CN105892237A

CN105892237A - Illumination device

Info

Publication number: CN105892237A
Application number: CN201610291349.4A
Authority: CN
Inventors: 根岸武利; 福井达雄
Original assignee: Nikon Corp
Current assignee: Nikon Corp
Priority date: 2012-05-29
Filing date: 2013-05-22
Publication date: 2016-08-24
Anticipated expiration: 2033-05-22
Also published as: HK1247672A1; CN104471486A; CN107315323A; KR20150027741A; CN105892237B; JPWO2013179977A1; TW201409184A; CN104471486B; CN107315323B; CN107741685A; WO2013179977A1

Abstract

An illumination device (IU) comprises: a first light source unit (21a); a second light source unit (21b) with a light emission direction which differs from that of the first light source unit; and a deflector unit (22) which deflects at least a portion of light such that a progress direction of light from the first light source unit and of light from the second light source unit are collected. The first light source unit and the second light source unit are positioned in different locations in prescribed directions such that illumination regions into which light enters which is emitted from each light source unit and transits the deflection unit are aligned contiguously in the prescribed directions.

Description

Illuminator

The application be Chinese Patent Application No. be 201380037678.0, to enter State Period date be January 14 in 2015 Day, international filing date be on May 22nd, 2013, PCT international application no be PCT/JP2013/064228, invention entitled " illumination Device, processing means and device making method " the divisional application of application for a patent for invention.

Technical field

The present invention relates to illuminator.

61/652, No. 719 CLAIM OF PRIORITY of the application U.S. Provisional Application based on May 29th, 2012, and help at this Use its content.

Background technology

In recent years, as the display device of television set etc., it is used mostly the flat faced displays such as such as display panels.? In the manufacture of the such various devices of flat faced display, utilize the processing meanss such as exposure device.Such as, utilize based on exposure device And the photoetching method realized, etching technique etc., form the various film figures such as transparent membrane electrode on a glass, thus manufacture Display panels.As photoetching method, substituted glass plate is proposed and to mask figure on the plate shape substrates of wound into rolls The method (patent documentation 1 for example, referring to following) as carrying out projection exposure of case.

Prior art literature

Patent documentation

Patent documentation 1: Japanese Laid-Open 2007-114385 publication

Summary of the invention

Expect that the processing meanss such as exposure device expand process range for the viewpoint that can manufacture device etc. efficiently, In the illuminator of such processing means, it is desirable to expand light on the direction vertical with the moving direction of treated object Range of exposures.

The purpose of the present invention program is, it is provided that a kind of can expand the illuminator of process range, processing means and device Part manufacture method.

The 1st scheme according to the present invention, it is provided that a kind of illuminator, has: the 1st light source portion；2nd light source portion, its light Injection direction is different from above-mentioned 1st light source portion；And deflector, it is so that from the light in above-mentioned 1st light source portion with from the above-mentioned 2nd The mode that the direct of travel of the light in light source portion is consistent, makes at least some of deflection of this light, above-mentioned 1st light source portion and the above-mentioned 2nd Light source portion is so that the most continuous from the injection of each light source portion the illumination region injected via the light of above-mentioned deflector The mode of ground arrangement, is arranged in diverse location in above-mentioned prescribed direction.

The 2nd scheme according to the present invention, it is provided that a kind of processing means, is formed into the pattern of mask pattern and is transferred to have On the substrate of inductive layer, this processing means has: the illuminator of the 1st scheme being illuminated above-mentioned mask pattern；With make The mobile device of the direction relative movement that above-mentioned mask pattern is vertical with above-mentioned prescribed direction with aforesaid substrate edge.

The 3rd scheme according to the present invention, it is provided that a kind of device making method, including: by the processing means of the 2nd scheme, Make above-mentioned mask pattern and aforesaid substrate relative movement while being transferred to continuously on aforesaid substrate by above-mentioned pattern；Utilize Subsequent treatment is implemented in change transferred with the inductive layer of the aforesaid substrate of above-mentioned pattern.

Invention effect

Mode according to the present invention, using the teaching of the invention it is possible to provide a kind of expand the illuminator of process range, processing means and device Manufacture method.

Accompanying drawing explanation

Fig. 1 is the figure of the example representing device inspection apparatus.

Fig. 2 is the side view of the processing means (exposure device) representing the 1st embodiment.

Fig. 3 is the front view of the processing means (exposure device) representing the 1st embodiment.

Fig. 4 A is the figure of the lighting module representing the 1st embodiment.

Fig. 4 B is the figure of the lighting module representing the 1st embodiment.

Fig. 5 is the axonometric chart of the deflector representing the 1st embodiment.

Fig. 6 is the top view of the deflector representing the 1st embodiment.

Fig. 7 is the figure of the example representing Illumination Distribution and optical filter.

Fig. 8 is the figure of other examples representing Illumination Distribution and optical filter.

Fig. 9 is the side view of the processing means (exposure device) representing the 2nd embodiment.

Figure 10 is the axonometric chart of the illuminator representing the 2nd embodiment.

Figure 11 is the top view of the illuminator representing the 2nd embodiment.

Figure 12 is the top view of the light source of the illuminator representing the 2nd embodiment.

Figure 13 A is the figure of the optics rod unit of the illuminator representing the 2nd embodiment.

Figure 13 B is the figure of the optics rod unit of the illuminator representing the 2nd embodiment.

Figure 14 is the top view of the relay lens of the illuminator representing the 2nd embodiment.

Figure 15 is the figure of the deflector of the illuminator representing the 2nd embodiment.

Figure 16 is the figure of the diaphragm parts of the illuminator representing the 2nd embodiment.

Figure 17 is the side view of the processing means (exposure device) representing the 3rd embodiment.

Figure 18 is the top view of the processing means (exposure device) representing the 3rd embodiment.

Figure 19 is the side view of the processing means (exposure device) representing the 4th embodiment.

Figure 20 is the front view of the processing means (exposure device) representing the 4th embodiment.

Figure 21 is the front view of the deflector of the illuminator representing the 4th embodiment.

Figure 22 is the flow chart of the example representing device making method.

Detailed description of the invention

[the 1st embodiment]

Fig. 1 is the figure of the structure example representing device inspection apparatus SYS (flexible display production line).Here, show from The flexible substrate P (sheet, film etc.) that supply roll FR1 is drawn winds via n platform processing means U1, U2, U3, U4, U5 ... Un successively To the example reclaimed volume FR2.

In FIG, XYZ orthogonal coordinate system being set to, the surface (or back side) of substrate P is set to vertical with XZ face, with The direction (width) that the conveyance direction (length direction) of substrate P is orthogonal is set to Y direction.Z-direction is set to Such as vertical, X-direction and Y direction are set to horizontal direction.Additionally, for convenience of description, sometimes will be from X-axis side The figure observed to (downstream of conveyance direction) is referred to as front view, by observe from Y direction (direction of center of rotation axle) Figure is referred to as side view, and the figure observed from Z-direction (top of vertical) is referred to as top view.

The substrate P being wound in supply roll FR1 is brought out, by marginal position control by the driving roller DR1 of clamping Device EPC1 and be positioned in the Y direction and to processing means U1 carry.

Processing means U1 is that by photonasty functional liquid, (photoresists, photonasty coupling material, UV solidify resin with mode of printing Liquid etc.) applying device on substrate P surface it is coated on continuously or optionally along the conveyance direction (length direction) of substrate P.? Being provided with applying mechanism Gp1 and drier Gp2 etc. in processing means U1, wherein, this applying mechanism Gp1 includes winding substrate P Pressure roller DR2, in this pressure roller DR2, photonasty functional liquid is uniformly applied to substrate P surface painting application roller or The relief printing plate optionally applied by photonasty functional liquid or the forme roller etc. of intaglio plate, drier Gp2 is for removing quilt rapidly It is coated on solvent or moisture that the photonasty functional liquid of substrate P is comprised.

Processing means U2 is heater, for the substrate P moved from processing means U1 is heated to set point of temperature (example As, several 10 DEG C to about 120 DEG C) and make the photonasty functional layer being applied to surface stably fix.In processing means U2 It is provided with the multiple rollers for conveyance of substrate P being turned back and air turning-bar (air turn bar), cooling chamber portion HA2, clamping Drive roller DR3 etc..

Processing means U3 as exposure device includes exposure device, and this exposure device is to moving from processing means U2 The photonasty functional layer of substrate P irradiates the patterned of the ultraviolet corresponding with the circuit pattern of display and wiring pattern Light.The marginal position control that the center of the Y-direction (width) of substrate P is controlled in fixed position it is provided with in processing means U3 Device EPC2 processed, the driving roller DR4 of clamping, by air bearing layer with the back side of the regulation tension force substrate P to transporting in X direction with The flexure plane of plane or cylindrical shape carries out the substrate-placing platform ST (substrate supporting parts) that supports and for giving substrate P Two groups of drivings roller DR6, DR7 etc. of lax (enough and to spare) DL of regulation.

And be additionally provided with in processing means U3: rotating cylinder 14, it is wound with the mask substrate of lamellar on outer peripheral face (hereinafter referred to as mask pattern M) and rotate around the centrage parallel with Y-direction；Illuminator IU, it is to being wound on this rotation rolling Mask pattern M on cylinder 14 irradiates the exposure illumination light of the slit-shaped along Y-direction extension and is transferred by the pattern of mask pattern M To by the substrate-placing platform ST part with the substrate P of plane supporting；And aligming microscope AM, it is in order to make to be transferred Pattern detect, with substrate P, the alignment mark etc. being previously formed in substrate P relative to para-position (alignment).

Processing means U3 of Fig. 1 includes the so-called exposure device close to (proximity) mode, will be wound with mask figure The rotation cylinder 14 of case M, as mask body, makes mask body and substrate P close with specified gap (within tens of μm), and by mask Pattern on body is transferred in substrate P.It is not limited to the transfer modes of the pattern realized based on processing means U3, it is also possible to be Or substrate P is wound on by the way of the picture of mask pattern is projected by projection optical system the mask body of cylindrical shape The way of contact on periphery.It addition, about mask body, rotate cylinder 14 and mask pattern M can separate, it is also possible to cannot Separate.Such as, mask body can form by formation mask pattern M on the surface rotating cylinder 14.

Processing means U4 is wet type processing device, enters the photonasty functional layer of the substrate P moved from processing means U3 At least one in such various wet processed such as row development treatment based on wet type, electroless plating process.

Processing means U5 is heat drying apparatus, heats the substrate P moved from processing means U4, will be in wet type In technique, the moisture of the substrate P of moistening is adjusted to setting, but detailed.Then, if will fill through dry-cure Substrate P after putting and passing through last processing means Un of series of process controls via driving roller DR9 and the marginal position of clamping Device EPC3 and be wound to reclaim volume FR2.

Higher level controls device CONT and is uniformly controlled the operating of each processing means U1 to Un constituting production line, also based on everywhere The treatment situation of reason device U1 to Un and the monitoring of conveyance state of substrate P processed between the supervision of state, processing means, thing Before/result of inspection/measurement afterwards carries out feedback modifiers or feedforward correction etc..

The substrate P used in present embodiment is such as resin molding, the paper tinsel that is made up of metal or alloy such as rustless steels (foil) etc..The material of resin molding includes such as polyvinyl resin, acrylic resin, polyester resin, ethylene-vinyl base co-polymer Resin, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene tree One or more in fat, vinyl acetate resin.

Expect that substrate P selects the material that thermal coefficient of expansion is little, thus can essence ignore because being subject in various treatment process The deflection that thermal conductance causes.Thermal coefficient of expansion can by such as inorganic filler is mixed in resin molding be set smaller than with The corresponding threshold value such as technological temperature.Inorganic filler can be such as titanium oxide, zinc oxide, aluminum, silicon oxide etc..It addition, substrate P Can be the individual layers that thickness is the very thin glass about 100 μm manufactured with floating system (float) method etc., it is also possible to be in this pole Fit on thin glass the duplexer of above-mentioned resin molding, paper tinsel etc..It addition, substrate P can be incited somebody to action beforehand through the pre-treatment of regulation Its surface modification and activation or be formed with fine next door structure (sag and swell) for precise pattern from the teeth outwards.

The device inspection apparatus SYS of Fig. 1 repeats or performs to be used for manufacturing device (display floater etc.) to substrate P continuously Various process.It is performed the substrate P after various process and splits (cutting) by each device, and become multiple device.About base The size of plate P, such as, the size of width (as the Y direction of minor face) is about 10cm to 2m, length direction (as The X-direction on long limit) size be more than 10m.

Then, the structure of processing means U3 is described in detail.Fig. 2 is the exposure device as processing means U3 The side view of EX, Fig. 3 is the front view of this exposure device EX.

Exposure device EX shown in Fig. 2 is so-called scanning-exposure apparatus, makes substrate P (sensitive film) and mask pattern M phase With the exposure light from mask pattern M, substrate P is scanned moving, thus will be formed in the exposure of mask pattern M Pattern is transferred in substrate P.The conveyance direction of the substrate P on substrate-placing platform ST and the exposure light from mask pattern M injection In substrate P, the direction (scanning direction) of scanning is roughly the same.

It addition, exposure device EX is the exposure device close to mode, make substrate P and mask pattern M shape close to each other Under state, by illumination light L from illuminator IU, mask pattern M is illuminated, and makes from illuminated mask pattern M injection Exposure light be irradiated in substrate P, thus, not via projection optical system, exposing patterns is transferred in substrate P.

Exposure device EX has: make substrate P and the mobile device 10 of mask pattern M relative movement；Mask pattern M is carried out The illuminator IU of illumination；For making the exposing patterns being transferred and the substrate P aligming microscope AM relative to para-position (to quasi-optics System)；Detection is irradiated in the illumination monitoring device 11 (measurement of the illumination (light intensity) of illumination light L of substrate P from illuminator IU Device)；With the control device 12 that each several part of exposure device EX is controlled.

Mobile device 10 has: the conveying unit 13 of conveyance substrate P；Keep mask pattern M and the rotation cylinder that can rotate 14；Carry out rotating the drive division 15 driven with to rotation cylinder 14.

Conveying unit 13 includes the driving roller DR4 shown in Fig. 1, drives roller DR6 etc., makes substrate P straight on substrate-placing platform ST Line moves.The position of the substrate P transported is detected by position-detection sensor 16.Control device 12 based on position-detection sensor The testing result of 16 controls conveying unit 13, thus controls the position of the substrate P transported by conveying unit 13.

Rotate cylinder 14 and there is the outer peripheral face (following, also referred to as barrel surface 14a) of cylinder planar, so that the mask of transmission-type Pattern M bends it into cylinder planar along the mode of barrel surface 14a and keeps.Barrel surface is with regulation half around regulation centrage The face of footpath bending, such as, is outer peripheral face at least some of of cylinder or cylinder.

Rotate cylinder 14 to configure in the way of the tangent plane of barrel surface 14a is almost parallel with the substrate P on substrate-placing platform ST. Rotate cylinder 14 to be arranged to rotate around the center of rotation axle AX1 of regulation.The center of rotation axle AX1 rotating cylinder 14 is set to Such as it is substantially orthogonal (the most flat with the width of substrate P with the moving direction of substrate P when transporting on substrate-placing platform ST OK).

Drive division 15 makes rotation cylinder 14 rotate around center of rotation axle AX1.Rotate the position of rotation of cylinder 14 by rotating inspection Survey sensor 17 to detect.Control device 12 testing result based on rotation sensor 17 and control drive division 15, thus lead to Overdrive portion 15 control rotate in rotate cylinder 14 position of rotation.

Mobile device 10 is controlled by controlling device 12, synchronizes to drive to substrate P and mask pattern M.Control device 12 to control Conveying unit 13 and drive division 15 so that the translational speed of substrate P (conveyance speed) and be held in rotate cylinder 14 mask figure The translational speed (linear velocity) of case M is roughly the same.Additionally, mobile device 10 also is able to Y direction and a side of Z-direction or Both sides raise the substrate P on whole substrate-placing platform ST and the relative position rotating cylinder 14.

Illuminator IU is arranged in the inner side rotating cylinder 14, with illumination light L from rotating the inner side of cylinder 14 to mask figure A part (illumination region IR) for case M is illuminated.Illumination region IR be such as by with the removing of the substrate P on substrate-placing platform ST Send orthogonal direction, direction as the belt-like zone of length direction.That is, illuminator IU by with rotate cylinder 14 rotation in Mandrel AX1 direction that be substantially parallel illumination light L (linear light) of the shape of slit for long limit and is irradiated in mask pattern M.

Injection direction setting from illumination light L of illuminator IU is the radial direction such as rotating cylinder 14.In this situation Under, illuminator IU from the substantially normal direction of mask pattern M illumination light L is irradiated in rotate cylinder 14 along outer peripheral face Mask pattern M.Illumination light L being such as considered almost parallel light is irradiated in mask pattern M by illuminator IU.

In exposure device EX, in the light path rotated between cylinder 14 (mask pattern M) and substrate-placing platform ST (substrate P) It is provided with diaphragm parts 18.Diaphragm parts 18 are so-called field stops, are penetrated and via covering from illuminator IU by regulation Light after film figure M by scope, that carrys out the light in regulation substrate P injects scope.

As it is shown on figure 3, aligming microscope AM is located at the side of center of rotation axle AX1 in the lower section of such as substrate-placing platform ST (+Y side) and opposite side (-Y side).Rotating on cylinder 14 (mask pattern M) and substrate-placing platform ST (substrate P), at such as+Y Side and-Y side are provided with alignment mark.Aligming microscope AM is by detecting the position that these alignment marks detect the X-direction of substrate P Put, the position of Y direction, at least one in position of rotation about the z axis.

Illumination monitoring device 11 is arranged in the lower section of such as substrate-placing platform ST, so that from the photograph of illuminator IU injection Mingguang City L injects.Illumination monitoring device 11 can measure the Illumination Distribution in illumination region IR.Illumination monitoring device 11 is such as on one side Move along the direction parallel with center of rotation axle AX1, the illumination in a part of region of measurement illumination region IR, thus count Survey the Illumination Distribution on the direction parallel with center of rotation axle AX1.

Illuminator IU has multiple lighting module 20, by making edge, illumination region and the substrate P of each lighting module 20 Orthogonal prescribed direction (Y direction) docking of conveyance direction, and the illumination region IR being long limit with prescribed direction is shone Bright.In the following description, suitably the illumination region of each lighting module 20 is referred to as local lighting region IRa.

Multiple lighting modules 20 are configured to when the conveyance direction (X-direction) from substrate P is observed along prescribed direction (Y-axis side To) arrangement.The lighting module 20 end with its local lighting region IRa and the local lighting region IRa of another lighting module 20 The overlapping mode in end the most closely configure.

As in figure 2 it is shown, lighting module 20 has the light source portion 21 of injection illumination light L and makes the photograph from light source portion 21 injection The deflector 22 of Mingguang City L deflection.Multiple light source portions 21 (with reference to Fig. 3) are so that the luminous point (office of illumination light L from deflector 22 injection Illumination region, portion IRa) in the prescribed direction continuous print mode arrange.

Multiple light source portions 21 in the way of the part that makes local lighting region IRa is overlapping in prescribed direction (Y direction) Upper close to each other.Therefore, as in figure 2 it is shown, multiple light source portion 21 so that light source portion 21 at least some of the most not with other light sources portion 21 modes interfering (physics conflict), make the position in the conveyance direction (Y direction) of substrate P stagger and configure.Example As, the 1st light source portion 21a that the 1st lighting module 20a is had is relative to being configured at the 1st photograph when the conveyance direction of substrate P is observed The 2nd light source portion 21b that the 2nd lighting module 20b on bright module 20a side is had, the position in the conveyance direction of substrate P is wrong Open.

In order to make the position conveyance direction (substrate realized based on illumination light L in substrate P in multiple light source portion 21 The scanning direction of P) on stagger and local lighting region IRa can be made to connect, by penetrating of illumination light L from multiple light source portions 21 Outgoing direction is set as multiple directions intersected with each other when prescribed direction is observed.Here, for convenience of description, will be from multiple light The injection direction of illumination light L in source portion 21 is set to both direction, by towards the 1st direction injection illumination light L in this both direction Light source portion 21 be set to the 1st light source portion 21a, will towards in this both direction the 2nd direction injection illumination light L light source portion 21 set It is the 2nd light source portion 21b.

Here, the 1st light source portion 21a and the 2nd light source portion 21b configures symmetrically relative to YZ face.In the conveyance side from substrate P In the arrangement of the lighting module 20 (with reference to Fig. 3) observed, from one end towards putting in order of the other end be odd number The light source portion 21 of lighting module 20, in the case of observing from prescribed direction, is arranged in such as the 1st light source portion 21a shown in Fig. 2 Position.The light source portion 21 of the lighting module 20 being even number it addition, it puts in order, in situation about observing from prescribed direction Under, it is arranged in the position of such as the 2nd light source portion 21b shown in Fig. 2.

It puts in order is that the lighting module 20 of even number is configured to such as make the illumination light L (light from light source portion 21 Bundle) chief ray there is the angle of+θ relative to the normal direction of substrate P.It addition, it puts in order is the illumination of odd number Module 20 is configured to such as make the chief ray of illumination light L from light source portion 21 have-θ's relative to the normal direction of substrate P Angle.

Such 1st light source portion 21a and the 2nd light source portion 21b is to make illumination light L be injected into substantially when prescribed direction is observed The mode of same area, is set to that the injection direction of illumination light L intersects.Such as, the 1st light source portion 21a is disposed relative to Illumination light L is penetrated in YZ face from-X side towards+X side, and the 2nd light source portion 21b is disposed relative to YZ face and penetrates from+X side towards-X side Illumination light L.

Deflector 22 so that from the 1st light source portion 21a injection illumination light L direct of travel and from the 2nd light source portion 21b injection The consistent mode of the direct of travel of illumination light L, make illumination light L deflect.When observing from prescribed direction (Y direction), deflection Portion 22 is arranged in the direct of travel of illumination light L from the 1st light source portion 21a and the row of illumination light L from the 2nd light source portion 21b Enter near the cross point in direction.

Then, illumination apparatus IU (lighting module 20) is described in more detail.The 1st lighting module 20a shown in Fig. 2 and 2nd lighting module 20b has identical structure, configures symmetrically relative to YZ face.Therefore, in this as multiple lighting modules 20 Represent, the 1st lighting module 20a is illustrated.

Fig. 4 A is the side view that the direction from center of rotation axle AX1 (Y direction) of the 1st lighting module 20a is observed, figure 4B is the front view that the conveyance direction from substrate P (X-direction) of the 1st lighting module 20a is observed.

Multiple lighting modules 20 are respectively provided with the light source portion 21 of injection illumination light L and make the illumination from light source portion 21 injection The deflection component 22a of light L deflection.Here, deflection component 22a is arranged with multiple along prescribed direction (Y direction), deflector 22 by Multiple deflection component 22a are constituted.Deflection component 22a is made up of the quartz etc. relative to the light of ultraviolet region with high-transmission rate.

Light source portion 21 shown in Fig. 4 A and 4B is configured to make the luminous point of illumination light L when deflection component 22a injects become With the shape that prescribed direction (Y direction) is long limit.Light source portion 21 has: the light source 23 of injection illumination light L；Make to penetrate from light source 23 Illumination light L (light beam) gone out is at line segment maker (line generator) 24 (optics of the upper diffusion of prescribed direction (Y direction) Parts)；With the collimator 25 (parallelization component) making the illumination light L parallelization spread by line segment maker 24.

Light source 23 includes solid light source, quasi-molecule laser source, the lamps such as such as laser diode, light emitting diode (LED) Light source.Illumination light L sent from light source 23 can be such as KrF excimer laser (wavelength 248nm), ArF excimer laser (ripple Long 193nm) etc. the bright line (g line, h line, i line) of ultraviolet region of the injection such as extreme ultraviolet light (DUV light), finsen lamp.

Additionally, light source portion 21 can also be by the light from light source 23 via light guide members such as optical fiber to line segment maker 24 The structure guided.In this case, light source 23 can be only fitted to rotate the outside of cylinder 14, it is also possible to is arranged in inner side.It addition, Light source portion 21 can also be by from optical fiber injection end face light after by parallelizations such as collimators to line segment maker 24 The structure guided.

Light beam from light source 23 (prescribed direction) in one direction is elongated by line segment maker 24.From line segment maker 24 Illumination light L passed through is as shown in Figure 4 B, it is stipulated that the angle of flare (radiation angle) in direction (Y direction) becomes big, and such as Fig. 4 A institute Showing, angle of flare is almost unchanged in the direction orthogonal to the prescribed direction.

Line segment maker 24 includes that such as U.S. Patent No. 4826299, U.S. Patent No. 5283694 etc. are recorded like that Bao Weier lens.As shown in Figure 4 B, the light beam space in the prescribed direction from such as light source 23 is split by Bao Weier lens, And make the light beam after segmentation spread along prescribed direction respectively.It addition, Bao Weier lens are so that illumination phase in light beam after Fen Ge The mode overlapped to relatively low part, makes the light beam after segmentation deflect respectively.Such as, when to make the light from light source 23 When Illumination Distribution defers to Gauss distribution, light beam is split near the peak value of Illumination Distribution by Bao Weier lens for border, and so that Be equivalent to the mode that the light beam bottom Gauss distribution is overlapping, make the light beam steering after segmentation.Therefore, by Bao Weier lens forming Illumination light L becomes the Illumination Distribution of so-called top-hat type, it is stipulated that the Illumination Distribution homogenization on direction.

Line segment maker 24 can be the structure being made beam spread by such as cylindrical lens.In this case, light source portion 21 could be included for making the optics of the Illumination Distribution homogenization of illumination light L from line segment maker 24 injection.It addition, line Section maker 24 can comprise diffraction optical element, it is also possible to is the structure being made beam spread by diffraction.It addition, line segment generates Device 24 can comprise the reflection parts such as convex mirror, it is also possible to is the structure being made beam spread by reflection.

Collimator 25 makes the parallel beam spread along prescribed direction (Y direction).Here, penetrate from line segment maker 24 Light beam spread along Y direction as shown in Figure 4 B, and spread hardly in the face orthogonal with Y direction as shown in Figure 4 A.Cause This, collimator 25 is to have function (power) in the face such as comprising prescribed direction (Y direction) and orthogonal with this face Face in not there is the optics of function, be made up of such as cylindrical lens etc..Collimator 25 shown in Fig. 4 B be relative to The plane of symmetry that XZ face is almost parallel and the shape of symmetry.From the chief ray of the light beam (illumination light L) of light source portion 21 injection with symmetrical Face is propagated substantially in parallel.

Like this, from illumination light L of light source 23 injection after being spread along prescribed direction by line segment maker 24, by standard Straight device 25 and by parallelization, thus, the banding that it is long limit with prescribed direction that the luminous point when deflection component 22a injects becomes.

Deflection component 22a shown in Fig. 4 A and 4B, as optical prism function, has for illumination light L from light source portion 21 The interface 26a of the inclination injected.Deflection component 22a makes illumination light L from light source portion 21 inclined by the refraction on the 26a of this interface Turn.Incide illumination light L on the 26a of interface to penetrate from deflection component 22a from the inside of deflection component 22a by (transmission), And incide illumination region IR (mask pattern M).Deflection component 22a such as so that illumination light L from substantially normal direction to mask The mode that illumination region IR on pattern M is incident, makes illumination light L deflect.Here, the row that illumination light L is when mask pattern M injects Enter direction (with reference to Fig. 2 and Fig. 3) to inject to substrate P (exposure area) with illumination light L (exposure light) penetrated from mask pattern M Time direct of travel roughly the same, almost parallel with Z-direction.

In the lighting module 20 shown in Fig. 4 A, light source portion 21 rolls to-X from Z-direction (normal direction of substrate P) Tiltedly, in order to make the illumination light L edge from such light source portion 21 direction that be substantially parallel traveling, deflection component 22a with Z-direction Interface 26a be set to that its normal direction rolls tiltedly to+X from Z-direction.

Deflection component 22a is arranged to, as shown in Figure 4 A, make from light source portion 21 injection illumination light L direct of travel with Warpage in the XZ face that prescribed direction (Y direction) is orthogonal, and make the direct of travel of illumination light L in prescribed direction as shown in Figure 4 B (Y direction) is upper almost unchanged.

Fig. 5 is the axonometric chart representing deflector 22.Deflector 22 shown in Fig. 5 is to make deflection component 22a along prescribed direction The structure of (Y direction) arrangement.In deflector 22, multiple deflection component 22a are integrated by such as mutually bonding.

In the 1st light source portion 21a and the 2nd light source portion 21b, the injection direction of illumination light L is different, thus, in deflector 22 The interface (interface 26a and interface 26b, the 1st and the 2nd face) injected for illumination light L is injected to each interface 26a, 26b according to injection The posture in light source portion 21 of light, and tilt to different directions.

Specifically, deflector 22 has the interface 26a injected for illumination light L from the 1st light source portion 21a and for illumination light L The interface 26b injected from the 2nd light source portion 21b.Here, in each lighting module 20 (with reference to Fig. 4 A and 4B), deflection component 22a with Light source portion 21 is arranged correspondingly, and interface 26a is the interface of the deflection component 22a corresponding for light source portion 21a with the 1st, interface 26b It it is the interface of the deflection component 22a corresponding for light source portion 21b with the 2nd.The normal direction of interface 26a is from Z-direction (substrate P Normal direction) roll oblique direction to+X, the normal direction of interface 26b is to-X side from Z-direction (normal direction of substrate P) The direction tilted.

Deflector 22 shown in Fig. 5 has the interface 26c making illumination light L penetrate towards mask pattern M.Interface 26c is such as Substantially same plane (the most concordant) it is arranged in multiple deflection component 22a, substantially vertical relative to the normal direction of substrate P Ground configuration.Like this, deflector 22 is configured to such as to make illumination light L deflect on the 26c of interface but it also may make illumination light L is at interface 26c upper deflecting.

Fig. 6 is the top view representing deflector 22.As shown in Figure 6, interface 26a and interface 26b is respectively trapezoidal shape, along rule Determine direction (Y direction) and be adjacent to configuration.Interface 26a and interface 26b is same shape, but is configured to relative to YZ face For the relation inverted each other.That is, it is configured to the minor face of the long limit of interface 26a and interface 26b side by side, similarly, is configured to interface The long limit of 26b and the minor face of interface 26a are side by side.

Like this, deflector 22 is configured to, when the injection direction (Z-direction) of always illumination light L of self-bias transfer part 22 is seen When examining, the border 27 (trapezoidal hypotenuse) of interface 26a and interface 26b non-vertically intersects with prescribed direction (Y direction).Change speech It, part 27a of deflection component 22a adjacent with border 27 in the 26a of interface and adjacent with border 27 inclined in the 26b of interface Part 27b of rotation member 22a is overlapping when observing from X-direction, and the position that part 27a is in prescribed direction (Y direction) Put roughly the same with part 27b.That is, across border 27 part 27a of deflection component 22a adjacent one another are, part 27b at XY Identical drift angle is become in face.

Therefore, illumination light L part 27a of interface 26a is incided and from the 2nd light source portion 21b from the 1st light source portion 21a Incide illumination light L in part 27b of interface 26b, to the region that the position of the Y direction illuminated in the IR of region is roughly the same Incident.That is, this region become the local lighting region IRa (with reference to Fig. 3) illuminated based on illumination light L via interface 26a and The region (referred to as repeat region) that the local lighting region IRa illuminated based on illumination light L via interface 26b repeats.This is heavy Multiple region is by the part by illumination light L from the 1st light source portion 21a and one of illumination light L from the 2nd light source portion 21b The optical illumination point mixed, the mixing ratio of its light quantity according to border 27 relative to the inclination of prescribed direction consecutive variations.Its Result is, even if in the 1st light source portion 21a and the 2nd light source portion 21b in the case of the brightness difference of illumination light L, it is also possible to suppression There is the situation that the Illumination Distribution of illumination region IR changes the most discontinuously.

It addition, illuminator IU by by lighting module 20 along substantially vertical with the scanning direction of substrate P (X-direction) Prescribed direction (Y direction) arranges multiple, and can increase the exposure of the transfer pattern in the prescribed direction vertical with scanning direction Optical width, but the inhomogeneities of the Illumination Distribution in the prescribed direction vertical with scanning direction may be produced.Therefore, Fig. 2 (Fig. 3) Shown illuminator IU is configured to, by for the Illumination Distribution realized based on illumination light L penetrated from deflector 22 The optical filter 28 being adjusted, guarantees the uniformity of Illumination Distribution in prescribed direction.

Fig. 7 is the figure of the example representing Illumination Distribution and optical filter 28 in the prescribed direction in illumination region IR, and Fig. 8 is Represent the figure of other examples of the Illumination Distribution in the prescribed direction in illumination region IR and optical filter 28.In Fig. 7 and Fig. 8 respectively The top view (figure top) observed in the injection direction from illumination light L of deflector 22 is associatedly shown, represents that simulation is not having Curve chart (the figure of the result obtained from the Illumination Distribution of illumination light L of deflector 22 injection in the structure of optical filter 28 is set Middle part) and represent the curve chart (figure bottom) of absorbance of optical filter 28.Emphasize that the change of illumination schematically illustrates illumination light The Illumination Distribution of L.

In Fig. 7 and Fig. 8, transverse axis represents the position of prescribed direction (Y direction).It addition, reference 30a represent from Illumination light L of the 1st light source portion 21a Illumination Distribution on illumination region IR, reference 30b represents from the 2nd light source portion 21b Illumination light L illumination region IR on Illumination Distribution, reference 30c represent from the 1st light source portion 21a illumination light L and From the 2nd light source portion 21b illumination light L illumination region IR on Illumination Distribution, reference 30d represents and prescribed direction pair The absorbance distribution of the optical filter 28 on the direction answered.

In the example shown in Fig. 7, illumination light L based on each light source portion 21 and the Illumination Distribution (Illumination Distribution that realizes 30a and Illumination Distribution 30b) be respectively so-called top-hat type distribution.Multiple light source portions 21 are configured to local lighting region The end of IRa is overlapping with the end of adjacent local lighting region IRa, and local lighting region IRa has adjacent local lighting It is non-duplicate that repeat region IRb that the end of region IRa is overlapped and adjacent local lighting region Ira does not overlaps each other Region IRc.

In non-duplicate region IRc, Illumination Distribution 30c with based on from the 1st light source portion 21a or the photograph of the 2nd light source portion 21b Mingguang City L and Illumination Distribution 30a or Illumination Distribution 30b that realize are roughly the same, generally uniform in this illumination.

It addition, in repeat region IRb, Illumination Distribution 30c is with side Illumination Distribution 30a and Illumination Distribution 30b being added Formula is distributed.The biggest then repeat region of spacing Py (distance between centers) in the prescribed direction (Y direction) of local lighting region IRa The illumination of Illumination Distribution 30c in IRb is the lowest, the illumination of Illumination Distribution 30c in the narrowest then repeat region IRb of this spacing Py The highest.Spacing Py in the prescribed direction (Y direction) of local lighting region IRa can be by the regulation side in such as light source portion 21 Spacing upwards and adjust, the prescribed direction of the narrowest then local lighting region IRa of the spacing in the prescribed direction in light source portion 21 On spacing Py the narrowest.

Like this, the illumination of Illumination Distribution 30c in repeat region IRb can be by adjusting local lighting region IRa's Spacing Py and be adjusted to the degree identical with the illumination of Illumination Distribution 30c in non-duplicate region IRc, but relative to non-duplicate district Illumination in the IRc of territory can produce the difference of the most a few % degree.Such as, in the example shown in Fig. 7, illumination is at lighting module 20 Minimizing compared with non-duplicate region IRc in docking section (repeat region IRb), in the example shown in Fig. 8, illumination is at repeat region Increase compared with non-duplicate region IRc in IRb.

The inhomogeneities (deviation) of such illumination is being in such as corresponding with the purposes of illuminator IU allowed band Can not revise in interior situation etc., but be modified for the viewpoint improving exposure accuracy etc. at this.

As the optical filter 28 of the Illumination Distribution homogenization made in prescribed direction as described above, as long as will be to illumination region Absorbance in the light path of the light that the of a relatively high region of illumination in IR is injected be set to relatively low, will be to illumination region IR In the light path of light injected of the relatively low region of illumination in absorbance be set to of a relatively high.

Such as, in the example shown in Fig. 7, owing to the illumination of the repeat region IRb in the IRa of local lighting region is heavier than non- The illumination of multiple region IRc is low, so the absorbance distribution 30d of optical filter 28 is set as, the light injected to repeat region IRb is led to Absorbance in the light path that absorbance in the light path crossed is passed through than the light injected to non-duplicate region IRc is high.

It addition, in the example shown in Fig. 8, owing to the illumination of the repeat region IRb in the IRa of local lighting region is heavier than non- The illumination of multiple region IRc is high, so the absorbance distribution 30d of optical filter 28 is set as, the light injected to repeat region IRb is led to Absorbance in the light path that absorbance in the light path crossed is passed through than the light injected to non-duplicate region IRc is low.

It addition, the producing cause of the inhomogeneities as Illumination Distribution, it is possible to enumerate the most each lighting module 20 (light source Portion 21) the deviation (the 1st reason) of light quantity, lighting module 20 (deflector 22) docking section at the deviation of light quantity (the 2nd is former Cause), the deviation (the 3rd reason) etc. of illumination in each lighting module 20.In order to alleviate or eliminate the inhomogeneities of Illumination Distribution, energy Enough process by the kind of these reasons.It addition, as the method making Illumination Distribution homogenization, except use optical filter 28 with Outward, there is also the method adjusting the shape of parts, configuration etc..Hereinafter, about the processing method of the inhomogeneities to Illumination Distribution, Illustrate by the producing cause of the inhomogeneities of Illumination Distribution.

1st reason includes manufacturing tolerance of the element (such as light source 23) due to lighting module 20 etc. and causes from respectively What light source portion 21 penetrated that the illumination of illumination light L produces deviation etc. in multiple light source portions 21 will be because of.Illumination shown in Fig. 2 and Fig. 3 Device IU, has the light quantity correction optical filter 28a being arranged between light source 23 and line segment maker 24 as optical filter 28, logical Cross the deviation that light quantity correction optical filter 28a reduces illumination light L of each light source 23.

Light quantity correction optical filter 28a such as of a relatively high with the regulation relative output of electric power from multiple light sources 23 The part injected of illumination light L of light source 23 at make absorbance relatively low, from multiple light sources 23 with regulation electricity The part that illumination light L of the relatively low light source 23 of output that power is relative is injected makes absorbance of a relatively high.

It is further possible to reduced the deviation of the light quantity of illumination light L of each light source 23 by the driving method of light source 23. For example, it is also possible in multiple light sources 23, in the way of the light quantity that makes illumination light L is consistent, make to the of a relatively high light source of output The electric power of 23 supplies is relatively low, makes the electric power supplied to the light source 23 that output is relatively low of a relatively high.Such driving side Method can realize by arranging electric filter on drive circuit etc., it is also possible to by the program etc. for driving light source 23 And realize.

The inhomogeneities of the Illumination Distribution produced by the 2nd reason can be by adjusting the prism shape of deflection component 22a, tune Illumination light L that spacing Py (spacing of lighting module 20) of whole local lighting region IRa, increase are spread by line segment maker 24 Width (size in the prescribed direction of luminous point) etc. is alleviated or eliminates.But, Illumination Distribution 30b in each light source portion 21, The tilting from the situation of linear deviation etc. of the end of local lighting region IRa in Illumination Distribution 30c, there may be Illumination Distribution The residual of inhomogeneities.Illuminator IU shown in Fig. 2 and Fig. 3 has the cylinder being arranged in light source portion 21 with rotating cylinder 14 Optical filter 28b is revised in docking section between face 14a (mask pattern M), revises optical filter 28b by docking section non-duplicate to reduce Mode poor with the illumination of repeat region IRb for region IRc is modified.

3rd reason includes the aberration residual in such as lighting module 20, owing to making illumination light L expand by line segment maker 24 Dissipate and cause the deviation of Illumination Distribution along prescribed direction expansion etc..The latter is in the prescribed direction such as maintaining illumination region IR Under size the situation of quantity reducing lighting module 20 etc., line segment maker 24 width of illumination light L spread the biggest and The most easily produce.In other words, the 3rd reason the inhomogeneities of the Illumination Distribution produced can be by increasing in lighting module 20 Illumination light L that optics is spread by line segment maker 24 with reduction with minimizing aberration, the quantity increasing lighting module 20 etc. Width etc. are alleviated or eliminate.

Illuminator IU shown in Fig. 2 and Fig. 3 have be arranged in light source portion 21 with rotate cylinder 14 barrel surface 14a (cover Film figure M) between Illumination Distribution correction optical filter 28c, in making each lighting module 20 by Illumination Distribution correction optical filter 28c Illumination Distribution homogenization.Illumination Distribution correction optical filter 28c is such as arranged by each lighting module 20.Such when using During Illumination Distribution correction optical filter 28c, such as, can improve the equal of Illumination Distribution while maintaining the quantity of lighting module 20 Even property, also additionally is able to maintain the uniformity of Illumination Distribution while reducing the quantity of lighting module 20.

The absorbance of various optical filter as described above can be fixing can also be variable.The filter of transmission-variable Mating plate can be by being movably disposed at scanning by the optical filter that absorbance changes along scanning direction (X-direction) the most in advance Realize on direction.Illuminator IU can such as adjust illumination region IR's by making the optical filter of transmission-variable move Illumination Distribution.Such as, illuminator IU can divide based on the illumination measured by the illumination monitoring device 11 shown in Fig. 2 and Fig. 3 Cloth, is finely adjusted whole so that Illumination Distribution homogenization.It addition, the adjustment of such Illumination Distribution can also be at such as lighting module 20 The time dependent situation of characteristic, change lighting module 20 at least some of (such as light source portion 21) situation etc. under enter OK.

The illuminator IU of present embodiment as described above by by multiple lighting modules 20 along prescribed direction arrange and By the local lighting region IRa of lighting module 20 along prescribed direction continuous arrangement, and can be by the prescribed direction of illumination region IR On dimension enlargement be desired value.Therefore, processing means U3 (exposure device EX) can expand transfer pattern with scanning side Width on vertical direction, for instance, it is possible to process the substrate of sheet efficiently.Its result is, device inspection apparatus can Manufacture the devices such as large-scale flat faced display efficiently, it is possible to use large stretch of layout substrate to manufacture device efficiently.

It addition, the multiple light source portions 21 staggered in the position on scanning direction by illuminator IU are so that observing from prescribed direction Time the mode intersected of the injection direction of illumination light L configure, by deflector 22 so that from illumination light L in multiple light source portions 21 The consistent mode of direct of travel make illumination light L deflect.Therefore, the configuration degree of freedom in multiple light source portions 21 improves, and such as can Avoid the interference (conflict) in multiple light source portion 21.

It addition, light source portion 21 penetrates illumination light L being the luminous point of the shape on long limit with prescribed direction in deflector 22, because of This, it is possible to while maintaining the quantity of lighting module 20, expand illumination region IR along prescribed direction, it is possible to maintaining illumination district The quantity of lighting module 20 is reduced while the size of territory IR.

Additionally, illuminator IU can also be following structure: illumination light L (light beam) is elongated to a direction by carrying out Deformation make the angle of flare of illumination light L in the scanning direction (X-direction) of substrate P and the prescribed direction vertical with scanning direction (Y direction) upper difference.In the structure shown here, when the pattern being transferred live width on mask pattern M is consistent, the figure being transferred Case live width in substrate P is different on scanning direction and prescribed direction.For making the pattern being transferred live width in substrate P Unanimously, such as, as long as the live width considered on mask pattern M corresponding with the anisotropy of the angle of flare of illumination light L designs cover Film figure M.It addition, illuminator IU can also be configured to the angle of flare the making illumination light L scanning direction (X-axis in substrate P Direction) and prescribed direction (Y direction) upper for isotropism.

Additionally, illumination monitoring device 11 could be arranged to a part of illuminator IU, it is also possible to by illumination monitoring device One or both of 11 and aligming microscope AM is arranged in the inner side rotating cylinder 14.Alternatively, it is also possible to make by multiple illumination moulds The outside being arranged in rotation cylinder 14 at least partially of the lamp optical system that block 20 is constituted.

[the 2nd embodiment]

Then, the 2nd embodiment is illustrated.In the present embodiment, sometimes to identical with above-mentioned embodiment Structure mark identical reference and simplification or the description thereof will be omitted.

Fig. 9 is the side view of processing means U3 (exposure device EX) representing present embodiment, and Figure 10 is to represent illumination dress Putting the axonometric chart of IU, Figure 11 is the top view representing illuminator.The substrate of the supporting substrates P of the exposure device EX shown in Fig. 9 The structure of supporting parts (rotating cylinder 35) is different from the 1st embodiment with the structure of illuminator IU.

Exposure device EX shown in Fig. 9 replaces the substrate-placing platform ST shown in Fig. 2 and has rotation cylinder 35, and by rotation Tumbler cylinder 35 supporting substrates P.Rotate cylinder 35 to be arranged to rotate around center of rotation axle AX2.Rotate in the rotation of cylinder 35 Mandrel AX2 is set to almost parallel with the center of rotation axle AX1 rotating cylinder 14.Rotate the driving that cylinder 35 is illustrated by omission Portion and be driven in rotation, and supporting substrates P and rotate, thus transport substrate P.

Illuminator IU has the multiple lighting modules 20 as shown in Figure 10 waits, but illustrates one in Fig. 9 as representative Individual lighting module 20.The illumination region IR of illuminator IU be set in rotate in cylinder 14 with rotate the immediate portion of cylinder 35 Near Fen.

Exposure device EX, by control device 12 the most as shown in Figure 2, makes rotation cylinder 14 and rotates cylinder 35 synchronously rotate, to carry out from illumination light L of illuminator IU being held in the mask pattern M rotated on cylinder 14 Illumination.Thus, illumination light L being injected on mask pattern M becomes light (exposure light) corresponding with the pattern being transferred, this exposure The substrate P that light is used up being transported by rotation cylinder 35 is scanned.Exposure light is to the region (exposure area PR) of substrate P incidence Be set in rotate in cylinder 35 with rotate near the immediate part of cylinder 14.The side that substrate P is scanned by exposure light To substantially vertical with center of rotation axle AX2 (Y direction) rotating cylinder 35, it is almost parallel with the tangent plane of exposure area PR Direction (X-direction).

Then, illumination apparatus IU is described in more detail.Illuminator IU shown in Figure 10 and Figure 11 is to make multiple photograph The structure that bright module 20 arranges along prescribed direction (Y direction).Multiple lighting modules 20 are identical structure, but configure Become by the order along Y direction arrangement, and alternately invert relative to the posture in YZ face.

Lighting module 20 shown in Fig. 9 has the 1st light source portion 21a and the deflection arranged correspondingly with light source portion 21 Parts 22a.Light source portion 21 has the light source 23 of injection illumination light L, for the optics rod unit injected from illumination light L of light source 23 36 and the relay lens 37 injected of illumination light L for passing through from optics rod unit 36 and relay lens 38.

Light source portion 21 is from direction injection illumination light L that the normal direction (Z-direction) relative to illumination region IR tilts.Example As, as shown in Figure 10, the 1st light source portion 21a of the 1st lighting module 20a is from from the normal direction (Z-direction) illuminating region IR Oblique direction injection illumination light L is rolled to-X.It addition, be configured at the 1st when observing from the scanning direction (X-direction) of exposure light The 2nd light source portion 21b of the 2nd lighting module 20b (with reference to Figure 11) on lighting module 20a side, from from the normal illuminating region IR Direction rolls oblique direction injection illumination light L to+X.

Like this, the 1st lighting module 20a and the 2nd lighting module 20b be configured to when prescribed direction is observed from light source The injection direction of the light in portion 21 intersects.Thus, the light source portion of light source portion the 21 and the 2nd lighting module 20b of the 1st lighting module 20a 21 be configured to mutually non-interference.

Such as, as shown in figure 11, the parts of the size maximum in the prescribed direction in light source portion 21 are relay lens 38, many Individual light source portion 21 is configured to, by making the position of the relay lens 38 in light source portion 21 adjacent when X-direction is observed stagger, in The lens 38 that continue will not interfere with the relay lens 38 in other light sources portion 21 in prescribed direction (Y direction).

Then, lighting module 20 is described in more detail.Figure 12 is the top view representing light source 23, and Figure 13 A and 13B is Representing the figure of optics rod unit 36, Figure 14 is the top view representing relay lens 38, and Figure 15 is the side-looking representing deflection component 22a Figure, Figure 16 is the top view representing diaphragm parts 42.Figure 13 A shows that the figure observed from Z-direction, Figure 13 B show from Y The figure that direction of principal axis is observed.

Light source 23 shown in Figure 12 has multiple solid light source 40 and the light guide member being arranged on each solid light source 40 41.Solid light source 40 is such as laser diode.Light guide member 41 is such as optical fiber, by illumination light L from solid light source 40 Guide to optics rod unit 36 (with reference to Figure 11).Multiple light guide member 41 boundling fasciculations, and there is an injection end face 41a. The angle of flare of illumination light L passed through from optical fiber is by the diameter of optical fiberDetermine, be the light isotropically spread.

Optics rod unit 36 shown in Figure 13 A and 13B is formed by such as quartz glass etc., has: for from light source 23 What illumination light L was injected injects end face 36a；Make to be injected into the inner face 36b of the illumination light L reflection injected on end face 36a；Including making The injection end face 36c of the illumination light L injection of reflection on the 36b of face.In light source 23, at the injection end face of multiple light guide members 41 On 41a, being formed with light source image by each light guide member 41, the Illumination Distribution of illumination light L becomes uneven on injection end face 41a Even.Such illumination light L makes the diffusance in angle of flare average by repeated reflection on the inner face 36b of optics rod unit 36 Change, thus penetrate the Illumination Distribution homogenization on end face 36c.Illumination light L when optics rod unit 36 penetrates with to optics bar Parts 36 are compared before injecting, and angle of flare is almost unchanged, are the light isotropically spread.

Like this, owing on the injection end face 36c of optics rod unit 36, Illumination Distribution becomes uniform, so lighting module The 20 injection end face 36c being configured to illuminate region IR and optics rod unit 36 become conjugation.Therefore, the injection of optics rod unit 36 End face 36c is set to such as identical with local lighting region IRa shape.Here, injection end face 36c is set to and prescribed direction The corresponding size in Y direction is more than the size in the Z-direction corresponding with scanning direction.That is, light source portion 21 is configured to office Illumination region, portion IRa is longer compared with scanning direction in the prescribed direction.

In Figure 13 A and 13B, the position that illumination light L at the injection end face 36c from optics rod unit 36 is injected On, it is provided with diaphragm parts 42.Diaphragm parts 42 are so-called field stops, for specifying the shape of local lighting region IRa.Light Door screen parts 42 have the opening 42a passed through for illumination light L.Flat shape about opening 42a will be described later.

Relay optical system including the relay lens 37 shown in Fig. 9 and relay lens 38 forms penetrating of optics rod unit 36 Go out the picture of end face 36c.The position in the face that the picture of the illumination region IR injection end face 36c that is set in optics rod unit 36 is formed or Near it.Including the relay optical system of relay lens 37 and relay lens 38 such as to adjust photograph when penetrating from light source portion 21 The mode of the angle of flare of Mingguang City L sets multiplying power.Such as, the angle of flare of illumination light L when mask pattern M injects is according to pattern Live width etc. and set, set in the way of becoming such angle of flare and include relay lens 37 and the relay optical of relay lens 38 The multiplying power of system.

Relay lens 38 (with reference to Figure 14), when from the direction top view of its optical axis, is formed as prescribed direction (Y-axis side To) compare the shape that the direction orthogonal with prescribed direction is long.Relay lens 38 is configured to such as from rotational symmetric around its optical axis Lens shape 38a suitably omits the shape of part 38b not having illumination light L to pass through, i.e. corresponding to local lighting region IRa Shape.Thereby, it is possible to avoid the interference between relay lens 38 and other structural elements.

As shown in FIG. 9 and 10, the light path from relay lens 37 to relay lens 38 is configured with diaphragm parts 43.Light Door screen parts 43 are so-called opening diaphragm (σ diaphragms), limit the angle of flare (so-called numerical aperture NA) of illumination light L.Diaphragm portion Part 43 has the opening passed through for illumination light L, so that the angle of flare of illumination light L passed through from relay lens 37 and relay lens 38 The mode becoming setting sets the diameter of opening.

It addition, be configured with reflecting mirror 44 in the light path from relay lens 37 to relay lens 38.Reflecting mirror 44 is so-called Warpage reflecting mirror, make from relay lens 37 injection illumination light L deflection.As shown in Figure 10, from illumination light L of light source 23 injection Edge and X-direction direction that be substantially parallel traveling and reflect on mirror 44, to rolling oblique than Z-direction to-X side or+X Advance in direction.Thereby, it is possible to make light source portion 21 reduce, thus such as easily light source portion 21 is arranged in rotation cylinder 14 Side.

From illumination light L of multiple light source portions 21 as described above injection, as shown in Figure 10, inject to deflector 22, pass through Deflector 22 and deflect, thus make direct of travel consistent.Deflector 22 includes the multiple deflection components along prescribed direction arrangement 22a.Multiple deflection component 22a are identical shape, but are configured to by the order arranged along Y direction relative to YZ face Posture alternately inverts (with reference to Figure 10 and Figure 11).

Deflection component 22a (with reference to Figure 15) has the interface 26a injected for illumination light L and the interface making illumination light L penetrate 26c.Here, the normal direction (Z-direction) that interface 26a and interface 26c is respectively relative to illuminate region IR tilts.That is, deflection Parts 22a makes illumination light L deflect by making illumination light L reflect on interface 26a and interface 26c respectively.

As shown in Figure 10, illumination light L penetrated from deflection component 22a (lighting module 20) is penetrated to local lighting region IRa Entering, multiple local lighting region IRa connect along prescribed direction, and thus, illuminator IU is to the illumination being long limit with prescribed direction Region IR is illuminated.

It addition, as illustrated by reference Fig. 7 and Fig. 8, the Illumination Distribution in the prescribed direction of illumination region IR exists not Uniform situation.Here, deflector 22 (with reference to Figure 11) is arranged to make the limit along prescribed direction adjacent pair deflection component 22a Boundary 27 intersects obliquely relative to prescribed direction.Thereby, it is possible to alleviate or eliminate in the prescribed direction in illumination region IR The inhomogeneities of Illumination Distribution.

It addition, the inhomogeneities of such Illumination Distribution also is able to by the diaphragm parts 42 shown in Figure 13 A and 13B The shape adjusting the opening supplying illumination light L to pass through is alleviated or eliminates.In the example shown in Fig. 7, due to repeat region IRb's The illumination illumination than non-duplicate region IRc is low, so for the inhomogeneities reducing such illumination, such as, increasing to repetition The light quantity etc. of illumination light L that the light quantity of illumination light L that region IRb injects or minimizing are injected to non-duplicate region IRc is effective 's.Adjusting to realize such light quantity, diaphragm parts 42 (with reference to Figure 13 A and 13B) are set with the opening passed through for illumination light L The shape of 42a.

The opening 42a of the diaphragm parts 42 shown in Figure 16 has: feed to the weight in local lighting region IRa (with reference to Fig. 7) Part 1 42b that the light that multiple region IRb injects passes through；Inject with the non-duplicate region IRc fed in the IRa of local lighting region Part 2 42c passed through of light.Owing to the position of repeat region IRb and non-duplicate region IRc is in prescribed direction (Y direction) Upper difference, so part 1 42b is arranged in different with part 2 42c on the direction (Y direction) corresponding from prescribed direction Position.Part 1 42b is passed through with part 2 42c to make the light corresponding with the direction being perpendicular to prescribed direction in illumination region IR The size in the direction (Z-direction) on door screen parts 42 is different, and makes the photograph passed through from the region of the unit length of respective Y direction The light quantity of Mingguang City L is different.

Diaphragm parts 42 shown in Figure 16 suppose the photograph that illumination is relatively low in repeat region IRb as shown in Figure 7 Degree distribution.In the Z-direction orthogonal with Y direction, when the inside dimension of part 1 42b being set to h1, by part 2 42c When inside dimension is set to h2, inside dimension h1 of part 1 is more than inside dimension h2 of part 2.Therefore, part 1 42b from Y-axis Light amount ratio part 2 42c of illumination light L that the region of the unit length in direction is passed through is many, and its result is, in illumination region IR Illumination Distribution homogenization in prescribed direction.Such as, the illumination of the repeat region IRb illumination fall relative to non-duplicate region IRc Low by 5%.In this case, inside dimension h1 of part 1 42b is such as set as relative to inside dimension h2 of part 2 102.5%.

Here, the opening 42a of diaphragm parts 42 is formed as the inside dimension in X-direction in part 1 42b and part 2 Change continuously between 42c.Therefore, suppression illumination discontinuously changes in repeat region IRb and non-duplicate region IRc.

Then, an example of each key element of illuminator IU is described.

Light source 23 shown in Figure 12 can use 20 injection wavelength to be the ultraviolet of 403nm as multiple solid light sources 40 The laser diode of the laser in region.It addition, as light guide member 41, it is possible to useOptical fiber for 0.125mm, it is possible to make it Become with 20 boundlingsBundle for 0.65mm.In this case, the angle of flare of illumination light L when light guide member 41 penetrates It is 0.2 under NA converts.

Optics rod unit 36 shown in Figure 13 A and 13B, such as, the size of X-direction is 100mm, the size of Y direction For 10mm, the size of Z-direction is 1.4mm.From the angle of flare of illumination light L of optics rod unit 36 injection and from light guide member 41 The angle of flare of illumination light L of injection is roughly the same, is 0.2 under NA converts.

About the diaphragm parts 42 shown in Figure 16, such as, the outside dimension in Z-direction and the ejecting end of optics rod unit 36 Face 36c identical (1.4mm).About the size of the opening 42a of diaphragm parts 42, such as, the size of Y direction is 10mm, the 1st Inside dimension h1 divided is 1mm, and inside dimension h2 of part 2 is 1.025mm.

Here, when mask pattern M injects, the angle of flare of illumination light L is set as 0.04 under NA converts.From optics bar portion The angle of flare of illumination light L of part 36 injection is 0.2, and relay lens 37 and relay lens 38 are by the injection end face of optics rod unit 36 36c is projected on illumination region IR as amplifying 5 times.Therefore, the angle of flare of illumination light L when illumination region IR injects is changed The value being counted as NA and obtain, the value obtained for the angle of flare of illumination light L penetrated from optics rod unit 36 is converted into NA (0.2) 1/5 times, is 0.04.The focal length (f1) of relay lens 37 is set as such as 20mm, the focal length (f2) of relay lens 38 It is set as such as 100mm.It addition, the diameter of the opening of diaphragm parts 43It is set as 8mm, so that from relay lens 37 And the angle of flare of illumination light L that relay lens 38 passes through is 0.04 under NA converts.

The deflection component 22a quartz etc. that absorbance is high by the light relative to ultraviolet region shown in Figure 15 is made, such as, Being set to that drift angle δ 1 is 20.51 °, bottom surface corner δ 2 is 80 °, and bottom surface corner δ 3 is 79.49 °.Here, the optical axis of relay lens 38 and Z Direction of principal axis angulation θ is such as 10 °.From the intersection point of the optical axis of relay lens 38 and deflection component 22a to illumination region IR Distance S (with reference to Fig. 9) of (mask pattern M) is such as 16mm.

In the local lighting region IRa realized based on such each lighting module 20, the size of X-direction is about 5mm, the size of Y direction is about 50mm.Such lighting module 20 is arranged 5 groups by illuminator IU, the X of illumination region IR Axial the most about 5mm, the size of Y direction is about 250mm.Here, each laser diode of light source 23 Light quantity power is 0.5W, and the absorbance of optical fiber is 0.7, and the utilization ratio of light based on diaphragm parts 42 realization is 1/1.4, from light The absorbance learning rod unit 36 to deflection component 22a is 0.8.In this case, the light quantity power of each lighting module 20 is 4W, When the size of the local lighting region IRa of lighting module 20 is 5mm × 50mm, illumination is estimated as 1600mW/cm²。

It addition, the angle of flare of illumination light L when illumination region IR (mask pattern M) is injected is such as 2.3 ° (NA conversions Under be 0.04), illumination region IR in relative to Z axis produce about 0.6mm dislocation.This magnitude of misalignment and the photograph on scanning direction The width (5mm) of territory, area pellucida IR is compared the least, can ignore that after being exposed processing.It addition, in terms of carrying out by this condition In the case of calculation, the astigmatism on illumination region IR is 0.84mm.Thereby, it is possible to relative to the light beam imaging in XZ face Position in Z-direction and make the consistent mode in focus face, be pre-designed and manufacture illuminator IU.Due to this astigmatism, Light beam in YZ face has the diffusance of about 0.07mm on focal position, if but this degree, then it is being exposed place Can ignore that after reason.Each key element of illuminator IU shown here is an example, certainly can suitably change.

The illuminator IU of present embodiment as described above can be with the illumination light L comparison area pellucida isotropically spread Territory IR is illuminated, and the live width of the pattern being transferred becomes isotropism with the ratio of the live width of the sub-image being transferred, therefore, it is possible to fall The design cost of low such as mask pattern M.

[the 3rd embodiment]

Then, the 3rd embodiment is illustrated.The most sometimes to identical with above-mentioned embodiment Structure marks identical reference simplification or the description thereof will be omitted.

Figure 17 is the side view of processing means U3 (exposure device EX) representing present embodiment, and Figure 18 is to represent exposure dress Put the top view of EX.The structure of the deflector 22 of the illuminator IU shown in Figure 17 and Figure 18 is different from the 1st embodiment.Figure 17 And the deflector 22 shown in Figure 18 includes the multiple reflecting mirrors 45 (deflection component) along Y direction arrangement, by making from light source Illumination light L in portion 21 reflects on reflecting mirror 45 and makes illumination light L deflect.

Here, when the normal direction of illumination region IR is set to Z-direction, will observe from prescribed direction (Y direction) Injection direction and the Z-direction angulation of illumination light L from light source portion 21 when being set to α, reflecting mirror 45 is relative to Z axis Direction only configures obliquely with the angle of α/2.In the example shown in Figure 17, α is 90 °, the normal direction of reflecting mirror 45 and Z axis Direction angulation is set as 45 °.

Reflecting mirror 45 includes that such as profile is the reflecting surface of trapezoidal shape.Reflecting mirror 45 shown in Figure 18 is configured to, in Y-axis side Upwards the border 46 of adjacent pair reflecting mirror 45 is relative to (the X-axis side, scanning direction being scanned substrate P with illumination light L To) intersect obliquely.Thereby, it is possible to make the Illumination Distribution homogenization in the prescribed direction of illumination region IR.It addition, illuminator IU is carried out reflecting and the structure that makes light deflect by then passing through deflector 22, it is possible to reduce the loss etc. of such as light.

[the 4th embodiment]

Then, the 4th embodiment is illustrated.The most sometimes to identical with above-mentioned embodiment Structure marks identical reference simplification or the description thereof will be omitted.

Figure 19 is the side view of processing means U3 (exposure device EX) representing present embodiment, and Figure 20 is to represent exposure dress Putting the top view of EX, Figure 21 is the illumination figure representing deflector 22.

The structure of the deflector 22 of the illuminator IU shown in Figure 19 and Figure 20 is different from the 1st embodiment.Shown in Figure 19 Deflector 22 be configured to, make illumination light L from the 1st light source portion 21a pass through, and make the illumination light from the 2nd light source portion 21b L reflects, and the direct of travel thus making illumination light L is consistent.Here, the 1st light source portion 21a is arranged in the normal direction of illumination region IR In (Z-direction), the illumination light L obstructed overshoot portion 22 from the 1st light source portion 21a deflects, but from normal direction to illumination Region IR injects.It addition, the 2nd light source portion 21b is configured to, when observing from prescribed direction (Y direction), with Z-direction angulation Degree β, illumination light L from the 2nd light source portion 21b is deflected by deflector 22, injects to illumination region IR from normal direction.At figure In 19, angle beta is set as 90 °, as long as but angle beta absolute value just can arbitrarily set more than 0 ° and less than the angle of 180 °.

Deflector 22 shown in Figure 21 has: for pass through from illumination light L of the 1st light source portion 21a by portion 46；With make The reflecting part 47 reflected from illumination light L of the 2nd light source portion 21b.By portion 46 and reflecting part 47 along prescribed direction (Y direction) Alternately repeatedly configure.Here, in by portion 46 absorbance of light generally uniform (gradient of the absorbance in Y direction is big Cause is 0), the reflectance of light generally uniform (gradient of reflectance substantially 0 in Y direction) in reflecting part 47.

By being configured with pars intermedia 48 between portion 46 and reflecting part 47.Pars intermedia 48 is set to, and compared with portion 46 The reflectance of illumination light L is higher, and the reflectance of illumination light L is relatively low compared with reflecting part 47.Here, the illumination in pars intermedia 48 The reflectance of light L is set to, along with uprising continuously or stepsly from trending towards reflecting part 47 side by side, portion 46.Separately Outward, the absorbance of illumination light L in pars intermedia 48 is set to, relatively low with compared with portion 46 and higher compared with reflecting part 47. Here, the absorbance of illumination light L in pars intermedia 48 is set to, along with trending towards reflecting part 47 side and continuous from by side, portion 46 Ground or steps reduce.

Illumination light L from the 1st light source portion 21a is penetrated to by portion 46 and two pars intermedias 48 passing through portion 46 adjacent with this Enter.It addition, illumination light L from the 2nd light source portion 21b is penetrated to reflecting part 47 and two pars intermedias 48 adjacent with this reflecting part 47 Enter.Therefore, on pars intermedia 48, illumination light L is injected from the 1st light source portion 21a and the 2nd light source portion 21b respectively.That is, pars intermedia 48 There is function illumination light L from the 1st light source portion 21a and illumination light L from the 2nd light source portion 21b synthesized.

The region (the repeat region IRb of Fig. 7) that illumination light L from pars intermedia 48 injection in illumination region IR is injected Illumination, becomes the illumination of a part by illumination light L from the 1st light source portion 21a and from illumination light L of the 2nd light source portion 21b A part illumination be added illumination.Therefore, it is possible to avoid the illumination of the repeat region IRb shown in Fig. 7 with non-duplicate The illumination of region IRc is discontinuous.

Such deflector 22 (light beam combining unit) is such as passed through will be with prescribed direction (Y direction) as length direction Individual prism 49 (with reference to Figure 19) engages and forms.The cross section orthogonal to the longitudinal direction of this prism 49 is right angled triangle, tool There is the hypotenuse 49a at angle at 45 ° with mutually orthogonal both sides.A pair prism 49 by by prism 49 include hypotenuse 49a and The inclined-plane of length direction is bonded with each other and is formed as the prism of prism-shaped.The inclined-plane of prism 49 is formed by vapour deposition method etc. Film has the reflecting materials such as such as aluminum, is consequently formed reflectance coating.Example is passed through by the reflectance of portion 46, reflecting part 47 and pars intermedia 48 Density Distribution such as reflectance coating etc. and adjust.

The density of reflectance coating represents with the ratio of the area coverage shared by the reflectance coating on such as unit are region, permissible Using region of a relatively high for the density of the reflectance coating in prism as reflecting part 47, the density of reflectance coating is lower than reflecting part Region is as pars intermedia 48, using region lower than pars intermedia 48 for the density of reflectance coating as by portion 46.

As the forming method of deflector 22, for instance, it is possible to enumerate following methods: film forming reflection on the inclined-plane of prism Reflectance coating is removed by the local such as etching after film, using the part that eliminates reflectance coating as by portion 46 or pars intermedia 48, will be not There is the part removing reflectance coating as reflecting part 47.In the forming method of such deflector 22, it is possible to by making etching bar Part such as etching period is the different Density Distribution realizing reflectance coating as described above in by portion 46 and pars intermedia 48.

It addition, as other forming methods of deflector 22, it is possible to enumerate such as following methods: on the inclined-plane of prism Reflectance coating is carried out partial film forming, film forming is had the part of reflectance coating as reflecting part 47 or pars intermedia 48, film forming will not had anti- Penetrate the part of film as by portion 46.In the forming method of such deflector 22, it is possible to by making the film forming bar of reflectance coating Part such as film formation time is the different Density Distribution realizing reflectance coating as described above in reflecting part 47 and pars intermedia 48.

The illuminator IU of present embodiment as described above, owing to passing through by portion 46 and reflection in deflector 22 Pars intermedia 48 is set to make local lighting region IRa connect, it is possible to make in the prescribed direction of illumination region IR between portion 47 Illumination Distribution homogenization.

Additionally, the present invention is not limited to above-mentioned embodiment.Such as, there is illustrated in the above-mentioned embodiment of omission The situation of above key element.It addition, can the key element of explanation in appropriately combined above-mentioned embodiment.It addition, allowed by law In the range of, quote the entire disclosure publication and Disclosure of U.S. patent quoted in above-mentioned embodiment being and remember herein The part carried.

Additionally, in the 1st embodiment, using the substrate-placing platform ST of supporting substrates P in planar fashion as substrate supporting Parts, but such substrate supporting parts also are able to be suitable in other embodiments.It addition, will rotation in the 2nd embodiment Tumbler cylinder 35 is as substrate supporting parts, but such substrate supporting parts also are able to be applicable to other embodiments.

Additionally, employ the mask pattern M of cylindrical shape in above-mentioned each embodiment but it also may it is such as so-called to use The mask pattern M of ring-band shape, it is also possible to using plane mask pattern M, the mode of mask holding member can be according to covering The mode of film figure M and suitably change.

Additionally, in the 1st embodiment, the light source portion 21 of illuminator IU makes beam spread by line segment maker 24, But such light source portion 21 also is able to be applicable to other embodiments.It addition, in the 2nd embodiment, the light of illuminator IU Source portion 21 makes the Illumination Distribution homogenization of each lighting module 20 by optics rod unit 36, but such light source portion 21 also is able to fit For other embodiments.

Additionally, in the 3rd embodiment, the deflector 22 of illuminator IU makes illumination light L deflect by reflection, but so Deflector 22 also be able to be applicable to other embodiments.Deflector 22 enables direction that illumination light L deflects according to from light The injection direction of illumination light L in source portion 21 and suitably change.

Additionally, in the above-described embodiment, the injection direction setting from illumination light L in multiple light source portions 21 is two sides To, but more than three directions can also be set as from the injection direction of illumination light L in multiple light source portions 21, in this case, The direction that deflector 22 enables illumination light L to deflect suitably is changed.

Additionally, exposure device EX can be to be the projection type exposure device of poly-lens mode or microlens array mode, at this In the case of can be by least one be applicable to multiple lamp optical systems of illuminator IU as described above.

It addition, also be able to group in mirror projection (mirror projection) type scanning-exposure apparatus to enter this embodiment party The illuminator IU of formula, wherein, in mirror projection type scanning-exposure apparatus, by the pattern of plane mask via having circle The catoptric projection optical system of the offner type of the perspective view of arcuation and be projected on plane sensitive substrate, and make mask Mobile relative to catoptric projection optical system scanning with sensitive substrate.In the case of Gai, such as, replace shown in Fig. 5, Fig. 6, Figure 10 Make multiple deflection component 22a along Y-direction with the configuration of linear array (joint), and make multiple deflection component 22a arrange deviously So that the illumination region IR on mask is similar to the perspective view of arc-shaped.To this end, in figure 6, as long as making formation each other Part 27a of side end face on the border 27 of adjacent deflection component 22a, 27b XY face in drift angle difference.

It addition, in the above-described embodiment, illuminator IU is applicable to exposure device EX, but illuminator IU also is able to It is applicable to such as annealing device etc..

[device making method]

Then, device making method is illustrated.Figure 22 is the flow process of the device making method representing present embodiment Figure.

In the device making method shown in Figure 22, first, such as display panels, organic EL display panel etc. are carried out The function of device/performance design (step 201).Then, design based on device, make mask pattern M (step 202).It addition, The hyaline membrane as device substrate or the substrate (step such as sheet or very thin metal forming is prepared in advance by buying or manufacture etc. 203)。

Then, ready substrate is put into rolling, the production line of batch, forms the electrode constituting device on the substrate With TFT backplane (back plane) layer of wiring, dielectric film, semiconductor film etc., organic EL luminescent layer (step of becoming pixel portion 204).In step 204, typically comprise and form the operation of corrosion-resisting pattern on the film on substrate and with this corrosion-resisting pattern be The operation that above-mentioned film is etched by mask.Following operation is implemented: be formed uniformly by etchant resist in the formation of corrosion-resisting pattern Operation in substrate surface；According to the respective embodiments described above with the exposure light that patterns via mask pattern M to substrate The operation that etchant resist is exposed；Make to be formed with the operation of the etchant resist development of the sub-image of mask pattern by this exposure.

In the case of the flexible device using printing technology etc. at the same time manufactures, implement to pass through coating type on the surface of the substrate And formed functional photosensitive layer (photonasty silane coupling material etc.) operation, will be via mask according to above-mentioned each embodiment Pattern M and the exposure light that patterns are irradiated in functional photosensitive layer and are formed according to pattern form on functional photosensitive layer The part of hydrophiling and the operation of the part of hydrophobization, coating plating end liquid in the part that the hydrophilic of functional photosensitive layer is high Deng and by electroless plating separate out formed metallic pattern operation etc..

Then, according to the device manufactured, such as, implement such as substrate cut or cut-out, laminating to be manufactured with other operations Other substrates such as there is the operation of the colored filter of lamellar of sealing function or thin glass substrate etc., thus assembly device (step 205).Then, carry out checking the subsequent treatment (step 206) of device etc..Can be by manufacturing device above.

Description of reference numerals

10 ... mobile device, 21 ... light source portion, 21a ... the 1st light source portion, 21b ... the 2nd light source portion, 22 ... deflector, 23 ... Light source, 24 ... line segment maker, 25 ... collimator, 28 ... optical filter, 35 ... rotation cylinder, 36 ... optics rod unit, 37,38 ... Relay lens, 42 ... diaphragm parts, 45 ... reflecting mirror, 46 ... by portion, 47 ... reflecting part, 48 ... pars intermedia, EX ... exposure dress Put, IU ... illuminator, L ... illumination light, M ... mask pattern, P ... substrate, S ... distance, U3 ... processing means.

Claims

1. an illuminator, irradiates the illumination light of the shape of slit of linearity or arc-shaped, it is characterised in that

Having multiple lighting module, the plurality of lighting module is to divide the illumination region of illumination light based on described shape of slit During for multiple local lighting region of the length direction along described shape of slit, by described local lighting area illumination from light The mode of the illumination light in source, configures along described length direction,

In each of the plurality of lighting module,

Being provided with deflector and optics, this deflector has: the 1st interface, and it is with described local lighting region accordingly Inject the described illumination light from described light source；With the 2nd interface, its make the described illumination light injected from described 1st interface towards Described local lighting region is penetrated, and described optics makes from the described illumination light of described light source towards the institute of described deflector State the 1st interface injection,

The described deflector of the described lighting module of the odd number arranged along described length direction and the described photograph of even number The described deflector of bright module is adjacent to configuration, the described light of the described lighting module of described odd number along described length direction The described optics of the described lighting module of department of the Chinese Academy of Sciences's part and described even number is on the direction intersected with described length direction With mutually different towards configuration.

2. illuminator as claimed in claim 1, it is characterised in that

Each of the plurality of lighting module includes from as described in the solid light source of described light source or LASER Light Source The light guide member that illumination light guides to described optics.

3. illuminator as claimed in claim 2, it is characterised in that

The described optics being arranged on the described lighting module of described odd number and the institute being arranged on described even number The described optics stated on lighting module is symmetrically arranged about following face: this face is at the photograph with the described shape of slit of formation Along described length direction by described illumination region under the state that the face in territory, area pellucida is vertical.

4. illuminator as claimed in claim 3, it is characterised in that

It is arranged on described 1st interface of the described deflector on the described lighting module of described odd number and is arranged on described Described 1st interface of the described deflector on the described lighting module of even number, court in the face orthogonal with described length direction To mutually different direction.

5. illuminator as claimed in claim 4, it is characterised in that

It is arranged on described 2nd interface of the described deflector on the described lighting module of described odd number and is arranged on described The border at described 2nd interface of the described deflector on the described lighting module of even number, with described length direction non-vertically Intersect.

6. the illuminator as according to any one of Claims 1 to 5, it is characterised in that

Described deflector is made up of optical prism, and this optical prism is by the refraction on described 1st interface or described 1st interface With the refraction on described 2nd interface both sides, the described illumination light from described optics is made to deflect.

7. illuminator as claimed in claim 6, it is characterised in that

The respective described optics of the plurality of lighting module includes: inject also for the described illumination light from described light source Make its line segment maker spread on described length direction；With make by described line segment maker diffusion described illumination light about The collimator of described length direction parallelization.

8. illuminator as claimed in claim 6, it is characterised in that

The respective described optics of the plurality of lighting module includes:

Optics rod unit, its have for inject from the described illumination light of described light source inject end face and with described length Direction corresponding to direction is long limit and the injection end face making described illumination light penetrate；With

Relay lens, it forms conjugate planes with described injection end face.

9. illuminator as claimed in claim 8, it is characterised in that

Having diaphragm parts, these diaphragm parts are so that the side of Illumination Distribution homogenization of described length direction in described illumination region Formula, specify the light from the injection of described optics rod unit on the direction vertical with described length direction passes through scope.