CN108008567A - Colored filter substrate and preparation method thereof - Google Patents
Colored filter substrate and preparation method thereof Download PDFInfo
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- CN108008567A CN108008567A CN201711342737.1A CN201711342737A CN108008567A CN 108008567 A CN108008567 A CN 108008567A CN 201711342737 A CN201711342737 A CN 201711342737A CN 108008567 A CN108008567 A CN 108008567A
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- color blocking
- unit
- spacer material
- material unit
- layer
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
Abstract
The present invention provides a kind of colored filter substrate and preparation method thereof.The production method of the colored filter substrate of the present invention makes chromatic filter layer using halftone mask processing procedure, cylindrical spacer is made during chromatic filter layer is made, the manufacturing process that cylindrical spacer is fabricated separately together can be saved, the photoresist and light shield for making cylindrical spacer are saved, so as to reduce production cost；Further, since the production method simplifies the preparation process of colored filter substrate, so as to improve production efficiency, production production capacity is improved.The colored filter substrate of the present invention makes cylindrical spacer by the way of color blocking layer is stacked, cylindrical spacer is formed with chromatic filter layer in same processing procedure, so as to simplify the preparation process of colored filter substrate, reduce production cost, and production efficiency is improved, improves production production capacity.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of colored filter substrate and preparation method thereof.
Background technology
With the development of display technology, the plane such as liquid crystal display (Liquid Crystal Display, LCD) display dress
Put because having the advantages that high image quality, power saving, fuselage are thin, radiationless, and be widely used in mobile phone, TV, individual digital and help
The various consumption electronic products such as reason, digital camera, laptop, desktop computer, become the mainstream in display device.
Liquid crystal display major part on existing market is backlight liquid crystal display, it includes housing, in housing
Liquid crystal display panel and the backlight module (Backlight module) in housing.
Traditional liquid crystal display panel is by one sheet of film transistor (TFT) array substrate (Thin Film Transistor
Array Substrate, TFT Array Substrate) and a piece of colored filter substrate (Color Filter
Substrate, CF Substrate) fitting forms, pixel electrode and common electrical are formed in TFT substrate and CF substrates respectively
Pole, and liquid crystal is poured between TFT substrate and CF substrates, its operation principle is by being applied between pixel electrode and public electrode
Add driving voltage, the rotation of the liquid crystal molecule in liquid crystal layer is controlled using the electric field formed between pixel electrode and public electrode
Turn, the light of backlight module is reflected into generation picture.
Colored filter substrate is essential key component in liquid crystal display panel, existing colored filter substrate
Preparation process be usually：Black matrix" (BM) → red green blue (R/G/B) color blocking unit → public electrode (ITO) → column every
Underbed (PS), since the red, green, blue color blocking unit is respectively necessary for preparing using one of manufacturing process, the black matrix", public affairs
Common electrode, cylindrical spacer are respectively necessary for preparing using one of manufacturing process, therefore the preparation process of colored filter substrate is led to
6 manufacturing process are often needed altogether, if by main spacer material (Main PS) and time spacer material (Sub PS) point when making cylindrical spacer
Making is opened, then also needs to one of manufacturing process of increase, 7 manufacturing process is needed altogether, since processing procedure quantity is more, so as to cause coloured silk
The production cost of colo(u)r filter substrate is higher.
The content of the invention
It is an object of the invention to provide a kind of production method of colored filter substrate, colorized optical filtering chip base can be simplified
The preparation process of plate, reduces production cost, and improves production efficiency, improves production production capacity.
The present invention also aims to provide a kind of colored filter substrate, making technology is simple, and production cost is low.
To achieve the above object, the present invention provides a kind of production method of colored filter substrate, includes the following steps：
Step 1, provide underlay substrate, black matrix" is formed on the underlay substrate, the black matrix" is in the lining
Spaced several sub-pixel areas are crossed on substrate, several sub-pixel areas include the first sub-pixel area, the second sub- picture
Plain area, the 3rd sub-pixel area；
Step 2, form chromatic filter layer on the underlay substrate, is formed and is located at during chromatic filter layer is made
Cylindrical spacer on black matrix"；
The chromatic filter layer includes the first color blocking unit in the first sub-pixel area, in the second sub-pixel area
The second color blocking unit, the 3rd color blocking unit in the 3rd sub-pixel area；
The cylindrical spacer is by one layer in the first spacer material unit, the second spacer material unit, the 3rd spacer material unit
Or multiple-layer stacked is formed；
The first color blocking unit and the first spacer material unit are formed by the first color blocking layer；The second color blocking unit with
Second spacer material unit is formed by the second color blocking layer；The 3rd color blocking unit and the 3rd spacer material unit are by the 3rd color blocking
Layer is formed；
Step 3, deposition electrically conducting transparent is thin on the underlay substrate, chromatic filter layer, black matrix", cylindrical spacer
Film, forms public electrode on the underlay substrate, chromatic filter layer and the black matrix" and positioned at the column dottle pin
Transparency conducting layer on thing, the public electrode are disconnected with transparency conducting layer and are not attached to.
Preferably, the cylindrical spacer by the first spacer material unit, the second spacer material unit, the 3rd spacer material unit from
Under supreme be sequentially overlapped to be formed.
Specifically, the step 2 includes：
Step 21, form the first color blocking layer on the underlay substrate and black matrix", using the first halftone mask pair
First color blocking layer is exposed, develops, and the first color blocking unit in the first sub-pixel area is made, positioned at black matrix"
On the first spacer material unit, the first color blocking unit and the first spacer material unit form by the first color blocking layer, and described
The height of first spacer material unit is more than the height of the first color blocking unit；
Step 22, form second on the underlay substrate, black matrix", the first color blocking unit, the first spacer material unit
Color blocking layer, is exposed second color blocking layer using the second halftone mask, develops, and is made in the second sub-pixel area
The second color blocking unit, the second spacer material unit on the first spacer material unit；
The second color blocking unit and the second spacer material unit are formed by the second color blocking layer, and the second spacer material list
The height of member is more than the height of the second color blocking unit；
Step 23, in the underlay substrate, black matrix", the first color blocking unit, the second color blocking unit, the second spacer material list
The 3rd color blocking layer is formed in member, the 3rd color blocking layer is exposed using the 3rd halftone mask, is developed, is made positioned at the
The 3rd color blocking unit in three sub-pixel areas, the 3rd spacer material unit on the second spacer material unit, the 3rd color blocking
Unit and the 3rd spacer material unit are formed by the 3rd color blocking layer, and the height of the 3rd spacer material unit is more than the described 3rd
The height of color blocking unit；
The first spacer material unit, the second spacer material unit, the 3rd spacer material unit being sequentially overlapped on black matrix" are total to
With composition cylindrical spacer；
The first color blocking unit, the second color blocking unit, the 3rd color blocking unit collectively form chromatic filter layer.
Specifically, the material of first color blocking layer is negativity photoresist；
First halftone mask is equipped with the first open area corresponding to the first color blocking unit with corresponding to first
Second open area of spacer material unit, the light transmittance of second open area are more than the printing opacity of first open area
Rate；
The material of second color blocking layer is negativity photoresist；
Second halftone mask is equipped with the 3rd open area corresponding to the second color blocking unit with corresponding to second
4th open area of spacer material unit, the light transmittance of the 4th open area are more than the printing opacity of the 3rd open area
Rate；
The material of 3rd color blocking layer is negativity photoresist；
3rd halftone mask is equipped with the 5th open area corresponding to the 3rd color blocking unit with corresponding to the 3rd
6th open area of spacer material unit, the light transmittance of the 6th open area are more than the printing opacity of the 5th open area
Rate.
Specifically, frontal projected area of the second spacer material unit on black matrix" is more than the first spacer material list
Member, frontal projected area of the 3rd spacer material unit on black matrix", and the second spacer material unit is on black matrix"
Orthographic projection edge beyond the first spacer material unit, one section of orthographic projection edge of the 3rd spacer material unit on black matrix" away from
From.
Based on the production method of above-mentioned colored filter substrate, the present invention also provides a kind of colored filter substrate, including：
Underlay substrate, the chromatic filter layer on the underlay substrate and black matrix", the column on the black matrix" every
Underbed, the public electrode on the underlay substrate, chromatic filter layer and black matrix", at the top of the cylindrical spacer
Transparency conducting layer；The public electrode is disconnected with transparency conducting layer and is not attached to；
The black matrix" crosses spaced several sub-pixel areas, several sub-pixels on the underlay substrate
Area includes the first sub-pixel area, the second sub-pixel area, the 3rd sub-pixel area；
The chromatic filter layer includes the first color blocking unit in the first sub-pixel area, in the second sub-pixel area
The second color blocking unit, the 3rd color blocking unit in the 3rd sub-pixel area；
The cylindrical spacer is by one layer in the first spacer material unit, the second spacer material unit, the 3rd spacer material unit
Or multiple-layer stacked is formed；
The first color blocking unit and the first spacer material unit are formed by the first color blocking layer；The second color blocking unit with
Second spacer material unit is formed by the second color blocking layer；The 3rd color blocking unit and the 3rd spacer material unit are by the 3rd color blocking
Layer is formed.
Preferably, the cylindrical spacer by the first spacer material unit, the second spacer material unit, the 3rd spacer material unit from
Under supreme be sequentially overlapped to be formed.
Specifically, the height of the first spacer material unit is more than the height of the first color blocking unit；Described second every
The height of underbed unit is more than the height of the second color blocking unit；The height of the 3rd spacer material unit is more than the described 3rd
The height of color blocking unit.
Specifically, frontal projected area of the second spacer material unit on black matrix" is more than the first spacer material list
Member, frontal projected area of the 3rd spacer material unit on black matrix", and the second spacer material unit is on black matrix"
Orthographic projection edge beyond the first spacer material unit, one section of orthographic projection edge of the 3rd spacer material unit on black matrix" away from
From.
Specifically, the thickness of the cylindrical spacer is 4 μm~10 μm；The thickness of the public electrode and transparency conducting layer
For 0.1 μm~0.2 μm.
Beneficial effects of the present invention：The present invention colored filter substrate production method using halftone mask processing procedure come
Chromatic filter layer is made, cylindrical spacer is made during chromatic filter layer is made, can save and column is fabricated separately together
The manufacturing process of shape spacer material, saves the photoresist and light shield for making cylindrical spacer, so as to reduce production cost；Separately
Outside, since the production method simplifies the preparation process of colored filter substrate, so as to improve production efficiency, production is improved
Production capacity.The colored filter substrate of the present invention makes cylindrical spacer by the way of color blocking layer is stacked so that column dottle pin
Thing can be formed with chromatic filter layer in same processing procedure, so as to simplify the preparation process of colored filter substrate, reduce production
Cost, and production efficiency is improved, improve production production capacity.
In order to be further understood that the feature of the present invention and technology contents, refer to below in connection with the detailed of the present invention
Illustrate and attached drawing, however attached drawing only provide with reference to and explanation use, be not used for being any limitation as the present invention.
Brief description of the drawings
Below in conjunction with the accompanying drawings, by the way that the embodiment of the present invention is described in detail, technical scheme will be made
And other beneficial effects are apparent.
In attached drawing,
Fig. 1 is the flow chart of the production method of the colored filter substrate of the present invention；
Fig. 2 is the schematic diagram of the step 1 of the production method of the colored filter substrate of the present invention；
Fig. 3 and Fig. 5 is the schematic diagram of the step 21 of the production method of the colored filter substrate of the present invention；
Fig. 4 is the structure diagram of the first halftone mask；
Fig. 6 and Fig. 8 is the schematic diagram of the step 22 of the production method of the colored filter substrate of the present invention；
Fig. 7 is the structure diagram of the second halftone mask；
Fig. 9 and Figure 11 is the schematic diagram of the step 23 of the production method of the colored filter substrate of the present invention；
Figure 10 is the structure diagram of the 3rd halftone mask；
Figure 12 is schematic diagram and the colored filter of the present invention of the step 3 of the production method of the colored filter substrate of the present invention
The structure diagram of mating plate substrate.
Embodiment
Further to illustrate the technological means and its effect of the invention taken, below in conjunction with being preferable to carry out for the present invention
Example and its attached drawing are described in detail.
Referring to Fig. 1, the present invention provides a kind of production method of colored filter substrate, include the following steps：
Step 1, as shown in Figure 2, there is provided underlay substrate 10, on the underlay substrate 10 formed black matrix" 20, it is described
Black matrix" 20 crosses spaced several sub-pixel areas on the underlay substrate 10, and several sub-pixel areas include the
One sub-pixel area 11, the second sub-pixel area 12, the 3rd sub-pixel area 13.
Specifically, the preparation method of the black matrix" 20 is：Black photoresist is provided, on the underlay substrate 10
Painting black photoresist, is exposed the black photoresist using light shield, develops, and black matrix" 20 is made.
Step 2, as shown in figure 11, the formation chromatic filter layer 30 on the underlay substrate 10, in making chromatic filter layer
The cylindrical spacer 40 on black matrix" 20 is formed during 30；
The chromatic filter layer 30 includes the first color blocking unit 31 in the first sub-pixel area 11, positioned at the second sub- picture
The second color blocking unit 32, the 3rd color blocking unit 33 in the 3rd sub-pixel area 13 in plain area 12；
The cylindrical spacer 40 is by the first spacer material unit 41, the second spacer material unit 42, the 3rd spacer material unit 43
In one layer or multiple-layer stacked formed；
The first color blocking unit 31 is formed with the first spacer material unit 41 by the first color blocking layer 51；Second color blocking
Unit 32 is formed with the second spacer material unit 42 by the second color blocking layer 52；The 3rd color blocking unit 33 and the 3rd spacer material list
Member 43 is formed by the 3rd color blocking layer 53.
Preferably, the cylindrical spacer 40 is by the first spacer material unit 41, the second spacer material unit 42, the 3rd spacer material
Unit 43 is sequentially overlapped to be formed from bottom to up.At this time, the step 2 includes：
Step 21, as shown in Fig. 3 and Fig. 5, form the first color blocking layer 51 on the underlay substrate 10 and black matrix" 20,
First color blocking layer 51 is exposed using the first halftone mask 61, is developed, is made in the first sub-pixel area 11
The first color blocking unit 31, the first spacer material unit 41 on black matrix" 20, the first color blocking unit 31 and first
Spacer material unit 41 is formed by the first color blocking layer 51, and the height of the first spacer material unit 41 is more than first color blocking
The height of unit 31.
Specifically, the material of first color blocking layer 51 is negativity photoresist.
Specifically, as shown in figure 4, first halftone mask 61 is equipped with first corresponding to the first color blocking unit 31
Open area 611 with corresponding to the first spacer material unit 41 the second open area 612, second open area 612 it is saturating
Light rate is more than the light transmittance of first open area 611.
Preferably, the light transmittance of second open area 612 is 100%, the light transmittance of first open area 611
For 50%.
Step 22, as shown in Fig. 6 and Fig. 8, in the underlay substrate 10, black matrix" 20, the first color blocking unit 31, first
The second color blocking layer 52 is formed on spacer material unit 41, second color blocking layer 52 is exposed using the second halftone mask 62
Light, development, are made the second color blocking unit 32 being located in the second sub-pixel area 12, second on the first spacer material unit 41
Spacer material unit 42, the second color blocking unit 32 are formed with the second spacer material unit 42 by the second color blocking layer 52, and described
The height of second spacer material unit 42 is more than the height of the second color blocking unit 32.
Specifically, the material of second color blocking layer 52 is negativity photoresist.
Specifically, as shown in fig. 7, second halftone mask 62 is equipped with the 3rd corresponding to the second color blocking unit 32
Open area 623 with corresponding to the second spacer material unit 42 the 4th open area 624, the 4th open area 624 it is saturating
Light rate is more than the light transmittance of the 3rd open area 623.
Preferably, the light transmittance of the 4th open area 624 is 100%, the light transmittance of the 3rd open area 623
For 50%.
Step 23, as shown in Figures 9 and 11, in the underlay substrate 10, black matrix" 20, the first color blocking unit 31,
The 3rd color blocking layer 53 is formed on two color blocking units 32, the second spacer material unit 42, using the 3rd halftone mask 63 to described the
Three color blocking layers 53 are exposed, develop, and the 3rd color blocking unit 33 in the 3rd sub-pixel area 13 are made, positioned at the second dottle pin
The 3rd spacer material unit 43 on thing unit 42, the 3rd color blocking unit 33 and the 3rd spacer material unit 43 are by the 3rd color blocking
Layer 53 is formed, and the height of the 3rd spacer material unit 43 is more than the height of the 3rd color blocking unit 33；
The first spacer material unit 41, the second spacer material unit 42, the 3rd spacer material being sequentially overlapped on black matrix" 20
Unit 43 collectively forms cylindrical spacer 40；
The first color blocking unit 31, the second color blocking unit 32, the 3rd color blocking unit 33 collectively form chromatic filter layer 30.
Specifically, the material of the 3rd color blocking layer 53 is negativity photoresist.
Specifically, as shown in Figure 10, the 3rd halftone mask 63 is equipped with the corresponding to the 3rd color blocking unit 33
Five open areas 635 and the 6th open area 636 corresponding to the 3rd spacer material unit 43, the 6th open area 636
Light transmittance is more than the light transmittance of the 5th open area 635.
Preferably, the light transmittance of the 6th open area 636 is 100%, the light transmittance of the 5th open area 635
For 50%.
Specifically, the thickness of the cylindrical spacer 40 is 4 μm~10 μm.
Specifically, step 21, step 22 and the step 23 are exposed using ultraviolet light.
Preferably, 42 frontal projected area on black matrix" 20 of the second spacer material unit slightly larger than described first every
The frontal projected area of underbed unit 41, the 3rd spacer material unit 43 on black matrix" 20, and the second spacer material unit 42
Orthographic projection edge on black matrix" 20 is beyond the first spacer material unit 41, the 3rd spacer material unit 43 in black matrix"
Orthographic projection edge a distance on 20.This structure design can make cylindrical spacer 40 obtain precipitous taper angles, ensure
Subsequently when chromatic filter layer 30, black matrix" 20 on cylindrical spacer 40 with depositing transparent conductive film 70, what is obtained is located at
Transparency conducting layer 72 on the cylindrical spacer 40 is with being located at the underlay substrate 10, chromatic filter layer 30 and black matrix" 20
On public electrode 71 disconnect and being not attached to, after such colored filter substrate and TFT substrate are to bit combination, positioned at the column
Transparency conducting layer 72 on spacer material 40 will not connect the public electrode 71 in the circuit and colored filter substrate in TFT substrate
It is connected together, so as to avoid causing short circuit.
Preferably, 42 frontal projected area on black matrix" 20 of the second spacer material unit is 10 μm of 10 μ m, institute
State the first spacer material unit 41, frontal projected area of the 3rd spacer material unit 43 on black matrix" 20 is 8 μm of 8 μ m.
Step 3, as shown in figure 12, deposited on the chromatic filter layer 30, black matrix" 20, cylindrical spacer 40 transparent
Conductive film 70, formed public electrode 71 on the underlay substrate 10, chromatic filter layer 30 and black matrix" 20 and
Transparency conducting layer 72 on the cylindrical spacer 40, the public electrode 71 are disconnected with transparency conducting layer 72 and are not attached to.
Specifically, the material of the transparent conductive film 70 is ITO (tin indium oxide), i.e., described public electrode 71 with it is transparent
The material of conductive layer 72 is ITO.
Specifically, the thickness of the transparent conductive film 70 be 0.1 μm~0.2 μm, i.e., described public electrode 71 with it is transparent
The thickness of conductive layer 72 is 0.1 μm~0.2 μm.
Since the thickness of the cylindrical spacer 40 is larger so that the transparent conductive film 70 be distributed in the column every
Form larger difference in height between the region and other regions of the top of underbed 40, and due to the cylindrical spacer 40 have to
Second spacer material unit 42 of surrounding protrusion, so that with precipitous taper angles, above structure design can effectively be separated transparent
Conductive layer 72 and public electrode 71, prevent the two to be connected.
Specifically, first color blocking layer 51, the second color blocking layer 52, the 3rd color blocking layer 53 are red color resistance layer, green color
The arbitrary arrangement combination of resistance layer, blue color blocking layer.Optionally, first color blocking layer 51, the second color blocking layer 52, the 3rd color blocking layer
53 be respectively red color resistance layer, green color blocking layer, blue color blocking layer.
The production method of above-mentioned colored filter substrate makes chromatic filter layer 30 using halftone mask processing procedure, is making
Make that cylindrical spacer 40 is made during chromatic filter layer 30, the technique that cylindrical spacer 40 is fabricated separately together can be saved
Processing procedure, saves the photoresist and light shield for making cylindrical spacer 40, so as to reduce production cost；Further, since the making side
Method simplifies the preparation process of colored filter substrate, so as to improve production efficiency, improves production production capacity.
2 are please referred to Fig.1, based on the production method of above-mentioned colored filter substrate, the present invention also provides a kind of colorized optical filtering
Plate base, including：Underlay substrate 10, the chromatic filter layer 30 on the underlay substrate 10 and black matrix" 20, arranged on institute
State cylindrical spacer 40 on black matrix" 20, on the underlay substrate 10, chromatic filter layer 30 and black matrix" 20
Public electrode 71, the transparency conducting layer 72 arranged on the top of cylindrical spacer 40；The public electrode 71 and transparency conducting layer
72 disconnections are not attached to；
The black matrix" 20 crosses spaced several sub-pixel areas, several sons on the underlay substrate 10
Pixel region includes the first sub-pixel area 11, the second sub-pixel area 12, the 3rd sub-pixel area 13；
The chromatic filter layer 30 includes the first color blocking unit 31 in the first sub-pixel area 11, positioned at the second sub- picture
The second color blocking unit 32, the 3rd color blocking unit 33 in the 3rd sub-pixel area 13 in plain area 12；
The cylindrical spacer 40 is by the first spacer material unit 41, the second spacer material unit 42, the 3rd spacer material unit 43
In one layer or multiple-layer stacked formed；
The first color blocking unit 31 is formed with the first spacer material unit 41 by the first color blocking layer 51；Second color blocking
Unit 32 is formed with the second spacer material unit 42 by the second color blocking layer 52；The 3rd color blocking unit 33 and the 3rd spacer material list
Member 43 is formed by the 3rd color blocking layer 53.
Preferably, the cylindrical spacer 40 is by the first spacer material unit 41, the second spacer material unit 42, the 3rd spacer material
Unit 43 is sequentially overlapped to be formed from bottom to up.
Specifically, the height of the first spacer material unit 41 is more than the height of the first color blocking unit 31；Described
The height of two spacer material units 42 is more than the height of the second color blocking unit 32；The height of the 3rd spacer material unit 43 is big
In the height of the 3rd color blocking unit 33.
Specifically, 42 frontal projected area on black matrix" 20 of the second spacer material unit slightly larger than described first every
The frontal projected area of underbed unit 41, the 3rd spacer material unit 43 on black matrix" 20, and the second spacer material unit 42
Orthographic projection edge on black matrix" 20 is beyond the first spacer material unit 41, the 3rd spacer material unit 43 in black matrix"
Orthographic projection edge a distance on 20.
Preferably, 42 frontal projected area on black matrix" 20 of the second spacer material unit is 10 μm of 10 μ m, institute
State the first spacer material unit 41, frontal projected area of the 3rd spacer material unit 43 on black matrix" 20 is 8 μm of 8 μ m.
Specifically, the thickness of the cylindrical spacer 40 is 4 μm~10 μm.
Specifically, the material of the public electrode 71 and transparency conducting layer 72 is ITO.
Specifically, the thickness of the public electrode 71 and transparency conducting layer 72 is 0.1 μm~0.2 μm.
Specifically, first color blocking layer 51, the second color blocking layer 52, the material of the 3rd color blocking layer 53 are negativity photoresist material
Material.
Specifically, first color blocking layer 51, the second color blocking layer 52, the 3rd color blocking layer 53 are red color resistance layer, green color
The arbitrary arrangement combination of resistance layer, blue color blocking layer.Optionally, first color blocking layer 51, the second color blocking layer 52, the 3rd color blocking layer
53 be respectively red color resistance layer, green color blocking layer, blue color blocking layer.
Above-mentioned colored filter substrate makes cylindrical spacer 40 by the way of color blocking layer is stacked so that column dottle pin
Thing 40 can be formed with chromatic filter layer 30 in same processing procedure, so as to simplify the preparation process of colored filter substrate, be reduced
Production cost, and production efficiency is improved, improve production production capacity.
In conclusion the present invention provides a kind of colored filter substrate and preparation method thereof.The colored filter of the present invention
The production method of substrate makes chromatic filter layer using halftone mask processing procedure, is made during chromatic filter layer is made
Cylindrical spacer, can save the manufacturing process that cylindrical spacer is fabricated separately together, save the light for making cylindrical spacer
Material and light shield are hindered, so as to reduce production cost；Further, since the production method simplifies the preparation work of colored filter substrate
Skill, so as to improve production efficiency, improves production production capacity.The colored filter substrate of the present invention is using the side for stacking color blocking layer
Formula makes cylindrical spacer so that cylindrical spacer can be formed with chromatic filter layer in same processing procedure, so as to simplify color
The preparation process of colo(u)r filter substrate, reduces production cost, and improves production efficiency, improves production production capacity.
The above, for those of ordinary skill in the art, can be with technique according to the invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claims in the present invention
Protection domain.
Claims (10)
1. a kind of production method of colored filter substrate, it is characterised in that include the following steps：
Step 1, provide underlay substrate (10), and black matrix" (20), the black matrix" are formed on the underlay substrate (10)
(20) spaced several sub-pixel areas are crossed on the underlay substrate (10), several sub-pixel areas include the first son
Pixel region (11), the second sub-pixel area (12), the 3rd sub-pixel area (13)；
Step 2, form chromatic filter layer (30) on the underlay substrate (10), during chromatic filter layer (30) is made
Form the cylindrical spacer (40) on black matrix" (20)；
The chromatic filter layer (30) includes the first color blocking unit (31) in the first sub-pixel area (11), positioned at the second son
The second color blocking unit (32), the 3rd color blocking unit (33) in the 3rd sub-pixel area (13) in pixel region (12)；
The cylindrical spacer (40) is by the first spacer material unit (41), the second spacer material unit (42), the 3rd spacer material unit
(43) one layer in or multiple-layer stacked are formed；
The first color blocking unit (31) is formed with the first spacer material unit (41) by the first color blocking layer (51)；Second color
Unit (32) is hindered to form by the second color blocking layer (52) with the second spacer material unit (42)；The 3rd color blocking unit (33) and the
Three spacer material units (43) are formed by the 3rd color blocking layer (53)；
Step 3, deposit in the underlay substrate (10), chromatic filter layer (30), black matrix" (20), cylindrical spacer on (40)
Transparent conductive film (70), forms positioned at the underlay substrate (10), chromatic filter layer (30) and the public affairs on black matrix" (20)
Common electrode (71) and the transparency conducting layer (72) on the cylindrical spacer (40), the public electrode (71) with it is transparent
Conductive layer (72) is disconnected and is not attached to.
2. the production method of colored filter substrate as claimed in claim 1, it is characterised in that the cylindrical spacer (40)
Shape is sequentially overlapped by the first spacer material unit (41), the second spacer material unit (42), the 3rd spacer material unit (43) from bottom to up
Into.
3. the production method of colored filter substrate as claimed in claim 2, it is characterised in that the step 2 includes：
Step 21, form the first color blocking layer (51) on the underlay substrate (10) and black matrix" (20), using the first half colors
Light regulating hood (61) is exposed first color blocking layer (51), develops, and is made first in the first sub-pixel area (11)
Color blocking unit (31), the first spacer material unit (41) on black matrix" (20), the first color blocking unit (31) and the
One spacer material unit (41) is formed by the first color blocking layer (51), and the height of the first spacer material unit (41) is more than described
The height of first color blocking unit (31)；
Step 22, in the underlay substrate (10), black matrix" (20), the first color blocking unit (31), the first spacer material unit
(41) the second color blocking layer (52) is formed on, second color blocking layer (52) is exposed using the second halftone mask (62),
Development, is made the second color blocking unit (32) in the second sub-pixel area (12), on the first spacer material unit (41)
Second spacer material unit (42)；
The second color blocking unit (32) is formed with the second spacer material unit (42) by the second color blocking layer (52), and described second
The height of spacer material unit (42) is more than the height of the second color blocking unit (32)；
Step 23, the underlay substrate (10), black matrix" (20), the first color blocking unit (31), the second color blocking unit (32),
The 3rd color blocking layer (53) is formed on second spacer material unit (42), using the 3rd halftone mask (63) to the 3rd color blocking layer
(53) it is exposed, develops, the 3rd color blocking unit (33) in the 3rd sub-pixel area (13) is made, positioned at the second spacer material
The 3rd spacer material unit (43) on unit (42), the 3rd color blocking unit (33) and the 3rd spacer material unit (43) are by the
Three color blocking layers (53) are formed, and the height of the 3rd spacer material unit (43) is more than the height of the 3rd color blocking unit (33)
Degree；
The first spacer material unit (41), the second spacer material unit (42), the 3rd dottle pin being sequentially overlapped on black matrix" (20)
Thing unit (43) collectively forms cylindrical spacer (40)；
The first color blocking unit (31), the second color blocking unit (32), the 3rd color blocking unit (33) collectively form chromatic filter layer
(30)。
4. the production method of colored filter substrate as claimed in claim 3, it is characterised in that first color blocking layer (51)
Material be negativity photoresist；
First halftone mask (61) be equipped with corresponding to the first color blocking unit (31) the first open area (611) with it is right
Institute should be more than in the second open area (612) of the first spacer material unit (41), the light transmittance of second open area (612)
State the light transmittance of the first open area (611)；
The material of second color blocking layer (52) is negativity photoresist；
Second halftone mask (62) be equipped with corresponding to the second color blocking unit (32) the 3rd open area (623) with it is right
Institute should be more than in the 4th open area (624) of the second spacer material unit (42), the light transmittance of the 4th open area (624)
State the light transmittance of the 3rd open area (623)；
The material of 3rd color blocking layer (53) is negativity photoresist；
3rd halftone mask (63) be equipped with corresponding to the 3rd color blocking unit (33) the 5th open area (635) with it is right
6th open area (636) of tri- spacer material units (43) of Ying Yu, the light transmittance of the 6th open area (636) are more than institute
State the light transmittance of the 5th open area (635).
5. the production method of colored filter substrate as claimed in claim 2, it is characterised in that the second spacer material unit
(42) frontal projected area on black matrix" (20) is more than the first spacer material unit (41), the 3rd spacer material unit (43)
Frontal projected area on black matrix" (20), and orthographic projection of the second spacer material unit (42) on black matrix" (20)
Edge is beyond the first spacer material unit (41), orthographic projection edge of the 3rd spacer material unit (43) on black matrix" (20)
A distance.
A kind of 6. colored filter substrate, it is characterised in that including：Underlay substrate (10), on the underlay substrate (10)
Chromatic filter layer (30) and black matrix" (20), the cylindrical spacer (40) on the black matrix" (20), arranged on institute
State public electrode (71) on underlay substrate (10), chromatic filter layer (30) and black matrix" (20), arranged on the column dottle pin
Transparency conducting layer (72) at the top of thing (40)；The public electrode (71) disconnects with transparency conducting layer (72) and being not attached to；
The black matrix" (20) crosses spaced several sub-pixel areas, several sons on the underlay substrate (10)
Pixel region includes the first sub-pixel area (11), the second sub-pixel area (12), the 3rd sub-pixel area (13)；
The chromatic filter layer (30) includes the first color blocking unit (31) in the first sub-pixel area (11), positioned at the second son
The second color blocking unit (32), the 3rd color blocking unit (33) in the 3rd sub-pixel area (13) in pixel region (12)；
The cylindrical spacer (40) is by the first spacer material unit (41), the second spacer material unit (42), the 3rd spacer material unit
(43) one layer in or multiple-layer stacked are formed；
The first color blocking unit (31) is formed with the first spacer material unit (41) by the first color blocking layer (51)；Second color
Unit (32) is hindered to form by the second color blocking layer (52) with the second spacer material unit (42)；The 3rd color blocking unit (33) and the
Three spacer material units (43) are formed by the 3rd color blocking layer (53).
7. colored filter substrate as claimed in claim 6, it is characterised in that the cylindrical spacer (40) is by the first dottle pin
Thing unit (41), the second spacer material unit (42), the 3rd spacer material unit (43) are sequentially overlapped to be formed from bottom to up.
8. colored filter substrate as claimed in claim 7, it is characterised in that the height of the first spacer material unit (41)
More than the height of the first color blocking unit (31)；The height of the second spacer material unit (42) is more than the second color blocking list
The height of first (32)；The height of the 3rd spacer material unit (43) is more than the height of the 3rd color blocking unit (33).
9. colored filter substrate as claimed in claim 7, it is characterised in that the second spacer material unit (42) is in black
Frontal projected area on matrix (20) is more than the first spacer material unit (41), the 3rd spacer material unit (43) in black matrix"
(20) frontal projected area on, and orthographic projection edge of the second spacer material unit (42) on black matrix" (20) exceeds institute
State the first spacer material unit (41), the orthographic projection edge a distance of the 3rd spacer material unit (43) on black matrix" (20).
10. colored filter substrate as claimed in claim 7, it is characterised in that the thickness of the cylindrical spacer (40) is 4
μm~10 μm；The thickness of the public electrode (71) and transparency conducting layer (72) is 0.1 μm~0.2 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711342737.1A CN108008567A (en) | 2017-12-14 | 2017-12-14 | Colored filter substrate and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711342737.1A CN108008567A (en) | 2017-12-14 | 2017-12-14 | Colored filter substrate and preparation method thereof |
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| CN201711342737.1A Pending CN108008567A (en) | 2017-12-14 | 2017-12-14 | Colored filter substrate and preparation method thereof |
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| CN108919557A (en) * | 2018-08-31 | 2018-11-30 | 深圳市华星光电技术有限公司 | The production method of colored optical filtering substrates |
| CN109254448A (en) * | 2018-11-15 | 2019-01-22 | 成都中电熊猫显示科技有限公司 | Color membrane substrates and liquid crystal display panel |
| CN110082963A (en) * | 2019-04-04 | 2019-08-02 | 深圳市华星光电技术有限公司 | Preparation method, liquid crystal display panel and the display device of liquid crystal display panel |
| CN110297353A (en) * | 2019-05-06 | 2019-10-01 | 惠科股份有限公司 | Color membrane substrates and preparation method thereof, display device |
| WO2019227663A1 (en) * | 2018-05-29 | 2019-12-05 | 深圳市华星光电技术有限公司 | Liquid crystal panel, liquid crystal display and electronic device |
| WO2020062452A1 (en) * | 2018-09-30 | 2020-04-02 | 惠科股份有限公司 | Display panel and display |
| WO2020062491A1 (en) * | 2018-09-30 | 2020-04-02 | 惠科股份有限公司 | Color filter and display panel |
| CN111123588A (en) * | 2020-02-16 | 2020-05-08 | 南京中电熊猫平板显示科技有限公司 | Color film substrate and manufacturing method thereof |
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| CN115118858A (en) * | 2022-06-24 | 2022-09-27 | 维沃移动通信有限公司 | Image sensor, image acquisition method and device, electronic equipment and storage medium |
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| CN111638607A (en) * | 2020-06-11 | 2020-09-08 | 武汉华星光电技术有限公司 | Narrow-frame display panel and preparation method thereof |
| CN115118858A (en) * | 2022-06-24 | 2022-09-27 | 维沃移动通信有限公司 | Image sensor, image acquisition method and device, electronic equipment and storage medium |
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Application publication date: 20180508 |