CN108103472A - A kind of composite coating layer cutter and preparation method thereof - Google Patents
A kind of composite coating layer cutter and preparation method thereof Download PDFInfo
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- CN108103472A CN108103472A CN201711451155.7A CN201711451155A CN108103472A CN 108103472 A CN108103472 A CN 108103472A CN 201711451155 A CN201711451155 A CN 201711451155A CN 108103472 A CN108103472 A CN 108103472A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/271—Diamond only using hot filaments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
- Drilling Tools (AREA)
Abstract
The present invention relates to a kind of composite coating layer cutters and preparation method thereof, belong to composite coating layer cutter technical field.The composite coating layer cutter of the present invention, the diamond layer and nitride layer outwards set gradually including tool matrix and by tool matrix surface.The composite coating layer cutter of the present invention, nitride layer is set outside diamond layer, utilize the red hardness of nitride, improve the heat-resisting quantity and corrosion resistance of composite coating layer cutter, and make not bond between diamond and cast iron, VIII race's metal element and its alloy, effectively promote the processing performance of diamond coatings and nitride composite coating to cast iron, ferrous metal, VIII race's metal element and its alloy.
Description
Technical field
The present invention relates to a kind of composite coating layer cutters and preparation method thereof, belong to composite coating layer cutter technical field.
Background technology
As the conventional cemented carbide of one of machining tool and wear part main material, it has been increasingly difficult to full
Its demand for development of foot, the successful development and application of diamond low-pressure chemical vapor deposition method, to research and develop diamond coatings
Hard alloy joint product is laid a good foundation.Compared with diamond single crystal and diamond composite, diamond coatings hard closes
Golden product is not only of low cost, shape limitation smaller, and its performance can also match in excellence or beauty with the above two.But hard alloy
The coefficient of thermal expansion of matrix and diamond coatings differs greatly, and causes the interface binding power between matrix and coating weaker, at present
Main concentrate of research how to improve interface binding power between matrix and diamond coatings etc..
Diamond coating for hard alloy product is mainly used as cutting tool, but due to VIII race such as ferrous metal and Co, Ni
Metal element is the solvent of C in the molten state, and in mechanical processing process, localized hyperthermia causes the carbon atom of diamond to dissolve in
In metal lattice, the cutting edge of diamond and the relevant coating product of diamond will be unable to work on.By increasing cutting fluid,
When making diamond-coated tool cutting edge workpieces processing, temperature relative reduction makes diamond-coated tool process ferrous metal, and
Due to the characteristic of hard high-strength, excellent effect, but since the cutting fluid of addition can cause environment undesirable influence, no
Beneficial to environmentally protective.Therefore how to make diamond-coated tools processing VIII race's metal element such as ferrous metal and Co, Ni and its
During alloy material, while the characteristics such as its hard high-strength are kept, and environment can not be impacted, become and urgently solve
Certainly the problem of.
The content of the invention
The object of the present invention is to provide a kind of composite coating layer cutter, available for VIII race's element gold such as ferrous metal and Co, Ni
The processing of category and its alloy material.
The present invention also provides a kind of preparation methods of above-mentioned composite coating layer cutter.
In order to achieve the goal above, technical solution is used by the composite coating layer cutter of the present invention:
A kind of composite coating layer cutter, the diamond layer outwards set gradually including tool matrix and by tool matrix surface and
Nitride layer.
The composite coating layer cutter of the present invention, sets nitride layer outside diamond layer, using the red hardness of nitride, improves
The heat-resisting quantity and corrosion resistance of composite coating layer cutter, and make diamond and cast iron, ferrous metal, VIII race's metal element and its
It is not bonded between alloy, effectively promotes diamond coatings and nitride composite coating cast iron, to ferrous metal, VIII race
The processing performance of metal element and its alloy.Due to the presence of the diamond coatings of high rigidity, tool matrix surface is improved
The hardness number of composite coating, the nitride layer of compact structure can improve the high temperature resistant temperature and toughness of composite coating again.It is high hard
Degree and high tenacity value improve the processing intensity of composite coating layer cutter, can be used for roughing and discontinuously processing.
Titanium coating is provided between the diamond layer and nitride layer, between the titanium coating and diamond layer also
It is provided with carbonization ti interlayer.Titanium coating and carbonization ti interlayer, Neng Gouzeng are set between diamond layer and nitride layer
The bond strength between diamond layer such as strong nitride, using process without nitride obscission, extends composite coating knife
The service life of tool.
The thickness of the titanium coating is 0.01~0.2 μm, and the thickness of titanium carbide layer is 0.01~0.1 μm.
During cutting workpiece, nitride layer forms thermodynamic barrier in tool surface.The nitride layer is made of nitride;It is described
Nitride is made of at least one of Ti, Si, Al, Cr, Zr element and N element.
Preferably, the nitride is made of at least one of Si, Al, Cr, Zr element and Ti elements, N element.
Preferably, the nitride is made of Ti, Si, Al and N element.The atom of Ti, Si and Al rub in the nitride
You are than being 1~3:0.05~0.3:2~3.Because N element is in coating compound forming process, participate in other elements formed it is close
In the nitrogen compound of metering ratio.But in coating composition, N atoms and the standard of the actual ratio value of other Elements Atoms in nitride
True value is difficult to determine, with text with unknown number x instead of the Relative mole ratio of nitrogen.
The thickness of the nitride layer is 2~6 μm;The thickness of the diamond layer is 3~15 μm.
The tool matrix is hard alloy, Si3N4One kind in ceramics.During using hard alloy as tool matrix, both may be used
Directly diamond coatings are arranged on hard alloy, can also set to improve between hard alloy and diamond layer
Hard alloy and the coating of diamond binding ability.
Technical solution is used by the preparation method of the composite coating layer cutter of the present invention:
A kind of preparation method of above-mentioned composite coating layer cutter, comprises the following steps:It is deposited on diamond-coated tools
Nitride formed nitride layer to get;The diamond-coated tools include tool matrix and coated in the gold on tool matrix
Hard rock layer.
The preparation method of the composite coating layer cutter of the present invention, it is simple for process, it is easy to utilize.
The preparation method of the diamond-coated tools, comprises the following steps:Tool matrix is carried out to alkali cleaning successively, is taken off
Cobalt, kind grain of crystallization, then on tool matrix depositing diamond layer to get;The tool matrix is hard alloy.
The washing lotion that the alkali cleaning uses is for 1 by hydroxide, the iron cyanide, water according to mass ratio:0.8~1.3:8~
13 are mixed to get.The hydroxide is at least one of sodium hydroxide, potassium hydroxide.The iron cyanide for the potassium ferricyanide,
At least one of sodium ferricyanide.During alkali cleaning, tool matrix is put into 20~30min of supersound process in washing lotion.After alkali cleaning, with water pair
Tool matrix is washed.
De- cobalt is carried out by the way of pickling.The washing lotion that the pickling uses be by sulfuric acid and hydrogen peroxide according to mass ratio for
1:1~2.4 ratio is mixed to get.The mass fraction of the hydrogen peroxide is 30~50%, the mass fraction of the sulfuric acid
For 97~99%.During pickling, tool matrix is put into 5~40s of immersion in washing lotion.Preferably, tool matrix is put into washing lotion
The time of immersion is 20~40s.After pickling, tool matrix is washed with water.
The method that kind grain of crystallization uses comprises the following steps:The tool matrix of pickling is put into nanodiamond suspension
It is ultrasonically treated.The grain size of the Nano diamond is 20~60nm.During kind grain of crystallization, the time of supersound process is 20
~50min.After tool matrix after kind of grain of crystallization is taken out, tool matrix is washed with water.
When being washed with water to tool matrix, deionized water may be employed.Tool matrix can such as be surpassed into the water
2~10min of sound is to wash tool matrix.
Using filament CVD, depositing diamond film forms diamond layer on tool matrix.The filament CVD is
Reaction source is deposited into 5~15h under 1~2.4kPa, 800~1200 DEG C of environment.The reaction source is H2And carbon source.The carbon source
For CH4。
Cvd nitride object uses vapour deposition process on diamond-coated tools, such as uses magnetron sputtering method.Preferably, exist
Cvd nitride object uses pulsed magnetron sputtering method on diamond-coated tools.Using pulsed magnetron sputtering method in diamond coatings knife
Cvd nitride object is using magnetron sputtering coater on tool.The pulsed magnetron sputtering method is the gaseous mixture in nitrogen and argon gas
In atmosphere, controlled at 500~550 DEG C, bias mains voltage be 70~100V, target power pulse frequency be 500~
1000Hz, target power are 8000~10000kW, sputter 2.5~7h.Used target can root during cvd nitride object
According to the composition of nitride, the target of corresponding component is selected.If cvd nitride object is by tri- kinds of elements of Ti, Si, Al and N element group
Titanium aluminium target and silicon titanium target material can be used in Cheng Shi.The ratio of each metallic atom is according to nitride in titanium aluminium target and silicon titanium target material
The molar ratio of the atom of middle Ti, Si, Al makes choice.In the mixed atmosphere of nitrogen and argon gas, the partial pressure of nitrogen is 400~
600MPa.In the mixed atmosphere of nitrogen and argon gas, the partial pressure of argon gas is 250~300MPa.
On diamond-coated tools before cvd nitride object, titanium is first deposited on diamond-coated tools away from gold
Titanium carbide layer, titanium coating are sequentially formed on the direction of hard rock coated cutting tool.
Titanium is deposited on diamond-coated tools using vapour deposition process, such as uses magnetron sputtering method.Preferably, exist
Titanium is deposited on diamond-coated tools and uses pulsed magnetron sputtering method.The magnetic control pulsed sputter method is in argon gas atmosphere
In, controlled at 500~550 DEG C, bias mains voltage be 70~100V, target power pulse frequency be 500~1000Hz,
Target power is 2000~3000kW, sputters 25~35min.Target is Ti targets used by depositing titanium coating.
When depositing titanium coating, the carbon source chemical reaction of Ti ions and diamond combines, the similar original with diamond particle surfaces titanizing
Reason, Titanium react to form TiC transition zones with carbon:Diamond (C)-TiC-Ti, using physical vaporous deposition in diamond layer
Upper deposition obtains layer of titanium metal, improves the chemical binding force of layer of titanium metal and diamond layer.
In cvd nitride object and titanium, using high-power pulsed magnetron sputtering method, splash-proofing sputtering metal target generates big
Amount ionization, gives the high energy pulse of target MW class, and the plasma of high load concentrations, strong improvement are formed in target material surface
The layer structure of coating and layer characteristic, this is because the residual stress of high-energy sputtering gained coating is small, the combination power between coating
Increase and more than shearing force.
Before depositing titanium on diamond-coated tools, first the diamond layer of diamond-coated tools is sprayed successively
Sand processing, Glow Discharge Cleaning and ion etching.
The medium that the blasting treatment uses is Al2O3.The pressure of blasting treatment is 3~4MPa, and the time is 8~15min.
Diamond-coated tools are washed using water after blasting treatment, such as can by diamond-coated tools into the water ultrasound 50
~80min.
The Glow Discharge Cleaning and ion etching are carried out in magnetic-controlled sputtering coating equipment.
The Glow Discharge Cleaning is in magnetic-controlled sputtering coating equipment, controlled at 500~550 DEG C, grid bias power supply
Voltage is 1000~1100V, and 40~180min is cleaned to diamond-coated tools in argon atmosphere.
The ion etching is in magnetic-controlled sputtering coating equipment, controlled at 500~550 DEG C, target power
Be 600~800V for 2000~3500kW, bias mains voltage, target power pulse frequency is 500~1000Hz, in argon gas gas
Target is opened in atmosphere, 25~35min is bombarded to diamond-coated tools.The target that ion etching uses is Ti targets or titanium aluminium target
Material.
Before proceeding by ion etching and cvd nitride object, magnetic-controlled sputtering coating equipment is evacuated to 1 × 10-3Pa。
In ion etching and titanium deposition metal process, the flow for the argon gas being filled with is 80~120sccm, to maintain required argon gas gas
Atmosphere.During Glow Discharge Cleaning, the rotating speed of turntable is 0~5min/r.The process of ion etching, deposition titanium and cvd nitride object
In, the rotating speed of turntable is 1~5min/r.Preferably, during ion etching, deposition titanium and cvd nitride object, turntable
Rotating speed be 1~3min/r.
Description of the drawings
Fig. 1 is the structure diagram of the composite coating layer cutter of embodiment 1;Wherein, 1- tool matrix, 2- diamond layers, 3-
Be carbonized ti interlayer, 4- titanium coatings, 5- nitride layers.
Specific embodiment
Technical scheme is further described below in conjunction with specific embodiment.
In specific embodiment, for YG6 carbide chips, specification is the tool matrix that Examples 1 to 5 uses
VNGA160404;The tool matrix that embodiment 6 uses is Si3N4Ceramics, specification VNGA160404.
Embodiment 1
The composite coating layer cutter of the present embodiment, as shown in Figure 1, including tool matrix 1 and by tool matrix surface outwards according to
The diamond layer 2 of secondary setting, titanium carbide (TiC) transition zone 3, titanium coating 4 and nitride layer 5;The thickness of diamond layer is 4 μ
M, the thickness for the ti interlayer that is carbonized is 0.01 μm, and the thickness of titanium coating is 0.01 μm, and the thickness of nitride layer is 3 μm;Nitridation
Nitride layer is made of nitride, nitride Ti2Si0.1Al2Nx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:1:10 ratio mixing, obtains alkali cleaning
Then tool matrix is put into alkali wash water and is ultrasonically treated 25min by liquid, take out, be put into deionized water be ultrasonically treated 3min with
It is washed;
2) by sulfuric acid and hydrogen peroxide according to 3:7 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 10s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 60min to be washed;Institute
For the mass fraction of the sulfuric acid used for 97%, the mass fraction of hydrogen peroxide is 30%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 30min,
It takes out, is put into deionized water and is ultrasonically treated 3min to be washed;The grain size of the Nano diamond is 30nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4As reaction source, pressure be 1kPa, temperature is
Under conditions of 800 DEG C, sedimentation time 5h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 3.5MPa, time 10min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and 500 DEG C are heated to, argon gas is passed through with the flow of 80sccm, setting bias mains voltage is 1100V, to Buddha's warrior attendant
Stone coated cutting tool carries out Glow Discharge Cleaning 60min;
Using Ti as target, setting target power is 2000kW, target power pulse frequency is 500Hz, grid bias power supply
Voltage is 800V, turntable rotating speed is 1min/r, opens target bombardment 30min;Then bias mains voltage is down to 100V, opened
Ti target as sputter 30min;
It is titanium aluminium target and silicon titanium target material to replace target, is passed through argon gas and nitrogen after vacuumizing, the partial pressure for making argon gas is
250MPa, the partial pressure of nitrogen is 450MPa, and wherein the flow of nitrogen is 80sccm, and it is 80V then to set bias mains voltage, and
Adjustment target power is 8000kW, opens target as sputter 3h;Cooling to get.
Embodiment 2
The composite coating layer cutter of the present embodiment, the Buddha's warrior attendant outwards set gradually including tool matrix and by tool matrix surface
Rock layers, titanium carbide (TiC) transition zone, titanium coating and nitride layer;The thickness of diamond layer is 8 μm, and be carbonized ti interlayer
Thickness is 0.05 μm, and the thickness of titanium coating is 0.1 μm, and the thickness of nitride layer is 4 μm;Nitride layer is made of nitride,
Nitride is Ti2Si0.1Al3Nx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:0.8:8 ratio mixing, obtains alkali cleaning
Then tool matrix is put into alkali wash water and is ultrasonically treated 25min by liquid, take out, be put into deionized water be ultrasonically treated 3min with
It is washed;
2) by sulfuric acid and hydrogen peroxide according to 1:1 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 20s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 90min to be washed;Institute
For the mass fraction of the sulfuric acid used for 99%, the mass fraction of hydrogen peroxide is 40%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 50min,
It takes out, is put into deionized water and is ultrasonically treated 3min to be washed;The grain size of the Nano diamond is 45nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4It is 2.4kPa, temperature in pressure as reaction source
Under conditions of 1000 DEG C, sedimentation time 10h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 3MPa, time 15min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and 550 DEG C are heated to, argon gas is passed through with the flow of 120sccm, setting bias mains voltage is 1000V, to Buddha's warrior attendant
Stone coated cutting tool carries out Glow Discharge Cleaning 60min;
Set target power be 3500kW, target power pulse frequency is 600Hz, bias mains voltage 600V,
Turntable rotating speed is 2min/r, opens Ti targets bombardment 30min;Then bias mains voltage is reduced to 80V, opens Ti target as sputter
30min;
Then it is titanium aluminium target and silicon titanium target material to replace target, is passed through argon gas and nitrogen after vacuumizing, makes the partial pressure of argon gas
For 250MPa, the partial pressure of nitrogen is 460MPa, and nitrogen is passed through flow as 90sccm, and it is 80V then to set bias mains voltage,
And target power is adjusted as 10000kW, open target as sputter 4h;Cooling to get.
Embodiment 3
The composite coating layer cutter of the present embodiment, the Buddha's warrior attendant outwards set gradually including tool matrix and by tool matrix surface
Rock layers, titanium carbide (TiC) transition zone, titanium coating and nitride layer;The thickness of diamond layer is 12 μm, and be carbonized ti interlayer
Thickness is 0.08 μm, and the thickness of titanium coating is 0.13 μm, and the thickness of nitride layer is 5 μm;Nitride layer is made of nitride,
Nitride is Ti2Si0.3Al3Nx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:1.3:13 ratio mixing, obtains alkali
Then tool matrix is put into alkali wash water and is ultrasonically treated 25min by washing lotion, take out, be put into deionized water and be ultrasonically treated 3min
To be washed;
2) by sulfuric acid and hydrogen peroxide according to 2:3 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 30s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 90min to be washed;Institute
For the mass fraction of the sulfuric acid used for 98%, the mass fraction of hydrogen peroxide is 35%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 20min,
It takes out, is put into deionized water and is ultrasonically treated 3min to be washed;The grain size of the Nano diamond is 60nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4It is 1.7kPa, temperature in pressure as reaction source
Under conditions of 1100 DEG C, sedimentation time 10h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 4MPa, time 8min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and 520 DEG C are heated to, argon gas is passed through with the flow of 100sccm, setting bias mains voltage is 1050V, to Buddha's warrior attendant
Stone coated cutting tool carries out Glow Discharge Cleaning 60min;
Using Ti as target, it is 2800kW to set target power, and target power pulse frequency is 800Hz, bias plasma
Source voltage is 700V, turntable rotating speed is 2min/r, opens target bombardment 30min;Then bias mains voltage is down to 90V, opened
Open target as sputter 30min;
It is titanium aluminium target and silicon titanium target material to replace target, is passed through argon gas and nitrogen after vacuumizing, the partial pressure for making argon gas is
250MPa, the partial pressure of nitrogen is 460MPa, and nitrogen is passed through flow as 90sccm, and setting bias mains voltage is 90V, and is adjusted
Target power is 9000kW, opens target as sputter 4.5h;Cooling to get.
Embodiment 4
The composite coating layer cutter of the present embodiment, the Buddha's warrior attendant outwards set gradually including tool matrix and by tool matrix surface
Rock layers and nitride layer;The thickness of diamond layer is 15 μm, and the thickness of nitride layer is 6 μm;Nitride layer is by nitride structure
Into nitride Ti3Si0.3Al3Nx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:1:10 ratio mixing, obtains alkali cleaning
Then tool matrix is put into alkali wash water and is ultrasonically treated 25min by liquid, take out, be put into deionized water be ultrasonically treated 3min with
It is washed;
2) by sulfuric acid and hydrogen peroxide according to 3:7 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 40s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 90min to be washed;Institute
For the mass fraction of the sulfuric acid used for 97%, the mass fraction of hydrogen peroxide is 50%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 30min,
It takes out, is put into deionized water and is ultrasonically treated 3min to be washed;The grain size of the Nano diamond is 30nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4As reaction source, pressure be 1kPa, temperature is
Under conditions of 800 DEG C, sedimentation time 15h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 3.5MPa, time 10min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and 500 DEG C are heated to, argon gas is passed through with the flow of 80sccm, setting bias mains voltage is 1100V, to Buddha's warrior attendant
Stone coated cutting tool carries out Glow Discharge Cleaning 60min;
Using Ti as target, it is 2000kW to set target power, and target power pulse frequency is 500Hz, bias plasma
Source voltage is 800V, turntable rotating speed is 3min/r, opens target bombardment 30min;
It is titanium aluminium target and silicon titanium target material to replace target, is passed through argon gas and nitrogen after vacuumizing, the partial pressure for making argon gas is
250MPa, the partial pressure of nitrogen is 500MPa, and nitrogen is passed through flow as 100sccm, and setting bias mains voltage is 80V, and is adjusted
Whole target power is 8000kW, opens target as sputter 7h;Cooling to get.
Embodiment 5
The composite coating layer cutter of the present embodiment, the Buddha's warrior attendant outwards set gradually including tool matrix and by tool matrix surface
Rock layers, titanium carbide (TiC) transition zone, titanium coating and nitride layer;The thickness of diamond layer is 3 μm, and be carbonized ti interlayer
Thickness is 0.01 μm, and the thickness of titanium coating is 0.2 μm, and the thickness of nitride layer is 6 μm;Nitride layer is made of nitride,
Nitride is TiSi0.05Al3Nx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:1.2:9 ratio mixing, obtains alkali cleaning
Then tool matrix is put into alkali wash water and is ultrasonically treated 20min by liquid, take out, be put into deionized water be ultrasonically treated 5min with
It is washed;
2) by sulfuric acid and hydrogen peroxide according to 3:7 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 40s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 70min to be washed;Institute
For the mass fraction of the sulfuric acid used for 97%, the mass fraction of hydrogen peroxide is 30%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 40min,
It takes out, is put into deionized water and is ultrasonically treated 2min to be washed;The grain size of the Nano diamond is 20nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4It is 1.4kPa, temperature in pressure as reaction source
Under conditions of 1200 DEG C, sedimentation time 4h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 3.2MPa, time 12min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and 500 DEG C are heated to, argon gas is passed through with the flow of 80sccm, setting bias mains voltage is 1000V, to Buddha's warrior attendant
Stone coated cutting tool carries out Glow Discharge Cleaning 40min;
Using Ti as target, setting target power is 2000kW, target power pulse frequency is 900Hz, bias plasma
Source voltage is 800V, turntable rotating speed is 2min/r, opens target bombardment 25min;Then voltage is reduced to 100V, is opened target and is splashed
Penetrate 25min;
It is titanium aluminium target and silicon titanium target material to replace target, is passed through argon gas and nitrogen after vacuumizing, the partial pressure for making argon gas is
250MPa, the partial pressure of nitrogen is 400MPa, and nitrogen is passed through flow as 80sccm, sets bias mains voltage to 100V, and adjust
Whole target power is 8000kW, opens target as sputter 7h;Cooling to get.
Embodiment 6
The composite coating layer cutter of the present embodiment, the Buddha's warrior attendant outwards set gradually including tool matrix and by tool matrix surface
Rock layers, titanium carbide (TiC) transition zone, titanium coating and nitride layer;The thickness of diamond layer is 15 μm, and be carbonized ti interlayer
Thickness is 0.03 μm, and the thickness of titanium coating is 0.16 μm, and the thickness of nitride layer is 2 μm;Nitride layer is made of nitride,
Nitride is Zr3Si0.05Al3CrNx。
The preparation method of the composite coating layer cutter of the present embodiment, comprises the following steps:
1) it is 1 according to mass ratio by the potassium ferricyanide, hydrogen-oxygen agent and deionized water:0.9:101 ratio mixing, obtains alkali
Then tool matrix is put into alkali wash water and is ultrasonically treated 30min by washing lotion, take out, be put into deionized water and be ultrasonically treated 8min
To be washed;
2) by sulfuric acid and hydrogen peroxide according to 3:7 volume ratio is mixed, and obtains pickle, after washing in step 1)
Tool matrix is put into immersion 30s in pickle and takes off cobalt, takes out, and is put into deionized water and is ultrasonically treated 80min to be washed;Institute
For the mass fraction of the sulfuric acid used for 97%, the mass fraction of hydrogen peroxide is 30%;
3) washed tool matrix in step 2) is put into nanodiamond suspension and carries out supersound process 35min,
It takes out, is put into deionized water and is ultrasonically treated 5min to be washed;The grain size of the Nano diamond is 30nm;
4) diamond is formed using tool matrix surface depositing diamond film of the filament CVD in step 3) after washing
Diamond-coated tools are made in layer;Filament CVD is deposited with H2And CH4It is 2.0kPa, temperature in pressure as reaction source
Under conditions of 900 DEG C, sedimentation time 17h;
5) diamond layer of the diamond-coated tools of step 4) is subjected to mechanical blasting treatment, the medium of blasting treatment is
Aluminium oxide, pressure 3.8MPa, time 15min;It is adopted after blasting treatment and 1h is washed with deionized;
6) diamond-coated tools after washing in step 5) are placed in the cavity of magnetron sputtering coater, be evacuated to
1×10-3Pa, and be heated to 500 DEG C is passed through argon gas with the flow of 80sccm, and setting bias mains voltage is 1100V, diamond
Coated cutting tool carries out Glow Discharge Cleaning 180min;
Using Ti as target, setting target power is 2000kW, target power pulse frequency is 1000Hz, bias plasma
Source voltage is 800V, turntable rotating speed is 3min/r, opens target bombardment 35min;Then bias mains voltage is reduced to 80V, opened
Open target as sputter 35min;
Replacement target is zirconium aluminium target, zirconium silicon target and chromium aluminium target, is passed through argon gas and nitrogen after vacuumizing, makes argon gas
It divides as 300MPa, the partial pressure of nitrogen is 600MPa, and nitrogen is passed through flow as 150sccm, sets the bias mains voltage to be
100V, and target power is adjusted as 10000kW, open target as sputter 2.5h;Cooling to get.
Comparative example 1
The cutter of this comparative example be YG6 carbide chips, specification VNGA160404.
Comparative example 2
The cutter of this comparative example is diamond-coated tools obtained in embodiment 1.
Experimental example 1
Using the nitride of the composite coating layer cutter of scarification testing example 1~6 and the bond strength of diamond, as a result
It is shown in Table 1.
The nitride of composite coating layer cutter of 1 Examples 1 to 6 of table and the bond strength of diamond
Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | |
Bond strength/N | 50 | 75 | 110 | 15 | 5 | 80 |
It can be known by data in table 1, titanium coating and carbonization ti interlayer are set between diamond layer and nitride layer
The bond strength of diamond layer and nitride layer can be enhanced.
Experimental example 2
The tool sharpening gray cast iron that Examples 1 to 6 and comparative example 1~2 is respectively adopted tests its service life, test knot
Fruit is shown in Table 2.For a diameter of 280mm of the gray cast iron workpiece of test, the trade mark of cast iron is HT250, hardness HB190;Test
When machined parameters be:Cutting speed 440m/min, amount of feeding 0.23mm/min, cutting-in 0.5mm, work piece surface roughness Ra
1.6, process time 50s.
The cutting-tool's used life test result of 2 Examples 1 to 6 of table and comparative example 1~2
Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | Comparative example 1 | Comparative example 2 | |
Process number of packages/sword | 13 | 40 | 45 | 12 | 11 | 38 | 6 | 3 |
From data in table 2, diamantiferous composite coating layer cutter can effectively process gray cast iron material.Wherein, it is real
Apply the composite coating layer cutter of example 1 because in preparation process tool matrix take off that the cobalt time is relatively short, and Co fails effectively to take off, in this knife
Depositing diamond is carried out on tool matrix, can be caused at tool matrix and diamond interface there are more gap, basal body coating layer is easy
Generation comes off, and influences cutting-tool's used life;And the composite coating layer cutter of embodiment 4, because being lacked between nitride layer and diamond layer
The compounds such as few carbide, do not form chemical bonding so that nitride is combined poor with diamond, and painting interlayer is easy to fall off, shortening
Cutting-tool's used life.The test result of the composite coating layer cutter of embodiment 2 and 3 is closer to, better performances, this is because coating
It is preferably excellent with applying Coating combination with matrix, coating, and because the diamond layer of the composite coating layer cutter of embodiment 3 is thicker, coating
Hardness number is larger, wearability preferably with embodiment 2.Embodiment 5 is larger because containing Al content, and coating is relatively soft, and wearability declines.
Zr substitutes Ti in embodiment 6, and performance is roughly the same with Ti compounds.It is slightly poor that comparative example 1 is compared with 2.
Experimental example 3
The tool sharpening hardened steel that Examples 1 to 6 and comparative example 1~2 is respectively adopted tests its service life, test knot
Fruit is shown in Table 3.It has been just GCr15 Bearing Quenching steel for the quenching of test, hardness HRC58-60.Machined parameters during test are:It cuts
Cut speed 146m/min, amount of feeding 0.12mm/min, cutting-in 0.15mm, work piece surface roughness Ra 1.6, process time
60s。
The cutting-tool's used life test result of 3 Examples 1 to 6 of table and comparative example 1~2
Embodiment 1 | Embodiment 2 | Embodiment 3 | Embodiment 4 | Embodiment 5 | Embodiment 6 | Comparative example 1 | Comparative example 2 | |
Process number of packages/sword | 22 | 100 | 120 | 15 | 11 | 98 | 18 | 0 |
From data in table 3, when processing GCr15 Bearing Quenching steel workpieces, diamond-coated tool loses because of cutting edge high temperature
Effect, can not process quenching steel workpiece.Compared to the carbide chip of non-coating, the diamond-coated tool of composite nitride layer adds
Work performance is obviously improved.Performance and trend and the processing ash that the composite coating layer cutter processing quenching of Examples 1 to 6 is shown when firm
Cast iron is roughly the same.
Claims (10)
1. a kind of composite coating layer cutter, it is characterised in that:It is outwards set gradually including tool matrix and by tool matrix surface
Diamond layer and nitride layer.
2. composite coating layer cutter according to claim 1, it is characterised in that:It is set between the diamond layer and nitride layer
Titanium coating is equipped with, carbonization ti interlayer is additionally provided between the titanium coating and diamond layer.
3. composite coating layer cutter according to claim 1, it is characterised in that:The thickness of the titanium coating for 0.01~
0.2 μm, the thickness of titanium carbide layer is 0.01~0.1 μm.
4. composite coating layer cutter according to claim 1, it is characterised in that:The nitride layer is made of nitride;Institute
Nitride is stated to be made of at least one of Ti, Si, Al, Cr, Zr element and N element.
5. composite coating layer cutter according to claim 4, it is characterised in that:The nitride is by Ti, Si, Al and N element
Composition;The atomic molar ratio of Ti, Si and Al are 1~3 in the nitride:0.05~0.3:2~3.
6. composite coating layer cutter according to claim 1, it is characterised in that:The thickness of the nitride layer is 2~6 μm;
The thickness of the diamond layer is 3~15 μm.
7. a kind of preparation method of composite coating layer cutter as described in claim 1, it is characterised in that:Comprise the following steps:
On diamond-coated tools cvd nitride object formed nitride layer to get;The diamond-coated tools include tool matrix and
Coated in the diamond layer on tool matrix.
8. the preparation method of composite coating layer cutter according to claim 7, it is characterised in that:The diamond-coated tools
Preparation method, comprise the following steps:Tool matrix is carried out to alkali cleaning, de- cobalt, kind grain of crystallization successively, is then sunk on tool matrix
Product diamond layer to get;The tool matrix is hard alloy.
9. the preparation method of composite coating layer cutter according to claim 7, it is characterised in that:On diamond-coated tools
Before cvd nitride object, titanium shape successively on the direction away from diamond-coated tools is first deposited on diamond-coated tools
Into titanium carbide layer, titanium coating.
10. the preparation method of composite coating layer cutter according to claim 9, it is characterised in that:In diamond-coated tools
Before upper deposition titanium, first the diamond layer of diamond-coated tools is carried out successively blasting treatment, Glow Discharge Cleaning and from
Son etching.
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