light shield face P1 of the light shield M of the Y-direction orthogonal with scan exposure direction The relationship of φ can be fallen in the range of 1.3≤L/ φ≤3.8.However, rotating being configured in Fig. 7 for light shield M shown in Fig. 7 90 °, and in the case of being set as Y-direction by the long side Lb of light shield M, short side L is set as θ directions, above-mentioned relation can be detached from.For example, Length-width ratio 16 previous:In the case of 9 50 inches of display panels, if the width in the θ directions of peripheral circuit area TAB is set For show picture area DPA length Ld 10% if, then since the long side Lb of light shield M is 121.76cm, short side L is 68.49cm, so the minimum value of length Ls of the light shield face P1 on the direction parallel with first axle AX1 is Lb (121.76cm), circle The diameter phi of cylinder wheel 21 is more than 21.80cm according to the calculating of φ >=L/ π.Therefore, diameter phi and light shield M with first axle AX1 The ratio Lb/ φ of length Lb on parallel direction are about 5.59.Similarly, in length-width ratio 2:1 50 inches of display panel In the case of, since the long side Lb of light shield M is 124.96cm, short side L is 62.48cm, so light shield face P1 with first axle AX1 The minimum value of length L on parallel direction is Lb (124.96cm), the diameter phi of cylinder wheel 21 according to the calculating of φ >=L/ π, For more than 19.89cm.Therefore, the ratio Lb/ φ of the length Lb of diameter phi and light shield M on the direction parallel with first axle AX1 About 6.28.

In this way, even if the size (Lb × L) of light shield M is identical, ratio L/ φ can be also made due to the direction of its long side and short side The value significantly change of (or Lb/ φ).Ratio L/ φ (or Lb/ φ) big situation be represent cylinder wheel 21 diameter phi is small and light shield The bending of face P1 is steep, therefore for the informativeness that pattern is maintained to transfer, and certainly will be by illumination region IR shown in Fig. 3 or projected area The width of the scan exposure direction Xs of domain PA sets narrower.Alternatively, the direction parallel with first axle AX1 of cylinder wheel 21 need to be made On length multiplication, to further increase the multiple projection optical system PL (lamp optical system IL) being configured in Y-direction Quantity.On the other hand, ratio L/ φ (or Lb/ φ) are small, and a kind of situation is that the light shield M on cylinder wheel 21 is put down with first axle AX1 Length on capable direction is small, such as using only half in six view field PA1~PA6 in Fig. 3 or so, another feelings Condition is that the diameter phi of cylinder wheel 21 is excessive, cause Fig. 6, remaining white portion 92 shown in Fig. 7 becoming large-sized for θ directions and as required It is more than degree.Due to more than reason, by by the appearance and size condition of cylinder wheel (light shield holding cylinder) 21 be set as 1.3≤L/ φ≤ 3.8 relationship can effectively be implemented to have used the accurate exposure operation for the light shield M for being formed with display panel pattern, and energy Improve productivity.

In Fig. 6 and example shown in Fig. 7, though on the peripheral surface (light shield face P1) of cylinder wheel (light shield holding cylinder) 21 The example of the light shield M with a face display panel pattern is supported, but also has the formation multi-panel display panel on the P1 of light shield face With the situation of pattern.Several examples of such case are illustrated by Fig. 8 to Figure 10.

Fig. 8 is the circumferential length direction represented on the P1 of light shield face by the light shield M1 of three identical sizes along cylinder wheel 21 The expanded view of outline structure when (θ directions) is configured.Fig. 9 is represented the light shield M2 edges of four identical sizes on the P1 of light shield face Cylinder wheel 21 circumferential length direction (θ directions) configuration when outline structure expanded view.Figure 10 is that represent will be shown in Fig. 9 Light shield M2 is rotated by 90 °, and in light shield face, P1 upper edges Y-direction arranges two light shield M2, then by its circumferential length along cylinder wheel 21 Direction (θ directions) be configured two groups when outline structure expanded view.Due to making phase in substrate P in the primary rotation of cylinder wheel 21 Display panel with size exposes multiple (being herein three or four), therefore Fig. 8 is referred to as being configured to example shown in Fig. 10 The light shield M of multi-panel.In addition, as shown in figure 8, by treating via the light shield face P1 on projection optical system PL scan exposures to substrate P On whole region be set as light shield M with coordinating Fig. 7, the light shield M1 (in Fig. 9,10 be M2) of display panel should be become in light shield M Sx arrangements in interval as defined in being separated along scan exposure direction (θ directions).It is same with Fig. 7 in each light shield M1 (being M2 in Fig. 9,10) Sample, display picture area DPA including catercorner length Le and the peripheral circuit area TAB surrounded.

First, details are as follows since example shown in Fig. 8.In Fig. 8, maximum rectangle is the peripheral surface of cylinder wheel 21 That is light shield face P1.Light shield face P1 when with origin that cutting line 94 is θ directions, in the range of the rotation angle from 0 ° to 360 ° On θ directions there is length π φ, there is length La in the Y-direction parallel with first axle AX1.In light shield face, the inside of P1 is with dotted line The region of expression is light shield M corresponding with the whole region (the exposure area A7 in Fig. 3) that should be exposed in substrate P.In light shield M The interior three light shield M1 arranged along θ directions are so that the long side direction of display picture area DPA is Y-direction, short side direction is θ directions Mode be configured.In addition, in the interval Sx adjacent along θ directions of each light shield M1, in the Y direction three at be discretely equipped with and be used for The alignment mark (light shield label) 96 of the position of light shield M (or M1) on specific cylinder wheel 21.These light shield labels 96 via Light shield (not shown) on the specified position of the circumferencial direction of cylinder wheel 21 with peripheral surface (light shield face P1) relative configuration is to quasi-optical System is detected.Exposure device U3 is surveyed according to the position of each light shield label 96 detected by light shield alignment optical system Measure 21 entirety of cylinder wheel or each position offsets of the light shield M1 on direction of rotation (θ directions) and position offset in the Y direction.

In general, laminated multi-layer is required in the device that display panel is formed in substrate P, and therefore, exposure device meeting The alignment mark (base plate mark) and light of the pattern of light shield M (or M1) will have been exposed for specific which position in substrate P Cover M (or M1) is transferred in substrate P together.In Fig. 8, this base plate mark 96a is respectively formed at the both ends of the Y-direction of each light shield M1 At three partly and on θ directions detached.The width of the Y-direction in the region on light shield (or substrate P) that base plate mark 96a is occupied It spends for several mm or so.Therefore, should be exposed to the Y-direction length L of the light shield M on the light shield face P1 in substrate P becomes the Y of each light shield M1 It is the size in direction, total with the size of the Y-direction in the region of base plate mark 96a that ensures in the Y-direction both sides of each light shield M1.

If in addition, the length after the size of the size in the θ directions of each light shield M1 and the Y-direction of each interval Sx is added up to is set as If Px, then the θ directions length Lb of the light shield M entirety on the P1 of light shield face becomes Lb=3Px.As shown in previous Fig. 7, it is being configured During light shield M corresponding with single display panel, though the remaining white portion 92 of specific length is preferably provided with, as shown in figure 8, in θ directions Upper setting interval Sx is come when multiple light shield M1 are configured, can to make the θ directions length in remaining white portion 92 be zero.That is, the θ side of each light shield M1 Be naturally to length depending on the size of display panel, as interval Sx needed for minimum dimension be also it is pre-determined, Therefore, as long as the diameter phi of cylinder wheel 21 to be set as to the relationship for meeting φ=3Px/ π.If it on the contrary, can be installed on If the range of the diameter phi of cylinder wheel 21 on exposure device U3 substantially determines, then it can be spaced by changing (increase) The size of Sx is adjusted.

Here, an example of the specific size of light shield M shown in Fig. 8 is illustrated.In Fig. 8, it is contemplated that the display of light shield M1 The catercorner length Le of picture area DPA is each of 32 inches (81.28cm), the Y-direction of peripheral circuit area TAB and θ directions Size is 10% or so of the size for showing picture area DPA and forms the size of the Y-direction in the region of base plate mark 96a 0.5cm (both sides add up to 1cm).If length-width ratio 16:If 9 display panel, then the short side dimension of light shield M1 for 48.83cm, Long edge size is 77.93cm, if length-width ratio 2:If 1 display panel, then the short side dimension of light shield M1 is 43.83cm, length Side size is 79.97cm.The size in remaining white portion 92 is being set as zero, and by three light shields in a manner of meeting Lb=π φ=3Px M1 and three interval Sx along θ directions arrange when, if if the θ directions length of light shield M1 is set as Lg, be spaced Sx by Sx= (Lb-3Lg)/3 it is obtained.

Then, by length-width ratio 16:9 display panel light shield M1 and length-width ratio 2:1 display panel is in light shield M1 One party be set as to be configured when on the light shield face P1 of the cylinder wheel 21 of same diameter, the diameter phi of cylinder wheel 21 is set as 43cm or so.In this case, in length-width ratio 16:In 9 display panel, the interval Sx between light shield M1 is set as 1.196cm, and in length-width ratio 2:In 1 display panel, the interval Sx between light shield M1 is set as 5.045cm.

Since the Y-direction length L of the light shield M on the P1 of light shield face is the Y-direction size of light shield M1 and the shape of base plate mark 96a Into region Y-direction size (1cm) it is total, so in length-width ratio 16:L=78.93cm in the light shield M of 9 display panel, And in length-width ratio 2:It is then L=80.97cm in the light shield M of 1 display panel.Therefore, if length-width ratio 16:9 display surface If the cylinder wheel 21 of plate, then the ratio of the Y-direction length L of the diameter phi (43cm) and light shield M of cylinder wheel 21 for L/ φ= 1.84, if length-width ratio 2:Then it is L/ φ=1.88 if the cylinder wheel 21 of 1 display panel.No matter which kind of situation, the ratio Rate L/ φ are fallen in the range of 1.3~3.8.

In addition, by length-width ratio 16:Situation on the pattern exposure to substrate P of 9 display panel and by length-width ratio 2:1 Display panel pattern exposure to substrate P in the case of, if by substrate P interval Sx θ directions size Control in institute If the irreducible minimum needed, then need to change the diameter phi of cylinder wheel 21 naturally.For example, when that will be spaced Sx and be set as 2cm, it is formed with Length-width ratio 16:The diameter phi of the cylinder wheel 21 of the light shield M1 of 9 display panel is seen as φ from the relationship of π φ=3 (Lg+Sx) ≥43.77cm.On the other hand, it is formed with length-width ratio 2:The diameter phi of the cylinder wheel 21 of the light shield M1 of 1 display panel is φ ≥40.1cm.In this case, if length-width ratio 16:If the cylinder wheel 21 of 9 display panel, then ratio L/ φ= 1.80, if length-width ratio 2:If the cylinder wheel 21 of 1 display panel, then ratio L/ φ=2.02, all fall 1.3~3.8 In the range of.

In addition, in the changed feelings of diameter phi for the cylinder wheel 21 (light shield M) that should be so installed on exposure device U3 Under condition, the 1/ of the residual quantity for making its diameter phi of the Z-direction position offset of first axle AX1 of cylinder wheel 21 is equipped in exposure device U3 2 or so mechanism.In the examples described above, since the difference of diameter phi is 3.67cm, so the first axle AX1 (axis SF) of cylinder wheel 21 1.835cm or so is deviated in z-direction and is supported.Further, when the first axle AX1 of cylinder wheel 21 is toward the offset of Z-direction When measuring big, it is also necessary to be altered to have by the cylindrical lens 54 shown in Fig. 4 convex as meeting lighting condition shown in fig. 5 The angle [alpha] ° of the first reflecting surface (plane mirror) P3 of component 70 is biased in the cylindrical lens of the curvature of barrel surface, adjustment first, and is made Polarization beam apparatus PBS and 1/4 wavelength plate 41 integrally tilt a little in XZ faces.

More than, as shown in figure 8, on light shield M (including three light shield M1) on cylinder wheel 21 is formed in, with being transferred to The pattern (light shield M1) of display panel in substrate P and along θ directions (scan exposure direction) equipped with multiple base plate mark 96a. Therefore, the pattern (light shield M1) of multiple base plate mark 96a and display panel are transferred to successively together when with exposure device U3 When in substrate P, then various problems during exposure are able to confirm that.For example, the base plate mark 96a being transferred in substrate P can be used The position of the defects of to generate on particular substrate P (such as sundries attachment) measures the patterning error of light shield, focus mistake The various biased errors such as aliasing error when difference, overlapping exposures.Measured biased error removes the pipe for being used in light shield entirety Reason is outer, the location management for each light shield M1 being also used on cylinder light shield 21 and each display panel for being transferred in substrate P The location management (amendment) of pattern (light shield M1).

Fig. 9 is represented for example in a manner of making Y-direction for display picture area DPA long sides, by length-width ratio 2:1 display surface The light shield M2 of plate arranges four along θ directions and the example on the light shield face P1 of cylinder wheel 21 is configured.In the θ side of each light shield M2 To side (long side) equipped with interval Sx, light shield label 96, base plate mark 96a are also set in the same manner as previous Fig. 8.This feelings Under condition, the overall length π φ (=Lb) of the circumferencial direction (θ directions) of light shield face P1 are π φ=4Px=4 (Lg+Sx).It here, will display The picture dimension of picture area DPA is set as 24 inches (Le=60.96cm), by total width in the θ directions of peripheral circuit area TAB Degree is set as the 10% of the θ directions length of display picture area DPA, and total width of the Y-direction of peripheral circuit area TAB is set as Show the 20% of the Y-direction length of picture area DPA, furthermore, the substrate on the Y-direction both ends of light shield M2 will be arranged respectively at Total width of the Y-direction of the forming region of 96a is marked to be set as 1cm.

In this case, because the size of display picture area DPA is long side 54.52cm, short side 27.26cm, light The Y-direction overall length L of exposure light cover M on cover P1 includes the forming region of light shield M2 and base plate mark 96a, is L= 66.43cm.In addition, because the θ directions length Lg of the light shield M2 on the P1 of light shield face is Lg=29.99cm, Sx will be spaced by working as When being set as 1cm, the diameter phi of light shield M (cylinder wheel 21) is more than 39.46cm due to π φ >=4Px.Therefore, as shown in figure 9, By length-width ratio 2:In the case that the amount in four faces of the light shield M2 of 1 display panel is set on cylinder wheel 21, ratio L/ φ are 1.67, also fall in the range of 1.3~3.8.

Figure 10 expressions make light shield M2 shown in Fig. 9 long side be configured towards θ directions, and after being rotated by 90 ° to be configured along θ directions Two, the example that the mode of two amounts to the situation of arrangement four on the P1 of light shield face is configured along Y-direction.In addition, it herein, is arranging It is listed between two light shield M in Y-direction, the forming region equipped with base plate mark 96a.Therefore, if shape by base plate mark 96a Into the Y-direction in region total width be set as 2cm if, then be formed in the Y-direction overall length (short side) of the light shield M on the P1 of light shield face L is 61.98cm, and θ directions overall length (long side) the π φ of light shield M are 132.86cm, and the diameter phi of light shield M (cylinder light shield 21) is More than 42.29cm, ratio L/ φ are 1.47.

In addition, when four light shield M2 are configured as Fig. 9 or Figure 10, as long as adjustment interval Sx, with regard to cylinder can be made The diameter phi and the Y-direction size La of light shield face P1 of wheel 21 are fixed.In the case of Fig. 9 and Figure 10, the Y-direction length L of light shield M That larger is the L=66.43cm in the case of Fig. 9, and the diameter phi of cylinder wheel 21 (light shield M) it is larger be Figure 10 in the case of φ >=42.29cm.Then, if the use of the Y-direction size La of peripheral surface (light shield face P1) being La >=66.43cm and diameter phi If cylinder wheel 21 for φ >=42.3cm, no matter Fig. 9 and Figure 10 which kind of configuration, can realize light shield M2 configuration four sides. In this case, ratio L/ φ are 1.57, are also fallen in the range of 1.3~3.8.

As shown in Fig. 8 to Figure 10, it is possible to be configured the light of display device with various configuration rules on the P1 of light shield face Cover pattern (light shield M, M1, M2).In contrast, by make the light shield face P1 (peripheral surface) of cylinder wheel (light shield holding cylinder) 21 with The relationship of the diameter phi of length L and cylinder wheel 21 on the orthogonal direction (Y-direction) in scan exposure direction (θ directions) meets 1.3 ≤ L/ φ≤3.8, thus as shown in Fig. 8 to Figure 10, even in the light shield figure for being configured with the display panel of multiple various sizes In the case of case (light shield M1, M2), also mask pattern can be configured in the state of gap (interval Sx) is reduced.

In addition, by the way that cylinder wheel 21 is made to meet the relationship of 1.3≤L/ φ≤3.8, lamp optical system IL can inhibited And projection optical system PL quantity increase while, the enlargement of restraining device.That is, cylinder wheel 21 becomes elongated, The quantity of lamp optical system IL and projection optical system PL can be inhibited to increase.In addition, the diameter phi of cylinder wheel 21 becomes larger, from And the Z-direction for being capable of restraining device becomes large-sized.

Here, as shown in fig. 7, by length-width ratio 2:The light shield M of the configuration one side of 1 display panel is formed in cylinder wheel When on 21 entire peripheral surface (light shield face P1), it is contemplated that so that the θ directions size in the remaining white portion 92 in Fig. 6, Fig. 7 is zero and makes Y-direction (first axle AX1 directions) size La of light shield face P1 is the situation of La=L.In addition, it as previously described, is configured Peripheral circuit area TAB around the DPA of active area has 20% or so the situation for being equivalent to active area DPA. However, the dimension scale of peripheral circuit area TAB can be due to practical pattern specification, design according in active area DPA The portion of terminal as circuit is configured with so as to change on which part of surrounding.Therefore, though can not accurately carry out it is specific, But the direction for being set as toward the aspect ratio as light shield M to become larger increases, the periphery adjacent with the short side of active area DPA electricity Total width of road region TAB, it is assumed that be 20% or so of the long side Ld of active area DPA.In addition, and picture-display-region Total width of the adjacent peripheral circuit area TAB of the long side of domain DPA, it assumes that 0 of short side Lc for active area DPA ~10% or so.Under this hypothesis, in active area, DPA is length-width ratio 2:In the case of 1 50 inches of display panels, The long side Ld of active area DPA is 113.59cm, short side Lc is 56.8cm.Therefore, the θ directions length of the light shield M in Fig. 7 Lb (=π φ) is 136.31cm, and the diameter phi of cylinder wheel 21 (light shield M) is 43.39cm, Y-direction length L (=La) for 56.8~ The ratio of 62.48cm, length L and diameter phiIt is 1.30~1.44.In this way, by the light of the big display panel of length-width ratio When cover entirety is formed in a manner of one side is configured on the entire peripheral surface (light shield face P1) of cylinder wheel 21, ratio L/ φ become most Small value 1.3.In addition, the length-width ratio in active area DPA is 2:In the case of 1, if light shield M is only wrapped on long side direction The width of the TAB containing peripheral circuit area and big 20% if, then it is shown in Fig. 7 configuration one side light shield M aspect ratio (Lb/L) It is 2.4, due to Lb=π φ, export ratio L/ φ=pi/2 .4 ≒ 1.30.

In addition, as printing machine, the light shield M in Fig. 7 is made is rotated by 90 ° and the light shield face P1 in cylinder wheel 21 is configured When substantially in entire surface, as previously described, ratio L/ φ can become too much.Described in condition as described above, shown in picture The length-width ratio of region DPA is 2:In the case of 1, if the light shield M of configuration one side includes peripheral circuit area only on long side direction The width of TAB and it is big by 20%, and if the θ directions size in remaining white portion 92 is zero, then L/Lb (π φ)=2.4/1, ratio L/ φ are 7.54.In this case, if if the light shield M of the configuration one side of 50 inches of display panels of exemplified earlier, then Y-direction is long Degree L is 136.31cm, and θ directions length Lb (π φ) is 56.8cm, and the diameter phi of cylinder wheel 21 (light shield M) is 18.1cm.In this way, In the case where the long side direction of light shield M is set as θ directions and Y-direction is set as, ratio L/ φ can significantly change.

The projection optical system PL of exposure device U3 is in the diameter of cylinder wheel 21In the case of significantly change, especially exist Diameter phi becomes hour, because of deformation (distortion) error caused by projection and the point of the variation of projection image planes caused by circular arc It can become larger, therefore, it is difficult to good projection image is exposed in substrate P.In this case, such as shown in figure 11, there will be length It is wide to compare 2:Two light shield M2 that the long side direction of the display panel of 1 active area DPA is set as Y-direction are arranged in θ side Upwards.

In Figure 11, it is 2 that two light shield M2, which respectively include length-width ratio,:1 active area DPA and configuration are shown in picture Show the peripheral circuit area TAB of the Y-direction both sides of region DPA.The total of Y-direction width of peripheral circuit area TAB is set as picture The 20% of the long edge size Ld of face display area DPA is equipped with interval Sx in the right adjacent side of light shield M2.If assume the week in light shield M2 No placement substrate label 96a or light shield label 96 are enclosed, then whole (the light shield faces of the light shield M comprising two light shield M2 and interval Sx P1 Y-direction size L) is L=1.2Ld, and θ directions size π φ (Lb) are π φ=2 (Lc+Sx).By active area When the length-width ratio Asp of DPA is set as Asp=Ld/Lc, ratio L/ φ represent as follows.

The π AspLc/ (Lc+Sx) of L/ φ=0.6

If here, interval Sx is set as zero, ratio L/ φ are the π Asp of L/ φ=0.6, by length-width ratio 2:1 it is aobvious Show two light shield M2 of panel with shown in Figure 11 direction configuration in the case of, the diameter phi of cylinder wheel 21 (light shield face P1) with The ratio L/ φ of the length L (=La) in first axle AX1 directions are 3.77 (about 3.8).In this case, if active area DPA(2:1) if being 50 inches, then straight φIt is 136.31cm for 36.16cm, length L (La).Similarly, by Figure 11 institutes The light shield M2 shown is set as length-width ratio 16:In the case that 9 display panel is used, if interval Sx is set as zero, due to L/ φ= The relationship of 0.6 π Asp, ratio L/ φ become 3.35.In this case, if active area DPA (16:9) it is 50 inches If, then diameter phi is 39.64cm, length L (La) is 132.83cm.

As described above, so that the short side direction of active area DPA towards circumferencial direction (the θ side of cylinder wheel 21 To), in the case that light shield M is configured in the mode in long side direction towards the direction (Y-direction) of the first axle AX1 of cylinder wheel 21, pass through More than two identical light shield M2 are arranged in θ directions, ratio L/ φ can be set as less than 3.8.If in addition, by shown in Figure 11 Light shield M2 n are arranged on θ directions with the same terms if, then the relational expression of previous expression ratio L/ φ is as follows.

The π AspLc/n (Lc+Sx) of L/ φ=1.2

According to the relational expression, light shield M2 being configured, is required on cylinder wheel 21 of the display panel of manufacture can be intended to Interval Sx etc. be set as 1.3≤L/ of satisfaction φ≤3.8.

In addition, light shield face P1 by by light shield M1, M2 of the mask pattern of display panel device as previous Fig. 8 Ratio L/ φ can be configured to be less than 3.8 by arrangement three or as shown in Figure 9 arrangement four.In this case, than Which kind of value rate L/ φ can become, and being can be according to Y-direction to be set as to the pass of light shield M1, M2 of long side when arranging n on θ directions It is what formula was obtained.According to the of different size of the peripheral circuit area TAB around display picture area DPA, light shield M1, M2 are in length and breadth Size can also change, therefore, will be because of the peripheral circuit area of the long side direction both sides of display picture area DPA (or unilateral) TAB and the enlargement ratio of the long side direction size of light shield M1, M2 that amplifies is set as e1, will be because showing the short side side of picture area DPA To the peripheral circuit area TAB of both sides (or unilateral), the enlargement ratio of the short side direction size of light shield M1, M2 that amplifies is set as e2.

Therefore, match in a manner that the Y-direction size La to make light shield face P1 is consistent with the long side direction size of light shield M1, M2 When putting, the Y-direction length L in the light shield region on the P1 of light shield face is L=La=e1Ld.Similarly, the light shield on the P1 of light shield face The θ directions length π φ (Lb) in region are π φ=n (e2Lc+Sx), and ratio L/ φ are represented by following relational expressions.

L/ φ=e1 π AspLc/n (e2Lc+Sx)

In the relational expression, if the light shield M2 shown in Figure 11, then n=2, e1=1.2, e2=1.0.

For example, the aspect ratio of the display picture area DPA of the light shield M2 of display panel device is set as 16:9(Asp =1.778) in the case of, if by light shield M2 if (n=3) is configured in the mode of θ directions Shang Yisan faces side by side, being spaced Sx is When zero, ratio L/ φ are L/ φ=e1 π Asp/ne2, even if enlargement ratio e1 is set as 1.2, sets enlargement ratio e2 It is 1.0, ratio L/ φ are also 2.23.

Further, as shown in previous Figure 10, if the four sides entirety of configuration light shield M2 (24 inches) is arranged with two rows two The aspect ratio in light shield region and the long side direction of picture area DPA will be shown towards light shield M (50 English of the configuration one side in θ directions It is very little) aspect ratio it is roughly the same if, then can only by the difference of the size of the portion of terminal of peripheral circuit area TAB or Every the difference of Sx, it is set as the cylinder wheel 21 of identical size.

As described above, the length-width ratio such as the display picture area DPA of display panel is 16:9 or 2:1 grade is such, when close 2:When 1, in order to which light shield M, M1, M2 of the display panel are effectively arranged on the peripheral surface of cylinder wheel 21, preferably make circle The pass of length L and diameter phi of cylinder wheel (the cylinder light shield) 21 on the direction (Y-direction) orthogonal with scan exposure direction (θ directions) System meets 1.3≤L/ φ≤3.8.Furthermore if the aspect ratio of single light shield M, M1, M2 is close to 2:If 1, then by these light Cover is in a manner of multi-panel to be configured when arranging multiple, preferably makes light shield region entirety on the light shield face P1 occupied when multi-panel is configured Aspect ratio (L:Lb) close to 1:1.In addition, interval Sx (or remaining white portion 92) is preferably set to fix.

In addition, the diameter phi of the peripheral surface (light shield face P1) of cylinder wheel 21 and the mask pattern that is formed on the P1 of light shield face The relationship of the overall length L (La) in first axle AX1 directions preferably meets 1.3≤L/ φ≤3.8, but further, if it is set as 1.3≤ If L/ φ≤2.6, then said effect can be preferably obtained.For example, if so that the long side of the light shield M2 shown in Figure 11 Direction becomes the mode in θ directions, and light shield M2 is made to be rotated by 90 ° and be used as and be configured without arranging two at spaced intervals along Y-direction If two sides, then L/ φ ≒ 2.6.In this case, the θ directions length π φ (Lb) of a light shield M2 are π φ=e1Ld, along Y The combined length L of two light shield M2 of direction arrangement is L=2e2Lc.Therefore, because Asp=Ld/Lc, ratio L/ φ become The π e2/e1Asp of L/ φ=2, if if being set as e1=1.2, e2=1.0, Asp=2/1, the ≒ 2.6 of L/ φ=π/1.2.

In addition, exposure device U3 is preferably capable light shield M (M1, M2) being set as replaceable.By the way that be set as light shield can It replaces, it can will be on the mask pattern projection exposure to substrate P of the display panel of various sizes or electronic circuit board. In addition, even if the face number of light shield (M, M1, M2 etc.) being formed on the light shield face P1 of cylinder wheel 21 there are many situation, without will Do too much in the gap (interval Sx) generated between each light shield.That is, light shield face P1 can be inhibited effective shared by entire area Light shield regional percentage (light shield utilization rate) reduction.

It additionally, it is preferred that can be so that diameter phi and the side orthogonal with scan exposure direction of the light shield face P1 of cylinder wheel 21 Light shield M (M1, M2) is set as replaceable by the mode that the length L in the light shield region in (Y-direction) is substantially the same.As a result, Only by replacing light shield M (M1, M2), without being exposed the projection optical system PL and lamp optical system of device U3 sides The adjustment of other parts such as the distance between IL or substrate P and light shield face P1 only need few adjustment amount that can just complete, The pattern of various devices can be also transferred with equal image quality after light shield replacement.

In addition, in the above-described embodiment, have the diameter phi of cylinder wheel 21 is set as fixed and make institute's configuration face number or The device of the different various face numbers of orientation light shield (M1, M2) is configured the situation on the P1 of light shield face or makes cylinder wheel 21 diameter phi is different and the situation of the device of various face numbers is configured on the P1 of light shield face.However, no matter which kind of situation, Dou Nengtong The relationship that the shape of cylindric light shield face P1 is made to meet 1.3≤L/ φ≤3.8 is crossed, and with less gap on the P1 of light shield face Multiple mask patterns are configured.Thereby, it is possible to the pattern of device (display panel) is efficiently made to be transferred in substrate P.In addition, pass through The cylinder light shield of cylinder wheel 21 is set as to the shape of the relationship of 1.3≤L/ of satisfaction φ≤3.8, multiple device patterns can reduced Gap while, the pattern of the device of various sizes is efficiently configured, and the variation of the diameter phi of cylinder light shield can be reduced.

In addition, as shown in Figs. 8 to 11, the mounting surface number of light shield M1, M2 can be according to the display panel (devices to be manufactured Part) size and be set as two sides, three faces, four sides or more.If the mounting surface number of light shield M1, M2 is increased into three faces, four sides Words can then further reduce the size of gap (interval Sx).

In addition, cylinder wheel 21 can be by meeting 1.3≤L/ φ≤3.8, and make illumination relative to rotary drum radial (diameter phi) The width in the scan exposure direction (θ directions) of region IR or view field PA, i.e. so-called exposure slit width are optimized and (are increased Greatly).Hereinafter, using Figure 12 to the pass of the diameter phi of the light shield face P1 of cylinder wheel 21 and the exposure slit width in scan exposure direction System illustrates.

Figure 12 is to change that defocus (Defocus) amount wide come the diameter phi and exposure slit of simulating cylinder wheel 21 (light shield face P1) Spend the chart of the relationship of D.In Figure 12, the longitudinal axis represents exposure slit width D [mm], this expression is formed in the projected area in substrate P The width in the θ directions (X-direction) of domain PA (Fig. 3).The longitudinal axis represents the diameter phi [mm] of cylinder wheel 21 (light shield face P1).In addition, institute Meaning defocus amount is the opening number NA of image side (substrate P side) according to the projection optical system PL by exposure device U3, exposure It the wavelength X of illumination light and is determined by depth of focus DOF that process constant k (k≤1) is defined.Here, for projection image Most preferably the departure (defocus amount) of focus direction between focal plane and substrate P surface with for 25 μm and be 50 μm two kinds of situations To be simulated.

Here, since the opening number NA of projection optical system PL is set as 0.0875 in the simulation of Figure 12, by illumination light Wavelength X be set as mercury vapor lamp i lines 365nm, process constant k is set as 0.5 or so, so depth of focus DOF is according to DOF= k·λ/NA²And it is about 50 μm of (about -25 μm~+25 μm) left and right to obtain width.In addition, as resolution ratio under this condition, it can Obtain 2.5 μm of L/S.25 μm be represented by the dotted line in Figure 12 refer to generate depth of focus DOF in exposure slit width D when defocusing 1/2 or so focusing deviation state；By solid line represent 50 μm defocus when then refer in exposure slit width D generate with The state of the comparable focusing deviation of depth of focus DOF degree.That is, 25 μm be represented by the dotted line graphics tables when defocusing show by During the error that the l/2 (25 μm of width) of the width of depth of focus DOF is generated as the bending of the light shield face P1 because the cylinder wheel 21 The relationship of when allowing, diameter phi and exposure slit width D；By solid line represent 50 μm defocus when graphics table show by Until width of depth of focus DOF or so as the light shield face P1 because the cylinder wheel 21 when allowing when being bent the error generated , the relationship of diameter phi and exposure slit width D.

In Figure 12, it is obtained the diameter phi of cylinder wheel 21 in the range of 100mm~1000mm and is carried out by following calculating Exposure when exposure slit width D and above-mentioned defocus amount when the defocus amount (being set as Δ Z) allowed during change is 25 μm are 50 μm Optical slits width D.

D=2 [(φ/2)²-(φ/2-ΔZ)²]^0.5

According to the simulation, such as in the case where diameter phi is 500mm, when allowing as defocus amount Δ Z to 25 μm The maximum value of exposure slit width D is about 7.lmm, and exposure slit width D when allowing as defocus amount Δ Z to 50 μm Maximum value is about 10.0mm.

As shown in figure 12, the diameter phi of cylinder wheel 21 is bigger, and the exposure slit width D for meeting allowed defocus amount is got over Greatly.It is 2 in the length-width ratio of display picture area DPA:1 and only display picture area DPA length direction on be equipped with periphery electricity In the case of road region TAB, as shown in figure 11 light shield M2, if being not provided with remaining white portion 92 (interval Sx) only by light shield M2 Be formed on one side on the entire light shield face P1 of cylinder wheel 21, then by the way that the length direction of light shield M2 is set as cylinder wheel 21 circumferencial direction (θ directions) or the direction (Y-direction) of first axle AX1, ratio L/ φ can great changes have taken place.If by light shield M2 Length direction be set as Y-direction as shown in figure 11 if, then the θ directions length Lc (short side) of the one side of light shield M2 and cylinder wheel 21 The whole circumference length π φ of peripheral surface are equal, become φ=Lc/ π.At this moment, the first axle AX1 side of the light shield M2 on cylinder wheel 21 Become L=1.2Ld in the same manner as the situation of Figure 11 to the length L of (Y-direction).Because length-width ratio is 2:1, and Ld=2Lc, so Ratio L/ φ in this case are the π ≒ 7.5 of L/ φ=2.4.On the other hand, if the short side direction of light shield M2 is set as Y-direction If, then whole circumference length π φ of the one side of light shield M2 on θ directions is 1.2Ld, the Y of the light shield M2 on cylinder wheel 21 Direction length L becomes Lc.Therefore, ratio L/ φ in this case become L/ φ=pi/2 .4 ≒ 1.3.

If the Y-direction length L of light shield is set in each view field PAl of the projection optical system PL of exposure device U3~ In the range of the Y-direction of PA6 (Fig. 3) adds up to size, and make length L to fix, then ratioFrom 1.3 to 7.5 variations About six times, it means that about six times of variation occurs for the diameter phi of cylinder wheel 21.The variation that about six times of diameter phi phase in fig. 12 When in the variation of such as diameter phi=from 150mm to 900mm.In this case, it will allow for exposure when defocus amount Δ Z is set as 25 μm Optical slits width D from φ 150mm when about 3.9mm be changed to φ 900mm when about 9.5mm.Therefore, by the Y-direction of light shield In the case of length L is set as fixed, when the cylinder light shield that diameter phi 150mm is faded to from the cylinder light shield of diameter phi 900mm, expose Optical slits width D is reduced to about 40%.It will allow for defocus amount Δ Z and be set as same at 50 μm.

Therefore, it is fixed next in the contrast for making projection image when ratio L/ φ are with from 1.3 to 7.5 ranging from object In the case of being exposed, it is simple for, assigning the light exposure of substrate P can be reduced to 40%.To make the light exposure of imparting substrate P Reach appropriate value (100%), during relative to being exposed based on the view field PA that exposure slit width D is set as to 9.5mm The movement speed of substrate P makes substrate P be moved with about 40% speed.That is, due to needing to make the conveying speed of substrate P to drop in itself To about 40%, so productivity (throughput) will drop to less than half.It is set as 3.9mm using exposure slit width D View field PA when being exposed, to avoid reducing the conveying speed of substrate P, thrown it is also contemplated that improving in view field PA The illumination of the briliancy of image, i.e. illuminating bundle ELI.In this case, illumination during relative to exposure slit width D for 9.5mm, The illumination of the illuminating bundle EL1 of irradiation light cover P1 need to be improved to about 2.5 times.

In contrast, when using the configuration two sides of the light shield M2 shown in Figure 11, ratio L/ φ can be down to about 3.8 The range (1.3~3.8) of (1.2 π) below.When the Y-direction length L of light shield is set as fixed, cylinder light shield (cylinder wheel 21) Diameter phi variation be about three times range, such as only need consider φ=900mm~300mm between.Pass through the mould of Figure 12 Intend, it is about 5.5mm that diameter phi will allow for the exposure slit width D that defocus amount Δ Z is set as in the case of 25 μm when being 300mm.Cause This, the situation for being about 9.5mm relative to exposure slit width D, the conveying speed of substrate P is only reduced to about 60% or so.In this way, Pass through the vertical of the light shield region that is formed on the light shield face P1 to cylinder wheel 21 in a manner that ratio L/ φ are about 1.3~about 3.8 Horizontal ratioIt is limited, the variation of exposure slit width D can be inhibited.

Similarly, in the case where the light shield M2 of Figure 11 is arranged three without interval Sx along θ directions as illustrated in fig. 8, The π Asp of L/ φ=0.4, the diameter phi of cylinder wheel 21 are for example possible to become in the range of this about 1.8 times of 500mm~900mm Change.About 9.5mm when the exposure slit width D that defocus amount is 25 μm can be 900mm from diameter phi is reduced to about 7.1mm, but this It is equivalent to productivity and is reduced to about 75%.However, it is obtained compared with the situation that the productivity in exemplified earlier is down to less than half Improve.Further, in the case where the light shield M2 of Figure 11 is arranged four without interval Sx along θ directions as illustrated in fig. 9, L/ The π Asp of φ=0.3, the diameter phi of cylinder wheel 21 are for example possible to change in the range of this about 1.3 times of 700mm~900mm. About 9.5mm when the exposure slit width D that defocus amount is 25 μm can be 900mm from diameter phi is reduced to about 8.4mm.This is equivalent to Productivity is reduced to about 88%, but is greatly improved compared with the situation that the productivity in exemplified earlier is down to less than half, It can carry out the exposure of substantial free of losses.If in addition, if 75% of exposure slit width D or 88% or so reduction, Luminous intensity or increase quantity of light source by improving light source 31 etc. can easily promote the illumination of illuminating bundle EL1, Productive reduction will not be generated completely.In addition, it is to become productivity with close to certain value that the size in light shield region, which is understood, It is fixed.That is, according to the picture dimension (catercorner length Le) of display picture area DPA, the configuration one of light shield M is respectively adopted The configuration multi-panel in face, light shield M1 or light shield M2, so as to realize that the size in light shield region (L × π φ) is fixed cylinder wheel 21 (diameter phi is constant), and can regularly maintain productivity.

Though however, the range of ratio L/ φ is set as about 1.3~about 3.8, this is because imagining as illustrated in fig. 11 ：Length-width ratio 2:The lengthwise dimension of the light shield M2 of 1 display panel includes the width of peripheral circuit area TAB, and phase In the case of the lengthwise dimension Ld for showing picture area DPA increases by 20% (in the case of being 1.2 times).Then, if by light If the lengthwise dimension of cover is amplified to e1 times relative to the lengthwise dimension Ld of display picture area DPA, then ratio L/ φ is due to Asp=Ld/Lc by following Range Representation.

π/(e1·Asp)≤L/φ≤e1·π

By using the cylinder wheel 21 (cylinder light shield) for meeting the condition, the exposure device U3 of present embodiment can inhibit The projection image distortion (distortion) generated due to projection error caused by barrel surface or the projection image planes caused by circular arc While changing (focusing deviation), multiple mask patterns of display panel (device) are arranged simultaneously in the case where reducing gap It is transferred in substrate P.

More than, by the configuration example of light shield M, M1, M2 for being formed on the cylinder light shield (cylinder wheel 21) in present embodiment etc. It summarizes, then as shown in Figure 13, Figure 14.The light shield M using θ directions as length direction is represented in the same manner as Figure 13 and previous Fig. 7 Configuration one side situation, Figure 14 then represents will to be the light shield M2 of length direction in θ side using Y-direction in the same manner as previous Figure 11 The situation on the configuration two sides of arrangement two upwards.Figure 13 similary with Fig. 7 is to showing picture in a manner that long side is θ directions direction The situation that the light shield M of the display panel of the catercorner length Le (inch) of region DPA is configured.It in this case, if will The ratio (Ld/Lc) of the long edge size Ld and short side dimension Lc of picture area DPA is shown as length-width ratio Asp, and display will be included Light shield M entirety nothing left including peripheral circuit area TAB around picture area DPA is formed in the peripheral surface of cylinder wheel 21 in vain On (light shield face P1), then the θ directions length π φ of light shield M are π φ=e1Ld=e1AspLc, and Y-direction length L is L=e2Lc.As previously described, e1 is by attached in the length direction both sides of display picture area DPA or unilateral side Total width of peripheral circuit area TAB represents the length direction of light shield M relative to the length direction of display picture area DPA The enlargement ratio of how many degree amplified.Similarly, e2 is by attached in the short side direction both sides of display picture area DPA or unilateral side Total width (Ta in Figure 13) of the peripheral circuit area TAB of category represents the short side direction of light shield M relative to display picture area The enlargement ratio of short side direction amplification how many degree of domain DPA.From the description above, the peripheral surface (light shield face P1) of cylinder wheel 21 The size of required minimum is that π φ × L, the length L of light shield M at this moment and the ratio L/ φ of diameter phi represent as follows.

L/ φ=π e2/e1Asp

Imagine aspect ratio (the π φ of light shield M:L) further increased situation, if by the long side with showing picture area DPA If the width Ta of adjacent peripheral circuit area TAB is set as zero (e2=1), enlargement ratio e1 is set as 1.2 (increasing by 20%), then Ratio L/ φ become π/1.2Asp.Therefore, when length-width ratio Asp is 2 (2/1), ratio L/ φ are pi/2 .4 ≒ 1.3；Length-width ratio When Asp is 1.778 (16/9), ratio L/ φ are then pi/2 .134 ≒ 1.47.

Figure 14 is similary with Figure 11 be will be to show that the long side direction of picture area DPA is two light shield M2 of Y-direction along θ side To the situation on the configuration two sides of arrangement, length-width ratio Asp, the definition of enlargement ratio e1, e2 are identical with the situation of Figure 13.Including display The size of a light shield M2 including peripheral circuit area TAB around picture area DPA is L × Lg, the two light shields M2 is in θ Interval Sx is configured side by side on direction.Therefore, it is white in the light shield entirety nothing left that will include two light shield M2 and two interval Sx In the case that ground is formed on the peripheral surface (light shield face P1) of cylinder wheel 21, the θ directions length π φ of light shield entirety are π φ=2 (Lg+Sx), the length L of Y-direction is then L=e1Ld.Therefore, ratio L/ φ at this moment are represented as follows.

L/ φ=π e1Ld/2 (Lg+Sx)

In this, it is assumed that enlargement ratio e1 is 1.2 (increasing by 20%), the periphery adjacent with the long side of display picture area DPA The width Ta of circuit region TAB is zero (e2=1), and is spaced Sx when being zero, according to the pass of Lg=e2Lc, Ld=AspLc System, ratio L/ φ are 0.6 π Asp.Therefore, when length-width ratio Asp is 2 (2/1), ratio L/ φ are about 3.8；Length-width ratio Asp is When 1.778 (16/9), ratio L/ φ are about 3.4.

In this way, the size (inch number) for the display panel (device) being configured on cylindric light shield face P1, display picture area Width of length-width ratio Asp and peripheral circuit area TAB of domain DPA etc. if it is determined that if, just can based on this, simply make Ratio L/ φ are suitable for the preferable cylinder light shield (cylinder wheel 21) of the device specification of exposure device U3.

Further, concrete example is illustrated using Figure 15 to Figure 18.It first, will be aobvious as shown in above-mentioned Fig. 7 or Figure 13 Show picture area DPA long side direction be set as θ directions light shield M be configured on the light shield face P1 of cylinder wheel 21 one side situation make For benchmark.Here, the projection optical system PL of exposure device U3 projects mask pattern to substrate P with equimultiple in concrete example On.Therefore, on the light shield face P1 of cylinder wheel 21, the mask pattern of the actual size of display panel can be formed.In addition, display surface The display picture area DPA of plate is set as high image quality size (length-width ratio 16:And 60 inches of pictures 9).In this case, picture is shown The short side dimension Lc of region DPA is 74.7cm, long edge size Ld is 132.8cm, catercorner length Le is 152.4cm.In addition, it closes It, will be related with showing the long side direction of picture area DPA in the size of the light shield M entirety including peripheral circuit area TAB Enlargement ratio e1 be set as 1.2 (increasing by 20%), the enlargement ratio e2 related with short side direction is set as 1.15 (increasing by 15%), long Edge direction (θ directions) is set as e1Ld=159.4cm, and short side direction (Y-direction) is set as e2Lc=85.9cm.Further, The θ directions length in the remaining white portions 92 of Fig. 6 or shown in Fig. 7 is set as 5.0cm.Since light shield M is arranged on cylinder with above-mentioned condition On the light shield face P1 of wheel 21, so the θ directions size π φ of light shield face P1 become 164.4cm.Therefore, the diameter phi of cylinder wheel 21 Need to be more than 52.33cm, such as be set as 52.5cm.Though in addition, the Y-direction length of the light shield M entirety of above-mentioned condition is set as 85.9cm, but due on the basis of light shield M, so the projection by each projection optical system PL1~PL6 of exposure device U3 The Y-direction overall with for the exposure area that region PA1~PA6 is connected along Y-direction is 87cm less times greater than 85.9cm.Here, according to Analog result shown in Figure 12 if the diameter phi of cylinder wheel 21 (cylinder light shield M) is set as 52.5cm, is defocused what is allowed Exposure slit width D when amount is set as 25 μm is 7.4mm, and the exposure slit width when defocus amount allowed is set as 50 μm D is then 10.3mm.Therefore, in the scan exposure that the light shield M (cylinder wheel 21) as benchmark shown in Figure 13 is used to carry out substrate P When, various conditions of exposures (the mobile speed of substrate P is made on the basis of below the 7.4mm or below 10.3mm of exposure slit width D The illumination etc. of degree, illuminating bundle EL1) it optimizes.That is, when the defocus amount Δ Z for being intended to be allowed is set as below 25 μm, adjustment figure The opening of the projection visual field aperture 63 in the illumination opening of visual field aperture 55 or projection optical system PL in 4, so that exposure is narrow Width D (width in the scan exposure direction of view field PA) is stitched as the specified value of below 7.4mm.

Then, illustrate in the outer of the cylinder wheels 21 set of the light shield M for 60 inches of display panels shown in Figure 13 On circumferential surface (light shield face P1), length-width ratio 16 is configured:The situation of 32 inches of display panel light shield M3 of 9 (Asp=16/9).Cylinder The size of the light shield face P1 of wheel 21 for Y-direction length L=85.9cm, θ direction length π φ=164.4cm, but with as benchmark Light shield M similarly, in a manner that the length direction for showing picture area DPA is θ directions, is configured 32 inches of display panel and uses Light shield M3 (configuration one side) when, generate around light shield M3 that can be on the P1 of light shield face it is broad more than white portion.

In the case of 32 inches of display panels, the long edge size Ld of display picture area DPA is 70.8cm, short side ruler Very little Lc is 39.9cm.In addition, by with the length direction both sides for showing picture area DPA or unilateral adjacent peripheral circuit area When the enlargement ratio e1 of TAB is set as 1.2 (increasing by 20%) left and right, the θ directions size of light shield M3 is amplified about 15cm and is become 85.8cm, if further along if white portion 92 more than θ directions setting 5cm or so, overall length becomes 90.8cm.Therefore, light shield M3 on the basis of light shield M use and prepare cylinder wheel 21 light shield face P1 on be only formed as whole circumference length (π φ= 164.4cm) about 55%.In addition, the Y-direction length L of the light shield face P1 of cylinder wheel 21 as benchmark is 85.9cm, relative to This, if if the enlargement ratio e2 for the short side direction for showing picture area DPA is set as 1.15 (increasing by 15%) left and right, light shield The Y-direction length of M3 becomes 45.8cm.Therefore, light shield M3 is only formed as Y on the light shield face P1 of the cylinder wheel 21 as benchmark About the 53% of direction size (L=85.9cm).It is incited somebody to action as a result, when in a manner that the length direction for showing picture area DPA is θ directions One 32 inches of display panel by the use of light shield M3 be configured when on the light shield face P1 of the cylinder wheel 21 as benchmark, light shield M3's accounts for There is about 30% that area is only the entire areas of light shield face P1, so efficiency is bad.

Then, in order to which efficiently a light shield M3 is configured on cylinder wheel 21, and change the diameter phi of cylinder wheel 21 with If total i.e. overall length 90.8cm of the θ directions size of light shield M3 and the size in remaining white portion 92 is made to become whole circumference length, then As long as minimum diameter phi is 28.91cm.Therefore, as the cylinder wheel 21 of light shield M3, it is if preparing a diameter phi The cylinder wheel of 29cm, then according to the analog result of Figure 12, exposure slit width D during diameter phi=29cm is allowing defocus amount Δ About 5.4mm when Z is 25 μm；And it is about then 7.6mm when it is 50 μm to allow defocus amount Δ Z.

It is added with the exposure slit width D (7.4mm or 10.3mm) set relative to the cylinder wheel 21 as benchmark To compare.In the case of as the light shield face P1 of benchmark (the cylinder wheel 21 of diameter phi=52.5cm), by exposure slit width D It is set as 10.3mm (allowing 50 μm of defocus amount), and by the mobile speed of the substrate P set in a manner of it can obtain correct exposure amount Degree is set as V1.At this moment, 32 inches on the cylinder wheel 21 for and being formed in diameter phi=29cm are exposed in the substrate P of the same terms In the case of the pattern of the light shield M3 of the configuration one side of display panel, since exposure slit width D is that 7.6mm (allows to defocus 50 μm of amount), so when illumination is fixed, become V2=(7.6/ to obtain the movement speed V2 of substrate P of correct exposure amount 10.3) V1, the processing substrate speed of production line integrally substantially reduce by 25%.In the case where defocus amount Δ Z is allowed to be 25 μm, Productivity also with degree reduces.

Then, by Figure 15 to the configuration shown in previous Figure 14 by length-width ratio 16:9 32 inches of display panels The concrete example that light shield M3 is set as the cylinder light shield (cylinder wheel 21) on configuration two sides illustrates.In the Figure 15, picture area is shown The long edge size Ld of domain DPA is 70.8cm, short side dimension Le is 39.9cm.In addition, due to caused by peripheral circuit area TAB The enlargement ratio e2 that the enlargement ratio e1 of the length direction (Y-direction) of light shield M3 is set as 1.2 or so, short side direction (θ directions) is set It is 1.15 or so, so the Y-direction length L of light shield M3 increases 15cm or so and becomes 85.8cm；The θ directions length Lg of light shield M3 Increase 6cm or so and become 45.9cm.

Here, when the θ directions size of the interval Sx (remaining white portion 92) adjacent with the long side of light shield M3 is set as 10cm, packet The θ directions length of light shield region entirety containing two light shield M3 and two interval Sx becomes 110.8cm due to 2 (Lg+Sx).Cause This, as long as the diameter phi of cylinder wheel 21 in this case is 35.3cm or so.In addition, the light shield face P1 on cylinder wheel 21 The minimum 85.8cm of Y-direction length L.Length L (85.8cm) is just fallen in the exposure by being set as the cylinder wheel 21 of benchmark In the range of Y-direction overall with (the Y-direction combined length of the view field PA1~PA6) 87cm in light region.Therefore, shown in Figure 15 Light shield M3 configuration two sides the cylinder light shield cylinder wheel 21 of L=85.8cm (φ=35.3cm) and the cylinder as benchmark The light shield cylinder wheel 21 of L=85.9cm (φ=52.5cm) can be similarly mounted on exposure device U3 and by light shield M3's Pattern is efficiently exposed in substrate P.

Figure 16 is to represent that the light shield M3 by 32 inches of display panels shown in figure 15 is set as other of configuration two sides The expanded view of outline structure.In this, it is assumed that by with the light shield M3 that Figure 15 is identical size to show the length side of picture area DPA Seamlessly arrange two along Y-direction to the mode for θ directions, the Y-direction size L of two light shield M3 for 91.8cm (2 × 45.9cm).The Y-direction overall with that length L (91.8cm) does not fall within the exposure area by being set as the cylinder wheel 21 of benchmark (is thrown The Y-direction combined length of shadow zone domain PA1~PA6) in the range of 87cm.That is, after the light shield M3 identical with Figure 15 is rotated by 90 ° Configuration two sides can not be configured on the light shield face P1 of the cylinder wheel 21 as benchmark.

Figure 17 is represented other outline of the light shield M3 configuration one sides of 32 inches of display panels shown in figure 15 The expanded view of structure.In this, it is assumed that by with the light shield M3 that Figure 15 is identical size to show the short side side of picture area DPA It is configured to the mode for θ directions, and the interval Sx in portion 92 white more than θ directions is set as 10cm.The configuration of this light shield M3 is opposite Minimum in the occupied area of the light shield face P1 of the cylinder wheel 21 as standard, efficiency is bad.Therefore, if imagining size and Figure 17 The cylinder wheel 21 that the light shield M3 of one side is adapted to, then the θ directions ruler that the whole circumference length π φ of cylinder wheel 21 pass through light shield M3 is configured The size (10cm) of very little Lg (45.9cm) and remaining white portion 92 (Sx) adds up to and is π φ=55.9cm.It is straight due to cylinder wheel 21 Diameter φ is more than 17.8cm, it is possible to be considered as 18cm.In addition, Y-direction length L and Figure 15 of light shield M3 in this case is same Sample is 85.8cm, therefore ratio L/ φ are about 4.77.

If in this way, it is set as the diameter than the cylinder light shield (cylinder wheel 21) as standard(52.5cm) small diameter phi (18cm), though light shield M3 then can efficiently be configured on the P1 of light shield face, productivity (throughput) can reduce.According to figure 12 simulation, if if the diameter of light shield face P1 is set as 18.0cm, the exposure that will allow for when defocus amount Δ Z is set as 25 μm is narrow It is about 4.3mm to stitch width D, and the exposure slit width D that will allow for when defocus amount Δ Z is set as 50 μm is about then 6.0mm.Therefore, The movement speed V1 of substrate P when the movement speed V2 of substrate P is relative to cylinder light shield (cylinder wheel 21) used as standard, It is reduced with the narrowing of exposure slit width D.When will allow for defocus amount Δ Z and be set as 25 μm, V2=(4.3/7.4) V1, And when will allow for defocus amount Δ Z and being set as 50 μm, V2=(6.0/10.3) V1, no matter which kind of situation, with the circle used as standard The situation of cylinder light shield is compared, and productivity can all be reduced to about 58%.

Then, according to Figure 18 to by with the light shield M3 that Figure 15 is identical size as illustrated in fig. 15 with length direction towards Y The concrete example that the mode in direction arranges in the case of three on θ directions illustrates.The configuration of the light shield M3 of Figure 18 with previously Fig. 8 be similarly configuration three faces.

If the here, θ directions size of white portion 92 (Sx) or interval Sx more than will be adjacent with each long side of three light shield M3 9cm is set as, then since the short side direction size Lg of light shield M3 is 45.9cm, so the θ directions length of light shield region entirety is because of 3 (Lg+Sx) it is 164.7cm.In this case, if making the θ directions length of light shield region entirety and the whole circumference of cylinder wheel 21 Length π φ are consistent, then the diameter phi of cylinder wheel 21 is more than 52.43cm.The value and the diameter phi of the cylinder light shield as standard =52.5cm is roughly the same.In addition, the Y-direction size L in light shield region be 85.8cm, fall exposure area (view field PA1~ PA6 Y-direction) adds up within width 87cm.

If in this way, length-width ratio 16:If the light shield M3 of 9 32 inches of display panels, pass through the configuration shown in Figure 18 Three faces, it is only necessary to the ruler of white portion 92 and interval Sx more than adjustment on the light shield face P1 as the cylinder wheel 21 (φ=52.5cm) of standard It is very little, light shield M3 just can effectively be configured.Therefore, when light shield M3 being configured three faces as illustrated in fig. 18, due to remain to used as The size (φ × L) of the cylinder light shield of standard, so productivity will not reduce.In addition, in the case of the Figure 18, ratio L/ φ About 1.63, it falls in 1.3≤L/ of range φ≤3.8 for being considered effectively producing.

As shown in FIG. 15 to 18, by the cylinder light shield (cylinder as benchmark can be installed on exposure device U3 On the basis of the size of the light shield face P1 of wheel 21), when the display panel device for making arbitrary dimension, by on cylinder wheel 21 Light shield is configured one side or the side of adjustment in the way of the ratio L/ φ when multi-panel is configured in a manner of are set as 1.3~3.8 range The transfer of pattern in the case where not reducing production efficiency, can be effectively performed in tropism and face number.

In addition, Figure 15 to Figure 18 shows that picture area DPA is length-width ratio 16 for making:9 60 inches of one side On the basis of the size of the light shield face P1 of display panel device.However, it's not limited to that.It for example, it is also possible to will display picture area Domain DPA is with length-width ratio 16:9 high image quality size is set as 65 inches of pictures.In this case, the display picture being configured as shown in figure 13 The catercorner length Le of face region DPA is 165.1cm, is 80.9cm along the short side Lc that Y-direction extends, the length extended along θ directions Side Ld is 143.9cm.In addition, the size of the light shield M entirety including peripheral circuit area TAB and the ruler of display picture area DPA Very little compare becomes larger, and only along long side direction (θ directions) increase enlargement ratio e1=1.2, (length direction of display picture area DPA increases It is big 20%), and (short side direction of display picture area DPA increases along short side direction (Y-direction) increase enlargement ratio e2=1.15 15%).Therefore, length-width ratio 16:In the case of the light shield M of the configuration one side of 9 65 inches of display panels, the length of light shield M Direction size is 172.7cm due to e1AspLc as illustrated in fig. 13, the size of short side direction then as illustrated in fig. 13 because E2Lc and be 93.1cm.In the case of the light shield M of configuration one side, the white portion 92 that has a surplus is disposed adjacently along θ directions, if by it If θ directions size (Sx) are set as 5cm, then the θ directions size of light shield face P1 becomes about 178cm, diameter phi is more than 56.7cm. In addition, the Y-direction length due to light shield face P1 is 93.1cm, so in the light shield on the basis of 65 inches of the cylinder light shield And on the exposure device U3 that can be installed, with the Y-direction overall with of exposure area (the Y-direction width of view field PA1~PA6 It is total) be, for example, 95.0cm mode, six projection optical system PL equipped with the Y-direction size for changing view field PA. Alternatively, it is provided in the Y direction and has added seven projection optical systems of a projection optical system PL.The length-width ratio 16:9 The ratio L/ φ of cylinder light shield (cylinder wheel 21) of configuration one side of 65 inches of display panels be the (≒ 93.1/ of L/ φ=1.64 56.7).In addition, the diameter phi due to cylinder light shield is 56.7cm, so according to the analog result of Figure 12, exposure slit width D The about 7.5mm when will allow for defocus amount Δ Z and be set as 25 μm, and be about then 10.6mm when will allow for defocus amount Δ Z and be set as 50 μm.

Then, with reference to Figure 19, illustrate in length-width ratio 16:The cylinder light shield of the configuration one side of 9 65 inches of display panels The light shield M4 of three 37 inches of display panels is configured with configuration as shown in figure 18 on (φ=56.7cm, L=93.1cm) The concrete example of multi-panel.In Figure 19, the long side Ld (Y-direction) of 37 inches of display picture area DPA is 81.9cm, short side Lc (θ sides To) it is 46.lcm, if the enlargement ratio e1 to long side direction, the enlargement ratio e2 to short side direction are set as 1.15 (increases 15%), then the long edge size L (e1Ld) of light shield M4 is about 94.2cm, and short side dimension Lg (e2Le) is about 53.0cm.

If here, if the interval Sx between light shield M4 and light shield M4 is set as 6.0cm or so, three light on the P1 of light shield face M4 and three, cover is spaced Sx 177cm, diameter phi are more than 56.4cm.In addition, the Y-direction length L due to light shield M4 is 94.2cm, so falling in exposure area Y-direction overall with (95cm) in.In addition, in the case of Figure 19, the 7th projection optical system PL has been added in the Y direction and (has been thrown Shadow zone domain PA7), make the Y-direction overall with of exposure area become 95cm.As known from the above, it is shown by 37 inches shown in Figure 19 When three faces is configured in the light shield of panel, it can be used with being used for the cylinder light of the light shield M configuration one sides of 65 inches of display panels Cover the cylinder light shield that (cylinder wheel 21) is same shape size.In this way, in the case of the light shield M4 shown in Figure 19, it also can be opposite Interval Sx between the gross area of the light shield face P1 of the cylinder wheel 21 as benchmark, three light shield M4 of reduction is efficient to carry out Configuration, and the cylinder wheel 21 with the cylinder light shield equivalent diameter φ as benchmark can also be used, therefore can also inhibit with exposure The productivity that optical slits width D is reduced and generated is low.

In addition, the size of the display picture area DPA of display panel device is set as 37 inches, and will be with thereon In the case of light shield M4 configurations two sides, it can also use and be similarly configured with above-mentioned Figure 15.In this case, by two light shield M4 The whole circumference length π φ of cylinder light shield are set as with total sizes of two interval Sx on θ directions and are set as interval Sx If 6cm or so,Therefore, cylinder light when two sides light shield M4 is efficiently configured in a circumferential direction The diameter phi for covering (cylinder wheel 21) is more than 37.6cm.

In this case, ratio L/ φ are about 2.5 (≒ 94.2/37.6).In addition, in the cylinder wheel of diameter phi=37.6cm In the case of 21, according to the simulation of Figure 12, exposure slit width D about 6mm when it is 25 μm to allow defocus amount Δ Z is allowing It is about then 8.6mm when defocus amount Δ Z is 50 μm.With being set relative to the cylinder light shield as diameter phi=56.7cm of benchmark The exposure slit width D (7.5mm, 10.6mm) as benchmark compare, be either set as 25 μm will allow for defocus amount Δ Z Or under 50 μm of either case, productivity (movement speed of substrate P) is each about 80%.If however, it can make illuminating bundle EL1's Illumination when being exposed used as the cylinder light shield of benchmark compared with if increase 20% or so, then will not generate substantive life Production property is low.

Though in addition, the exposure device U3 of present embodiment projects the mask pattern of cylinder light shield (cylinder wheel 21) with equimultiple Onto substrate P, but it's not limited to that.Exposure device U3 can also adjust the structure of projection optical system PL and cylinder light shield The peripheral speed of (cylinder wheel 21) and the movement speed of substrate P etc. are projected to base after the pattern of light shield M is amplified with regulation multiplying power On plate P, it is projected in substrate P after can also being reduced with regulation multiplying power.

More than, in the cylinder light shield on the exposure device U3 of present embodiment is mountable to, such as Fig. 8, Fig. 9, Figure 14, figure 15th, shown in Figure 18, Figure 19, the long side direction of rectangular display picture area DPA is set as Y-direction, and separate along θ directions In the case of the configuration multi-panel for arranging to interval Sx more than two light shield regions (light shield M1, M2, M3, M4), the cylinder light shield (circle 21) cylinder wheel is formed as follows.

A kind of cylinder light shield, the shape along the barrel surface (P1) relative to center line (AX1) with radii fixus (Rm) Into there is mask pattern (light shield M1~M4), which is installed on exposure dress in a manner of it can be rotated around above-mentioned center line It puts, in above-mentioned barrel surface, has n (n >=2) along circumferencial direction (θ directions) interval Sx arrangement forms of above-mentioned barrel surface The rectangular light shield region (light shield M1~M4) of a display panel, which includes：Long edge size is Ld, short side ruler Very little is the display picture area (DPA) that the length-width ratio of Lc is Asp (=Ld/Lc)；It is adjacent with the periphery of the display picture area Peripheral circuit area (TAB), when length direction (Y-direction) the size L in above-mentioned light shield region is set as above-mentioned display picture area E1 times (enlargement ratio e1 >=1) of the long edge size Ld in domain, and short side direction (θ directions) size in above-mentioned light shield region is set as When e2 times (enlargement ratio e2 >=1) of the short side dimension Lc of above-mentioned display picture area, above-mentioned barrel surface is in above-mentioned center line side It is set as more than above-mentioned size L (=e1Ld) to the length of (Y-direction), the diameter of above-mentioned barrel surface is set as to the above-mentioned circle of φ The whole circumference length π φ in cylinder face are set as n (e2Lc+Sx), further so that size L and the ratio of diameter phi 1.3≤ The mode of the range of L/ φ≤3.8 sets above-mentioned diameter phi, above-mentioned number n, above-mentioned interval Sx.

[second embodiment]

Then, the exposure device U3a of second embodiment is illustrated with reference to Figure 20.In addition, to avoid repeating to record, Only illustrate the part different from first embodiment, for inscape identical with first embodiment, then mark and first The identical reference numeral of embodiment illustrates.Figure 20 is the exposure device (substrate board treatment) for representing second embodiment Integrally-built figure.The exposure device U3 of first embodiment is to keep passing through projection with cylindric substrate supporting cylinder 25 The structure of the substrate P in region, but the exposure device U3a of second embodiment by can in X/Y plane one-dimensional or two-dimensional movement Base supporting mechanism 12a substrate P is kept into it is planar.Therefore, the substrate P of present embodiment can be set with flexibility Fat (PET or PEN etc.) is the sheet substrate of sheet or the thin glass substrate of sheet of substrate.

In the exposure device U3a of second embodiment, base supporting mechanism 12a has flat equipped with substrate P is kept into The Substrate table 102 of the bearing surface P2 of planar and make Substrate table 102 in the face orthogonal with median plane CL in X direction scanning movement Mobile device (diagram omit).

Since the bearing surface P2 of the substrate P of Figure 20 is that (orthogonal with median plane CL is flat for plane substantially parallel with XY faces Face), thus from light shield M reflection, by being projected in substrate P after projection optical module PLM (projection optical system PL1~PL6) Projected light beam EL2 chief ray be configured to it is vertical with XY faces.

In addition, in second embodiment, when the projection multiplying power of projection optical module PLM is set as equimultiple (× 1), with Previous Fig. 2 similarly, when being observed in XZ faces, from the center of the odd number illumination region IR1 (and IR3, IR5) on light shield M All long range CCM of the point until the central point of even number illumination region IR2 (and IR4, IR6), with the base along bearing surface P2 The central point of odd number view field PA1 (and PA3, PA5) on plate P is to the second view field of even number PA2 (and PA4, PA6) Central point until X-direction (scan exposure direction) distance CCP, be set as being substantially equal.

In the exposure device U3a of Figure 20, also by the mobile device of 16 control base board supporting device 12a of slave control device (linear motor and fine motion actuator of scan exposure etc.), with keeping the rotation precision of cylinder wheel 21 of cylinder light shield M same Step ground drive substrate platform 102.Therefore, the shift position of the x-direction and y-direction of Substrate table 102 passes through ranging laser interferometer Or linear encoder critically measures, the rotation position of cylinder wheel 21 is critically measured also by rotary encoder.In addition, The bearing surface P2 of Substrate table 102 can also by scan exposure by substrate P with the absorption retainer of vacuum suction, Electrostatic Absorption It forms, it can also be by forming hydrostatic gas-lubricated bearing between bearing surface P2 and substrate P come with contactless state or low friction state The bernoulli type retainer of supporting substrates P is formed.

It, can since substrate P can be the sheet substrate (web) of flexible strip in the case of bernoulli type retainer While the tension for assigning X-direction (and Y-direction) to substrate P, substrate P is made to be moved to X-direction, so Substrate table need not be made 102 (bernoulli type retainers) to X, Y-direction move, as long as in addition, bearing surface P2 be also have can cover view field PA1~ The area of the range of PA6 can seek the miniaturization of Substrate table 102.In addition, in the case of bernoulli type retainer, if If sheet substrate of the substrate P for strip, due to can scan exposure on one side substrate P is made continuously to be moved to strip direction while, so Compared with the situation of the absorption retainer of the additional times such as absorption/opening with needing substrate P, it is more suitable for the manufacture of roll-to-roll mode.

As shown in exposure device U3a, bearing surface P2 is being set as plane substantially parallel with XY faces, and by substrate P branch It holds in the case of being planar, the shape conditions (L/ of the cylinder wheel 21 by making light shield M (M1~M4) being kept into cylindrical shape φ) meet the relationship illustrated by previous first embodiment, and can be efficient by the mask pattern of the display panel of various sizes Ground is arranged in substrate P and is exposed, and can inhibit productive reduction.

[third embodiment]

Then, the exposure device U3b of third embodiment is illustrated with reference to Figure 21.In addition, to avoid repeating to record, Only illustrate the part different from first, second embodiment, for the inscape identical with first, second embodiment, then The mark reference numeral identical with first, second embodiment illustrates.Figure 21 is the exposure dress for representing third embodiment Put the integrally-built figure of (substrate board treatment).The exposure device U3b of second embodiment is using the light reflected by light shield As the structure of the reflection-type light shield of projected light beam EL2, but the exposure device U3b of third embodiment is used through light shield Light as projected light beam EL2 infiltration type light shield structure.

In the exposure device U3b of third embodiment, light shield holding mechanism 11a has：Light shield MA is kept into cylinder Cylinder wheel (light shield holding cylinder) 21a of shape；Support the deflector roll 93 of light shield holding cylinder 21a；Drive the driven roller of light shield holding cylinder 21a 98；And driving portion 99.

Light shield holding cylinder 21a forms the light shield face (P1) for the illumination region IR configurations on light shield MA.In present embodiment, Light shield face is set to the barrel surface for having radius Rm (diameter phi=2Rm) relative to the center line AX1 ' extended along Y-direction.Cylinder Face is, for example, peripheral surface of the peripheral surface of cylinder, cylinder etc..Light shield holding cylinder 21a is configured to have by such as glass or quartz etc. The circular transparent tube of fixed thickness, peripheral surface (barrel surface) form light shield face.

Light shield MA is e.g. at one of the very thin glass plate of the good strip of flatness (such as thickness is 100~500 μm) The planar thin slice light shield of figuratum infiltration type is formed on face with light shield layers such as chromium, makes it along the outer of light shield holding cylinder 21a Circumferential surface is bent, and is used in the state of winding in (fitting) to the peripheral surface.Light shield MA has the non-pattern being unpatterned Forming region is installed in non-pattern forming region (being equivalent to the remaining white portion 92 on periphery etc.) on light shield holding cylinder 21a.Therefore, In this case, light shield MA can be assembled and disassembled relative to light shield holding cylinder 21a.Generation can also be configured by planar thin slice light shield The structure as light shield MA on the peripheral surface of light shield holding cylinder 21a (circular transparent tube) is wound to, and by circular transparent Directly describe on the peripheral surface of light shield holding cylinder 21a that is made of cylinder and form the mask pattern formed with light shield layers such as chromium and progress one Body.In this case, light shield holding cylinder 21a also serves as the bearing part (light shield bearing part) of light shield MA and functions.

Deflector roll 93 and driven roller 98 extend in the parallel Y directions of the center line AX1 ' relative to light shield holding cylinder 21a. Though deflector roll 93 and driven roller 98 with circumscribed near the Y-direction end of light shield holding cylinder 21a, not with light shield holding cylinder 21a institutes The mode of the pattern forming region contact of the light shield MA of holding is set.Driven roller 98 is connect with driving portion 99.Driven roller 98 passes through Light shield holding cylinder 21a is transferred to by next torque is supplied from driving portion 99, and makes light shield holding cylinder 21a around center axis rotation.

The light supply apparatus 13a of present embodiment has light source identical with first embodiment (diagram is omitted) and multiple photographs Bright optical system ILa (ILa1~ILa6).Part or all of configuration of each lamp optical system ILa1~ILa6 is protected in light shield It holds on the inside of a 21a (cricoid transparent tube), from inside to the light shield that is maintained on light shield holding cylinder 21a peripheral surfaces (light shield face P1) Each illumination region IR1~IR6 on MA is illuminated.

Each lamp optical system ILa1~ILa6 has fly's-eye lens and bar-shaped integrator (rod integrator) etc., leads to Over-illumination light beam EL1 illuminates each illumination region IR1~IR6 with uniform illumination.In addition, light source can be only fitted to light shield The inside of holding cylinder 21a can also be configured in the outside of light shield holding cylinder 21a.In addition, light source can also be with exposure device U3b It is provided separately, is guided via light elements such as optical fiber and relay lens.

It, also can be by making to keep light shield MA when as in the embodiment described in, using infiltration type cylinder light shield as light shield Shape conditions (L/ φ) into cylindric light shield bearing cylinder 21a meet relationship illustrated by previous first embodiment, and The mask pattern of the display panel of various sizes is efficiently arranged in substrate P and is exposed, and productive reduction can be inhibited.

More than exposure device U3, U3a, U3b of first, second, third each embodiment be all that will be formed in cylindric light Mask pattern on cover P1 (cylinder wheel 21, light shield holding cylinder 21a) is projected via projection optical module PLM (PL1~PL6) to expose Mode on light to substrate P.However, in the case of the infiltration type cylinder light shield (MA) as described in third embodiment, may be used also To be set as the following scanning-exposure apparatus close in a manner of (proximity), in the peripheral surface (light shield of infiltration type cylinder light shield Face P1) and the mode that gap (tens μm~hundreds of μm) are remained fixed between the object i.e. surface of substrate P is exposed, it will transmit through type circle Cylinder light shield (MA), close to configuration, makes substrate P toward a direction synchronizing moving with substrate P while infiltration type cylinder light shield is rotated.

In addition, in first to each embodiment of third exposure device U3, U3a, U3b, in order to correspond to install Cylinder light shield (cylinder wheel 21, light shield holding cylinder 21a) the transformable situation of diameter phi, and there is provided cylinder light can be adjusted The mechanism of the bearing position (Z location) of cover or adjustment lamp optical system IL's and the optical device in projection optical system PL Mechanism of state etc..In this case, for the diameter phi of cylinder light shield installed for exposure device, exist from minimum diameter The model circle of φ 1 to maximum gauge φ 2.Therefore, according to the size for the display panel to be manufactured, with the configuration of light shield (M, M1~M4) When on one side or the mode of configuration multi-panel makes cylinder light shield, preferably with 1≤φ of relationship and φ of 1.3≤L/ of satisfaction φ≤3.8 The geomery of the mode of the relationship of≤φ 2, setting cylinder light shield 21 and light shield holding cylinder 21a.

Then, device making method is illustrated with reference to Figure 22.Figure 22 is the device for representing to be carried out by device inspection apparatus The flow chart of part manufacturing method.

In device making method shown in Figure 22, first, the aobvious of the selfluminous element formation such as based on organic EL is carried out Show function, the performance design of panel, with the circuit pattern of the designs such as CAD and wiring pattern (step S201).Then, according to With various each layer patterns of the designs such as CAD, the cylinder light shield (step S202) of layer amount needed for making.At this moment, cylinder light shield The relationship for being fabricated to diameter phi and length L (La) meets 1.3≤L/ φ≤3.8 and meets the item that can be mounted on exposure device Part and φ 1≤φ≤φ 2.In addition, preparation is wound with flexible substrate P (resin film, the gold of the base material as display panel Belong to paper tinsel film, plastics etc.) supply reel FR1 (step S203).In addition, the scroll-like substrate P prepared in step S203 Can its surface carried out as needed modified or formed bottom in advance (such as by stamped method (imprint) To minute asperities) substrate or be laminated with the functional membrane of photoinduction or the substrate of hyaline membrane (insulating materials) in advance.

Then, the electrode or wiring, insulating film, TFT (films half by forming display panel device are formed in substrate P Conductor) etc. compositions backplane level, and the hair being made of selfluminous elements such as organic EL is formed in a manner of being laminated on the bottom plate Photosphere (display pixel portion) (step S204).In step S204, including：As the exposure illustrated by previous each embodiment The cylinder light shield of the upper installation provision of electro-optical device U3, U3a, U3b makes the photoinduction layer (photoresist being coated on substrate P surface Layer, photonasty silane coupling agent layer etc.) exposure, so as to form the exposure process of the picture (sub-image etc.) of mask pattern on the surface； The substrate P of mask pattern is formed with exposed after development as needed, metal film pattern (cloth is formed with electroless plating method Line, electrode etc.) wet type operation；Alternatively, the printing process by depicting pattern such as the conductive inks containing Nano silver grain Deng processing.

Then, each display panel device continuously produced in strip substrate P in a manner of volume is cut into substrate P, Bonding protective film (to the separation layer of environment) or colored filter film etc., carry out assembly device on the surface of each display panel device (step S205).Then, carry out whether display panel device can work normally or whether meet desired performance and characteristic Inspection operation (step S206).Thereby, it is possible to produce display panel (flexible display).

Reference sign

1 device inspection apparatus

2 substrate feeding devices

4 substrate retracting devices

5 host control devices

11 light shield holding mechanisms

12nd, 12a base supporting mechanisms

13 light supply apparatus

16 slave control devices

21 cylinder wheels

21a light shield holding cylinder

25 substrate supporting cylinders

31 light sources

32 light guide members

41 1/4 wavelength plates

51 collimation lenses

52 fly's-eye lenses

53 collector lenses

54 cylindrical lenses

55 illumination visual field apertures

56 relay lens systems

61 first optical systems

62 second optical systems

63 projection visual field apertures

64 focuses correct optical component

65 as switching optical component

66 multiplying power amendment optical components

67 rotation correction mechanisms

68 polarization adjustment mechanisms

70 first are biased to component

71 first lens groups

72 first concave mirrors

80 second are biased to component

81 second lens groups

82 second concave mirrors

More than 92 white portions

P substrates

FR1 supply reels

FR2 recycling reels

U1~Un processing units

U3, U3a, U3b exposure device (substrate board treatment)

M, M1, M2, M3 light shield

AX1 first axles

The second axis of AX2

P1 light shields face

P2 bearing surfaces

P7 intermediate image planes

EL1 illuminating bundles

EL2 projected light beams

Rm radius of curvature

Rp radius of curvature

CL median planes

PBS polarization beam apparatus

IR1~IR6 illumination regions

IL1~IL6 lamp optical systems

ILM illumination optics modules

PA1~PA7 view fields

PLM projection optical modules

Claims

1. a kind of cylinder light shield along relative to center line there is the barrel surface of radii fixus and a diameter of φ to form display surface The mask pattern of plate, and be mounted in exposure device in a manner of it can be rotated around the center line, which is characterized in that

The rectangular light shield region of display panel is formed in the barrel surface, which is including long edge size Ld, the display picture area that short side dimension is Lc and the peripheral circuit area being disposed adjacently with its periphery,

As the e that the size of the long side direction in the light shield region is set as to the long edge size Ld₁Again, by the light shield region The size L of short side direction is set as the e of the short side dimension Lc₂Times when, wherein, e₁>=1, e₂>=1, the barrel surface described Length on the direction of center line is set as more than the size L, the barrel surface determined by pi and the diameter phi Whole circumference length π φ be set as e1 times or more of the size Ld, and the size L and ratio L/ of the diameter phi φ is set as the range of 1.3≤L/ φ≤3.8, and the diameter phi is set as to be mounted on the exposure device most In the range of minor diameter φ 1 and maximum gauge φ 2.

2. cylinder light shield according to claim 1, which is characterized in that

With for along the cylinder base material of the barrel surface of the diameter phi holding mask pattern.

3. cylinder light shield according to claim 2, which is characterized in that

The cylinder base material is made of metal cylinder,

The mask pattern is configured to reflection-type mask pattern, and the reflection-type mask pattern passes through the week in the cylinder base material It is directly formed on face and is formed for the high reflection portion of the illumination light from the exposure device and low reflecting part.

4. cylinder light shield according to claim 2, which is characterized in that

The mask pattern is configured to reflection-type thin slice light shield, and the reflection-type thin slice light shield on thin plate by forming for next It is formed from the high reflection portion of the illumination light of the exposure device and low reflecting part,

The reflection-type thin slice light shield is maintained as cylindrical shape along the circumferential surface of the cylinder base material,

Diameter of the diameter phi for the figuratum light shield face of formation of the reflection-type thin slice light shield.

5. cylinder light shield according to claim 4, which is characterized in that

The cylinder base material keeps the reflection-type thin slice light shield in a manner of it can assemble and disassemble the reflection-type thin slice light shield.

6. cylinder light shield according to claim 2, which is characterized in that

The cylinder base material is made of circular transparent tube,

The mask pattern is configured to infiltration type mask pattern, and the infiltration type mask pattern is filled by using that will come from the exposure The light shield layer of illumination light shading put directly forms pattern on the circumferential surface of the transparent tube and forms.

7. cylinder light shield according to claim 2, which is characterized in that

The cylinder base material is made of circular transparent tube,

The mask pattern is configured to the infiltration type thin slice light shield formed by thin glass plate, by will be from the exposure device The light shield layer of illumination light shading is formed with pattern on the thin glass plate,

The infiltration type thin slice light shield is maintained as cylindrical shape along the circumferential surface of the cylinder base material,

Diameter of the diameter phi for the figuratum light shield face of formation of the infiltration type thin slice light shield.

8. cylinder light shield according to claim 7, which is characterized in that

The cylinder base material keeps the infiltration type thin slice light shield in a manner of it can assemble and disassemble the infiltration type thin slice light shield.

9. according to cylinder light shield according to any one of claims 1 to 8, which is characterized in that

The size L and the relationship of the diameter phi are also set to 1.3≤L/ of satisfaction φ≤2.6.

10. according to cylinder light shield according to any one of claims 1 to 8, which is characterized in that

The mask pattern includes：With for partly being led to the film that is driven of each pixel being configured in the display picture area The corresponding pattern of structure of body and be configured the peripheral circuit area and for drive show picture circuit it is corresponding Pattern.

11. according to cylinder light shield according to any one of claims 1 to 8, which is characterized in that

The display picture area is corresponding with the display picture of liquid crystal display or organic el display.

12. according to cylinder light shield according to any one of claims 1 to 8, which is characterized in that

The ratio of the long edge size Ld and the short side dimension Lc of the display picture area are 16：9 or 2：1.

13. a kind of cylinder light shield forms mask pattern, and with energy along the barrel surface relative to center line with radii fixus It is enough to be mounted in exposure device around the mode that the center line rotates, which is characterized in that

Size L of the region of the formation mask pattern in the barrel surface on the direction of the center line is set as passing through The length in the maximum exposure region on the direction of the center line that the exposure device can expose is hereinafter, and the barrel surface Diameter phi be set as to be mounted in the range of minimum diameter φ 1 and maximum gauge φ 2 on the exposure device.

14. cylinder light shield according to claim 13, which is characterized in that

The size L and ratio L/ φ of the diameter phi be set as 1.3≤L/ φ≤3.8 range or 1.3≤L/ φ≤ 2.6 range.

15. cylinder light shield according to claim 14, which is characterized in that

The rectangular light shield region of one or more display panels is formed in the barrel surface, which includes The rectangular display picture area that long edge size is Ld, short side dimension is Lc and the periphery electricity being disposed adjacently with its periphery Road region.

16. cylinder light shield according to claim 15, which is characterized in that

In the case of forming a light shield region in the barrel surface, by the long side ruler of the display picture area The direction of very little Ld is set as the circumferencial direction of the barrel surface, matches in the direction of the short side dimension Lc along the direction of the center line It puts.

17. cylinder light shield according to claim 15, which is characterized in that

In the case of multiple light shield regions are formed in the barrel surface, by the long side ruler of the display picture area The direction of very little Ld is set as the direction of the center line, the direction of the short side dimension Lc is set as to the circumference side of the barrel surface To multiple light shield regions is made along the circumferential direction to be configured in a row.

18. a kind of exposure method, by scanning-exposure apparatus, scan exposure is gone out and is formed with regulation aspect ratio on the substrate of strip Mask pattern, which is characterized in that including：

Cylinder light shield is made to become scanning with the circumferencial direction relative to barrel surface of the center line with radii fixus and a diameter of φ The mode in the direction of exposure is rotated with defined rotary speed, wherein the center line is orthogonal with the direction of the scan exposure Side upwardly extend, the cylinder light shield can around the center line rotate and be formed with the light shield along the barrel surface Pattern；

By the direction that the direction setting of the strip of the substrate is the scan exposure, the substrate is made to be moved with defined speed It is dynamic,

When the mask pattern that will be formed in the barrel surface of the cylinder light shield is on the direction of the center line When size is set as L, the ratio L/ φ of the diameter phi and the size L are set as the range of 1.3≤L/ φ≤3.8.

19. a kind of exposure method, by scanning-exposure apparatus, scan exposure goes out pattern on substrate, it is vertical which is formed in regulation In the rectangular light shield region of horizontal ratio, which is characterized in that including：

Cylinder light shield is made to be mounted on the scan exposure in a manner of the direction that the circumferencial direction of barrel surface becomes scan exposure to fill It puts and is rotated around defined center line with defined rotary speed, wherein, the barrel surface is with relative to the center line Diameter phi bending with radii fixus and the length with size L on the direction of the center line, the cylinder light shield edge It the barrel surface and is formed with one or more light shield regions, and the ratio L/ φ of the diameter phi and the size L It is set as the range of 1.3≤L/ φ≤3.8；

The substrate is made to be moved on the direction of the scan exposure with the speed synchronous with the rotary speed of the cylinder light shield.

20. exposure method according to claim 19, which is characterized in that

In the barrel surface of the cylinder light shield, display panel is formed in a manner of short side and the centerline parallel and is used Rectangular 1 light shield region, which includes：Long edge size is Ld, short side dimension is Lc display picture area, With the peripheral circuit area being disposed adjacently with its periphery,

The long side ruler is set as when the size of the long side direction in the light shield region is included the peripheral circuit area inside The e of very little Ld₁Again, the size of the short side direction in the light shield region is included into the peripheral circuit area and is set as described short inside The e of side size Lc₂Times when, wherein, e₁>=1, e₂>=1,

The diameter phi and the size L are set as meeting π φ >=e1Ld and L >=e2Lc, and wherein π is pi.

21. exposure method according to claim 19, which is characterized in that

In the barrel surface of the cylinder light shield, with long side and the centerline parallel and along the circumference side of the barrel surface There is the rectangular light shield region of n display panel to the mode arrangement form of interval Sx, wherein, n >=2, the light shield Region includes the display picture area that long edge size is Ld, short side dimension is Lc and the periphery being disposed adjacently with its periphery electricity Road region,

As the e for the long edge size Ld that the size of the long side direction in the light shield region is set as to the display picture area₁Again, will The size of the short side direction in the light shield region is set as the e of the short side dimension Lc of the display picture area₂Times when, wherein, e₁≥ 1, e₂>=1, the whole length La on the direction of the center line of the barrel surface is set as more than the size L, and So that the ratio L/ φ meet 1.3~3.8 range and as π φ=n (e₂Lc+Sx mode) sets the diameter φ, number n, the interval Sx.

22. the exposure method according to claim 20 or 21, which is characterized in that

The pattern for being formed in the light shield region includes：Form for be arranged in it is described display picture area each pixel into Row driving thin film semiconductor pattern and be configured the peripheral circuit area and for drive show picture circuit pair The pattern answered.

23. exposure method according to claim 22, which is characterized in that

The ratio of the display picture area and the long edge size Ld and short side dimension Lc are 16：9 or 2：1 liquid crystal display Device or the display picture of organic el display correspond to.

24. the exposure method according to any one of claim 19~21, which is characterized in that

The pattern for being formed in the light shield region in the barrel surface of the cylinder light shield is reflection-type mask pattern, the reflection-type Mask pattern is made of the high reflection portion and low reflecting part for being directed to the illumination light of exposure.

25. exposure method according to claim 24, which is characterized in that

The scanning-exposure apparatus has：

Lamp optical system is used to use the illumination region irradiation exposure being set in the barrel surface of the cylinder light shield Illumination light；

Projection optical system, incidence appear in the reflected light from the reflection-type mask pattern in the illumination region, And the picture of the mask pattern is projected into the view field set on the substrate；

Polarization beam apparatus is configured between the cylinder light shield and the projection optical system, is made from the light optics The illumination light of system is reflected towards the cylinder light shield, and makes the reflected light from the cylinder light shield described in Projection optical system penetrates.

26. exposure method according to claim 25, which is characterized in that

The projection optical system as equimultiple projects to the base by the reflection-type mask pattern of the cylinder light shield On plate.