CN106526957B - Color membrane substrates and its manufacturing method, display panel - Google Patents
Color membrane substrates and its manufacturing method, display panel Download PDFInfo
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- CN106526957B CN106526957B CN201710039335.8A CN201710039335A CN106526957B CN 106526957 B CN106526957 B CN 106526957B CN 201710039335 A CN201710039335 A CN 201710039335A CN 106526957 B CN106526957 B CN 106526957B
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- spacer material
- substrate
- alignment films
- layer
- spacer
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
The invention discloses a kind of color membrane substrates and its manufacturing methods, display panel, belong to display field.The described method includes: forming color blocking layer on underlay substrate；Alignment films are formed in the color blocking layer；Spacer material is formed in the alignment films.The invention avoids the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates, ensure that the orientation effect of oriented layer, liquid crystal is arranged according to certain orientation, to ensure that the display performance of display panel.The present invention is for showing.
Description
Technical field
The present invention relates to display field, in particular to a kind of color membrane substrates and its manufacturing method, display panel.
Background technique
Thin Film Transistor-LCD (English: Thin Film Transistor Liquid Crystal
Display；It referred to as: TFT-LCD) include display panel, backlight and drive circuit board.Display panel is by array substrate and coloured silk
Ilm substrate orientation and to box after, in the intermediate Formation of liquid crystals that is added.Wherein, the purpose of orientation is to enable liquid crystal according to certain side
To arrangement.Also, in order to support array substrate and color membrane substrates not to collapse, be also formed on color membrane substrates spacer material (English:
Photo Spacer；Referred to as: PS) layer, the PS layers is also referred to as pixel wall or insulated column.
In the related technology, PS layers are first formed on the color membrane substrates manufactured, and PS is not then formed on color membrane substrates
The coating and friction (English: Rubbing) orientation process of oriented layer are carried out on the position of layer.
But due to PS layers of blocking, there can be imperfect or frictional strength very little the region that rubs on color membrane substrates,
Cause orientation effect poor, exception occurs in liquid crystal arrangement, influences the display performance of display panel.
Summary of the invention
Poor in order to solve orientation effect in the related technology, there is exception in liquid crystal arrangement, influences the display of display panel
The problem of energy, the embodiment of the invention provides a kind of color membrane substrates and its manufacturing methods, display panel.The technical solution is such as
Under:
In a first aspect, providing a kind of manufacturing method of color membrane substrates, which comprises
Color blocking layer is formed on underlay substrate；
Alignment films are formed in the color blocking layer；
Spacer material is formed in the alignment films.
It is optionally, described to form spacer material in the alignment films, comprising:
Spacer material is formed in the alignment films by the way of silk-screen printing.
It is optionally, described to form spacer material in the alignment films by the way of silk-screen printing, comprising:
Mask plate is set in the alignment films, and the side of the mask plate is fitted in the alignment films；
Spacer material material is injected into the hollowed out area of the mask plate, until the spacer material material fills the hollow out
Region；
The spacer material material of the hollowed out area is overflowed in removal；
Remove the mask plate.
It is optionally, described to form spacer material in the alignment films, comprising:
Spacer material is formed in the alignment films by the way of transfer.
It is optionally, described to form spacer material in the alignment films by the way of transfer, comprising:
Spacer material is formed on the substrate；
Substrate with spacer material is buckled in the alignment films；
Remove the substrate.
It is optionally, described that spacer material is formed on the substrate, comprising:
Spacer material is manufactured using nanometer embossing in substrate.
It is optionally, described that spacer material is manufactured using nanometer embossing in substrate, comprising:
Spacer material material layer is formed on the substrate；
The spacer material material layer is heated, the heating temperature of the spacer material material layer is greater than the spacer material material
The glass transition temperature of the bed of material；
Compacting tool set is pressed into the spacer material material layer, so that forming dottle pin article pattern in the spacer material material layer；
Cool down to the spacer material material layer；
After the temperature of the spacer material material layer is lower than the glass transition temperature, the compacting tool set is removed；
The spacer material material being formed in the low areas in the spacer material material layer of the dottle pin article pattern is removed, with sudden and violent
Expose the basal region below the low areas.
Optionally, the glass transition temperature is 105 degrees Celsius；
The temperature range of the heating temperature is 150 degrees Celsius to 230 degrees Celsius.
Second aspect, provides a kind of color membrane substrates, and color membrane substrates method as described in first aspect is fabricated.
The third aspect provides a kind of display panel, comprising: color membrane substrates described in second aspect.
Technical solution provided in an embodiment of the present invention has the benefit that
Color membrane substrates provided in an embodiment of the present invention and its manufacturing method, display panel, by before forming spacer material,
Alignment films are formed in color blocking layer, so that in forming the alignment film, spacer material will not form friction and block, relative to correlation
Technology avoids the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates, ensure that taking for oriented layer
To effect, liquid crystal is arranged according to certain orientation, to ensure that the display performance of display panel.
Detailed description of the invention
To describe the technical solutions in the embodiments of the present invention more clearly, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.
Fig. 1 is a kind of flow chart of the manufacturing method of color membrane substrates provided in an embodiment of the present invention；
Fig. 2 is a kind of structural schematic diagram formed after color blocking layer on underlay substrate provided in an embodiment of the present invention；
Fig. 3 is a kind of knot formed after alignment films on the underlay substrate for be formed with color blocking layer provided in an embodiment of the present invention
Structure schematic diagram；
Fig. 4-1 be it is provided in an embodiment of the present invention it is a kind of by the way of silk-screen printing in alignment films formed spacer material
Method flow diagram；
Fig. 4-2 is a kind of schematic top plan view being arranged after mask plate in alignment films provided in an embodiment of the present invention；
Fig. 4-3 be it is provided in an embodiment of the present invention it is a kind of on the underlay substrate for be formed with alignment films formed spacer material after
Structural schematic diagram；
Fig. 5-1 is a kind of method for forming spacer material in alignment films by the way of transfer provided in an embodiment of the present invention
Flow chart；
Fig. 5-2 is a kind of method for manufacturing spacer material using nanometer embossing in substrate provided in an embodiment of the present invention
Flow chart；
Fig. 5-3 is a kind of structural schematic diagram being formed on the substrate after spacer material material layer provided in an embodiment of the present invention；
Fig. 5-4 is a kind of structural representation being pressed into compacting tool set after spacer material material layer provided in an embodiment of the present invention
Figure；
Fig. 5-5 is the structural representation after the compacting tool set in a kind of removal spacer material material layer provided in an embodiment of the present invention
Figure；
Fig. 5-6 be it is provided in an embodiment of the present invention it is a kind of removal be formed with it is low in the spacer material material layer of dottle pin article pattern
Spacer material material in concave region, the structural schematic diagram after the spacer material being formed in substrate；
Fig. 5-7 is a kind of method for forming spacer material using exposure development technology in substrate provided in an embodiment of the present invention
Flow chart；
Fig. 5-8 be it is provided in an embodiment of the present invention it is a kind of by with spacer material substrate buckle in alignment films after knot
Structure schematic diagram；
Fig. 6-1 is a kind of flow chart of the manufacturing method of display panel provided in an embodiment of the present invention；
Fig. 6-2 is a kind of structural schematic diagram of array substrate provided in an embodiment of the present invention；
Fig. 6-3 is a kind of structural schematic diagram of display panel provided in an embodiment of the present invention.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached drawing to embodiment party of the present invention
Formula is described in further detail.
With market and client's growth requirement, requirement of the market to liquid crystal display is higher and higher, in order to be promoted and be optimized
Its display effect, liquid crystal display panel need box spacing with higher, such as: box spacing >=15 micron.But using correlation
When the manufacturing method of technology manufactures the display panel with higher box spacing (i.e. spacer material height with higher), due to every
Underbed blocks, and orientation process will receive certain influence, i.e., occurs the imperfect or friction that rubs on color membrane substrates
The region of intensity very little, causes orientation effect poor, then occurs liquid crystal arrangement abnormal, also, for twisted-nematic (English
Text: Twist Nematic；Referred to as: the TN) display panel of type, the relevant technologies can not be formed in alignment films makes liquid crystal deflection
Default inclination angle, the final display performance for influencing display panel.The manufacturing method of color membrane substrates provided in an embodiment of the present invention is led to
It crosses before forming spacer material, alignment films is formed in color blocking layer, so that in forming the alignment film, spacer material will not be to friction
Formation is blocked, it may therefore be assured that this method is suitable for the production of the display panel with higher box spacing, also, for TN
The display panel of type is also capable of forming the default inclination angle of the condition of satisfaction, and then ensure that the display performance of display panel.Fig. 1 is this
The flow chart of the manufacturing method for a kind of color membrane substrates that inventive embodiments provide, as shown in Figure 1, this method may include:
Step 101 forms color blocking layer on underlay substrate.
Step 102 forms alignment films on the underlay substrate for be formed with color blocking layer.
Step 103 forms spacer material on the underlay substrate for be formed with alignment films.
In conclusion the manufacturing method of color membrane substrates provided in an embodiment of the present invention, by inciting somebody to action before forming spacer material
Alignment films are formed in color blocking layer, so that in forming the alignment film, spacer material will not form friction and block, relative to related skill
Art avoids the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates, ensure that the orientation of oriented layer
Effect enables liquid crystal to arrange according to certain orientation, to ensure that the display performance of display panel.
Further, in a step 101, the underlay substrate can be transparent substrate, specifically can be using glass,
Quartz, transparent resin etc. have substrate made of the leaded light of certain robustness and nonmetallic materials.The color blocking layer is used to form
Colored light, the color blocking layer generally comprise Red lightscreening plate, green color filter and blue color filter.Wherein, Red lightscreening plate is only
Feux rouges is allowed to pass through, green color filter only allows green light to pass through, and blue color filter only allows blue light to pass through.Illustratively, it please refers to
Fig. 2, it illustrates the structural schematic diagrams after the formation color blocking layer 002 on underlay substrate 001.
In practical application, colored light can also be formed by other means, and the embodiment of the present invention does not do specific limit to it
It is fixed.Such as: scattering medium layer can be used and form colored light, which can be by quantum dot (English: Quantum
Dot；Referred to as: QD) material is made.
It should be noted that black matrix can also be formed with before forming color blocking layer on underlay substrate.The black matrix energy
It is enough to cover non-pixel region, so that playing prevents light leakage, improves displaying contrast for display panel, guarantee that image is aobvious
Show the effect of quality.
In a step 102, the process for alignment films being formed on the underlay substrate for be formed with color blocking layer may include: oriented layer
Coating and friction orientation technique.
Illustratively, referring to FIG. 3, it illustrates form alignment films on the underlay substrate 001 for being formed with color blocking layer 002
Structural schematic diagram after 003.Wherein, alignment films 003 can be by polyimides (English: Polyimide；Referred to as: PI) it is made.
Illustratively, magnetron sputtering, thermal evaporation or plasma enhanced chemical vapor deposition method (Plasma can be used
Enhanced Chemical Vapor Deposition；The methods of referred to as: PECVD) in the underlay substrate for being formed with color blocking layer
One layer of upper deposition has certain thickness polyimide material, obtains oriented layer.Then, enterprising in the oriented layer using orientation roller
Row friction, being formed in oriented layer has the groove mark of certain orientation to get alignment films are arrived.The presence of groove mark can in alignment films
Arrange liquid crystal according to certain orientation.Wherein, the value range of the thickness of alignment films can be set according to actual needs, the present invention
Embodiment is not construed as limiting this.
In step 103, spacer material is formed on the underlay substrate for be formed with alignment films, it can be square there are many can be achieved
Formula, the embodiment of the present invention are illustrated for following three kinds.
The first can realize mode, form spacer material in alignment films by the way of silk-screen printing.As shown in Fig. 4-1,
The process may include:
Step 1031a, mask plate is set in alignment films, and the side of mask plate is fitted in alignment films.
Schematic top plan view after mask plate 1 is arranged in alignment films 003 can be as shown in the Fig. 4-2, wherein on mask plate 1
Include multiple hollowed out areas 11, can see that the alignment films 003 on underlay substrate through the hollowed out area 11.
Step 1032a, spacer material material is injected into the hollowed out area of mask plate, until spacer material material fills vacancy section
Domain.
Optionally, which can be polymethyl methacrylate (English: polymethyl
methacrylate；Referred to as: PMMA) or other resin materials are formed, and details are not described herein again.
Illustratively, poly-methyl methacrylate can be injected into the hollowed out area of mask plate using instiling or the modes such as pouring into
Ester or other resin materials, until spacer material material fills hollowed out area.
Step 1033a, the spacer material material of hollowed out area is overflowed in removal.
Optionally, after spacer material material fills hollowed out area, the dottle pin that scraper will overflow hollowed out area can be used
Object material removal, to guarantee the integrality and accuracy of the spacer material shape formed.
Step 1034a, remove mask plate.
After removing mask plate, so that it may the spacer material formed.Illustratively, Fig. 4-3 is please referred to, it illustrates formed
Have and forms the structural schematic diagram after spacer material 004 on the underlay substrate 001 of alignment films 003.
It should be noted that the method for manufacturing spacer material in substrate using the mode of silk-screen printing, have it is simple, be easy to
It realizes and therefore this method can be applied to the mass production of spacer material on production line by feature at low cost.
Second of achievable mode, forms spacer material by the way of transfer in alignment films, as shown in fig. 5-1, the mistake
Journey may include:
Step 1031b, spacer material is formed on the substrate.
Optionally, a kind of optional implementation that spacer material is formed on the substrate can be with are as follows: nanometer pressure is used in substrate
Print technology manufactures spacer material.As shown in Fig. 5-2, mode, which can be achieved, in this be can specifically include:
Step b11, spacer material material layer is formed on the substrate.
Optionally, Fig. 5-3 is please referred to, it illustrates the structures after the formation spacer material material layer 0041 in substrate 201 to show
It is intended to.Wherein, spacer material material layer 0041 can be formed by polymethyl methacrylate or other resin materials, and substrate 201 can
Think transparent substrate, specifically can be has the guide-lighting and nonmetallic of certain robustness using glass, quartz, transparent resin etc.
Substrate made of material, details are not described herein again.
Illustratively, can be deposited one layer on substrate using the methods of magnetron sputtering, thermal evaporation or PECVD is had centainly
The polymethyl methacrylate of thickness or other resin materials, obtain spacer material material layer.The thickness of the spacer material material layer
Value range can be set according to actual needs, and the embodiment of the present invention is not construed as limiting this.
Step b12, spacer material material layer is heated, the heating temperature of spacer material material layer is greater than spacer material material layer
Glass transition temperature.
Spacer material is heated, and make heating temperature be greater than spacer material material layer glass transition temperature, be in order to
Make the character of spacer material material that can change after heating temperature reaches glass transition temperature, such as: become from solid-state
Liquid, and then it can be changed by suppression its shape in the follow-up process, to realize effective compacting.
Optionally, the material of spacer material material layer can be polymethyl methacrylate, the glass of polymethyl methacrylate
Glass transition temperature is 105 degrees Celsius, illustratively, can be taken the photograph to the temperature range of the heating temperature of spacer material material layer for 150
Family name's degree is to 230 degrees Celsius.
Step b13, compacting tool set is pressed into spacer material material layer, so that forming dottle pin article pattern in spacer material material layer.
Optionally, during being heated to spacer material material layer, compacting tool set can be pressed into spacer material material layer, made
Dottle pin article pattern is formed in spacer material material layer, that is to say, make spacer material material layer is formed under the compacting of compacting tool set and
The matched pattern of the press pattern of compacting tool set.Illustratively, Fig. 5-4 is please referred to, it illustrates compacting tool set 3 is pressed into spacer material
Structural schematic diagram after material layer 0041.Wherein, compacting tool set 3 can be made of earth silicon material, so that entirely pressing
During system, compacting tool set 3 will not be adhered to spacer material material layer 0041.
It should be noted that the dottle pin article pattern and the press pattern on compacting tool set that are formed in spacer material material layer are mutual
It mends.
Step b14, cool down to spacer material material layer.
Cool down to spacer material material layer, is in order to which the dottle pin article pattern for forming compacting can be solidified into after cooling
Type, to obtain having effigurate dottle pin article pattern.
Step b15, compacting tool set is removed lower than after glass transition temperature in the temperature of spacer material material layer.
Illustratively, Fig. 5-5 is please referred to, it illustrates the structures after the compacting tool set 3 in removal spacer material material layer 0041
Schematic diagram, wherein being formed with further includes the spacer material material having in low areas in the spacer material material layer 0041 of dottle pin article pattern
Expect 0041a, the spacer material material 0041a in the low areas is remained in the low areas in pressing process.
Step b16, the spacer material material being formed in the low areas in the spacer material material layer of dottle pin article pattern is removed,
To expose the basal region in substrate below low areas.
Illustratively, Fig. 5-6 is please referred to, it illustrates the indentations that removal is formed in the spacer material material layer of dottle pin article pattern
Spacer material material in region, the structural schematic diagram after obtaining the spacer material 004 being formed in substrate 201.
It is alternatively possible to be formed with the spacer material material of dottle pin article pattern using the method removal of oxygen response type ion etching
Spacer material material in low areas on the bed of material, until the basal region below the low areas in substrate is exposed, with
To the spacer material being formed in substrate.
It, may be residual in the low areas in spacer material material layer when being suppressed using compacting tool set in practical application
There are spacer material materials, it is also possible to not remain spacer material material, when remaining spacer material material in low areas, need
Except the spacer material material in the low areas, when in low areas without residual spacer material material, at this point, low areas is practical
Upper is a hollowed out area, and the removal without executing spacer material material acts, i.e., without executing step b16.
It should be noted that the method for manufacturing spacer material in substrate using the mode of nano impression, have it is at low cost and
Therefore this method can be applied on production line by the characteristics of simple process and the spacer material produced precision with higher
The mass production of spacer material.
Optionally, the optional implementation of another kind that spacer material is formed on the substrate can be with are as follows: using exposure in substrate
Developing technique manufactures spacer material.As illustrated in figs. 5-7, mode, which can be achieved, in this can specifically include:
Step b21, spacer material material layer is formed on the substrate.
Illustratively, the structural schematic diagram after spacer material material layer is formed on the substrate can refer to Fig. 5-3, wherein the dottle pin
Object material layer can be made of photosensitive materials such as polymethyl methacrylates, that is to say, which can be by photoetching
Glue is made.The process that spacer material material layer is formed on the substrate can accordingly refer to the process of step b11, and details are not described herein again.
Step b22, spacer material material layer is exposed and is developed so that spacer material is formed on the substrate.
For example, it is assumed that spacer material material layer is made of positive photoresist, spacer layer can be exposed, can make every
Underbed material layer forms complete exposure region and non-exposed area, develops to the spacer material material layer after exposure, can make completely
The photoresist of exposure region is completely removed, and the photoresist of non-exposed area all retains, and finally obtains the dottle pin with certain figure
Object.
Illustratively, the structural schematic diagram for the spacer material for spacer material material layer being exposed and being developed can be with reference to figure
5-6。
It should be noted that the embodiment of the present invention is said for forming spacer material material layer using positive photoresist
Bright, in practical application, spacer material material layer can also be formed using negative photoresist, the embodiment of the present invention does not limit this
It is fixed.
Step 1032b, the substrate with spacer material is buckled in alignment films.
Illustratively, Fig. 5-8 is please referred to, it illustrates buckle the substrate 201 for having spacer material 004 in alignment films 003
Structural schematic diagram later.Wherein, it buckles and refers to spacer material is attached to alignment films far from underlay substrate far from the side of substrate
Side on.
Step 1033b, stripping group bottom.
Optionally, stripping group bottom is to indicate to complete to form the entire of spacer material on the underlay substrate for be formed with alignment films
Process illustratively please refers to Fig. 4-3, and it illustrates spacer material 004 is formed on the underlay substrate 001 for be formed with alignment films 003
Structural schematic diagram afterwards.
It should be noted that the sequencing of the manufacturing method step of color membrane substrates provided in an embodiment of the present invention can be into
Row appropriate adjustment, step according to circumstances can also accordingly be increased and decreased.Anyone skilled in the art is in this hair
In the technical scope of bright exposure, the method that can readily occur in variation be should be covered by the protection scope of the present invention, therefore not
It repeats again.
In conclusion the manufacturing method of color membrane substrates provided in an embodiment of the present invention, by inciting somebody to action before forming spacer material
Alignment films are formed in color blocking layer, so that in forming the alignment film, spacer material will not form friction and block, relative to related skill
Art avoids the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates, ensure that the orientation of oriented layer
Effect enables liquid crystal to arrange according to certain orientation, to ensure that the display performance of display panel.
The embodiment of the invention also provides a kind of color membrane substrates, the color membrane substrates are by preceding method embodiment institute of the invention
The manufacturing method stated is fabricated, and structural schematic diagram can refer to and please refer to Fig. 4-3, as shown in Fig. 4-3, the color membrane substrates 00
May include:
Underlay substrate 001.
Color blocking layer 002 is provided on underlay substrate 001.
Alignment films 003 are provided in color blocking layer 002.
Spacer material 004 is provided in alignment films 003.
Optionally, black matrix is also provided between underlay substrate 001 and color blocking layer 002.
In conclusion color membrane substrates provided in an embodiment of the present invention, by the way that before spacer material is arranged, alignment films are arranged
In color blocking layer, so that in forming the alignment film, spacer material will not form friction and block, relative to the relevant technologies, avoid
Rub the appearance in imperfect or frictional strength very little region on color membrane substrates, ensure that the orientation effect of oriented layer, so that
Liquid crystal can be arranged according to certain orientation, to ensure that the display performance of display panel.
The embodiment of the invention also provides a kind of display panels comprising any color film base provided in an embodiment of the present invention
Plate.The display panel can be with are as follows: liquid crystal display panel, Electronic Paper, mobile phone, tablet computer, television set, display, laptop, number
The display panel of any products or components having a display function such as code photo frame, navigator.
In conclusion display panel provided in an embodiment of the present invention, by the way that before spacer material is arranged, alignment films are arranged
In the color blocking layer of color membrane substrates, so that in forming the alignment film, spacer material will not form friction and block, relative to related skill
Art avoids the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates, ensure that the orientation of oriented layer
Effect enables liquid crystal to arrange according to certain orientation, to ensure that the display performance of display panel.
The embodiment of the invention also provides a kind of manufacturing methods of display panel, and as in Figure 6-1, this method can wrap
It includes:
Step 601, manufacture color membrane substrates.
Optionally, the process for manufacturing color membrane substrates can be accordingly with reference to step 101 to step 103, and details are not described herein again.
Step 602, manufacture array substrate.
Optionally, the process for manufacturing array substrate may include: to form gate patterns on the first underlay substrate, formed
Have and forms gate insulation layer on the first underlay substrate of gate patterns, is formed on the first underlay substrate for being formed with gate insulation layer
Active layer forms source-drain electrode figure, in the first lining for being formed with source-drain electrode figure on the first underlay substrate for be formed with active layer
Passivation layer is formed on substrate and forms pixel electrode on the first underlay substrate for being formed with passivation layer.
Illustratively, Fig. 6-2 is a kind of structural schematic diagram of array substrate 01 provided in an embodiment of the present invention, wherein first
Gate patterns 012, gate insulation layer 013, active layer 014, source-drain electrode figure 015, passivation layer are sequentially formed on underlay substrate 011
016 and pixel electrode 017, wherein gate patterns 012 include grid, and source-drain electrode figure 015 includes: source electrode 0151 and drain electrode
0152。
It should be noted that alignment films can also be formed on the underlay substrate for be formed with pixel electrode.
Step 603, by array substrate and color membrane substrates to box, and filling liquid crystal between the array substrate and the color film substrate.
Illustratively, please refer to Fig. 6-3, it illustrates by array substrate 01 and color membrane substrates 00 to box, and in array substrate
Filling liquid crystal 02 between 01 and color membrane substrates 00, the structural schematic diagram after forming display panel 0, in the display panel 0, array
The side that substrate 01 and color membrane substrates 00 are formed with film layer is oppositely arranged.
Optionally, the mode of filling liquid crystal can be ink-jet (English: inkjet) between the array substrate and the color film substrate
Etc. modes, the embodiment of the present invention it is not specifically limited.
It should be noted that the sequencing of the manufacturing method step of display panel provided in an embodiment of the present invention can be into
Row appropriate adjustment, step according to circumstances can also accordingly be increased and decreased.Anyone skilled in the art is in this hair
In the technical scope of bright exposure, the method that can readily occur in variation be should be covered by the protection scope of the present invention, therefore not
It repeats again.
In conclusion the manufacturing method of display panel provided in an embodiment of the present invention, by inciting somebody to action before spacer material is arranged
Alignment films are arranged in the color blocking layer of color membrane substrates, so that in forming the alignment film, spacer material will not form friction and block, phase
For the relevant technologies, the appearance in imperfect or frictional strength very little the region that rubs on color membrane substrates is avoided, ensure that and take
To the orientation effect of layer, liquid crystal is arranged according to certain orientation, to ensure that the display performance of display panel.
Those of ordinary skill in the art will appreciate that realizing that all or part of the steps of above-described embodiment can pass through hardware
It completes, relevant hardware can also be instructed to complete by program, the program can store in a kind of computer-readable
In storage medium, storage medium mentioned above can be read-only memory, disk or CD etc..
The foregoing is merely presently preferred embodiments of the present invention, is not intended to limit the invention, it is all in spirit of the invention and
Within principle, any modification, equivalent replacement, improvement and so on be should all be included in the protection scope of the present invention.
Claims (8)
1. a kind of manufacturing method of color membrane substrates, which is characterized in that the described method includes:
Color blocking layer is formed on underlay substrate；
Alignment films are formed in the color blocking layer；
Spacer material is formed on the substrate；
Substrate with spacer material is buckled in the alignment films, described buckle refers to the spacer material far from the substrate
Side be attached on side of the alignment films far from the underlay substrate；
Remove the substrate.
2. the method according to claim 1, wherein
It is described to form spacer material in the alignment films, comprising:
Spacer material is formed in the alignment films by the way of silk-screen printing.
3. according to the method described in claim 2, it is characterized in that,
It is described to form spacer material in the alignment films by the way of silk-screen printing, comprising:
Mask plate is set in the alignment films, and the side of the mask plate is fitted in the alignment films；
Spacer material material is injected into the hollowed out area of the mask plate, until the spacer material material fills the vacancy section
Domain；
The spacer material material of the hollowed out area is overflowed in removal；
Remove the mask plate.
4. the method according to claim 1, wherein
It is described that spacer material is formed on the substrate, comprising:
Spacer material is manufactured using nanometer embossing in substrate.
5. according to the method described in claim 4, it is characterized in that,
It is described that spacer material is manufactured using nanometer embossing in substrate, comprising:
Spacer material material layer is formed on the substrate；
The spacer material material layer is heated, the heating temperature of the spacer material material layer is greater than the spacer material material layer
Glass transition temperature；
Compacting tool set is pressed into the spacer material material layer, so that forming dottle pin article pattern in the spacer material material layer；
Cool down to the spacer material material layer；
After the temperature of the spacer material material layer is lower than the glass transition temperature, the compacting tool set is removed；
The spacer material material being formed in the low areas in the spacer material material layer of the dottle pin article pattern is removed, to expose
Basal region below the low areas.
6. according to the method described in claim 5, it is characterized in that,
The glass transition temperature is 105 degrees Celsius；
The temperature range of the heating temperature is 150 degrees Celsius to 230 degrees Celsius.
7. a kind of color membrane substrates, which is characterized in that the color membrane substrates by any method manufacture of claim 1 to 6 and
At.
8. a kind of display panel characterized by comprising color membrane substrates as claimed in claim 7.
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| CN107402470A (en) * | 2017-08-25 | 2017-11-28 | 东旭（昆山）显示材料有限公司 | Color filter and its manufacture method, display panel, display, storage medium |
| CN111025779A (en) * | 2018-10-09 | 2020-04-17 | 咸阳彩虹光电科技有限公司 | Device for improving liquid crystal panel manufacturing process and manufacturing method thereof |
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| CN1141020A (en) * | 1993-11-03 | 1997-01-22 | 康宁股份有限公司 | Color filter and method of printing |
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| JP2000180862A (en) * | 1998-12-11 | 2000-06-30 | Ricoh Microelectronics Co Ltd | Formation of spacer for liquid crystal display device, device for formation of spacer for liquid crystal display device and liquid crystal display device |
| KR20030052786A (en) * | 2001-12-21 | 2003-06-27 | 엘지.필립스 엘시디 주식회사 | Method for forming spacer of liquid crystal display |
| CN1794049A (en) * | 2004-12-23 | 2006-06-28 | Lg.菲利浦Lcd株式会社 | Method of manufacturing substrate for liquid crystal display device |
| CN102466922A (en) * | 2010-11-05 | 2012-05-23 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method thereof and liquid crystal display (LCD) provided therewith |
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- 2017-01-19 CN CN201710039335.8A patent/CN106526957B/en not_active Expired - Fee Related
Patent Citations (6)
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|---|---|---|---|---|
| CN1141020A (en) * | 1993-11-03 | 1997-01-22 | 康宁股份有限公司 | Color filter and method of printing |
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| JP2000180862A (en) * | 1998-12-11 | 2000-06-30 | Ricoh Microelectronics Co Ltd | Formation of spacer for liquid crystal display device, device for formation of spacer for liquid crystal display device and liquid crystal display device |
| KR20030052786A (en) * | 2001-12-21 | 2003-06-27 | 엘지.필립스 엘시디 주식회사 | Method for forming spacer of liquid crystal display |
| CN1794049A (en) * | 2004-12-23 | 2006-06-28 | Lg.菲利浦Lcd株式会社 | Method of manufacturing substrate for liquid crystal display device |
| CN102466922A (en) * | 2010-11-05 | 2012-05-23 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method thereof and liquid crystal display (LCD) provided therewith |
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