CN107001246B - 作为光聚合物用书写单体的萘基丙烯酸酯 - Google Patents

作为光聚合物用书写单体的萘基丙烯酸酯 Download PDF

Info

Publication number
CN107001246B
CN107001246B CN201580067579.6A CN201580067579A CN107001246B CN 107001246 B CN107001246 B CN 107001246B CN 201580067579 A CN201580067579 A CN 201580067579A CN 107001246 B CN107001246 B CN 107001246B
Authority
CN
China
Prior art keywords
diyl
binaphthyl
bis
oxy
oxycarbonyliminoethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201580067579.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN107001246A (zh
Inventor
T.罗勒
H.贝尔内特
F-K.布鲁德
D.黑内尔
S.科施特罗迈
T.法伊克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Covestro Deutschland AG
Original Assignee
Covestro Deutschland AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Covestro Deutschland AG filed Critical Covestro Deutschland AG
Publication of CN107001246A publication Critical patent/CN107001246A/zh
Application granted granted Critical
Publication of CN107001246B publication Critical patent/CN107001246B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
    • C07C271/30—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a six-membered aromatic ring being part of a condensed ring system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/40—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings
    • C07C271/42—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/48—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of six-membered aromatic rings with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
    • C07C323/43—Y being a hetero atom
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/52—Amides or imides
    • C08F20/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/733—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/0208—Individual components other than the hologram
    • G03H2001/022—Writing means other than actinic light wave
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Holo Graphy (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN201580067579.6A 2014-12-12 2015-12-09 作为光聚合物用书写单体的萘基丙烯酸酯 Active CN107001246B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP14197565.6 2014-12-12
EP14197565 2014-12-12
EP15173157 2015-06-22
EP15173157.7 2015-06-22
PCT/EP2015/079152 WO2016091965A1 (de) 2014-12-12 2015-12-09 Naphthylacrylate als schreibmonomere für photopolymere

Publications (2)

Publication Number Publication Date
CN107001246A CN107001246A (zh) 2017-08-01
CN107001246B true CN107001246B (zh) 2021-02-02

Family

ID=54843835

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201580067579.6A Active CN107001246B (zh) 2014-12-12 2015-12-09 作为光聚合物用书写单体的萘基丙烯酸酯

Country Status (7)

Country Link
US (1) US10241402B2 (ja)
EP (1) EP3230261B1 (ja)
JP (1) JP6700280B2 (ja)
KR (1) KR102583200B1 (ja)
CN (1) CN107001246B (ja)
TW (1) TWI679189B (ja)
WO (1) WO2016091965A1 (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107223121B (zh) * 2014-12-19 2020-10-27 科思创德国股份有限公司 湿稳定的全息介质
EP3622352A1 (de) 2017-05-09 2020-03-18 Covestro Deutschland AG System aus zwei trocken übertragbaren uv-härtenden lackschichten für den schutz eines hologramms in einem photopolymer-folienverbund
EP3401910A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
CN110603589B (zh) * 2017-05-09 2021-11-16 科思创德国股份有限公司 含全息曝光的光致聚合物层和高耐受性涂料层的全息介质
TW201906882A (zh) * 2017-05-09 2019-02-16 德商科思創德意志股份有限公司 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構
EP3401909A1 (de) 2017-05-09 2018-11-14 Covestro Deutschland AG Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US11313048B2 (en) 2019-06-27 2022-04-26 Prc-Desoto International, Inc. Addition polymer for electrodepositable coating compositions
US11485874B2 (en) 2019-06-27 2022-11-01 Prc-Desoto International, Inc. Addition polymer for electrodepositable coating compositions
US11274167B2 (en) * 2019-06-27 2022-03-15 Prc-Desoto International, Inc. Carbamate functional monomers and polymers and use thereof
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
US20220153693A1 (en) * 2020-11-13 2022-05-19 Facebook Technologies, Llc Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings
CN115386046A (zh) * 2021-05-24 2022-11-25 华为技术有限公司 全息记录介质、全息高分子材料及其制备方法、显示设备
WO2024052256A1 (de) 2022-09-07 2024-03-14 Covestro Deutschland Ag Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1666294A (zh) * 2002-05-29 2005-09-07 英法塞技术公司 含有铝盐化合物和不对称丙烯酸酯化合物的全息数据存储介质

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4576998A (en) * 1984-12-07 1986-03-18 The Dow Chemical Company Vinyl urethane composite polymer containing vinyl terminated urethane oligomers
EP0389067B1 (en) 1985-11-20 1994-10-19 The Mead Corporation Ionic dye compounds
US4965152A (en) * 1988-01-15 1990-10-23 E. I. Du Pont De Nemours And Company Holographic notch filters
US5153237A (en) * 1991-09-09 1992-10-06 Isp Investments Inc. Radiation curable propenyl ether resins
GB9618604D0 (en) * 1996-09-06 1996-10-16 Dow Deutschland Inc Thermoset resins based on epoxy vinyl ester and urethane vinyl ester resins mixtures
WO2004077511A2 (en) * 2003-02-24 2004-09-10 The Regents Of The University Of Colorado (meth)acrylic and (meth)acrylamide monomers, polymerizable compositions, and polymers obtained
JP5076414B2 (ja) * 2005-11-29 2012-11-21 Ｊｎｃ株式会社 重合性の光学活性化合物およびその組成物
TW200920785A (en) * 2007-09-06 2009-05-16 Nippon Paint Co Ltd Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium
US20090174919A1 (en) 2007-12-28 2009-07-09 Gaylord Moss Directed illumination diffraction optics auto-stereo display
JP2009185192A (ja) * 2008-02-07 2009-08-20 Dic Corp 硬化性樹脂組成物、アルカリ現像型感光性樹脂組成物、これらの硬化物、ビニルエステル樹脂、及び酸基含有ビニルエステル樹脂
JP5402266B2 (ja) * 2008-06-10 2014-01-29 三菱化学株式会社 光反応性組成物、光学材料、ホログラム記録層形成用組成物、ホログラム記録材料およびホログラム記録媒体
ATE493383T1 (de) * 2008-08-08 2011-01-15 Bayer Materialscience Ag Phenylisocyanat-basierte urethanacrylate mit hohem brechungsindex
BRPI0914464A2 (pt) * 2008-10-22 2015-10-27 3M Innovative Properties Co "composição dentária endurecível, artigos dentários e monômero bifenil di(met)acrilato"
WO2010095475A1 (ja) * 2009-02-18 2010-08-26 Dic株式会社 （メタ）アクリレート樹脂、その製造方法、硬化性樹脂組成物、その硬化物、及びプラスチックレンズ
EP2496549B1 (de) * 2009-11-03 2014-10-08 Bayer Intellectual Property GmbH Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung
JP5638085B2 (ja) * 2009-11-03 2014-12-10 バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ 異なった書込コモノマーを含有する感光性ポリマー組成物
PL2317511T3 (pl) * 2009-11-03 2012-08-31 Bayer Materialscience Ag Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv
US8771903B2 (en) * 2009-11-03 2014-07-08 Bayer Materialscience Ag Method for producing a holographic film
WO2011091550A1 (en) * 2010-01-28 2011-08-04 Bayer Materialscience Ag High speed dvds
EP2354845B1 (de) * 2010-02-02 2015-12-23 Covestro Deutschland AG Photopolymer-Formulierung zur Herstellung holographischer Medien
JP6023592B2 (ja) * 2010-02-02 2016-11-09 バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ トリアジン系書込モノマー含有感光性ポリマー組成物
TWI541224B (zh) * 2010-08-11 2016-07-11 拜耳材料科學股份有限公司 雙官能基之（甲基）丙烯酸酯之寫入單體
EP2431786A1 (de) 2010-09-17 2012-03-21 Bayer MaterialScience AG Autostereoskopisches 3D-Display
EP2450893A1 (de) 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
JP2013014533A (ja) * 2011-07-02 2013-01-24 Kawasaki Kasei Chem Ltd 縮合多環芳香族骨格を有するウレタン（メタ）アクリレート化合物及び連鎖移動剤並びにこれを用いたポリマー
TWI664447B (zh) 2014-02-18 2019-07-01 德商拜耳材料科學股份有限公司 使用全像光學元件之裸視３ｄ顯示裝置
CN106232651B (zh) * 2014-04-25 2019-08-13 科思创德国股份有限公司 作为全息光聚合物组合物中的书写单体的芳族二醇醚
CN107223121B (zh) * 2014-12-19 2020-10-27 科思创德国股份有限公司 湿稳定的全息介质

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1666294A (zh) * 2002-05-29 2005-09-07 英法塞技术公司 含有铝盐化合物和不对称丙烯酸酯化合物的全息数据存储介质

Also Published As

Publication number Publication date
US10241402B2 (en) 2019-03-26
JP6700280B2 (ja) 2020-05-27
CN107001246A (zh) 2017-08-01
EP3230261B1 (de) 2018-09-05
KR20170094201A (ko) 2017-08-17
EP3230261A1 (de) 2017-10-18
KR102583200B1 (ko) 2023-09-27
TW201639812A (zh) 2016-11-16
US20170363957A1 (en) 2017-12-21
WO2016091965A1 (de) 2016-06-16
JP2018501224A (ja) 2018-01-18
TWI679189B (zh) 2019-12-11

Similar Documents

Publication Publication Date Title
CN107001246B (zh) 作为光聚合物用书写单体的萘基丙烯酸酯
US9804490B2 (en) Holographic media with improved light sensitivity
KR101727769B1 (ko) 홀로그래피 필름의 제조 방법
KR102003564B1 (ko) 보호 층 및 노출된 광중합체 층을 포함하는 적층 구조물
KR101804591B1 (ko) 에스테르-기재 기록 단량체를 갖는 광중합체 배합물
CN107223121B (zh) 湿稳定的全息介质
US20190263761A1 (en) Substituted triazines and a method for producing same
US20140255824A1 (en) Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations
KR20150123852A (ko) 아크릴레이트계 보호성 광택제 및 접착제
TW201406871A (zh) 用於光聚合物之新穎光起始劑
CN106575079B (zh) 包含光聚合物层和基底层的层结构
TW201710405A (zh) 含有經鏈取代之花青染料的全像媒體
TW201335211A (zh) 於以聚胺甲酸酯為基底之光聚合物配製物中之含硫鏈轉移劑

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant