CN106601776A - Flexible amoled display panel - Google Patents
Flexible amoled display panel Download PDFInfo
- Publication number
- CN106601776A CN106601776A CN201611216204.4A CN201611216204A CN106601776A CN 106601776 A CN106601776 A CN 106601776A CN 201611216204 A CN201611216204 A CN 201611216204A CN 106601776 A CN106601776 A CN 106601776A
- Authority
- CN
- China
- Prior art keywords
- layer
- amoled display
- insulating film
- interlayer insulating
- display floaters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
Abstract
The present invention provides a flexible AMOLED display panel in which a hollow structure extending downwardly through at least the interlayered insulation layer is formed, starting from the interlayered insulation layer in a region other than the TFT structure; the hollow structure is filled with a planarization layer. Through the utilization of the organic materials in the planarization layer to replace the inorganic materials of the interlayered insulation layer, the gate electrode insulation layer and the buffering layer, it is possible to improve the stress performance of the flexible AMOLED display panel and prevent the breakage and come-off of a screen when the screen is bended; in addition, since the hollow structure is arranged in a region other than the TFT structure, the insulation effect among the gate electrode, the source electrode and the drain electrode in the TFT structure is not compromised.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of flexible AMOLED display floaters.
Background technology
Flat panel display device has many merits such as thin fuselage, power saving, radiationless, is widely used.It is existing
Flat panel display device mainly includes liquid crystal display device (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
Display device (Organic Light Emitting Display, OLED).
Organic light emitting diodde desplay device due to being provided simultaneously with self-luminous, be not required to backlight, contrast height, thickness of thin,
Visual angle is wide, response speed is fast, can be used for flexibility panel, using the excellent specific property such as wide temperature range, construction and processing procedure be simpler,
It is considered as the emerging application technology of flat-panel screens of future generation.OLED display can be divided into passive square according to type of drive
Formation OLED (Passive Matrix OLED, PMOLED) and active array type OLED (Active Matrix OLED,
AMOLED) two big class, i.e. direct addressin and thin film transistor (TFT) (Thin Film Transistor, the TFT) class of matrix addressing two.Its
In, AMOLED has the pixel in array arrangement, belongs to active display type, and luminous efficacy is high, excellent performance.
OLED display is generally included:Substrate, the anode on substrate, the organic luminous layer on anode, with
And the negative electrode on organic luminous layer.Launch from the hole of anode and the electricity from negative electrode to organic luminous layer during work
These electronics and hole combination are produced excitability electron-hole pair by son, and excitability electron-hole pair is turned from excited state
It is changed to ground state to realize lighting.
Flexible Displays are a big characteristics of OLED display, and the flexible flexible display apparatus of changeable type can give user
Bring subversive experience.But current flexible display technologies are ripe not enough, existing flexible display panels are in order to anti-
Produce electric leakage, it will usually which the first metal is set between source electrode only in the grid and second metal layer in the first metal layer and drain electrode
Thickness of insulating layer between layer and second metal layer is bigger than the thickness of other insulating barriers, so results in answering for the insulating barrier
Power performance is also worse, in screen-bending, it is easier to fracture occurs and the bad phenomenon such as come off, in turn results in the bad of product.
The content of the invention
Object of the present invention is to provide a kind of flexible AMOLED display floaters, can improve flexible AMOLED display surfaces
, there is fracture and the bad phenomenon for coming off in the stress performance of plate when preventing screen-bending.
For achieving the above object, the invention provides a kind of flexible AMOLED display floaters, including:Flexible substrate, covering
The cushion of the flexible substrate, the TFT layer on the cushion, the planarization layer on the TFT layer, located at institute
State the anode on planarization layer, the pixel defining layer on the anode, on the anode and by the pixel definition
Organic luminous layer and the negative electrode on the organic luminous layer and pixel defining layer that layer is surrounded;
The TFT layer includes:Semiconductor layer, the covering semiconductor layer and cushion on the cushion
Gate insulator, the grid on the gate insulator on the semiconductor layer, located at the grid and gate insulator
On interlayer insulating film, the source electrode that is spaced apart on the interlayer insulating film and drain electrode;
The semiconductor layer, grid, source electrode and drain electrode are collectively forming TFT structure;
Region beyond TFT structure, starts down to be formed with exhausted at least through the interlayer from the interlayer insulating film
Planarization layer is filled with the engraved structure of edge layer, the engraved structure.
The engraved structure is through the interlayer insulating film and gate insulator.
The engraved structure runs through the interlayer insulating film, gate insulator and cushion.
The flexible substrate includes:First organic polymer layers, the inorganic insulation for covering first organic polymer layers
Layer, the second organic polymer layers for covering the inorganic insulation layer.
The material of the planarization layer is transparent with machine material.
The material of the interlayer insulating film and gate insulator is the combination of the one or both in SiOx and SiNx.
The material of the semiconductor layer is low temperature polycrystalline silicon.
The source electrode and drain electrode are respectively by two vias on the interlayer insulating film and gate insulator and institute
State two end in contact of semiconductor layer.
The anode is by the via and the drain contact through the planarization layer.
The material of the grid, source electrode and drain electrode is one or more in copper, molybdenum and aluminum of combination.
Beneficial effects of the present invention:The invention provides a kind of flexible AMOLED display floaters, the flexible AMOLED shows
Region of the panel beyond TFT structure starts down to be formed with least through the interlayer insulating film from the interlayer insulating film
Engraved structure is simultaneously filled with planarization layer in engraved structure, and using the organic material of planarization layer interlayer insulating film, grid are replaced
The inorganic material of pole insulating barrier and cushion, can improve the stress performance of flexible AMOLED display floaters, prevent screen curved
Occur fracture and the bad phenomenon for coming off when bent, and engraved structure is arranged at the region beyond TFT structure, does not affect TFT structure
Insulation effect between middle grid and source electrode and drain electrode.
Description of the drawings
In order to be able to be further understood that the feature and technology contents of the present invention, refer to below in connection with the detailed of the present invention
Illustrate and accompanying drawing, but accompanying drawing only provides with reference to and illustrates to use, not for being any limitation as to the present invention.
In accompanying drawing,
Fig. 1 is the structure chart of the first embodiment of the flexible AMOLED display floaters of the present invention;
Fig. 2 is the structure chart of the second embodiment of the flexible AMOLED display floaters of the present invention;
Fig. 3 is the structure chart of the 3rd embodiment of the flexible AMOLED display floaters of the present invention.
Specific embodiment
Further to illustrate the technological means taken of the invention and its effect, below in conjunction with being preferable to carry out for the present invention
Example and its accompanying drawing are described in detail.
Fig. 1 is referred to, Fig. 1 is the schematic diagram of the first embodiment of the flexible AMOLED display floaters of the present invention, concrete bag
Include:Flexible substrate 1, the cushion 2 for covering the flexible substrate 1, the TFT layer 3 on the cushion 2, located at the TFT
Planarization layer 4, the anode 5 on the planarization layer 4 on layer 3, the pixel defining layer 6 on the anode 5, it is located at
The organic luminous layer 7 that surrounds on the anode 5 and by the pixel defining layer 6 and located at the organic luminous layer 7 and picture
Negative electrode 8 on plain definition layer 6.
Specifically, the TFT layer 3 includes:Semiconductor layer 31, the covering semiconductor layer on the cushion 2
31 and the gate insulator 32 of cushion 2, the grid 33 on the gate insulator 32 on the semiconductor layer 31, it is located at
Interlayer insulating film 34 on the grid 33 and gate insulator 32, the source being spaced apart on the interlayer insulating film 34
Pole 35 and drain electrode 36.
Further, the semiconductor layer 31, grid 33, source electrode 35 and drain electrode 36 is collectively forming TFT structure.
Emphasis, the region beyond TFT structure, the interlayer insulating film 34 has engraved structure 37, the hollow out
Planarization layer 4 is filled with structure 37.
Specifically, the source electrode 35 and drain electrode 36 are respectively by through the interlayer insulating film 34 and gate insulator 32
On two vias and the semiconductor layer 31 two end in contact.The anode 5 is by the via through the planarization layer 4 and institute
State drain electrode 36 to contact.
It should be noted that the material of the interlayer insulating film 34 is inorganic material, such as silicon oxide (SiOx) and nitridation
The combination of the one or both in silicon (SiNx), in prior art interlayer insulating film be a monolithic inorganic thin film, its stress
Can be poor, in screen-bending, it is easy to fracture occur or come off, cause display floater to occur bad, the present invention is by TFT
The interlayer insulating film 34 in the region beyond structure carries out hollow processing, forms engraved structure, is then filled into planarization layer 4 and engraves
In hollow structure, the material of planarization layer 4 is, transparent with machine material, with preferable elasticity and pliability, can be released with relatively good
Stress is put, by forming engraved structure 37 and filling planarization layer 4 wherein the stress performance of interlayer insulating film 34 can be improved,
Prevent its occur in screen-bending rupture or come off it is bad, and then lifted flexibility AMOLED display floaters quality, fully
Play the advantage of the Flexible Displays of OLED display panel.
Specifically, the flexible substrate 1 is mutually overlapped with inorganic thin film using organic polymer thin film and formed, wherein, nothing
Machine thin film has high-k, and good barrier effect is played in high-insulativity, to external world environment isolation, but is existed larger
Mechanical stress problem, for organic polymer films, there is preferably elasticity and pliability, can be with relatively good release stress, but it hinders
It is poor every the ability of external environment, and utilize organic polymer thin film mutually to overlap with inorganic thin film, can both reach obstruct and protect
Shield, can eliminate influencing each other for stress between each protection coating materials again.Preferably, the flexible substrate 1 includes:First organic polymer
Nitride layer 11, the inorganic insulation layer 12 for covering first organic polymer layers 11, the second of the covering inorganic insulation layer 12 have
Machine polymeric layer 13.Wherein, the material of the organic polymer layers 13 of first organic polymer layers 11 and second is polyamides
Imines (Polyimide, PI), the material of the inorganic insulation layer 12 is SiNx.Meanwhile, it is covered in second organic polymer
The material of the cushion 2 on layer 13 is the combination of the one or both in SiOx and SiNx, further eliminates each protection coating materials
Between stress influence each other, can also prevent the impurity from diffusing up from flexible substrate 1, affect the performance of TFT layer 3.
Preferably, the material of the gate insulator 32 is the combination of the one or both in SiOx and SiNx, described half
The material of conductor layer 31 be low temperature polycrystalline silicon (Low Temperature Poly-silicon, LTPS), the grid 33, source electrode
35 and the material of drain electrode 36 be one or more of combination in copper, molybdenum and aluminum.
It is understood that as shown in FIG. 2 and 3, in second and the 3rd embodiment of the present invention, the hollow out knot
Structure 37 also continues to down extend, for example in a second embodiment shown in figure 2 the engraved structure to extend not only through the interlayer exhausted
Edge layer 34 is also simultaneously through the gate insulator 32 of the lower section of the interlayer insulating film 34, the institute in the 3rd embodiment shown in Fig. 3
Engraved structure is stated then while having run through interlayer insulating film 34, gate insulator 32 and cushion 2, this change will not shadow
Ring the realization of the present invention.
In sum, the invention provides a kind of flexible AMOLED display floaters, the flexible AMOLED display floaters are in TFT
Region beyond structure starts down to be formed with least through the engraved structure of the interlayer insulating film from the interlayer insulating film
And in engraved structure be filled with planarization layer, using planarization layer organic material replace interlayer insulating film, gate insulator,
And the inorganic material of cushion, the stress performance of flexible AMOLED display floaters can be improved, occur when preventing screen-bending
Fracture and the bad phenomenon that comes off, and engraved structure is arranged at the region beyond TFT structure, do not affect in TFT structure grid with
Insulation effect between source electrode and drain electrode.
The above, for the person of ordinary skill of the art, can be with technology according to the present invention scheme and technology
Other various corresponding changes and deformation are made in design, and all these changes and deformation should all belong to the claims in the present invention
Protection domain.
Claims (10)
1. a kind of flexible AMOLED display floaters, it is characterised in that include:Flexible substrate (1), the covering flexible substrate (1)
Cushion (2), the TFT layer (3) on the cushion (2), the planarization layer (4) on the TFT layer (3), set
Anode (5) on the planarization layer (4), the pixel defining layer (6) on the anode (5), located at the anode (5)
Above and by the organic luminous layer (7) of the pixel defining layer (6) encirclement and located at the organic luminous layer (7) and pixel
Negative electrode (8) on definition layer (6);
The TFT layer (3) includes:Semiconductor layer (31) on the cushion (2), cover the semiconductor layer (31) with
And gate insulator (32), the grid on the gate insulator (32) on the semiconductor layer (31) of cushion (2)
(33) interlayer insulating film (34), on the grid (33) and gate insulator (32), located at the interlayer insulating film
(34) source electrode (35) being spaced apart on and drain electrode (36);
The semiconductor layer (31), grid (33), source electrode (35) and drain electrode (36) are collectively forming TFT structure;
Region beyond TFT structure, is down formed with exhausted at least through the interlayer from the interlayer insulating film (34) beginning
Planarization layer (4) is filled with the engraved structure (37) of edge layer (34), the engraved structure (37).
2. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the engraved structure (37) is through described
Interlayer insulating film (34) and gate insulator (32).
3. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the engraved structure (37) is through described
Interlayer insulating film (34), gate insulator (32) and cushion (2).
4. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the flexible substrate (1) includes:First
Organic polymer layers (11), the inorganic insulation layer (12) for covering first organic polymer layers (11), covering are described inorganic exhausted
Second organic polymer layers (13) of edge layer (12).
5. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the material of the planarization layer (4) is
Transparent with machine material.
6. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the interlayer insulating film (34) and described
The material of gate insulator (32) is the combination of the one or both in SiOx and SiNx.
7. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the material of the semiconductor layer (31) is
Low temperature polycrystalline silicon.
8. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the source electrode (35) and drain (36) divide
Not by two vias and the semiconductor layer (31) on the interlayer insulating film (34) and gate insulator (32)
Two end in contact.
9. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the anode (5) is by running through described
The via of planarization layer (4) is contacted with the drain electrode (36).
10. flexibility AMOLED display floaters as claimed in claim 1, it is characterised in that the grid (33), source electrode (35) and
The material of drain electrode (36) is one or more in copper, molybdenum and aluminum of combination.
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CN201611216204.4A CN106601776A (en) | 2016-12-26 | 2016-12-26 | Flexible amoled display panel |
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CN201611216204.4A CN106601776A (en) | 2016-12-26 | 2016-12-26 | Flexible amoled display panel |
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CN107146810A (en) * | 2017-06-19 | 2017-09-08 | 合肥市惠科精密模具有限公司 | A kind of flexible AMOLED display panels |
CN107658333A (en) * | 2017-10-31 | 2018-02-02 | 京东方科技集团股份有限公司 | A kind of flexible display panels and its manufacture method, flexible display apparatus |
CN108962952A (en) * | 2018-07-17 | 2018-12-07 | 京东方科技集团股份有限公司 | A kind of display panel and preparation method thereof, display device |
CN109037447A (en) * | 2018-07-24 | 2018-12-18 | 云谷(固安)科技有限公司 | Display screen and display device |
CN109065505A (en) * | 2018-08-10 | 2018-12-21 | 武汉华星光电半导体显示技术有限公司 | Display panel and its manufacturing method |
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CN109256413A (en) * | 2018-10-12 | 2019-01-22 | 云谷(固安)科技有限公司 | Flexible display panels and device |
CN109658826A (en) * | 2018-11-06 | 2019-04-19 | Oppo广东移动通信有限公司 | Flexible screen and electronic equipment |
CN109659345A (en) * | 2018-12-19 | 2019-04-19 | 武汉华星光电半导体显示技术有限公司 | Flexible OLED panel |
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