CN103091905A - Color film substrate and manufacturing method thereof - Google Patents
Color film substrate and manufacturing method thereof Download PDFInfo
- Publication number
- CN103091905A CN103091905A CN2011103379302A CN201110337930A CN103091905A CN 103091905 A CN103091905 A CN 103091905A CN 2011103379302 A CN2011103379302 A CN 2011103379302A CN 201110337930 A CN201110337930 A CN 201110337930A CN 103091905 A CN103091905 A CN 103091905A
- Authority
- CN
- China
- Prior art keywords
- layer
- colour element
- element layer
- chock insulator
- insulator matter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention relates to the technical field of thin film transistor liquid crystal displays, in particular to a color film substrate and a manufacturing method thereof. The color film substrate comprises a substrate, black matrixes formed on the substrate and a color pixel layer positioned above the substrate, the color pixel layer comprises a first color pixel layer, a second color pixel layer, a third color pixel layer and a spacer, the spacer comprises at least two or more spacing layers, and each spacing layer is identical with one color pixel layer in material. The spacer comprises at least two or more spacing layers, and each spacing layer is identical with one color pixel layer in material and can be formed with the color pixel layer simultaneously, so that the number of using a mask plate can be reduced furthest. The color film substrate has the advantages of simple manufacturing process, low manufacturing cost and the like.
Description
Technical field
The present invention relates to the Thin Film Transistor-LCD technical field, particularly a kind of color membrane substrates and preparation method thereof.
Background technology
TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Transistor-LCD) is the main flow of present flat-panel screens, its have low in energy consumption, cost is relatively low and the advantage such as substantially radiationless.The TFT-LCD panel is formed box by color membrane substrates and array base palte, and keeps the thickness of liquid crystal cell by chock insulator matter.
As shown in Figure 1, be the side view of prior art color film substrate structure.This color membrane substrates comprises glass substrate 10, black matrix 11, pixel layer, photoetching chock insulator matter 15 and protective seam 16.the method for making of the photoetching chock insulator matter 15 in existing color membrane substrates usually adopts and at first form black matrix 11 on glass substrate 10, then form successively red pixel layer 12 on the glass substrate 10 that forms black matrix 11, green pixel layer 13, blue pixel layer 14 and protective seam 16, after waiting to complete above-mentioned processing step, need one mask of extra increase to re-start cleaning, gluing, solidify, photoetching, the series of process flow processs such as development just form photoetching chock insulator matter 15, and should only have one deck by the extra photoetching chock insulator matter that forms, its number of plies and elastic parameter are more fixing.Could form because chock insulator matter of the prior art needs one mask of extra use to carry out corresponding technological process to it, cause the making flow and method more complicated of chock insulator matter, and increased the production cost of liquid crystal display.
Summary of the invention
The technical matters that (one) will solve
The technical problem to be solved in the present invention is to provide a kind of color membrane substrates and preparation method thereof, to overcome the high problem of complex manufacturing technology, cost of manufacture that needs one mask of extra increase to carry out separately the technique making and bring.
(2) technical scheme
In order to address the above problem, one aspect of the present invention provides a kind of color membrane substrates, comprise: substrate, at the black matrix that forms on described substrate, be positioned at the colour element layer above substrate, described colour element layer comprises the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter, it is characterized in that, described chock insulator matter comprises two or more dottle pin layers, and each dottle pin layer is identical with a kind of material of described colour element layer.
Further, described chock insulator matter is arranged on the top of described black matrix.
Further, be connected with adjacent colour element layer with the contacted dottle pin layer of black matrix.
Further, described chock insulator matter is positioned at the middle part of black matrix.
Further, described chock insulator matter thickness is 2.0～4.0 μ m.
Further, also comprise protective seam, be covered on the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter.
Further, the thickness of described protective seam is 2.0-3.0 μ m.
On the other hand, the present invention also provides a kind of method for making of above-mentioned color membrane substrates, comprises the steps:
Step S1, form black Matrix Pattern on substrate;
Step S2, form the dottle pin layer of the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter on the substrate of completing steps S1, and each dottle pin layer of chock insulator matter is that colour element layer with respective color forms simultaneously.
Further, be coated with protective seam on the substrate of completing steps S2, and it is cured.
(3) beneficial effect
Color membrane substrates provided by the invention and preparation method thereof, described chock insulator matter comprises two or more dottle pin layers, each dottle pin layer is identical with a kind of material of described colour element layer, can form simultaneously with the colour element layer, thereby can farthest reduce the number of times that uses mask, has manufacture craft simple, the advantage such as cost of manufacture is lower.
Description of drawings
Fig. 1 is prior art color film substrate structure side view;
Fig. 2 is embodiment of the present invention color membrane substrates side view;
Fig. 3 is embodiment of the present invention color membrane substrates vertical view;
Fig. 4 is the process flow diagram of embodiment of the present invention color membrane substrates method for making.
Wherein: 10, glass substrate; 11, black matrix; 12, red pixel layer; 13, green pixel layer; 14, blue pixel layer; 15, photoetching chock insulator matter; 16, protective seam; 17, red pixel dottle pin layer; 18, green pixel dottle pin layer; 19, blue pixel dottle pin layer.
Embodiment
Below in conjunction with drawings and Examples, the specific embodiment of the present invention is described in further detail.Following examples are used for explanation the present invention, but are not used for limiting the scope of the invention.
As shown in Fig. 2-3, the color membrane substrates that the embodiment of the present invention provides, comprise: glass substrate 10, at the black matrix 11 that forms on glass substrate 10 be positioned at colour element layer above substrate, this colour element layer comprises red pixel layer 12, green pixel layer 13 and blue pixel layer 14, also comprise, protective seam 16 and chock insulator matter, this protective seam is positioned at the top layer of color membrane substrates; Chock insulator matter is between black matrix 11 and protective seam 16.Wherein, chock insulator matter comprises two or more dottle pin layers, and each dottle pin layer is identical with a kind of material of described colour element layer.
Wherein, can form red pixel dottle pin layer 17 by the technological process that forms red pixel layer 12, can form green pixel dottle pin layer 18 by the technological process that forms green pixel layer 13, can form blue pixel dottle pin layer 19 by the technological process that forms blue pixel layer 14, this dottle pin layer successively longitudinal arrangement above black matrix 11.The numbers of plies different by the dottle pin layer can realize the thickness that chock insulator matter is different, and can obtain by the thickness of adjusting each layer chock insulator matter chock insulator matter support performance and elasticity recovery characteristics preferably.The number of plies of concrete chock insulator matter can be decided according to the thickness requirement of actual chock insulator matter.Usually the thickness of each colour element layer and individual layer chock insulator matter is 1.0-3.0 μ m.
In order to obtain preferably the support performance of chock insulator matter, chock insulator matter is positioned at the middle part of black matrix.The chock insulator matter that setting is positioned at black matrix 11 ground floors is connected with adjacent colour element layer, further strengthens supporting capacity and the stability of chock insulator matter.The cross section structure of overlooking that this chock insulator matter is set is polygon or circle.
In order to obtain preferably the elasticity recovery characteristics of chock insulator matter, the thickness of every layer of chock insulator matter is greater than the thickness of black matrix, and more preferably, the thickness of multilayer chock insulator matter should be 2-4 times of black matrix thickness, and can suitably adjust the density in the chock insulator matter inches.The side cross-sectional structure that this chock insulator matter is set is approximate trapezoid.
As shown in Figure 4, the process of color membrane substrates of the present invention comprises the steps:
Step S1, form black Matrix Pattern on substrate;
Specifically comprise: form black matrix layer by processes such as coating photoresist, physical sputtering or chemogenic deposits on glass substrate, have formation metal or resin black matrix on the glass substrate of black matrix layer by exposure, development and etching technics.
Step S2, form the dottle pin layer of the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter on the substrate of completing steps S1, and each dottle pin layer of chock insulator matter is that colour element layer with respective color forms simultaneously.Specifically comprise: coating red pixel photoresist on the substrate of completing steps S1, by forming the red pixel figure after exposure, developing process, the red pixel figure that will be positioned at simultaneously black Matrix Pattern top forms red pixel dottle pin layer by half GTG exposure technique, be specially, the difference of the light light transmission capacity by controlling half gray-tone mask plate is adjusted the thickness of the photoresist rete of half exposure region.Can adopt above-mentioned identical method to form successively green pixel figure and green pixel dottle pin layer and blue pixel figure and blue pixel dottle pin layer.Chock insulator matter is more than two-layer or two-layer in red pixel dottle pin layer, green pixel dottle pin layer and blue pixel dottle pin layer, and it is all enumerated in the top of black matrix.The number of plies of concrete chock insulator matter can be decided according to the thickness requirement of actual chock insulator matter.Usually the thickness of each colour element figure and individual layer chock insulator matter is 1.0-3.0 μ m.
Step S3, be coated with protective seam on the substrate of completing steps S2, and it is cured.Wherein, protective seam adopts resin material to make usually, and its thickness is 2.0-3.0 μ m.
Color membrane substrates provided by the invention and preparation method thereof, described chock insulator matter comprises two or more dottle pin layers, each dottle pin layer is identical with a kind of material of described colour element layer, can form simultaneously with the colour element layer, thereby can farthest reduce the number of times that uses mask, has manufacture craft simple, the advantage such as cost of manufacture is lower.
Above embodiment only is used for explanation the present invention; and be not limitation of the present invention; the those of ordinary skill in relevant technologies field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (9)
1. color membrane substrates, comprise: substrate, at the black matrix that forms on described substrate, be positioned at the colour element layer above substrate, described colour element layer comprises the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter, it is characterized in that, described chock insulator matter comprises two or more dottle pin layers, and each dottle pin layer is identical with a kind of material of described colour element layer.
2. color membrane substrates as claimed in claim 1, is characterized in that, described chock insulator matter is arranged on the top of described black matrix.
3. color membrane substrates as claimed in claim 1, is characterized in that, is connected with adjacent colour element layer with the contacted dottle pin layer of black matrix.
4. color membrane substrates as claimed in claim 2, is characterized in that, described chock insulator matter is positioned at the middle part of black matrix.
5. color membrane substrates as claimed in claim 4, is characterized in that, described chock insulator matter thickness is 2.0～4.0 μ m.
6. color membrane substrates as claimed in claim 1, is characterized in that, also comprises protective seam, is covered on the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter.
7. color membrane substrates as claimed in claim 1, is characterized in that, the thickness of described protective seam is 2.0-3.0 μ m.
8. the method for making as the described color membrane substrates of claim 1-7, is characterized in that, comprises the steps:
Step S1, form black Matrix Pattern on substrate;
Step S2, form the dottle pin layer of the first colour element layer, the second colour element layer, the 3rd colour element layer and chock insulator matter on the substrate of completing steps S1, and each dottle pin layer of chock insulator matter is that colour element layer with respective color forms simultaneously.
9. the method for making of color membrane substrates as claimed in claim 8, is characterized in that, is coated with protective seam on the substrate of completing steps S2, and it is cured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103379302A CN103091905A (en) | 2011-10-31 | 2011-10-31 | Color film substrate and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103379302A CN103091905A (en) | 2011-10-31 | 2011-10-31 | Color film substrate and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103091905A true CN103091905A (en) | 2013-05-08 |
Family
ID=48204670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103379302A Pending CN103091905A (en) | 2011-10-31 | 2011-10-31 | Color film substrate and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103091905A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105158962A (en) * | 2015-08-24 | 2015-12-16 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
| CN105974642A (en) * | 2016-06-27 | 2016-09-28 | 京东方科技集团股份有限公司 | Color filter substrate, preparation method thereof and display panel |
| CN106292042A (en) * | 2015-05-29 | 2017-01-04 | 鸿富锦精密工业（深圳）有限公司 | Colored filter substrate and manufacture method thereof |
| CN107065314A (en) * | 2017-03-03 | 2017-08-18 | 京东方科技集团股份有限公司 | Spacer material and preparation method thereof, display panel |
| CN108008567A (en) * | 2017-12-14 | 2018-05-08 | 深圳市华星光电技术有限公司 | Colored filter substrate and preparation method thereof |
| CN108919557A (en) * | 2018-08-31 | 2018-11-30 | 深圳市华星光电技术有限公司 | The production method of colored optical filtering substrates |
| CN112198706A (en) * | 2020-10-28 | 2021-01-08 | 武汉华星光电技术有限公司 | Color film substrate, manufacturing method thereof and display panel |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07318950A (en) * | 1994-05-27 | 1995-12-08 | Sony Corp | Formation of spacer of electro-optic display cell |
| CN1530706A (en) * | 2003-03-17 | 2004-09-22 | 统宝光电股份有限公司 | Masking external frame structure of liquid-crystal displaying panel and producing method thereof |
| US20100165266A1 (en) * | 2007-06-11 | 2010-07-01 | Tohru Sakata | Production method of color filter substrate, production method of liquid crystal display device, color filter substrate, and liquid crystal display device |
| CN101889221A (en) * | 2007-12-07 | 2010-11-17 | 大日本印刷株式会社 | Color filter and method for producing color filter |
| CN102109628A (en) * | 2011-01-28 | 2011-06-29 | 深圳市华星光电技术有限公司 | Structure of CF (color filter) and manufacture method thereof |
| CN102135678A (en) * | 2010-01-21 | 2011-07-27 | 京东方科技集团股份有限公司 | Color filter and manufacturing method thereof, and liquid crystal display device |
-
2011
- 2011-10-31 CN CN2011103379302A patent/CN103091905A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07318950A (en) * | 1994-05-27 | 1995-12-08 | Sony Corp | Formation of spacer of electro-optic display cell |
| CN1530706A (en) * | 2003-03-17 | 2004-09-22 | 统宝光电股份有限公司 | Masking external frame structure of liquid-crystal displaying panel and producing method thereof |
| US20100165266A1 (en) * | 2007-06-11 | 2010-07-01 | Tohru Sakata | Production method of color filter substrate, production method of liquid crystal display device, color filter substrate, and liquid crystal display device |
| CN101889221A (en) * | 2007-12-07 | 2010-11-17 | 大日本印刷株式会社 | Color filter and method for producing color filter |
| CN102135678A (en) * | 2010-01-21 | 2011-07-27 | 京东方科技集团股份有限公司 | Color filter and manufacturing method thereof, and liquid crystal display device |
| CN102109628A (en) * | 2011-01-28 | 2011-06-29 | 深圳市华星光电技术有限公司 | Structure of CF (color filter) and manufacture method thereof |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106292042A (en) * | 2015-05-29 | 2017-01-04 | 鸿富锦精密工业（深圳）有限公司 | Colored filter substrate and manufacture method thereof |
| CN105158962A (en) * | 2015-08-24 | 2015-12-16 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
| WO2017031771A1 (en) * | 2015-08-24 | 2017-03-02 | 武汉华星光电技术有限公司 | Color filter and method for manufacture thereof |
| CN105974642A (en) * | 2016-06-27 | 2016-09-28 | 京东方科技集团股份有限公司 | Color filter substrate, preparation method thereof and display panel |
| CN107065314A (en) * | 2017-03-03 | 2017-08-18 | 京东方科技集团股份有限公司 | Spacer material and preparation method thereof, display panel |
| CN108008567A (en) * | 2017-12-14 | 2018-05-08 | 深圳市华星光电技术有限公司 | Colored filter substrate and preparation method thereof |
| CN108919557A (en) * | 2018-08-31 | 2018-11-30 | 深圳市华星光电技术有限公司 | The production method of colored optical filtering substrates |
| CN112198706A (en) * | 2020-10-28 | 2021-01-08 | 武汉华星光电技术有限公司 | Color film substrate, manufacturing method thereof and display panel |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103091905A (en) | Color film substrate and manufacturing method thereof | |
| CN102681246B (en) | Color film substrate, method for manufacturing same and liquid crystal display | |
| CN102681067B (en) | Color filter and preparation method thereof | |
| US9696594B2 (en) | Display substrate and fabricating method thereof, and display device | |
| US10634958B1 (en) | Manufacturing method of black photo spacer array substrate and black photo spacer array substrate | |
| US7616274B2 (en) | Color filter substrate comprising spacers, black matrix, and protrusions made of the same material and method of manufacturing the same | |
| KR101578692B1 (en) | Color filter array of liquid crystal display device and method for fabricating the same | |
| EP2525250B1 (en) | Color filter substrate and method of manufacturing the same | |
| CN101840100A (en) | Liquid crystal display device and manufacture method of color film substrate thereof | |
| CN102981202B (en) | A kind of method for making of colored filter | |
| CN100445836C (en) | Liquid crystal display panel and array base plate and method for manufacturing same | |
| CN103487971A (en) | Color film substrate, touch display device and method for manufacturing color film substrate | |
| CN104330926A (en) | Display substrate as well as manufacturing method and display panel | |
| CN103033981A (en) | Color filter substrate and manufacturing method thereof as well as liquid crystal panel | |
| CN102269834A (en) | Color optical filter and manufacturing method thereof | |
| US9116297B2 (en) | Color filter substrate, manufacturing method thereof and liquid crystal panel | |
| WO2015027594A1 (en) | Colour film substrate and preparation method therefor, and display device | |
| CN110596936A (en) | Color film substrate and manufacturing method thereof | |
| WO2015113386A1 (en) | Display substrate and manufacturing method therefor, method for driving display substrate, and display apparatus | |
| CN101364014A (en) | Liquid crystal display panel and method for manufacturing same | |
| WO2019075900A1 (en) | Liquid crystal display panel and fabrication method therefor | |
| US20130021688A1 (en) | Color filter and manufacturing method thereof | |
| CN202306065U (en) | Liquid crystal display (LCD) and color film substrate thereof | |
| CN108196421B (en) | Method for manufacturing gray-scale mask | |
| CN101373300A (en) | TFT LCD color film substrate structure and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20130508 |