CN108179396B - 环形循环连续式真空镀膜装置 - Google Patents
环形循环连续式真空镀膜装置 Download PDFInfo
- Publication number
- CN108179396B CN108179396B CN201810018226.2A CN201810018226A CN108179396B CN 108179396 B CN108179396 B CN 108179396B CN 201810018226 A CN201810018226 A CN 201810018226A CN 108179396 B CN108179396 B CN 108179396B
- Authority
- CN
- China
- Prior art keywords
- rotary table
- vacuum
- feeding
- cavities
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 61
- 230000008569 process Effects 0.000 claims abstract description 61
- 230000007246 mechanism Effects 0.000 claims abstract description 32
- 238000000576 coating method Methods 0.000 claims abstract description 31
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000009489 vacuum treatment Methods 0.000 claims abstract description 8
- 238000005516 engineering process Methods 0.000 claims abstract description 3
- 238000007789 sealing Methods 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000007733 ion plating Methods 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 238000010891 electric arc Methods 0.000 claims description 3
- 238000009504 vacuum film coating Methods 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 abstract description 20
- 230000003028 elevating effect Effects 0.000 abstract 1
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 238000005086 pumping Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000010924 continuous production Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810018226.2A CN108179396B (zh) | 2018-01-09 | 2018-01-09 | 环形循环连续式真空镀膜装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810018226.2A CN108179396B (zh) | 2018-01-09 | 2018-01-09 | 环形循环连续式真空镀膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108179396A CN108179396A (zh) | 2018-06-19 |
CN108179396B true CN108179396B (zh) | 2020-07-28 |
Family
ID=62550216
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810018226.2A Active CN108179396B (zh) | 2018-01-09 | 2018-01-09 | 环形循环连续式真空镀膜装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108179396B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113445015A (zh) * | 2020-03-26 | 2021-09-28 | 中国科学院微电子研究所 | 一种集成镀膜设备的样品传输装置 |
CN112553582A (zh) * | 2020-12-02 | 2021-03-26 | 深圳市捷佳伟创新能源装备股份有限公司 | 靶材供料设备与真空镀膜设备 |
CN113445011B (zh) * | 2021-06-22 | 2022-09-09 | 湖南国创同芯科技有限公司 | 一种用于镀膜机的银靶喷溅装置 |
CN114457315B (zh) * | 2021-12-28 | 2023-07-25 | 凯盛信息显示材料(洛阳)有限公司 | 一种玻璃磁控溅射镀膜*** |
CN115407432B (zh) * | 2022-08-29 | 2023-12-22 | 歌尔光学科技有限公司 | 一种真空镀膜*** |
CN115305450A (zh) * | 2022-09-06 | 2022-11-08 | 嘉兴云浩纳米技术有限公司 | 基于数字工厂智联网纳米镀膜产线*** |
CN115558888B (zh) * | 2022-11-09 | 2023-03-17 | 泰州远鹏吊索具有限公司 | 一种石油化工用c形吊具表面防锈处理装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000323554A (ja) * | 1999-05-14 | 2000-11-24 | Tokyo Electron Ltd | 処理装置 |
JP2001127135A (ja) * | 1999-10-27 | 2001-05-11 | Shibaura Mechatronics Corp | 真空処理装置 |
CN100513635C (zh) * | 2004-05-28 | 2009-07-15 | 应用材料股份有限两合公司 | 真空处理设备用的传动机构 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070209932A1 (en) * | 2006-03-10 | 2007-09-13 | Veeco Instruments Inc. | Sputter deposition system and methods of use |
CN104752275B (zh) * | 2013-12-29 | 2018-01-09 | 北京北方华创微电子装备有限公司 | 工艺腔室以及半导体加工设备 |
-
2018
- 2018-01-09 CN CN201810018226.2A patent/CN108179396B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000323554A (ja) * | 1999-05-14 | 2000-11-24 | Tokyo Electron Ltd | 処理装置 |
JP2001127135A (ja) * | 1999-10-27 | 2001-05-11 | Shibaura Mechatronics Corp | 真空処理装置 |
CN100513635C (zh) * | 2004-05-28 | 2009-07-15 | 应用材料股份有限两合公司 | 真空处理设备用的传动机构 |
Also Published As
Publication number | Publication date |
---|---|
CN108179396A (zh) | 2018-06-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108179396B (zh) | 环形循环连续式真空镀膜装置 | |
CN107058947B (zh) | 用于制备燃料电池金属双极板非晶碳膜磁控溅射连续线 | |
CN202347079U (zh) | 三室连续真空高温低压渗碳设备 | |
WO2014089948A1 (zh) | 多功能连续式磁控溅射镀膜装置 | |
CN202730224U (zh) | 一种柔性薄膜太阳能电池导电膜沉积设备 | |
CN112981346B (zh) | 一种多室磁控多层光学镀膜设备及镀膜方法 | |
CN108277471A (zh) | 立式周向循环连续式气相沉积设备 | |
CN113770608A (zh) | 一种通道式真空焊接炉 | |
CN111286705A (zh) | 双室三工位多靶共溅磁控溅射镀膜设备 | |
CN110699655A (zh) | 一种dlc连续镀膜生产线及镀膜工艺 | |
CN107895644B (zh) | 一种用于重稀土晶界扩渗的生产线及生产方法 | |
CN219689835U (zh) | 一种真空磁控溅射双面镀膜*** | |
CN211112112U (zh) | 分段式连续热处理炉 | |
CN207958497U (zh) | 单腔循环连续式类金刚石涂层装置 | |
CN217809639U (zh) | 一种真空镀膜机 | |
CN217973389U (zh) | 一种连续镀膜装置 | |
CN112481588B (zh) | 全自动快速溅射镀膜生产设备 | |
CN216912581U (zh) | 一种通道式真空焊接炉 | |
CN108179397B (zh) | 并行周向连续式等离子体镀膜装置 | |
CN212293657U (zh) | 一种多工位真空退火机 | |
CN208218942U (zh) | 一种气体氮化炉 | |
CN114293168A (zh) | 镀膜材料存放装置、真空镀膜设备及真空镀膜方法 | |
CN220034647U (zh) | 一种燃料电池金属双极板连续镀膜设备 | |
CN219886167U (zh) | 一种连续式电阻电子束蒸发镀膜装置 | |
CN220202034U (zh) | 一种往返式真空镀膜装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240524 Address after: 215000, 2nd Floor, Building 1, No. 19 Yong'an Road, High tech Zone, Suzhou City, Jiangsu Province Patentee after: Suzhou Puweidi Nanotechnology Co.,Ltd. Country or region after: China Address before: 325000 Wenzhou City National University Science Park incubator, No. 38 Dongfang South Road, Ouhai District, Wenzhou, Zhejiang Patentee before: WENZHOU VOCATIONAL & TECHNICAL College Country or region before: China |